CN105371755A - Wavelength correction type multi-beam step plane reflecting mirror laser interferometer and wavelength correction method - Google Patents
Wavelength correction type multi-beam step plane reflecting mirror laser interferometer and wavelength correction method Download PDFInfo
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Abstract
The invention discloses a wavelength correction type multi-beam step plane reflecting mirror laser interferometer and a wavelength correction method. The wavelength correction type multi-beam step plane reflecting mirror laser interferometer comprises a laser source, a beam splitter, a fixed reflecting mirror, a measurement reflecting mirror device and a photoelectric detector group. The laser source comprises n (n>=2) parallel laser beams. The photoelectric detector group comprises n photoelectric detectors. The measurement reflecting mirror device comprises a measurement reflecting mirror and a precision displacement device. The reflecting surfaces of the fixed reflecting mirror are n step planes. Distance between two adjacent reflecting planes is lambda/2n+klambda/2 (k is a natural number). Each beam of laser is divided into two beams through the beam splitter, wherein one beam transmits through the beam splitter through reflection of the fixed reflecting mirror to reach the photoelectric detectors, and the other beam of laser is also incident to the photoelectric detectors through reflection of the measurement reflecting mirror and the beam splitter in turn. The laser interference phenomenon generated by the laser interferometer is related to laser wavelength and also related to the height difference values of the step type reflecting planes. Displacement of which precision reaches the level of lambda/2n can be detected by the photoelectric detector group, and environmental equivalent wavelength can be acquired by adopting the wavelength correction method so that measurement precision can be substantially enhanced.
Description
Technical field
The present invention relates to a kind of Precision Inspection and instrument field, particularly a kind of wavelength amendment type multiple beam ladder planar reflector laser interference instrument and wavelength modification method.
Background technology
The appearance of laser instrument, makes ancient interference technique be developed rapidly, and laser has that brightness is high, good directionality, monochromaticity and the feature such as coherence is good, and laser interferometry techniques is comparative maturity.Laser interferometry system is applied widely: the measurement of accurate length, angle is as the detection of linear scale, grating, gauge block, precision lead screw; Position detecting system in exact instrument is as the control of precision optical machinery, correction; Position detecting system in large scale integrated circuit specialized equipment and detecting instrument; Minute sized measurement etc.In most of laser interference length-measuring system, all have employed Michelson interferometer or similar light channel structure.
The light beam that single frequency laser interferometer sends from laser instrument, is divided into two-way by spectroscope after beam-expanding collimation, and reflects can be combined in spectroscope from stationary mirror and moving reflector respectively and produce interference fringe.When moving reflector moves, the light intensity change of interference fringe is converted to electric impulse signal by the photo-electric conversion element in receptacle and electronic circuit etc., after shaping, amplification, input up-down counter calculate overall pulse number, calculating formula L=N × λ/2 are pressed again by robot calculator, in formula, λ is optical maser wavelength (N is electric pulse sum), calculates the displacement L of moving reflector.When using single frequency laser interferometer, require that ambient atmosphere is in steady state (SS), various air turbulence all can cause DC level change and affect measurement result.
One of weakness of single frequency laser interferometer is exactly seriously affected by environment, and severe at test environment, when measuring distance is longer, this shortcoming is very outstanding.Its reason is that it is a kind of direct current measurement system, must have the drawback of the gentle level drift of direct current light.When laser interferometer moveable mirror moves, photelectric receiver can output signal, if signal has exceeded the triggering level of counter, will go on record, if and laser beam intensity changes, with regard to likely making photosignal make counter stop counting lower than the triggering level of counter, the main cause of laser intensity or interference signal Strength Changes is made to be air turbulence, lathe mist of oil, cutting swarf is on the impact of light beam, and skew or corrugated distortion occur result light beam.
Single frequency laser interferometer is owing to measuring the problem of structure, and its measuring accuracy is limited to the wavelength of laser, and its precision can only be generally the integral multiple of its wavelength, is difficult to promote again, and the change of measurement environment simultaneously has considerable influence to measurement result.Along with the requirement of commercial production to precision measurement is more and more higher, the measuring accuracy of surveying instrument is had higher requirement.
Summary of the invention
The object of the invention is to overcome existing laser interferometer measurement precision and be limited to optical maser wavelength, measuring accuracy is difficult to the deficiency promoted, a kind of wavelength amendment type multiple beam ladder planar reflector laser interference instrument and wavelength modification method are provided, this laser interferometer is on the basis of existing Michelson laser interferometer, adopt multiple light courcess multi-ladder plane mirror, the precision of λ/2n can be detected for n ladder plane mirror, improve the measuring accuracy of laser interferometer.Laser effective wavelength under measurement environment can be obtained by wavelength modification method of the present invention, further increases the measuring accuracy of this laser interferometer.Simultaneously due to multi-pass interference state checker, there is higher antijamming capability to the environmental change of optical path.
In order to realize foregoing invention object, the invention provides following technical scheme:
A kind of wavelength amendment type multiple beam ladder planar reflector laser interference instrument, comprise lasing light emitter, spectroscope, stationary mirror, measurement reflector apparatus, photodetector group, it is characterized in that, described measurement reflector apparatus comprises measures catoptron and accurate displacement device, described measurement catoptron is arranged on described accurate displacement device, described accurate displacement device is arranged on testee, described accurate displacement device for described measurement catoptron provide with testee displacement in the same way or reverse displacement.Described lasing light emitter comprises n collimated laser beam, wherein n >=2, described photodetector group comprises n photoelectric detector, the reflecting surface of described stationary mirror is n the plane of reflection becoming notch cuttype, the spacing of adjacent two planes of reflection equals λ/2n+k λ/2, and wherein k is random natural number, λ is the optical maser wavelength that lasing light emitter sends; Every Shu Jiguang that each described lasing light emitter sends is after described dichroic mirror, and vertically inject a corresponding plane of reflection respectively, each described plane of reflection is by corresponding laser reflection each photoelectric detector of correspondence to described photodetector group; The often bundle laser beam that described lasing light emitter sends, after described spectroscope transmission, impinges perpendicularly on described measurement catoptron back reflection each photoelectric detector to the correspondence of photodetector group respectively.
