CN105413905A - Two-phase-flow atomized-spray washing device and two-phase-flow atomized-spray washing method - Google Patents
Two-phase-flow atomized-spray washing device and two-phase-flow atomized-spray washing method Download PDFInfo
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- CN105413905A CN105413905A CN201510917538.3A CN201510917538A CN105413905A CN 105413905 A CN105413905 A CN 105413905A CN 201510917538 A CN201510917538 A CN 201510917538A CN 105413905 A CN105413905 A CN 105413905A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
- B05B7/04—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
- B05B7/0416—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
- B05B7/0441—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with one inner conduit of liquid surrounded by an external conduit of gas upstream the mixing chamber
- B05B7/045—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with one inner conduit of liquid surrounded by an external conduit of gas upstream the mixing chamber the gas and liquid flows being parallel just upstream the mixing chamber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
- B05B7/04—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
- B05B7/0416—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
- B05B7/0483—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with gas and liquid jets intersecting in the mixing chamber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a two-phase-flow atomized-spray washing device and a two-phase-flow atomized-spray washing method. A plurality of liquid branching pipelines provided with liquid guide outlets with a preset angle, and an air discharging screen plate provided with a vertical air guide outlet are arranged inside a nozzle main body, so that ejected high-speed liquid flow and high-speed air flow interact fully to form ultra-micro atomized liquid drops which are uniform and adjustable in particle size; under the acceleration and guidance effect of an atomized particle guide outlet, the ultra-micro atomized liquid drops are downwards ejected towards a wafer surface to realize mobile atomization washing. The device and the method disclosed by the invention are capable of greatly reducing the size of atomized particles and reducing energy of the atomized particles, so that damages of a graphic structure of the wafer surface can be prevented, the washing quality and washing efficiency can be improved, and the washing cost can be lowered.
Description
Technical field
The present invention relates to semiconductor cleaning device technical field, more specifically, relate to a kind of two-phase flow atomized spray cleaning device and cleaning method.
Background technology
Along with the high speed development of semiconductor integrated circuit manufacturing technology, the pattern character size of IC chip has entered into the deep-submicron stage, causes the characteristic size of the crucial pollutant (such as particle) of superfine circuit malfunction or damage on chip also greatly to reduce thereupon.
In the process for making of integrated circuit, semiconductor crystal wafer usually all can through multiple tracks processing steps such as such as thin film deposition, etching, polishings.And these processing steps just become the important place that pollutant produces.In order to keep the clean conditions of crystal column surface, eliminating the pollutant being deposited on crystal column surface in each processing step, cleaning treatment must be carried out to the crystal column surface that subjected to after per pass processing step.Therefore, cleaning becomes processing step the most general in integrated circuit fabrication process, its object is to the contamination level effectively controlling each step, to realize the target of each processing step.
In order to remove the pollutant of crystal column surface, when carrying out monolithic wet clean process, wafer will be placed on the rotation platform (such as rotary chuck) of cleaning equipment, and rotates according to certain speed; Simultaneously to the cleaning liquid of the surface spraying certain flow of wafer, crystal column surface is cleaned.
While reached removal pollutant object by cleaning, the most important thing is will ensure wafer, especially the not damaged of figure crystal column surface figure be cleaned.
Along with reducing of integrated circuit pattern characteristic size, the removal difficulty of the pollutant of crystal column surface smaller szie is also continuing to increase.Therefore, a lot of Novel washing technology has also obtained applying more widely on cleaning equipment.Wherein, on monolithic wet clean equipment, utilize atomization cleaning technology can improve the effect of cleaning further.In atomization cleaning process, atomizing particle can produce an impulsive force to the liquid film of crystal column surface, and in liquid film, form the shock wave of fast propagation.When shock wave is on particulate pollutant, the process that pollutant departs from from crystal column surface can be accelerated on the one hand; On the other hand, shock wave can accelerate the flowing velocity of crystal column surface cleaning liquid, impels particulate pollutant to be taken away crystal column surface along with the flowing of liquid quickly.
But, the atomized particle size that atomization cleaner common at present produces is larger, and the energy that atomizing particle has is also higher, when these atomization cleaners are applied in the wafer cleaning technique in 65 nanometers and following technology generation, be easy to cause the problems such as surfacial pattern damage.The utilization rate of liquid phase fluid is lower simultaneously, causes the profligacy of resource.
In order to reduce the damage to crystal column surface figure, need the size reducing the liquid particles ejected further, and control the direction of motion of atomizing particle, movement velocity, movement locus and uniformity etc. better, reduce the damage of liquid particles to pattern side wall and corner, improve cleaning quality and efficiency, save cleaning cost.
Summary of the invention
The object of the invention is to the above-mentioned defect overcoming prior art existence, there is provided a kind of structure simple, reproducible two-phase flow atomized spray cleaning device and cleaning method, by rational structural design and corresponding technical arrangement plan, complete gas-liquid two-phase atomization process, form the ultra micro liquid particles spraying of size uniformity, and utilize carrier gas to make atomizing particle move both vertically to crystal column surface with certain kinetic energy, complete the mobile atomization cleaning process to wafer, the damage of liquid particles to wafer pattern side wall and corner can be reduced, improve cleaning quality and efficiency, save cleaning cost.
For achieving the above object, technical scheme of the present invention is as follows:
A kind of two-phase flow atomized spray cleaning device, for carrying out atomization cleaning to the wafer be placed in cleaning chambers on rotation platform, described cleaning device comprises:
Nozzle body, its inside is provided with liquid line, gas piping is provided with around liquid line, nozzle body lower end is provided with gas-liquid guiding parts, gas-liquid guiding parts is provided with the multichannel separating liquid pipeline being communicated with liquid line with certain symmetric relation level, there is between each separating liquid pipeline the web plate of giving vent to anger being communicated with gas piping, web plate of giving vent to anger vertically is provided with the outlet of densely covered majority gas channeling, and being provided with nozzle body axis along each separating liquid pipeline is that the majority guiding fluid that has a down dip of predetermined angle exports; Described guiding fluid outlet and/or gas channeling outlet are Straight, helically coiled or Laval nozzle structure;
Water influent pipeline and air inlet pipeline, be connected on a spray arm, and be communicated with liquid line, gas piping in nozzle body respectively, and the circular arc that described spray arm drives nozzle body to do the wafer center of circle moves back and forth;
Atomizing particle exit, around being located at below gas-liquid guiding parts, it is Laval nozzle structure or has vertical inwall;
Wherein, the liquid being exported ejection by guiding fluid with exported by gas channeling that the gas sprayed is crossing below gas-liquid guiding parts forms atomizing particle, and spray to crystal column surface downwards through atomizing particle exit.
Preferably, the shape of cross section of described nozzle body comprises circle, triangle or polygon, the multichannel separating liquid pipeline of described gas-liquid guiding parts is common connectivity points with liquid line lower end, and by uniform spoke-like setting, the web plate of giving vent to anger of almost fan is formed between adjacent liquid distribution pipeline, the guiding fluid outlet of each separating liquid pipeline is positioned at below web plate of giving vent to anger, and the downward-sloping setting of gas channeling Way out of web plate of giving vent to anger towards its corresponding side.
