JP2017100367A - Screen mask and method for producing screen mask - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a screen mask with a simple structure excellent in durability and realizing high precision printing, and a method for producing a screen mask.SOLUTION: Provided is a screen mask 1 comprising: a frame 2; a screen mesh 3; the first screen layer 4; and the second screen layer 5. The second screen layer 5 being a member located on the first screen layer 4 and provided with a planar photosensitive emulsion similarly to the first screen layer 4. The second screen layer 5 being a layer contacted with foreign matter 10 on the matter 6 to be printed or foreign matter 10 lying in a region at the outside than the matter to be printed. Namely, it is made into a layer protecting the first screen layer 4 and the screen mesh 3 from the contact of the foreign matter 10. Further, the second screen layer 5 is formed with a pattern hole 9. This pattern hole 9 is provided at a position corresponding to the pattern hole 8 of the first screen layer 4.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a screen mask and a method for manufacturing the screen mask. More specifically, the present invention relates to a screen mask that has a simple structure, excellent durability, and capable of realizing high-precision printing, and a method for manufacturing the screen mask.

  Screen printing is used as a kind of stencil printing. Screen printing is a technique in which a printing paste is passed through a screen mask on which a printing pattern is formed, and printing is performed on a printed material according to the printing pattern.

  Screen printing can be performed on a wide range of objects, for example, printing on paper, cloth, plastic, metal, glass, and the like. In recent years, the application to the manufacture of electronic components has been expanded and widely used in fields that require high-precision printing, such as the formation of wiring for chip components, the formation of electrodes for flat panel displays, and the manufacture of crystalline silicon solar cells. Yes.

  The screen mask is mainly composed of a frame, a screen mesh, and a photosensitive emulsion. The frame is made of aluminum die cast or aluminum pipe, and the screen mesh is made of metal fibers such as stainless steel or tungsten, or synthetic fibers such as polyester.

  The photosensitive emulsion has the property of being cured by exposure or laser irradiation. For example, a photocurable resin composition such as PVA, PVAc, silicon resin, acrylic resin, or epoxy resin is used.

  In the production of a screen mask, a screen mesh is fixed to a frame with an adhesive, and a photosensitive emulsion is coated on the surface of the screen mesh to form a layer. A photomask patterned on a film or glass is superimposed on this layer and exposed to light by exposure or laser irradiation to form a printed pattern, which is developed with a developer such as water.

  At the time of printing, a printing paste is applied on a screen mask, pressure is applied while sliding a squeegee such as urethane rubber, and the printing paste is printed on the substrate by a transfer mechanism.

  In the production of a screen mask used for high-definition printing in recent years, it is common to form a pattern using a photosensitive emulsion. However, since the hardness of the photosensitive emulsion is low, the patterned photosensitive emulsion portion is worn or deformed by printing or mask cleaning.

  As a result, the occurrence of printing misalignment and the damage to the screen mask due to the deterioration of flatness increase, and there is a problem that the screen mask must be replaced in a relatively short period of time.

  Under such circumstances, a screen mask in which the surface of the patterned photosensitive emulsion and the screen mesh is covered with a protective film having excellent wear resistance, corrosion resistance, and lubricity has been proposed. For example, there is a screen mask described in Patent Document 1 To do.

  As shown in FIG. 9, the screen mask 100 described in Patent Document 1 has a predetermined pattern formed on a photosensitive emulsion 103 on a screen mesh 102 provided on a frame 101. The photosensitive emulsion 103 is composed of a cured photosensitive emulsion portion through which the printing paste does not pass and a mesh portion through which the printing paste passes.

  In the screen mask 100, a protective film 104 having excellent wear resistance, corrosion resistance, and lubricity is formed on the photosensitive emulsion portion 103 at the center of the frame body 101 and the screen mesh 102 around it.

  The protective film 104 is formed by subjecting a screen mask to plasma treatment using a carbon-containing compound gas as a plasma generating raw material gas and modifying the surface of the photosensitive emulsion and the wrinkles.

JP 2010-69835 A

  However, the screen mask described in Patent Document 1 requires a plasma processing apparatus for forming a protective film. Further, in applications that require a large number of print patterns, it is necessary to manufacture a screen mask according to a plurality of print patterns.

  Moreover, in the conventional screen mask, the foreign substance which exists on the to-be-printed material or its periphery may contact a screen mask and may be damaged. The foreign matter includes ceramics, metal pieces, a lump of printing paste, and the like. Further, the contact of the convex portion of the printing material itself also leads to damage.