The collimated laser beam quantity of the lasing light emitter generation of this laser interferometer, the quantity of notch cuttype plane of reflection quantity and photoelectric detector is n (n >=2), and be one_to_one corresponding, namely every Shu Jiguang that lasing light emitter is launched is divided into two-way, one road laser is by after dichroic mirror to one of them plane of the cascaded surface of stationary mirror, vertical reflection is to one of them photoelectric detector in photodetector group, another road laser straight is connected in spectroscope to incide after transmission to measure after catoptron vertical reflection to same photoelectric detector again, this photoelectric detector can detect this two-way optical path difference and be subjected to displacement in process whether produce the strongest interference state or the most weak interference state at measurement catoptron.Owing to stationary mirror being notch cuttype reflecting surface, so each Shu Jiguang that lasing light emitter is launched is not identical by the light path of the light path after the cascaded surface reflection of stationary mirror, the retardation values arrived after every Shu Jiguang that lasing light emitter is launched simultaneously is divided into two-way after corresponding photoelectric detector is all not identical, phenomenon can be interfered not only relevant with the wavelength of laser, also there is relation with the level difference of the ladder plane of reflection, adjacent two level differences of this cascaded surface (i.e. the notch cuttype plane of reflection) equal λ/2n+k λ/2, namely the height difference in adjacent steps face can be the same or different, because every Shu Jiguang is after each plane of reflection reflection, light path is difference to some extent, height difference regardless of adjacent two planes of reflection is how many, its optical path difference is λ/n+k λ.
Because in above-mentioned optical path difference formula, k λ can't affect the interference state of this beam laser, only have difference λ/n just can have an impact to the interference state of this beam laser, therefore, as long as measure catoptron to carry out the distance of mobile λ/2n or integral multiple in the distance of λ/2n, one of them of photoelectric detector in this photodetector group can detect that its laser interference state reaches the strongest interference state, therefore the accuracy of detection of this laser interferometer then becomes λ/2n, can only accuracy of detection be for laser wavelength lambda relative to existing laser interferometer, this measuring accuracy is significantly improved, namely this measuring accuracy is determined by the spacing (also can be described as height or thickness) of every two ladder planes of the cascaded surface of stationary mirror and the optical maser wavelength of lasing light emitter.
Owing to adopting multi-pass interferometry, in measuring process, the DC level that each photodetector detects should alternately change, if the DC level that the change of the measurement environment of a certain light path causes photodetector to measure offsets, and there is not alternately change in the DC level that the photodetector of other optical path detects, now think that this optical path is the impact being subject to measurement environment, ignore the change of its level.If the DC level that the change of the measurement environment of many light paths causes multiple photodetector to measure offsets, then think that measurement environment changes, ignore the change of its level.Only the situation strictly meeting the alternately change of multi-pass interference state in measuring process is just counted it, namely introduce AC signal in multi-pass interferometry, the measurement of DC level in traditional laser interferometry is converted to the measurement of AC signal.
It should be noted that, adjacent two level differences equal λ/2n+k λ/2, and whether real decision laser is in the just difference λ/2n of the strongest interference state, and difference k λ/2 of increase are the height difference in order to increase adjacent two reflectings surface of cascaded surface.
Preferably, described stationary mirror comprises plane mirror body and n-1 reflection sheet combines, and the thickness of each described reflection sheet is λ/2n+k λ/2, and wherein k is natural number.
This cascaded surface is superimposed upon on plane mirror body by n-1 reflection sheet and forms, plane mirror body surface is laser interferometer normal mirror, wherein the thickness of each reflection sheet is λ/2n+k λ/2, k is natural number, and namely the thickness of each reflection sheet can be the same or different.
Preferably, each described reflection sheet thickness is λ/2n.
Preferably, described plane mirror body and the identical reflection sheet of n-1 thickness are formed in one body, the height error of two ladder planes that adjacent two reflection sheets avoiding the reflection sheet of piecemeal to link together producing are formed.
In the such scheme of the application, due to measurement catoptron is arranged on accurate displacement device, and accurate displacement device is arranged on testee, when testee is subjected to displacement, testee drives accurate displacement device, and then drive measurement catoptron, so, when testee is subjected to displacement, in displacement process, due to the change of optical interference circuit light path, make, the laser interference state of corresponding light beam also changes thereupon, before starting surveying work, start accurate displacement device, measurement catoptron is made to produce displacement, the sense of displacement of described measurement catoptron and the sense of displacement of testee are on the same line, when any one photodetector in photodetector group detects the strongest constructive interference, stop accurate displacement device, and photodetector countings all in photodetector group are reset, and then start the displacement of measuring testee, in the interference state change procedure of corresponding laser beam, the total degree N of the strongest constructive interference of the corresponding optical interference circuit of all photodetectors register in photodetector group, when testee mobile end, when remaining static, photodetector group stops counting, now, by accurate displacement device, measurement catoptron is moved on the sense of displacement of testee, and observe photodetector group, when any one photodetector in photodetector group detects the strongest constructive interference, stop accurate displacement device, and read the shift value △ L that accurate displacement device provides for measuring catoptron.
If displacement △ L is identical with the sense of displacement of testee, then shift value L=N × λ/(2n)+(λ/(2n)-△ L) of the actual generation of testee, wherein △ L < λ/(2n), in formula, λ is optical maser wavelength;
If displacement △ L is contrary with the sense of displacement of testee, then the shift value L=N × λ of the actual generation of testee/(2n)+△ L, wherein △ L < λ/(2n), in formula, λ is optical maser wavelength.