Preferably, described Laval nozzle structure comprises collapsible tube, narrow larynx, convergent divergent channel successively, and the longitudinal section of described collapsible tube and/or convergent divergent channel has the tube wall shape of straight line or arc line shaped.
Preferably, described narrow larynx is one section of sizing tube.
Preferably, it is the end face that predetermined angle has a down dip that described separating liquid pipeline has with the vertical axis of nozzle body, and described guiding fluid outlet is vertically drawn by this end face.
Preferably, described predetermined angle is 10 ~ 80 °.
Preferably, described predetermined angle is 30 ~ 60 °.
Preferably, when described guiding fluid outlet and/or gas channeling outlet are for straight tube or helically coiled, its cross sectional shape comprises circle, triangle, polygon; Preferably, the outlet of described gas channeling and/or guiding fluid outlet diameter or to push up the end high be 1 ~ 1000 μm; Further preferably, the outlet of described gas channeling and/or guiding fluid outlet diameter or to push up the end high be 200 ~ 400 μm.
Preferably, described water influent pipeline by the middle part of the upper surface of nozzle body or upper end sidepiece enter in nozzle body and be communicated with liquid line, enter in nozzle body in the middle part of the corresponding upper end sidepiece by nozzle body of described air inlet pipeline or upper surface and be communicated with gas piping.
Preferably, when described air inlet pipeline by the upper end sidepiece of nozzle body enter in nozzle body be communicated with gas piping time, a gas barrier is horizontally disposed with around liquid line in described gas piping below its gas feed, described gas barrier is provided with the through hole of a series of different sizes around liquid line, and it reduces successively by the direction size away from gas feed.
Preferably, the shape of described through hole comprises circle, triangle or polygon.
Preferably, described gas barrier is provided with one around the arc-shaped through-hole of liquid line, and it reduces gradually by the direction opening away from gas feed.
Preferably, the shape of cross section of described nozzle body is fan-shaped, the multichannel separating liquid pipeline of described gas-liquid guiding parts with one with the separating liquid pipeline of fan-shaped dead in line for trunk, and by this trunk separating liquid pipeline connection liquid line lower end, other symmetrical its both sides of apportion of separating liquid pipeline, and the limit fan-shaped with homonymy is parallel; Separating liquid pipeline is formed with exterior domain and to give vent to anger web plate, is provided with two row has a down dip towards its direction, both sides respectively and be that the guiding fluid that arranges of predetermined angle exports with the vertical axis of nozzle body along each separating liquid pipeline.
Preferably, the shape of described nozzle body is the strip of level, its inside is provided with liquid line and gas piping side by side along long axis direction, and be communicated with water influent pipeline separately, air inlet pipeline, at liquid line and gas BOP, be provided with along its long axis direction the guiding fluid that some row of being communicated with it be arranged in parallel separately to export, gas channeling exports, each guiding fluid outlet, gas channeling outlet arranges in the horizontal axis bilateral symmetry of nozzle body, and be that identical predetermined angle dips down mutually and arranges with this horizontal axis, atomizing particle exit is around being located at below guiding fluid outlet and gas exit.
Preferably, described nozzle body is rotated by the rotary part being mated peripheral hardware, the protective cover in described nozzle body side, along its rotation direction peripheral hardware one vertical direction.
Preferably, described nozzle body has a spherical portion, and described rotary part is around this spherical portion and the rotary buckle of rotatable clamping; Described protective cover is connected at below rotary buckle, and it has the block surface of arc.
Preferably, also comprise a liquid rinse pipeline, be located in cleaning chambers, and be positioned at the oblique upper of rotation platform, its outlet is arranged towards the center of rotation platform; Or liquid rinse pipeline can be connected on spray arm, its outlet is positioned at described nozzle body side, and arranges vertically downward.
A kind of cleaning method using above-mentioned two-phase flow atomized spray cleaning device, comprise: the movement locus of setting spray arm and cleaning menu, start cleaning, first start wafer to rotate, and open liquid rinse pipeline, to crystal column surface large discharge jet cleaning liquid, to form the equally distributed cleaning liquid film of one deck at crystal column surface, then water influent pipeline is opened, the cleaning liquid of certain flow is passed into the liquid line in nozzle body, open air inlet pipeline simultaneously, the gas of certain flow is passed into the gas piping in nozzle body, make to form ultra micro atomizing particle with the angular slope directive preset from the concurrent raw atomizing of gas of gas channeling outlet ejection from the cleaning liquid of guiding fluid outlet ejection, then under the vertically-guided of atomizing particle exit or the acceleration of Laval nozzle structure, inject in the cleaning liquid thin layer of crystal column surface, to carry out mobile atomization cleaning to wafer.
Preferably, the cleaning liquid flow of described liquid rinse pipeline is 100 ~ 2000ml/min, and the cleaning liquid flow of described water influent pipeline is 10 ~ 500ml/min, and the gas flow of described air inlet pipeline is 10 ~ 150L/min.
Further preferably, the cleaning liquid flow of described liquid rinse pipeline is 500 ~ 1000ml/min, and the cleaning liquid flow of described water influent pipeline is 50 ~ 200ml/min, and the gas flow of described air inlet pipeline is 60 ~ 100L/min.
Preferably, after opening liquid rinse pipeline, interval 3 ~ 10s opens water influent pipeline and air inlet pipeline more simultaneously.
Preferably, described cleaning liquid comprises chemical liquid or ultra-pure water, and described gas comprises nitrogen, carbon dioxide or compressed air.
Preferably, described liquid rinse pipeline and the cleaning liquid passed in water influent pipeline can identical, also can be different.
The present invention has the following advantages:
1, by the atomizing nozzle structure exported by guiding fluid and gas exit is formed, the high-speed liquid stream making it spray and high velocity gas stream produce and interact fully, and by adjustment piping flow, form the ultra micro atomized drop that particle size is homogeneous, adjustable, greatly can reduce atomized particle size, reduce the energy that it has, avoid becoming damage to crystal column surface figure structure; When atomizing particle exit has Laval nozzle structure, when air inlet pipeline and water influent pipeline keep flow constant, can make to there is higher speed, to improve cleaning efficiency from the atomizing particle of device end outlet injection.
2, when atomizing particle exit has vertical inner wall structure, the vertically-guided effect produced by atomizing particle exit, can make in technical process airflow direction and crystal column surface perpendicular, promote that the impurity in surface grooves figure is to the transmission of bodies of fluid, improve the efficiency of cleaning, improve cleaning performance, and the cross shear of atomizing particle to crystal column surface figure structure can be reduced, prevent the damage of crystal column surface figure structure; Meanwhile, be conducive to saving cleaning liquid.
3, size uniformity can be formed, adjustable atomizing particle rinses crystal column surface, because the quality of atomizing particle is little, but also crystal column surface can be made to be pre-existing in one deck sprayed the cleaning liquid film formed with large discharge by liquid rinse pipeline, thus the impulsive force that can reduce crystal column surface structure, and the damage to crystal column surface figure structure can be reduced; Simultaneously, the shock wave produced when atomizing particle can be utilized to clash into cleaning liquid film is on particulate pollutant, the process that pollutant departs from from crystal column surface can be accelerated on the one hand, on the other hand, shock wave can accelerate the flowing velocity of crystal column surface cleaning liquid, impels particulate pollutant to be taken away crystal column surface along with the flowing of liquid quickly.