  Damage causes cracks on the surface of the photosensitive emulsion, and the printing paste leaks from the cracks, resulting in poor printing. In addition, when the damage is severe, the screen mesh is cut and the screen mask itself is broken.

  In general, the area of the screen mask is larger than the area of the substrate. Since the amount of foreign matter located around the substrate to be printed increases as the number of times of printing increases, damage is likely to occur in an area outside the substrate to be printed on the screen mask.

  There is also a method of giving first aid to the damaged part of the screen mask with a curable liquid or an adhesive tape, but it has an adverse effect on the printing pattern, so it is difficult to adopt in practice.

  The present invention has been devised in view of the above points, and relates to a screen mask and a method for manufacturing the screen mask that can realize high-precision printing with a simple structure, excellent durability, and the like.

  In order to achieve the above object, a screen mask of the present invention includes a frame, a screen mesh stretched in the frame, and a first pattern hole provided on the screen mesh and formed with a first pattern hole. And a second pattern in which a second pattern hole is formed at a position corresponding to the first pattern hole, on the surface of the first pattern layer opposite to the frame body. And a layer.

  Here, the base of the screen mask is formed by the frame and the screen mesh stretched in the frame.

  Moreover, the printing pattern according to the 1st pattern hole can be printed on a to-be-printed object by the 1st pattern layer provided in the screen mesh and in which the 1st pattern hole was formed. That is, the printing paste is moved to the substrate side through the first pattern hole. In addition, the 1st pattern hole means what refers to the whole hole which forms a predetermined pattern.

  Moreover, the damage which a screen mesh and a 1st pattern layer receive by the 2nd pattern layer provided in the surface on the opposite side to the frame of a 1st pattern layer can be reduced. That is, at the time of printing, the second pattern layer is located between the screen mesh and the first pattern layer and the printing material, and as a result, the durability of the screen mask can be improved.

  The screen pattern and the second pattern layer provided on the surface of the first pattern layer opposite to the frame and having the second pattern hole formed at a position corresponding to the first pattern hole. A print pattern corresponding to the first pattern hole can be printed on the printing material while protecting the first pattern layer from damage. The second pattern hole is a hole provided at a position corresponding to the first pattern hole, and means a whole hole that forms a predetermined pattern.

  Further, when the hole diameter of the second pattern hole is formed larger than the hole diameter of the first pattern hole, the first pattern hole and the second pattern hole are not flush with each other. The printing accuracy via can be improved. That is, it is possible to reduce the influence of the deformation and the like of the thickness and shape of the printing paste on the printing material in contact with the second pattern hole.

  Further, when the distance between the outer peripheral surface of the second pattern hole and the outer peripheral surface of the first pattern hole is 20 μm or more, the screen mesh and the first pattern layer can be more easily protected from damage, The printing accuracy of one pattern hole can also be improved.

  On the other hand, when the distance between the outer peripheral surface of the second pattern hole and the outer peripheral surface of the first pattern hole is less than 20 μm, the second pattern hole and the printing paste on the substrate are likely to come into contact with each other. Thus, the thickness and shape of the printed paste after printing are likely to be deformed.

  In addition, when a positioning line is provided on the outer peripheral portion of the first pattern layer, the positional shift between the first pattern hole and the second pattern hole hardly occurs. That is, for example, a positioning line is provided as a pattern on the outer periphery of each photomask that forms the first pattern layer and the second pattern layer, so that the outer periphery of the first pattern layer is exposed after exposure. A positioning line is formed, and further, the first pattern layer and the second pattern layer are aligned by aligning the positioning line of the first pattern layer with the positioning line of the photomask forming the second pattern layer. The position of the pattern layer is difficult to shift.

  In order to achieve the above object, the screen mask of the present invention is provided with a frame, a screen mesh stretched in the frame, the screen mesh, and a first pattern hole in a central region thereof. And a second pattern layer provided in a region on the opposite side of the first pattern layer from the frame body and in a region outside the first pattern hole. Prepare.

  Here, the damage from the foreign matter located outside the substrate by the second pattern layer provided on the surface opposite to the frame of the first pattern layer and on the outside of the first pattern hole. It becomes easy to cope with. That is, it becomes a structure that protects a region near the outer periphery of the screen mask.

  In order to achieve the above object, a method for producing a screen mask according to the present invention includes a first step of fixing a screen mesh in a frame body, and a photosensitive emulsion serving as a first pattern layer on the screen mesh. A second step of providing a layer, and a first pattern in which a first photomask is applied to the layer of the photosensitive emulsion provided in the second step and irradiated with light to form a first pattern hole A third step of forming a layer, a fourth step of providing a photosensitive emulsion layer as a second pattern layer in the first pattern layer, and a layer of the photosensitive emulsion provided in the fourth step. And a fifth step of forming a second pattern layer in which a second pattern hole corresponding to the first pattern hole is formed by irradiating the second photomask with a light beam.