So, pass through said structure, also measure add in displacement detecting result by exceeding 1/ (2n) individual optical maser wavelength part △ L in testee actual displacement, and then make the displacement result that obtains measured by the laser interferometer of the application more accurate, its degree of accuracy, higher than 1/ (2n) individual optical maser wavelength, specifically depends on the displacement accuracy that accurate displacement device can provide.
As the preferred version of the application, described accurate displacement device comprises support platform and is arranged on the drive unit in described support platform, described support platform matches with described testee, and described drive unit is the displacement that described measurement catoptron is provided on testee sense of displacement.
As the preferred version of the application, described drive unit is Piezoelectric drive unit.
In this programme, adopt the ceramic material that mechanical energy and electric energy can be changed mutually by Piezoelectric drive unit, its deformation quantity produced under electric field action is very little, be no more than at most the micro-displacement of 1/10000000th of size own, there is good repetitive distortion recovery capability, good stability, precision are high, further increase accuracy and the reliability of the application's accurate displacement device.
As the preferred version of the application, described accurate displacement device also comprises the first displacement piece be arranged in described support platform and the second displacement piece be arranged in described first displacement piece, described drive unit matches with described first displacement piece, for described first displacement piece provides the displacement along described support platform, described first displacement piece has an inclined-plane tilted relative to its sense of displacement, described second displacement piece is slidably arranged on the inclined-plane of described first displacement piece, described second displacement piece can be slided along the inclined-plane of described first displacement piece, snug fit between described first displacement piece and the second displacement piece, described measurement catoptron is arranged in described second displacement piece, described support platform is also provided with restraint device, described second displacement piece of described restraint device restriction is along moving on described first displacement piece sense of displacement, make when the first displacement piece is driven by described drive unit and produces displacement, described second displacement piece is driven by described first displacement piece and produces displacement, and, the sense of displacement of described second displacement piece and the sense of displacement of described first displacement piece perpendicular, the inclined-plane of described first displacement piece and the angle of its sense of displacement are A degree, 0<A<45.
In the such scheme of the application, drive unit matches with the first displacement piece, for the first displacement piece provides the displacement along support platform, first displacement piece has an inclined-plane tilted relative to its sense of displacement, second displacement piece is slidably arranged on the inclined-plane of the first displacement piece, second displacement piece can be slided along the inclined-plane of the first displacement piece, when accurate displacement device works, drive unit provides certain displacement to promote the first displacement piece, now, because restraint device limits the second displacement piece along moving on the first displacement piece sense of displacement, make the sense of displacement of the sense of displacement of the second displacement piece and the first displacement piece perpendicular, so, the displacement of the second displacement piece is relevant to the displacement that drive unit provides for the first displacement piece, also relevant with the angle of its sense of displacement to the inclined-plane of the first displacement piece.
Namely, if the inclined-plane of the first displacement piece and the angle of its sense of displacement are A degree, when the displacement that drive unit provides is X, second displacement piece is being Y=Xtan (A) perpendicular to the displacement that drive unit direction of motion produces, so, when included angle A is less than 45 degree, the displacement that one is less than X value will be obtained, when further reducing included angle A, displacement Y also reduces thereupon, so, make in the scheme of the application, accurate displacement device is by changing the mode of precision with stroke, directly enhance the precision of the application's accurate displacement device, also just further improve the measuring accuracy of the application's laser interferometer.
As the preferred version of the application, be also provided with the magnetic magnetic part of tool between described first displacement piece and described support platform, described second displacement piece has magnetic, state that described second displacement piece and described magnetic part are that there is a natural attraction between the sexes.Making the first displacement piece when being pushed, can keep fitting tightly with the second displacement piece, ensure the precision of the application's accurate displacement device, and then ensure the measuring accuracy of the application's laser interferometer.
As the preferred version of the application, described second displacement piece is also provided with flexible member.Making the first displacement piece when being pushed, can keep being in contact condition with the second displacement piece, ensure the precision of the application's accurate displacement device, and then ensure the measuring accuracy of the application's laser interferometer.
As the preferred version of the application, described second displacement piece and described measurement catoptron are integral type structure.
In such scheme, the second displacement piece is integral type structure with measuring catoptron, that is, directly a reflecting surface is set in the second displacement piece, makes itself be formed and measure catoptron, so, simplify the structure of the application's laser interferometer, convenient debugging and use.
Although at present, also there is the device measuring air refraction, the atmospheric temperature of single locus, humidity and air pressure are measured, by wavelength compensation formula, optical maser wavelength is revised, but it is merely able to detect local air, and in the displacement measurement field of the application, because its displacement carries out in a region, in this region, each parameter of the air of each position all has difference, particularly there is the situations such as larger thermograde, moist gradient and barometric gradient, comparatively big error will be there is with single-point parameters revision optical maser wavelength.
So, for these reasons, in this application, a kind of optical maser wavelength modification method of laser interferometer is inventor provided, under detecting current measurement environment, the environment effective wavelength λ ' of laser, and this λ ' value is the effective wavelength of current measurement environment, so the problem directly avoiding zones of different air refraction difference and bring, so, reduce the error that environmental factor is brought, and then further improve the measuring accuracy of the application's laser interferometer and measuring method thereof.
