CN105378143B - A kind of vacuum coating equipment and film plating process - Google Patents
A kind of vacuum coating equipment and film plating process Download PDFInfo
- Publication number
- CN105378143B CN105378143B CN201480038276.7A CN201480038276A CN105378143B CN 105378143 B CN105378143 B CN 105378143B CN 201480038276 A CN201480038276 A CN 201480038276A CN 105378143 B CN105378143 B CN 105378143B
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- Prior art keywords
- vacuum coating
- stent strut
- coating equipment
- support
- data line
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Abstract
The invention discloses a kind of vacuum coating equipment, data line bracket and film plating process, wherein, the vacuum coating equipment includes vapor deposition chamber and the holder for being set to vapor deposition interior, holder includes multiple first support connectors, first support connector is adapted to the first data cable connector and can patch each other fixation, and then data line is set to the vapor deposition interior.The efficiency and coating effects of data line vacuum nano plated film are improved so as to carry out batch vacuum plated film to data line by the design mating with data line structure, and the junction portion of data line can also be protected in coating process.
Description
Technical field
The present invention relates to a kind of vacuum coating equipment and film plating process.
Background technology
It high molecular material is cracked into after nano molecular the uniform gapless in vacuum environment is attached to product surface and formed
Nano protective film, referred to as vacuum vapor deposition nano-coating.The nano-coating of this technique and traditional plated film or oil spout, spray
Paint has following characteristic：1, waterproof and dampproof impunctate, good airproof performance；2, plated film acid and alkali-resistance, class of insulation height, antistatic generate；
3, coated surface smoothes out, and antifouling foul adherency, frictional force is small, easily cleans；4, appearance luster can adjust according to demand, thoroughly from height
It is bright to arrive other colors.5, coating film thickness all may be used from 0.1 micron to 50 micron or more；6, adhesion of coating film is good, without interior internal stress,
Crafters, plated film adapt to environment temperature ± 200 DEG C, do not fall off wrinkle resistant.
When nano-coating, raw material enters 650 DEG C or so of high temperature in usable material chamber after 150 DEG C of vaporization forms gaseous state
Pyrolysis furnace, resolve into nanoscale molecular.The coating chamber of room temperature is entered, is formed under vacuum conditions with the waterproof that is vapor-deposited thin
Film, uniform fold product surface pin hole and gap.It with metallising and spray paint the difference is that, as long as product surface with
Air contact can form pin-free, dense uniform, high transparency film by vacuum vapor deposition nano-coating, uniform fold.
It when due to nano-coating, needs the product surface of plated film that will be contacted with air, therefore, how filming equipment is carried out
Improving, which is one to adapt to different product plated film, technical problem to be solved.
Invention content
A kind of vacuum coating equipment of present invention offer, data line bracket and film plating process can carry out data line and criticize
Vacuum nano plated film is measured, the efficiency and coating effects of data line vacuum nano plated film are improved.
In order to solve the above technical problems, a kind of technical solution provided by the invention is：A kind of vacuum coating equipment is provided, is used
In carrying out vacuum coating to data line, described data line one end is provided with the first data cable connector, the vacuum coating equipment packet
It includes vapor deposition chamber and is set to the indoor holder of the vapor deposition, the holder includes multiple first support connectors, institute
Fixation can be adapted to first data cable connector and patch each other by stating first support connector, and then the data line is arranged
In vapor deposition interior；The vacuum coating equipment further comprise being set to the entrance of the vapor deposition chamber side wall with
And it is set to the indoor cooling distributing damper faced with the entrance of the vapor deposition, the entrance is for introducing macromolecule
Material cracked gas, the high molecular material cracked gas are spread in the vapor deposition after cooling distributing damper cooling
It is indoor.
Wherein, the holder further comprises that stent strut and multiple first support bars, the multiple first support bar are set
It is placed in the radial direction radiated entend on the stent strut and along the stent strut, the first support connector is arranged at intervals at
In the first support bar.
Wherein, multiple first card slots are arranged at intervals in the first support bar, the first support connector is fixed on institute
It states in the first card slot.