4, with the nozzle gas-liquid guiding parts design of spiral liquid/gas channeling outlet, the nebulization efficiency of cleaning liquid can be improved, reduce the diameter of atomizing particle, improve the uniformity of atomizing particle; And design with the liquid/gas exit of Laval nozzle structure, liquid/gas can be made to have higher speed from during its outlet ejection.
5, nozzle body can design becomes fan-shaped, triangle, polygon or strip, can improve the area coverage of nozzle, increases atomizer cleaning area at one time, improves cleaning uniformity, improves the cleaning efficiency of device.
6, by arranging gas barrier in gas piping, the distribution of uniform gas flowfield can be realized, improve the uniformity of atomized particle size and distributed number.
7, rotary part and protective cover structure are set up in nozzle body outside; can make nozzle and crystal column surface angled, towards away from crystal circle center direction, aim at crystal round fringes cleaning; effectively to remove the pollutant of crystal round fringes, and can prevent cleaning liquid from sputtering the secondary pollution caused.
Accompanying drawing explanation
Fig. 1 ~ Fig. 2 is a kind of two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention with round nozzle main body;
Fig. 3 ~ Fig. 8 is the different structure variation diagram of Fig. 2;
Fig. 9 ~ Figure 14 is the different structure change enlarged drawing of gas-liquid guiding parts in Fig. 2;
Figure 15 ~ Figure 17 is a kind of two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention with triangular nozzle main body;
Figure 18 ~ Figure 21 is a kind of two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention with fan nozzle main body;
Figure 22 ~ Figure 23 is a kind of two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention with pentagon nozzle body;
Figure 24 ~ Figure 25 is a kind of two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention with strip nozzle body;
Figure 26 is gas piping interior flow field non-uniform Distribution schematic diagram in a kind of nozzle body;
Figure 27 ~ Figure 32 is a kind of two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention with gas barrier;
Figure 33 ~ Figure 34 is the one rotatable two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention;
Figure 35 ~ Figure 36 is a kind of two-phase flow atomized spray cleaning device in a preferred embodiment of the present invention structural representation when being positioned at cleaning chambers;
Figure 37 is the movement locus schematic diagram of spray arm in cleaning process.
Detailed description of the invention
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in further detail.
It should be noted that, in following detailed description of the invention, when describing embodiments of the present invention in detail, in order to clearly represent structure of the present invention so that explanation, special to the structure in accompanying drawing not according to general scale, and carried out partial enlargement, distortion and simplify processes, therefore, should avoid being understood in this, as limitation of the invention.
In following the specific embodiment of the present invention, first refer to Fig. 1 ~ Fig. 2, Fig. 1 ~ Fig. 2 is a kind of two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention with round nozzle main body.As shown in Figure 1, the contour structures of its display cleaning device of the present invention.A kind of two-phase flow atomized spray cleaning device of the present invention, externally comprises: nozzle body 3, water influent pipeline 2 and air inlet pipeline 1, be positioned at the atomizing particle exit 4 of nozzle body lower end.Wherein the shape of cross section of nozzle body 3 can comprise circle, triangle or polygon, and fan-shaped, strip etc.
As shown in Figure 2, the internal structure of its display Fig. 1 cleaning device.Be provided with liquid line 6 in nozzle body 3 inside, be provided with gas piping 5 around liquid line.Water influent pipeline 2 and air inlet pipeline 1 are communicated with liquid line 6, gas piping 5 in nozzle body respectively, are respectively used to pass into cleaning liquid, gas.Be positioned at below liquid line 6 and gas piping 5 be provided with gas-liquid guiding parts 7 in nozzle body lower end, namely, for the cleaning liquid in liquid line and the purge gas in gas piping being derived and forming atomizing particle, then spray to crystal column surface downwards through atomizing particle exit 4.Atomizing particle exit 4 is around being located at below gas-liquid guiding parts 7, and it has illustrated Lavalle (Laval) nozzle structure 8, or also can have vertical interior wall construction.
For improving the speed that atomizing particle penetrates from cleaning device end, can be optimized the structure of atomizing particle exit, the design of atomizing particle exit is become the structure with Laval nozzle, thus when the flow of air inlet pipeline and water influent pipeline remains unchanged, can make to there is higher speed, to improve cleaning efficiency from the atomizing particle of device end outlet injection.As shown in Figure 2, to have the nozzle body of circular cross section, described atomizing particle exit 4 can be designed to Laval nozzle structure 8, this Laval nozzle structure 8 comprises collapsible tube, narrow larynx, convergent divergent channel from top to bottom successively.
In the collapsible tube part of Laval nozzle, the rule that gas motion is followed " little place, cross section flow velocity is large, and cross section general goal flow velocity is little ", therefore air-flow is constantly accelerated.When reaching narrow larynx, the flow velocity of gas exceedes velocity of sound, and ultrasonic fluid no longer follows above-mentioned rule when convergent divergent channel componental movement, but just the opposite, cross section is larger, and flow velocity is faster.Therefore, this principle can be utilized, atomizing particle exit 4 is designed to the structure 8 with Laval nozzle, make, from the atomizing particle of cleaning device injection, there is higher speed, to improve cleaning efficiency, save the cleaning liquid and gases at high pressure that clean and consume.
Next refer to Fig. 3 ~ Fig. 8, Fig. 3 ~ Fig. 8 is the different structure variation diagram of Fig. 2.As shown in Figure 3, as an optional embodiment, in Laval nozzle structure 8, narrow throat can adopt one section of sizing tube form, namely adds the fixing transition portion of one section of diameter in two parts conical pipe centre of collapsible tube and convergent divergent channel.Can make gas after by the sizing pipeline section of narrow larynx like this, its overwhelming majority still can be ejected into crystal column surface with vertical direction under the constraint of sizing tube.
As shown in Fig. 3 ~ Fig. 6, as different embodiments, the longitudinal section of the collapsible tube of Laval nozzle structure 8 and convergent divergent channel one of them or both can have the tube wall shape of straight line or arc line shaped, be conical pipe or approximate bowl shaped structure, suitably to regulate the air velocity of process and direction.
As shown in Figure 7, as different embodiments, atomizing particle exit 4 also can have vertical interior wall construction, its effect makes the direction of motion and the uneven atomizing particle of nozzle body 3 vertical axial impinge upon on the sidewall of atomizing particle exit 4, to ensure that the direction of motion of the atomizing particle of all arrival crystal column surface liquid films is perpendicular to wafer, prevents cross shear from causing the structural damage of crystal column surface figure.