  Here, the basis of the screen mask can be formed by the first step of fixing the screen mesh in the frame.

  In addition, a second step of providing a photosensitive emulsion layer serving as a first pattern layer on the screen mesh, and a light beam is applied by overlapping the first photomask on the photosensitive emulsion layer provided in the second step. And forming the first pattern layer on which the print pattern corresponding to the first pattern hole can be printed on the printing material by the third step of forming the first pattern layer in which the first pattern hole is formed. Can do. In addition, the 1st pattern hole means what refers to the whole hole which forms a predetermined pattern. Moreover, the light ray here means a thing containing ultraviolet rays and visible light.

  In addition, a fourth step of providing a photosensitive emulsion layer to be a second pattern layer on the first pattern layer, and a second photomask are superimposed on the photosensitive emulsion layer provided in the fourth step. The second pattern layer positioned between the screen mesh, the first pattern layer, and the printing material can be formed by the fifth step of irradiating light to form the second pattern layer. That is, a structure that reduces damage to the screen mesh and the first pattern layer can be obtained.

  In addition, a fourth step of providing a photosensitive emulsion layer to be a second pattern layer on the first pattern layer, and a second photomask are superimposed on the photosensitive emulsion layer provided in the fourth step. While protecting the screen mesh and the first pattern layer from damage by the fifth step of irradiating the light beam and forming the second pattern layer in which the second pattern hole corresponding to the first pattern hole is formed, It becomes possible to form a screen mask capable of printing a printing pattern corresponding to the first pattern hole on the substrate. The second pattern hole is a hole provided at a position corresponding to the first pattern hole, and means a whole hole that forms a predetermined pattern.

  Further, when the hole diameter of the second pattern hole is formed larger than the hole diameter of the first pattern hole, the first pattern hole and the second pattern hole are not flush with each other. The printing accuracy via can be improved. That is, it is possible to reduce the influence of the deformation and the like of the thickness and shape of the printing paste on the printing material in contact with the second pattern hole.

  When a sheet-like photosensitive emulsion is pasted on the screen mesh in the second step, the emulsion thickness in the same layer of the first pattern layer is uniform. As a result, the ink transfer film thickness can be made uniform during printing. Further, the smoothness of the emulsion surface is improved. As a result, ink bleeding during printing can be reduced, and sharp printing with good linearity can be achieved. That is, the ink film thickness and the uniformity in the width direction can be improved, and the printing accuracy can be increased.

  Further, when a sheet-like photosensitive emulsion is pasted on the first pattern layer in the fourth step, the emulsion thickness in the same layer of the second pattern layer becomes uniform. As a result, the ink transfer film thickness can be made uniform during printing. Further, the smoothness of the emulsion surface is improved. As a result, ink bleeding during printing can be reduced, and sharp printing with good linearity can be achieved. That is, the ink film thickness and the uniformity in the width direction can be improved, and the printing accuracy can be increased.

  The first photomask and the second photomask are provided with positioning lines. In the third step, the first photomask corresponds to the first photomask positioning lines in the first pattern layer. In the fifth step, the first pattern hole and the second photomask are overlapped with each other by aligning the first pattern line and the second photomask positioning line. Therefore, it is possible to form a screen mask with little displacement of the pattern hole positions. That is, by aligning the positioning line of the first pattern layer and the positioning line of the second photomask, the positions of the first pattern layer and the second pattern layer are less likely to be displaced. The positional deviation between the first pattern hole and the second pattern hole is small.

  In order to achieve the above object, the screen mask of the present invention is provided with a frame, a screen mesh stretched inside the frame, and provided on the screen mesh to form pattern holes. And a pattern layer formed so that the thickness of the non-pattern hole forming region is larger than the thickness around the pattern hole forming region.

  Here, the basis of the screen mask is formed by the frame and the screen mesh stretched inside the frame.

  Moreover, the printing layer according to the pattern hole can be printed on the printing material by the pattern layer provided on the screen mesh and having the pattern hole formed therein. That is, the printing paste is moved to the substrate side through the pattern holes. In addition, a pattern hole means what refers to the whole hole which forms a predetermined pattern.

  In addition, the pattern mesh is formed on the screen mesh to form pattern holes, and the pattern layer formed so that the thickness of the non-pattern hole forming area is larger than the thickness around the pattern hole forming area reduces damage to the screen mesh. Can be made. Further, the durability of the pattern layer can be increased. The pattern hole non-formation region is a portion of the pattern layer where there is no pattern hole, and the pattern hole and the portion near the pattern hole mean a portion not included in the pattern hole non-formation region. .

