CN105549340A - Photoetching method and device of roll to roll flexible substrate - Google Patents
Photoetching method and device of roll to roll flexible substrate Download PDFInfo
- Publication number
- CN105549340A CN105549340A CN201610098275.2A CN201610098275A CN105549340A CN 105549340 A CN105549340 A CN 105549340A CN 201610098275 A CN201610098275 A CN 201610098275A CN 105549340 A CN105549340 A CN 105549340A
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- flexible substrate
- substrate
- transmission shaft
- eyeglass
- ultraviolet
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a photoetching method and device of a roll to roll flexible substrate. By designing an exposure infrared transmission path and an exposure mode, photoetching of the flexible substrate is achieved, and process steps of attaching a traditional flexible substrate onto a glass substrate, final substrate stripping and the like are not needed; and on one hand, the process device cost is saved, and on the other hand, the production yield and the production rate are improved. The fabrication process is simple, the production rate can be effectively improved, and rapid and high-quality etching on the flexible substrate can be achieved on the condition of lower production cost. The device disclosed by the invention mainly comprises an infrared light source, a flexible substrate transfer system and a photoresist coating device. The device is simple in structure, and is convenient to use, maintain and fabricate.
Description
Technical field
The present invention relates to a kind of manufacturing method and apparatus showing field tft array substrate, particularly relate to a kind of photoetching method and device of tft array, be applied to the thin film transistor (TFT) preparing technical field based on the photoetching of volume to volume flexible substrate.
Background technology
The English full name of thin film transistor (TFT) is ThinFilmTransistor, is abbreviated as TFT.
The English full name of volume to volume is RolltoRoll, is abbreviated as R2R.Traditional R2R substrate film figure manufacture method is as follows:
The various ways such as serigraphy, laser patterning, inkjet printing are adopted to realize monofilm graphically to the transfer of flexible substrate, but what utilize said method to realize graphically generally can only realize the larger-size rete of figure live width, the litho pattern feature sizes of rete is generally tens microns or larger, the patterning process accuracy requirement of rete is low, rete technique without multilayer contraposition high-precision requirement, to be applied to display field flexible TFT array substrate make then can not meet the demands.Flexible substrate to be first coated on traditional glass substrate and to be cured by traditional flexible base, board exposure technology, the methods such as laser lift-off are utilized flexible substrate to be peeled away from glass substrate after screen technique to be shown terminates, classic method adds the process time of Flexible Displays on the one hand, then add process equipment cost, see Fig. 1 on the other hand.
Flexible TFT array substrate makes needs the photoetching process realizing more than 4 times, comparatively general photoetching process needs 5 photoetching processes, the feature sizes realizing display is less, reach several microns, graphical aligning accuracy requires high, generally need to be less than or equal to 1 micron, so said method cannot realize the patterning process of the tft array substrate based on volume to volume flexible substrate at present, therefore urgently study new photoetching method to realize patterned technological requirement.
Summary of the invention
In order to solve prior art problem, the object of the invention is to the deficiency overcoming prior art existence, a kind of volume to volume flexible substrate photoetching method and device are provided, by the optical path adjusting to light source, make flexible substrate realize accurate photoetching process when spool place supports.
