CN105378143A

CN105378143A - Vacuum coating device, data line supports, and vacuum coating method

Info

Publication number: CN105378143A
Application number: CN201480038276.7A
Authority: CN
Inventors: 文洁; 何自坚
Original assignee: Shenzhen Tatfook Quaintfab Co ltd
Current assignee: Shenzhen Dafu Mingren Technology Co ltd
Priority date: 2014-06-12
Filing date: 2014-06-12
Publication date: 2016-03-02
Anticipated expiration: 2034-06-12
Also published as: CN105378143B; WO2015188350A1

Abstract

A vacuum coating device, data line supports, and a vacuum coating method. The vacuum coating device comprises a vapor deposition chamber and a support disposed inside of the vapor deposition chamber. The support comprises multiple first support connectors. The first support connectors and first data line connectors are compatible and can be plugged into one another for position-fixing, thereby arranging data lines in the vapor deposition chamber. By making the design compatible with the data line structure, data lines can be vacuum coated in batches, thereby enhancing data line vacuum nano-coating efficiency and coating effectiveness. Additionally, the connectors of the data lines are protected during vacuum coating.

Description

Vacuum coating equipment, data line support and coating method

[ technical field ] A method for producing a semiconductor device

The invention relates to vacuum coating equipment, a data line support and a coating method.

[ background of the invention ]

After the high molecular material is cracked into nano molecules, the nano molecules are uniformly attached to the surface of a product in a gapless manner in a vacuum environment to form a nano protective film, which is called as a vacuum vapor deposition nano coating. The nano coating film prepared by the process has the following characteristics compared with the traditional coating film or oil spraying and paint spraying: 1. waterproof and moistureproof, without pore, good sealing; 2. the coating film is acid and alkali resistant, high in insulation level and resistant to static generation; 3. the surface of the coating is smooth, dirt is prevented from adhering, the friction force is small, and the coating is easy to scrub; 4. the appearance color can be adjusted according to the requirement, and the color can be changed from high transparency to other colors. 5. The thickness of the coating film can be from 0.1 micron to more than 50 microns; 6. the coating film has good adhesive force, no internal stress, bubble holes, no falling and no wrinkling, and the coating film adapts to the environment temperature of +/-200 ℃.

When the nano coating is carried out, the raw materials are vaporized at 150 ℃ in a material chamber to form a gas state, and then the gas state enters a cracking furnace with high temperature of about 650 ℃ to be decomposed into nano molecules. And (4) entering a coating chamber at normal temperature, and performing vapor deposition to prevent water to form a film in a vacuum state, so as to uniformly cover pinholes and gaps on the surface of the product. It is different from metal spraying and oil spraying paint in that the surface of the product can be uniformly covered by vacuum vapor deposition nanometer coating film as long as the surface of the product is contacted with air, and a compact, uniform and highly transparent film without pinholes is formed.

Because the surfaces of products to be coated are contacted with air during nano coating, the technical problem to be solved is how to improve coating equipment to adapt to coating of different products.

[ summary of the invention ]

The invention provides vacuum coating equipment, a data line support and a coating method, which can carry out batch vacuum nano coating on data lines and improve the vacuum nano coating efficiency and coating effect of the data lines.

In order to solve the technical problems, the invention provides a technical scheme that: the utility model provides a vacuum coating equipment for carry out vacuum coating to the data line, data line one end is provided with first data line and connects, vacuum coating equipment include the vapor deposition room and set up in support in the vapor deposition room, the support includes a plurality of first support joints, first support joint can with first data line connects the adaptation and connects each other to connect and insert fixedly, and then will the data line set up in the vapor deposition room.

The support further comprises a support column and a plurality of first support rods, the first support rods are arranged on the support column and radially extend along the radial direction of the support column, and the first support joints are arranged on the first support rods at intervals.

A plurality of first clamping grooves are formed in the first supporting rod at intervals, and the first support joint is fixed in the first clamping grooves.