Wherein, the other end of the data line is provided with the second data cable connector, and the holder further comprises multiple
Two Support joints and multiple second support bars, the multiple second support bar along the stent strut axial direction relative to institute
It states first support bar and is arranged at intervals at radial direction radiated entend on the stent strut and along the stent strut, described second
Support joint is arranged at intervals in the second support bar, the second support connector be adapted to second data cable connector and
Fixation can be patched each other, and then the data line is set between the first support bar and the second support bar.
Wherein, multiple second card slots are arranged at intervals in the second support bar, the second support connector is fixed on institute
It states in the second card slot.
Wherein, the first support connector and the second support connector are symmetrical arranged, so that being set to described first
The data line between supporting rod and the second support bar is parallel to the axial direction of the stent strut.
Wherein, the axial direction of at least one of the first support bar and the second support bar along the stent strut
Position it is adjustable so that the spacing of the first support bar and the second support bar along the axial direction of the stent strut
It is adjustable.
Wherein, the holder further comprises the first main support ring and the second main support ring, the first main support ring and
The second main support ring is nested with the stent strut respectively to be arranged and is fixed on institute along the axial direction interval of the stent strut
It states on stent strut, the first support bar includes multiple first main support rods, and the multiple first main support rod is set to described
In first main support ring and to the outside radiated entend of the described first main support ring, the second support bar includes multiple second
Main support rod, the multiple second main support rod are set in the described second main support ring and to outside the described second main support ring
Side radiated entend.
Wherein, the holder further comprises the first auxiliary support ring, the second auxiliary support ring, multiple first auxiliary supporting rods and more
A second auxiliary supporting rod, the first auxiliary support ring are set on first main support rod and along the radial direction side of the stent strut
It is arranged to nested with the described first main support central spacer, the multiple first auxiliary supporting rod is set in the described first auxiliary support ring
And to the outside radiated entend of the described first auxiliary support ring, the second auxiliary support ring is set on second main support rod
And along the setting nested with the described second main support central spacer of the radial direction of the stent strut, the multiple second auxiliary supporting rod is set
It is placed in the described second auxiliary support ring and to the outside radiated entend of the described second auxiliary support ring.
Wherein, the vacuum coating equipment further comprises being vented column, and the exhaust column is in hollow form and in the exhaust
Multiple first ventholes are provided on the side wall of column, the stent strut is more in being provided on hollow form and the side wall of the stent strut
A second venthole, the exhaust column are inserted into the stent strut from one end of the stent strut, and the stent strut nesting is set to
It can be rotated on the outside of the exhaust column and around the exhaust column, the high molecular material cracked gas is ventilated through described first
Hole and second venthole uniformly spread and are deposited on the data line.
Wherein, second venthole is set to the first main support rod being disposed adjacent along the axial direction of the stent strut
Between and between the second main support rod for being disposed adjacent of axial direction of the stent strut.
Wherein, the vacuum coating equipment further comprises that magnetic rotation component, the magnetic rotation component include setting
In it is described vapor deposition outside the first rotary magnet and be set to it is described vapor deposition indoor the second rotary magnet,
First rotary magnet and the second rotary magnet magnetic couplings, rotation drive motor drive first rotary magnet to turn
It is dynamic, and second rotary magnet is driven to be rotated, and then drive the stent strut that can be rotated around the exhaust column.
Wherein, the exhaust column is arranged through the vapor deposition chamber, first rotary magnet and second rotation
Magnet rotates bearing in can be rotated on the exhaust column and around the exhaust column respectively.
Wherein, the exhaust column is disposed through on the bottom wall of the vapor deposition chamber and vertically extends, described
Stent strut is on the outside of the vertical direction nesting to the exhaust column and bearing is on second rotary magnet.
In order to solve the above technical problems, provided by the invention also have a kind of technical solution to be：A kind of the true of data line is provided
Empty film plating process, the vacuum coating method carry out the data line by using the vacuum coating equipment of any description above
Vacuum coating, the method includes：The Support joint of the data cable connector of the data line and holder is patched into fixation each other；It will
The vapor deposition that the holder is positioned over the vacuum coating equipment is indoor, so that the data line is set to the vapor deposition
It is indoor；High molecular material cracked gas is introduced into the vapor deposition chamber and is deposited on the data line.
