CN105549340B - Volume to volume flexible substrate photolithography method and device - Google Patents
Volume to volume flexible substrate photolithography method and device Download PDFInfo
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- CN105549340B CN105549340B CN201610098275.2A CN201610098275A CN105549340B CN 105549340 B CN105549340 B CN 105549340B CN 201610098275 A CN201610098275 A CN 201610098275A CN 105549340 B CN105549340 B CN 105549340B
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- flexible substrate
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
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- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a kind of volume to volume flexible substrate photolithography method and device, by being designed to exposure transmission of ultraviolet light path and Exposure mode, so as to realize the photoetching of flexible substrate, the processing step such as photoetching and the last substrate desquamation of technique on glass substrate need to be attached to without conventional flex substrate, on the one hand process equipment cost is saved, on the other hand the yield and productive temp of production are improved, manufacture craft of the present invention is simple, productive temp can be effectively improved, under conditions of lower production cost, realize the quick and high-quality photolithographic fabrication of flexible substrate.Apparatus of the present invention are mainly made up of ultraviolet source, flexible substrate transmission system and photoetching gum coating apparatus, simple in construction, easy to use, are easy to safeguard and are manufactured.
Description
Technical field
It is more particularly to a kind of TFT gusts the present invention relates to a kind of manufacturing method and apparatus of display field tft array substrate
The photolithography method and device of row, applied to the thin film transistor (TFT) preparing technical field based on volume to volume flexible substrate photoetching.
Background technology
The English full name of thin film transistor (TFT) is Thin Film Transistor, is abbreviated as TFT.
The English full name of volume to volume is Roll to Roll, is abbreviated as R2R.Traditional R2R substrate film figure manufacturers
Method is as follows：
Realize that monofilm is graphical to flexible substrate using various ways such as silk-screen printing, laser patterning, inkjet printings
Transfer, but using the above method realize it is graphical can only typically realize the larger film layer of figure feature sizes, film layer
Litho pattern feature sizes are usually tens microns or bigger, and the patterning process required precision of film layer is low, the nothing of film layer technique
Multilayer aligns high-precision requirement, and the flexible TFT array substrate applied to display field, which is made, can not then meet requirement.Tradition
Flexible base board exposure technology first flexible substrate is coated on traditional glass substrate and solidified, screen technique knot to be shown
Flexible substrate is peeled away from glass substrate using methods such as laser lift-offs after beam, on the one hand conventional method adds flexibility
The process time of display, process equipment cost is then on the other hand added, referring to Fig. 1.
Flexible TFT array substrate, which makes, to be needed to realize the photoetching process of more than 4 times, and more general photoetching process needs 5
Secondary photoetching process, realizes that the feature sizes of display are smaller, reaches several microns, graphical aligning accuracy requires high, generally requires small
In equal to 1 micron, so the above method can not realize the figure chemical industry of the tft array substrate based on volume to volume flexible substrate at present
Skill, therefore urgently study new photolithography method to realize patterned technological requirement.
The content of the invention
In order to solve prior art problem, it is an object of the present invention to overcome the deficiencies of the prior art, and to provide one kind
Volume to volume flexible substrate photolithography method and device, by the optical path adjusting to light source, the feelings for making flexible substrate be supported at spool
Accurate photoetching process is realized under condition.
