CN105149308A - Cleaning device and cleaning method having static-eliminating function - Google Patents
Cleaning device and cleaning method having static-eliminating function Download PDFInfo
- Publication number
- CN105149308A CN105149308A CN201510698073.7A CN201510698073A CN105149308A CN 105149308 A CN105149308 A CN 105149308A CN 201510698073 A CN201510698073 A CN 201510698073A CN 105149308 A CN105149308 A CN 105149308A
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- liquid
- cleaning device
- cleaning
- gas
- gas vent
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05F—STATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
- H05F3/00—Carrying-off electrostatic charges
- H05F3/06—Carrying-off electrostatic charges by means of ionising radiation
Abstract
The invention discloses a cleaning device having a static-eliminating function. The cleaning device comprises a body, one or more liquid inlets and one or more gas inlets are formed in the upper portion of the body, a liquid outlet communicated with the liquid inlet(s) is formed in the middle of the lower end of the body, one or more gas outlets communicated with the gas inlet(s) are further formed in the lower end of the body, and each gas outlet is in a horn shape; when only one gas outlet is formed, the gas outlet is formed around the liquid outlet, and when multiple gas outlets are formed, the gas outlets are evenly formed in the outer side of the liquid outlet in a symmetrical mode. The invention further discloses a cleaning method having the static-eliminating function. By means of the cleaning device and cleaning method having static-eliminating function, electrostatic discharge arcs can be eliminated and static electricity on the surface of wafers can be removed within an effective cleaning area, and meanwhile the operation of laminar flow wind for cleaning a process chamber is not affected.
Description
Technical field
The present invention relates to semiconductor integrated circuit manufacturing equipment technical field, more specifically, relate to a kind of cleaning device and the cleaning method in wet clean process with removal electrostatic interaction.
Background technology
Along with the high speed development of semiconductor integrated circuit manufacturing technology, the pattern character size of IC chip has entered into the deep-submicron stage, causes the characteristic size of the crucial pollutant (such as particle) of superfine circuit malfunction or damage on chip also greatly to reduce thereupon.
In the process for making of integrated circuit, semiconductor crystal wafer usually all can through multiple tracks processing steps such as such as thin film deposition, etching, polishings.And these processing steps just become the important place that pollutant produces.In order to keep the clean conditions of crystal column surface, eliminating the pollutant being deposited on crystal column surface in each processing step, cleaning treatment must be carried out to the crystal column surface that subjected to after per pass processing step.Therefore, cleaning becomes processing step the most general in integrated circuit fabrication process, its object is to the contamination level effectively controlling each step, to realize the target of each processing step.
One chip wet clean process in integrated circuit fabrication process is the cleaning way that 65nm and following technology are mainly used for wafer manufacture.Clean different from slot type, one chip cleaning utilizes spray equipment cleansing medium to be ejected into crystal column surface to reach cleaning performance.But in one chip cleaning process, inevitably produce electrostatic, the electrostatic that the Relative friction of the electrostatic that such as high-speed rotating system and windage produce, cleansing medium and wafer produces and the electrostatic that cleansing medium itself carries etc.
Above-mentioned produced electrostatic can make particle or chemical spot produce polarization electric double layer effect, causes it to be chargedly adsorbed on crystal column surface, affects the cleaning performance of wafer.And dust under the effect of statcoulomb power or dirt also can cause short circuit, loose contact to the circuit on wafer, make device performance impaired.Meanwhile, the arc discharge that electrostatic phenomenon causes under certain condition, also can cause damage to the figure on wafer, reduces product yield.Therefore, the removal of electrostatic seems particularly important in single piece type cleaning technique.
The method that tradition eliminates processing chamber electrostatic utilizes laminar winds to take the negative ions that electrostatic ionic rod produces to process area, to reach the effect removing electrostatic.This method high-speed punching washing lotion is dripped and the fricative electrostatic of process cavity effective.But, in order to avoid destroying laminar winds, electrostatic atomiser needs to arrange near FFU (FanFilterUnit, fan filter) usually, therefore not obvious to the adsorption effect of electrostatic particle already contg in liquid, this have impact on the electrostatic removal effect in cleaning process.