Creating object for reaching foregoing invention, adopting following technical proposals:
A kind of volume to volume flexible substrate photoetching method, comprises the steps:
A. after flexible substrate coating photoresist, by driving the first directed transmission shaft, the flexible substrate part of coating photoresist is sent to substrate film figure and manufactures position detector place, manufacture the location Mark of position detector to the setting of edges of substrate by substrate film figure and carry out location, position, after having good positioning in position, then the flexible substrate of coating photoresist is sent to the second directed transmission shaft;
B. ultraviolet source is opened, make exposure Ultraviolet radiation on substrate film figure eyeglass, the part arc curved mirror that substrate film figure eyeglass is the surperficial face of cylinder of the second directed transmission shaft in step a is set, the shape and size of substrate film figure eyeglass are identical with flexible substrate litho pattern to be manufactured, substrate film figure eyeglass adopts transparent material to make, and the ultraviolet transmitance of substrate film figure eyeglass is more than 95%;
C. the second directed transmission shaft is driven, flexible substrate is sent to the position of substrate film figure eyeglass, make exposure ultraviolet in stepb through substrate film figure eyeglass, the flexible substrate of the coating photoresist be sent on second driving shaft is exposed, forms flexible substrate litho pattern;
D. after having exposed in step c, close ultraviolet source, continue to drive second driving shaft, other flexible substrate part unexposed is sent to the substrate film figure lens position place of the second directed transmission shaft, open ultraviolet source again, continue to expose flexible substrate, form flexible substrate litho pattern;
E. make the course of work of steps d circulate to carry out, according to the production technology beat of setting, the litho pattern of flexible substrate is manufactured continuously.
As the preferred technical scheme of the present invention, in stepb, exposure ultraviolet is first after the first mirror-reflection, make ultraviolet through mask plate again and project on the second minute surface, then by the second minute surface ultraviolet focused on and launch, then inciding on the substrate film figure eyeglass of the second directed transmission shaft.
A kind of volume to volume flexible substrate lithographic equipment, primarily of ultraviolet source, flexible substrate transfer system and photoresist apparatus for coating composition, photoresist apparatus for coating is coated with photoresist on flexible substrates, flexible substrate transfer system is primarily of the first directed transmission shaft, second directed transmission shaft and corresponding transmission shaft driver composition, after being coated with photoresist on flexible substrates, the flexible substrate one side scribbling photoresist is wound up on the surface of the first directed transmission shaft, by driving the first directed transmission shaft, the flexible substrate part of coating photoresist is sent to substrate film figure and manufactures position detector place, manufacture the location Mark mark of position detector to the setting of edges of substrate by substrate film figure and carry out location, position, after having good positioning in position, again the flexible substrate part of coating photoresist is sent on the second directed transmission shaft, the at least part of periphery of second directed transmission shaft adopts the transparent material of ultraviolet transmitance more than 95% to make, the transparent column face portion of the second directed transmission shaft forms arc-shaped curved surface mirror, as substrate film figure eyeglass, the shape and size of substrate film figure eyeglass are identical with flexible substrate litho pattern to be manufactured, open ultraviolet source, exposure Ultraviolet radiation can be made on substrate film figure eyeglass, drive the second directed transmission shaft, the flexible substrate part of coating photoresist is sent to the position of substrate film figure eyeglass, make at exposure ultraviolet through substrate film figure eyeglass, the flexible substrate part of the coating photoresist be sent on second driving shaft is exposed, form flexible substrate litho pattern, after exposure completes, close ultraviolet source, continue to drive second driving shaft, other flexible substrate part unexposed is sent to the substrate film figure lens position place of the second directed transmission shaft, open ultraviolet source again, continue to expose flexible substrate, form flexible substrate litho pattern, control transmits and exposure work process cycle carries out, according to the production technology beat of setting, the litho pattern of flexible substrate is manufactured continuously.
As the preferred technical scheme of apparatus of the present invention, exposure ultraviolet is first after the first mirror-reflection, make ultraviolet through mask plate again and project on the second minute surface, then by the second minute surface ultraviolet focused on and launch, then inciding on the substrate film figure eyeglass of the second directed transmission shaft.
As the further optimal technical scheme of technique scheme, the second minute surface adopts surface through the minute surface of ovennodulation.
As the further optimal technical scheme of technique scheme, by controller, adjustment production technology beat, controls the photolithographic fabrication speed of the litho pattern of flexible substrate.
As the further optimal technical scheme of technique scheme, substrate film figure eyeglass adopts quartz to make.