The beneficial effects of the invention are as follows：Be different from the prior art, provide a kind of vacuum coating equipment, data line bracket and
Film plating process improves data by the design mating with data line structure so as to carry out batch vacuum plated film to data line
The efficiency and coating effects of line vacuum nano-coating, and data cable connector part can also be protected in coating process.
Description of the drawings
Fig. 1 is a kind of structural schematic diagram of vacuum coating equipment provided in an embodiment of the present invention；
Fig. 2 is a kind of structural schematic diagram of the exhaust column of vacuum coating equipment provided in an embodiment of the present invention；
Fig. 3 is a kind of structural schematic diagram of the stent strut of vacuum coating equipment provided in an embodiment of the present invention；
Fig. 4 is the structural schematic diagram of another vacuum coating equipment provided in an embodiment of the present invention；
Fig. 5 is a kind of flow chart of the vacuum coating method of data line provided in an embodiment of the present invention.
Specific implementation mode
The present invention is described in detail with reference to the accompanying drawings and examples.
Referring to Fig. 1, Fig. 1 is a kind of structural schematic diagram of vacuum coating equipment provided in an embodiment of the present invention, as schemed institute
Show, the vacuum coating equipment of the present embodiment is used to carry out vacuum coating to data line, and wherein data line one end is provided with the first number
According to wire terminal, vacuum coating equipment includes vapor deposition chamber 1 and is set to the indoor holder 2 of vapor deposition, and holder 2 includes more
A first support connector 21, first support connector 21 can be adapted to the first data cable connector and patch each other fixation, and then will
Data line is set in vapor deposition chamber 2.
On the basis of the embodiment of the present invention one, present invention further propose that a kind of embodiment of supporting structure, wherein
Holder 2 still further comprises stent strut 22 and multiple first support bars 23, and multiple first support bars 23 are set to stent strut 22
It above and along the radial direction of stent strut extends radially, first support connector 21 is arranged at intervals in first support bar 23, should
Embodiment is only a kind of preferable embodiment example of supporting structure, does not constitute limiting the scope of the invention,
It is every according to the technical essence of the invention to any modification, equivalent variations and modification made by the present embodiment, still fall within this hair
In the range of bright technical solution.
Multiple first card slots 24 are arranged at intervals in first support bar 23, first support connector 21 is fixed on the first card slot 24
It is interior.
Wherein, the other end of data line is additionally provided with the second data cable connector, and holder 2 further comprises multiple second supports
Connector 25 and multiple second support bars 26, multiple second support bars 26 are supported along the axial direction of stent strut 22 relative to first
Bar 23 is arranged at intervals on stent strut 22 and is extended radially along the radial direction of stent strut 22, and second support connector 25 is spaced
It being set in second support bar 26, second support connector 25 is adapted to the second data cable connector and can patch each other fixation, into
And data line is set between first support bar 23 and second support bar 26.
Multiple second card slots 27 are arranged at intervals in second support bar 26, second support connector 25 is fixed on the second card slot 27
It is interior.
First support connector 21 and second support connector 25 are symmetrical arranged, so that being set to first support bar 23 and second
Data line between supporting rod 26 is parallel to the axial direction of stent strut 22.
At least one of first support bar 23 and second support bar 26 are adjustable along the position of the axial direction of stent strut 22,
So that first support bar 23 is adjustable along the spacing of the axial direction of stent strut 22 with second support bar 26.
Wherein, holder 2 further comprises the first main support ring 28 and the second main support ring 29, the first main support ring 28 and
Two main support rings 29 are nested with stent strut 22 respectively to be arranged and is fixed on stent strut 22 along the axial direction interval of stent strut, the
One supporting rod 23 include multiple first main support rods 231, multiple first main support rods 231 be set in the first main support ring 28 and
It is extended radially to the outside of the first main support ring 28, second support bar 26 includes multiple second main support rods 261, Duo Ge
Two main support rods 261 are set in the second main support ring 29 and are extended radially to the outside of the second main support ring 29.