Summary of the invention
The object of the invention is to the above-mentioned defect overcoming prior art existence, there is provided a kind of and there is the cleaning device and cleaning method of removing electrostatic interaction, the electrostatic of static discharge electric arc and removal crystal column surface can be eliminated in cleaning effective coverage, do not affect again the laminar winds running of cleaning chamber simultaneously.
For achieving the above object, technical scheme of the present invention is as follows:
A kind of have the cleaning device removing electrostatic interaction, comprise a body, described body upper part is provided with one to several liquid-inlets and to several gas feeds, the liquid outlet of a connection liquid-inlet is provided with in the middle part of body lower end, body lower end is also provided with the gas vent of one or several connection gas feeds, and described gas vent is tubaeform; Wherein, when described gas vent is one, it is arranged around described liquid outlet, when described gas vent is several, its in a symmetrical uniform ring around described liquid outlet arranged outside.
Preferably, described body upper center is provided with a gas feed, its side is arranged with some liquid-inlets, each liquid-inlet is respectively by its liquid branch flow passage and be communicated to liquid outlet after the vertical first liquid sprue of interflow formation one, one gas vent is arranged around the first liquid sprue of liquid outlet and top thereof, it forms the flared cavity shunk gradually in body, and is communicated with gas feed from the top of cavity, and each liquid branch flow passage is through cavity connects first liquid sprue.
Preferably, described first liquid sprue has cylinder outline, forms cavity between itself and flaring gas vent.
Preferably, the spacing between described cylinder outline and gas vent inwall increases setting from top to bottom gradually.
Preferably, described cylinder outline upwards has one section of back taper from liquid outlet.
Preferably, gas vent lower surface is not less than liquid outlet.
Preferably, described body upper center is provided with a liquid-inlet, its side is provided with some gas feeds symmetrically and evenly, be connected by a vertical second liquid sprue between liquid-inlet with liquid outlet, each gas feed is connected with each self-corresponding tubaeform gas vent in body lower end respectively by a vertical gas flow.
Preferably, each gas vent lower surface is equal, and is not less than liquid outlet.
Preferably, described liquid outlet is given prominence to body lower surface and is arranged, and it has back taper outer wall profile, and corresponding with the tubaeform inwall angle of each gas vent.
Preferably, the connection of gas vent and gas flow has rounding off.
A kind of have the cleaning method removing electrostatic interaction, adopt above-mentioned cleaning device, comprise: cleaning device is placed in above pending wafer, wafer is rotated, then opens cleaning device, to the vertical jet cleaning media fluid of crystal column surface, scan-type cleaning is carried out to wafer, meanwhile, with divergent shape and around media fluid mode, to crystal column surface jet band electron ion wind, to eliminate the electrostatic of static discharge electric arc and removal crystal column surface in cleaning effective coverage.
Preferably, described charged ion wind is with positive and negative electric charge.
Preferably, described charged ion wind with positive and negative electric charge can be equal quantities or inequality.
Preferably, described media fluid is deionized water or chemical reagent.
Preferably, described charged ion wind sprays to form the circle of divergent shape, square, rhombus or polygon form around media fluid.
As can be seen from technique scheme, the present invention is by removing function i ntegration around the outlet of cleansing medium liquid by electrostatic, because the operating distance of charged ion wind and wafer is short, the contact probability of its positive and negative electric charge carried and crystal column surface can be improved, gas vent adopts flaring divergent shape structure, the contact area of charged ion wind and crystal column surface can be increased, reduce in positive and negative ion and probability, thus the electrostatic removal effect can improved in cleaning process, improve electrostatic removal efficiency, do not affect again the laminar winds running in whole chamber simultaneously.
