CN107338420A - A kind of vacuum coating method and equipment - Google Patents
A kind of vacuum coating method and equipment Download PDFInfo
- Publication number
- CN107338420A CN107338420A CN201710611044.1A CN201710611044A CN107338420A CN 107338420 A CN107338420 A CN 107338420A CN 201710611044 A CN201710611044 A CN 201710611044A CN 107338420 A CN107338420 A CN 107338420A
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- China
- Prior art keywords
- vacuum
- chamber
- plating piece
- coater
- surge chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The embodiment of the invention discloses a kind of vacuum coating method and vacuum coating equipment.The vacuum coating method includes carrying out vacuum pre-treatment to plating piece；And the plating piece after vacuum pre-treatment is put into vacuum coater and carries out vacuum coating.Vacuum coating equipment and its used vacuum coating method in the application, it is to be placed in plating piece in the vacuum chamber of the first vacuum for a long time, efficiently remove the gas and impurity of residual in plating piece, therefore plating piece is difficult to discharge gas or impurity again during vacuum coating, and then ensure that the atmosphere constituent in vacuum coating room is stable, so that the Film color on plating piece surface is uniform, activate plating piece surface, improve membranous layer binding force and improve film surface stress, ensure the stability and repeatability of technique for vacuum coating, improve the efficiency and yields of plating piece production.
Description
Technical field
The present invention relates to technical field of vacuum plating, more particularly to a kind of vacuum coating method and equipment.
Background technology
Vacuum coating, the atom referred in vacuum indoor material isolates from heating source to be got on the surface of plating piece,
The major function of vacuum coating includes assigning plating piece apparent height metallic luster effect and mirror effect, and film layer has outstanding
Barrier property, there is provided excellent electromagnetic shielding and conductive effect.Whether plating piece superficial film color is uniform, whether adhesion is firm
Admittedly it is one of important indicator for judging whether coating quality is excellent, if plating piece superficial film irregular colour is even or film layer occurs
Come off, then plating piece will be dropped as defective work.
It is excellent, it is necessary to maintain the atmosphere constituent in vacuum chamber stable for guarantee plating piece coating quality.And plating piece is being made
It is possible to remain some gases in it during work, such as the plating piece that mixed injection molding part metal and plastic-injection form, in order to protect
Both good combinations of card, both have interface or the hole of complexity, and some moisture bearing gas may be then retained in these holes
Or other objects are such as cleaning fluid, antiscuffing paste.
Existing vacuum coating equipment can set corresponding heating-up temperature and vacuum.Set when plating piece is positioned over vacuum coating
After standby, vacuum coating equipment starts and progressively reaches the heating-up temperature and vacuum of its setting.General vacuum coating equipment reaches
Predetermined set heating-up temperature and predetermined vacuum degree (such as reach vacuum 6.0*10-3Pa after), next processing procedure link is just immediately entered,
The process for keeping heating in vacuum for a long time will not be reserved.Because the pore-size in plating piece is particularly small, relative porosity factor
Micropore is especially deep, and gas or other impurities are difficult thoroughly to remove totally under relatively short vacuum and normal temperature state,
Now plating piece surface can also a large amount of miscellaneous gas of remaining be not released, cause plating piece in coating process by atomic collision, table
Face heating makes to remain in gap, the miscellaneous gas of micropore is continually released, and ultimately results in Film color inequality, adhesion is not
Foot, film quality are affected, and then influence the technology stability and repeatability of vacuum coating equipment.
Plating piece discharges gas or impurity during how avoiding vacuum coating, ensures that the atmosphere constituent in vacuum chamber is steady
It is fixed, turn into urgent problem to be solved in technique for vacuum coating.
The content of the invention
The invention provides a kind of vacuum coating method, it is intended that avoiding plating piece during vacuum coating from discharging
Gas or impurity, ensure that the atmosphere constituent in vacuum chamber is stable.
