CN105662898A - Mask and preparation method thereof - Google Patents
Mask and preparation method thereof Download PDFInfo
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- CN105662898A CN105662898A CN201610070389.6A CN201610070389A CN105662898A CN 105662898 A CN105662898 A CN 105662898A CN 201610070389 A CN201610070389 A CN 201610070389A CN 105662898 A CN105662898 A CN 105662898A
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/19—Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
- A61K8/28—Zirconium; Compounds thereof
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/02—Cosmetics or similar toiletry preparations characterised by special physical form
- A61K8/0212—Face masks
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/02—Cosmetics or similar toiletry preparations characterised by special physical form
- A61K8/0241—Containing particulates characterized by their shape and/or structure
- A61K8/027—Fibers; Fibrils
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/19—Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
- A61K8/36—Carboxylic acids; Salts or anhydrides thereof
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/73—Polysaccharides
- A61K8/736—Chitin; Chitosan; Derivatives thereof
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q17/00—Barrier preparations; Preparations brought into direct contact with the skin for affording protection against external influences, e.g. sunlight, X-rays or other harmful rays, corrosive materials, bacteria or insect stings
- A61Q17/005—Antimicrobial preparations
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q19/00—Preparations for care of the skin
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- Dermatology (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
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- Cosmetics (AREA)
Abstract
The invention provides a mask with an antibacterial function and a preparation method of the mask. The mask comprises a mask matrix and a mask liquid, wherein the mask liquid is stored in the mask matrix, and the mask liquid comprises an antibacterial agent. According to the provided mask, chitin fibers are added to the mask matrix, so that the mask has higher balanced moisture regain and higher water absorption; the mask better fits skin due to softness and skin adaptability, and more sufficient nutrient substances can be provided for skin. The antibacterial agent is innovatively added, the anti-inflammatory and antibacterial performance is increased on the basis that the moisture retention property and other properties of the mask are not affected, and the mask can also be used for inflammatory skin or sensitive skin.
Description
Technical field
The invention belongs to cosmetic field, it relates to a kind of facial mask and its preparation method, particularly relate to a kind of facial mask and its preparation method with antibacterial.
Background technology
In cosmetics, facial mask belongs to the one occurred the earliest, facial mask is exactly the of short duration time utilizing and covering face, the air in the temporarily isolation external world and pollution, it is to increase skin temperature, the pore expansion of skin, promote sweat gland secretion and metabolism, make the oxygen level of skin increase, be conducive to skin to get rid of the oil substances of the metabolic product of epidermic cell and accumulation, moisture in facial mask infiltrates the stratum corneum of skin epidermis, and skin becomes soft.
At present, facial mask on the market has a variety of, and by quality classification, facial mask is broadly divided into pureed facial mask, film shape facial mask and skin care products facial mask 3 class. Pureed facial mask taking kaolin, green potter's clay as main component, has the function of absorb oil mostly, it may also be useful to after can feel that skin is relatively salubrious, pureed facial mask also usually can add some plant enzymes such as pawpaw, pineapple, accelerates metabolism aging cutin and acne etc. Film shape facial mask majority uses some paper class, tNonwovens, biological fibers etc. to be base material, various essence is discharged to skin, utilizing the characteristic that " film " is airtight, be incubated, accelerate the ability of skin absorption skin care products, common various moisture saver mask, cleawhite pack all belong to film shape facial mask. Skin care products facial mask this kind of facial mask is like general skin care products, what have is gel, what have presents emulsion form or breast frost shape, require directly very thin to smear one layer on face, there are moisturizing, nourishing, conditioning functions, directly clean after using or with facial tissue wiping, some product is also indicated and need not be cleaned, and the facial mask of this class belongs to daily maintenance character mostly.
It is broadly divided into cleaning pack, moisture saver mask, Firm facial mask and cleawhite pack etc. by effect. Moisture saver mask take moisturizing as major objective, usually occurs with film shape, generally can contain the moisturizing compositions such as Hyaluronic Acid, propylene glycol, glycerine, Amino acid, collagen protein, vitamin B5 and lipid in essence. Cleawhite pack is the star's product in market, also it is in the majority with film shape form, how containing whitening compositions such as tartaric acid, vitamins C, black bearberry element, Placenta extract, mulberry fruit extraction liquid, Qu acid in essence, utilize sealing, the tepor character of facial mask, allow skin accelerate to absorb whitening composition, reach the effect desalinating melanochrome, spot fast.
