CN105675262B - The high depth of parallelism wavefront of optical components detection device of heavy caliber - Google Patents
The high depth of parallelism wavefront of optical components detection device of heavy caliber Download PDFInfo
- Publication number
- CN105675262B CN105675262B CN201610024221.1A CN201610024221A CN105675262B CN 105675262 B CN105675262 B CN 105675262B CN 201610024221 A CN201610024221 A CN 201610024221A CN 105675262 B CN105675262 B CN 105675262B
- Authority
- CN
- China
- Prior art keywords
- heavy caliber
- wavefront
- mirror
- standard
- parallelism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
Abstract
A kind of high depth of parallelism wavefront of optical components detection device of heavy caliber, the device includes small-bore short-coherence light source flat interferometer host, beam-expanding system, standard mirror and computer, apparatus of the present invention can accurately detect the high depth of parallelism wavefront of optical components error of big mouth, general commercial heavy caliber phase-shifting interferometer via wavelength tuning is efficiently solved when detect high depth of parallelism optical element, the problem of self-interference striped of generation causes corrugated that can not unpack calculating due to rear surface reflection.
Description
Technical field
The invention belongs to field of optical measuring technologies, in particular to a kind of high depth of parallelism wavefront of optical components detection of heavy caliber
Device, the high depth of parallelism optical element wave of heavy caliber needed for being mainly used in the fields such as large laser fusion facility, military project, space flight
Preceding process inspection and final inspection.
Background technique
In recent years, with heavy-caliber optical system astronomicalc optics, space science research, ground Space Object Detection with
Extensive use in the high-tech areas such as identification, inertial confinement fusion, due to the particularity of optical elements of large caliber, people couple
The wavefront error required precision of optical elements of large caliber is higher and higher, while being also required for corresponding high-precision detection means
To judge whether its wavefront error meets the requirements.
Parallel flat belongs to one of Large aperture optical components, and the heavy caliber in high power laser system is such as applied to polarize
Piece is general after machine-shaping all to have the very high depth of parallelism (i.e. surface parallel error is less than 10 "), especially for work saturating
It penetrates and is finally also needed with the heavy caliber polarizing film under reflective-mode, requirement all with higher for the wavefront error on two sides
Surface coating.During being detected using general heavy caliber phase-shifting interferometer via wavelength tuning, due to the reflection of its rear surface generation
Light can introduce self-interference striped, can seriously affect the result of wavefront measurement.Heavy caliber polarizing film is really under Brewster's angle
It uses, also needs to carry out element gyration (not 0 deg is incident) during detection and place, which in turns increases detections
Difficulty.
In the case where vertical incidence (0 ° of incidence), sample to be tested can be processed into the angle of wedge or the rear table in detected element
Face applies vaseline, but it is not easy to clean and may will affect optical surface quality the case where (such as rear surface being also working face),
It can not be in this way for coated element.On commercial heavy caliber phase-shifting interferometer via wavelength tuning, ZYGO company is proposed
Multi-surface Fourier transformation phase shift test method (Deck.L, Fourier-transform phase-shifting
Interferometry [J], Applied Optic, 2003,42 (13): 2354-2365), the accurate of tested wavefront can be obtained
As a result.
In the case where actually using angle (not 0 deg is incident), after will appear using the detection of heavy caliber phase-shifting interferometer via wavelength tuning
Surface multiple reflections and the influence of self-interference striped generated, carry out the feelings that will appear loss of data after phase unwrapping calculates
Condition is caused the imperfect of corrugated data, and can not be detected using multi-surface Fourier transformation phase shifting method.Especially for plating
Optical element after film cannot apply vaseline in rear surface, and accurate test result is needed using short-coherence light source in order to obtain
Interferometer detects.
4D company commercial synchronous phase-shift fiso interferometer patented technology (James E.Millerd, James C.Wyant,
Simultaneousphase-shiftingFizeauinterferometer.U.S.Paten t, 7,230,718,2007) it proposes
The light source of a kind of short-coherence light source light path matching scheme, interferometer uses short-coherence light source, may be implemented to be greater than thickness
The detection of the parallel flat wavefront error of 0.3mm, but the testing beam diameter (Φ 100mm) that bore cannot be greater than interferometer is detected,
The detection of unified wavefront can not be carried out for optical elements of large caliber.
Summary of the invention
The purpose of the present invention is to solve the high depth of parallelism optical element waves of heavy caliber under 0 ° and not 0 deg condition of incidence
Preceding error testing problem, proposes a kind of high depth of parallelism wavefront of optical components detection device of heavy caliber, which can be to big mouth Gao Ping
Row degree wavefront of optical components error accurately detected, and the general commercial heavy caliber phase-shifting interferometer via wavelength tuning of effective solution is being examined
When surveying high depth of parallelism optical element, since the self-interference striped that rear surface reflects and generates causes corrugated that can not unpack calculating
Problem.