The present invention compared with prior art, has following apparent outstanding substantive distinguishing features and remarkable advantage:
Flexible substrate to be first coated on traditional glass substrate and to be cured by traditional flexible base, board exposure technology, the methods such as laser lift-off are utilized flexible substrate to be peeled away from glass substrate after screen technique to be shown terminates, classic method adds the process time of Flexible Displays on the one hand, comprise the coating of flexible material and set time, display screen technique terminates the rear stripping technology time, then add process equipment cost on the other hand, comprise laser lift-off equipment, flexible substrate curing process equipment etc.; And the present invention adopts R2R mode to the display screen relevant exposure technique of flexible substrate, do not need the curing process to flexible substrate material and stripping technology, save process equipment cost on the one hand, improve the yield produced and productive temp on the other hand, manufacture craft of the present invention is simple, effectively productive temp be can improve, under the condition of lower production cost, the quick of flexible substrate and high-quality manufacture realized.
Accompanying drawing explanation
Fig. 1 is the display screen manufacturing process flow block diagram of tradition based on flexible substrate.
Fig. 2 is preferred embodiment of the present invention volume to volume flexible substrate photolithography process block diagram.
Fig. 3 is the structural representation of preferred embodiment of the present invention volume to volume flexible substrate lithographic equipment.
Embodiment
Details are as follows for the preferred embodiments of the present invention:
In the present embodiment, see Fig. 2 and Fig. 3, a kind of volume to volume flexible substrate lithographic equipment, primarily of ultraviolet source 50, flexible substrate transfer system and photoresist apparatus for coating composition, photoresist apparatus for coating is coated with photoresist 80 in flexible substrate 10, flexible substrate transfer system is primarily of the first directed transmission shaft 20, second directed transmission shaft 21 and corresponding transmission shaft driver composition, after flexible substrate 10 is coated with photoresist 80, flexible substrate 10 one side scribbling photoresist 80 is wound up on the surface of the first directed transmission shaft 20, by driving the first directed transmission shaft 20, flexible substrate 10 part of coating photoresist 80 is sent to substrate film figure and manufactures position detector 30 place, the location Mark being manufactured the setting of position detector 30 pairs of edges of substrate by substrate film figure is identified 40 and carries out location, position, after having good positioning in position, again flexible substrate 10 part of coating photoresist 80 is sent on the second directed transmission shaft 21, second directed transmission shaft 21 at least partly periphery adopts the clear quartz material of ultraviolet transmitance more than 95% to make, quartz has high permeability, the transparent column face portion of the second directed transmission shaft 21 forms arc-shaped curved surface mirror, as substrate film figure eyeglass 62, the shape and size of substrate film figure eyeglass 62 are identical with flexible substrate 10 litho pattern to be manufactured, open ultraviolet source 50, exposure Ultraviolet radiation can be made on substrate film figure eyeglass 62, drive the second directed transmission shaft 21, flexible substrate 10 part of coating photoresist 80 is sent to the position of substrate film figure eyeglass 62, make at exposure ultraviolet through substrate film figure eyeglass 62, flexible substrate 10 part of the coating photoresist 80 be sent on second driving shaft 21 is exposed, form flexible substrate litho pattern, after exposure completes, close ultraviolet source 50, continue to drive second driving shaft 21, other flexible substrate part 90 unexposed is sent to substrate film figure eyeglass 62 position of the second directed transmission shaft 21, open ultraviolet source 50 again, continue to expose flexible substrate 10, form flexible substrate litho pattern, control transmits and exposure work process cycle carries out, according to the production technology beat of setting, the litho pattern of flexible substrate 10 is manufactured continuously.
In the present embodiment, see Fig. 2 and Fig. 3, exposure ultraviolet is first after the first minute surface 60 reflects, make ultraviolet through mask plate again and project on the second minute surface, then by the second minute surface ultraviolet focused on and launch, then incide on the substrate film figure eyeglass 62 of the second directed transmission shaft 21, wherein the second minute surface is the minute surface of surface through ovennodulation.The present embodiment device is primarily of ultraviolet source, flexible substrate transfer system and photoresist apparatus for coating composition, and structure is simple, easy to use, is convenient to safeguard and manufacture
In the present embodiment, see Fig. 2 and Fig. 3, by controller, adjustment production technology beat, controls the photolithographic fabrication speed of the litho pattern of flexible substrate 10.