Wherein, holder 2 further comprises the first auxiliary support ring 30, the second auxiliary support ring 31, multiple first auxiliary supporting rods 232
With the multiple second auxiliary supporting rods 261, the first auxiliary support ring 30 is set on the first main support rod 231 and along the radial direction of stent strut 22
Direction and the first main support ring 28 are spaced nested setting, multiple first auxiliary supporting rods 232 be set in the first auxiliary support ring 30 and
It is extended radially to the outside of the first auxiliary support ring 30, the second auxiliary support ring 31 is set on the second main support rod 261 and edge
The radial direction of stent strut 22 is spaced nested setting with the second main support ring 29, and multiple second auxiliary supporting rods 261 are set to second
It is extended radially in auxiliary support ring 31 and to the outside of the second auxiliary support ring 31.
Pass through the first main support ring 28 and the second main support ring 29 on holder 2, the first auxiliary support ring 30, the second auxiliary branch
Supporting rod as much as possible can be arranged in pushing out ring 31, to which Support joint as much as possible be arranged.
Wherein, the vacuum coating equipment of the present embodiment further comprise being set to the entrance 37 of 1 side wall of vapor deposition chamber with
And it is set to the indoor cooling distributing damper 38 faced with entrance 37 of vapor deposition, the high molecular material gas through cracking is through entering
Mouth 37 introduces, and is spread in vapor deposition chamber 1 after cooling distributing damper 38 cools down.Cooling distributing damper 38 can avoid height
Warm high molecular material gas is directly encountered on product to be coated, and the high molecular material nano gas after cracking encounters cooling
38 postcooling of distributing damper is to room temperature and spreads around.
Wherein, the vacuum coating equipment of the present embodiment further comprises that air guide column is vented column 32, and air guide column exhaust column 32 is in
Hollow form and it is provided with multiple first ventholes (not shown) on the side wall of exhaust column 32, stent strut 22 is in hollow form and branch
Multiple second ventholes 221 are provided on the side wall of trestle 22, exhaust column 32 is inserted into stent strut 22, branch from one end of stent strut 22
22 nesting of trestle is set to 32 outside of exhaust column and can be rotated around exhaust column 32, and high molecular material cracked gas is through first
Venthole and the second venthole 221 uniformly spread and are deposited on data line.
It is vented column further referring to the air guide column that Fig. 2, Fig. 2 are a kind of vacuum coating equipments provided in an embodiment of the present invention
Structural schematic diagram, as shown, air guide column exhaust 32 side wall of column on multiple first ventholes 321 be length direction along air guide
Column is vented the strip-shaped hole of the axial direction setting of column.Further, the axial direction that column 32 is vented along air guide column is disposed adjacent
The first venthole 321 along air guide column be vented column 32 axial direction offset one from another.So that the first ventilation as much as possible is arranged
Hole 321.
Please refer to Fig.1 and combine refering to Fig. 3, Fig. 3 be a kind of vacuum coating equipment provided in an embodiment of the present invention holder
The structural schematic diagram of column, multiple second ventholes 221 being arranged on 22 side wall of stent strut are round hole, and are set to along stent strut
Between the first main support rod 231 that 22 axial direction is disposed adjacent and along stent strut 22 axial direction be disposed adjacent
Between two main support rods 261.So that the residual gas in vapor deposition chamber 1 after vacuum deposition can be equably logical through first
Stomata 321 and the second venthole 221 are extracted out from exhaust column 32.
Please continue to refer to Fig. 1, it is preferable that holder 2 further comprises sealed set in the head cover of the other end of stent strut 22
33, extraction holder 2 can be facilitated by head cover 33.
Wherein, the vacuum coating equipment of the present embodiment still further comprise be set to the outside of vapor deposition chamber 1 and with exhaust
The cooling tower 39 that column 32 connects, the residual gas after vapor deposition enter row by the second venthole 221 and the first venthole 321
Air column 32 is further vented column 32 by air guide column and imported into cooling tower 39.To avoid residual gas to external diffusion, at the same it is cold
But it is also installed with sensor in tower 39, the content of high molecular material cracked gas in residual gas can be detected by sensor,
And entrance 37 is adjusted according to the content of high molecular material cracked gas in residual gas, to decrease or increase introducing vapor deposition chamber
The amount of 1 macromolecule cracked gas.