As different optional manner, as shown in Fig. 1 ~ Fig. 6, described water influent pipeline 2 can be communicated with liquid line 6 by entering in nozzle body in the middle part of the upper surface of nozzle body 3, and described air inlet pipeline 1 correspondence can be entered in nozzle body by the upper end sidepiece of nozzle body 3 and be communicated with gas piping 5.Also can be as shown in Figure 8, described water influent pipeline 2 is entered in nozzle body by the upper end sidepiece of nozzle body 3 and is communicated with liquid line 6 (this needs through gas piping 5), enters in nozzle body and be communicated with gas piping 5 in the middle part of the upper surface of described air inlet pipeline 1 correspondence by nozzle body 3.Water influent pipeline and the air inlet pipeline access port on nozzle body also can be positioned at other positions, and can adopt other access way, and the present invention is not construed as limiting.
Please then consult Fig. 9 ~ Figure 14, Fig. 9 ~ Figure 14 is the different structure change enlarged drawing of gas-liquid guiding parts in Fig. 2.To have the nozzle body of circular cross section, as shown in Figure 9, gas-liquid guiding parts 7 is provided with the multichannel separating liquid pipeline 9 being communicated with liquid line with certain symmetric relation level, such as in the present embodiment, the multichannel separating liquid pipeline 9 of described gas-liquid guiding parts is common connectivity points with liquid line lower end 13, and by uniform spoke-like setting; There is between each separating liquid pipeline 9 web plate 10 of giving vent to anger being communicated with gas piping, such as in the present embodiment, between adjacent liquid distribution pipeline, form fan-shaped web plate of giving vent to anger; Web plate 10 of giving vent to anger vertically is provided with the gas channeling outlet 12 of densely covered majority, being provided with nozzle body vertical axis along each separating liquid pipeline 9 is that the majority guiding fluid that has a down dip of predetermined angle exports 11, such as in the present embodiment, the guiding fluid outlet 11 of each separating liquid pipeline is positioned at below web plate 10 of giving vent to anger, and exports the 12 downward-sloping settings in direction towards the gas channeling of its corresponding side (being illustrated as left side) web plate of giving vent to anger.When actual fabrication, can process one in described separating liquid pipeline 9 lower end with the vertical axis of nozzle body is the end face that has a down dip of predetermined angle, then described guiding fluid outlet 11 is vertically drawn by this end face.As optional embodiment, when above-mentioned predetermined angle is between 10 ~ 80 °, good atomizing particle can be had and form effect; And when described predetermined angle is between 30 ~ 60 °, better atomizing particle can be had and form effect.
Described guiding fluid outlet 11 and/or gas channeling outlet 12 can be Straight, helically coiled or Laval nozzle structure.For improving the nebulization efficiency of cleaning liquid, reducing the diameter of atomizing particle, improving the uniformity of atomizing particle, the gas in nozzle gas-liquid guiding parts 7 and/or guiding fluid exit design can be become helical form.As shown in Figure 10, the schematic top plan view of a kind of nozzle gas-liquid guiding parts with the outlet of helically coiled guiding fluid of its display.When cleaning liquid and spraying from guiding fluid outlet 11 with certain speed, due to the guide effect of its helical structure, under the effect of inertia force, cleaning liquid spontaneously can form a thin layer, thus to increase and gas channeling exports 12 and sprays interaction area between gas, more efficiently can form micro-, nanoscale atomizing particle that particle size is homogeneous, thus improve cleaning efficiency, reduce damaged graphics.
When described guiding fluid outlet and/or gas channeling outlet are for straight tube or helically coiled, its cross sectional shape can comprise circle, triangle, polygon.As shown in Figure 9, a kind of schematic diagram with the nozzle gas-liquid guiding parts 7 of round liquid exit 11 and circular gas exit 12 of its display; As shown in figure 11, a kind of schematic diagram with the nozzle gas-liquid guiding parts 7 of triangular liquid exit 11 and circular gas exit 12 of its display; As shown in figure 12, a kind of schematic diagram with the nozzle gas-liquid guiding parts 7 of round liquid exit 11 and triangularpath gas exit 12 of its display; As shown in figure 13, a kind of schematic diagram with the nozzle gas-liquid guiding parts 7 of triangular liquid exit 11 and triangularpath gas exit 12 of its display.
Alternatively, highly at the bottom of the round diameter of described guiding fluid outlet 11 and/or gas channeling outlet 12 or triangle, polygon top can be 1 ~ 1000 μm; Preferably, the diameter of the outlet of described guiding fluid and/or gas channeling outlet or the end, top, highly can be 200 ~ 400 μm.
As shown in figure 14, as one preferred embodiment, gas channeling outlet 12 and/or guiding fluid outlet 11 can be designed to the structure with Laval nozzle, make gas and/or liquid have higher speed from during outlet ejection.In illustrated the present embodiment, the structure with Laval nozzle is processed in gas channeling outlet 12.Further, Laval nozzle structure also can have multiple different structure combination (please refer to Fig. 3 ~ Fig. 6 to be understood) in taper or bowl-type cross section herein.
For improving the cleaning efficiency of cleaning device of the present invention, can be optimized the shape of nozzle body, to improve the area coverage of nozzle.Wherein, nozzle body can design becomes triangle, fan-shaped, polygon or strip.
Refer to Figure 15 ~ Figure 17, Figure 15 ~ Figure 17 is a kind of two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention with triangular nozzle main body.As shown in figure 15, nozzle body 3 has the contour structures of triangle cylinder, and water influent pipeline 2 is arranged in the middle part of the upper surface of triangle cylinder, and air inlet pipeline 1 is arranged on the upper end sidepiece of triangle cylinder; Nozzle body vertical section as shown in figure 16, gas piping 5 has the triangle pipeline interior shape with nozzle body 3 same shape, atomizing particle exit 4 is positioned at below separating liquid pipeline 9, and it has vertical inwall, and matches with the triangular-shaped profile of nozzle body 3; Be provided with along each separating liquid pipeline 9 and have a down dip towards direction, one or both sides and be arranging or two row guiding fluids export 11 of arranging of predetermined angle (such as 30 ~ 60 °) with the vertical axis of nozzle body 3; As shown in figure 17, three separating liquid pipelines 9 are communicated with liquid line jointly in liquid line lower end 13, and are fixed to the triangular apex position of nozzle body 3 respectively, form symmetrical structure, web plate of giving vent to anger is arranged between separating liquid pipeline 9, it is processed with densely covered gas channeling outlet 12.Atomizing particle exit in this example also can adopt Laval nozzle version.
Refer to figure Figure 18 ~ Figure 21, Figure 18 ~ Figure 21 is a kind of two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention with fan nozzle main body.As shown in figure 18, nozzle body 3 has the contour structures of fan-shaped cylinder, and water influent pipeline 2 is arranged in the middle part of the upper surface of fan-shaped cylinder, and air inlet pipeline 1 is arranged on the upper end of sector; Nozzle body vertical section as shown in figure 19, gas piping 5 has the fan-shaped pipeline interior shape with nozzle body 3 same shape, atomizing particle exit 4 is positioned at below separating liquid pipeline 9, and it has vertical inwall, and matches with the scalloped profile of nozzle body 3; As shown in figure 20, seven the separating liquid pipelines 9 that schematically illustrates described gas-liquid guiding parts with the separating liquid pipeline of in the middle of it and fan-shaped dead in line for trunk, and pass through the lower end of this trunk separating liquid pipeline connection liquid line 6, other symmetrical its both sides of apportion of six separating liquid pipelines, and the limit fan-shaped with homonymy is parallel; Separating liquid pipeline 9 forms with exterior domain web plate of giving vent to anger, and it is processed with densely covered gas channeling outlet 12; As shown in figure 21, be provided with two row along each separating liquid pipeline 9 to have a down dip towards diagram direction, the left and right sides respectively and be that the guiding fluid that arranges of predetermined angle (such as 30 ~ 60 °) exports 11 with the vertical axis of nozzle body.Simultaneously the advantage of fan-shaped two-phase flow atomized spray cleaning device to cover the sector region of crystal circle center to crystal round fringes, increases atomizer cleaning area at one time, improves cleaning efficiency, improves cleaning uniformity.Atomizing particle exit in this example also can adopt Laval nozzle version.