The other end of the data line is provided with a second data line connector, the support further comprises a plurality of second support connectors and a plurality of second supporting rods, the plurality of second supporting rods are arranged along the axial direction of the support column relative to the first supporting rod at intervals, the support column is provided with a plurality of radial direction radial extension portions, the second support connectors are arranged on the second supporting rods at intervals, the second support connectors are matched with the second data line connectors and can be mutually connected and fixed, and then the data line is arranged between the first supporting rods and the second supporting rods.

The second support rod is provided with a plurality of second clamping grooves at intervals, and the second support joint is fixed in the second clamping grooves.

Wherein the first bracket joint and the second bracket joint are symmetrically arranged so that the data line arranged between the first support bar and the second support bar is parallel to the axial direction of the bracket column.

At least one of the first support rod and the second support rod is adjustable in position along the axial direction of the support column, so that the distance between the first support rod and the second support rod along the axial direction of the support column is adjustable.

The stent further comprises a first main support ring and a second main support ring, the first main support ring and the second main support ring are respectively nested with the stent column and fixed on the stent column at intervals along the axial direction of the stent column, the first support rod comprises a plurality of first main support rods, the plurality of first main support rods are arranged on the first main support ring and radially extend towards the outer side of the first main support ring, the second support rod comprises a plurality of second main support rods, and the plurality of second main support rods are arranged on the second main support ring and radially extend towards the outer side of the second main support ring.

The support further comprises a first auxiliary support ring, a second auxiliary support ring, a plurality of first auxiliary support rods and a plurality of second auxiliary support rods, wherein the first auxiliary support ring is arranged on the first main support rod and is nested with the first main support ring at intervals along the radial direction of the support column, the plurality of first auxiliary support rods are arranged on the first auxiliary support ring and radially extend to the outer side of the first auxiliary support ring, the second auxiliary support ring is arranged on the second main support rod and is nested with the second main support ring at intervals along the radial direction of the support column, and the plurality of second auxiliary support rods are arranged on the second auxiliary support ring and radially extend to the outer side of the second auxiliary support ring.

The vacuum coating equipment further comprises an inlet arranged on the side wall of the vapor deposition chamber and a cooling and shunting baffle arranged in the vapor deposition chamber and opposite to the inlet, wherein the inlet is used for introducing high polymer material cracking gas, and the high polymer material cracking gas is diffused in the vapor deposition chamber after being cooled by the cooling and shunting baffle.

The vacuum coating equipment further comprises an exhaust column, wherein the exhaust column is hollow, a plurality of first vent holes are formed in the side wall of the exhaust column, the support column is hollow, a plurality of second vent holes are formed in the side wall of the support column, the exhaust column is inserted into the support column from one end of the support column, the support column is nested outside the exhaust column and can rotate around the exhaust column, and high polymer material cracked gas is uniformly diffused through the first vent holes and the second vent holes and is deposited on the data line.

The first vent hole is a strip-shaped hole which is arranged along the axial direction of the exhaust column in the length direction.

Wherein the first vent holes adjacently disposed along the axial direction of the exhaust column are staggered from each other along the axial direction of the exhaust column.

The second vent holes are circular holes and are arranged between the first main support rods which are adjacently arranged along the axial direction of the support column and between the second main support rods which are adjacently arranged along the axial direction of the support column.

Wherein, the support further comprises a top cover which is arranged at the other end of the support column in a sealing way.

The vacuum coating equipment further comprises a cooling tower which is arranged outside the vapor deposition chamber and connected with the exhaust column, and residual gas after vapor deposition enters the exhaust column through the second vent hole and the first vent hole and is further led into the cooling tower through the exhaust column.

The vacuum coating equipment further comprises a magnetic rotating assembly, the magnetic rotating assembly comprises a first rotating magnet arranged on the outer side of the vapor deposition chamber and a second rotating magnet arranged on the inner side of the vapor deposition chamber, the first rotating magnet is magnetically coupled with the second rotating magnet, and a rotary driving motor drives the first rotating magnet to rotate and drives the second rotating magnet to rotate so as to drive the support column to rotate around the exhaust column.

