CN109402597A - Vacuum coating system is directly electroplated in a kind of semidry method processing plastic cement - Google Patents
Vacuum coating system is directly electroplated in a kind of semidry method processing plastic cement Download PDFInfo
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- CN109402597A CN109402597A CN201811272348.0A CN201811272348A CN109402597A CN 109402597 A CN109402597 A CN 109402597A CN 201811272348 A CN201811272348 A CN 201811272348A CN 109402597 A CN109402597 A CN 109402597A
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- 238000000034 method Methods 0.000 title claims abstract description 59
- 239000004033 plastic Substances 0.000 title claims abstract description 31
- 239000004568 cement Substances 0.000 title claims abstract description 27
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 25
- 239000000956 alloy Substances 0.000 claims abstract description 34
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 34
- KRQUFUKTQHISJB-YYADALCUSA-N 2-[(E)-N-[2-(4-chlorophenoxy)propoxy]-C-propylcarbonimidoyl]-3-hydroxy-5-(thian-3-yl)cyclohex-2-en-1-one Chemical compound CCC\C(=N/OCC(C)OC1=CC=C(Cl)C=C1)C1=C(O)CC(CC1=O)C1CCCSC1 KRQUFUKTQHISJB-YYADALCUSA-N 0.000 claims abstract description 17
- 239000011248 coating agent Substances 0.000 claims abstract description 16
- 238000000576 coating method Methods 0.000 claims abstract description 16
- 238000007599 discharging Methods 0.000 claims abstract description 11
- 238000007747 plating Methods 0.000 claims abstract description 7
- 238000002360 preparation method Methods 0.000 claims abstract description 4
- 238000004544 sputter deposition Methods 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 12
- 230000007704 transition Effects 0.000 claims description 11
- 238000005273 aeration Methods 0.000 claims description 6
- 238000002955 isolation Methods 0.000 claims description 6
- 230000005540 biological transmission Effects 0.000 claims description 4
- 208000002925 dental caries Diseases 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 238000001914 filtration Methods 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- MEYZYGMYMLNUHJ-UHFFFAOYSA-N tunicamycin Natural products CC(C)CCCCCCCCCC=CC(=O)NC1C(O)C(O)C(CC(O)C2OC(C(O)C2O)N3C=CC(=O)NC3=O)OC1OC4OC(CO)C(O)C(O)C4NC(=O)C MEYZYGMYMLNUHJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000012530 fluid Substances 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 238000007789 sealing Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 claims 16
- 238000001035 drying Methods 0.000 claims 2
- 239000002344 surface layer Substances 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000010949 copper Substances 0.000 abstract description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052802 copper Inorganic materials 0.000 abstract description 2
- 239000003814 drug Substances 0.000 abstract description 2
- 230000007613 environmental effect Effects 0.000 abstract description 2
- 238000009713 electroplating Methods 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 235000004443 Ricinus communis Nutrition 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of semidry method processing plastic cement, and vacuum coating system is directly electroplated, including feeding vacuum cavity, aura modified vacuum cavity, hard Cr coating bottoming vacuum cavity, Cr is to alloy layer plated film vacuum cavity, alloy layer plated film vacuum cavity and discharging cavity；The coating system can make film layer bulky grain diameter drop to 30 μm or less；Producing line beat is no more than 8min；It directly forms resistance to stress conductive layer in plastic rubber member surface, the pre-electroplating treatment process before sour copper to replace wet process plating, the film of preparation is semidry method processing mode, is a kind of plated film mode of environmental protection, to replace the heavily contaminateds medicaments such as Cr VI used in wet process plated film.
Description
Technical field
The present invention relates to coating technique fields, are specially related to a kind of semidry method processing plastic cement and Vacuum Deposition membrane system is directly electroplated
System.
Background technique
Column target power output used in prior art plated film is low, and cooling effect is poor, film deposition low efficiency, and Cu sputters bulky grain
Obviously, producing line productive temp is too long causes production efficiency low；Problem to be solved: using high-power shielding power supply, increases column
Cu target is changed to alloys target by target volume and amount of cooling water, and reducing bulky grain influences, and film deposition efficiency is promoted, by productive temp
8min is fallen to from 45min.
