CN105070748B - 一种igbt栅极的制作方法 - Google Patents
一种igbt栅极的制作方法 Download PDFInfo
- Publication number
- CN105070748B CN105070748B CN201510546385.6A CN201510546385A CN105070748B CN 105070748 B CN105070748 B CN 105070748B CN 201510546385 A CN201510546385 A CN 201510546385A CN 105070748 B CN105070748 B CN 105070748B
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- Prior art keywords
- grid
- silicon dioxide
- dioxide layer
- peripheral part
- protective layer
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 36
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 102
- 239000010410 layer Substances 0.000 claims abstract description 56
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 51
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 49
- 230000002093 peripheral effect Effects 0.000 claims abstract description 32
- 239000011241 protective layer Substances 0.000 claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 229920002120 photoresistant polymer Polymers 0.000 claims description 15
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 230000003647 oxidation Effects 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 6
- 229920005591 polysilicon Polymers 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 11
- 238000010586 diagram Methods 0.000 description 14
- 238000005530 etching Methods 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 241000209140 Triticum Species 0.000 description 1
- 235000021307 Triticum Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 235000013312 flour Nutrition 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 230000010415 tropism Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66234—Bipolar junction transistors [BJT]
- H01L29/66325—Bipolar junction transistors [BJT] controlled by field-effect, e.g. insulated gate bipolar transistors [IGBT]
Abstract
Description
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201510546385.6A CN105070748B (zh) | 2015-08-31 | 2015-08-31 | 一种igbt栅极的制作方法 |
Applications Claiming Priority (1)
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CN201510546385.6A CN105070748B (zh) | 2015-08-31 | 2015-08-31 | 一种igbt栅极的制作方法 |
Publications (2)
Publication Number | Publication Date |
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CN105070748A CN105070748A (zh) | 2015-11-18 |
CN105070748B true CN105070748B (zh) | 2019-01-29 |
Family
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Family Applications (1)
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CN201510546385.6A Active CN105070748B (zh) | 2015-08-31 | 2015-08-31 | 一种igbt栅极的制作方法 |
Country Status (1)
Country | Link |
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CN (1) | CN105070748B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106783568A (zh) * | 2016-12-27 | 2017-05-31 | 株洲中车时代电气股份有限公司 | 一种功率器件栅极侧墙制备方法 |
CN108269739B (zh) * | 2016-12-30 | 2021-06-04 | 无锡华润上华科技有限公司 | 多晶硅栅极的形成方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000174269A (ja) * | 1998-12-04 | 2000-06-23 | Toshiba Corp | 半導体装置及びその製造方法 |
JP2000223690A (ja) * | 1999-01-28 | 2000-08-11 | Sharp Corp | 量子細線の製造方法および半導体素子 |
CN1538508A (zh) * | 2003-04-15 | 2004-10-20 | 财团法人工业技术研究院 | 碳化硅沟槽式金氧半电晶体 |
CN102842502A (zh) * | 2011-06-22 | 2012-12-26 | 中国科学院微电子研究所 | 绝缘栅双极晶体管及其制作方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5118638A (en) * | 1988-03-18 | 1992-06-02 | Fuji Electric Co., Ltd. | Method for manufacturing MOS type semiconductor devices |
CN101740362B (zh) * | 2008-11-18 | 2011-08-24 | 上海华虹Nec电子有限公司 | 栅极形成方法 |
-
2015
- 2015-08-31 CN CN201510546385.6A patent/CN105070748B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000174269A (ja) * | 1998-12-04 | 2000-06-23 | Toshiba Corp | 半導体装置及びその製造方法 |
JP2000223690A (ja) * | 1999-01-28 | 2000-08-11 | Sharp Corp | 量子細線の製造方法および半導体素子 |
CN1538508A (zh) * | 2003-04-15 | 2004-10-20 | 财团法人工业技术研究院 | 碳化硅沟槽式金氧半电晶体 |
CN102842502A (zh) * | 2011-06-22 | 2012-12-26 | 中国科学院微电子研究所 | 绝缘栅双极晶体管及其制作方法 |
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CN105070748A (zh) | 2015-11-18 |
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Address after: The age of 412001 in Hunan Province, Zhuzhou Shifeng District Road No. 169 Patentee after: ZHUZHOU CRRC TIMES ELECTRIC Co.,Ltd. Address before: The age of 412001 in Hunan Province, Zhuzhou Shifeng District Road No. 169 Patentee before: ZHUZHOU CSR TIMES ELECTRIC Co.,Ltd. |
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Effective date of registration: 20201010 Address after: 412001 Room 309, floor 3, semiconductor third line office building, Tianxin hi tech park, Shifeng District, Zhuzhou City, Hunan Province Patentee after: Zhuzhou CRRC times Semiconductor Co.,Ltd. Address before: The age of 412001 in Hunan Province, Zhuzhou Shifeng District Road No. 169 Patentee before: ZHUZHOU CRRC TIMES ELECTRIC Co.,Ltd. |