CN104716152B - X射线平板探测器及其制备方法与白色绝缘材料 - Google Patents

X射线平板探测器及其制备方法与白色绝缘材料 Download PDF

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CN104716152B
CN104716152B CN201510152077.5A CN201510152077A CN104716152B CN 104716152 B CN104716152 B CN 104716152B CN 201510152077 A CN201510152077 A CN 201510152077A CN 104716152 B CN104716152 B CN 104716152B
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高锦成
曹占锋
姚琪
李正亮
何晓龙
张斌
孔祥春
张伟
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BOE Technology Group Co Ltd
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Abstract

本发明公开了一种X射线平板探测器及其制备方法与白色绝缘材料。X射线平板探测器,包括:薄膜晶体管基板;设置于该薄膜晶体管基板上具有反射作用的绝缘层,该绝缘层上设有暴露该薄膜晶体管基板的源极的接触孔;设置在该绝缘层上的像素电极,该像素电极通过该接触孔与该薄膜晶体管基板的源极导通;覆盖该像素电极的光电二极管;设置在该光电二极管上的电极;和设置在该电极上的X射线转换层。本发明的X射线平板探测器具有高量子探测效率和灵敏度。

Description

X射线平板探测器及其制备方法与白色绝缘材料
技术领域
本发明涉及X射线平板探测器及其制备方法与白色绝缘材料。
背景技术
近年来平板探测技术取得飞跃性的发展。其中,CN101159283A描述了一种平板探测,其实现了降低平板探测器的成本,从而更快地推广平板探测器的应用。
平板探测技术可分为直接和间接两类,间接平板探测器中的关键部件是获取图像的平板探测器(FPD),由X射线转化层与光电二极管、薄膜晶体管、信号储存基本像素单元及信号放大与信号读取等组成。工作原理为:X射线经X射线转化层转化为550nm左右的可见光,再由光电二极管将可见光转化为电信号,并通过薄膜晶体管存储在信号储存单元中,在驱动电路的作用下,存储在像素单元中的电荷被传输到读出电路,读出电路会对电信号作进一步的放大、模/数转换等处理,最终获得图像信息。
光电二极管中的非晶硅薄膜存在光致衰退效应,导致光电二极管经长时间光照后光电转化效率下降。减薄非晶硅薄膜的厚度有助于降低光致衰退问题,然而减薄非晶硅薄膜厚度,入射光不能充分地被吸收,会有大量的光透过光电二极管元件,降低光电二极管的转化效率。故控制光电二极管中非晶硅薄膜的厚度,减少光致衰退效应的同时提高光电二极管对入射光的吸收利用以及光电转化效率从而提高射线探测器的量子探测效率,成为X射线平板探测器设计和制造领域需要解决的一个重要课题。
发明内容
为解决上述技术问题,本发明提供了一种X射线平板探测器。
该X射线平板探测器可使透过光电转换二极管的光线反射回光电转换二极管中,有效提升入射光的利用效率,提高探测器的量子探测效率和灵敏度。
本发明所提供的X射线平板探测器,包括:
薄膜晶体管基板;
设置于该薄膜晶体管基板上具有反射作用的绝缘层,该绝缘层上设有暴露该薄膜晶体管基板的源极的接触孔;
设置在该绝缘层上的像素电极,该像素电极通过该接触孔与该薄膜晶体管基板的源极导通;
覆盖该像素电极的光电二极管;
设置在该光电二极管上的电极;和
设置在该电极上的X射线转换层。
其中,该薄膜晶体管基板包括
基板;
形成于该基板上的栅极;
形成于该栅极上的栅绝缘层;
形成于该栅绝缘层上方的有源层;和
形成于该有源层上的源极和漏极。
该绝缘层由白色绝缘材料制成,该白色绝缘材料,包括如下重量百分含量的物质:
80%~98%树脂基体,2%~20%光线漫反射功能材料、以及为余量的助剂。
该光线漫反射功能材料为锐钛矿型二氧化钛粉末。
该树脂基体为该树脂基体选自下述至少一种:
聚乙烯-醋酸乙烯、乙烯-醋酸乙烯甲醛交联聚合物、热塑性聚氨酯弹性体,或者上述三种材料的离子型、络合型改性材料。
该助剂为塑化剂。
本发明还提供了该白色绝缘材料,其包括如下重量百分含量的物质:
80%~98%树脂基体,2%~20%光线漫反射功能材料、以及为余量的助剂。
该光线漫反射功能材料为锐钛矿型二氧化钛粉末。
该树脂基体为该树脂基体选自下述至少一种:
聚乙烯-醋酸乙烯、乙烯-醋酸乙烯甲醛交联聚合物、热塑性聚氨酯弹性体,或者上述三种材料的离子型、络合型改性材料。
该助剂为塑化剂。
本发明还提供了该X射线平板探测器的制备方法,包括如下步骤:
提供薄膜晶体管基板;
在该薄膜晶体管基板上形成具有反射作用的绝缘层,该绝缘层上设有暴露该薄膜晶体管基板的源极的接触孔;
在该绝缘层上形成像素电极,该像素电极通过该接触孔与该薄膜晶体管基板的源极导通;
在该像素电极上形成光电二极管;
在该光电二极管上形成电极;以及
在该电极上形成X射线转换层。
其中,该薄膜晶体管基板按照如下步骤制备:
提供基板;
在该基板上形成栅极以及与该栅极连接的栅线;