The screen mask according to the present invention has a simple structure, excellent durability, and high-precision printing.
In addition, the method for manufacturing a screen mask according to the present invention has a simple structure, excellent durability, and high-precision printing.

It is the schematic which shows the screen mask to which this invention is applied. It is the schematic which shows other embodiment of the screen mask to which this invention is applied. It is the schematic (a) which shows a frame, and the schematic (b) which shows fixation of the screen mesh to a frame. FIG. 2 is a schematic diagram (a) showing a coating operation using a sheet-like photosensitive emulsion as a first layer and a schematic diagram (b) showing a coating operation for forming a photosensitive emulsion layer by coating in the first layer. It is the schematic (a) which shows the light irradiation in an exposure operation | work, and the schematic (b) which shows hardening of a photosensitive emulsion. FIG. 2 is a schematic diagram (a) showing a coating operation using a sheet-like photosensitive emulsion in the second layer and a schematic diagram (b) showing a state in which the second photosensitive emulsion layer is formed. It is the schematic (a) which shows the light irradiation in exposure operation | work, and the schematic (b) which shows the 2nd pattern layer by which the photomask was removed and the pattern formation was carried out. It is the schematic which shows an example of the line for positioning. It is the schematic which shows the structure of the conventional screen mask.

Hereinafter, embodiments of the present invention will be described with reference to the drawings to facilitate understanding of the present invention.
FIG. 1 is a schematic view showing a screen mask to which the present invention is applied. In addition, the structure shown below is an example of this invention and the content of this invention is not limited to this.

  As shown in FIG. 1, a screen mask 1 that is an example of a screen mask to which the present invention is applied includes a frame 2, a screen mesh 3, a first screen layer 4, and a second screen layer 5.

  The screen mask 1 prints a printing paste 7 (ink) from a predetermined pattern hole on a substrate 6 disposed at a position facing the second screen layer 5. At the time of printing, the printing paste on the screen mesh 3 is pushed out from the pattern hole while sliding a squeegee (not shown).

  The frame 2 has a square frame shape, and for example, an aluminum die-cast or aluminum pipe is used. In addition, the shape and size of the frame 2 are appropriately changed depending on the size of the target printing material and the type of printing machine on which the screen mask 1 is installed.

  The screen mesh 3 is a portion that supports a screen layer in which a predetermined pattern hole described later is formed. A constant value of tension is applied to the screen mesh 3 and both ends are fixed to the frame 2 with an adhesive. The screen mesh 3 is disposed inside the frame 2.

  The screen mesh 3 is formed of a metal fiber such as stainless steel or tungsten, or a synthetic fiber such as polyester. The screen mesh 3 is formed in a mesh shape having a large number of holes through which the printing paste 7 can pass. The frame 2 and the screen mesh 3 are members that become the substrate of the screen mask 1.

  The first screen layer 4 is a member in which a photosensitive emulsion is provided on the screen mesh 3 in a plate shape. The first screen layer 4 is formed with pattern holes 8 that enable desired printing on the substrate. This pattern hole 8 becomes a part through which the printing paste passes and draws a circuit or substrate pattern on the surface of the substrate 6. Therefore, the pattern hole 8 means what was comprised from the several hole part.

  The photosensitive emulsion constituting the first screen layer 4 has a property of being cured by exposure or laser irradiation. For example, a photocurable resin composition such as polyvinyl alcohol (PVA), polyvinyl acetate (PVAc), silicon resin, acrylic resin, or epoxy resin is used. A portion cured by the exposure operation is a portion through which the printing paste 7 cannot pass. It is preferable that the 1st screen layer 4 is excellent in adhesiveness with a mesh, elasticity, and resolution.

  The second screen layer 5 is located on the first screen layer 4 and, like the first screen layer 4, is a member provided with a photosensitive emulsion in a plate shape. The second screen layer 5 is a layer that comes into contact with the foreign material 10 on the substrate 6 and the foreign material 10 in the region outside the substrate. That is, it becomes a layer that protects the first screen layer 4 and the screen mesh 3 from contact with the foreign material 10.

  In the screen mask 1, the second screen layer 5 is formed in the central portion of the screen mask 1. For this reason, the second screen layer 5 covers most of the first screen layer 4 other than the region where the pattern holes 8 are formed.

  Further, pattern holes 9 are formed in the second screen layer 5. The pattern hole 9 is provided at a position corresponding to the pattern hole 8 of the first screen layer 4.