The purpose of the present invention is what is be achieved through the following technical solutions:
A kind of high depth of parallelism wavefront of optical components detection device of heavy caliber, it is characterized in that the device includes small-bore short phase
Dry source plane interferometer host, beam-expanding system, standard mirror and computer, the beam-expanding system include small-bore turn successively
Catadioptric mirror expands time microscope group, heavy caliber turnover reflecting mirror and collimation primary mirror, and the standard mirror includes standard diaphotoscope and mark
Quasi-reflection mirror, the light beam outbound course along interferometer host are successively the small-bore turnover reflecting mirrors, expand time microscope group, is big
Bore turnover reflecting mirror, collimation primary mirror, standard diaphotoscope, optical element to be checked and standard reflection mirror, the computer pass through
Data line is connected with the interferometer host, interference fringe described in the computer acquisition, using existing method to institute
The interference fringe stated carries out phase shift and unpacks to calculate, and obtains the wavefront information of optical element to be checked.
The small-bore polarization collimated light beam that interferometer host issues becomes heavy caliber polarization collimated light after beam-expanding system
Beam, the light beam are reflected back to form reference beam by standard diaphotoscope rear portion, and a part penetrates standard diaphotoscope quilt
Optical element surface to be checked reflects back to form test beams, or reflects back shape by standard reflection mirror by optical element to be checked
At test beams, reference beam and test beams form interference fringe, and described computer is acquired and divides to interference fringe
Analysis calculates, and obtains the wavefront information of optical element to be checked [8].Interference fringe is acquired by computer, using existing side
Method carries out phase shift and unpacks to calculate to interference fringe, obtains the wavefront information of optical element to be checked [8].
The advantages of the present invention over the prior art are that:
1, apparatus of the present invention are able to detect the wavefront error of heavy caliber high depth of parallelism optical element of the thickness greater than 0.3mm,
The self-interference striped that can be generated to avoid rear surface multiple reflections influences, and optical element to be checked does not need the reprocessing angle of wedge,
Shorten the period of optics cold working.
2, the beam-expanding system of apparatus of the present invention, by successively small-bore turnover reflecting mirror, expand time microscope group, heavy caliber is transferred
Reflecting mirror and collimation primary mirror are constituted, and keep whole device compact-sized, and optical path shortens, and reduces the occupied ground of equipment.
3, it is 0 ° and not 0 deg feelings that the high depth of parallelism optical element of heavy caliber, which may be implemented, in incidence angle in detection device of the invention
The detection of reflection, transmission wavefront under condition.
4, the validity test bore of the beam-expanding system is not limited to 600mm, can expand 800mm or other test mouths
Diameter.
5, apparatus of the present invention can be not only used for surface parallel error less than 10 " and do not need the height for being processed into certain angle of wedge
The detection of the final wavefront of depth of parallelism planar optical elements, and can be used for surface parallel error greater than 10 " other optical planes
The detection of element wavefront.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the high depth of parallelism wavefront of optical components detection device of heavy caliber of the present invention.
Fig. 2 is 0 ° of reflection wave-front detection method index path of the high depth of parallelism optical element of heavy caliber.
Fig. 3 is 0 ° of transmission wavefront detection method index path of the high depth of parallelism optical element of heavy caliber.
Fig. 4 is the high depth of parallelism optical element not 0 deg reflection wave-front detection method index path of heavy caliber.
Fig. 5 is the high depth of parallelism optical element not 0 deg transmission wavefront detection method index path of heavy caliber.
Specific embodiment
Present invention will be further explained below with reference to the attached drawings and examples.
Fig. 1 is the structural schematic diagram of the high depth of parallelism wavefront of optical components detection device of heavy caliber of the present invention, as seen from the figure, this
The high depth of parallelism wavefront of optical components detection device of invention heavy caliber, the device include small-bore short-coherence light source flat interferometer master
Machine 2, beam-expanding system, standard mirror and computer 1, the beam-expanding system by successively small-bore turnover reflecting mirror 3, expand secondary mirror
Group 4, heavy caliber turnover reflecting mirror 5 and collimation primary mirror 6 are constituted, and the standard mirror includes standard diaphotoscope 7 and standard reflection mirror
9, the light beam outbound course along interferometer host 2 is successively the small-bore turnover reflecting mirror 3, expands time microscope group 4, heavy caliber
Turnover reflecting mirror 5, collimation primary mirror 6, standard diaphotoscope 7, optical element to be checked 8 and standard reflection mirror 9, the computer 1 are logical
It crosses data line to be connected with the interferometer host 2, the computer 1 acquires the interference fringe, using existing method
The interference fringe is carried out phase shift and unpacked to calculate, obtains the wavefront information of optical element 8 to be checked.