The exhaust column penetrates through the vapor deposition chamber, and the first rotating magnet and the second rotating magnet are respectively rotatably supported on the exhaust column and can rotate around the exhaust column.

The exhaust column penetrates through the bottom wall of the vapor deposition chamber and extends in the vertical direction, and the support column is nested to the outer side of the exhaust column in the vertical direction and is supported on the second rotary magnet.

Wherein an opening is provided on the top of the vapor deposition chamber through which the holder can be placed in or taken out of the vapor deposition chamber.

In order to solve the above technical problems, another technical solution provided by the present invention is: the data line support comprises a plurality of support joints, the support joints are matched with the data line joints of the data line and can be mutually inserted and fixed, and the data line is arranged in a vapor deposition chamber of the vacuum coating equipment.

In order to solve the above technical problems, the present invention provides another technical solution: provided is a vacuum coating method of a data line, the method comprising: inserting and fixing a data wire joint of the data wire and a bracket joint of a bracket; placing the support in a vapor deposition chamber of vacuum coating equipment so that the data line is arranged in the vapor deposition chamber; and introducing high molecular material cracking gas into the vapor deposition chamber and depositing the high molecular material cracking gas on the data line.

The invention has the beneficial effects that: the vacuum coating equipment, the data line bracket and the coating method are different from the prior art, and through the design matched with the data line structure, the batch vacuum coating can be carried out on the data line, the vacuum nano coating efficiency and the coating effect of the data line are improved, and the joint part of the data line can be protected in the coating process.

[ description of the drawings ]

Fig. 1 is a schematic structural diagram of a vacuum coating apparatus according to an embodiment of the present invention;

FIG. 2 is a schematic structural diagram of an exhaust column of a vacuum deposition apparatus according to an embodiment of the present invention;

fig. 3 is a schematic structural diagram of a support column of a vacuum coating apparatus according to an embodiment of the present invention;

FIG. 4 is a schematic structural diagram of another vacuum deposition apparatus provided in an embodiment of the present invention;

fig. 5 is a flowchart of a vacuum coating method for a data line according to an embodiment of the present invention.

[ detailed description ] embodiments

The present invention will be described in detail below with reference to the accompanying drawings and examples.

Referring to fig. 1, fig. 1 is a schematic structural diagram of a vacuum deposition apparatus according to an embodiment of the present invention, and as shown in the drawing, the vacuum deposition apparatus according to the embodiment is used for vacuum deposition of a data line, wherein a first data line connector is disposed at one end of the data line, the vacuum deposition apparatus includes a vapor deposition chamber 1 and a support 2 disposed in the vapor deposition chamber, the support 2 includes a plurality of first support connectors 21, and the first support connectors 21 are capable of being adapted to the first data line connectors and being connected and fixed to each other, so as to dispose the data line in the vapor deposition chamber 2.

On the basis of the first embodiment of the present invention, the present invention further provides an embodiment of the stent structure, wherein the stent 2 further includes a stent column 22 and a plurality of first supporting rods 23, the plurality of first supporting rods 23 are disposed on the stent column 22 and radially extend along the radial direction of the stent column, and the first stent connectors 21 are disposed on the first supporting rods 23 at intervals.

A plurality of first locking grooves 24 are arranged on the first support rod 23 at intervals, and the first support joint 21 is fixed in the first locking grooves 24.

The other end of the data line is further provided with a second data line connector, the support 2 further comprises a plurality of second support connectors 25 and a plurality of second support rods 26, the plurality of second support rods 26 are arranged on the support column 22 at intervals along the axial direction of the support column 22 relative to the first support rod 23 and radially extend along the radial direction of the support column 22, the second support connectors 25 are arranged on the second support rods 26 at intervals, the second support connectors 25 are matched with the second data line connectors and can be connected and fixed with each other in an inserting mode, and then the data line is arranged between the first support rods 23 and the second support rods 26.