Refer to Figure 22 ~ Figure 23, Figure 22 ~ Figure 23 is a kind of two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention with pentagon nozzle body.As shown in figure 22, nozzle body 3 has the contour structures of pentagon cylinder, and water influent pipeline 2 is arranged in the middle part of the upper surface of pentagon cylinder, and air inlet pipeline 1 is arranged on the upper end of a pentagon cylinder wherein side; Nozzle body vertical section as shown in figure 23, atomizing particle exit 4 is positioned at below separating liquid pipeline 9, and it has vertical inwall, and matches with the pentagon profile of nozzle body 3; Five separating liquid pipelines 9 are communicated with liquid line jointly in liquid line lower end, and be fixed to the position, pentagon summit of nozzle body respectively, form symmetrical structure, be provided with along each separating liquid pipeline 9 and have a down dip towards direction, side and be that the guiding fluid that arranges of predetermined angle (such as 30 ~ 60 °) exports 11 with the vertical axis of nozzle body 3; Web plate of giving vent to anger is arranged between separating liquid pipeline, it is processed with densely covered gas channeling outlet 12.Atomizing particle exit in this example also can adopt Laval nozzle version.
Refer to Figure 24 ~ Figure 25, Figure 24 ~ Figure 25 is a kind of two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention with strip nozzle body.As shown in figure 24, nozzle body 3 has the strip contour structures of level, and water influent pipeline 2, air inlet pipeline 1 pass into main body from its one end, and the liquid line be communicated with separately in main body and gas piping, nozzle body vertical section as shown in figure 25, is provided with liquid line 6 and gas piping 5 side by side along its long axis direction in main body, bottom liquid line 6, be provided with along its long axis direction the micropore shape guiding fluid that some row of being communicated with it be arranged in parallel and export 11 (such as illustrated five arrange), bottom gas piping 5, be provided with along its long axis direction the micropore shape gas channeling that some row of being communicated with it be arranged in parallel equally and export 12 (such as illustrated five arrange), each guiding fluid outlet 11 and gas exit 12 arrange in the horizontal axis bilateral symmetry of nozzle body 3, and be that identical predetermined angle (such as 10 ~ 80 °) dips down mutually and arranges with this horizontal axis, clash into so that the gentle physical efficiency of cleaning liquid of injection intersects to produce, form ultra-fine atomizing particle, this structure is actually the design separating liquid pipeline of gas-liquid guiding parts and guiding fluid being exported the another kind of form combined that combines, give vent to anger web plate and gas channeling are exported, atomizing particle exit 4 is around being located at below guiding fluid outlet 11 and gas exit 12, and it has vertical inwall, and matches with the rectangular profile of nozzle body 3.Atomizing particle exit in this example also can adopt Laval nozzle version.
Refer to Figure 26, Figure 26 is gas piping interior flow field non-uniform Distribution schematic diagram in a kind of nozzle body.As shown in figure 26, when described air inlet pipeline 1 to be entered in nozzle body by the upper end sidepiece (be illustrated as left side) of nozzle body 3 and is communicated with gas piping 5, after its gas passed into enters gas piping, the flow field of a non-uniform Distribution can be formed.Away from the direction of gas feed, gas is more, then forms the relatively less region of a gas in the below near gas feed.This can cause the atomizing particle formed at atomizing particle exit 4 place to have Size Distribution heterogeneous, distributed number and spatial distribution (illustrating with the different depth to show difference).
Please then consult Figure 27 ~ Figure 32, Figure 27 ~ Figure 32 is a kind of two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention with gas barrier.As shown in figure 27, for improving the uniformity of gas flowfield in orifice gas pipeline, in described gas piping 5 below gas feed, be horizontally disposed with a gas barrier 14 around liquid line 6, and the through hole 15 of a series of different sizes around liquid line 6 can be processed on described gas barrier 14.Further, can as shown in figure 28, through hole 15 (legend is circular hole) be reduced to process by its orient diameter away from gas feed successively.
Please continue to refer to Figure 28 ~ Figure 30.On described gas barrier 14, the shape of through hole 15 can comprise circle, triangle or polygon.As shown in figure 28, its shape of through holes is the circle that size diminishes successively; As shown in figure 29, its shape of through holes is the triangle that size diminishes successively; As shown in figure 30, its shape of through holes is the pentagon that size diminishes successively.
As shown in figure 31, can also adopt and process arc-shaped through-hole 15 form around liquid line 6 to regulate air-flow on described gas barrier 14.As shown in figure 32, this arc-shaped through-hole 15 can reduce (illustrating direction from left to right) processing gradually by its direction opening away from gas feed.
In addition, in the manufacture process of semiconductor devices, semiconductor crystal wafer will stand the PROCESS FOR TREATMENT such as such as mask, etching, deposit and cleaning, forms the electronic circuit needed for semiconductor devices thus.Along with diminishing gradually of dimensions of semiconductor devices, the pollutant removing crystal column surface becomes more and more important, thus makes cleaning in the manufacture process of semiconductor devices, become very crucial.After wafer often stands one-time process process, all need to be cleaned.But the cleaning of routine can only remove the pollutant in crystal circle center region, and effectively can not remove the pollutant of crystal round fringes.And if the pollutant of crystal round fringes can not get good removal, the harm of at least two aspects will be caused: one is that pollutant such as the metal ion of crystal round fringes can be diffused into crystal circle center region, and then pollute whole wafer, thus reduce the fine ratio of product of semiconductor devices; Two is that the pollutant of crystal round fringes can be transferred on other wafer by the use of edge clamping, wafer clamp and wafer cassette etc., causes the pollution to other wafer.
For this reason, the present invention, by designing the adjustable two-phase flow atomized spray cleaning device of a kind of injection direction, while carrying out normal wash, can realize the cleaning to crystal round fringes, thus improves the yield of chip manufacturing.
Refer to Figure 33 ~ Figure 34, Figure 33 ~ Figure 34 is the one rotatable two-phase flow atomized spray cleaning device structural representation in a preferred embodiment of the present invention.As shown in figure 33, can, on the basis of the invention described above two-phase flow atomized spray cleaning device, in the outside of described nozzle body 3, by rotary part, the such as rotary buckle 16 being mated setting, nozzle body 3 can be rotated in rotary buckle 16.Further, also can protective cover 17 in described nozzle body side, along its rotation direction peripheral hardware one vertical direction, such as can extend the arc protective cover 17 that installation one has one fixed width below rotary buckle 16, and arrange vertically downward.As shown in figure 34, the sharp processing of nozzle body 3 can be gone out a spherical portion, rotary buckle 16 can be divided into the two parts engaged up and down, and there is the clamping inner chamber matched with nozzle body spherical portion profile, so that the spherical portion of nozzle body 3 is blocked, make nozzle body 3 can and rotary buckle 16 between realize relatively rotating.