  More specifically, the positions of the pattern holes 8 and the pattern holes 9 substantially coincide with each other in a plan view in a state where the first screen layer 4 and the second screen layer 5 are overlapped. The pattern hole 9 is also a part through which the printing paste passes, and is composed of a plurality of holes.

  As described above, the positions of the pattern hole 8 and the pattern hole 9 are substantially the same, but the hole diameter of the pattern hole 9 is formed larger than the hole diameter of the pattern hole 8. In terms of the positional relationship between the corresponding holes, the position indicated by the arrow Z in FIG. 1 has a deviation of 20 μm.

  The photosensitive emulsion constituting the second screen layer 5 has a property of being cured by exposure or laser irradiation. Similar to the photosensitive emulsion constituting the first screen layer 4, for example, a photo-curable resin composition such as polyvinyl alcohol (PVA), polyvinyl acetate (PVAc), silicon resin, acrylic resin, epoxy resin or the like is used. It is done. The second screen layer 5 is preferably excellent in solvent resistance and mechanical durability.

  A portion cured by the exposure operation of the photosensitive emulsion is a portion through which the printing paste 7 cannot pass. The photosensitive emulsions constituting the first screen layer 4 and the second screen layer 5 may be the same material or different materials. In the case where different materials are employed in the two layers, the material having the characteristics of excellent adhesion, elasticity and resolution with the mesh required for the first screen layer 4 as described above, By combining materials having characteristics of excellent solvent resistance and mechanical durability required for the second screen layer 5, it is possible to manufacture a screen mask having excellent printing accuracy and durability.

  In addition, the first screen layer 4 and the second screen layer 5 have a thickness of about several μm to 100 μm. In the screen mask 1, the thickness of the first screen layer 4 is 20 μm, and the thickness of the second screen layer 5 is 30 μm.

  Here, the size and formation location of the pattern hole 8 and the pattern hole 9 are not limited, and can be appropriately changed according to a desired pattern to be drawn on the printing material.

  Further, the positional deviation between the corresponding holes in the pattern hole 8 and the pattern hole 9 is not necessarily 20 μm. It is sufficient if it is difficult to affect the printing via the pattern hole 8, and for example, a deviation of about 100 μm or 1 mm may be used. On the other hand, when the magnitude of the deviation is less than 20 μm, the pattern hole 9 may affect the printing accuracy, and therefore, the positional deviation between the corresponding holes is preferably 20 μm.

  Further, the thicknesses of the first screen layer 4 and the second screen layer 5 are not limited, and can be appropriately changed according to the type of printing material and printing paste, the type and size of foreign matter that easily occurs. It has become.

  In addition, the first screen layer 4 and the second screen layer 5 do not necessarily have to be formed as two different layers. For example, a structure in which the two layers are integrated may be used.

  In addition, the number of screen layers is not necessarily limited to the two layers of the first screen layer 4 and the second screen layer 5. For example, a third screen layer or more layers may be formed on the second screen layer 5. However, two screen layers are sufficient because the number of manufacturing steps increases and the protective capability can be adjusted by changing the thickness of the second screen layer 5.

  In addition, the second screen layer 5 does not necessarily have to be formed in the central portion of the screen mask 1. However, it is preferable that the second screen layer 5 is formed in the central portion of the screen mask 1 in that the first screen layer 4 and the screen mesh 3 are more sufficiently protected.

  On the other hand, as another embodiment of the screen mask to which the present invention is applied, the following configuration may be employed. Hereinafter, a description will be given with reference to FIG.

  Foreign matter that causes damage to the screen mask tends to increase in the area outside the substrate by repeated printing. In general, the pattern hole of the screen layer is formed on the center side of the screen layer in plan view, and has a structure in which no pattern hole exists outside the screen layer.

  Therefore, a screen mask 11 shown in FIG. 2 is also conceivable as another embodiment of the present invention. In the screen mask 11, the second screen layer 12 is formed outside the region where the pattern holes 8 of the first screen layer 4 are provided.

  The second screen layer 12 has a structure capable of protecting the first screen layer 4 and the screen mesh 3 from foreign matter 10 outside the substrate 6. The other parts of the structure of the screen mask 11 are the same as those of the screen mask 1 described above, so that the description thereof is omitted.

Details of the method for manufacturing a screen mask to which the present invention described above is applied will be described below.
In addition, the manufacturing method of the screen mask to which this invention is applied is not limited to the content described below, It can change suitably.