A plurality of second locking grooves 27 are formed in the second support rod 26 at intervals, and the second bracket joint 25 is fixed in the second locking grooves 27.

The first bracket joint 21 and the second bracket joint 25 are symmetrically disposed such that a data line disposed between the first support bar 23 and the second support bar 26 is parallel to the axial direction of the bracket post 22.

At least one of the first support bar 23 and the second support bar 26 is adjustable in position in the axial direction of the holder post 22, so that the distance between the first support bar 23 and the second support bar 26 in the axial direction of the holder post 22 is adjustable.

The stent 2 further comprises a first main supporting ring 28 and a second main supporting ring 29, the first main supporting ring 28 and the second main supporting ring 29 are respectively nested with the stent column 22 and fixed on the stent column 22 at intervals along the axial direction of the stent column, the first supporting rod 23 comprises a plurality of first main supporting rods 231, the plurality of first main supporting rods 231 are arranged on the first main supporting ring 28 and radially extend to the outer side of the first main supporting ring 28, the second supporting rod 26 comprises a plurality of second main supporting rods 261, and the plurality of second main supporting rods 261 are arranged on the second main supporting ring 29 and radially extend to the outer side of the second main supporting ring 29.

The stent 2 further includes a first auxiliary support ring 30, a second auxiliary support ring 31, a plurality of first auxiliary support rods 232 and a plurality of second auxiliary support rods 261, the first auxiliary support ring 30 is disposed on the first main support rod 231 and is nested with the first main support ring 28 at intervals along the radial direction of the stent column 22, the plurality of first auxiliary support rods 232 is disposed on the first auxiliary support ring 30 and radially extends to the outer side of the first auxiliary support ring 30, the second auxiliary support ring 31 is disposed on the second main support rod 261 and is nested with the second main support ring 29 at intervals along the radial direction of the stent column 22, and the plurality of second auxiliary support rods 261 is disposed on the second auxiliary support ring 31 and radially extends to the outer side of the second auxiliary support ring 31.

As many support bars as possible, and thus as many support joints as possible, can be provided by the first main support ring 28 and the second main support ring 29, the first auxiliary support ring 30, and the second auxiliary support ring 31 on the rack 2.

The vacuum deposition apparatus of this embodiment further includes an inlet 37 disposed on a sidewall of the vapor deposition chamber 1, and a temperature-reducing shunt baffle 38 disposed in the vapor deposition chamber and opposite to the inlet 37, wherein the cracked polymer material gas is introduced through the inlet 37, and is cooled by the temperature-reducing shunt baffle 38 and then diffuses in the vapor deposition chamber 1. The cooling and shunting baffle 38 can prevent high-temperature polymer material gas from directly touching the product to be coated, and the cracked polymer material nano gas is cooled to room temperature and diffused all around after meeting the cooling and shunting baffle 38.

The vacuum coating apparatus of this embodiment further includes an air guide column exhaust column 32, the air guide column exhaust column 32 is hollow and is provided with a plurality of first vent holes (not shown) on the side wall of the exhaust column 32, the support column 22 is hollow and is provided with a plurality of second vent holes 221 on the side wall of the support column 22, the exhaust column 32 is inserted into the support column 22 from one end of the support column 22, the support column 22 is nested and is arranged outside the exhaust column 32 and can rotate around the exhaust column 32, and the high polymer material cracked gas is uniformly diffused and deposited on the data line through the first vent holes and the second vent holes 221.

Referring to fig. 2, fig. 2 is a schematic structural diagram of an air guide column exhaust column of a vacuum deposition apparatus according to an embodiment of the present invention, and as shown in the figure, a plurality of first vent holes 321 on a sidewall of the air guide column exhaust column 32 are strip-shaped holes with length directions arranged along an axial direction of the air guide column exhaust column. Further, the first vent holes 321 adjacently disposed in the axial direction of the air column exhaust column 32 are offset from each other in the axial direction of the air column exhaust column 32. So that as many first vent holes 321 as possible are provided.