To reach that foregoing invention creates purpose, using following technical proposals：
A kind of volume to volume flexible substrate photolithography method, comprises the following steps：
A. after flexible substrate coating photoresist, power transmission shaft is oriented by the flexible liner of coating photoresist by driving first
Bottom point is sent at substrate film figure manufacture position detector, and position detector is manufactured to substrate by substrate film figure
The positioning Mark of the setting at edge carries out position positioning, after position is had good positioning, then the flexible substrate of coating photoresist is sent to
Second orientation power transmission shaft；
B. ultraviolet source is opened, exposure ultraviolet is irradiated on substrate film figure eyeglass, substrate film figure is set
Eyeglass is the part arc-shaped curved surface mirror on the surface face of cylinder of the second orientation power transmission shaft in step a, substrate film figure eyeglass
Shape and size it is identical with flexible substrate litho pattern to be manufactured, substrate film figure eyeglass is made of transparent material,
The transmitance of the ultraviolet of substrate film figure eyeglass is more than 95%；
C. driving second is oriented at power transmission shaft, the position that flexible substrate is sent to substrate film figure eyeglass, is made in step
Exposure ultraviolet in rapid b passes through substrate film figure eyeglass, by the coating photoresist having been transferred on second driving shaft
Flexible substrate is exposed, and forms flexible substrate litho pattern；
D. in step c exposure complete after, close ultraviolet source, continue drive second driving shaft, by it is unexposed its
Its flexible substrate part is sent at the substrate film figure lens position of the second orientation power transmission shaft, is then turned on ultraviolet source, after
It is continuous that flexible substrate is exposed, form flexible substrate litho pattern；
E. circulate the step d course of work to carry out, according to the production technology beat of setting, to the photoetching figure of flexible substrate
Shape is continuously manufactured.
As currently preferred technical scheme, in stepb, exposure ultraviolet is first passed through after the first mirror-reflection, then
Make ultraviolet through mask plate and project on the second minute surface, be then concurrently shot out ultraviolet line focus by the second minute surface,
It is then incident on the substrate film figure eyeglass of the second orientation power transmission shaft.
A kind of volume to volume flexible substrate lithographic equipment, is mainly applied by ultraviolet source, flexible substrate transmission system and photoresist
Cloth apparatus is constituted, and photoetching gum coating apparatus coating photoresist on flexible substrates, flexible substrate transmission system is mainly determined by first
, will on flexible substrates after coating photoresist to power transmission shaft, the second orientation power transmission shaft and corresponding power transmission shaft driver composition
The flexible substrate one side for scribbling photoresist is wound up on the surface of the first orientation power transmission shaft, and orienting power transmission shaft by driving first will
The flexible substrate part of coating photoresist is sent at substrate film figure manufacture position detector, passes through substrate film figure system
Make position detector and position positioning is carried out to the positioning Mark marks of the setting of edges of substrate, after position is had good positioning, then will coating
The flexible substrate part of photoresist is sent on the second orientation power transmission shaft, and second orientation power transmission shaft at least part periphery is used
Transparent material of the transmitance of ultraviolet more than 95% is made, and the transparent column face part of the second orientation power transmission shaft forms arc
Curved mirror, as substrate film figure eyeglass, the shape and size of substrate film figure eyeglass and flexible liner back light to be manufactured
Needle drawing shape is identical, opens ultraviolet source, exposure ultraviolet can be made to be irradiated on substrate film figure eyeglass, and the orientation of driving second is passed
At moving axis, the position that the flexible substrate of coating photoresist is partially transferred to substrate film figure eyeglass, make in exposure ultraviolet
Through substrate film figure eyeglass, the flexible substrate part for the coating photoresist having been transferred on second driving shaft is exposed
Light, forms flexible substrate litho pattern, after exposure is completed, and closes ultraviolet source, continues to drive second driving shaft, will not expose
Other flexible substrate parts of light are sent at the substrate film figure lens position of the second orientation power transmission shaft, are then turned on ultraviolet light
Source, continuation is exposed to flexible substrate, forms flexible substrate litho pattern, control transmission and exposure work process cycle
Carry out, according to the production technology beat of setting, the litho pattern of flexible substrate is continuously manufactured.
As the preferred technical scheme of apparatus of the present invention, exposure ultraviolet is first passed through after the first mirror-reflection, then makes purple
Outside line is through mask plate and projects on the second minute surface, is then concurrently shot out ultraviolet line focus by the second minute surface, then
Incide on the substrate film figure eyeglass of the second orientation power transmission shaft.
As the further preferred technical scheme of above-mentioned technical proposal, the second minute surface uses minute surface of the surface through ovennodulation.
As the further preferred technical scheme of above-mentioned technical proposal, by controller, production technology beat, control are adjusted
The photolithographic fabrication speed of the litho pattern of flexible substrate processed.
As the further preferred technical scheme of above-mentioned technical proposal, substrate film figure eyeglass is made of quartz.