Although facial mask kind on the market is a lot, but general facial mask frequently uses, skin will be made to become responsive, red blood streak or red and swollen phenomenon occur, when there is inflammation in skin or the crowd of supersensitivity skin quality the requirement of facial mask is just higher, common facial mask just can not meet the requirement of these special populations, otherwise, this just fragile skin can be made more serious, also do not see the facial mask for this kind of crowd at present on the market.
Summary of the invention
The present invention is directed to the defect that prior art exists, it is proposed to a kind of facial mask and its preparation method with anti-microbial effect.
The first aspect of the invention is to provide a kind of facial mask with anti-microbial effect, and described facial mask comprises face mask substrate material and facial mask liquid, and described facial mask liquid is stored in described face mask substrate material, and described facial mask liquid comprises antiseptic-germicide.
As a preferred embodiment of the present invention, described antiseptic-germicide comprises silver ion antimicrobial agent and disinfecting, antimicrobial agent, described antiseptic-germicide is any one or a few combination in inorganic antiseptic and organic antibacterial agent, it is preferable to any one or a few combination in inorganic antiseptic.
As a preferred embodiment of the present invention, described disinfecting, antimicrobial agent is any one or a few combination in quaternary ammonium salt-15, Timbercote 2000, chlorhexidine, wallantoin, Virahol, glutaraldehyde, poly-sub-first hydrochloric acid, benzalkonium chloride, Sodium.alpha.-hydroxypropionate, chlorhexidine acetate, Hydagen B.
As a preferred embodiment of the present invention, described silver ion antimicrobial agent is any one or a few combination in zinc oxide, cupric oxide, primary ammonium phosphate, Quilonum Retard and silver ions and compound thereof.
As a preferred embodiment of the present invention, in described silver ion antimicrobial agent, the content of silver ions is the 0.1-5% of facial mask liquid weight, such as 0.2%, 0.4%, it is preferable to 0.3-3%, such as 0.4%, 2.5%, it is more preferable to be 0.5-1.5%, such as 1%.
As a preferred embodiment of the present invention, the source of described silver ions comprises any one or a few combination in silver-loaded zirconium phosphate, Silver Nitrate, silver simple substance, silver suboxide etc.
As a preferred embodiment of the present invention, described facial mask liquid can also comprise wetting Agent for Printing Inks, anti-quick dose, any one or a few combination in sanitas and pH poiser.
As a preferred embodiment of the present invention, described wetting Agent for Printing Inks is one or more in hyaluronic acid, glycerine, trimethyl-glycine, butyleneglycol, polyglutamic acid sodium, polyoxyethylene glycol (PEG-400), chitin, pyrrolidone sodium carboxylate, sorbyl alcohol, hydroxyethyl urea, Natrulon H-10 and Pfansteihl.
As a preferred embodiment of the present invention, described anti-quick dose is one or more in Radix Glycyrrhizae diacid potassium, ascorbic acid glucoside and peoniflorin.
As a preferred embodiment of the present invention, described sanitas is the combination of one or more in pine, Sodium Benzoate, benzethonium chloride, Sorbic Acid and salt thereof together of 9.69% methylisothiazolinone, methyl hydroxybenzoate, iodo propinyl ammonia butyl formate, 2-bromo-2-nitro-1.3-propylene glycol (Xi Luoboer), two Imidurea, Phenoxyethanol, Sorbic Acid and potassium sorbate, methylisothiazolinone, Tegosept M, Phenoxyethanol, bronopol, Benzene Chloride.
As a preferred embodiment of the present invention, pH poiser is one or more combinations in citric acid, EDETATE SODIUM, trolamine, lactic acid.
As a preferred embodiment of the present invention, the pH value=5.5-6.5 of described facial mask liquid.
As a preferred embodiment of the present invention, described facial mask liquid can also comprise heat sensitizer, described heat sensitizer be in VANILLYL ALCOHOL MIN 98 butyl ether, Rizinsan K2 A2 any one or its combination.