Disclosed herein as well is a kind of optical maser wavelength modification method adopting above-mentioned laser interferometer, comprise the steps:
Steps A: needing to adopt laser interferometer to carry out in the environment of displacement measurement, installs wavelength amendment type multiple beam ladder planar reflector laser interference instrument;
Step B: measurement reflector apparatus is arranged on testee;
Step C: debugging wavelength amendment type multiple beam ladder planar reflector laser interference instrument, makes it form satisfactory light path, and make each optical interference circuit be in interference state;
Step D: start accurate displacement device, measurement catoptron is moved, when there being any one the strongest constructive interference to be detected in photodetector group, stopping accurate displacement device, and being reset by photodetector group counting;
Step e: again start accurate displacement device, traverse measurement catoptron, make the total degree of the strongest constructive interference of all photodetectors register in photodetector group be M (M is positive integer), and read measurement mirror displacements value Z corresponding to M constructive interference the strongest;
Step F: according to Z=(M × λ ')/(2n), n is photodetector number, under drawing current measurement environment, effective wavelength the λ '=2nZ/M of laser.
As the preferred version of the application, in described step D and E, the strongest described constructive interference can also be the most weak destructive interference.In this programme, in optical maser wavelength makeover process, photodetector is the total degree recording the most weak destructive interference in each laser interference light path, the correction of the optical maser wavelength that so still can realize.
In such scheme, by detecting the effective wavelength λ ' in measurement environment, namely the wavelength of laser being revised, so reducing the error that environmental factor is brought, and then further improve the measuring accuracy of the application's laser interferometer and measuring method thereof.
Compared with prior art, beneficial effect of the present invention:
(1) the laser beam quantity of the lasing light emitter transmitting of this high precision ladder plane reflection laser interferometer, the quantity of notch cuttype plane of reflection quantity and photoelectric detector is n (n >=2), and one_to_one corresponding, the each Shu Jiguang launched due to lasing light emitter is different by the light path of the light path after Different Plane reflection on the cascaded surface of stationary mirror, the retardation values arrived after every Shu Jiguang that lasing light emitter is launched simultaneously is divided into two-way after corresponding photoelectric detector is all not identical, whether each photoelectric detector can detect corresponding two-way laser can interfere phenomenon, the generation of this interference is not only relevant with the wavelength of laser, also there is relation with the level difference of cascaded surface, because adjacent two level differences of this cascaded surface equal λ/2n+k λ/2, therefore, as long as measure catoptron to carry out the distance of mobile λ/2n or integral multiple in the distance of λ/2n, photoelectric detector in this photodetector group one of them can only can detect that it is in most light laser interference state, therefore the accuracy of detection of this laser interferometer is λ/2n, can only accuracy of detection be for laser wavelength lambda relative to existing laser interferometer, its measuring accuracy obtains significant raising.Simultaneously owing to adopting multi-pass interferometry, in measuring process, the DC level that each photodetector detects should alternately change, if the DC level that the change of the measurement environment of a certain light path causes photodetector to measure offsets, and there is not alternately change in the DC level that the photodetector of other optical path detects, now think that this optical path is the impact being subject to measurement environment, ignore the change of its level.If the DC level that the change of the measurement environment of many light paths causes multiple photodetector to measure offsets, then think that measurement environment changes, ignore the change of its level.Only the situation strictly meeting the alternately change of multi-pass interference state in measuring process is just counted it, namely AC signal is introduced in multi-pass interferometry, the measurement of DC level in traditional laser interferometry is converted to the measurement of AC signal, improves the antijamming capability of interferometer.
(2) by detecting the effective wavelength λ ' of laser in measurement environment, optical maser wavelength being revised, so, reducing the error that environmental factor is brought, and then further improve the measuring accuracy of the application's laser interferometer.
Accompanying drawing illustrates:
fig. 1for laser optical path signal when wavelength amendment type multiple beam ladder planar reflector laser interference instrument of the present invention uses
figure;
fig. 2for
fig. 1the structural representation of middle lasing light emitter
figure;
fig. 3for
fig. 1the structural representation of the notch cuttype plane of reflection of middle stationary mirror
figure;
fig. 4for measuring catoptron and the second displacement piece integral structure
figure.
fig. 1mark in-4:
1, lasing light emitter, 11, laser beam one, 12, laser beam two, 13, laser beam three, 14, laser beam four, 2, spectroscope, 3, stationary mirror, 31, the plane of reflection one, 32, the plane of reflection two, 33, the plane of reflection three, 34, the plane of reflection four, 35, catoptron body, 36, reflection sheet, 4, measure catoptron, 5, photodetector group, 51, photoelectric detector one, 52, photoelectric detector two, 53, photoelectric detector three, 54, photoelectric detector four, 6, accurate displacement device, 7, measure catoptron, 8, supporting platform, 9, drive unit, 10, restraint device, 11, magnetic part, 12, testee, 13, first displacement piece, 14, second displacement piece, 15, inclined-plane, 16, flexible member.
Embodiment
Below in conjunction with test example and embodiment, the present invention is described in further detail.But this should be interpreted as that the scope of the above-mentioned theme of the present invention is only limitted to following embodiment, all technology realized based on content of the present invention all belong to scope of the present invention.
as Fig. 1shown in, a kind of wavelength amendment type multiple beam ladder planar reflector laser interference instrument, comprise lasing light emitter 1, spectroscope 2, stationary mirror 3, measure reflector apparatus 4, photodetector group 5, described measurement catoptron group 4 comprises measures catoptron 7 and accurate displacement device 6, measure catoptron 7 and comprise a plane of reflection, described measurement catoptron 7 is arranged on described accurate displacement device 6, described accurate displacement device 6 is arranged on testee 12, described accurate displacement device 6 for described measurement catoptron 7 provide with testee 12 displacement in the same way or reverse displacement;
Described lasing light emitter 1 comprises n collimated laser beam, n >=2, photodetector group 5 also comprises n photoelectric detector, the reflecting surface of stationary mirror 3 is n the notch cuttype plane of reflection, the spacing h of adjacent two ladder planes of reflection equals λ/2n+k λ/2, and wherein k is natural number, λ is the optical maser wavelength that lasing light emitter 1 sends; The often bundle laser beam that lasing light emitter 1 sends, after spectroscope 2 reflects, vertically injects a corresponding reflection sheet 36 respectively, and each reflection sheet 36 will often restraint laser reflection to corresponding photoelectric detector; The corresponding laser beam that lasing light emitter 1 sends, after spectroscope 2 transmission, impinges perpendicularly on respectively after measuring catoptron 7 and reflexes to corresponding photoelectric detector again.It should be noted that, the λ in literary composition is the optical maser wavelength that lasing light emitter 1 sends, and the often bundle optical maser wavelength that lasing light emitter 1 sends is all the same.