The present invention compared with prior art, substantive distinguishing features and remarkable advantage is obviously protruded with following：
Flexible substrate is first coated on traditional glass substrate and solidified by traditional flexible base board exposure technology, is treated
Display screen technique is peeled away from glass substrate flexible substrate using methods such as laser lift-offs after terminating, the side of conventional method one
Face adds the process time of Flexible Displays, including the coating of flexible material and hardening time, display screen technique terminate after peel off
Process time, on the other hand then add process equipment cost, including laser lift-off equipment, flexible substrate curing process equipment
Deng；And the present invention is using display screen relevant exposure technique of the R2R modes to flexible substrate, it is not necessary to which flexible substrate material is consolidated
Chemical industry skill and stripping technology, on the one hand save process equipment cost, on the other hand improve the yield and productive temp of production,
Manufacture craft of the present invention is simple, can effectively improve productive temp, under conditions of lower production cost, realize flexible substrate
Quick and high-quality manufacture.
Brief description of the drawings
Fig. 1 is traditional display screen manufacturing process flow block diagram based on flexible substrate.
Fig. 2 is preferred embodiment of the present invention volume to volume flexible substrate photolithography process block diagram.
Fig. 3 is the structural representation of preferred embodiment of the present invention volume to volume flexible substrate lithographic equipment.
Embodiment
Details are as follows for the preferred embodiments of the present invention：
In the present embodiment, referring to Fig. 2 and Fig. 3, a kind of volume to volume flexible substrate lithographic equipment, mainly by ultraviolet source
50th, flexible substrate transmission system and photoetching gum coating apparatus composition, photoetching gum coating apparatus are coated with photoetching in flexible substrate 10
Glue 80, flexible substrate transmission system is main to be driven by the first orientation power transmission shaft 20, second orientation power transmission shaft 21 and corresponding power transmission shaft
Dynamic device composition, in flexible substrate 10 after coating photoresist 80, the one side of flexible substrate 10 for scribbling photoresist 80 is wound up into
On the surface of first orientation power transmission shaft 20, power transmission shaft 20 is oriented by the flexible substrate 10 of coating photoresist 80 by driving first
Divide and be sent at substrate film figure manufacture position detector 30, position detector 30 is manufactured to substrate by substrate film figure
The positioning Mark marks 40 of the setting at edge carry out position positioning, after position is had good positioning, then by the flexible liner of coating photoresist 80
The part of bottom 10 is sent on the second orientation power transmission shaft 21, and second orientation power transmission shaft 21 at least part periphery is using ultraviolet
Clear quartz material of the transmitance more than 95% is made, and quartz has high transmittance, the transparent column of the second orientation power transmission shaft 21
Face part forms arc-shaped curved surface mirror, as substrate film figure eyeglass 62, the shape and size of substrate film figure eyeglass 62 with
The litho pattern of flexible substrate 10 to be manufactured is identical, opens ultraviolet source 50, exposure ultraviolet can be made to be irradiated to substrate film figure
On shape eyeglass 62, driving second orients power transmission shaft 21, and the flexible substrate 10 of coating photoresist 80 is partially transferred into substrate film
At the position of figure eyeglass 62, make to pass through substrate film figure eyeglass 62 in exposure ultraviolet, the second transmission will be had been transferred to
The part of flexible substrate 10 of coating photoresist 80 on axle 21 is exposed, and forms flexible substrate litho pattern, is completed in exposure
Afterwards, ultraviolet source 50 is closed, continues to drive second driving shaft 21, unexposed other flexible substrate parts 90 is sent to the
At the position of substrate film figure eyeglass 62 of two orientation power transmission shafts 21, ultraviolet source 50 is then turned on, continuation is entered to flexible substrate 10
Row exposure, forms flexible substrate litho pattern, control transmission and exposure work process cycle are carried out, according to the production of setting
Technique beat, is continuously manufactured to the litho pattern of flexible substrate 10.