Accompanying drawing explanation
Fig. 1-Fig. 4 is that a kind of of the embodiment of the present invention one has the cleaning device structural representation removing electrostatic interaction;
Fig. 5-Fig. 7 is that a kind of of the embodiment of the present invention two has the cleaning device structural representation removing electrostatic interaction.
Detailed description of the invention
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in further detail.
It should be noted that, in following detailed description of the invention, when describing embodiments of the present invention in detail, in order to clearly represent structure of the present invention so that explanation, special to the structure in accompanying drawing not according to general scale, and carried out partial enlargement, distortion and simplify processes, therefore, should avoid being understood in this, as limitation of the invention.
The present invention, by providing following a kind of cleaning device with removal electrostatic interaction, for eliminating the electrostatic of static discharge electric arc and removal crystal column surface in the effective coverage of cleaning, does not affect again the laminar winds running of cleaning chamber simultaneously.
A kind of cleaning device with removal electrostatic interaction of the present invention, comprise a body, described body upper part is provided with one to several liquid-inlets and to several gas feeds, the liquid outlet of a connection liquid-inlet is provided with in the middle part of body lower end, body lower end is also provided with the gas vent of one or several connection gas feeds, and described gas vent is tubaeform; Wherein, when described gas vent is one, it is arranged around described liquid outlet, when described gas vent is several, its in a symmetrical uniform ring around described liquid outlet arranged outside.
Embodiment one
In a following specific embodiment of the present invention, refer to Fig. 1-Fig. 4, Fig. 1-Fig. 4 is that a kind of of the embodiment of the present invention one has the cleaning device structural representation removing electrostatic interaction.First refer to Fig. 1, the profile of its display cleaning device of the present invention and top structure.As shown in Figure 1, a kind of cleaning device with removal electrostatic interaction of the present invention, has the body 1 of a near cylindrical.Be processed with a gas feed 2 at the middle part of body 1 upper surface, around gas feed 2 side, (axial symmetry or Central Symmetry) is processed with two liquid-inlets 3 symmetrically.Certainly, as required and structural allocation, the quantity of gas feed can be more than one, and the quantity of liquid-inlet also can adopt one or more than two forms.Liquid-inlet and gas feed also can process the side on the nearly top of body.The present invention can be not limited thereto.
Refer to Fig. 2, the polycrystalline substance of its display cleaning device of the present invention.As shown in Figure 2, in the middle part of the lower surface of body, be processed with a liquid outlet 5, liquid outlet is communicated to liquid-inlet 3.Body lower surface is also processed with a gas vent 4, and the structure of gas vent 4 is tubaeform, and arranges around liquid outlet 5.The lower surface of gas vent can flush with or slightly higher than liquid outlet with liquid outlet; The upper surface (i.e. its entrance) of gas vent 4 is communicated to gas feed 2.Upwards there is from liquid outlet 5 in body the outline 6 of cylinder, be combined with gas vent 4 shape looking like an electric horn.
Refer to Fig. 3, the internal structure in its display cleaning device one cutting direction of the present invention.As shown in Figure 3, two liquid-inlets 3 enter in body respectively by its liquid branch flow passage 7, and the first liquid sprue 8 that interflow formation one is vertical further, be then communicated to liquid outlet 5.First liquid sprue 8 has cylinder outline 6, forms cavity 9 between itself and flaring gas vent 4.Two liquid branch flow passages 7 are communicated with first liquid sprue 8 (because of the relation in cutting direction, the liquid branch flow passage outline that the cavity top in this direction is through occupies) through cavity 9.
Refer to Fig. 4, its display cleaning device of the present invention and Fig. 3 are the internal structure of 90 degree of direction cuttings.As shown in Figure 4, the first liquid sprue 8 that gas vent 4 is communicated with around liquid outlet 5 and top thereof is arranged, gas vent 4 top in body forms the flared cavity 9 shunk gradually, form gas flow between the tubaeform inwall of gas vent 4 and cylinder outline 6, and be communicated to gas feed 2 from the top of cavity 9.