Summary of the invention
In order to solve the above-mentioned technical problem, the purpose of the present invention is to provide a kind of semidry method processing plastic cement to be directly electroplated very
Empty coating system.
The present invention is achieved through the following technical solutions: vacuum coating system, which is directly electroplated, in semidry method processing plastic cement has
Continuous six cavitys, respectively 1- feeds vacuum cavity in sequence；2- aura modified vacuum cavity；3- hard Cr coating is beaten
Bottom vacuum cavity；4-Cr is to alloy layer plated film vacuum cavity；5- alloy layer plated film vacuum cavity；6- discharging cavity；
Wherein charging vacuum cavity 1 reaches purer brightness by vacuumizing isolation atmosphere and aura modified vacuum cavity 2
Light gas component improves binding force and its uniformity；Aura modified vacuum cavity 2 passes through 2500V/50% high-frequency ac aura electricity
Source oxygen build-up of luminance is realized that plastic rubber member surface is modified；Hard Cr coating bottoming vacuum cavity 3 uses 60KW, 40KHz mid frequency sputtering
Power supply forms bottoming Cr layers in substrate surface and the Cr tunic thickness is made to be 0.1-0.2 μm；In Cr to alloy layer plated film vacuum chamber
30KW DC sputtering power is used in body 4, forms transition zone in Cr layer surface, the film thickness of the transition zone is 0.1-0.2 μm；Alloy
Coating plated film vacuum cavity 5 uses 30KW DC sputtering power, forms pure alloy-layer in transition layer surface, the alloy layer thickness
It is 0.1-0.2 μm；Discharging cavity 6, which is crossed, vacuumizes isolation atmosphere and alloy layer plated film vacuum cavity 5, reaches purer sputtering
Gas component improves binding force and its uniformity.Product is 480s, total thicknesses of layers by the design section bat time of all cavitys
It is 0.3-0.6 μm.
The invention has the following beneficial effects: film layer bulky grain diameters to drop to 30 μm or less；Producing line beat is no more than
8min；It directly forms resistance to stress conductive layer in plastic rubber member surface, before the plating before sour copper to replace wet process plating
Process is managed, it is a kind of plated film mode of environmental protection that the film of preparation, which is semidry method processing mode, is used in wet process plated film to replace
The heavily contaminateds medicament such as Cr VI.
Detailed description of the invention
It, below will be to required in embodiment or description of the prior art in order to illustrate more clearly of technical solution of the present invention
The attached drawing used is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, right
For those of ordinary skill in the art, without creative efforts, it can also be obtained according to these attached drawings
Its attached drawing.
Fig. 1 is top view of the invention.
Fig. 2 is main view of the invention.
In figure: 1- feeds vacuum cavity；2- aura modified vacuum cavity；3- hard Cr coating bottoming vacuum cavity；4-Cr
To alloy layer plated film vacuum cavity；5- alloy layer plated film vacuum cavity；6- discharging cavity；7- transmits rectangle gate valve；8-
Manual operation door；9- observation window；10- equips support frame；11- heavy type lower margin；12- heavy type castor；Roughing pump in 13- dry type
Unit；14- ultrahigh vacuum gate valve；15- high-vacuum molecular pump；16- low vacuum pump-line；17-KF25 interface；18-DN connects
Mouthful；19- medium-high frequency high-voltage glow electrode；20- mid frequency sputtering device；21- throttle valve；22- intermediate frequency and d.c. sputtering transition apparatus；
23- DC sputtering device；24- pivoted frame transmission system.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, carries out to the technical solution in inventive embodiments clear, complete
Ground description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.Based on this
The embodiment of invention, those of ordinary skill in the art's every other reality obtained without making creative work
Example is applied, shall fall within the protection scope of the present invention.