Referring to fig. 1 in combination with fig. 3, fig. 3 is a schematic structural diagram of a support column of a vacuum deposition apparatus according to an embodiment of the present invention, in which a plurality of second ventilation holes 221 formed in a side wall of the support column 22 are circular holes and are disposed between first main support rods 231 and second main support rods 261 which are adjacently disposed along an axial direction of the support column 22. So that the residual gas after vacuum deposition in the vapor deposition chamber 1 can be uniformly pumped out of the exhaust column 32 through the first vent hole 321 and the second vent hole 221.

With continued reference to fig. 1, preferably, the rack 2 further includes a top cover 33 sealingly disposed at the other end of the rack post 22, and the rack 2 is easily extracted through the top cover 33.

The vacuum deposition apparatus of this embodiment further includes a cooling tower 39 disposed outside the vapor deposition chamber 1 and connected to the exhaust column 32, wherein the residual gas after vapor deposition enters the exhaust column 32 through the second vent hole 221 and the first vent hole 321, and is further introduced into the cooling tower 39 through the gas guide column exhaust column 32. So as to prevent the residual gas from diffusing outwards, and the cooling tower 39 is also provided with a sensor, by which the content of the high molecular material cracked gas in the residual gas can be detected, and the inlet 37 is adjusted according to the content of the high molecular material cracked gas in the residual gas so as to reduce or increase the amount of the high molecular material cracked gas introduced into the vapor deposition chamber 1.

Wherein, the vacuum coating equipment of this embodiment further includes magnetism runner assembly, magnetism runner assembly is including setting up in the first rotary magnet 34 of vapour deposition chamber 1 outside and setting up in the second rotary magnet of vapour deposition chamber 1 inboard, first rotary magnet 34 and the mutual magnetic coupling of second rotary magnet 35, and rotary drive motor (not shown) drives first rotary magnet 34 and rotates, and first rotary magnet 34 drives second rotary magnet 35 and rotates, and then drives support post 22 and can rotate around exhaust post 32.

The exhaust column 32 is disposed through the vapor deposition chamber 1, and the first rotating magnet 34 and the second rotating magnet are rotatably supported on the exhaust column 32 and can rotate around the exhaust column 32.

The exhaust column 32 penetrates through the bottom wall of the vapor deposition chamber and extends in the vertical direction, and the support column 22 is nested outside the exhaust column 32 in the vertical direction and is supported on the second rotary magnet 35.

Wherein, furthermore, an opening 36 is provided on the ceiling of the vapor deposition chamber 1, and the holder 2 can be placed in the vapor deposition chamber 2 or taken out of the vapor deposition chamber 2 through the opening 36.

Referring to fig. 4, fig. 4 is another vacuum coating apparatus according to an embodiment of the present invention, and as shown in the drawing, the vacuum coating apparatus of the embodiment includes a raw material storage tank 3, a cracking furnace 4, a vapor deposition chamber 1, a support 2 disposed in the vapor deposition chamber, a temperature-reducing flow-dividing baffle 38, a vacuum pump 5, a rotation driving motor 6, and a cooling tower 39.

The raw material storage tank 3 is configured to store a pyrolysis gas for raw material, i.e., polymer material for vacuum coating, such as at least one of Parylene n (Parylene), Parylene C (poly-p-xylylene monochloride), and Parylene d (poly-p-xylylene dichloride), and most preferably, the pyrolysis gas is Parylene. The raw material is heated to 150 ℃ by a first-stage heating furnace (not shown) therein to form a gaseous polymer material, which is introduced into the cracking furnace.

The cracking furnace 4 is connected with the raw material storage tank 3, receives the high polymer material which is heated to be gaseous through the first stage, carries out secondary heating to 650 ℃, then cracks the high polymer material into high polymer material nano gas, and leads the high polymer material nano gas into the vapor deposition chamber 1 through the inlet 37 on the side wall of the vapor deposition chamber 1.