The small-bore polarization collimated light beam of interferometer host is expanded heavy caliber divergent beams by the system, collimates primary mirror 6
Heavy caliber divergent beams are collimated into collimated light beam output again;Standard mirror includes standard diaphotoscope 7 and standard reflection mirror 9.Interference
The small-bore polarization collimated light beam that instrument host 2 issues becomes heavy caliber polarization collimated light beam, light beam warp after beam-expanding system
It crosses 7 rear portion of standard diaphotoscope to be reflected back to form reference beam, a part is through standard diaphotoscope 7 by optics member to be checked
8 surface reflection of part goes back to form test beams, or is reflected back to form test by standard reflection mirror 9 by optical element 8 to be checked
Light beam, reference beam and test beams form interference fringe, are acquired by computer 1 to interference fringe, the calculating
Machine 1 is connected by data line with the interferometer host 2, and the computer 1 acquires the interference fringe, and use is existing
Method carries out phase shift and unpacks to calculate to the interference fringe, obtains the wavefront information of optical element 8 to be checked.
The small-bore short-coherence light source flat interferometer host that the present embodiment uses is that the commercialization of 4D company of U.S. production is dynamic
State Feisuo is total to optical path type interferometer, and validity test bore is Φ 100mm.Beam-expanding system expand multiple be 6 ×, standard diaphotoscope
7 and standard reflection mirror 9 validity test bore be Φ 600mm, wavefront processing quality require PV be better than 0.1 λ.
The detection method of the high depth of parallelism wavefront of optical components of heavy caliber is carried out using above-mentioned apparatus, comprising:
As shown in Fig. 2, making the heavy caliber collimated light beam being emitted by collimation primary mirror 6 in the case where 0 ° of reflection Wave-front measurement
By standard diaphotoscope 7 and the surface of element under test 8 is impinged perpendicularly on, being adjusted element under test 8 makes light beam along backtracking,
Using the light path matching technique of interferometer host 2 obtain interference fringe and adjust to interference fringe number it is minimum, pass through computer 1
Analytical calculation obtains the reflection wavefront information of element under test 8.
As shown in figure 3, making the heavy caliber collimated light beam being emitted by collimation primary mirror 6 in the case where 0 ° of transmission wavefront detects
Element under test 8 is penetrated by the beam orthogonal of standard diaphotoscope 7, the surface of standard reflection mirror 9 is incident on, it is anti-to be adjusted standard
Penetrating mirror 9 makes light beam along backtracking, obtains interference fringe using the light path matching technique of interferometer host 2 and adjusts to number most
It is few, the transmission wavefront information of element under test is obtained by 1 analytical calculation of computer.
As shown in figure 4, making the heavy caliber collimated light beam being emitted by collimation primary mirror 1 in the case where not 0 deg anti-Wave-front measurement
By standard diaphotoscope 7, the surface of element under test 8 is incident on according to the test angle of regulation, then anti-by the surface of element under test 8
It is mapped to 9 surface of standard reflection mirror, adjustment standard reflection mirror 9 is made light beam along backtracking, matched using the light path of interferometer host
Technology obtains interference fringe and adjusting is minimum to number, before the not 0 deg back wave that element under test is obtained by computer analytical calculation
Information.
As shown in figure 5, making the heavy caliber collimated light being emitted by collimation primary mirror 6 in the case where the detection of not 0 deg transmission wavefront
Beam penetrates element under test 8 according to the incident angle of regulation by the light beam of standard diaphotoscope 7, is again incident on standard reflection mirror 9
Surface, being adjusted standard reflection mirror 9 makes light beam along backtracking, is done using the light path matching technique of interferometer host 2
It relates to striped and adjusting is minimum to number, the not 0 deg transmission wavefront information of element under test is obtained by 1 analytical calculation of computer.
The high depth of parallelism wavefront of optical components of heavy caliber of the effective solution of the present invention under 0 ° and not 0 deg condition of incidence is missed
It the problem of difference detection, solves when detecting high depth of parallelism optical element, due to the self-interference item that rear surface reflects and generates
The problem of line causes corrugated that can not unpack calculating, it can be achieved that the high depth of parallelism wavefront of optical components error of heavy caliber accurate detection.
