CN105390414B - 按需填充安瓿 - Google Patents

按需填充安瓿 Download PDF

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Publication number
CN105390414B
CN105390414B CN201510523984.6A CN201510523984A CN105390414B CN 105390414 B CN105390414 B CN 105390414B CN 201510523984 A CN201510523984 A CN 201510523984A CN 105390414 B CN105390414 B CN 105390414B
Authority
CN
China
Prior art keywords
ampoule
precursor
substrate
substrate processing
filling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201510523984.6A
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English (en)
Chinese (zh)
Other versions
CN105390414A (zh
Inventor
阮途安
伊什沃·兰加纳坦
尚卡尔·斯瓦米纳坦
阿德里安·拉沃伊
克洛伊·巴尔达赛罗尼
弗兰克·L·帕斯夸里
普鲁肖塔姆·库马尔
钱俊
康胡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
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Filing date
Publication date
Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of CN105390414A publication Critical patent/CN105390414A/zh
Application granted granted Critical
Publication of CN105390414B publication Critical patent/CN105390414B/zh
Active legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
    • B65B1/00—Packaging fluent solid material, e.g. powders, granular or loose fibrous material, loose masses of small articles, in individual containers or receptacles, e.g. bags, sacks, boxes, cartons, cans, or jars
    • B65B1/04—Methods of, or means for, filling the material into the containers or receptacles
    • B65B1/08—Methods of, or means for, filling the material into the containers or receptacles by vibratory feeders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
CN201510523984.6A 2014-08-22 2015-08-24 按需填充安瓿 Active CN105390414B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201462040974P 2014-08-22 2014-08-22
US62/040,974 2014-08-22
US14/516,452 2014-10-16
US14/516,452 US20160052651A1 (en) 2014-08-22 2014-10-16 Fill on demand ampoule

Publications (2)

Publication Number Publication Date
CN105390414A CN105390414A (zh) 2016-03-09
CN105390414B true CN105390414B (zh) 2018-07-10

Family

ID=55347636

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510523984.6A Active CN105390414B (zh) 2014-08-22 2015-08-24 按需填充安瓿

Country Status (6)

Country Link
US (1) US20160052651A1 (https=)
JP (1) JP6857960B2 (https=)
KR (1) KR102414284B1 (https=)
CN (1) CN105390414B (https=)
SG (1) SG10201506630VA (https=)
TW (1) TWI684666B (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11072860B2 (en) 2014-08-22 2021-07-27 Lam Research Corporation Fill on demand ampoule refill
US11970772B2 (en) * 2014-08-22 2024-04-30 Lam Research Corporation Dynamic precursor dosing for atomic layer deposition
US10094018B2 (en) * 2014-10-16 2018-10-09 Lam Research Corporation Dynamic precursor dosing for atomic layer deposition
US11718912B2 (en) 2019-07-30 2023-08-08 Applied Materials, Inc. Methods and apparatus for calibrating concentration sensors for precursor delivery
KR102619482B1 (ko) * 2019-10-25 2024-01-02 에이에스엠 아이피 홀딩 비.브이. 막 증착 공정에서의 정상 펄스 프로파일의 변형
CN115867999A (zh) 2020-06-06 2023-03-28 朗姆研究公司 用于半导体处理的可移除喷头面板
CN115917039A (zh) 2020-07-29 2023-04-04 朗姆研究公司 使用起泡器的浓度控制
US12084771B2 (en) 2021-03-02 2024-09-10 Applied Materials, Inc. Control of liquid delivery in auto-refill systems
CN114777024B (zh) * 2022-06-22 2022-10-28 国家管网集团北方管道有限责任公司 一种输油管线的一键启停控制方法
WO2025155439A1 (en) * 2024-01-19 2025-07-24 Lam Research Corporation Level monitoring of solid precursors

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100438960C (zh) * 2002-07-23 2008-12-03 高级技术材料公司 蒸发器输送安瓿
CN101514446A (zh) * 2008-02-22 2009-08-26 普莱克斯技术有限公司 多安瓿输送系统
CN102348829A (zh) * 2009-01-16 2012-02-08 威科仪器有限公司 用于低温沉积钌的组合物和方法
CN103688339A (zh) * 2011-07-22 2014-03-26 应用材料公司 用于ald/cvd工艺的反应物输送系统

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Publication number Priority date Publication date Assignee Title
DE1813318C3 (de) * 1968-12-07 1974-01-03 Alexander 2000 Hamburg Kueckens Zeitgesteuerte Dosiervorrichtung für flüssige Medien aus festen und elastischen Behältern
JP2004031782A (ja) * 2002-06-27 2004-01-29 Sumitomo Chem Co Ltd 有機金属ガス供給装置
US20050252449A1 (en) * 2004-05-12 2005-11-17 Nguyen Son T Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
US20060121192A1 (en) * 2004-12-02 2006-06-08 Jurcik Benjamin J Liquid precursor refill system
US8951478B2 (en) * 2006-03-30 2015-02-10 Applied Materials, Inc. Ampoule with a thermally conductive coating
KR100855582B1 (ko) * 2007-01-12 2008-09-03 삼성전자주식회사 액 공급 장치 및 방법, 상기 장치를 가지는 기판 처리설비, 그리고 기판 처리 방법
JP5305328B2 (ja) * 2007-06-07 2013-10-02 株式会社日立国際電気 基板処理装置
WO2010135250A2 (en) * 2009-05-22 2010-11-25 Applied Materials, Inc. Methods for determining the quantity of precursor in an ampoule
KR102387359B1 (ko) * 2014-04-18 2022-04-14 어플라이드 머티어리얼스, 인코포레이티드 자동-리필 앰풀 및 사용 방법들

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100438960C (zh) * 2002-07-23 2008-12-03 高级技术材料公司 蒸发器输送安瓿
CN101514446A (zh) * 2008-02-22 2009-08-26 普莱克斯技术有限公司 多安瓿输送系统
CN102348829A (zh) * 2009-01-16 2012-02-08 威科仪器有限公司 用于低温沉积钌的组合物和方法
CN103688339A (zh) * 2011-07-22 2014-03-26 应用材料公司 用于ald/cvd工艺的反应物输送系统

Also Published As

Publication number Publication date
KR20160023605A (ko) 2016-03-03
TW201623676A (zh) 2016-07-01
US20160052651A1 (en) 2016-02-25
JP2016044361A (ja) 2016-04-04
JP6857960B2 (ja) 2021-04-14
KR102414284B1 (ko) 2022-06-28
SG10201506630VA (en) 2016-03-30
CN105390414A (zh) 2016-03-09
TWI684666B (zh) 2020-02-11

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