Macromolecular material nanometer is gaseous from the entry 37 back that gets into, through cooling reposition of redundant personnel baffle cooling 38 to avoid 650 degrees gas directly to touch on the product of treating the coating film, the macromolecular material nanometer after the schizolysis is gaseous to meet cooling reposition of redundant personnel baffle 38 back and is diffused all around.

The vacuum deposition apparatus further includes an exhaust column 32, a rotating assembly 7, a vapor deposition chamber 1, and a support 2 disposed in the vapor deposition chamber 1, and the detailed composition and functions of these components refer to the detailed description of the above embodiments, which are not necessarily labeled.

The vacuum coating equipment of the embodiment further comprises a cooling tower 39, the cooling tower 39 is arranged outside the vapor deposition chamber 1 and is connected with the exhaust column 32, and residual gas after vapor deposition enters the exhaust column through the second vent hole on the support column of the support and the first vent hole of the exhaust column 32 and is further introduced into the cooling tower 39 through the exhaust column 32. The polymer gas in the residual gas is rapidly solidified by the cooling tower 39 to prevent the polymer gas from diffusing outwards.

The vacuum coating apparatus of the present embodiment further includes a vacuum pump 5, and the vacuum pump 5 is connected to the cooling tower 39 to vacuumize the vapor deposition chamber through the exhaust column 32, so that the vapor deposition chamber 1 forms a vacuum negative pressure, which is convenient for efficiently implementing vapor deposition.

Furthermore, the vacuum coating apparatus of this embodiment further includes a rotation driving motor 6, which is connected to the first rotating magnet through a synchronous belt, and is configured to drive the first rotating magnet to rotate, so as to drive the second rotating magnet, and further drive the support column 32 in the vapor deposition chamber to rotate.

It should be noted that the polymer material in the embodiment of the present invention may be at least one material of Parylene N (Parylene), Parylene c (poly-p-chloro-xylene), and Parylene D (poly-p-dichloro-xylene), and most preferably, Parylene.

Another embodiment of the present invention provides a data line holder for a vacuum deposition apparatus, wherein the data line holder includes a plurality of holder connectors, the holder connectors are adapted to and capable of being inserted and fixed with each other, and the data line is disposed in a vapor deposition chamber of the vacuum deposition apparatus. For the specific structure and structure of the data line support, please refer to the description of the support of the vacuum coating apparatus provided in the above embodiments, which is not repeated herein.

Furthermore, on the basis of the vacuum coating equipment provided above, the embodiment of the invention also provides a vacuum coating method for the data line, which performs vacuum coating on the data line by using the vacuum coating equipment. Referring to fig. 5, fig. 5 is a flowchart of a vacuum deposition method for a data line according to an embodiment of the present invention, where the vacuum deposition method for a data line includes:

s101: inserting and fixing a data wire joint of a data wire and a bracket joint of a bracket;

specifically, a first data line connector of the data line is fixedly connected with a first support connector of the support in a plugging manner, a second data line connector of the data line is fixedly connected with a second support connector of the support in a plugging manner, and the position of at least one of a first support rod and a second support rod of the support along the axial direction of the support column is adjusted, so that the data line arranged between the first support rod and the second support rod is parallel to the axial direction of the support column.

S102: placing the support in a vapor deposition chamber of vacuum coating equipment so as to enable the data line to be arranged in the vapor deposition chamber;

and opening an opening on a vapor deposition chamber of the vacuum coating equipment, and placing the support with the data line arranged in the vapor deposition chamber of the vacuum coating equipment so as to enable the data line to be arranged in the vapor deposition chamber.

S103: introducing the high molecular material cracking gas into the vapor deposition chamber, depositing the high molecular material cracking gas on the data line, and extracting residual gas from the exhaust column.