Cleaning device of the present invention in use, cleansing medium liquid (can be deionized water or chemical reagent) passes into from liquid-inlet, converge the pending crystal column surface vertically spraying to below from liquid outlet to first liquid sprue through two liquid branch flow passages, cleaning device body is swingable, carries out scan-type cleaning to wafer.In cleaning process, in order to eliminate the electrostatic of static discharge electric arc and removal crystal column surface, electrostatic is removed function i ntegration on cleansing medium shower nozzle (body) by the present invention, namely around liquid outlet around arranging flaring gas vent, when shower nozzle does swing cleaning, charged ion wind is passed into (with just from gas feed, negative electrical charge), be that divergent shape is injected in crystal column surface by gas vent around media fluid, static discharge electric arc can be eliminated in effective district of washer jet, and reach the effect of removing crystal column surface electrostatic, do not affect again the laminar winds running of cleaning chamber simultaneously.
Please continue to refer to Fig. 4.Gas vent 4 adopts ring-type divergence form to construct, and the object done like this is the contact area in order to increase charged ion wind and crystal column surface, improves electrostatic removal efficiency.Charged ion wind is through tubaeform gas vent, neutralize together because positive and negative ion is easy to encounter, thus reduce the effective charge quantity arriving crystal column surface, reduce and go static efficiency, therefore, radian design is adopted to the turning, path of the distinguished and admirable mistake of gas vent structure intermediate ion, and can only become large gradually from import to the sequence channel radius of outlet, and can not reduce.That is, need the spacing between cylinder outline 6 and gas vent 4 inwall to be processed into the version increased gradually from top to bottom.Therefore, can refer to illustrated example, the contour direction of cylinder outline 6 top matching gas vent 4 inwall is formed an approximate vertex of a cone 10, and make the air flue spacing formed between it meet current-controlled design needs; Then, shrink to the inside with round and smooth turnover, formed from liquid outlet 5 one section of inverted cone-shaped structure 11 upwards, and adopt radian design in turning point.Like this, media fluid can be fully enclosed in wherein by charged ion wind, obtains and well removes electrostatic efficiency.
Embodiment two
In following another specific embodiment of the present invention, refer to Fig. 5-Fig. 7, Fig. 5-Fig. 7 is that a kind of of the embodiment of the present invention two has the cleaning device structural representation removing electrostatic interaction.First refer to Fig. 5, the profile of its display cleaning device of the present invention and top structure.As shown in Figure 5, a kind of cleaning device with removal electrostatic interaction of the present invention, has the body 21 of a near cylindrical.Be processed with a liquid-inlet 22 at the middle part of body 21 upper surface, around liquid-inlet 22 side, (axial symmetry or Central Symmetry) is processed with four gas feeds 23 symmetrically.Certainly, as required and structural allocation, the quantity of liquid-inlet can be more than one, and the quantity of gas feed also can adopt other most forms.The present invention can be not limited thereto.
Refer to Fig. 6, the polycrystalline substance of its display cleaning device of the present invention.As shown in Figure 6, in the middle part of the lower surface of body, be processed with a liquid outlet 25, liquid outlet 25 is communicated to liquid-inlet 22.Body lower surface is also processed with four gas vents 24, and four gas feeds 23 of its position and body upper end are corresponding to the same.The structure of gas vent 24 is tubaeform, and arranges around liquid outlet 25, can increase the contact area of charged ion wind and crystal column surface, reduces in positive and negative ion and probability, improves electrostatic removal efficiency.The lower surface of gas vent 24 can be concordant with liquid outlet 25 or higher than liquid outlet, such as, illustrate the form higher than liquid outlet; The lower surface that liquid outlet 25 can protrude from body is arranged, and has the outer wall profile 26 of back taper.The upper surface (i.e. its entrance) of gas vent 24 is communicated to gas feed 23.