Wherein, the vacuum coating equipment of the present embodiment further comprises that magnetic rotation component, magnetic rotation component include setting
The first rotary magnet 34 for being placed in 1 outside of vapor deposition chamber and the second rotary magnet for being set to 1 inside of vapor deposition chamber, the
One rotary magnet 34 is magnetically coupled to each other with the second rotary magnet 35, and rotation drive motor (not shown) drives the first rotary magnet
34 rotations, the first rotary magnet 34 drive the second rotary magnet 35 to be rotated, and then drive stent strut 22 can be around exhaust column
32 are rotated.
It is vented column 32 through vapor deposition chamber 1 to be arranged, the first rotary magnet 34 and the second rotary magnet rotate bearing respectively
In exhaust column 32 on and can around exhaust column 32 rotated.
Exhaust column 32 is disposed through on the bottom wall of vapor deposition chamber and vertically extends, and stent strut 22 is along vertical side
To nested 32 outside of extremely exhaust column and bearing is on the second rotary magnet 35.
Wherein, further, opening 36 is provided on the top of vapor deposition chamber 1, holder 2 can be put by opening 36
It is placed in vapor deposition chamber 2 or is taken out from vapor deposition chamber 2.
Referring to Fig. 4, Fig. 4 is another vacuum coating equipment provided in an embodiment of the present invention, as shown, the present embodiment
Vacuum coating equipment include raw material storage tank 3, pyrolysis furnace 4, vapor deposition chamber 1 and be set to the indoor holder of vapor deposition
2, cool down distributing damper 38, vacuum pump 5, check valve 6, rotation drive motor 7 and cooling tower 39.
Wherein, raw material storage tank 3 is used for raw material for storing, that is, is used for the high molecular material of vacuum coating, such as
Parylene N (Parylene), Parylene C (poly) and Parylene D (polydichloro-p-xylene)
At least one material cracked gas, wherein most preferably Parylene cracked gas.And utilize its interior level-one heating furnace
(not shown) forms gaseous state high molecular material after raw material is heated to 150 degree, imported into pyrolysis furnace.
Pyrolysis furnace 4 is connect with raw material storage tank 3, is received and is heated into gaseous high molecular material through level-one, and carries out two level
High molecular material nano gas is cracked into after being heated to 650 degree, by the entrance 37 of 1 side wall of vapor deposition chamber by high molecular material
Nano gas is imported into vapor deposition chamber 1.
High molecular material nano gas is after the entrance of entrance 37, by the distributing damper cooling 38 that cools down, to avoid 650 degree
Gas is directly encountered on product to be coated, and the high molecular material nano gas after cracking encounters after cooling distributing damper 38 to four
Week diffusion.
Vacuum coating equipment further comprises being vented column 32, rotary components 7, vapor deposition chamber 1 and to be set to gas phase heavy
Holder 2 in product room 1, the concrete composition and function of these composition parts please refer to the detailed description of above-described embodiment, this reality
It applies example and does not mark explanation one by one.
The vacuum coating equipment of the present embodiment further includes cooling tower 39, and cooling tower 39 is set to 1 outside of vapor deposition chamber simultaneously
It is connect with exhaust column 32, the residual gas after vapor deposition is by the second venthole and exhaust column 32 on the stent strut of holder
First venthole enters exhaust column, is further imported into cooling tower 39 by being vented column 32.By cooling tower 39 residual gas
High molecular material gas quick solidification in body, prevents it to external diffusion.
The vacuum coating equipment of the present embodiment further comprises that vacuum pump 5, vacuum pump 5 are connect with above-mentioned cooling tower 39, with
Vapor deposition chamber is vacuumized by being vented column 32, so that vapor deposition chamber 1 is formed negative pressure of vacuum, convenient for efficiently realizing gas
Mutually deposit.
Further, the vacuum coating equipment of the present embodiment further includes rotation drive motor 6, passes through synchronous belt and first
Rotary magnet connects, and for driving the first rotary magnet rotation, drives the second rotary magnet, and then drive vapor deposition interior
Stent strut 32 is rotated.
It should be noted that the high molecular material in the embodiment of the present invention can be Parylene N (Parylene),
At least one material of Parylene C (poly) and Parylene D (polydichloro-p-xylene), wherein optimal
Choosing is Parylene.