1. Stretching operation First, the frame 2 that becomes the frame of the screen mask 1 is washed, and the screen mesh 3 is attached as shown in FIGS. 3 (a) and 3 (b). The screen mesh 3 is pulled with a tension of a designated value according to the designation of the user of the screen mask 1 and the type of material, and is fixed to the frame 2 with an adhesive while applying the tension.

2. Coat work (first layer)
On the surface of the screen mesh 3 facing the substrate, a photosensitive emulsion layer 13 to be the first screen layer 4 is formed by a coating operation. As the photosensitive emulsion, for example, photocurable PVA can be used, and the photosensitive emulsion layer is formed so as to have an emulsion thickness specified by the user.

  For this coating operation, a method of sticking a sheet-like photosensitive emulsion shown in FIG. 4A or applying a photosensitive emulsion shown in FIG. 4B can be employed.

  In the method shown in FIG. 4A, a sheet-like photosensitive emulsion having a desired emulsion film thickness is pasted on the surface of the screen mesh 3. In the pasting, a liquid photosensitive emulsion is applied to the screen mesh 3 made vertical, and a film sheet 25 of the photosensitive emulsion is pasted from below the screen mesh 2.

  The film sheet 25 is attached from the bottom to the top in the direction indicated by the arrow Y in FIG. By using the film sheet 25 formed to have a constant film thickness, variations in the film thickness of the first screen layer 4 can be reduced.

  On the other hand, as shown in FIG. 4B, a coating operation in which the liquid photosensitive emulsion 26 is coated on the screen mesh 3 in a flat plate shape may be used. In this case, coating and drying of the photosensitive emulsion are repeated until the desired emulsion film thickness is obtained.

  The liquid photosensitive emulsion 26 is also applied from the bottom to the top in the direction indicated by the arrow Y in FIG. The application operation may be an automatic operation by an application machine or an application through a human hand.

  As described above, the layer 13 of the photosensitive emulsion is formed on the surface of the screen mesh 3 by pasting or coating the sheet of the photosensitive emulsion.

3. Exposure work (first layer)
Subsequently, a pattern is formed on the photosensitive emulsion layer 13 formed by the above-described coating operation using a photomask. The formation of the photomask will be described later. As shown in FIG. 5A, the first photomask 14 on which the pattern to be the pattern hole of the first screen layer 4 is formed is fixed in accordance with a designated position on the layer 13 of the photosensitive emulsion.

  The first photomask 14 has a photomask pattern portion 15 that does not transmit light. The position corresponding to the photomask pattern portion 15 of the photosensitive emulsion layer 13 becomes the pattern hole 8 of the first screen layer 5. Further, the region other than the photomask pattern portion 15 of the first photomask 14 is a portion that transmits light. In addition, a light ray here means what contains an ultraviolet-ray and visible light.

  As seen in FIG. 5A, the first photomask 14 is irradiated with light from the upper side with an exposure device (not shown). As shown in FIG. 5 (b), the light does not pass through the photomask pattern portion 15, and the photosensitive emulsion located therebelow is not irradiated with the light and becomes an uncured region 16 as it is.

  On the other hand, in other areas, the light beam passes through the first photomask 14 and the light-sensitive emulsion layer 13 is irradiated with the light beam. As shown in FIG. 5B, the photosensitive emulsion irradiated with the light beam is cured to become a cured region 17.

  When the uncured region 16 is washed with water and washed away in a developing operation step described later, a through hole is formed in the same portion, and the pattern hole 8 described above is formed. Moreover, the hardening area | region 17 becomes a part which comprises a layer as it is.

4). Court work (2nd layer)
Similar to the above-described coating operation, a photosensitive emulsion layer 18 to be the second screen layer 5 is formed by the coating operation on the photosensitive emulsion layer 13 irradiated with light. The photosensitive emulsion used here may be the same emulsion as that used for forming the layer 13 of the photosensitive emulsion, or a different emulsion. Even in the second coating operation, the photosensitive emulsion layer is formed so as to have the emulsion film thickness specified by the user.

  In this coating operation, as shown in FIGS. 6A and 6B, a sheet-like photosensitive emulsion is pasted to form a layer. Here, a liquid photosensitive emulsion is applied to the photosensitive emulsion layer 13 that has been irradiated with light in a vertical direction, and a film sheet 19 of the photosensitive emulsion is pasted from below the screen mesh 3.

  The film sheet 19 is attached from the bottom to the top in the direction indicated by the arrow Y in FIG. By using the film sheet 19 formed in a constant film thickness also in this step, it is possible to reduce the film thickness variation. The photosensitive emulsion layer 18 is formed by pasting the sheet.