Refer to Fig. 7, the internal structure in its display cleaning device one cutting direction of the present invention.As shown in Figure 7, be connected between liquid-inlet 22 with liquid outlet 25 by a vertical second liquid sprue 27, four gas feeds 23 are connected with each self-corresponding tubaeform gas vent 24 in body lower end respectively by a vertical gas flow 28.The lower surface that liquid outlet 25 protrudes from body is arranged, and it has the outer wall profile 26 of back taper, and corresponding with the tubaeform inwall angle of each gas vent 24, and such as diagram is close to the structure paralleled.Thus the lower surface of each gas vent 24 is arranged higher than liquid outlet 25.Certainly, also the lower surface of each gas vent can be dropped to the position equal with liquid outlet.The lower surface of four gas vents 24 is in same level, to ensure to form uniform charged ion wind around media fluid.Encounter for reducing positive and negative ion the probability occurring together to neutralize, gas vent 24 has rounding off with the connection of gas flow 28, thus can ensure the effective charge quantity arriving crystal column surface, improves and goes static efficiency.The horizontal cross sectional geometry of gas vent can adopt circle, also can adopt square, the shape such as polygon or rhombus.
Below a kind of cleaning method with removal electrostatic interaction of the present invention is elaborated.A kind of cleaning method with removal electrostatic interaction of the present invention, have employed the cleaning device that the present invention is above-mentioned.Cleaning method comprises: be placed in above pending wafer by cleaning device, wafer is rotated, then opens cleaning device, passes into cleansing medium liquid from liquid-inlet, can be deionized water or chemical reagent; Media fluid vertically sprays to the pending crystal column surface of below from liquid outlet through second liquid sprue.Cleaning device body is swingable, carries out scan-type cleaning to wafer.
Meanwhile, pass into the charged ion wind with positive and negative electric charge from gas feed, sprayed by gas vent through gas flow, formed around the charged ion wind of media fluid also in divergent shape, media fluid is surrounded, and is injected in crystal column surface.Wherein, charged ion wind with positive and negative electric charge can be equal quantities or inequality.And, by being processed into by tubaeform gas vent, its horizontal cross-section is rounded, square, the shape such as rhombus or polygon, make around media fluid, the charged ion vane of ejection forms that the correspondence of divergent shape is circular, square, the form such as rhombus or polygon, spray to crystal column surface.
According to above-mentioned cleaning method of the present invention, the charged ion wind formed with divergent shape and around media fluid mode, will spray to crystal column surface, thus can eliminate the electrostatic of static discharge electric arc and removal crystal column surface in the cleaning effective coverage of washer jet.
In sum, the present invention is by removing function i ntegration around the outlet of cleansing medium liquid by electrostatic, because the operating distance of charged ion wind and wafer is short, the contact probability of its positive and negative electric charge carried and crystal column surface can be improved, gas vent adopts flaring divergent shape structure, the contact area of charged ion wind and crystal column surface can be increased, reduce in positive and negative ion and probability, thus the electrostatic removal effect can improved in cleaning process, improve electrostatic removal efficiency, do not affect again the laminar winds running in whole chamber simultaneously.
Above-describedly be only the preferred embodiments of the present invention; described embodiment is also not used to limit scope of patent protection of the present invention; therefore the equivalent structure that every utilization description of the present invention and accompanying drawing content are done changes, and in like manner all should be included in protection scope of the present invention.
Claims (15)
1. one kind has the cleaning device removing electrostatic interaction, it is characterized in that, comprise a body, described body upper part is provided with one to several liquid-inlets and to several gas feeds, the liquid outlet of a connection liquid-inlet is provided with in the middle part of body lower end, body lower end is also provided with the gas vent of one or several connection gas feeds, and described gas vent is tubaeform; Wherein, when described gas vent is one, it is arranged around described liquid outlet, when described gas vent is several, its in a symmetrical uniform ring around described liquid outlet arranged outside.
2. cleaning device according to claim 1, it is characterized in that, described body upper center is provided with a gas feed, its side is arranged with some liquid-inlets, each liquid-inlet is respectively by its liquid branch flow passage and be communicated to liquid outlet after the vertical first liquid sprue of interflow formation one, one gas vent is arranged around the first liquid sprue of liquid outlet and top thereof, it forms the flared cavity shunk gradually in body, and being communicated with gas feed from the top of cavity, each liquid branch flow passage is through cavity connects first liquid sprue.