Vacuum coating system is directly electroplated with continuous six in reference book attached drawing 1-2, semidry method processing plastic cement
Cavity, respectively 1- feeds vacuum cavity in sequence；2- aura modified vacuum cavity；3- hard Cr coating bottoming vacuum chamber
Body；4-Cr is to alloy layer plated film vacuum cavity；5- alloy layer plated film vacuum cavity；6- discharging cavity；
Wherein charging vacuum cavity 1 reaches purer brightness by vacuumizing isolation atmosphere and aura modified vacuum cavity 2
Light gas component improves binding force and its uniformity；Aura modified vacuum cavity 2 passes through 2500V/50% high-frequency ac aura electricity
Source oxygen build-up of luminance is realized that plastic rubber member surface is modified；Hard Cr coating bottoming vacuum cavity 3 uses 60KW, 40KHz mid frequency sputtering
Power supply forms bottoming Cr layers in substrate surface and the Cr tunic thickness is made to be 0.1-0.2 μm；In Cr to alloy layer plated film vacuum chamber
30KW DC sputtering power is used in body 4, forms transition zone in Cr layer surface, the film thickness of the transition zone is 0.1-0.2 μm；Alloy
Coating plated film vacuum cavity 5 uses 30KW DC sputtering power, forms pure alloy-layer in transition layer surface, the alloy layer thickness
It is 0.1-0.2 μm；Discharging cavity 6, which is crossed, vacuumizes isolation atmosphere and alloy layer plated film vacuum cavity 5, reaches purer sputtering
Gas component improves binding force and its uniformity.Workpiece is 480s, total thicknesses of layers by the design pitch time of all cavitys
It is 0.3-0.6 μm.
Wherein feed the course of work of vacuum cavity 1 are as follows: step 1 is to be evacuated down to 5.0E-3Pa；Step 2 is to fill band mistake
The atmosphere 150s of filter；
The course of work of aura modified vacuum cavity 2 are as follows: step 1 is to restore vacuum, air pressure 2.0E-3Pa, when process
Between be 30s；Step 2 is aura preparation, and being filled with gas ratio is Ar:O2=1:3, pressure are 3~5Pa, process time 15s；
Step 3 is modified for aura, and being filled with gas ratio is Ar:O2=1:3, pressure are 3~5Pa, 15s, auxiliary voltage 2500V/
50%, process time 300s；Step 4 is ending protection, and being filled with gas ratio is Ar:O2=1:3, pressure are 3~5Pa, mistake
The journey time is 10s；
3 course of work of hard Cr coating bottoming vacuum cavity are as follows: step 1 is to restore vacuum, air pressure 2.0E-3Pa, mistake
The journey time is 30s；Step 2 is pre-aeration, adjusts Ar pressure to 3.5E-1~5.5E-1Pa, process time 15s；Step 3
To carry out Cr bottoming (thicknesses of layers >=100nm), Ar pressure is 3.5E-1~5.5E-1Pa, power 40KW, and frequency is
40KHz, process time 330s；Step 4 is ending protection, and Ar pressure is 3.5E-1~5.5E-1Pa；
Cr is to 4 course of work of alloy layer plated film vacuum cavity are as follows: step 1 restores vacuum, air pressure 2.0E-3Pa, mistake
The journey time is 30s；Step 2 is pre-aeration, adjusts Ar pressure to 3.5E-1~5.5E-1Pa, process time 15s；Step 3
For alloy plating transition zone (thicknesses of layers >=100nm), Ar pressure is 3.5E-1~5.5E-1Pa, Cr: being first decremented to 40Kw
10Kw plates alloy: power is incremented to 30Kw, process time 330s by 10Kw；Step 4 is ending protection, and Ar pressure is
3.5E-1~5.5E-1Pa；
5 course of work of alloy layer plated film vacuum cavity is that step 1 restores vacuum, air pressure 2.0E-3Pa, process time
For 30s；Step 2 is pre-aeration, adjusts Ar pressure to 3.5E-1~5.5E-1Pa, process time 15s；Step 3 is that plating is closed
The pure layer (thicknesses of layers >=100nm) of gold, Ar pressure are 3.5E-1~5.5E-1Pa, power 30Kw, process time 330s；
Step 4 is ending protection, and Ar pressure is 3.5E-1~5.5E-1Pa；
Discharging 6 course of work of cavity is that step 1 fills the atmosphere by filtering, process time 180s；Step 2 is taken out true
Sky, air pressure 5.0E-3Pa.
Vacuum coating system is directly electroplated with pivoted frame transmission system (24) in the semidry method processing plastic cement, and the pivoted frame passes
Dynamic system (24) have pivoted frame drive bearing, and the pivoted frame drive bearing uses magnet fluid sealing, so that leak rate is lower than 10E-8Pa
Rank.