As a preferred embodiment of the present invention, described facial mask liquid by weight percentage: wetting Agent for Printing Inks 1-10%, silver ion antimicrobial agent 0.1-0.5ppm (counting taking silver), disinfecting, antimicrobial agent 0-3%, sanitas 0-0.3%, anti-quick dose of 0.05-0.1%, pH poiser 0-0.1%, surplus are as water.
As a preferred embodiment of the present invention, described face mask substrate material comprises the first layer of fibers, the 2nd layer of fibers and non-woven fabric layer, and described first layer of fibers, the 2nd layer of fibers are bonded to described non-woven fabric layer.
As a preferred embodiment of the present invention, the bonding between described first layer of fibers, the 2nd layer of fibers and described non-woven fabric layer utilizes the combination of any one or a few mode being selected from subordinate: binder layer, fusible films, heating and ultrasonic wave.
As a preferred embodiment of the present invention, at least described first layer of fibers, the 2nd layer of fibers comprise described antiseptic-germicide.
As a preferred embodiment of the present invention, the material of described first layer of fibers, the 2nd layer of fibers is any one or a few combination in copper ammonia fibre, biological fiber, pulp fiber and alginate fiber.
As a preferred embodiment of the present invention, the material of described non-woven fabric layer is any one or a few combination in paper, spunlace non-woven cloth and silk fabric.
As a preferred embodiment of the present invention, described non-woven fabric layer is vesicular structure, to increase the storage capacity of facial mask liquid.
The second aspect of the invention is to provide the preparation method of a kind of facial mask with anti-microbial effect, and described preparation method comprises the steps:
Step 1, in spinning solution, add silver-loaded zirconium phosphate, stir evenly, prepare the spinning solution comprising silver-loaded zirconium phosphate;
Step 2, the spinning solution comprising silver-loaded zirconium phosphate prepared in step 1 is prepared fiber yarn;
Step 3, described fiber yarn step 2 prepared adopt wet laid random web to reinforce into cloth, prepare layer of fibers;
Step 4, layer of fibers step 3 prepared and non-woven fabric layer bonding, prepare face mask substrate material;
Step 5, the described face mask substrate material of preparation is immersed in facial mask liquid, prepare described facial mask.
The third aspect of the invention is the preparation method of the facial mask providing another to have anti-microbial effect, and described preparation method comprises the steps:
Step 1, chitin and/or chitosan and Silver Nitrate are uniformly mixed after, stir with fiber filament, blending, prepare layer of fibers;
Step 2, layer of fibers step 1 prepared and non-woven fabric layer bonding, prepare face mask substrate material;
Step 3, the described face mask substrate material of preparation is immersed in facial mask liquid, prepare described facial mask.
As a preferred embodiment of the present invention, after chitin and/or chitosan and Silver Nitrate are uniformly mixed by step 1, be prepared into short fibre, with stir with fiber filament, blending, prepare layer of fibers.
The fourth aspect of the invention is the preparation method of the facial mask providing another to have anti-microbial effect, and described preparation method comprises the steps:
Step 1, Silver Nitrate is mixed with Trisodium Citrate, prepare micro-nano silver citrate mixture;
In step 2, silver citrate mixture fiber yarn is added step 1 preparing, fully it is uniformly mixed, obtains adsorbing the fiber yarn of silver citrate particle;
Layer of fibers is prepared in the fiber yarn processing of step 3, absorption silver citrate particle step 2 prepared;
Step 4, layer of fibers step 3 prepared and non-woven fabric layer bonding, prepare face mask substrate material;
Step 5, the described face mask substrate material of preparation is immersed in facial mask liquid, prepare described facial mask.
As a preferred embodiment of the present invention, in step 1, Silver Nitrate at room temperature adds in sodium citrate aqueous solution, obtains micro-nano silver citrate solution.
As a preferred embodiment of the present invention, in step 1, Trisodium Citrate adds in silver nitrate solution under water bath condition, prepares micro-nano silver citrate colloid.
The fifth aspect of the invention is the preparation method of the facial mask providing another to have anti-microbial effect, and described preparation method comprises the steps:
Step 1, silver carrier is added in facial mask base liquid, obtain facial mask liquid;
Step 2, face mask substrate material is immersed facial mask liquid prepared by step 1, obtain described facial mask.
As a preferred embodiment of the present invention, described silver carrier can be silver simple substance, silver chloride, silver lactate and with EDTA-bis-sodium generate complex compound in any one or a few combine.