In the present embodiment, see Fig. 2 and Fig. 3, a kind of volume to volume flexible substrate photoetching method, comprises the steps:
A. first photoresist 80 is coated with in flexible substrate 10, then by driving first directed transmission shaft 21, flexible substrate 10 part of coating photoresist 80 is sent to substrate film figure and manufactures position detector 30 place, the location Mark being manufactured the setting of position detector 30 pairs of edges of substrate by substrate film figure is identified 40 and carries out location, position, after having good positioning in position, then the flexible substrate 10 of coating photoresist 80 is sent to the second directed transmission shaft 21;
B. ultraviolet source 50 is opened, make exposure Ultraviolet radiation on substrate film figure eyeglass 62, the part arc curved mirror that substrate film figure eyeglass 62 is the surperficial face of cylinder of the second directed transmission shaft 21 in step a is set, the shape and size of substrate film figure eyeglass 62 are identical with the litho pattern of flexible substrate 10 to be manufactured, substrate film figure eyeglass 62 adopts transparent material to make, and the ultraviolet transmitance of substrate film figure eyeglass 62 is more than 95%;
C. the second directed transmission shaft 21 is driven, flexible substrate 10 is sent to the position of substrate film figure eyeglass 62, make exposure ultraviolet in stepb through substrate film figure eyeglass 62, the flexible substrate 10 of the coating photoresist 80 be sent on second driving shaft 21 is exposed, forms the litho pattern of flexible substrate 10;
D. after having exposed in step c, close ultraviolet source 50, continue to drive second driving shaft 21, other flexible substrate part 90 unexposed is sent to substrate film figure eyeglass 62 position of the second directed transmission shaft 21, open ultraviolet source 50 again, continue to expose flexible substrate 10, form the litho pattern of flexible substrate 10;
E. make the course of work of steps d circulate to carry out, according to the production technology beat of setting, carry out continuous exposure, the litho pattern of flexible substrate 10 is manufactured continuously.
In the present embodiment, see Fig. 2 and Fig. 3, the present embodiment volume to volume flexible substrate photoetching method and device, by designing exposure transmission of ultraviolet light path and Exposure mode, thus realize the photoetching of flexible substrate, and do not need conventional flex substrate need be attached to the processing step such as photoetching on glass substrate and the last substrate desquamation of technique, save process equipment cost on the one hand, improve the yield produced and productive temp on the other hand, manufacture craft of the present invention is simple, effectively can improve productive temp, under the condition of lower production cost, realize the quick of flexible substrate and high-quality photolithographic fabrication.
By reference to the accompanying drawings the embodiment of the present invention is illustrated above; but the invention is not restricted to above-described embodiment; multiple change can also be made according to the object of innovation and creation of the present invention; change, the modification made under all Spirit Essences according to technical solution of the present invention and principle, substitute, combination or simplify; all should be the substitute mode of equivalence; as long as goal of the invention according to the invention; only otherwise deviate from know-why and the inventive concept of volume to volume flexible substrate photoetching method of the present invention and device, all protection scope of the present invention is belonged to.