The laser beam quantity that the lasing light emitter 1 of this laser interferometer sends, the photoelectric detector quantity of cascaded surface plane quantity and photodetector group 5 is n (n >=2), and be one_to_one corresponding, namely every Shu Jiguang that lasing light emitter 1 is launched is divided into two-way, one road laser reflexes to one of them plane of the cascaded surface of stationary mirror 3 by spectroscope 2 after, be reflected back spectroscope 2 and reenter one of them photoelectric detector be mapped in photodetector group 5, another road laser straight reflexes to spectroscope 2 after being connected in spectroscope 2 and impinging perpendicularly on measurement catoptron 7 after transmission again, spectroscope 2 reflects it to same photoelectric detector again, this photoelectric detector can detect this two-way optical path difference and be subjected to displacement in process whether produce interference state at measurement catoptron 7, i.e. constructive interference or destructive interference.Due to the cascaded surface on stationary mirror 3, so each Shu Jiguang that lasing light emitter 1 is launched is not identical by the light path of the light path after the cascaded surface reflection of stationary mirror 3, the retardation values arrived after every Shu Jiguang that lasing light emitter 1 is launched simultaneously is divided into two-way after corresponding photodetector group 5 is all not identical, phenomenon can be interfered not only relevant with the wavelength of laser, also there is relation with the level difference of cascaded surface, because adjacent two level difference h of this cascaded surface equal λ/2n+k λ/2, therefore, as long as measure catoptron 7 to carry out the distance of mobile λ/2n or integral multiple in the distance of λ/2n, photodetector group 5 on this photodetector all has one of them to detect, and it is in most light laser interference state, therefore the accuracy of detection of this laser interferometer then becomes λ/2n, can only accuracy of detection be for laser wavelength lambda relative to existing laser interferometer, this measuring accuracy is significantly improved, namely this measuring accuracy is determined by the spacing (also can be described as height or thickness) of adjacent two ladder planes of the cascaded surface of stationary mirror 3 and the optical maser wavelength of lasing light emitter 1.
This stationary mirror 3 comprises plane mirror body 35 and the identical reflection sheet 36 of n-1 thickness h combines, and the thickness h of each described reflection sheet 36 is λ/2n.This cascaded surface is superimposed upon on plane mirror body 35 by the reflection sheet 36 that n-1 thickness h is identical and forms, and plane mirror body 35 is the laser interferometer normal mirror that surface is plane, and wherein the thickness h of each reflection sheet 36 is λ/2n.Meanwhile, this plane mirror body 35 and the identical reflection sheet 36 of n-1 thickness h can be formed in one body, the height error of two ladder planes that adjacent two reflection sheets 36 avoiding the reflection sheet 36 of piecemeal to link together producing are formed.
as Fig. 2shown in, n the laser beam that all lasing light emitters 1 send is equally spaced, now, select n=4, k=0, the laser beam that lasing light emitter 1 sends is respectively laser beam 1, laser beam 2 12, laser beam 3 13, laser beam 4 14, and the spacing d of adjacent two laser beam equals the integral multiple of optical maser wavelength.Select the optical maser wavelength of 663 nanometers, the spacing d of the adjacent laser beams that adjacent laser source 1 sends is 4 millimeters.The photoelectric detector that corresponding photodetector group 5 receives laser is also respectively four, i.e. photoelectric detector 1, photoelectric detector 2 52, photoelectric detector 3 53, photoelectric detector 4 54.
Now, the notch cuttype plane of reflection on stationary mirror 3 is also corresponding elects four as, i.e. the plane of reflection 1, the plane of reflection 2 32, the plane of reflection 3 33, the plane of reflection 4 34,
as Fig. 3shown in, select four planes of reflection to become notch cuttype plane so that process and reduce costs.This light path route is that the laser that laser beam 1 sends is divided into two-way at spectroscope 2, one tunnel is split after mirror 2 reflects and incides stationary mirror 3, transmission incide photoelectric detector 1 again after being reflexed to spectroscope 2 by the plane of reflection 1, another road of this laser is then direct incides measurement catoptron 7 after spectroscope 2 transmission, after being reflected to spectroscope 2, spectroscope 2 again by this laser reflection to photoelectric detector 1.By that analogy, other laser beam 2 12, laser beam 3 13, laser beam 4 14 are reflected by the plane of reflection 2 32, the plane of reflection 3 33, the plane of reflection 4 34 respectively, and are received by photoelectric detector 2 52, photoelectric detector 3 53, photoelectric detector 4 54 respectively.According to calculating, owing to have employed four notch cuttype planes of reflection, the difference in height of adjacent two planes of reflection is λ/8, and the retardation values of laser after stationary mirror 3 reflects therefore sent by laser beam 1, laser beam 2 12, laser beam 3 13, laser beam 4 14 is respectively a
1λ, a
2λ-λ/4, a
3λ-λ/2, a
4λ-3 λ/4, wherein a
1, a
2, a
3, a
4for natural number.