In the present embodiment, referring to Fig. 2 and Fig. 3, exposure ultraviolet is first passed through after the reflection of the first minute surface 60, then makes ultraviolet
Through mask plate and project on the second minute surface, be then concurrently shot out ultraviolet line focus by the second minute surface, it is then incident
Onto the substrate film figure eyeglass 62 of the second orientation power transmission shaft 21, wherein the second minute surface is minute surface of the surface through ovennodulation.This
Embodiment device is mainly made up of ultraviolet source, flexible substrate transmission system and photoetching gum coating apparatus, simple in construction, user
Just, it is easy to safeguard and manufacture
In the present embodiment, referring to Fig. 2 and Fig. 3, by controller, production technology beat is adjusted, flexible substrate 10 is controlled
Litho pattern photolithographic fabrication speed.
In the present embodiment, referring to Fig. 2 and Fig. 3, a kind of volume to volume flexible substrate photolithography method comprises the following steps：
A. first in the coating photoresist 80 of flexible substrate 10, photoetching will be coated with by then orienting power transmission shaft 21 by driving first
The part of flexible substrate 10 of glue 80 is sent at substrate film figure manufacture position detector 30, is manufactured by substrate film figure
Position detector 30 carries out position positioning to the positioning Mark marks 40 of the setting of edges of substrate, after position is had good positioning, then will apply
The flexible substrate 10 of cloth photoresist 80 is sent to the second orientation power transmission shaft 21；
B. ultraviolet source 50 is opened, exposure ultraviolet is irradiated on substrate film figure eyeglass 62, substrate film is set
Figure eyeglass 62 is the part arc-shaped curved surface mirror on the surface face of cylinder of the second orientation power transmission shaft 21 in step a, substrate film
The shape and size of figure eyeglass 62 are identical with the litho pattern of flexible substrate 10 to be manufactured, and substrate film figure eyeglass 62 is adopted
It is made of transparent material, the transmitance of the ultraviolet of substrate film figure eyeglass 62 is more than 95%；
C. driving second is oriented at power transmission shaft 21, the position that flexible substrate 10 is sent to substrate film figure eyeglass 62,
Exposure ultraviolet in stepb is passed through substrate film figure eyeglass 62, the painting on second driving shaft 21 will be had been transferred to
The flexible substrate 10 of cloth photoresist 80 is exposed, and forms the litho pattern of flexible substrate 10；
D. after exposure is completed in step c, ultraviolet source 50 is closed, continues to drive second driving shaft 21, will be unexposed
Other flexible substrate parts 90 be sent at the position of substrate film figure eyeglass 62 of the second orientation power transmission shaft 21, be then turned on purple
Outer light source 50, continuation is exposed to flexible substrate 10, forms the litho pattern of flexible substrate 10；
E. circulate the step d course of work to carry out, according to the production technology beat of setting, continuous exposure is carried out, to soft
The litho pattern of property substrate 10 is continuously manufactured.
In the present embodiment, referring to Fig. 2 and Fig. 3, the present embodiment volume to volume flexible substrate photolithography method and device, by right
Exposure transmission of ultraviolet light path and Exposure mode are designed, so that the photoetching of flexible substrate is realized, without conventional flex
Substrate need to be attached to the processing step such as photoetching and the last substrate desquamation of technique on glass substrate, on the one hand save technique and set
Standby cost, on the other hand improves the yield and productive temp of production, and manufacture craft of the present invention is simple, can effectively improve production section
Clap, under conditions of lower production cost, realize the quick and high-quality photolithographic fabrication of flexible substrate.
The embodiment of the present invention is illustrated above in conjunction with accompanying drawing, but the invention is not restricted to above-described embodiment, can be with
Made according to the purpose of the innovation and creation of the present invention under a variety of changes, all Spirit Essence and principle according to technical solution of the present invention
Change, modification, replacement, the combination or simplified made, should be equivalent substitute mode, as long as meeting the goal of the invention of the present invention,
Without departing from technical principle and the inventive concept of volume to volume flexible substrate photolithography method of the present invention and device, the present invention is belonged to
Protection domain.