Meanwhile the present invention also provides a kind of vacuum coating equipment, it uses the vacuum coating method in the embodiment of the present invention,
It can ensure the stability and repeatability of technique for vacuum coating.
To achieve these goals, technical scheme is as follows：
According to an aspect of the present invention, there is provided a kind of vacuum coating method, including：
Vacuum pre-treatment is carried out to plating piece；
Plating piece after vacuum pre-treatment is put into vacuum coater and carries out vacuum coating.
Wherein, it is described that plating piece progress vacuum pre-treatment is included：
Plating piece is placed on the microscope carrier in vacuum chamber；
The first vacuum is evacuated to vacuum chamber, the first temperature is heated to plating piece in vacuum；
Keep first temperature-resistant, the vacuum chamber is maintained the first vacuum setting duration.
Wherein, the vacuum chamber maintains the first vacuum setting duration to be more than 1 hour；First vacuum is less than 1 × 10- 2Pa。
Further, aura cleaning step is also included after carrying out vacuum pre-treatment to plating piece；Aura cleaning step includes：
Keep the vacuum chamber first temperature-resistant, inert gas is filled with into vacuum chamber to the second vacuum；
Aura cleaning device power supply is opened, aura cleaning setting time is carried out to plating piece；
After setting time reaches, aura cleaning device power supply is closed.
Preferably, vacuum pre-treatment is carried out to plating piece with the aura cleaning step periodically to replace.
It is further preferred that also include before vacuum pre-treatment is carried out to plating piece：
The first surge chamber connected with the vacuum chamber is provided with the entrance of the vacuum chamber；
First the first surge chamber and the vacuum chamber are completely cut off, and plating piece is first put into the first surge chamber；
First surge chamber is vacuumized, when vacuum reaches the first vacuum in the first surge chamber, by plating piece by
One surge chamber is delivered in the vacuum chamber.
Wherein, the vacuum chamber is connected with the vacuum coater arranges or is independently arranged.
It is further preferred that before the plating piece is put into vacuum coater, in addition to：
The second surge chamber connected with the vacuum chamber is provided with the exit of the vacuum chamber；
First the second surge chamber and the vacuum chamber are completely cut off, and the second surge chamber is vacuumized；
When the vacuum in the second surge chamber reaches the first vacuum, plating piece is delivered to second by the vacuum chamber
In surge chamber.
It is further preferred that be put into the plating piece in vacuum coater after progress vacuum coating, in addition to：
The 3rd surge chamber connected with the vacuum coater is provided with the vacuum coater exit；
First the 3rd surge chamber and the vacuum coater are completely cut off, and the 3rd surge chamber is vacuumized；
When the vacuum in the 3rd surge chamber is identical with the vacuum in vacuum coater, by plating piece by described true
Empty coating apparatus is sent to the 3rd surge chamber.
According to another aspect of the present invention, a kind of vacuum coating equipment, including vacuum coater and vacuum are additionally provided
Pretreatment unit, the vacuum pre-treatment device include vavuum pump, vacuum chamber, the microscope carrier being arranged in vacuum chamber, heating
System and vacuum measurement system；
The plating piece is arranged on the microscope carrier；
The vavuum pump and the vacuum chamber UNICOM, and the vacuum chamber is vacuumized；
The heating system and the vacuum measurement system are arranged in the vacuum chamber.
Preferably, the first buffering connected with the vacuum chamber is provided with the vacuum pre-treatment device entrance
Room.
It is further preferred that second connected with the vacuum chamber is provided with the vacuum pre-treatment device exit
Surge chamber.
It is further preferred that connected with the vacuum coater is provided with the vacuum coater exit
Three surge chambers.
It is further preferred that the vacuum pre-treatment device also includes aura cleaning device and inert gas supply system
System；
The aura cleaning device is arranged in the vacuum chamber；The inert gas air supply system is arranged at described true
Outside empty cabin, the aura cleaning device is connected with the inert gas air supply system.