Claims (7)
1. a volume to volume flexible substrate photoetching method, is characterized in that, comprises the steps:
A. after flexible substrate coating photoresist, by driving the first directed transmission shaft, the flexible substrate part of coating photoresist is sent to substrate film figure and manufactures position detector place, manufacture the location Mark of position detector to the setting of edges of substrate by described substrate film figure and carry out location, position, after having good positioning in position, then the flexible substrate of coating photoresist is sent to the second directed transmission shaft;
B. ultraviolet source is opened, make exposure Ultraviolet radiation on substrate film figure eyeglass, the part arc curved mirror that described substrate film figure eyeglass is the surperficial face of cylinder of the second directed transmission shaft in described step a is set, the shape and size of described substrate film figure eyeglass are identical with flexible substrate litho pattern to be manufactured, described substrate film figure eyeglass adopts transparent material to make, and the ultraviolet transmitance of described substrate film figure eyeglass is more than 95%;
C. described second directed transmission shaft is driven, flexible substrate is sent to the position of described substrate film figure eyeglass, make the exposure ultraviolet in described step b through described substrate film figure eyeglass, the flexible substrate of the coating photoresist be sent on described second driving shaft is exposed, forms flexible substrate litho pattern;
D. after having exposed in described step c, close ultraviolet source, continue to drive described second driving shaft, other flexible substrate part unexposed is sent to the described substrate film figure lens position place of described second directed transmission shaft, open ultraviolet source again, continue to expose flexible substrate, form flexible substrate litho pattern;
E. make the course of work of described steps d circulate to carry out, according to the production technology beat of setting, the litho pattern of flexible substrate is manufactured continuously.
2. volume to volume flexible substrate photoetching method according to claim 1, it is characterized in that: in described step b, exposure ultraviolet is first after the first mirror-reflection, make ultraviolet through mask plate again and project on the second minute surface, then by the second minute surface ultraviolet focused on and launch, then inciding on the substrate film figure eyeglass of described second directed transmission shaft.
3. a volume to volume flexible substrate lithographic equipment, primarily of ultraviolet source (50), flexible substrate transfer system and photoresist apparatus for coating composition, described photoresist apparatus for coating is coated with photoresist (80) in flexible substrate (10), it is characterized in that: described flexible substrate transfer system is primarily of the first directed transmission shaft (20), second directed transmission shaft (21) and corresponding transmission shaft driver composition, after flexible substrate (10) is coated with photoresist (80), flexible substrate (10) one side scribbling photoresist (80) is wound up on the surface of described first directed transmission shaft (20), by driving described first directed transmission shaft (20), flexible substrate (10) part being coated with photoresist (80) is sent to substrate film figure and manufactures position detector (30) place, by described substrate film figure manufacture position detector (30), (40) are identified to the location Mark of the setting of edges of substrate and carry out location, position, after having good positioning in position, again flexible substrate (10) part being coated with photoresist (80) is sent on described second directed transmission shaft (21), described second directed transmission shaft (21) at least partly periphery adopts the transparent material of ultraviolet transmitance more than 95% to make, the transparent column face portion of described second directed transmission shaft (21) forms arc-shaped curved surface mirror, as substrate film figure eyeglass (62), the shape and size of described substrate film figure eyeglass (62) are identical with flexible substrate to be manufactured (10) litho pattern, open described ultraviolet source (50), exposure Ultraviolet radiation can be made on described substrate film figure eyeglass (62), drive described second directed transmission shaft (21), flexible substrate (10) part being coated with photoresist (80) is sent to the position of described substrate film figure eyeglass (62), make at exposure ultraviolet through described substrate film figure eyeglass (62), the flexible substrate (10) of the coating photoresist (80) be sent on described second driving shaft (21) part is exposed, form flexible substrate litho pattern, after exposure completes, close described ultraviolet source (50), continue to drive described second driving shaft (21), other flexible substrate part (90) unexposed is sent to described substrate film figure eyeglass (62) position of described second directed transmission shaft (21), open described ultraviolet source (50) again, continue to expose flexible substrate (10), form flexible substrate litho pattern, control transmits and exposure work process cycle carries out, according to the production technology beat of setting, the litho pattern of flexible substrate (10) is manufactured continuously.
4. volume to volume flexible substrate lithographic equipment according to claim 3, it is characterized in that: exposure ultraviolet is first after the first minute surface (60) reflection, make ultraviolet through mask plate again and project on the second minute surface, then by the second minute surface ultraviolet focused on and launch, then inciding on the described substrate film figure eyeglass (62) of described second directed transmission shaft (21).
5. volume to volume flexible substrate lithographic equipment according to claim 4, is characterized in that: described second minute surface adopts surface through the minute surface of ovennodulation.