在该栅极、栅线上形成栅绝缘层;
在该栅绝缘层上形成有源层;以及
在该有源层上形成源电极、漏电极与数据扫描线。
其中,该绝缘层由白色绝缘材料制成,该白色绝缘材料,包括如下重量百分含量的物质:80%~98%树脂基体,2%~20%光线漫反射功能材料、以及为余量的助剂。
该光线漫反射功能材料为锐钛矿型二氧化钛粉末。
该树脂基体为该树脂基体选自下述至少一种:
聚乙烯-醋酸乙烯、乙烯-醋酸乙烯甲醛交联聚合物、热塑性聚氨酯弹性体,或者上述三种材料的离子型、络合型改性材料。
该助剂为塑化剂。
本发明的X射线平板探测器具有高量子探测效率和灵敏度。
附图说明
图1表示本发明的X射线平板探测器的结构示意图。
图2表示本发明的X射线平板探测器的制备方法的流程图。
具体实施方式
本发明的X射线平板探测器可使透过光电转换二极管的光线反射回光电转换二极管中,有效提升入射光的利用效率,提高探测器的量子探测效率和灵敏度。
本发明的X射线平板探测器,如图1所示,包括:
薄膜晶体管基板6;
设置于该薄膜晶体管基板6上具有反射作用的绝缘层5,该绝缘层5上设有暴露该薄膜晶体管基板的源极7的接触孔8;
设置在该绝缘层上的像素电极4,该像素电极4通过该接触孔8与该薄膜晶体管基板6的源极7导通;
覆盖该像素电极的光电二极管3;
设置在该光电二极管3上的电极2;和
设置在该电极2上的X射线转换层1。
其中,绝缘层5由白色绝缘材料制成,该白色绝缘材料包括如下重量百分含量的物质:
80%~98%树脂基体,2%~20%光线漫反射功能材料、以及为余量的助剂。
该白色绝缘材料用于X射线平板探测器的绝缘层,可将透过光电转换二极管的光线反射回二极管中,有效提升入射光的利用效率,提高探测器的量子探测效率和灵敏度。
其中,该薄膜晶体管基板包括
基板;
形成于该基板上的栅极;
形成于该栅极上的栅绝缘层;
形成于该栅绝缘层上方的有源层;和
形成于该有源层上的源极和漏极。
薄膜晶体管基板不限于上述结构,现有技术中的顶栅型和底栅型的薄膜集体管均可以应用于本发明,不做进一步限定。
该绝缘层由白色绝缘材料制成,该白色绝缘材料,包括如下重量百分含量的物质:
80%~98%树脂基体,2%~20%光线漫反射功能材料、以及为余量的助剂。
该光线漫反射功能材料为已知的具有反射作用的材料,例如,改性二氧化钛粉末,该改性二氧化钛为用下述至少一种对二氧化钛进行改性而获得:
稀土金属无机物、有机稀土金属络合物;具体如锐钛矿型二氧化钛粉末。
该树脂基体为具有透光作用的树脂材料,例如该树脂基体为该树脂基体选自下述至少一种:
聚乙烯-醋酸乙烯、乙烯-醋酸乙烯甲醛交联聚合物、热塑性聚氨酯弹性体,或者上述三种材料的离子型、络合型改性材料。
该助剂为塑化剂。
下面将结合附图和实施例,对本发明的具体实施方式作进一步详细描述。以下实施例用于说明本发明,但不用来限制本发明的范围。
实施例1
制备X射线平板探测器,如图2所示,包括如下步骤
S1:提供基板;
其中,该基板可以为玻璃板、石英板等。
S2:在该基板上形成栅极以及与该栅极连接的栅线;
在该基板上沉积栅线层薄膜,通过构图工艺,形成栅极以及与所述栅极连接的栅线。
具体地,首先可以采用溅射或热蒸发的方法在基板上沉积一层栅线层膜,栅线层薄膜可以使用Cr、W、Ti、Ta、Mo、Al、Cu等金属及其合金,然后采用掩膜板,通过构图工艺对栅线层薄膜进行刻蚀,在基板上形成栅极以及与所述栅极连接的栅线。
构图工艺通常包括基板清洗、成膜、光刻胶涂覆、曝光、显影、刻蚀、光刻胶剥离等工序;对于金属层通常采用物理气相沉积方式(例如磁控溅射法)成膜,通过湿法刻蚀形成图形,而对于非金属层通常采用化学气相沉积方式成膜,通过干法刻蚀形成图形。
S3:在该栅极、栅线上形成栅绝缘层;
在形成有栅极、栅线的基板上沉积栅绝缘层薄膜,形成栅绝缘层;
具体地,可以采用等离子增强化学气相沉积法(PECVD)在形成有栅极、栅线的基板上沉积栅绝缘层薄膜,形成栅绝缘层3。其中,栅绝缘层薄膜可以选用氧化物、氮化物或者氮氧化合物,对应的反应气体可以为SiH4、NH4、N2成的混合气体或SiH2Cl4、NH3、N2的混合气体。
S4:在该栅绝缘层上形成有源层;
在形成有栅绝缘层上的基板上沉积源漏极金属薄膜。
S5:在该有源层上形成源电极、漏电极与数据扫描线,获得薄膜晶体管基板。
通过构图工艺,形成源电极、漏电极与数据扫描线(图中未示出)。
S6:在该薄膜晶体管基板上形成具有反射作用的绝缘层,该绝缘层上设有暴露该薄膜晶体管基板的源极的接触孔;
绝缘层为白色绝缘材料膜。白色绝缘材料膜包括如下重量百分含量的物质:85%的聚乙烯-醋酸乙烯、14%的锐钛矿型二氧化钛和1%的塑化剂。85%的聚乙烯-醋酸乙烯、14%的锐钛矿型二氧化钛和1%的塑化剂经过混合和制膜等工艺即得到白色绝缘材料膜。测试白色绝缘材料膜在光线波长550nm下的反射率为93.2%。
S7:在该绝缘层上形成像素电极,该像素电极通过该接触孔与该薄膜晶体管基板的源极导通;
S8:在该像素电极上形成光电二极管;
S9:在该光电二极管上形成电极;以及
S10:在该电极上形成X射线转换层,获得X射线平板探测器。
该X射线平板探测器的量子探测效率与未使用白色绝缘材料膜的X射线平板探测器相比探测效率从40%提高至45%。
以上所述仅是本发明的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明技术原理的前提下,还可以做出若干改进和替换,这些改进和替换也应视为本发明的保护范围。

