CN104814919A - Moisturizing anti-wrinkle mask solution, manufacturing method and moisturizing anti-wrinkle mask - Google Patents

Moisturizing anti-wrinkle mask solution, manufacturing method and moisturizing anti-wrinkle mask Download PDF

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Publication number
CN104814919A
CN104814919A CN201510242022.3A CN201510242022A CN104814919A CN 104814919 A CN104814919 A CN 104814919A CN 201510242022 A CN201510242022 A CN 201510242022A CN 104814919 A CN104814919 A CN 104814919A
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extract
facial mask
mask liquid
skin
moisturizing
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CN201510242022.3A
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Chinese (zh)
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朱敏
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Cosmetics Co., Ltd. Guangzhou to the United States
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朱敏
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Abstract

The invention discloses a moisturizing anti-wrinkle mask solution and a manufacturing method thereof. The anti-wrinkle mask solution is prepared from the following components in percentage by weight: 0.1-2.0% of high-polymer sodium hyaluronate, 0.1-2% of oligomeric sodium hyaluronate, 0.01-0.2% of disodium edetate, 0.01-5.0% of desensitizer, 1-8% of first moisturizer, 0.01-0.5% of preservative, 0.01-1% of oligopeptide, 1-6% of second moisturizer, 0.5-2% of yeast extract and the balance of deionized water. The preparation method of the mask solution is simple. By using the synergistic actions of the epidermal growth factor oligopeptide and the double moisturizing factors high polymer sodium hyaluronate and oligomeric sodium hyaluronate in combination with the ferment carrier-yeast extract, the mask solution has the functions of restoring the damaged part of the skin, accelerating the skin regeneration progress, promoting the metabolism of the fibrocytes and epidermis cells, improving the skin circulation, enhancing the compactness and fullness of the skin and relieving the skin texture symptom, thereby finally achieving the efficient moisturizing and anti-wrinkle effects.