Claims (7)
1. a kind of volume to volume flexible substrate photolithography method, it is characterised in that comprise the following steps：
A. after flexible substrate coating photoresist, power transmission shaft is oriented by the flexible liner bottom of coating photoresist by driving first
Divide and be sent at substrate film figure manufacture position detector, position detector is manufactured to substrate by the substrate film figure
The positioning Mark that sets of edge carry out position positioning, after position is had good positioning, then the flexible substrate of coating photoresist is sent to
Second orientation power transmission shaft；
B. ultraviolet source is opened, exposure ultraviolet is irradiated on substrate film figure eyeglass, the substrate film figure is set
Eyeglass is the part arc-shaped curved surface mirror on the surface face of cylinder of the second orientation power transmission shaft in the step a, the substrate film
The shape and size of figure eyeglass are identical with flexible substrate litho pattern to be manufactured, and the substrate film figure eyeglass is using saturating
Bright material is made, and the transmitance of the ultraviolet of the substrate film figure eyeglass is more than 95%；
C. drive at the second orientation power transmission shaft, the position that flexible substrate is sent to the substrate film figure eyeglass, make
Exposure ultraviolet in the step b passes through the substrate film figure eyeglass, will have been transferred to second orientation and pass
The flexible substrate of coating photoresist on moving axis is exposed, and forms flexible substrate litho pattern；
D. after exposure is completed in the step c, ultraviolet source is closed, continues to drive the second orientation power transmission shaft, will not
Other flexible substrate parts of exposure are sent at the substrate film figure lens position of the second orientation power transmission shaft, then
Ultraviolet source is opened, continuation is exposed to flexible substrate, forms flexible substrate litho pattern；
E. circulate the course of work of the step d to carry out, according to the production technology beat of setting, to the photoetching figure of flexible substrate
Shape is continuously manufactured.
2. volume to volume flexible substrate photolithography method according to claim 1, it is characterised in that：In the step b, exposure is purple
Outside line is first passed through after the first mirror-reflection, then is made ultraviolet through mask plate and projected on the second minute surface, then passes through second
Ultraviolet line focus is concurrently shot out by minute surface, on the substrate film figure eyeglass for being then incident on the second orientation power transmission shaft.
3. a kind of volume to volume flexible substrate lithographic equipment, mainly by ultraviolet source (50), flexible substrate transmission system and photoresist
Apparatus for coating is constituted, photoetching gum coating apparatus coating photoresist (80) in flexible substrate (10), it is characterised in that：It is described
Flexible substrate transmission system is main to be driven by the first orientation power transmission shaft (20), the second orientation power transmission shaft (21) and corresponding power transmission shaft
Device is constituted, in flexible substrate (10) after coating photoresist (80), will scribble flexible substrate (10) one side of photoresist (80)
On the surface for being wound up into the first orientation power transmission shaft (20), by driving the first orientation power transmission shaft (20) that photoetching will be coated with
The flexible substrate (10) of glue (80) is partly sent to substrate film figure manufacture position detector (30) place, passes through the thin substrates
The positioning Mark marks (40) that film pattern manufacture position detector (30) is set to the edge of substrate carry out position positioning, and position is fixed
After position is good, then the flexible substrate (10) of coating photoresist (80) is partly sent on the second orientation power transmission shaft (21), institute
State transparent material system of second orientation power transmission shaft (21) at least part periphery using the transmitance of ultraviolet more than 95%
Into the transparent column face part of the second orientation power transmission shaft (21) forms arc-shaped curved surface mirror, is used as substrate film figure eyeglass
(62), the shape and size of the substrate film figure eyeglass (62) are identical with flexible substrate (10) litho pattern to be manufactured,
The ultraviolet source (50) is opened, exposure ultraviolet can be made to be irradiated on the substrate film figure eyeglass (62), driving is described
Second orientation power transmission shaft (21), the substrate film figure mirror is partially transferred to by the flexible substrate (10) of coating photoresist (80)
At the position of piece (62), make to pass through the substrate film figure eyeglass (62) in exposure ultraviolet, described the will be had been transferred to
The flexible substrate (10) of coating photoresist (80) on two orientation power transmission shafts (21) is partly exposed, and forms flexible substrate photoetching
Figure, after exposure is completed, closes the ultraviolet source (50), continues to drive the second orientation power transmission shaft (21), will not
Other flexible substrate parts (90) of exposure are sent to the substrate film figure eyeglass of the second orientation power transmission shaft (21)
(62) at position, the ultraviolet source (50) is then turned on, continuation is exposed to flexible substrate (10), forms flexible substrate photoetching
Figure, control transmission and exposure work process cycle are carried out, according to the production technology beat of setting, to flexible substrate (10)
Litho pattern continuously manufactured.