6. according to volume to volume flexible substrate lithographic equipment described in any one in claim 3 ~ 5, it is characterized in that: by controller, adjustment production technology beat, controls the photolithographic fabrication speed of the litho pattern of flexible substrate (10).
7. according to volume to volume flexible substrate lithographic equipment described in any one in claim 3 ~ 5, it is characterized in that: described substrate film figure eyeglass (62) adopts quartz to make.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201610098275.2A CN105549340B (en) | 2016-02-24 | 2016-02-24 | Volume to volume flexible substrate photolithography method and device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201610098275.2A CN105549340B (en) | 2016-02-24 | 2016-02-24 | Volume to volume flexible substrate photolithography method and device |
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| CN105549340A true CN105549340A (en) | 2016-05-04 |
| CN105549340B CN105549340B (en) | 2017-10-24 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107104187A (en) * | 2017-04-14 | 2017-08-29 | 武汉华星光电技术有限公司 | Flexible display substrates laser lift-off device and its laser-stripping method |
| CN112462578A (en) * | 2020-12-16 | 2021-03-09 | 广东思沃激光科技有限公司 | Exposure method, exposure machine, and computer-readable storage medium |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20050092848A (en) * | 2004-03-17 | 2005-09-23 | 주식회사 코오롱 | Manufacturing method of prism film using the exposure system and exposure system |
| CN102460306A (en) * | 2009-05-27 | 2012-05-16 | 3M创新有限公司 | Method and apparatus for photoimaging substrate |
| CN102929100A (en) * | 2012-11-22 | 2013-02-13 | 苏州蒙斯威光电科技有限公司 | Device and method for implementing alignment reel-to-reel UV (ultraviolet) forming |
| CN103229105A (en) * | 2010-11-23 | 2013-07-31 | 彩虹科技系统有限公司 | Photoimaging |
| KR20140050520A (en) * | 2012-10-17 | 2014-04-29 | 주식회사 토바 | Method for producing vitamin film, roll-to-roll system tererfor and vitamin film thereof |
| WO2015016424A1 (en) * | 2013-07-31 | 2015-02-05 | 한국해양과학기술원 | Device for manufacturing amphiphilic pattern and method for manufacturing same |
| CN104968830A (en) * | 2013-01-31 | 2015-10-07 | 应用材料公司 | Deposition source with adjustable electrode |
-
2016
- 2016-02-24 CN CN201610098275.2A patent/CN105549340B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20050092848A (en) * | 2004-03-17 | 2005-09-23 | 주식회사 코오롱 | Manufacturing method of prism film using the exposure system and exposure system |
| CN102460306A (en) * | 2009-05-27 | 2012-05-16 | 3M创新有限公司 | Method and apparatus for photoimaging substrate |
| CN103229105A (en) * | 2010-11-23 | 2013-07-31 | 彩虹科技系统有限公司 | Photoimaging |
| KR20140050520A (en) * | 2012-10-17 | 2014-04-29 | 주식회사 토바 | Method for producing vitamin film, roll-to-roll system tererfor and vitamin film thereof |
| CN102929100A (en) * | 2012-11-22 | 2013-02-13 | 苏州蒙斯威光电科技有限公司 | Device and method for implementing alignment reel-to-reel UV (ultraviolet) forming |
| CN104968830A (en) * | 2013-01-31 | 2015-10-07 | 应用材料公司 | Deposition source with adjustable electrode |
| WO2015016424A1 (en) * | 2013-07-31 | 2015-02-05 | 한국해양과학기술원 | Device for manufacturing amphiphilic pattern and method for manufacturing same |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107104187A (en) * | 2017-04-14 | 2017-08-29 | 武汉华星光电技术有限公司 | Flexible display substrates laser lift-off device and its laser-stripping method |
| CN112462578A (en) * | 2020-12-16 | 2021-03-09 | 广东思沃激光科技有限公司 | Exposure method, exposure machine, and computer-readable storage medium |
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| CN105549340B (en) | 2017-10-24 |
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