Description

A kind of moisturizing wrinkle removal facial mask liquid, manufacture method and moisturizing wrinkle removal facial film
Technical field
The present invention relates to a kind of facial mask liquid and manufacture method thereof, be specifically related to a kind of the moisturizing wrinkle removal facial mask liquid and the manufacture method thereof that contain oligopeptide.In addition, the invention still further relates to a kind of moisturizing wrinkle removal facial film comprising this facial mask liquid, belong to cosmetic field.
Background technology
Facial film is as skin care item common in a kind of daily life, it utilizes the blink covering face, the pore of skin is impelled to expand, promote sweat gland secretion and metabolism, the oxygen content of skin is made to increase, to promote that skin gets rid of the oil substances of the metabolic product of epidermis cell and accumulation, and the highly condensed nutritious composition in facial mask liquid is added in skin fast, thus reality is to the effectively nursing fast of skin.At present, the facial film on market is of a great variety, and effect of its demand is also had nothing in common with each other.But these facial films are not good enough in moisturizing wrinkle removal effect, therefore, a facial film with significant moisturizing wrinkle removal effect of exploitation is badly in need of.
Summary of the invention
The object of the invention is to overcome the deficiencies in the prior art, provide a kind of preparation method simple, and there is the facial mask liquid of significant moisturizing wrinkle removal effect.Another object of the present invention is to the manufacture method that this facial mask liquid a kind of is provided.Another object of the present invention is to provide a kind of patch formula moisturizing wrinkle removal facial film comprising this facial mask liquid.
For achieving the above object, the present invention is by the following technical solutions:
Moisturizing wrinkle removal facial mask liquid of the present invention, by weight percentage, it is made up of following component: polymer hyaluronic acid sodium: 0.1-2.0%, oligomerization hyaluronate sodium: 0.1-2%, disodiumedetate (EDTA-2Na): 0.01-0.2%, anti-sensitizer: 0.01-5.0%, the first wetting agent: 1-8%, antiseptic: 0.01-0.5%, oligopeptide: 0.01-1%, the second wetting agent: 1-6%, yeast extract: 0.5-2%, deionized water: its surplus.
Wherein, preferably, by weight percentage, described facial mask liquid is made up of following component: polymer hyaluronic acid sodium: 0.8%, oligomerization hyaluronate sodium: 1.2%, EDTA-2Na:0.03%, anti-sensitizer: 0.20%, the first wetting agent: 7.6%, antiseptic: 0.02%, the second wetting agent: 1.8%, oligopeptide: 0.25%, yeast extract: 0.76%, deionized water: its surplus.
Further, the molecular weight of described polymer hyaluronic acid sodium is 1000kDa ~ 1800kDa;
The molecular weight of described oligomerization hyaluronate sodium is less than 10kDa;
Described oligopeptide is at least one in oligopeptide-1 (EGF-1), oligopeptide-2 (EGF-2), oligopeptide-3 (EGF-3) and oligopeptide-5 (EGF-5);
Further: to be anti-sensitizer be in glycyrrhizic acid dipotassium, camomile extract, sinomenine, Flos Chrysanthemi extract, Herba Centellae extract, Herba Rosmarini Officinalis extract, Glycyrrhiza glabra L. extract, Rhizoma Polygoni Cuspidati extract, Folium Camelliae sinensis extract, scutellariae,radix extract, Radix Sophorae Flavescentis extract, Aloe vulgaris leaf extract, Radix Sangusorbae extract, peel of Citrus reticulata Blanco extract, Fructus Gleditsia extract, Cacumen Platycladi extract, B9-Vitapol, Vitapol VB at least one that described anti-sensitizer is described anti-sensitizer;
Described antiseptic is at least one in chlorphenesin, phenoxyethanol, methyl hydroxybenzoate, Sensiva SC50, Methylisothiazolinone, 2-bromo-2-nitropropane-1,3-glycol, methylchloroisothiazandnone, iodine propilolic alcohol butyl mephenesin Carbamate, BIT;
Described first wetting agent is at least one in 1,3 butylene glycol, glycerol, propylene glycol, PEG-400, Natrulon H-10, glycerin polyether-26, reed fragrant plant oil; Described second wetting agent is at least one in glucosan, Scleroglucan, oat beta-glucan, mushroom glucosan, yeast dextran, Aloe glue.
In the said components of facial mask liquid of the present invention:
Macromolecule hyaluronic acid sodium: there is excellent lubricity, film property, moisture retention and anti-sunlight function; easily pin moisture in skin surface; keep skin smooth moistening; strengthen skin vigor, can microgroove be smoothed simultaneously, improve skin water oil balance; make the tender gloss of skin; high resilience, and assist skin barrier territorial function, protection skin is from infringement.
Oligomerization hyaluronate sodium: the present invention adopts molecular weight to be less than the oligomerization hyaluronate sodium of 10kDa, it is easy to Transdermal absorption more, infiltrate skin basal layer, there is deep moisturizing, defying age, carry out shining the effect of rear reparation, and blood vessel elasticity, increase cell thickness can be improved, contribute to improving red blood streak symptom.