As a preferred embodiment of the present invention, after the simple substance electrolysis of described silver is silver ions, added in facial mask base liquid.
As a preferred embodiment of the present invention, described in electrolysis, the voltage of silver simple substance is 5-24V.
As a preferred embodiment of the present invention, also comprise the facial mask liquid using and obtaining in silver electrode electrolysis step 1.
Facial mask provided by the invention, adds chitin fiber in mask matrix, thus have higher equilibrium regain, and water-absorbent is stronger, because its soft skin-friendly also makes facial mask more fit skin, it is possible to for skin provides more sufficient nutrient material. The present invention also creatively adds antiseptic-germicide, increases the performance of antiphlogistic antibacterial, have inflammation skin or susceptibility skin to use on the basis not affecting other performances such as facial mask moisture retention.
Accompanying drawing explanation
Fig. 1 is facial mask provided by the invention;
Embodiment
Facial mask
As shown in Figure 1, for facial mask provided by the invention, this facial mask comprises 3 layers, it is respectively the first layer of fibers 1, the 2nd layer of fibers 3 and non-woven fabric layer 2, non-woven fabric layer 2 is between the first layer of fibers 1 and the 2nd layer of fibers 3, non-woven tackiness agent is evenly scribbled, to fix these three layers between this three aspects rete.
All containing facial mask liquid in first layer of fibers 1, the 2nd layer of fibers 3 and non-woven fabric layer 2, all containing silver ions in the first layer of fibers 1, the 2nd layer of fibers 3, non-woven fabric layer 2 can contain silver ions, it is also possible to not containing silver ions.
The material of the first layer of fibers 1, the 2nd layer of fibers 3 is any one in copper ammonia fibre, biological fiber, pulp fiber and alginate fiber, it is also possible to be the mixing between two or more in this several fiber.
In facial mask liquid, the content of each material is wetting Agent for Printing Inks 1-10%, silver ion antimicrobial agent 0.1-0.5ppm (counting taking silver), disinfecting, antimicrobial agent 0-3%, sanitas 0-0.3%, resists quick dose of 0.05-0.1%, pH poiser 0-0.1%, surplus as water.
The preparation of facial mask
Embodiment one
In mass ratio, 2.5% pyrrolidone sodium carboxylate, 2% polyglutamic acid sodium, 2% butyleneglycol, 0.1% Radix Glycyrrhizae diacid potassium add in deionized water, after abundant stirring and dissolving, are heated to 75-80 DEG C, stir sterilization 30min with the rotating speed of 150-200rpm in homogenizer. Treating that in homogenizer, solution is cooled to 45-50 DEG C, adding mass concentration in solution is that 2% hyaluronic acid, the 0.1% pair of Imidurea are even, stirs with 150rpm and is cooled to room temperature, prepares facial mask liquid for subsequent use.
In spinning solution, add equivalent silver-loaded zirconium phosphate, make concentration of silver ions in spinning solution be 0.2ppm, stir evenly, obtain comprising the spinning solution of silver-loaded zirconium phosphate, the spinning solution comprising silver-loaded zirconium phosphate obtained is prepared fiber yarn, and adopts wet laid random web to reinforce into cloth, prepare layer of fibers. At 2 even coated non-woven cloth tackiness agents of fiber layer surface, tackiness agent is made to soak into whole layer of fibers by saturated pickling process or foam dip method, get the non-woven fabric layer of even coated non-woven cloth tackiness agent, non-woven fabric layer is between 2 layer of fibers, by involutory for difference face mask layer, heat treated, different face mask layer and tackiness agent form one to reinforce, and prepare face mask substrate material.
After facial mask liquid storage and aging 24h, being immersed in facial mask liquid by face mask substrate material, after fully absorbing, encapsulation, prepares facial mask.
Embodiment two
In mass ratio, 2.5% pyrrolidone sodium carboxylate, 2% polyglutamic acid sodium, 2% butyleneglycol, 0.1% Radix Glycyrrhizae diacid potassium add in deionized water, after abundant stirring and dissolving, are heated to 75-80 DEG C, stir sterilization 30min with the rotating speed of 150-200rpm in homogenizer. Treating that in homogenizer, solution is cooled to 45-50 DEG C, adding mass concentration in solution is that 2% hyaluronic acid, the 0.1% pair of Imidurea are even, stirs with 150rpm and is cooled to room temperature, prepares facial mask liquid for subsequent use.