Vacuum coating system, which is directly electroplated, in the semidry method processing plastic cement also has travel switch, advances for detecting workpiece
Position.
Directly vacuum coating system is electroplated also in the semidry method processing plastic cement, and there is high vacuum rectangle to transmit gate valve, energy
Shorten the gap between pivoted frame while guaranteeing that leak rate is stablized.
The preferred embodiment of the present invention has shown and described in above description, as previously described, it should be understood that the present invention is not office
Be limited to form disclosed herein, should not be regarded as an exclusion of other examples, and can be used for various other combinations, modification and
Environment, and can be changed within that scope of the inventive concept describe herein by the above teachings or related fields of technology or knowledge
It is dynamic.And changes and modifications made by those skilled in the art do not depart from the spirit and scope of the present invention, then it all should be appended by the present invention
In scope of protection of the claims.
Claims (12)
1. vacuum coating system, including charging vacuum cavity (1), aura modified vacuum is directly electroplated in a kind of semidry method processing plastic cement
Cavity (2), hard Cr coating bottoming vacuum cavity (3), for Cr to alloy layer plated film vacuum cavity (4), alloy layer plated film is true
Cavity body (5) and discharging cavity (6)；
It is characterized in that, by by the continuous connection vacuum cavity (1), aura modified vacuum cavity (2), hard Cr coating bottoming
Vacuum cavity (3), Cr to alloy layer plated film vacuum cavity (4), alloy layer plated film vacuum cavity (5) and discharging cavity (6)
It forms semidry method processing plastic cement and vacuum coating system is directly electroplated.
2. vacuum coating system is directly electroplated in semidry method according to claim 1 processing plastic cement, which is characterized in that it is described into
Material vacuum cavity (1) reaches purer glow gases group by vacuumizing isolation atmosphere and aura modified vacuum cavity (2)
Point, improve binding force and its uniformity；
The aura modified vacuum cavity (2), by oxygen build-up of luminance, realizes plastic cement by 2500V/50% high-frequency ac aura power supply
Part surface is modified；
The hard Cr coating bottoming vacuum cavity (3) uses 60KW, 40KHz mid frequency sputtering power supply, beats in substrate surface formation
Bottom Cr layers makes the Cr tunic thickness be 0.1-0.2 μm；
30KW DC sputtering power is used in the Cr to alloy layer plated film vacuum cavity (4), is formed in Cr layer surface
Layer is crossed, the film thickness of the transition zone is 0.1-0.2 μm；
The alloy layer plated film vacuum cavity (5) uses 30KW DC sputtering power, forms pure alloy in transition layer surface
Layer, the alloy layer thickness are 0.1-0.2 μm；
The discharging cavity (6), which is crossed, vacuumizes isolation atmosphere and the alloy layer plated film vacuum cavity (5), reaches purer
Sputter gas component improves binding force and its uniformity.
3. vacuum coating system is directly electroplated in semidry method according to claim 1 processing plastic cement, which is characterized in that it is described into
Expect the course of work of vacuum cavity (1) are as follows: step 1 is to be evacuated down to 5.0E-3Pa；Step 2 is to fill the atmosphere with filtering
150s。
4. vacuum coating system is directly electroplated in semidry method processing plastic cement according to claim 1, which is characterized in that the brightness
The course of work of light modified vacuum cavity (2) are as follows: step 1 is to restore vacuum, air pressure 2.0E-3Pa, process time 30s；
Step 2 is aura preparation, and being filled with gas ratio is Ar:O2=1:3, pressure are 3~5Pa, process time 15s；Step 3 is
Aura is modified, and being filled with gas ratio is Ar:O2=1:3, pressure is 3~5Pa, 15s, auxiliary voltage 2500V/50%, when process
Between be 300s；Step 4 is ending protection, and being filled with gas ratio is Ar:O2=1:3, pressure are 3~5Pa, and process time is
10s。
5. vacuum coating system is directly electroplated in semidry method processing plastic cement according to claim 1, which is characterized in that described hard
Matter Cr coating bottoming vacuum cavity (3) course of work are as follows: step 1 is to restore vacuum, air pressure 2.0E-3Pa, and process time is
30s；Step 2 is pre-aeration, adjusts Ar pressure to 3.5E-1~5.5E-1Pa, process time 15s；Step 3 is to carry out Cr
Bottoming, thicknesses of layers >=100nm, Ar pressure are 3.5E-1~5.5E-1Pa, power 40KW, frequency 40KHz, process time
For 330s；Step 4 is ending protection, and Ar pressure is 3.5E-1~5.5E-1Pa.