Oligopeptide: be a kind of active substance in human body, by 53 amino active polypeptide formed, by the tyrosine phosphorylation stimulating EGFR, reach and repair hypertrophy skin surface cell, promote the proliferation and differentiation of cell, thus replace the effect of old and feeble and dead cell with the cell of new life.Oligopeptide pore refining, crease-resistant effect are very remarkable, reason is the growth division that oligopeptide can promote various kinds of cell in epidermis cell tissue, make epidermis cell become full, recover younger state, it can also impel collagen growth ability, repair the collagen elastic fiber of aging fracture, be described as " the beautiful factor ".
Yeast extract: yeast will the wherein extracting such as protein, nucleic acid, vitamin after breaking cellular wall, the active skull cap components pale yellow powders such as micromolecular aminoacid, peptide, nucleotide, vitamin are rich in again through biological enzymolysis, amino acid content more than 30%, total protein more than 50%, nucleotide more than 10%.Aminoacid in yeast extract, peptide have good moistening effect, nucleotide then has the effect of scavenging free radicals, nourishes rough skin cell, skin metabolism can be improved, make skin more delicate smooth, in addition, the nutrients such as contained in yeast extract a small amount of vitamin and mineral can also provide sufficient nutrition for skin.It should be noted that, the yeast extract adopted in the present invention not only extracts by extraction process of the prior art and forms, and also obtain by market is bought, then this repeats no more.
Another object of the present invention, a kind of manufacture method of moisturizing wrinkle removal facial mask liquid as above, it comprises following manufacturing step:
A, the polymer hyaluronic acid sodium of above-mentioned percentage by weight, oligomerization hyaluronate sodium, EDTA-2Na, anti-sensitizer, the first wetting agent and deionized water are stirred 30-60min to each component mix homogeneously with the rotating speed of 2000-4000rpm at 80-85 DEG C;
B, the component mixture in step a is cooled to 45-50 DEG C, and add antiseptic, oligopeptide, the second wetting agent and yeast extract, and namely obtain moisturizing wrinkle removal facial mask liquid of the present invention after stirring 30-60min to each component mix homogeneously with the rotating speed of 2000-4000rpm.
Another object of the present invention, a kind of patch formula moisturizing wrinkle removal facial film, it comprises the face mask substrate material as facial mask liquid carrier, and on described face mask substrate material, uniform adsorption has the present invention's facial mask liquid as above.
Wherein, preferably: often open deadweight for the face mask substrate material of 20-80g is adsorbed with facial mask liquid described in 20-50g.
It is even more preferred that described face mask substrate material is any one in cotton, silkworm silk, non-woven fabrics and biological fiber.
Beneficial effect of the present invention is, moisturizing wrinkle removal facial mask liquid of the present invention, manufacture method is simple, utilize the synergism of " epidermal growth factor " oligopeptide and " dual Moisture factor " polymer hyaluronic acid sodium and oligomerization hyaluronate sodium, and with ferment carrier--yeast extract combines, facial mask liquid of the present invention is had and repairs skin undamaged portion, accelerate the newborn process of skin, promote fibrocyte and epidermis cell metabolism, improve skin circulation, improve compact sense and the satiety of skin, alleviate the effect of skin pattern symptom, finally reach the effect of efficient moisturizing wrinkle removal.In addition, facial mask liquid of the present invention not only directly can be coated on face and carry out skin nursing, is also entered skin nursing by being adsorbed in mode face mask substrate material being made patch formula facial film, to meet the different nursing care demand of the personage that likes to be beautiful.
Detailed description of the invention
Below in conjunction with specific embodiment, the specific embodiment of the present invention is described further.But the present invention is not limited in following embodiment.Unless otherwise noted, the mode that each component adopted in the present invention is all bought by market obtains.Wherein:
K220 is the antiseptic that German Shu Mei produces, and its principle active component is Methylisothiazolinone/Sensiva SC50; K145 is the antiseptic that German Shu Mei produces, and its principle active component is the bromo-2-nitropropane of 2--1,3-glycol/methylchloroisothiazandnone/Methylisothiazolinone; 9010 is the main antiseptic effectively becoming phenoxyethanol/Sensiva SC50 of German Shu Mei production; SIG is the principle active component that Thorlabs company of the U.S. produces is the antiseptic of Methylisothiazolinone/BIT.
The yeast elite extract E100 of what yeast extract in the embodiment of the present invention adopted is Angel Yeast Co., Ltd.
Embodiment 1
A kind of moisturizing wrinkle removal facial mask liquid, by weight percentage, it is made up of the raw material of following component: polymer hyaluronic acid sodium (molecular weight 1200kDa): 0.8%, oligomerization hyaluronate sodium (molecular weight 9000Da): 1.2%, EDTA-2Na:0.03%, glycyrrhizic acid dipotassium: 0.2%, 1,3 butylene glycol: 7.6%, K220:0.02%, oligopeptide-1:0.25%, oat beta-glucan: 1.8%, yeast elite extract E100:0.76%, deionized water: its surplus.