Another embodiment of the present invention provides a kind of data line bracket for vacuum coating equipment, wherein data line bracket
Including multiple Support joints, Support joint is adapted to the data cable connector of data line and can patch each other fixation, and then will count
The vapor deposition that vacuum coating equipment is set to according to line is indoor.Wherein, the specific composition and structure of data line bracket please refer to
The associated description of the holder of the vacuum coating equipment provided in above-described embodiment, details are not described herein.
Further, on the basis of vacuum coating equipment provided above, the embodiment of the present invention also provides a kind of number
According to the vacuum coating method of line, which carries out Vacuum Deposition by using above-mentioned vacuum coating equipment to data line
Film.Referring to Fig. 5, Fig. 5 is a kind of flow chart of the vacuum coating method of data line provided in an embodiment of the present invention, the present embodiment
The method of data line vacuum coating includes：
S101：The Support joint of the data cable connector of data line and holder is patched into fixation each other；
Specifically, the first support connector of the first data cable connector of data line and holder is patched into fixation, data line
The second support connector of second data cable connector and holder patches fixation, and adjusts the first support bar and second support bar of holder
At least one along stent strut axial direction position so that the data being set between first support bar and second support bar
Line is parallel to the axial direction of stent strut.
S102：The vapor deposition that holder is positioned over to vacuum coating equipment is indoor, so that data line is set to vapor deposition
It is indoor；
The opening on the vapor deposition chamber of vacuum coating equipment is opened, the holder for setting data line is positioned over Vacuum Deposition
The vapor deposition of film device is indoor, so that data line is set to vapor deposition interior.
S103：High molecular material cracked gas is introduced and vapor deposition chamber and is deposited on data line, and by residual gas
From exhaust column extraction.
Vapor deposition chamber, rotation drive motor are introduced from vapor deposition chamber side wall entrance by high molecular material cracked gas
First rotary magnet of (not shown) driving vacuum coating equipment is rotated, and the second rotary magnet is driven to be turned
It is dynamic, and then drive stent strut that can be rotated around exhaust column.High molecular material cracked gas is after cooling distributing damper cooling
It is indoor to be spread in vapor deposition, be uniformly distributed in vapor deposition interior after runing rest rotation and is deposited on data line.Into one
Step uniformly extracts residual gas out by the second venthole being vented on the first venthole of column and the stent strut of holder, and remaining
Gas is discharged from center residual gas discharge pipe.Monitor macromolecule cracked gas in residual gas in real time after cooling tower cools down
Content, adjust the pipeline tapping size of 650 degree pyrolysis furnaces in time, be allowed to realize the maximization of macromolecule deposition efficiency.Vacuum pump
Constantly vacuum (extract vapor deposition after residual gas) is extracted from vapor deposition chamber be allowed to allow the cracking nanometers of 650 degree of pyrolysis furnaces
Organic polymer is constantly spread to gaseous phase deposition stove.
Wherein, the high molecular material in the embodiment of the present invention can be with Parylene N (Parylene), Parylene C
At least one material of (poly) and Parylene D (polydichloro-p-xylene), wherein being most preferably to gather to two
Toluene.
Above vacuum coating equipment, data line bracket and film plating process provided in an embodiment of the present invention, by with data
The mating design of cable architecture improves the effect of data line vacuum nano plated film so as to carry out batch vacuum plated film to data line
Rate and coating effects, and the junction portion of data line can also be protected in coating process.
Claims (15)
1. a kind of vacuum coating equipment, for carrying out vacuum coating to data line, described data line one end is provided with the first data
Wire terminal, which is characterized in that the vacuum coating equipment includes vapor deposition chamber and to be set to the vapor deposition indoor
Holder, the holder include multiple first support connectors, and the first support connector can be suitable with first data cable connector
Match and patch each other fixation, the data line other end is provided with the second data cable connector, and the holder further comprises multiple
Second support connector, the second support connector can be adapted to second data cable connector and patch fixation each other, in turn
It is indoor that the data line is set to the vapor deposition；The vacuum coating equipment further comprises that being set to the gas phase sinks
The entrance of product room side wall and be set to the indoor cooling distributing damper faced with the entrance of the vapor deposition, it is described enter
Mouth expands for introducing high molecular material cracked gas, the high molecular material cracked gas after cooling distributing damper cooling
It dissipates in vapor deposition interior.