When laser beam 1 be in the strongest interference state time, the retardation values after the laser that namely laser beam 1 sends is divided into two-way is a
1λ, can measure laser by photoelectric detector 1 and be in the strongest interference state, now laser beam 2 12 to optical interference circuit, laser beam 3 13 to optical interference circuit and laser beam 4 14 the two-way retardation values of optical interference circuit is respectively: a
2λ-λ/4, a
3λ-λ/2, a
4λ-3 λ/4, three's light path is now all in the strongest non-interference state.
When measurement catoptron 7 moves λ/8, when the two-way laser retardation values that lasing light emitter 1 is divided into increases λ/4, laser light path difference also corresponding increase λ/4 of other lasing light emitters, now, the retardation values that the laser that laser beam 1 sends is divided into two-way is a
1λ+λ/4, are in the strongest non-interference state, and the retardation values that the laser that laser beam 2 12 sends is divided into two-way then becomes a
2λ, therefore photoelectric detector 2 52 can detect that optical interference circuit is in the strongest interference state, and the laser of laser beam 3 13 and laser beam 4 14 is also in the strongest non-interference state.When measuring catoptron 7 and moving λ/4, laser beam 3 13 will be in the strongest interference state to optical interference circuit, can measure the strongest interference state of laser by photoelectric detector 3 53.
Similar, when measuring catoptron 7 and moving 3 λ/8, when the two-way laser retardation values that laser beam 1 is divided into increases by 3 λ/4, laser light path difference also corresponding increase by 3 λ/4 of other laser beam, the retardation values that the laser that now laser beam 4 14 sends is divided into two-way then becomes a
4λ, the two-way light path that its laser is divided into will be in constructive interference state, can measure laser interference state by photoelectric detector 4 54.
Again, when measuring catoptron 7 and moving λ/2, when the two-way laser retardation values that laser beam 1 is divided into increases λ, the laser light path difference also corresponding increase λ of other laser beam, laser beam 1 will be in again the strongest interference state to optical interference circuit, can measure the strongest interference state of laser by photoelectric detector 1.Therefore, be just λ/8 for the measuring accuracy corresponding to the laser interferometer corresponding to four-step planar laser reflection configuration, namely measure catoptron 7 displacement and be equal to or greater than λ/8, namely corresponding photodetector group 5 can observe the interference state significant change of the light path of the four bundle laser that lasing light emitter 1 is launched.
Therefore, the ladder plane of reflection quantity increasing stationary mirror 3 can improve measuring accuracy, when the laser mirror structure of the employing 8 ladder plane of reflection, the corresponding measuring accuracy corresponding to laser interferometer is then λ/16, when adopting stationary mirror 3 structure of the n ladder plane of reflection, the measuring accuracy of this laser interferometer is just corresponding becomes λ/2n.
Owing to adopting multi-pass interferometry, in measuring process, the DC level that each photodetector detects should alternately change, if the DC level that the change of the measurement environment of a certain light path causes photodetector to measure offsets, and there is not alternately change in the DC level that the photodetector of other optical path detects, now think that this optical path is the impact being subject to measurement environment, ignore the change of its level.If the DC level that the change of the measurement environment of many light paths causes multiple photodetector to measure offsets, then think that measurement environment changes, ignore the change of its level.Only the situation strictly meeting the alternately change of multi-pass interference state in measuring process is just counted it, namely AC signal is introduced in multi-pass interferometry, the measurement of DC level in traditional laser interferometry is converted to the measurement of AC signal, improves the antijamming capability of interferometer.
In the present embodiment, due to measurement catoptron 7 is arranged on accurate displacement device 6, and accurate displacement device 6 is arranged on testee 12, when testee 12 is subjected to displacement, testee 12 drives accurate displacement device 6, and then drive measurement catoptron 7, so, when testee 12 is subjected to displacement, in displacement process, the interference state of each laser interference light path that laser interferometer of the present invention is corresponding also changes thereupon, before starting surveying work, start accurate displacement device 6, measurement catoptron 7 is made to produce displacement, the sense of displacement of described measurement catoptron 7 and the sense of displacement of testee 12 are on the same line, when any one photodetector in photodetector group 5 detects the strongest constructive interference, stop accurate displacement device 6, and photodetector countings all in photodetector group 5 are reset, and then start the displacement of measuring testee 12, in the interference state change procedure of corresponding each laser interference light path, the total degree N of the strongest constructive interference of each photodetectors register of photodetector group 5, when testee 12 mobile end, when remaining static, photodetector group 5 stops counting, now, by accurate displacement device 6, measurement catoptron 7 is moved on the sense of displacement of testee 12, and observe photodetector group 5, when any one photodetector in photodetector group 5 detects the strongest constructive interference, stop accurate displacement device 6, and read the shift value △ L that accurate displacement device 6 provides for measuring catoptron 7.
If displacement △ L is identical with the sense of displacement of testee 12, then, shift value L=N × λ/(2n)+(λ/(the 2n)-△ L) that testee 12 reality produces, wherein △ L < λ/(2n), in formula, λ is optical maser wavelength;
And if displacement △ L is contrary with the sense of displacement of testee 12, then, shift value L=N × λ/(2n)+△ L that testee 12 reality produces, wherein △ L < λ/(2n), in formula, λ is optical maser wavelength.
So, pass through said structure, the part △ L exceeding laser wavelength lambda/(2n) in testee 12 actual displacement is also measured and adds in displacement detecting result, and then make the displacement result that obtains measured by the laser interferometer of the application more accurate, its precision, higher than half optical maser wavelength, specifically depends on the displacement accuracy that accurate displacement device 6 can provide.
Embodiment 2,
as Fig. 1, shown in 4, laser interferometer as described in Example 1, the drive unit 9 that described accurate displacement device 6 comprises support platform 8 and is arranged in described support platform 8, described support platform 8 matches with described testee 12, described drive unit 9 is the displacement that described measurement catoptron 7 is provided on testee 12 sense of displacement, and described drive unit 9 is Piezoelectric drive unit.