3. cleaning device according to claim 2, is characterized in that, described first liquid sprue has cylinder outline, forms cavity between itself and flaring gas vent.
4. cleaning device according to claim 3, is characterized in that, the spacing between described cylinder outline and gas vent inwall increases setting from top to bottom gradually.
5. cleaning device according to claim 4, is characterized in that, described cylinder outline upwards has one section of back taper from liquid outlet.
6. the cleaning device according to Claims 1 to 5 any one, is characterized in that, gas vent lower surface is not less than liquid outlet.
7. cleaning device according to claim 1, it is characterized in that, described body upper center is provided with a liquid-inlet, its side is provided with some gas feeds symmetrically and evenly, be connected by a vertical second liquid sprue between liquid-inlet with liquid outlet, each gas feed is connected with each self-corresponding tubaeform gas vent in body lower end respectively by a vertical gas flow.
8. cleaning device according to claim 7, is characterized in that, each gas vent lower surface is equal, and is not less than liquid outlet.
9. cleaning device according to claim 7, is characterized in that, described liquid outlet is given prominence to body lower surface and arranged, and it has back taper outer wall profile, and corresponding with the tubaeform inwall angle of each gas vent.
10. cleaning device according to claim 7, is characterized in that, the connection of gas vent and gas flow has rounding off.
11. 1 kinds have the cleaning method removing electrostatic interaction, adopt cleaning device according to claim 1, it is characterized in that, comprise: cleaning device is placed in above pending wafer, wafer is rotated, then cleaning device is opened, to the vertical jet cleaning media fluid of crystal column surface, scan-type cleaning is carried out to wafer, simultaneously, with divergent shape and around media fluid mode, to crystal column surface jet band electron ion wind, to eliminate the electrostatic of static discharge electric arc and removal crystal column surface in cleaning effective coverage.
12. cleaning methods according to claim 11, is characterized in that, described charged ion wind is with positive and negative electric charge.
13. cleaning methods according to claim 12, is characterized in that, described charged ion wind with positive and negative electric charge can be equal quantities or inequality.
14. cleaning methods according to claim 11, is characterized in that, described media fluid is deionized water or chemical reagent.
15. cleaning methods according to claim 11, is characterized in that, described charged ion wind sprays to form the circle of divergent shape, square, rhombus or polygon form around media fluid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201510698073.7A CN105149308B (en) | 2015-10-23 | 2015-10-23 | It is a kind of that there is the cleaning device and cleaning method for removing electrostatic interaction |
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| CN201510698073.7A CN105149308B (en) | 2015-10-23 | 2015-10-23 | It is a kind of that there is the cleaning device and cleaning method for removing electrostatic interaction |
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| CN105149308A true CN105149308A (en) | 2015-12-16 |
| CN105149308B CN105149308B (en) | 2017-07-25 |
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| CN106024585A (en) * | 2016-05-27 | 2016-10-12 | 嘉兴晶装电子设备有限公司 | Rotary type washing and drying apparatus |
| CN106040668A (en) * | 2016-05-27 | 2016-10-26 | 京东方科技集团股份有限公司 | Dedusting device used for display screen, dedusting method and corresponding display device |
| CN111348306A (en) * | 2018-12-21 | 2020-06-30 | 天津市泊鹤农业科技发展有限公司 | A roll up membrane storage device for warmhouse booth |
| CN112235927A (en) * | 2020-09-26 | 2021-01-15 | 江苏亚电科技有限公司 | Wafer static electricity removing and cleaning device |
| CN112235926A (en) * | 2020-09-26 | 2021-01-15 | 江苏亚电科技有限公司 | Wafer static electricity removing and cleaning method |
| CN115070605A (en) * | 2022-06-22 | 2022-09-20 | 北京烁科精微电子装备有限公司 | Polishing equipment and working method thereof |
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