Claims (6)

1.一种X射线平板探测器,包括:
薄膜晶体管基板;
设置于该薄膜晶体管基板上具有漫反射作用的绝缘层,该绝缘层上设有暴露该薄膜晶体管基板的源极的接触孔;该绝缘层由白色绝缘材料制成,该白色绝缘材料,包括如下重量百分含量的物质:
80%~98%树脂基体,2%~20%光线漫反射功能材料、以及为余量的助剂;
该光线漫反射功能材料为锐钛矿型二氧化钛粉末;
该树脂基体选自下述至少一种:
聚乙烯-醋酸乙烯、乙烯-醋酸乙烯甲醛交联聚合物或者上述材料的离子型、络合型改性材料;
设置在该绝缘层上的像素电极,该像素电极通过该接触孔与该薄膜晶体管基板的源极导通;
覆盖该像素电极的光电二极管;
设置在该光电二极管上的电极;和
设置在该电极上的X射线转换层。
2.根据权利要求1所述的X射线平板探测器,其特征在于,该薄膜晶体管基板包括
基板;
形成于该基板上的栅极;
形成于该栅极上的栅绝缘层;
形成于该栅绝缘层上方的有源层;和
形成于该有源层上的源极和漏极。
3.根据权利要求1所述的X射线平板探测器,其特征在于,该助剂为塑化剂。
4.X射线平板探测器的制备方法,包括如下步骤:
提供薄膜晶体管基板;
在该薄膜晶体管基板上形成具有反射作用的绝缘层,该绝缘层上设有暴露该薄膜晶体管基板的源极的接触孔;该绝缘层由白色绝缘材料制成,该白色绝缘材料,包括如下重量百分含量的物质:
80%~98%树脂基体,2%~20%光线漫反射功能材料、以及为余量的助剂;
该光线漫反射功能材料为锐钛矿型二氧化钛粉末;
该树脂基体选自下述至少一种:
聚乙烯-醋酸乙烯、乙烯-醋酸乙烯甲醛交联聚合物或者上述材料的离子型、络合型改性材料;
在该绝缘层上形成像素电极,该像素电极通过该接触孔与该薄膜晶体管基板的源极导通;
在该像素电极上形成光电二极管;
在该光电二极管上形成电极;以及
在该电极上形成X射线转换层。
5.根据权利要求4所述的制备方法,其特征在于,该薄膜晶体管基板按照如下步骤制备:
提供基板;
在该基板上形成栅极以及与该栅极连接的栅线;
在该栅极、栅线上形成栅绝缘层;
在该栅绝缘层上形成有源层;以及
在该有源层上形成源电极、漏电极与数据扫描线。
6.根据权利要求4所述的制备方法,其特征在于,该助剂为塑化剂。
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