In the present embodiment, the Piezoelectric drive unit 9 adopted is ceramic material mechanical energy and electric energy can changed mutually, its deformation quantity produced under electric field action is very little, be no more than at most the micro-displacement of 1/10000000th of size own, there is good repetitive distortion recovery capability, good stability, precision are high, further increase the precision of accurate displacement device 6 in the present embodiment.
Embodiment 3,
as Fig. 1, shown in 4, laser interferometer as described in Example 2, described accurate displacement device 6 also comprises the first displacement piece 13 be arranged in described support platform 8 and the second displacement piece 14 be arranged in described first displacement piece 13, described drive unit 9 matches with described first displacement piece 13, for described first displacement piece 13 provides the displacement along described support platform 8, described first displacement piece 13 has an inclined-plane 15 tilted relative to its sense of displacement, described second displacement piece 14 is slidably arranged on the inclined-plane 15 of described first displacement piece 13, described second displacement piece 14 can be slided along the inclined-plane 15 of described first displacement piece 13, snug fit between described first displacement piece 13 and the second displacement piece 14, described measurement catoptron 7 is arranged in described second displacement piece 14, described support platform 8 is also provided with restraint device 10, described restraint device 10 limits described second displacement piece 14 along moving on described first displacement piece 13 sense of displacement, make when the first displacement piece 13 is driven by described drive unit 9 and produces displacement, described second displacement piece 14 is driven by described first displacement piece 13 and produces displacement, and, the sense of displacement of described second displacement piece 14 and the sense of displacement of described first displacement piece 13 perpendicular, the inclined-plane 15 of described first displacement piece 13 is A degree with the angle of its sense of displacement, preferred 0<A<45.
In an embodiment, drive unit 9 matches with the first displacement piece 13, for the first displacement piece 13 provides the displacement along support platform 8, first displacement piece 13 has an inclined-plane 15 tilted relative to its sense of displacement, second displacement piece 14 is slidably arranged on the inclined-plane 15 of the first displacement piece 13, second displacement piece 14 can be slided along the inclined-plane 15 of the first displacement piece 13, when accurate displacement device 6 works, drive unit 9 provides certain displacement to promote the first displacement piece 13, now, because restraint device 10 limits the second displacement piece 14 along moving on the first displacement piece 13 sense of displacement, make the sense of displacement of the sense of displacement of the second displacement piece 14 and the first displacement piece 13 perpendicular, so, the displacement of the second displacement piece 14 is relevant to the displacement that drive unit 9 provides for the first displacement piece 13, also relevant with the angle of its sense of displacement to the inclined-plane 15 of the first displacement piece 13.
That is, if the inclined-plane 15 of the first displacement piece 13 is A degree with the angle of its sense of displacement, when the displacement that drive unit 9 provides is X, the second displacement piece 14 is being Y=Xtan (A) perpendicular to the displacement that drive unit 9 direction of motion produces.Preferably, when included angle A is less than 45 degree, the displacement that one is less than X value will be obtained, when further reducing included angle A, displacement Y also reduces thereupon, so, make in the present embodiment, accurate displacement device 6, by changing the mode of precision with stroke, directly enhances the precision of the present embodiment accurate displacement device 6, also just further improves the measuring accuracy of the present embodiment laser interferometer.
Embodiment 4,
as Fig. 4shown in, laser interferometer as described in Example 3, the magnetic magnetic part 11 of tool is also provided with between described first displacement piece 13 and described support platform 8, described second displacement piece 14 has magnetic, state that described second displacement piece 14 and described magnetic part 11 be that there is a natural attraction between the sexes, described second displacement piece 14 and described measurement catoptron 7 are integral type structure.Make the first displacement piece 13 when being pushed, measure catoptron 7 can keep fitting tightly with the second displacement piece 14, ensure the precision of the application's accurate displacement device 6, and then ensure the measuring accuracy of the application's laser interferometer, the second displacement piece 14 is integral type structure with measuring catoptron 7, that is, directly a reflecting surface is set in the second displacement piece 14, makes itself be formed and measure catoptron 7, so, simplify the structure of the present embodiment laser interferometer, convenient debugging and use.
Embodiment 5
Laser interferometer as described in Example 3, described second displacement piece 14 is also provided with has flexible member 16, make the first displacement piece 13 when being pushed, can keep being in contact condition with the second displacement piece 14, ensure the precision of the application's accurate displacement device, and then ensure the measuring accuracy of the application's laser interferometer.
Embodiment 6
as Fig. 1shown in-4, a kind of optical maser wavelength modification method adopting embodiment 1-5 any one laser interferometer, comprises the steps:
Steps A: needing to adopt laser interferometer to carry out in the environment of displacement measurement, installs wavelength amendment type multiple beam ladder planar reflector laser interference instrument;
Step B: measurement reflector apparatus 4 is arranged on testee 12;
Step C: debugging wavelength amendment type multiple beam ladder planar reflector laser interference instrument, makes it form satisfactory light path, and make each optical interference circuit be in interference state;
Step D: start accurate displacement device 6, measurement catoptron 7 is moved, when there being any one the strongest constructive interference to be detected in photodetector group 5, stopping accurate displacement device, and being reset by photodetector group counting;
Step e: again start accurate displacement device, traverse measurement catoptron, make the total degree of the strongest constructive interference of all photodetectors register in photodetector group be M (M is positive integer), and read measurement mirror displacements value Z corresponding to M constructive interference the strongest;
Step F: according to Z=(M × λ ')/(2n), n is photodetector number, under drawing current measurement environment, effective wavelength the λ '=2nZ/M of laser.