By said components and percentage by weight, the manufacturing step of described facial mask liquid comprises:
A, the polymer hyaluronic acid sodium of above-mentioned percentage by weight, oligomerization hyaluronate sodium, EDTA-2Na, glycyrrhizic acid dipotassium, 1,3 butylene glycol and deionized water are stirred 40min to each component mix homogeneously with the rotating speed of 3500rpm at 85 DEG C;
B, the component mixture in step a is cooled to 45 DEG C, and add K220, oligopeptide-1, oat beta-glucan and yeast elite extract E100 by above-mentioned percentage by weight, and namely obtain moisturizing wrinkle removal facial mask liquid of the present invention after stirring 45min to each component mix homogeneously with the rotating speed of 3000rpm.
Embodiment 2
A kind of moisturizing wrinkle removal facial mask liquid, by weight percentage, it is made up of the raw material of following component: polymer hyaluronic acid sodium (molecular weight 1800kDa): 0.3%, oligomerization hyaluronate sodium (molecular weight 4500Da): 1.9%, EDTA-2Na:0.17%, Herba Rosmarini Officinalis extract: 2.3%, camomile extract: 1%, sinomenine: 0.03%, glycerol: 5%, K145:0.30%, oligopeptide-3:0.85%, yeast dextran: 6%, yeast elite extract E100:1.2%, deionized water: its surplus.
By said components and percentage by weight, the manufacturing step of described facial mask liquid comprises:
A, the polymer hyaluronic acid sodium of above-mentioned percentage by weight, oligomerization hyaluronate sodium, EDTA-2Na, sinomenine, camomile extract, Herba Rosmarini Officinalis extract, glycerol and deionized water are stirred 40min to each component mix homogeneously with the rotating speed of 2500rpm at 80 DEG C;
B, the component mixture in step a is cooled to 50 DEG C, and add K145, oligopeptide-3, yeast dextran and yeast elite extract E100, and namely obtain moisturizing wrinkle removal facial mask liquid of the present invention after stirring 50min to each component mix homogeneously with the rotating speed of 3500rpm.
Embodiment 3
A kind of moisturizing wrinkle removal facial mask liquid, by weight percentage, it is made up of the raw material of following component: polymer hyaluronic acid sodium (molecular weight 1300kDa): 1.2%, oligomerization hyaluronate sodium (molecular weight 9500Da): 0.3%, EDTA-2Na:0.06%, Fructus Gleditsia extract: 1%, peel of Citrus reticulata Blanco extract: 0.5%, Herba Centellae extract: 3%, PEG-400:1.5%, SIG:0.45%, oligopeptide-2:0.03%, Aloe glue: 2.8%, yeast elite extract E100:1.9%, deionized water: its surplus.
Its manufacturing step is with embodiment 1.
Embodiment 4
A kind of moisturizing wrinkle removal facial mask liquid, by weight percentage, it is made up of the raw material of following component: polymer hyaluronic acid sodium (molecular weight 1500kDa): 1.8%, oligomerization hyaluronate sodium (molecular weight 6000Da): 0.85%, EDTA-2Na:0.11%, Cacumen Platycladi extract: 0.3%, Flos Chrysanthemi extract: 0.5%, Radix Scutellariae extract: 1%, glycerin polyether-26:3.8%, 9010:0.04%, oligopeptide-5:0.6%, oat beta-glucan: 4.2%, yeast elite extract E100:0.55%, deionized water: its surplus.
Its manufacturing step is with embodiment 2.
The facial mask liquid that the present invention obtains not only directly can be coated on face and carry out skin nursing, also facial mask liquid of the present invention can be adsorbed in various face mask substrate material, as on non-woven fabrics, cotton, silkworm silk, biological fiber, make patch formula facial film to use, and often open on the face mask substrate material of deadweight for 20-80g, the adsorbance of facial mask liquid is 20-50g.
Random selecting 100 ages 18-45 year age bracket people as object on probation, facial mask liquid obtained in the embodiment of the present invention 1 is coated on face carries out skin nursing, and nurse weekly twice, each coating time is 20min, and life cycle is one month.Adopt skinanalysis apparatus test to use the moisture content of skin of facial skin before and after facial mask liquid of the present invention, and directly observe wrinkle, the microgroove removal situation of face in the mode of range estimation.Find after skinanalysis apparatus test: the trier of 99%, its skin moisture of nursing position obtains remarkable lifting before not nursing, and the situations such as the non-microgroove of user face of 99%, dry stricture of vagina can be observed directly obtain obvious improvement by the mode of range estimation, after long-time use, the full elasticity of skin can be recovered.
In addition, facial mask liquid of the present invention is made patch formula facial film and carries out face's nursing, its result on trial and the above results similar, do not repeat them here.
Specific embodiment described in the invention is only for the detailed description of the specific implementation process to this facial mask liquid and facial film, instead of the restriction to its preparation method.Any modification of carrying out this product and improvement, the substituting and using of similar or close material in the scope of the claims or category, all belongs to scope of patent protection of the present invention.