After chitin and/or chitosan and Silver Nitrate are uniformly mixed, stir with fiber filament, blending, prepare layer of fibers; The layer of fibers of preparation and non-woven fabric layer bonding, prepare face mask substrate material. At 2 even coated non-woven cloth tackiness agents of fibrous face film surface, tackiness agent is made to soak into whole layer of fibers by saturated pickling process or foam dip method, get the non-woven fabric layer of even coated non-woven cloth tackiness agent, non-woven fabric layer is between 2 layer of fibers, by involutory for difference face mask layer, heat treated, different face mask layer and tackiness agent form one to reinforce, and prepare face mask substrate material.
After facial mask liquid storage and aging 24h, being immersed in facial mask liquid by face mask substrate material, after fully absorbing, encapsulation, prepares facial mask.
Embodiment three
In mass ratio, 2.5% pyrrolidone sodium carboxylate, 2% polyglutamic acid sodium, 2% butyleneglycol, 0.1% Radix Glycyrrhizae diacid potassium add in deionized water, after abundant stirring and dissolving, are heated to 75-80 DEG C, stir sterilization 30min with the rotating speed of 150-200rpm in homogenizer. Treating that in homogenizer, solution is cooled to 45-50 DEG C, adding mass concentration in solution is that 2% hyaluronic acid, the 0.1% pair of Imidurea are even, stirs with 150rpm and is cooled to room temperature, prepares facial mask liquid for subsequent use.
The amount of trying to please is the monopolar electrolyzer one of 500L, fixing water condition constant C1For 0.02475mg/ (min A), compound concentration is the citric acid solution 500L of 0.0712g/L, and electrode is the silver electrode of purity more than 99.9%, and electric current is 8A, and long 500min during electrolysis, prepares silver citrate solution.
By the silver citrate solution silver citrate solution in mass ratio of preparation: facial mask liquid=100:1, is added dropwise in the facial mask liquid of preparation, stirring evenly, now in facial mask liquid, concentration of silver ions is 0.198ppm; After facial mask liquid storage and aging 24h, face mask substrate material is immersed in facial mask liquid, encapsulation after fully absorbing.
Embodiment four
In mass ratio, 2.5% pyrrolidone sodium carboxylate, 2% polyglutamic acid sodium, 2% butyleneglycol, 0.1% Radix Glycyrrhizae diacid potassium add in deionized water, after abundant stirring and dissolving, are heated to 75-80 DEG C, stir sterilization 30min with the rotating speed of 150-200rpm in homogenizer. Treat that in homogenizer, solution is cooled to 45-50 DEG C, add in solution mass concentration be 2% hyaluronic acid, the 0.1% pair of Imidurea evenly, 0.1% citric acid, stirs with 150rpm and is cooled to room temperature, prepare facial mask liquid for subsequent use.
The amount of trying to please is the bipolar electrolyzer one of 500L, fixing water condition constant C1For 25mg/ (min A), electrode is the silver electrode of purity more than 99.9%, and electric current is 80mA, long 50min during electrolysis, prepares the facial mask liquid that silver ion concentration is 0.2ppm. After facial mask liquid storage and aging 24h, face mask substrate material is immersed in facial mask liquid, encapsulation after fully absorbing.
The moisture retention of facial mask
Experimental technique: bend side mark 3 3cm at the left front arm of candidate side in the wrong, right front arm respectively2The square area of size, taking the square area of left arm that marks as experimental group, taking the square area of right arm that marks as control group.Experimental group and control group clean totally respectively, for subsequent use.
Experimental group uses facial mask provided by the invention to apply 10-15min, and control group is left intact.
Test uses moisture of skin tester to measure the moisture content of each group of different time after terminating, and repeats 5 times respectively, draws mean value, be calculated as follows hydration rate:
Hydration rate=(experimental group moisture content-control group moisture content)/control group moisture content X100%
Result is as shown in table 1.
Table 1, facial mask provided by the invention use the hydration rate of rear skin
As shown in Table 1, after using facial mask provided by the invention, hydration rate in skin significantly improves, and along with time lengthening, hydration rate reduces gradually, but after 4h, hydration rate tends towards stability gradually, and the change of hydration rate is not obvious, it may also be useful to after 8h, hydration rate still remains on more than 40%, illustrates that facial mask provided by the invention has the humidity-holding effect of long period.