The high polymer material pyrolysis gas is introduced into the vapor deposition chamber from an inlet on the side wall of the vapor deposition chamber, and a rotary driving motor (not shown in the figure) drives a first rotary magnet of the vacuum coating equipment to rotate and drives a second rotary magnet to rotate, so that the support column is driven to rotate around the exhaust column. The high polymer material cracked gas is cooled by the cooling and shunting baffle plate and then is diffused in the vapor deposition chamber, and the rotating bracket is uniformly distributed in the vapor deposition chamber after rotating and is deposited on the data line. And further uniformly pumping residual gas through the first vent hole of the exhaust column and the second vent hole on the support column of the support, and exhausting the residual gas from the central residual gas exhaust pipe. After the cooling tower is cooled, the content of the high polymer cracking gas in the residual gas is monitored in real time, and the opening size of a pipeline of the cracking furnace at the temperature of 650 ℃ is adjusted in time, so that the high polymer deposition efficiency is maximized. The vacuum pump continuously pumps vacuum (extracting residual gas after vapor deposition) from the vapor deposition chamber to ensure that the cracking nanometer organic polymer of the 650-DEG cracking furnace continuously diffuses to the vapor deposition furnace.

The polymer material in the embodiment of the present invention may be at least one material of Parylene N (Parylene), Parylene c (poly-p-xylylene monochloride), and Parylene D (poly-p-xylylene dichloride), and most preferably, Parylene.

The vacuum coating equipment, the data line bracket and the coating method provided by the embodiment of the invention have the advantages that the batch vacuum coating can be carried out on the data lines through the design matched with the data line structure, the vacuum nano coating efficiency and the coating effect of the data lines are improved, and the joint parts of the data lines can be protected in the coating process.