Claims (10)

1. a moisturizing wrinkle removal facial mask liquid, is characterized in that: by weight percentage, and it is made up of following component:
2. facial mask liquid according to claim 1, is characterized in that: by weight percentage, and it is made up of following component:
3. facial mask liquid according to claim 1 and 2, is characterized in that: the molecular weight of described polymer hyaluronic acid sodium is 1000kDa ~ 1800kDa.
4. facial mask liquid according to claim 1 and 2, is characterized in that: the molecular weight of described oligomerization hyaluronate sodium is less than 10kDa.
5. facial mask liquid according to claim 1 and 2, is characterized in that: described anti-sensitizer to be anti-sensitizer be in glycyrrhizic acid dipotassium, camomile extract, sinomenine, Flos Chrysanthemi extract, Herba Centellae extract, Herba Rosmarini Officinalis extract, Glycyrrhiza glabra L. extract, Rhizoma Polygoni Cuspidati extract, Folium Camelliae sinensis extract, scutellariae,radix extract, Radix Sophorae Flavescentis extract, Aloe vulgaris leaf extract, Radix Sangusorbae extract, peel of Citrus reticulata Blanco extract, Fructus Gleditsia extract, Cacumen Platycladi extract, B9-Vitapol, Vitapol VB one or more; Described antiseptic is one or more in chlorphenesin, phenoxyethanol, methyl hydroxybenzoate, Sensiva SC50, Methylisothiazolinone, 2-bromo-2-nitropropane-1,3-glycol, methylchloroisothiazandnone, iodine propilolic alcohol butyl mephenesin Carbamate, BIT.
6. facial mask liquid according to claim 1 and 2, is characterized in that: described first wetting agent is one or more in 1,3 butylene glycol, glycerol, propylene glycol, PEG-400, Natrulon H-10, glycerin polyether-26, reed fragrant plant oil; Described second wetting agent is one or more in glucosan, Scleroglucan, oat beta-glucan, mushroom glucosan, yeast dextran, Aloe glue.
7. a manufacture method for facial mask liquid as claimed in claim 1 or 2, is characterized in that: comprise following manufacturing step:
A, the polymer hyaluronic acid sodium of above-mentioned percentage by weight, oligomerization hyaluronate sodium, EDTA-2Na, anti-sensitizer, the first wetting agent and deionized water are stirred 30-60min to each component mix homogeneously with the rotating speed of 2000-4000rpm at 80-85 DEG C;
B, the component mixture in step a is cooled to 45-50 DEG C, and adds antiseptic, the second wetting agent and yeast extract, and namely obtain described moisturizing wrinkle removal facial mask liquid after stirring 30-60min to each component mix homogeneously with the rotating speed of 2000-4000rpm.
8. a moisturizing wrinkle removal facial film, is characterized in that: comprise face mask substrate material, on described face mask substrate material, uniform adsorption is just like the facial mask liquid described in claim 1 or 2.
9. facial film according to claim 8, is characterized in that: often open on face mask substrate material and be adsorbed with facial mask liquid described in 20-50g.
10. facial film according to claim 8 or claim 9, is characterized in that: described face mask substrate material is any one in cotton, silkworm silk, non-woven fabrics and biological fiber.
CN201510242022.3A 2015-05-13 2015-05-13 Moisturizing anti-wrinkle mask solution, manufacturing method and moisturizing anti-wrinkle mask Pending CN104814919A (en)

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Cited By (13)