During cleaning, wafer is fixed on the rotation platform in cleaning chambers, rotates with certain speed; Nozzle body is turned to crystal column surface angled, and towards away from crystal circle center direction, aim at crystal round fringes and clean.After cleaning liquid sputters, major part flies to the direction beyond wafer; small part flies to the liquid knockout of crystal circle center on protective cover 17, is dropped in crystal column surface downwards, under the effect of wafer rotary centrifugal force; throw away wafer, can prevent from causing the secondary pollution to crystal circle center.Manual adjustment can be adopted to the adjustment of nozzle body angle, or install motor additional above nozzle body, change the direction of two-phase flow atomizer relative to crystal column surface by transmission device.
Refer to Figure 35 ~ Figure 36, Figure 35 ~ Figure 36 is a kind of two-phase flow atomized spray cleaning device in a preferred embodiment of the present invention structural representation when being positioned at cleaning chambers.As shown in figure 35, at cleaning chambers 21 built with rotation platform 22, rotation platform is provided with grip unit 25, for fixing wafer 20; Rotation platform is driven by motor 23 and can realize rotating.Below cleaning chambers 21, be provided with devil liquor recovery unit, the waste liquid in cleaning process is discharged in the devil liquor recovery outlet 24 by cavity bottom.The nozzle body 3 of cleaning device of the present invention is hung in cleaning chambers, and can fully movement above rotation platform 22.Nozzle body 3 is connected on spray arm 18 also fixing by water influent pipeline 2 and air inlet pipeline 1.
Refer to Figure 35.Two-phase flow atomized spray cleaning device of the present invention also comprises a liquid rinse pipeline 19, is located in cleaning chambers, and can be positioned at the oblique upper of rotation platform 23, and such as, above the inwall side that can be arranged on cleaning chambers 21, its outlet is arranged towards the center of rotation platform 22.
When carrying out two-phase flow atomization cleaning technique, except the road cleaning liquid introduced by water influent pipeline, liquid line in atomizer inside, also additionally need the liquid rinse pipeline 19 of a large discharge, its effect be wafer 20 surface formed one deck cover completely, equally distributed cleaning liquid film.The atomization of liquid particle that independent dependence two-phase flow atomizer produces may be not enough to the area covering whole wafer, also cannot form best cleaning performance simultaneously.When in the cleaning liquid film of the high speed atomisation particles hit sprayed from two-phase flow atomizing particle exit at crystal column surface, an impulsive force can be produced, and in liquid film, form the shock wave of fast propagation.When this shock wave is on particulate pollutant, the process that pollutant departs from from crystal column surface can be accelerated on the one hand; On the other hand, shock wave can accelerate the flowing velocity of crystal column surface cleaning liquid, impels particulate pollutant to be taken away crystal column surface along with the flowing of liquid quickly.
When cleaning, described spray arm 18 can movement locus as shown in figure 37, and the circular arc driving nozzle body 3 to do wafer 20 center of circle moves back and forth, and carries out mobile atomization cleaning to the wafer on rotation platform 22.
Please continue to refer to Figure 35.Large discharge liquid enters from the large discharge liquid inlet 19-2 of liquid rinse pipeline 19, spray from large discharge liquid outlet, its spray angle adjusts accordingly by large discharge Liquid inject angle adjusting 19-1, enables large discharge liquid be ejected into the center of wafer 20.In technical process, large discharge liquid rinse pipeline 19 is first opened, jet cleaning liquid, until cleaning liquid covers crystal column surface completely, now opens two-phase flow atomizer and starts cleaning.In two-phase flow atomizer cleaning process, large discharge liquid line can be held open or close or intermittent unlatching, depends on the technological parameters such as water influent pipeline flow, large discharge fluid flow, wafer rotating speed.
Refer to Figure 36.The mode be mounted on by liquid rinse pipeline 19 on spray arm 18 can also be adopted, make the large discharge liquid outlet of liquid rinse pipeline 19 be positioned at the side of described nozzle body 3, and arrange vertically downward.Be with the difference of structure shown in Figure 35, large discharge liquid rinse pipeline 19 is fixed on after on spray arm 18, synchronously can carry out arc swing along with the swing of nozzle body 3.
In addition, as further optimal design, the gas flow regulating valve being used for adjusting gas flow can also be set on described air inlet pipeline 1, also can the liquid flow regulating valve being used for regulates liquid flow be set in described water influent pipeline 2 further.Wherein, can gas flow be controlled between 10L/min ~ 150L/min, preferably between 60 ~ 100L/min, fluid flow be controlled between 10ml/min ~ 500ml/min, preferably between 50ml/min ~ 200ml/min.
The large discharge liquid flow regulating valve being used for regulates liquid flow can also be set on the liquid rinse pipeline 19 of large discharge.Its flow can be controlled between 100ml/min ~ 2000ml/min, preferably between 500ml/min ~ 1000ml/min.
The pneumatic operated valve being used for gauge tap can also be set on the liquid rinse pipeline 19 of described air inlet pipeline 1, water influent pipeline 2 and large discharge.
The principle of the atomizer formation atomizing particle of the two-phase flow atomized spray cleaning device of the invention described above is as follows: the cleaning liquid in water influent pipeline enters the separating liquid pipeline in divergent shape along the liquid line in nozzle body, and from guiding fluid outlet ejection; The gross area due to guiding fluid outlet is less than the sectional area of water influent pipeline and liquid line, cleaning liquid is produced and accelerates, be divided into the liquid stream of several diameters in micron dimension simultaneously, and with the oblique injection of angle preset.Same, the gas of air inlet pipeline, by the gas channeling outlet injection bottom the gas piping in nozzle body, forms the gas flow of several diameters in micron dimension, and penetrates along the vertical axial direction of nozzle body.Have an effect in the below that gas flow and liquid stream export at gas channeling, liquid stream is broken up forms ultra micro atomizing particle.After ultra micro atomizing particle is formed, under the effect of gas flow, do accelerated motion downwards.For the atomizing particle exit with VERTICAL TUBE wall construction; the uneven ultra micro atomizing particle in vertical axial direction of the direction of motion and nozzle body can impinge upon on the sidewall of atomizing particle exit; again converge and become large drop; flowed down by tube wall, ensure the direction of motion uniformity of the atomizing particle ejected from atomizing particle exit with this.
Below by detailed description of the invention, a kind of cleaning method of above-mentioned two-phase flow atomized spray cleaning device that uses of the present invention is described in detail.
A kind of cleaning method using above-mentioned two-phase flow atomized spray cleaning device of the present invention, can comprise:
First, the movement locus of setting spray arm 18 and cleaning menu, start cleaning.
Wafer 20 is fixed on rotation platform 22 by wafer mounting apparatus (grip unit in such as Figure 35,36), and rotates with certain speed under the drive of motor 23.