6. vacuum coating system is directly electroplated in semidry method processing plastic cement according to claim 1, which is characterized in that the Cr
To alloy layer plated film vacuum cavity (4) course of work are as follows: step 1 restores vacuum, air pressure 2.0E-3Pa, and process time is
30s；Step 2 is pre-aeration, adjusts Ar pressure to 3.5E-1~5.5E-1Pa, process time 15s；Step 3 is alloy plating
Transition zone, thicknesses of layers >=100nm, Ar pressure are 3.5E-1~5.5E-1Pa, Cr: 40Kw being decremented to 10Kw first, is plated
Alloy: power is incremented to 30Kw, process time 330s by 10Kw；Step 4 be ending protection, Ar pressure be 3.5E-1~
5.5E-1Pa。
7. vacuum coating system is directly electroplated in semidry method processing plastic cement according to claim 1, which is characterized in that the conjunction
5 course of work of gold plate plated film vacuum cavity is that step 1 restores vacuum, air pressure 2.0E-3Pa, process time 30s；Step
Two be pre-aeration, adjusts Ar pressure to 3.5E-1~5.5E-1Pa, process time 15s；Step 3 is the pure layer of alloy plating, film
Thickness degree >=100nm, Ar pressure are 3.5E-1~5.5E-1Pa, power 30Kw, process time 330s；Step 4 is ending
Protection, Ar pressure are 3.5E-1~5.5E-1Pa.
8. vacuum coating system is directly electroplated in semidry method processing plastic cement according to claim 1, which is characterized in that discharging chamber
Body (6) course of work is that step 1 fills the atmosphere by filtering, process time 180s；Step 2 vacuumizes, air pressure 5.0E-
3Pa。
9. vacuum coating system is directly electroplated in semidry method processing plastic cement according to claim 1, which is characterized in that described half
Vacuum coating system is directly electroplated with pivoted frame transmission system (24) in dry process plastic cement, and the pivoted frame transmission system (24) has
Pivoted frame drive bearing, the pivoted frame drive bearing use magnet fluid sealing, so that leak rate is lower than 10E-8Pa rank.
10. vacuum coating system is directly electroplated in semidry method processing plastic cement according to claim 1, which is characterized in that described
Vacuum coating system, which is directly electroplated, in semidry method processing plastic cement also has travel switch, for detecting workpiece advanced positions.
11. vacuum coating system is directly electroplated in semidry method processing plastic cement according to claim 1, it is characterised in that described half
Directly vacuum coating system is electroplated also in dry process plastic cement, and there is high vacuum rectangle to transmit gate valve, can stablize guaranteeing leak rate
While shorten pivoted frame between gap.
12. vacuum coating system is directly electroplated in semidry method processing plastic cement according to claim 1, it is characterised in that workpiece warp
The design pitch time for crossing all cavitys is 480s, and total thicknesses of layers is 0.3-0.6 μm.
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| CN201811272348.0A CN109402597A (en) | 2018-10-30 | 2018-10-30 | Vacuum coating system is directly electroplated in a kind of semidry method processing plastic cement |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110055501A (en) * | 2019-04-17 | 2019-07-26 | 厦门阿匹斯智能制造系统有限公司 | A kind of method of semidry method continuous type PVD plated film plastic metal temperature control |
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| US20120024695A1 (en) * | 2011-03-14 | 2012-02-02 | Primestar Solar, Inc. | Systems and methods for high-rate deposition of thin film layers on photovoltaic module substrates |
| CN107338420A (en) * | 2017-07-25 | 2017-11-10 | 北京实力源科技开发有限责任公司 | A kind of vacuum coating method and equipment |
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| CN110055501A (en) * | 2019-04-17 | 2019-07-26 | 厦门阿匹斯智能制造系统有限公司 | A kind of method of semidry method continuous type PVD plated film plastic metal temperature control |
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