Wherein, the vacuum chamber is connected with the vacuum coater arranges or is independently arranged.
The vacuum coater in the application is one or more.
From above technical scheme, vacuum coating equipment and its used vacuum coating method in the application, it is
Plating piece is placed in the vacuum chamber of the first vacuum for a long time, efficiently removes the gas and impurity of residual in plating piece,
Therefore plating piece is difficult to discharge gas or impurity again during vacuum coating, and then ensures the atmosphere constituent in vacuum coating room
It is stable, so that the Film color on plating piece surface is uniform, activation plating piece surface, improves membranous layer binding force and improve film layer table
Face stress, ensure the stability and repeatability of technique for vacuum coating, improve the efficiency and yields of plating piece production.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to institute in embodiment
The accompanying drawing needed to use is briefly described, it should be apparent that, drawings in the following description are only some implementations of the present invention
Example, for those of ordinary skill in the art, on the premise of not paying creative work, can also be obtained according to these accompanying drawings
Obtain other accompanying drawings.
Fig. 1 is to be preferable to carry out the structural representation of vacuum coating equipment that exemplifies according to one；
Fig. 2 is the structural representation according to another vacuum coating equipment for being preferable to carry out exemplifying.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Whole description, it is clear that described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other under the premise of creative work is not made
Embodiment, belong to the scope of protection of the invention.
The present invention provides a kind of vacuum coating method, and the gas in plating piece or impurity can carried out plated film advance by it
Row fully removes, and so as to avoid plating piece from discharging gas or impurity during vacuum coating, and then ensures the gas in vacuum chamber
Atmosphere stable components.
Vacuum coating method described in the embodiment of the present invention includes：
Vacuum pre-treatment is carried out to plating piece；
Plating piece after vacuum pre-treatment is put into vacuum coater and carries out vacuum coating.
Specifically, carrying out vacuum pre-treatment to plating piece includes：
Plating piece is placed on the microscope carrier in vacuum chamber；
The first vacuum is evacuated to vacuum chamber, the first temperature is heated to plating piece in vacuum；First
The threshold value of temperature determines that the first temperature is less than the highest bearing temperature of plating piece according to the selection of material of plating piece.
Keep first temperature-resistant, vacuum chamber is maintained the first vacuum setting duration.
Wherein, the numerical value of the first vacuum is less than 1 × 10-2Pa.Vacuum chamber maintains the setting duration of the first vacuum to need
More than 1 hour；If make gas in plating piece or impurity removes more thoroughly, when vacuum chamber maintains the setting of the first vacuum
It is long to be preferably more than 3 hours.
Plating piece is placed in the vacuum chamber of the first vacuum for a long time, can efficiently remove the gas of residual in plating piece
Body and impurity, then plating piece is just difficult to discharge gas or impurity again during vacuum coating, and then is ensured in vacuum coating room
Atmosphere constituent it is stable so that the Film color on plating piece surface is uniform, plating piece surface can be activated again, film layer is improved and combine
Power simultaneously improves film surface stress, ensures the stability and repeatability of technique for vacuum coating, improves the efficiency of plating piece production
And yields.
The species of plating piece in the application include but is not limited to stainless steel, mixed injection molding part, composite, kirsite,
Plastic cement plated item etc..
The application preferably, to plating piece carry out vacuum pre-treatment after, carry out vacuum pre-treatment vacuum chamber in,
Also include aura cleaning step.Wherein, aura cleaning step includes：
Keep vacuum chamber first temperature-resistant, inert gas is filled with into vacuum chamber to the second vacuum.Wherein,
Two vacuums are more than the first vacuum, and its numerical stability is in the range of 1~2Pa.The preferred high-purity indifferent gas style of inert gas
Such as argon gas.
Aura cleaning device power supply is opened, aura cleaning setting time is carried out to plating piece；
After setting time reaches, aura cleaning device power supply is closed.