The bactericidal properties of facial mask
In order to investigate the bactericidal property of facial mask provided by the invention, sterilization mensuration has been carried out respectively for streptococcus aureus and intestinal bacteria, setting experimental group and control group, experimental group is respectively the facial mask prepared according to the preparation method described in embodiment one-four, the square being cut into 1.0cm 1.0cm, control group is the commercially available facial mask of not silver ion, is cut into the square of 1.0cm 1.0cm, packing respectively, for subsequent use.
The bactericidal properties one of facial mask
Prepare bacteria suspension: the nutrient agar inclined-plane fresh culture thing (18 24h) in streptococcus aureus (ATCC6538) bacterial strain 3rd～14 generation, wash lower bacterium tongue with 5mL0.03mol/L phosphate buffered saline buffer (hereinafter referred to as PBS), bacterium is suspended after evenly and is diluted to desired concn with above-mentioned PBS.
Experimental group and control group are put into respectively the Erlenmeyer flask of 250mL, adds 70mL phosphate buffered saline(PBS) (PBS) and 5mL bacteria suspension respectively, make the concentration of bacteria suspension in PBS for (1～9) 104cfu/mL。
Experimental group Erlenmeyer flask is fixed on vibration shaking table, with the rotating speed jolting 1h of 300r/min. Get the sample liquid after 0.5mL jolting, or the sample liquid after using PBS to do suitably dilution, inoculate plate with agar tilt-pour process, carry out enumeration.
Control group Erlenmeyer flask is fixed on vibration shaking table, with the rotating speed jolting 1h of 300r/min. Respectively after jolting 0h, 1h, the mixed solution getting 0.5mL bacteria suspension and PBS is cooked suitable dilution, then carries out enumeration.
Test repeats 3 times, is calculated as follows bacteriostasis rate:
Bacteriostasis rate=(control group colony number-experimental group colony number)/control group colony number 100%, result is as shown in table 2.
Table 2, facial mask provided by the invention are to streptococcus aureus bactericidal property
| Facial mask preparation method | Embodiment one | Embodiment two | Embodiment three | Embodiment four |
| Bacteriostasis rate (%) | 96 | 95 | 97 | 96 |
As shown in Table 2, facial mask provided by the invention is to the bacteriostasis rate of streptococcus aureus all more than 95%, and stable performance, illustrates that streptococcus aureus is had good bacteriostasis property by facial mask provided by the invention.
The bactericidal properties two of facial mask
Prepare bacteria suspension: the nutrient agar inclined-plane fresh culture thing (18 24h) in intestinal bacteria (8099 or ATCC25922) bacterial strain the 3 14 generation, wash lower bacterium tongue with 5mL0.03mol/L phosphate buffered saline buffer (hereinafter referred to as PBS), bacterium is suspended after evenly and is diluted to desired concn with above-mentioned PBS.
Experimental group and control group are put into respectively the Erlenmeyer flask of 250mL, adds 70mL phosphate buffered saline(PBS) (PBS) and 5mL bacteria suspension respectively, make the concentration of bacteria suspension in PBS for (1～9) 104cfu/mL。
Experimental group Erlenmeyer flask is fixed on vibration shaking table, with the rotating speed jolting 1h of 300r/min.Get the sample liquid after 0.5mL jolting, or the sample liquid after using PBS to do suitably dilution, inoculate plate with agar tilt-pour process, carry out enumeration.
Control group Erlenmeyer flask is fixed on vibration shaking table, with the rotating speed jolting 1h of 300r/min. Respectively after jolting 0h, 1h, the mixed solution getting 0.5mL bacteria suspension and PBS is cooked suitable dilution, then carries out enumeration.
Test repeats 3 times, is calculated as follows bacteriostasis rate:
Bacteriostasis rate=(control group colony number-experimental group colony number)/control group colony number 100%, result is as shown in table 3.
Table 3, facial mask provided by the invention are to the bactericidal property of intestinal bacteria
| Facial mask preparation method | Embodiment one | Embodiment two | Embodiment three | Embodiment four |
| Bacteriostasis rate (%) | 98 | 97 | 98 | 99 |
As shown in Table 3, facial mask provided by the invention is to the bacteriostasis rate of intestinal bacteria all more than 97%, and stable performance, illustrates that intestinal bacteria are had good bacteriostasis property by facial mask provided by the invention.