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CN105193697A (en) * 2015-09-06 2015-12-30 上海爱迦俪日用化妆品厂 Mask composition and preparation method thereof
CN105726457A (en) * 2016-03-24 2016-07-06 烟台市华昕生物医药科技有限公司 Oligopeptide mask essence
CN106265479A (en) * 2016-10-27 2017-01-04 广州仙施生物科技有限公司 A kind of skin repair compositions and preparation method thereof
CN106924073A (en) * 2017-05-09 2017-07-07 南通千竹电子科技有限公司 A kind of replenishing water and preserving moisture facial mask and preparation method thereof
CN107362352A (en) * 2016-05-12 2017-11-21 上海昊海生物科技股份有限公司 A kind of albumen or peptide composition and its production and use
CN107412045A (en) * 2017-05-19 2017-12-01 广州蜜妆生物科技有限公司 A kind of prebiotics is good for skin facial mask
CN107951756A (en) * 2017-12-26 2018-04-24 广州莱蔓诗生物科技有限公司 A kind of full effect whitening and moisturizing anti-wrinkle speckle removing, acne removing elite and preparation method thereof
CN108478469A (en) * 2018-06-27 2018-09-04 孙涛 A kind of pole profit moisturizing Face-protecting mask
CN109394612A (en) * 2018-11-15 2019-03-01 广州秉科医药科技有限公司 Facial mask and preparation method thereof is repaired in a kind of moisturizing
CN109498528A (en) * 2019-01-23 2019-03-22 郑州云端朵儿化妆品有限公司 A kind of anti-ageing maintenance frost and preparation method thereof
CN110613638A (en) * 2019-10-19 2019-12-27 浙江英树生物科技有限公司 Hyaluronic acid moisturizing and repairing foundation liquid and preparation method thereof
CN110934770A (en) * 2018-09-25 2020-03-31 无锡时光美人生物科技有限公司 Pepper extraction stock solution mask and production process thereof
CN112641665A (en) * 2019-10-10 2021-04-13 广州樱奈儿化妆品有限公司 Anti-allergy repair essence and preparation method thereof

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Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105193697A (en) * 2015-09-06 2015-12-30 上海爱迦俪日用化妆品厂 Mask composition and preparation method thereof
CN105726457A (en) * 2016-03-24 2016-07-06 烟台市华昕生物医药科技有限公司 Oligopeptide mask essence
CN107362352B (en) * 2016-05-12 2021-04-02 上海昊海生物科技股份有限公司 Protein or polypeptide composition and preparation method and application thereof
CN107362352A (en) * 2016-05-12 2017-11-21 上海昊海生物科技股份有限公司 A kind of albumen or peptide composition and its production and use
CN106265479A (en) * 2016-10-27 2017-01-04 广州仙施生物科技有限公司 A kind of skin repair compositions and preparation method thereof
CN106924073A (en) * 2017-05-09 2017-07-07 南通千竹电子科技有限公司 A kind of replenishing water and preserving moisture facial mask and preparation method thereof
CN107412045A (en) * 2017-05-19 2017-12-01 广州蜜妆生物科技有限公司 A kind of prebiotics is good for skin facial mask
CN107951756A (en) * 2017-12-26 2018-04-24 广州莱蔓诗生物科技有限公司 A kind of full effect whitening and moisturizing anti-wrinkle speckle removing, acne removing elite and preparation method thereof
CN108478469A (en) * 2018-06-27 2018-09-04 孙涛 A kind of pole profit moisturizing Face-protecting mask
CN110934770A (en) * 2018-09-25 2020-03-31 无锡时光美人生物科技有限公司 Pepper extraction stock solution mask and production process thereof
CN109394612A (en) * 2018-11-15 2019-03-01 广州秉科医药科技有限公司 Facial mask and preparation method thereof is repaired in a kind of moisturizing
CN109498528A (en) * 2019-01-23 2019-03-22 郑州云端朵儿化妆品有限公司 A kind of anti-ageing maintenance frost and preparation method thereof
CN112641665A (en) * 2019-10-10 2021-04-13 广州樱奈儿化妆品有限公司 Anti-allergy repair essence and preparation method thereof
CN110613638A (en) * 2019-10-19 2019-12-27 浙江英树生物科技有限公司 Hyaluronic acid moisturizing and repairing foundation liquid and preparation method thereof

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