By aura cleaning step, ion aura processing can be carried out to the plating piece in vacuum chamber, realized to plated
Part surface carries out surface active, etching processing, can preferably increase plating piece surface cleanness, excludes plating piece adsorption
Gas and moisture, increase the adhesion of plating piece and film layer.
It is further preferred that carrying out vacuum pre-treatment and aura cleaning step to plating piece in the application can be carried out periodically
Alternately.Such as the time that vacuum pre-treatment is carried out to plating piece is set as 1 hour, aura scavenging period 20 minutes.Vacuum first
To reach the first vacuum in cabin, and be heated to the first temperature.The first temperature and the first vacuum are kept after 1 hour, vacuum
High purity inert gas such as argon gas is added in cabin, makes to reach the second vacuum, i.e. 1.0~2.0pa in vacuum chamber, opens aura
Cleaning device power supply, after aura cleaning being carried out to plating piece 20 minutes, aura power supply is closed, closes inert gas air supply system.
Vacuum chamber is recovered to the first vacuum, and be incubated to carrying out aura again after 1 hour and clean 20 minutes.By periodically
Vacuum constant temperature, aura cleaning are carried out to vacuum chamber, plating piece can be made preferably to discharge its internal gas, activate plating piece table
Face, improve plating piece and membranous layer binding force.
It is further preferred that also include before vacuum pre-treatment is carried out to plating piece：
The first surge chamber connected with vacuum chamber is provided with the entrance of vacuum chamber；
First the first surge chamber and vacuum chamber are completely cut off, and plating piece is first put into the first surge chamber；
First surge chamber is vacuumized, when vacuum reaches the first vacuum in the first surge chamber, by plating piece by
One surge chamber is delivered in vacuum chamber.
Before plating piece is put into vacuum coater, in addition to：
The second surge chamber connected with vacuum chamber is provided with the exit of vacuum chamber；
First the second surge chamber and vacuum chamber are completely cut off, and the second surge chamber is vacuumized；
When the vacuum in the second surge chamber reaches the first vacuum, plating piece is delivered into the second buffering by vacuum chamber
In room.
It is put into plating piece in vacuum coater after progress vacuum coating, in addition to：
The 3rd surge chamber connected with vacuum coater is provided with vacuum coater exit；
First the 3rd surge chamber and vacuum coater are completely cut off, and the 3rd surge chamber is vacuumized；
When the vacuum in the 3rd surge chamber is identical with the vacuum in vacuum coater, by plating piece by Vacuum Deposition
Film device is sent to the 3rd surge chamber.
By the setting of above-mentioned first surge chamber, the second surge chamber and the 3rd surge chamber, plating piece can be achieved and entirely locating
Vacuum environment is in non-destructive state all the time during reason., can when only setting a surge chamber or any two surge chamber
Realize that the vacuum environment at corresponding import or export is in not collapse state.
In the application, vacuum chamber can be the setting that is connected with vacuum coater, can also be independently arranged.
Vacuum chamber is connected arrangement with vacuum coater, and plating piece can be fed directly into the environment of vacuum is not destroyed
In vacuum coater, the atmosphere in vacuum coater will not produce change.
Vacuum chamber is independently arranged with vacuum coater.Plating piece is put rapidly after vacuum pre-treatment is carried out in the short time
Enter in vacuum coater.Because open-assembly time is short in an atmosphere, the impurity level such as moisture and gas of plating piece adsorption is not
The atmosphere in vacuum coater can be influenceed.
Vacuum coater in the application is one or more., can be disposably to batch in vacuum pre-treatment step
Plating piece carries out vacuum pre-treatment, after the plating piece of batch carries out vacuum pre-treatment, can be sent to one or more vacuum coatings
Batch coating film treatment is carried out in device.