  Here, it is not always necessary to form the photosensitive emulsion layer 18 by pasting a sheet-like photosensitive emulsion. For example, a method of forming the photosensitive emulsion layer 18 by the coating process as described above may be employed. However, it is preferable that the sheet-like photosensitive emulsion is pasted from the viewpoint that the variation in the film thickness of the second screen layer 5 can be reduced. By making the film thickness of the second screen layer 5 uniform, it becomes difficult to interfere with the printing paste transferred onto the substrate, and the printing accuracy can be further increased.

5). Exposure work (2nd layer)
Subsequently, a pattern is formed on the photosensitive emulsion layer 18 formed by the above-described coating operation using a photomask. As shown in FIG. 7A, a second photomask 19 on which a pattern to be a pattern hole of the second screen layer 5 is formed is fixed in accordance with a designated position on the layer 18 of the photosensitive emulsion.

  The second photomask 19 has a photomask pattern portion 20 that does not transmit light. A position corresponding to the photomask pattern portion 20 of the layer 18 of the photosensitive emulsion is a pattern hole 9 of the second screen layer 5. The region other than the photomask pattern portion 20 of the second photomask 19 is a portion that transmits light.

  Further, the pattern of the photomask pattern portion 20 of the second photomask 19 is formed at substantially the same position as the photomask pattern portion 15 of the first photomask pattern 14. Further, the size of the photomask pattern portion 20 is formed slightly larger than the size of the photomask pattern portion 15.

  That is, the pattern hole 9 of the second screen layer 5 formed using the second photomask 19 overlaps with the pattern hole 8 of the first screen layer 4 so as to substantially coincide with the position of the pattern hole. 9 is formed to be slightly larger than the pattern hole 8. The deviation between the two holes is preferably 20 μm or more.

  As shown in FIG. 7A, the second photomask 19 is irradiated with light from the upper side by an exposure device (not shown). As shown in FIG. 7B, the photomask pattern portion 20 does not transmit light, and the photosensitive emulsion located therebelow is not irradiated with light, and becomes an uncured region 21 as it is.

  On the other hand, in other areas, the light beam passes through the second photomask 19 and the light-sensitive emulsion layer 18 is irradiated with the light beam. The photosensitive emulsion irradiated with light is cured to become a cured region 22.

6). Development work After the irradiation of the light beam, the uncured region 16 and the uncured region 21 are washed with water and washed away, so that a through hole is formed in the same portion, and a pattern hole 8 and a pattern hole 9 are formed. Moreover, the hardening area | region 17 and the hardening area | region 22 become a part which comprises a layer as it is.

  When the uncured area is removed through the cleaning operation and dried, the first screen layer 4 and the second screen layer 5 are obtained. That is, the screen mask 1 is completed when it is dried through a cleaning operation.

7). Production of Photomask Production of the photomask used for producing the screen mask 1 will be described. The first photomask 14 and the second photomask 19 are made of a light transmissive material such as glass or polyethylene terephthalate (PET) film. Desired pattern data is produced by a CAD operation, and a pattern is formed on a material such as glass by a CAM operation using a drawing machine. By this operation, a photomask capable of forming the pattern holes 8 and the pattern holes 9 is created.

  Further, in the method for manufacturing a screen mask to which the present invention is applied, alignment lines can be provided in addition to the pattern for pattern holes. As shown in FIG. 8, the first photomask 14 is provided with positioning lines 23 on four sides of the flat photomask by a drawing machine. The second photomask 19 is also provided with positioning lines 24 at the same location.

The positioning line 23 and the positioning line 24 are portions that serve as marks when the second photomask 19 is overlaid on the photosensitive emulsion layer 13 and the photosensitive emulsion layer 18 after the light irradiation.

  When an exposure operation is performed through the first photomask 14, a line corresponding to the positioning line 23 is formed in the photosensitive emulsion layer 13. This line is also visible through layer 18 of the photosensitive emulsion. By overlapping this line with the positioning line 24 of the second photomask 19, the shift between the pattern of the first photomask 14 and the pattern of the second photomask is made small. Can do.

  That is, the position where the pattern hole 8 and the pattern hole 9 overlap can be made substantially the same position. Thus, by forming the positioning lines on the photomask, the positions of the pattern holes formed in the two screen layers can be easily aligned.

  Here, the mark for facilitating superposition does not have to be a positioning line. It is sufficient if it becomes a mark for superposition, and may be a symbol such as a circle. However, it is preferable to form a line when providing a mark because it is difficult to cause a shift.