Claims

The utility model provides a vacuum coating equipment for carry out vacuum coating to the data line, data line one end is provided with first data line and connects, its characterized in that, vacuum coating equipment include the vapor deposition room and set up in the indoor support of vapor deposition, the support includes a plurality of first support joints, first support joint can with first data line joint adaptation just connect to connect each other and insert fixedly, and then will the data line set up in the vapor deposition room.
The vacuum plating apparatus according to claim 1, wherein the holder further comprises a holder post and a plurality of first support rods disposed on the holder post and extending radially in a radial direction of the holder post, the first holder joints being disposed at intervals on the first support rods.
The vacuum coating apparatus according to claim 2, wherein the first support rod is provided with a plurality of first engaging grooves at intervals, and the first bracket joint is fixed in the first engaging grooves.
The vacuum plating apparatus according to claim 2, wherein a second data line connector is disposed at the other end of the data line, the support further comprises a plurality of second support connectors and a plurality of second support rods, the plurality of second support rods are disposed on the support post at intervals along the axial direction of the support post with respect to the first support rods and radially extend along the radial direction of the support post, the second support connectors are disposed on the second support rods at intervals, and the second support connectors are adapted to the second data line connector and can be fixedly connected to each other, so as to dispose the data line between the first support rods and the second support rods.
The vacuum coating apparatus according to claim 4, wherein the second support rod is provided with a plurality of second engaging grooves at intervals, and the second support joint is fixed in the second engaging grooves.
The vacuum plating apparatus according to claim 4, wherein the first bracket joint and the second bracket joint are symmetrically arranged such that the data line arranged between the first support rod and the second support rod is parallel to an axial direction of the bracket post.
The vacuum plating apparatus according to claim 4, wherein a position of at least one of the first support rod and the second support rod in an axial direction of the holder post is adjustable, so that a distance between the first support rod and the second support rod in the axial direction of the holder post is adjustable.
The vacuum plating apparatus according to claim 4, wherein the support frame further comprises a first main support ring and a second main support ring, the first main support ring and the second main support ring are respectively nested with the support column and fixed to the support column at intervals along an axial direction of the support column, the first support rod comprises a plurality of first main support rods, the plurality of first main support rods are disposed on the first main support ring and radially extend to an outer side of the first main support ring, the second support rod comprises a plurality of second main support rods, the plurality of second main support rods are disposed on the second main support ring and radially extend to an outer side of the second main support ring.
The vacuum plating apparatus according to claim 8, wherein the holder further comprises a first auxiliary support ring disposed on the first main support bar and nested with the first main support ring at a spacing in a radial direction of the holder post, a second auxiliary support ring disposed on the first auxiliary support ring and radially extending to an outer side of the first auxiliary support ring, a plurality of first auxiliary support bars disposed on the second main support bar and nested with the second main support ring at a spacing in a radial direction of the holder post, and a plurality of second auxiliary support bars disposed on the second auxiliary support ring and radially extending to an outer side of the second auxiliary support ring.
The vacuum coating apparatus according to any one of claims 1 to 8, further comprising an inlet disposed on a sidewall of the vapor deposition chamber, and a temperature-reducing diversion baffle disposed in the vapor deposition chamber opposite to the inlet, wherein the inlet is used for introducing a polymer material cracking gas, and the polymer material cracking gas is cooled by the temperature-reducing diversion baffle and then diffuses into the vapor deposition chamber.
The vacuum coating apparatus according to claim 10, further comprising a hollow exhaust column having a plurality of first ventilation holes formed in a sidewall thereof, wherein the support column has a hollow shape having a plurality of second ventilation holes formed in a sidewall thereof, the exhaust column is inserted into the support column from one end thereof, the support column is nested outside the exhaust column and can rotate around the exhaust column, and the polymer material pyrolysis gas is uniformly diffused through the first ventilation holes and the second ventilation holes and deposited on the data line.
The vacuum plating apparatus according to claim 11, wherein the first vent hole is a strip-shaped hole having a length direction arranged along an axial direction of the exhaust column.
The vacuum plating apparatus according to claim 12, wherein the first vent holes that are adjacently disposed in the axial direction of the exhaust column are offset from each other in the axial direction of the exhaust column.
The vacuum plating apparatus according to claim 11, wherein the second vent holes are circular holes and are provided between the first main support rods adjacently disposed in the axial direction of the support column and between the second main support rods adjacently disposed in the axial direction of the support column.
The vacuum plating apparatus according to claim 11, wherein the holder further comprises a top cover sealingly provided to the other end of the holder post.
The vacuum plating apparatus according to claim 11, further comprising a cooling tower disposed outside the vapor deposition chamber and connected to the exhaust column, wherein residual vapor after vapor deposition enters the exhaust column through the second vent hole and the first vent hole and is further introduced into the cooling tower through the exhaust column.
The vacuum coating apparatus according to claim 11, further comprising a magnetic rotation assembly, wherein the magnetic rotation assembly comprises a first rotating magnet disposed outside the vapor deposition chamber and a second rotating magnet disposed inside the vapor deposition chamber, the first rotating magnet is magnetically coupled to the second rotating magnet, and a rotation driving motor drives the first rotating magnet to rotate and drives the second rotating magnet to rotate, thereby driving the support column to rotate around the exhaust column.
The vacuum plating apparatus according to claim 11, wherein the exhaust column extends through the vapor deposition chamber, and the first rotary magnet and the second rotary magnet are rotatably supported on the exhaust column and are capable of rotating around the exhaust column, respectively.
The vacuum plating apparatus according to claim 11, wherein the exhaust column is penetratingly disposed on a bottom wall of the vapor deposition chamber and extends in a vertical direction, and the holder column is nested outside the exhaust column in the vertical direction and is seated on the second rotary magnet.
The vacuum plating apparatus according to claim 19, wherein an opening is provided on a top of the vapor deposition chamber, and the holder is placed in or taken out of the vapor deposition chamber through the opening.
The data line support for the vacuum coating equipment is characterized by comprising a plurality of support joints, wherein the support joints are matched with the data line joints of the data line and can be mutually inserted and fixed, and then the data line is arranged in a vapor deposition chamber of the vacuum coating equipment.
A vacuum coating method of a data line is characterized by comprising the following steps:

inserting and fixing a data wire joint of the data wire and a bracket joint of a bracket;

placing the support in a vapor deposition chamber of vacuum coating equipment so that the data line is arranged in the vapor deposition chamber;

and introducing high molecular material cracking gas into the vapor deposition chamber and depositing the high molecular material cracking gas on the data line.