Then, open liquid rinse pipeline 19 and regulate flow, to crystal column surface large discharge jet cleaning liquid, to form the equally distributed cleaning liquid film of one deck at crystal column surface.
Then, after a certain time, preferably between 3s ~ 10s, open water influent pipeline 2 and regulate flow, passing into cleaning liquid to the liquid line 6 in nozzle body 3; Open air inlet pipeline 1 simultaneously, pass into the gas of certain flow to the gas piping 5 in nozzle body 3, make to form ultra micro atomizing particle with the angular slope directive preset from the concurrent raw atomizing of gas of gas channeling outlet 12 ejection from the cleaning liquid of guiding fluid outlet 11 ejection.By regulating the flow of water influent pipeline 2 and air inlet pipeline 1, adjust the size of aerosolized liquid particles.
The aerosolized liquid particles generated is under the drive of high-speed gas, and under the vertically-guided of atomizing particle exit 4 vertical inner wall or the acceleration of Laval nozzle structure, vertically inject in the cleaning liquid thin layer of crystal column surface, the physical force of increasing action on pollutant, drive the vibration of cleaning fluid thin layer simultaneously, accelerate the transmittance process of pollutant to cleaning liquid fluid, improve cleaning efficiency, better complete atomization cleaning technique.
As one preferred embodiment, by the flow control valve regulating pipeline to arrange, be 100 ~ 2000ml/min by the cleaning liquid flow-control of described liquid rinse pipeline 19, be 10 ~ 500ml/min by the cleaning liquid flow-control of described water influent pipeline 2, and the gas flow of described air inlet pipeline 1 is controlled to be 10 ~ 150L/min, to form the ultra micro atomizing particle of size uniformity.
Further preferably, can be 500 ~ 1000ml/min by the cleaning liquid flow-control of described liquid rinse pipeline 19, be 50 ~ 200ml/min by the cleaning liquid flow-control of described water influent pipeline 2, the gas flow of described air inlet pipeline 1 is controlled to be 60 ~ 100L/min, to form the more homogeneous ultra micro atomizing particle of size.
As other preferred embodiment, the cleaning liquid passed in liquid rinse pipeline 19 of the present invention and water influent pipeline 2 can comprise chemical liquid or ultra-pure water, and the gas passed in air inlet pipeline 1 can comprise nitrogen, carbon dioxide or compressed air.Especially, described liquid rinse pipeline 19 and the cleaning liquid passed in water influent pipeline 2 can identical, also can be different.Which kind of gas of concrete employing and liquid, can be decided according to the actual requirements.
In sum, the present invention has following distinguishing feature:
1, by the atomizing nozzle structure exported by guiding fluid and gas exit is formed, the high-speed liquid stream making it spray and high velocity gas stream produce and interact fully, and by adjustment piping flow, form the ultra micro atomized drop that particle size is homogeneous, adjustable, greatly can reduce atomized particle size, reduce the energy that it has, avoid becoming damage to crystal column surface figure structure; When atomizing particle exit has Laval nozzle structure, when air inlet pipeline and water influent pipeline keep flow constant, can make to there is higher speed, to improve cleaning efficiency from the atomizing particle of device end outlet injection.
2, when atomizing particle exit has vertical inner wall structure, the vertically-guided effect produced by atomizing particle exit, can make in technical process airflow direction and crystal column surface perpendicular, promote that the impurity in surface grooves figure is to the transmission of bodies of fluid, improve the efficiency of cleaning, improve cleaning performance, and the cross shear of atomizing particle to crystal column surface figure structure can be reduced, prevent the damage of crystal column surface figure structure; Meanwhile, be conducive to saving cleaning liquid.
3, size uniformity can be formed, adjustable atomizing particle rinses crystal column surface, because the quality of atomizing particle is little, but also crystal column surface can be made to be pre-existing in one deck sprayed the cleaning liquid film formed with large discharge by liquid rinse pipeline, thus the impulsive force that can reduce crystal column surface structure, and the damage to crystal column surface figure structure can be reduced; Simultaneously, the shock wave produced when atomizing particle can be utilized to clash into cleaning liquid film is on particulate pollutant, the process that pollutant departs from from crystal column surface can be accelerated on the one hand, on the other hand, shock wave can accelerate the flowing velocity of crystal column surface cleaning liquid, impels particulate pollutant to be taken away crystal column surface along with the flowing of liquid quickly.
4, with the nozzle gas-liquid guiding parts design of spiral liquid/gas channeling outlet, the nebulization efficiency of cleaning liquid can be improved, reduce the diameter of atomizing particle, improve the uniformity of atomizing particle; And design with the liquid/gas exit of Laval nozzle structure, liquid/gas can be made to have higher speed from during its outlet ejection.
5, nozzle body can design becomes fan-shaped, triangle, polygon or strip, can improve the area coverage of nozzle, increases atomizer cleaning area at one time, improves cleaning uniformity, improves the cleaning efficiency of device.
6, by arranging gas barrier in gas piping, the distribution of uniform gas flowfield can be realized, improve the uniformity of atomized particle size and distributed number.
7, rotary part and protective cover structure are set up in nozzle body outside; can make nozzle and crystal column surface angled, towards away from crystal circle center direction, aim at crystal round fringes cleaning; effectively to remove the pollutant of crystal round fringes, and can prevent cleaning liquid from sputtering the secondary pollution caused.
Above-describedly be only the preferred embodiments of the present invention; described embodiment is also not used to limit scope of patent protection of the present invention; therefore the equivalent structure that every utilization description of the present invention and accompanying drawing content are done changes, and in like manner all should be included in protection scope of the present invention.
Claims (26)
1. a two-phase flow atomized spray cleaning device, for carrying out atomization cleaning to the wafer be placed in cleaning chambers on rotation platform, is characterized in that, described cleaning device comprises:
Nozzle body, its inside is provided with liquid line, gas piping is provided with around liquid line, nozzle body lower end is provided with gas-liquid guiding parts, gas-liquid guiding parts is provided with the multichannel separating liquid pipeline being communicated with liquid line with certain symmetric relation level, there is between each separating liquid pipeline the web plate of giving vent to anger being communicated with gas piping, web plate of giving vent to anger vertically is provided with the outlet of densely covered majority gas channeling, and being provided with nozzle body axis along each separating liquid pipeline is that the majority guiding fluid that has a down dip of predetermined angle exports; Described guiding fluid outlet and/or gas channeling outlet are Straight, helically coiled or Laval nozzle structure;
Water influent pipeline and air inlet pipeline, be connected on a spray arm, and be communicated with liquid line, gas piping in nozzle body respectively, and the circular arc that described spray arm drives nozzle body to do the wafer center of circle moves back and forth;
Atomizing particle exit, around being located at below gas-liquid guiding parts, it is Laval nozzle structure or has vertical inwall;
Wherein, the liquid being exported ejection by guiding fluid with exported by gas channeling that the gas sprayed is crossing below gas-liquid guiding parts forms atomizing particle, and spray to crystal column surface downwards through atomizing particle exit.