According to another aspect of the present invention, a kind of vacuum coating equipment is additionally provided.Fig. 1 is to be preferable to carry out illustrating according to one
The structural representation of the vacuum coater gone out.As shown in figure 1, vacuum coating equipment includes vacuum coater 1 and vacuum is pre-
Processing unit 2.Vacuum pre-treatment device includes vavuum pump 20, vacuum chamber 21, the microscope carrier 22 being arranged in vacuum chamber, heating
System 23 and vacuum measurement system 24.Plating piece is arranged on microscope carrier 22.Vavuum pump 20 and the UNICOM of vacuum chamber 21, and to vacuum
Cabin is vacuumized.Heating system 23 and vacuum measurement system 24 are arranged in vacuum chamber.
It is further preferred that vacuum pre-treatment device also includes aura cleaning device 25 and inert gas air supply system.Brightness
Light cleaning apparatus is arranged in vacuum chamber；Inert gas air supply system is arranged at outside vacuum chamber, aura cleaning device with it is lazy
Property the connection of gas air supply system.
Fig. 2 is the structural representation according to another vacuum coating equipment for being preferable to carry out exemplifying.As shown in Fig. 2 vacuum
Filming equipment is preferably provided with the first surge chamber 3 connected with vacuum chamber in vacuum pre-treatment device entrance.
The second surge chamber 4 connected with vacuum chamber is provided with vacuum pre-treatment device exit.
The 3rd surge chamber 5 connected with vacuum coater is provided with vacuum coater exit.
In the application, the vacuum coater in vacuum coating equipment is one or more.
From above technical scheme, vacuum coating equipment and its used vacuum coating method in the application, it is
Plating piece is placed in the vacuum chamber of the first vacuum for a long time, efficiently removes the gas and impurity of residual in plating piece,
Therefore plating piece is difficult to discharge gas or impurity again during vacuum coating, and then ensures the atmosphere constituent in vacuum coating room
It is stable, so that the Film color on plating piece surface is uniform, activation plating piece surface, improves membranous layer binding force and improve film layer table
Face stress, ensure the stability and repeatability of technique for vacuum coating, improve the efficiency and yields of plating piece production.
It should be appreciated that the invention is not limited in the precision architecture for being described above and being shown in the drawings, and
And various modifications and changes can be being carried out without departing from the scope.The scope of the present invention is only limited by appended claim.
Claims (10)
- A kind of 1. vacuum coating method, it is characterised in that including：Vacuum pre-treatment is carried out to plating piece；Plating piece after vacuum pre-treatment is put into vacuum coater and carries out vacuum coating.
- 2. vacuum coating method according to claim 1, it is characterised in that described that vacuum pre-treatment bag is carried out to plating piece Include：Plating piece is placed on the microscope carrier in vacuum chamber；The first vacuum is evacuated to vacuum chamber, the first temperature is heated to plating piece in vacuum；Keep first temperature-resistant, the vacuum chamber is maintained the first vacuum setting duration.
- 3. vacuum coating method according to claim 2, it is characterised in that the vacuum chamber maintains the first vacuum to set Timing is long to be more than 1 hour；First vacuum is less than 1 × 10-2Pa。
- 4. vacuum coating method according to claim 2, it is characterised in that also wrapped after carrying out vacuum pre-treatment to plating piece Include aura cleaning step；The aura cleaning step includes：Keep the vacuum chamber first temperature-resistant, inert gas is filled with into vacuum chamber to the second vacuum；Aura cleaning device power supply is opened, aura cleaning setting time is carried out to plating piece；After setting time reaches, aura cleaning device power supply is closed.
- 5. vacuum coating method according to claim 4, it is characterised in that to plating piece carry out vacuum pre-treatment with it is described Aura cleaning step is periodically alternately.