Claims (1)
1. a kind of high depth of parallelism wavefront of optical components detection device of heavy caliber, it is characterised in that the device includes small-bore short relevant
Source plane interferometer host (2), beam-expanding system, standard mirror and computer (1), the beam-expanding system include small-bore turnover
Reflecting mirror (3) expands time microscope group (4), heavy caliber turnover reflecting mirror (5) and collimation primary mirror (6), and the standard mirror includes standard
Diaphotoscope (7) and standard reflection mirror (9), the light beam outbound course along interferometer host (2) are successively the small-bore turnovers
Reflecting mirror (3) expands time microscope group (4), heavy caliber turnover reflecting mirror (5), collimation primary mirror (6), standard diaphotoscope (7), light to be checked
Element (8) and standard reflection mirror (9) are learned, the computer (1) is connected by data line with the interferometer host (2),
Computer (1) acquisition interference fringe, carries out phase shift and unpacking to the interference fringe using existing method
It calculates, obtains the wavefront information of optical element to be checked (8).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610024221.1A CN105675262B (en) | 2016-01-14 | 2016-01-14 | The high depth of parallelism wavefront of optical components detection device of heavy caliber |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610024221.1A CN105675262B (en) | 2016-01-14 | 2016-01-14 | The high depth of parallelism wavefront of optical components detection device of heavy caliber |
Publications (2)
Publication Number | Publication Date |
---|---|
CN105675262A CN105675262A (en) | 2016-06-15 |
CN105675262B true CN105675262B (en) | 2018-12-25 |
Family
ID=56300820
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610024221.1A Active CN105675262B (en) | 2016-01-14 | 2016-01-14 | The high depth of parallelism wavefront of optical components detection device of heavy caliber |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN105675262B (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107036554B (en) * | 2017-05-25 | 2019-05-17 | 中国科学院上海光学精密机械研究所 | The absolute surface shape detection apparatus of planar optical elements |
CN108931189A (en) * | 2018-10-09 | 2018-12-04 | 上海乾曜光学科技有限公司 | Double vision field interferometer |
CN110824680A (en) * | 2019-11-28 | 2020-02-21 | 合肥工业大学 | Beam expanding device of catadioptric interferometer |
CN111442909A (en) * | 2020-05-20 | 2020-07-24 | 北京理工大学 | Phase-shifting interference transmission wavefront measuring device and method for large-caliber workbench |
CN113281013B (en) * | 2021-05-25 | 2022-08-05 | 华中科技大学 | Device and method for measuring surface shape of optical element in vacuum environment |
CN115597483B (en) * | 2022-09-30 | 2024-02-06 | 南京理工大学 | Interferometer beam expansion collimation device |
CN115523863B (en) * | 2022-10-18 | 2024-03-22 | 南京理工大学 | Large-caliber phase-shifting interferometry surface shape measuring device |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1096873A (en) * | 1993-06-26 | 1994-12-28 | 南京理工大学 | High-precision large aperture phase-shifting digital planar interferometer |
CN1130758A (en) * | 1995-03-08 | 1996-09-11 | 中国科学院上海光学精密机械研究所 | L-Fizeau interferometer for detecting large laser amplifier |
CN1746648A (en) * | 2005-10-31 | 2006-03-15 | 中国科学院光电技术研究所 | A kind of deep aspherical mirror detection system with big bore |
CN101261183A (en) * | 2008-04-15 | 2008-09-10 | 中国科学院光电技术研究所 | Heavy caliber aspherical mirror checking system |
CN101561401A (en) * | 2009-05-23 | 2009-10-21 | 青岛大学 | Real-time observation method of crystal growing surface microstructure |
CN101907445A (en) * | 2010-04-23 | 2010-12-08 | 西安工业大学 | Full-field detection device of heavy-calibre monolayer film thickness |
CN102879109A (en) * | 2012-09-12 | 2013-01-16 | 中国科学院西安光学精密机械研究所 | Dynamic wave-front testing device |
CN202692937U (en) * | 2012-06-26 | 2013-01-23 | 东莞市兰光光学科技有限公司 | Large-caliber phase shifting interferometer |
CN104034257A (en) * | 2014-06-14 | 2014-09-10 | 中国科学院光电技术研究所 | Device and method for measuring synchronous phase shifting interference of Fizeau quasi-common optical path structure |
CN204758259U (en) * | 2015-04-20 | 2015-11-11 | 成都太科光电技术有限责任公司 | Testing arrangement is interfered to striking cable in horizontal dual -port plane |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2647913B1 (en) * | 1989-06-05 | 1991-09-13 | Essilor Int | NETWORK OPTICAL DEVICE AND SEPARATOR FOR THE PHASE DETECTION CONTROL OF ANY OPTICAL SYSTEM, IN PARTICULAR AN OPHTHALMIC LENS |