4. volume to volume flexible substrate lithographic equipment according to claim 3, it is characterised in that：Exposure ultraviolet first passes through first
After minute surface (60) reflection, then make ultraviolet through mask plate and project on the second minute surface, then will be ultraviolet by the second minute surface
Line focus is simultaneously launched, and is then incident on the substrate film figure eyeglass (62) of the second orientation power transmission shaft (21)
On.
5. volume to volume flexible substrate lithographic equipment according to claim 4, it is characterised in that：Second minute surface uses surface
Minute surface through ovennodulation.
6. the volume to volume flexible substrate lithographic equipment according to any one in claim 3~5, it is characterised in that：Pass through control
Device processed, adjusts production technology beat, the photolithographic fabrication speed of the litho pattern of control flexible substrate (10).
7. the volume to volume flexible substrate lithographic equipment according to any one in claim 3~5, it is characterised in that：The lining
Bottom film pattern eyeglass (62) is made of quartz.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201610098275.2A CN105549340B (en) | 2016-02-24 | 2016-02-24 | Volume to volume flexible substrate photolithography method and device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201610098275.2A CN105549340B (en) | 2016-02-24 | 2016-02-24 | Volume to volume flexible substrate photolithography method and device |
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| CN105549340A CN105549340A (en) | 2016-05-04 |
| CN105549340B true CN105549340B (en) | 2017-10-24 |
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| CN107104187A (en) * | 2017-04-14 | 2017-08-29 | 武汉华星光电技术有限公司 | Flexible display substrates laser lift-off device and its laser-stripping method |
| CN112462578A (en) * | 2020-12-16 | 2021-03-09 | 广东思沃激光科技有限公司 | Exposure method, exposure machine, and computer-readable storage medium |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102460306A (en) * | 2009-05-27 | 2012-05-16 | 3M创新有限公司 | Method and apparatus for photoimaging substrate |
| CN102929100A (en) * | 2012-11-22 | 2013-02-13 | 苏州蒙斯威光电科技有限公司 | Device and method for implementing alignment reel-to-reel UV (ultraviolet) forming |
| CN103229105A (en) * | 2010-11-23 | 2013-07-31 | 彩虹科技系统有限公司 | Photoimaging |
| CN104968830A (en) * | 2013-01-31 | 2015-10-07 | 应用材料公司 | Deposition source with adjustable electrode |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20050092848A (en) * | 2004-03-17 | 2005-09-23 | 주식회사 코오롱 | Manufacturing method of prism film using the exposure system and exposure system |
| KR101440840B1 (en) * | 2012-10-17 | 2014-09-25 | 주식회사 토바 | Method for producing Vitamin film, roll-to-roll system tererfor and vitamin film thereof |
| KR101431180B1 (en) * | 2013-07-31 | 2014-08-22 | 한국해양과학기술원 | Fabrication apparatus of anti-biofouling amphiphilic pattern and method thereof |
-
2016
- 2016-02-24 CN CN201610098275.2A patent/CN105549340B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102460306A (en) * | 2009-05-27 | 2012-05-16 | 3M创新有限公司 | Method and apparatus for photoimaging substrate |
| CN103229105A (en) * | 2010-11-23 | 2013-07-31 | 彩虹科技系统有限公司 | Photoimaging |
| CN102929100A (en) * | 2012-11-22 | 2013-02-13 | 苏州蒙斯威光电科技有限公司 | Device and method for implementing alignment reel-to-reel UV (ultraviolet) forming |
| CN104968830A (en) * | 2013-01-31 | 2015-10-07 | 应用材料公司 | Deposition source with adjustable electrode |
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