2. cleaning device according to claim 1, it is characterized in that, the shape of cross section of described nozzle body comprises circle, triangle or polygon, the multichannel separating liquid pipeline of described gas-liquid guiding parts is common connectivity points with liquid line lower end, and by uniform spoke-like setting, the web plate of giving vent to anger of almost fan is formed between adjacent liquid distribution pipeline, the guiding fluid outlet of each separating liquid pipeline is positioned at below web plate of giving vent to anger, and the downward-sloping setting of gas channeling Way out of web plate of giving vent to anger towards its corresponding side.
3. cleaning device according to claim 2, is characterized in that, it is the end face that predetermined angle has a down dip that described separating liquid pipeline has with the vertical axis of nozzle body, and described guiding fluid outlet is vertically drawn by this end face.
4. the cleaning device according to claim 1 or 3, is characterized in that, described predetermined angle is 10 ~ 80 °.
5. cleaning device according to claim 4, is characterized in that, described predetermined angle is 30 ~ 60 °.
6. cleaning device according to claim 1, is characterized in that, when described guiding fluid outlet and/or gas channeling outlet are for straight tube or helically coiled, its cross sectional shape comprises circle, triangle, polygon.
7. cleaning device according to claim 1, is characterized in that, described Laval nozzle structure comprises collapsible tube, narrow larynx, convergent divergent channel successively, and the longitudinal section of described collapsible tube and/or convergent divergent channel has the tube wall shape of straight line or arc line shaped.
8. cleaning device according to claim 7, is characterized in that, described narrow larynx is one section of sizing tube.
9. cleaning device according to claim 1, it is characterized in that, described water influent pipeline by the middle part of the upper surface of nozzle body or upper end sidepiece enter in nozzle body and be communicated with liquid line, enter in nozzle body in the middle part of the corresponding upper end sidepiece by nozzle body of described air inlet pipeline or upper surface and be communicated with gas piping.
10. cleaning device according to claim 1, it is characterized in that, the shape of cross section of described nozzle body is fan-shaped, the multichannel separating liquid pipeline of described gas-liquid guiding parts with one with the separating liquid pipeline of fan-shaped dead in line for trunk, and by this trunk separating liquid pipeline connection liquid line lower end, other symmetrical its both sides of apportion of separating liquid pipeline, and the limit fan-shaped with homonymy is parallel; Separating liquid pipeline is formed with exterior domain and to give vent to anger web plate, is provided with two row has a down dip towards its direction, both sides respectively and be that the guiding fluid that arranges of predetermined angle exports with the vertical axis of nozzle body along each separating liquid pipeline.
11. cleaning devices according to claim 1, it is characterized in that, the shape of described nozzle body is the strip of level, its inside is provided with liquid line and gas piping side by side along long axis direction, and be communicated with water influent pipeline separately, air inlet pipeline, at liquid line and gas BOP, be provided with along its long axis direction the guiding fluid that some row of being communicated with it be arranged in parallel separately to export, gas channeling exports, each guiding fluid outlet, gas channeling outlet arranges in the horizontal axis bilateral symmetry of nozzle body, and be that identical predetermined angle dips down mutually and arranges with this horizontal axis, atomizing particle exit is around being located at below guiding fluid outlet and gas exit.
12. cleaning devices according to claim 9, it is characterized in that, when described air inlet pipeline by the upper end sidepiece of nozzle body enter in nozzle body be communicated with gas piping time, a gas barrier is horizontally disposed with around liquid line in described gas piping below its gas feed, described gas barrier is provided with the through hole of a series of different sizes around liquid line, and it reduces successively by the direction size away from gas feed.
13. cleaning devices according to claim 12, is characterized in that, the shape of described through hole comprises circle, triangle or polygon.
14. cleaning devices according to claim 12, is characterized in that, described gas barrier is provided with one around the arc-shaped through-hole of liquid line, and it reduces gradually by the direction opening away from gas feed.
15. cleaning devices according to claim 1, is characterized in that, described nozzle body is rotated by the rotary part being mated peripheral hardware, the protective cover in described nozzle body side, along its rotation direction peripheral hardware one vertical direction.
16. cleaning devices according to claim 15, is characterized in that, described nozzle body has a spherical portion, and described rotary part is around this spherical portion and the rotary buckle of rotatable clamping; Described protective cover is connected at below rotary buckle, and it has the block surface of arc.
17. cleaning devices according to claim 1, is characterized in that, also comprise a liquid rinse pipeline, are located in cleaning chambers, and be positioned at the oblique upper of rotation platform, and its outlet is arranged towards the center of rotation platform.
18. cleaning devices according to claim 1, is characterized in that, also comprise a liquid rinse pipeline, are connected on spray arm, and its outlet is positioned at described nozzle body side, and arranges vertically downward.
19. cleaning devices according to claim 6, is characterized in that, the diameter of the outlet of described gas channeling and/or guiding fluid outlet or to push up the end high be 1 ~ 1000 μm.
20. cleaning devices according to claim 19, is characterized in that, the diameter of the outlet of described gas channeling and/or guiding fluid outlet or to push up the end high be 200 ~ 400 μm.
21. 1 kinds of cleaning methods using the two-phase flow atomized spray cleaning device described in claim 1 ~ 20 any one, it is characterized in that, comprise: the movement locus of setting spray arm and cleaning menu, start cleaning, first start wafer to rotate, and open liquid rinse pipeline, to crystal column surface large discharge jet cleaning liquid, to form the equally distributed cleaning liquid film of one deck at crystal column surface, then water influent pipeline is opened, the cleaning liquid of certain flow is passed into the liquid line in nozzle body, open air inlet pipeline simultaneously, the gas of certain flow is passed into the gas piping in nozzle body, make to form ultra micro atomizing particle with the angular slope directive preset from the concurrent raw atomizing of gas of gas channeling outlet ejection from the cleaning liquid of guiding fluid outlet ejection, then under the vertically-guided of atomizing particle exit or the acceleration of Laval nozzle structure, inject in the cleaning liquid thin layer of crystal column surface, to carry out mobile atomization cleaning to wafer.
22. cleaning methods according to claim 21, it is characterized in that, the cleaning liquid flow of described liquid rinse pipeline is 100 ~ 2000ml/min, and the cleaning liquid flow of described water influent pipeline is 10 ~ 500ml/min, and the gas flow of described air inlet pipeline is 10 ~ 150L/min.
23. cleaning methods according to claim 22, it is characterized in that, the cleaning liquid flow of described liquid rinse pipeline is 500 ~ 1000ml/min, and the cleaning liquid flow of described water influent pipeline is 50 ~ 200ml/min, and the gas flow of described air inlet pipeline is 60 ~ 100L/min.
24. cleaning methods according to claim 21, is characterized in that, after opening liquid rinse pipeline, interval 3 ~ 10s opens water influent pipeline and air inlet pipeline more simultaneously.
25. cleaning methods according to claim 21, it is characterized in that, described cleaning liquid comprises chemical liquid or ultra-pure water, described gas comprises nitrogen, carbon dioxide or compressed air.
26. cleaning methods according to claim 21, is characterized in that, described liquid rinse pipeline and the cleaning liquid passed in water influent pipeline can identical, also can be different.
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