Although at present, also there is the device measuring air refraction, the atmospheric temperature of single locus, humidity and air pressure are measured, by wavelength compensation formula, optical maser wavelength is revised, but it is merely able to detect local air, and in the displacement measurement field of the application, because its displacement carries out in a region, in this region, each parameter of the air of each position all has difference, particularly there is the situations such as larger thermograde, moist gradient and barometric gradient, comparatively big error will be there is with single-point parameters revision optical maser wavelength.
So, for these reasons, in this application, a kind of optical maser wavelength modification method of laser interferometer is inventor provided, under detecting current measurement environment, the environment effective wavelength λ ' of laser, and this λ ' value is the effective wavelength of current measurement environment, so the problem directly avoiding zones of different air refraction difference and bring, so, reduce the error that environmental factor is brought, and then further improve the measuring accuracy of the application's laser interferometer and measuring method thereof.
Embodiment 7
as Fig. 1shown in-4, wavelength modification method as described in Example 6, described step D is in step e, and the strongest described constructive interference can also be the most weak destructive interference.
Above embodiment only in order to the present invention is described and and unrestricted technical scheme described in the invention, although this instructions with reference to each above-mentioned embodiment to present invention has been detailed description, but the present invention is not limited to above-mentioned embodiment, therefore anyly the present invention is modified or equivalent to replace; And all do not depart from technical scheme and the improvement thereof of the spirit and scope of invention, it all should be encompassed in the middle of right of the present invention.
Claims (5)
1. a wavelength amendment type multiple beam ladder planar reflector laser interference instrument, comprise lasing light emitter, spectroscope, stationary mirror, measure reflector apparatus, photodetector group, it is characterized in that, described measurement reflector apparatus comprises measures catoptron and accurate displacement device, described measurement catoptron is arranged on described accurate displacement device, described accurate displacement device is arranged on testee, described accurate displacement device for described measurement catoptron provide with testee displacement in the same way or reverse displacement, described lasing light emitter comprises n collimated laser beam, wherein n >=2, described photodetector group comprises n photoelectric detector, the reflecting surface of described stationary mirror is n the plane of reflection becoming notch cuttype, the spacing of adjacent two planes of reflection equals λ/2n+k λ/2, wherein k is natural number, λ is the optical maser wavelength that lasing light emitter (1) sends, the laser that each described lasing light emitter sends, after described dichroic mirror, vertically injects a corresponding plane of reflection, and each described plane of reflection is by corresponding laser beam reflection each photoelectric detector to corresponding described photodetector group, every Shu Jiguang that described lasing light emitter sends, after described spectroscope transmission, impinges perpendicularly on described measurement catoptron back reflection each photoelectric detector to corresponding photodetector group respectively.
Described accurate displacement device comprises support platform and is arranged on the drive unit in described support platform, described support platform matches with described testee, described drive unit is the displacement that described measurement catoptron is provided on testee sense of displacement, described drive unit is Piezoelectric drive unit, also comprise the first displacement piece be arranged in described support platform and the second displacement piece be arranged in described first displacement piece, described drive unit matches with described first displacement piece, for described first displacement piece provides the displacement along described support platform, described first displacement piece has an inclined-plane tilted relative to its sense of displacement, described second displacement piece is slidably arranged on the inclined-plane of described first displacement piece, described second displacement piece can be slided along the inclined-plane of described first displacement piece, snug fit between described first displacement piece and the second displacement piece, described measurement catoptron is arranged in described second displacement piece, described support platform is also provided with restraint device, described second displacement piece of described restraint device restriction is along moving on described first displacement piece sense of displacement, make when the first displacement piece is driven by described drive unit and produces displacement, described second displacement piece is driven by described first displacement piece and produces displacement, and, the sense of displacement of described second displacement piece and the sense of displacement of described first displacement piece perpendicular, the inclined-plane of described first displacement piece and the angle of its sense of displacement are A degree, 0<A<45, described second displacement piece is provided with flexible member, the second displacement piece and the first displacement piece is made to keep in touch state.
2. wavelength amendment type multiple beam ladder planar reflector laser interference instrument as claimed in claim 1, it is characterized in that, the magnetic magnetic part of tool is also provided with between described first displacement piece and described support platform, described second displacement piece has magnetic, state that described second displacement piece and described magnetic part are that there is a natural attraction between the sexes.
3. wavelength amendment type multiple beam ladder planar reflector laser interference instrument as claimed in claim 2, it is characterized in that, described second displacement piece and described measurement catoptron are integral type structure.
4. adopt an optical maser wavelength modification method for wavelength amendment type multiple beam ladder planar reflector laser interference instrument as claimed in claim 3, it is characterized in that, comprise the steps:
Steps A: needing to adopt laser interferometer to carry out in the environment of displacement measurement, installs wavelength amendment type multiple beam ladder planar reflector laser interference instrument;
Step B: measurement reflector apparatus is arranged on testee;
Step C: debugging wavelength amendment type multiple beam ladder planar reflector laser interference instrument, makes it form satisfactory light path, and make each optical interference circuit be in interference state;
Step D: start accurate displacement device, measurement catoptron is moved, when there being any one the strongest constructive interference to be detected in photodetector group, stopping accurate displacement device, and being reset by photodetector group counting;
Step e: again start accurate displacement device, traverse measurement catoptron, make the total degree of the strongest constructive interference of all photodetectors register in photodetector group be M (M is positive integer), and read measurement mirror displacements value Z corresponding to M constructive interference the strongest;
Step F: according to Z=(M × λ ')/(2n), n is photodetector number, under drawing current measurement environment, effective wavelength the λ '=2nZ/M of laser.
5. the optical maser wavelength modification method as described in claim 4, is characterized in that, described step D is in step e, and the strongest described constructive interference can also be the most weak destructive interference.
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