2. vacuum coating equipment according to claim 1, which is characterized in that the holder further comprise stent strut and
Multiple first support bars, the multiple first support bar are set on the stent strut and are put along the radial direction of the stent strut
Shape extension is penetrated, the first support connector is arranged at intervals in the first support bar.
3. vacuum coating equipment according to claim 2, which is characterized in that be arranged at intervals in the first support bar more
A first card slot, the first support connector are fixed in first card slot.
4. vacuum coating equipment according to claim 2, which is characterized in that the holder further comprises multiple second
Strut, the multiple second support bar are arranged at intervals at institute along the axial direction of the stent strut relative to the first support bar
The radial direction radiated entend on stent strut and along the stent strut is stated, the second support connector is arranged at intervals at described
On two supporting rods, and then the data line is set between the first support bar and the second support bar.
5. vacuum coating equipment according to claim 4, which is characterized in that be arranged at intervals in the second support bar more
A second card slot, the second support connector are fixed in second card slot.
6. vacuum coating equipment according to claim 4, which is characterized in that the first support connector and second described
Holder joint is symmetrical arranged, so that the data line being set between the first support bar and the second support bar is parallel
In the axial direction of the stent strut.
7. vacuum coating equipment according to claim 4, which is characterized in that the first support bar and second support
At least one of bar is adjustable along the position of the axial direction of the stent strut, so that the first support bar and described the
Two supporting rods are adjustable along the spacing of the axial direction of the stent strut.
8. vacuum coating equipment according to claim 4, which is characterized in that the holder further comprises the first main support
Ring and the second main support ring, the first main support ring and the second main support ring respectively it is nested with the stent strut setting and
It is fixed on the stent strut along the axial direction interval of the stent strut, the first support bar includes the multiple first main supports
Bar, the multiple first main support rod are set in the described first main support ring and are radiated to the outside of the described first main support ring
Shape extends, and the second support bar includes multiple second main support rods, and the multiple second main support rod is set to described second
In main support ring and to the outside radiated entend of the described second main support ring.
9. vacuum coating equipment according to claim 8, which is characterized in that the holder further comprises the first auxiliary support
Ring, the second auxiliary support ring, multiple first auxiliary supporting rods and multiple second auxiliary supporting rods, the first auxiliary support ring are set to described
It is the multiple on first main support rod and along the setting nested with the described first main support central spacer of the radial direction of the stent strut
First auxiliary supporting rod is set in the described first auxiliary support ring and to the outside radiated entend of the described first auxiliary support ring, described
Second auxiliary support ring is set on second main support rod and along the radial direction of the stent strut and the described second main support
Central spacer nesting is arranged, and the multiple second auxiliary supporting rod is set in the described second auxiliary support ring and to the described second auxiliary support
The outside radiated entend of ring.
10. vacuum coating equipment according to claim 1, which is characterized in that the vacuum coating equipment further comprises
It is vented column, the exhaust column is provided with multiple first ventholes, the holder in hollow form and on the side wall of the exhaust column
Column is in being provided with multiple second ventholes on hollow form and the side wall of the stent strut, the exhaust column is from the one of the stent strut
The stent strut is inserted at end, and the stent strut nesting is set on the outside of the exhaust column and can be turned around the exhaust column
Dynamic, the high molecular material cracked gas uniformly spreads through first venthole and second venthole and is deposited on described
On data line.
11. vacuum coating equipment according to claim 10, which is characterized in that second venthole is set to along described
It is disposed adjacent between the first main support rod that the axial direction of stent strut is disposed adjacent and along the axial direction of the stent strut
The second main support rod between.
12. vacuum coating equipment according to claim 10, which is characterized in that the vacuum coating equipment further comprises
Magnetic rotation component, the magnetic rotation component include being set to the first rotary magnet of the vapor deposition outside and setting
It is placed in the second rotary magnet of the vapor deposition indoor, first rotary magnet and the second rotary magnet magnetism coupling
It closes, rotation drive motor drives the first rotary magnet rotation, and second rotary magnet is driven to be rotated, and then band
Moving the stent strut can be rotated around the exhaust column.