- 6. according to any described vacuum coating method in claim 2 to 5, it is characterised in that including following technical characteristics It is at least one：Also include before vacuum pre-treatment is carried out to plating piece：The first surge chamber connected with the vacuum chamber is provided with the entrance of the vacuum chamber；First the first surge chamber and the vacuum chamber are completely cut off, and plating piece is first put into the first surge chamber；First surge chamber is vacuumized, when vacuum reaches the first vacuum in the first surge chamber, plating piece delayed by first Room is rushed to deliver in the vacuum chamber；Before the plating piece is put into vacuum coater, in addition to：The second surge chamber connected with the vacuum chamber is provided with the exit of the vacuum chamber；First the second surge chamber and the vacuum chamber are completely cut off, and the second surge chamber is vacuumized；When the vacuum in the second surge chamber reaches the first vacuum, plating piece is delivered into the second buffering by the vacuum chamber In room；It is put into the plating piece in vacuum coater after progress vacuum coating, in addition to：The 3rd surge chamber connected with the vacuum coater is provided with the vacuum coater exit；First the 3rd surge chamber and the vacuum coater are completely cut off, and the 3rd surge chamber is vacuumized；When the vacuum in the 3rd surge chamber is identical with the vacuum in vacuum coater, by plating piece by the Vacuum Deposition Film device is sent to the 3rd surge chamber.
- 7. vacuum coating method according to claim 6, it is characterised in that the vacuum chamber fills with the vacuum coating Put to be connected and arrange or be independently arranged.
- 8. a kind of vacuum coating equipment, including vacuum coater, it is characterised in that described also including vacuum pre-treatment device Vacuum pre-treatment device includes vavuum pump, vacuum chamber, the microscope carrier being arranged in vacuum chamber, heating system and vacuum measurement system System；The plating piece is arranged on the microscope carrier；The vavuum pump and the vacuum chamber UNICOM, and the vacuum chamber is vacuumized；The heating system and the vacuum measurement system are arranged in the vacuum chamber.
- 9. vacuum coating equipment according to claim 8, it is characterised in that include at least one of following technical characteristics：The first surge chamber connected with the vacuum chamber is provided with the vacuum pre-treatment device entrance；The second surge chamber connected with the vacuum chamber is provided with the vacuum pre-treatment device exit.The 3rd surge chamber connected with the vacuum coater is provided with the vacuum coater exit.The vacuum chamber is connected with the vacuum coater to be arranged or is independently arranged；Vacuum coater is one or more.
- 10. vacuum coating equipment according to claim 8 or claim 9, it is characterised in that the vacuum pre-treatment device also includes Aura cleaning device and inert gas air supply system；The aura cleaning device is arranged in the vacuum chamber；The inert gas air supply system is arranged at the vacuum chamber Outdoor, the aura cleaning device are connected with the inert gas air supply system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710611044.1A CN107338420A (en) | 2017-07-25 | 2017-07-25 | A kind of vacuum coating method and equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710611044.1A CN107338420A (en) | 2017-07-25 | 2017-07-25 | A kind of vacuum coating method and equipment |
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| Publication Number | Publication Date |
|---|---|
| CN107338420A true CN107338420A (en) | 2017-11-10 |
Family
ID=60217082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710611044.1A Pending CN107338420A (en) | 2017-07-25 | 2017-07-25 | A kind of vacuum coating method and equipment |
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| CN (1) | CN107338420A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109402597A (en) * | 2018-10-30 | 2019-03-01 | 厦门建霖健康家居股份有限公司 | Vacuum coating system is directly electroplated in a kind of semidry method processing plastic cement |
| CN112281134A (en) * | 2020-10-30 | 2021-01-29 | 湘潭宏大真空技术股份有限公司 | Double-chamber high-efficiency film coating machine |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109402597A (en) * | 2018-10-30 | 2019-03-01 | 厦门建霖健康家居股份有限公司 | Vacuum coating system is directly electroplated in a kind of semidry method processing plastic cement |
| CN112281134A (en) * | 2020-10-30 | 2021-01-29 | 湘潭宏大真空技术股份有限公司 | Double-chamber high-efficiency film coating machine |
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