Specific embodiments of the invention being described in detail above, but it is just as example, the present invention is not restricted to specific embodiment described above. To those skilled in the art, any equivalent modifications the present invention carried out and replacement are also all among the category of the present invention. Therefore, the impartial conversion done without departing from the spirit and scope of the invention and amendment, all should contain within the scope of the invention.
Claims (10)
1. one kind has the facial mask of anti-microbial effect, it is characterised in that, described facial mask comprises face mask substrate material and facial mask liquid, and described facial mask liquid is stored in described face mask substrate material, and described facial mask liquid comprises antiseptic-germicide.
2. facial mask according to claim 1, it is characterised in that, described antiseptic-germicide comprises silver ion antimicrobial agent and disinfecting, antimicrobial agent, and described antiseptic-germicide is any one or a few combination in inorganic antiseptic and organic antibacterial agent.
3. facial mask according to claim 1, it is characterised in that, the content of silver ions described in described silver ion antimicrobial agent is the 0.1-5% of facial mask liquid weight.
4. facial mask according to claim 1, it is characterised in that, the source of described silver ions comprises any one or a few combination in silver-loaded zirconium phosphate, Silver Nitrate, silver simple substance and silver suboxide.
5. facial mask according to claim 1, it is characterised in that, described facial mask liquid also comprise wetting Agent for Printing Inks, anti-quick dose, sanitas, any one or a few combination in heat sensitizer and pH poiser.
6. facial mask according to claim 1, it is characterised in that, described face mask substrate material comprises the first layer of fibers, the 2nd layer of fibers and non-woven fabric layer, and described first layer of fibers, the 2nd layer of fibers are bonded to described non-woven fabric layer.
7. the preparation method of a facial mask, it is characterised in that, described method comprises the steps:
Step 1, in spinning solution, add silver-loaded zirconium phosphate, stir evenly, prepare the spinning solution comprising silver-loaded zirconium phosphate;
Step 2, the spinning solution comprising silver-loaded zirconium phosphate prepared in step 1 is prepared fiber yarn;
Step 3, described fiber yarn step 2 prepared adopt wet laid random web to reinforce into cloth, prepare layer of fibers;
Step 4, layer of fibers step 3 prepared and non-woven fabric layer bonding, prepare face mask substrate material;
Step 5, the described face mask substrate material of preparation is immersed in facial mask liquid, prepare described facial mask.
8. the preparation method of a facial mask, it is characterised in that, described method comprises the steps:
Step 1, chitin and/or chitosan and Silver Nitrate are uniformly mixed after, stir with fiber filament, blending, prepare layer of fibers;
Step 2, layer of fibers step 1 prepared and non-woven fabric layer bonding, prepare face mask substrate material;
Step 3, the described face mask substrate material of preparation is immersed in facial mask liquid, prepare described facial mask.
9. the preparation method of a facial mask, it is characterised in that, described preparation method comprises the steps:
Step 1, Silver Nitrate is mixed with Trisodium Citrate, prepare micro-nano silver citrate mixture;
In step 2, silver citrate mixture fiber yarn is added step 1 preparing, fully it is uniformly mixed, obtains adsorbing the fiber yarn of silver citrate particle;
Layer of fibers is prepared in the fiber yarn processing of step 3, absorption silver citrate particle step 2 prepared;
Step 4, layer of fibers step 3 prepared and non-woven fabric layer bonding, prepare face mask substrate material;
Step 5, the described face mask substrate material of preparation is immersed in facial mask liquid, prepare described facial mask.
10. the preparation method of a facial mask, it is characterised in that, described preparation method comprises the steps:
Step 1, silver carrier is added in facial mask base liquid, obtain facial mask liquid;
Step 2, face mask substrate material is immersed facial mask liquid prepared by step 1, obtain described facial mask.
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| CN201610070389.6A CN105662898A (en) | 2016-02-01 | 2016-02-01 | Mask and preparation method thereof |
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| CN201610070389.6A CN105662898A (en) | 2016-02-01 | 2016-02-01 | Mask and preparation method thereof |
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