  The screen mask 1 completed through the above steps is used for screen printing. At the time of printing, the second screen layer 5 of the screen mask 1 is arranged to face the surface of the substrate 6. Then, a high-viscosity printing paste is placed from the screen mesh 3 side, and the squeegee is slid and moved relative to the screen mask 1 while pressing the squeegee from the screen mesh 3 side against the printing material 6 side.

  When the second screen layer 5 of the screen mask 1 is brought into contact with and separated from the substrate by the squeegee, the printing paste is transmitted through the pattern holes 8 and 9 and the printing paste is transferred onto the substrate. As the squeegee slides from end to end of the screen mask 1, printing according to the pattern holes 8 and the pattern holes 9 is performed.

  At the time of printing, the foreign matter 10 and the convex portion of the substrate itself come into contact with the screen mask 1, but the contact occurs with the second screen layer 5, and the first screen layer 4 and the screen mesh 3 are in contact with each other. It is difficult to do. Therefore, there is little damage with respect to the 1st screen layer 4 and the screen mesh 3, and the screen mask 1 can be made highly durable.

  Moreover, in the manufacturing method mentioned above, since the manufacturing equipment of the conventional screen mask 1 can be used as it is, the screen mask 1 excellent in durability can be manufactured very easily.

As described above, the piping structure of the panel valve of the present invention can realize a simpler piping structure.
The panel valve control method of the present invention is a control method that uses a simpler piping structure.

DESCRIPTION OF SYMBOLS 1 Screen mask 2 Frame 3 Screen mesh 4 1st screen layer 5 2nd screen layer 6 Printed material 7 Printing paste 8 Pattern hole 9 Pattern hole 10 Foreign material 11 Screen mask 12 2nd screen layer 13 Layer 14 of photosensitive emulsion 14 First Photomask 15 Photomask Pattern Part 16 Uncured Area 17 Cured Area 18 Photosensitive Emulsion Layer 19 Film Sheet 20 Photomask Pattern Part 21 Uncured Area 22 Cured Area 23 Positioning Line 24 Positioning Line 25 Film Sheet 26 Liquid photosensitive emulsion

Claims (11)

A frame,
A screen mesh stretched in the frame;
A first pattern layer provided on the screen mesh and having a first pattern hole formed thereon;
A screen provided with a second pattern layer provided on a surface opposite to the frame of the first pattern layer and having a second pattern hole formed at a position corresponding to the first pattern hole; mask. The screen mask according to claim 1, wherein a hole diameter of the second pattern hole is formed larger than a hole diameter of the first pattern hole. The screen mask according to claim 2, wherein a distance between an outer peripheral surface of the second pattern hole and an outer peripheral surface of the first pattern hole is 20 μm or more. The screen mask according to claim 1, wherein the first pattern layer is provided with positioning lines on an outer peripheral portion. A frame,
A screen mesh stretched in the frame;
A first pattern layer provided in the screen mesh and having a first pattern hole formed in a central region thereof;
A screen mask comprising: a second pattern layer provided on a surface of the first pattern layer opposite to the frame and on a region outside the first pattern hole. A first step of fixing the screen mesh in the frame;
A second step of providing a photosensitive emulsion layer as a first pattern layer on the screen mesh;
A third step in which a first photomask is superimposed on the layer of the photosensitive emulsion provided in the second step and irradiated with light to form a first pattern layer having a first pattern hole;
A fourth step of providing a photosensitive emulsion layer as a second pattern layer on the first pattern layer;
A second pattern in which a second photomask is superimposed on the layer of the photosensitive emulsion provided in the fourth step and irradiated with light to form a second pattern hole corresponding to the first pattern hole. A method for producing a screen mask, comprising: a fifth step of forming a layer. The method for manufacturing a screen mask according to claim 6, wherein a hole diameter of the second pattern hole is formed larger than a hole diameter of the first pattern hole. The method for manufacturing a screen mask according to claim 6 or 7, wherein the second step is to paste a sheet-like photosensitive emulsion on the screen mesh. 9. The method of manufacturing a screen mask according to claim 6, wherein in the fourth step, a sheet-like photosensitive emulsion is pasted on the first pattern layer. 10. The first photomask and the second photomask are provided with positioning lines,
The third step forms a first pattern line corresponding to a positioning line for the first photomask on the first pattern layer,
The fifth step includes overlapping the second photomask by aligning the first pattern line and the positioning line for the second photomask. 10. A method for producing a screen mask according to 9. A frame,
A screen mesh stretched inside the frame;
A screen mask comprising: a pattern layer provided on the screen mesh, in which pattern holes are formed, and a thickness of a non-pattern hole forming region is larger than a thickness around a pattern hole forming region.

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