13. vacuum coating equipment according to claim 12, which is characterized in that the exhaust column runs through the vapor deposition
Room is arranged, and first rotary magnet and second rotary magnet rotate bearing on the exhaust column and can be around institute respectively
Exhaust column is stated to be rotated.
14. vacuum coating equipment according to claim 12, which is characterized in that the exhaust column is disposed through the gas
Extend on the bottom wall of phase settling chamber and vertically, the stent strut is on the outside of the vertical direction nesting to the exhaust column
And bearing is on second rotary magnet.
15. a kind of vacuum coating method of data line, which is characterized in that the vacuum coating method is by using claim 1-
14 any vacuum coating equipments carry out vacuum coating to the data line, the method includes：
The Support joint of the data cable connector of the data line and holder is patched into fixation each other；
The vapor deposition that the holder is positioned over to the vacuum coating equipment is indoor, so that the data line is set to the gas
Phase within the deposition chamber；
High molecular material cracked gas is introduced into the vapor deposition chamber and is deposited on the data line.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2014/079749 WO2015188350A1 (en) | 2014-06-12 | 2014-06-12 | Vacuum coating device, data line supports, and vacuum coating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105378143A CN105378143A (en) | 2016-03-02 |
| CN105378143B true CN105378143B (en) | 2018-09-04 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480038276.7A Active CN105378143B (en) | 2014-06-12 | 2014-06-12 | A kind of vacuum coating equipment and film plating process |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN105378143B (en) |
| WO (1) | WO2015188350A1 (en) |
Families Citing this family (1)
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| CN113652653A (en) * | 2021-07-22 | 2021-11-16 | 深圳源国光子通信有限公司 | Method for coating cavity surface of semiconductor laser |
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| CN202201960U (en) * | 2011-07-29 | 2012-04-25 | 安徽金色环境治理股份有限公司 | Positioning frame for vacuum coating machine |
| CN102597298A (en) * | 2009-09-09 | 2012-07-18 | 耳蜗有限公司 | An insulated conductive element having a substantially continuous barrier layer formed through multiple coatings |
| CN103510045A (en) * | 2012-06-29 | 2014-01-15 | 深圳富泰宏精密工业有限公司 | Gas pipe for vacuum coating and vacuum coating device applying gas pipe |
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| JPS63150912A (en) * | 1986-12-15 | 1988-06-23 | Shin Etsu Handotai Co Ltd | Formation of thin film and apparatus therefor |
| US7988787B2 (en) * | 2007-08-27 | 2011-08-02 | Caterpillar Inc. | Workpiece support system and method |
| CN201169621Y (en) * | 2008-01-09 | 2008-12-24 | 金梁 | Support for vacuum plating furnace |
| CN202954085U (en) * | 2012-11-01 | 2013-05-29 | 东莞钜升塑胶电子制品有限公司 | Plated piece clamping device used for vacuum coating equipment |
| CN203513784U (en) * | 2013-09-17 | 2014-04-02 | 和宏华进纳米科技（上海）有限公司 | Workpiece support of evaporation furnace |
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- 2014-06-12 WO PCT/CN2014/079749 patent/WO2015188350A1/en active Application Filing
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2632847Y (en) * | 2003-06-30 | 2004-08-11 | 北京广播学院 | Thermal-oxidative even flowing thermal insulative radiator |
| CN102597298A (en) * | 2009-09-09 | 2012-07-18 | 耳蜗有限公司 | An insulated conductive element having a substantially continuous barrier layer formed through multiple coatings |
| CN202201960U (en) * | 2011-07-29 | 2012-04-25 | 安徽金色环境治理股份有限公司 | Positioning frame for vacuum coating machine |
| CN103510045A (en) * | 2012-06-29 | 2014-01-15 | 深圳富泰宏精密工业有限公司 | Gas pipe for vacuum coating and vacuum coating device applying gas pipe |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105378143A (en) | 2016-03-02 |
| WO2015188350A1 (en) | 2015-12-17 |
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