-
2016
- 2016-01-14 CN CN201610024221.1A patent/CN105675262B/en active Active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1096873A (en) * | 1993-06-26 | 1994-12-28 | 南京理工大学 | High-precision large aperture phase-shifting digital planar interferometer |
CN1130758A (en) * | 1995-03-08 | 1996-09-11 | 中国科学院上海光学精密机械研究所 | L-Fizeau interferometer for detecting large laser amplifier |
CN1746648A (en) * | 2005-10-31 | 2006-03-15 | 中国科学院光电技术研究所 | A kind of deep aspherical mirror detection system with big bore |
CN101261183A (en) * | 2008-04-15 | 2008-09-10 | 中国科学院光电技术研究所 | Heavy caliber aspherical mirror checking system |
CN101561401A (en) * | 2009-05-23 | 2009-10-21 | 青岛大学 | Real-time observation method of crystal growing surface microstructure |
CN101907445A (en) * | 2010-04-23 | 2010-12-08 | 西安工业大学 | Full-field detection device of heavy-calibre monolayer film thickness |
CN202692937U (en) * | 2012-06-26 | 2013-01-23 | 东莞市兰光光学科技有限公司 | Large-caliber phase shifting interferometer |
CN102879109A (en) * | 2012-09-12 | 2013-01-16 | 中国科学院西安光学精密机械研究所 | Dynamic wave-front testing device |
CN104034257A (en) * | 2014-06-14 | 2014-09-10 | 中国科学院光电技术研究所 | Device and method for measuring synchronous phase shifting interference of Fizeau quasi-common optical path structure |
CN204758259U (en) * | 2015-04-20 | 2015-11-11 | 成都太科光电技术有限责任公司 | Testing arrangement is interfered to striking cable in horizontal dual -port plane |
Also Published As
Publication number | Publication date |
---|---|
CN105675262A (en) | 2016-06-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN105675262B (en) | The high depth of parallelism wavefront of optical components detection device of heavy caliber | |
CN104296698A (en) | Method for measuring evenness of optical surface with ultrahigh precision | |
CN108195849A (en) | Position phase defect detecting system and method based on the safe graceful interferometer of short relevant dynamic | |
CN104949630B (en) | A kind of adjustable point-diffraction interference device of large-numerical aperture fringe contrast | |
CN101324421A (en) | Synchronous phase-shift fiso interferometer | |
CN110319769B (en) | Anti-vibration Fizeau interferometry device and method | |
CN104296678B (en) | Heterodyne interferometer based on phase shift of low-frequency-difference acousto-optic frequency shifter | |
CN104748835A (en) | Interference-mount separating type nonlinear error correcting method and device for laser interference vibration tester | |
CN104808254B (en) | High-precision absolute gravimeter optics frequency multiplier type laser interference system and application | |
CN204631269U (en) | High precision absolute gravimeter optics frequency multiplier type laser interference system and application | |
Buchenauer et al. | Quadrature interferometer for plasma density measurements | |
CN110186390A (en) | Compact transient state multi-wavelength phase shift interference device and its measurement method | |
CN110530531B (en) | Michelson interference-based fountain type atomic gravimeter light beam phase change measuring device and method | |
CN105784129A (en) | Low-frequency heterodyne ineterferometer used for laser wavefront detection | |
CN105674875B (en) | A kind of full filed low frequency heterodyne point-diffraction interferometer | |
EP3899420A1 (en) | Full-field heterodyne interferometer for inspecting an optical surface | |
CN104457559A (en) | Synchronous phase shift point diffraction interference detection method based on reflecting grating | |
CN102519357B (en) | Polarization phase-shift circular shear Jamin interferometer | |
US8279439B2 (en) | Birefringence measuring device and birefringence measuring method | |
CN107024173B (en) | Use the total optical path point diffraction simultaneous phase-shifting interference testing device of pinhole difiration plate | |
CN105928454B (en) | A kind of double optical fiber point-diffraction full filed low frequency heterodyne ineterferometers | |
CN112378346B (en) | Phase compensation method for polarization aberration of large-caliber polarization phase-shifting Fizeau interferometer | |
CN201434946Y (en) | Device for measuring fourfold of optical path of refractive index of transparent member | |
JPH11337321A (en) | Method and device for simultaneously measuring phase shift interference fringe | |
CN113340212A (en) | Appearance and thickness detection device based on two side interferometers |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |