CN104588351A - Substrate cleaning device and method for cleaning substrate using the same - Google Patents
Substrate cleaning device and method for cleaning substrate using the same Download PDFInfo
- Publication number
- CN104588351A CN104588351A CN201410719858.3A CN201410719858A CN104588351A CN 104588351 A CN104588351 A CN 104588351A CN 201410719858 A CN201410719858 A CN 201410719858A CN 104588351 A CN104588351 A CN 104588351A
- Authority
- CN
- China
- Prior art keywords
- substrate
- guard shield
- water
- water jet
- dryer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
- B08B2203/0211—Case coverings
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Liquid Crystal (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention relates to a substrate cleaning device and a method for cleaning a substrate using the same. The substrate cleaning device comprises a shield which comprises a roof, a side wall extends downward from the roof and a sprinkler arranged in the shield. The width of the shield and the width of the sprinkler cover the width of the substrate, and the side wall extends to the position near the surface of the substrate. When the substrate cleaning device is used for cleaning the substrate, water drop in external environment can not drop on the substrate, so that the condition that different degrees of etching appears on the substrate is avoided, and the problem that irreparable spots appear on a liquid crystal display panel is avoided.
Description
Technical field
The present invention relates to liquid crystal display and manufacture field, particularly a kind of base plate cleaning device.The invention still further relates to the method using this base plate cleaning device to carry out cleaning base plate.
Background technology
In today of liquid crystal panel fast development, the yield rate of product promotes and shows important day.Finished product rate determines the vitality of the competitiveness of product in market and factory.
The yield rate of liquid crystal panel is subject to the impact of several factors, such as scene effect transistor (namely, TFT) spot (that is, Mura) produced in making technology can produce significant impact by counter plate, thus affects the yield rate of liquid crystal panel greatly.
Wet process in TFT making technology generally includes strong acid or highly basic (that is, medicament) processing procedure and washing processing procedure afterwards, and wherein strong acid or highly basic processing procedure are in order to etch, and washing processing procedure is in order to rinse out these etching agents.Washing processing procedure realizes usually in the following manner: use water cutter on substrate, to be coated with water membrane equably to wash liquid residual on substrate fast off.But, because the water droplet in external environment can drop onto on substrate in substrate contacts before water cutter, and finally cause prepared liquid crystal panel to occur the spot of unrepairable, thus have a strong impact on the yield rate of liquid crystal panel.
Summary of the invention
For the problems referred to above, the present invention proposes a kind of base plate cleaning device.When using according to base plate cleaning device cleaning base plate of the present invention, the water droplet in external environment can not drop onto on substrate, thus avoids substrate and occur the situation that etching degree is different, and thus avoid the problem that the spot of unrepairable appears in liquid crystal panel.
Base plate cleaning device according to a first aspect of the invention, comprise: guard shield, this guard shield comprises top board and from top board to the sidewall of downward-extension, is arranged on the water jet in guard shield, the width of guard shield and water jet covers the width of substrate, and sidewall extends near substrate surface.
When using base plate cleaning device according to the present invention to carry out cleaning base plate, guard shield has hidden substrate.Like this, before substrate runs into water jet, the water droplet in external environment can only be fallen at most on guard shield instead of on substrate.Thus, the medicament liquid film remained on substrate also would not be diluted partly, thus the entirety of substrate etching degree can be identical.Like this, just fundamentally avoid the spot that unrepairable appears in liquid crystal panel, improve the yield rate of liquid crystal panel.In addition, width due to water jet covers the width of substrate, therefore water jet can form the uniform moisture film of one deck on substrate, namely the liquid remained on substrate is diluted equably, the entirety etching degree that this guarantees substrate is all identical, and finally improves the yield rate of liquid crystal panel.
In one embodiment, water jet comprises the (operating) water nozzle that direction can adjust.Like this, the water spraying direction of water jet can be adjusted at any time according to actual conditions, thus guarantee on substrate, form the uniform moisture film of one deck.In one embodiment, (operating) water nozzle tiltedly toward the front.Like this, the water of water jet ejection more effectively can wash away the surface of substrate, improves the cleaning performance of substrate.In one embodiment, water jet is water cutter.Water cutter can spray the very thin water curtain of thickness, is very beneficial for the water yield controlling to be sprayed onto on substrate, not only to realize cleaning base plate but also can significantly conserve water.
In one embodiment, in guard shield, be also provided with the hair-dryer for forming windstream on the surface of the substrate at the rear of water jet.In a preferred embodiment, hair-dryer is air knife.
In one embodiment, hair-dryer comprises gas jets, and the straight line residing for this gas jets and the intersection point of substrate are adjacent to be in the rear of the intersection point of straight line residing for (operating) water nozzle and substrate.Like this, the wind that hair-dryer produces can blow forward water jet and be sprayed onto water on substrate, and anti-sealing spreads backward.Thereby, it is possible to prevent on substrate residual liquid to be caused the etching degree of substrate different by diluting unevenly, thus avoid the spot that unrepairable appears in prepared liquid crystal panel.
In one embodiment, the height of hair-dryer is lower than the height of water jet.Like this, the air-flow from hair-dryer can not be subject to any stop, but directly blows on substrate, thus the water that can water jet be prevented further to be sprayed onto on substrate spreads backward.
In one embodiment, this device also comprises vacuum elements, and the top board of guard shield is provided with exhaust outlet.Steam in guard shield can be taken away by vacuum elements, thus avoid the water droplet that the condensation vapor in guard shield becomes to drop onto on substrate, also the uneven dilution just avoiding on substrate residual liquid causes substrate etch degree different, and then avoids the spot that unrepairable appears in liquid crystal panel.
According to a second aspect of the invention, propose a kind of method using device mentioned above to carry out cleaning base plate, comprise: substrate is passed guard shield along direction from back to front, the (operating) water nozzle of water jet is adjusted to tiltedly toward the front, realize cleaning with water spray on substrate.
In one embodiment, in device, also comprise vacuum elements, to be taken away by steam in guard shield.
In one embodiment, in guard shield, be also provided with hair-dryer at the rear of water jet, hair-dryer forms windstream forward on the surface of the substrate to blow forward the water on substrate.
In this application, orientation term " front " refers to the direction of substrate motion.Orientation term " rear " refers to the direction contrary with " front ".
Compared with prior art, the invention has the advantages that: (1) base plate cleaning device according to the present invention comprises guard shield, before substrate runs into water jet, the water droplet in external environment can only be fallen at most on guard shield instead of on substrate.Thus, remain in would not being diluted partly of the medicament liquid film on substrate, thus the entirety of substrate etching degree is identical.Like this, just fundamentally avoid the spot that unrepairable appears in liquid crystal panel, improve the yield rate of liquid crystal panel.(2) because the width of water jet covers the width of substrate, therefore water jet can form the uniform moisture film of one deck on substrate, namely the liquid remained on substrate is diluted equably, the entirety etching degree that this guarantees substrate is all identical, and finally improves the yield rate of liquid crystal panel.
Accompanying drawing explanation
Also will be described in more detail the present invention with reference to accompanying drawing based on embodiment hereinafter.Wherein:
Fig. 1 show schematically show the side view according to base plate cleaning device of the present invention.
Fig. 2 is the A direction view of Fig. 1.
Fig. 3 show schematically show according to base plate cleaning device of the present invention state in use.
In the accompanying drawings, identical parts use identical Reference numeral.Accompanying drawing is not according to the ratio of reality.
Detailed description of the invention
Below in conjunction with accompanying drawing, the invention will be further described.
Fig. 1 show schematically show the side view according to base plate cleaning device 10 (hereinafter referred to as device 10) of the present invention.As shown in Figure 1, device 10 comprises guard shield 11 and the water jet 12 be arranged in guard shield 11.Guard shield 11 comprises top board 13 and the sidewall from top board 13 to downward-extension 14.Should be appreciated that, device 10 can also comprise support 15 (as Fig. 3) as required.
For the substrate of specific dimensions, the width of guard shield 11 and water jet 12 covers the width of substrate, and sidewall 14 extends near substrate surface.Like this, when operative installations 10 cleaning base plate 31 (see Fig. 3), guard shield 11 has integrally hidden substrate 31, thus before substrate 31 runs into water jet 12, the water droplet in external environment can only be fallen at most on guard shield 11.Width due to water jet 12 covers the width of substrate 31, and therefore water jet 12 can form one deck moisture film equably on the substrate 31, namely dilutes equably residual liquid on the substrate 31.Based on above reason, the entirety etching degree of substrate 31 is all identical, and this just fundamentally avoids the spot that unrepairable appears in liquid crystal panel, improves the yield rate of liquid crystal panel.
The water sprayed to enable water jet 12 more effectively washes away the surface of substrate 31, the (operating) water nozzle 22 of water jet 12 can be set to tiltedly toward the front.Preferably, water jet 12 can be water cutter.Water cutter can spray the very thin water curtain of thickness, is very beneficial for controlling to be ejected into the water yield on substrate 31, thus not only cleaning base plate 31 but also can significantly conserve water effectively.In addition, the (operating) water nozzle 22 of water jet 12 can also be configured to adjust.Like this can according to actual conditions, such as substrate 31 and the relative altitude of guard shield 11 adjust the direction of (operating) water nozzle 22, and to ensure the cleaning performance of substrate 31, this have also been enlarged the scope of application of device 10.
Also as shown in Fig. 1,2 or 3, in guard shield 11, be also provided with hair-dryer 16, and hair-dryer 16 is arranged on the rear of water jet 12.Hair-dryer 16 is for forming windstream on the surface of substrate 31.In the embodiment shown in fig. 3, the intersection point 32 that the gas jets 23 of hair-dryer 16 is set to straight line residing for it and substrate 31 is in the rear of the intersection point 33 of straight line residing for (operating) water nozzle 22 and substrate 31, and adjacent as much as possible.Like this, the wind that hair-dryer 16 produces can blow forward water jet 12 and be sprayed onto water on substrate 31, and anti-sealing spreads backward.Liquid on the region being in water jet 12 rear of substrate 31 also would not be spread the water come gradually and be diluted by front, particularly can not be diluted as different levels along with the diffusion of water.Like this, to prevent on substrate 31 residual liquid to be caused the problem that the etching degree of substrate 31 is different by diluting unevenly, thus avoid the spot that unrepairable appears in prepared liquid crystal panel.In addition, the liquid on substrate 31 can also blow away by the air-flow that hair-dryer 16 produces, thus improves the cleaning efficiency of substrate 31.In a preferred embodiment, hair-dryer 16 is air knife.The directionality of the air-flow that air knife produces is fine, contributes to the airflow direction controlling substrate 31 surface.
Preferably, as shown in figs. 1 and 3, also hair-dryer 16 is set to the height of its height lower than water jet 12.Like this, the air-flow from hair-dryer 16 can not be subject to any stop at arrival substrate 31, and that is air-flow blows on the substrate 31 completely, thus the water that can effectively prevent water jet 12 to be sprayed onto on substrate 31 spreads backward.
In addition, device 10 also comprises vacuum elements 21 (as shown in Figure 1), and the top board 13 of guard shield 11 is provided with exhaust outlet 17 (as shown in Figure 2).Show schematically show two exhaust outlets 17 in fig. 2, in fact can multiple exhaust outlet be set as required.In the process of cleaning base plate 31, the steam in guard shield 11 can be taken away by vacuum elements 21.Like this, the steam in guard shield 11 would not condense into water droplet again but be pumped to outside guard shield 11, thus also just no longer includes water droplet and drop onto on substrate, causes and dilutes liquid residual on substrate 31 unevenly.Ensure that the etching degree of substrate 31 is identical thus, and then avoid the spot that unrepairable appears in liquid crystal panel.
The method using device 10 according to the present invention to carry out cleaning base plate 31 is described below.
As shown in Figure 3, by substrate 31 along direction (as shown in the arrow 30 in Fig. 3) from back to front through device 10, and the (operating) water nozzle 22 of water jet 12 is adjusted to tiltedly toward the front, realizes cleaning base plate 31 with water spray on substrate 31.Preferably, while starting cleaning, the vacuum elements of starting drive 10, to take away steam in guard shield 11.More preferably, the hair-dryer 16 be arranged in guard shield 11 is started.Because hair-dryer 16 is arranged on the rear of water jet 12, therefore hair-dryer 16 can at the surface of substrate 31 formation windstream forward to blow forward the water on substrate 31.
By cleaning method of the present invention, residual liquid can be avoided on substrate 31 to be diluted partly, thus this ensure that the etching degree of substrate 31 is identical, and then avoid liquid crystal panel and occur spot.
Although invention has been described with reference to preferred embodiment, without departing from the scope of the invention, various improvement can be carried out to it and parts wherein can be replaced with equivalent.Especially, only otherwise there is structural hazard, the every technical characteristic mentioned in each embodiment all can combine in any way.The present invention is not limited to specific embodiment disclosed in literary composition, but comprises all technical schemes fallen in the scope of claim.
Claims (10)
1. a base plate cleaning device, comprising:
Guard shield, described guard shield comprises top board and from described top board to the sidewall of downward-extension,
Be arranged on the water jet in described guard shield,
Wherein, the width of described guard shield and described water jet covers the width of described substrate, and described sidewall extends near described substrate surface.
2. device according to claim 1, is characterized in that, described water jet comprises the (operating) water nozzle that direction can adjust.
3. device according to claim 2, is characterized in that, described (operating) water nozzle tiltedly toward the front.
4. device according to claim 1, is characterized in that, in described guard shield, is also provided with the hair-dryer for forming windstream on described substrate surface at the rear of described water jet.
5. device according to claim 4, is characterized in that, described hair-dryer comprises gas jets, and the intersection point of the straight line residing for described gas jets and described substrate is adjacent to be in the rear of the intersection point of straight line residing for (operating) water nozzle and substrate.
6. device according to claim 5, is characterized in that, the height of described hair-dryer is lower than the height of described water jet.
7. the device according to any one of claim 1 to 6, is characterized in that, also comprises vacuum elements, and the top board of described guard shield is provided with exhaust outlet.
8. use the base plate cleaning device according to any one of claim 1 to 7 to carry out a method for cleaning base plate, comprising:
Substrate is passed described guard shield along direction from back to front,
The (operating) water nozzle of described water jet is adjusted to tiltedly toward the front, realizes cleaning with water spray on substrate.
9. method according to claim 8, is characterized in that, also comprises vacuum elements in described device, to be taken away by steam in described guard shield.
10. method according to claim 8 or claim 9, is characterized in that, in described guard shield, be also provided with hair-dryer at the rear of described water jet, and described hair-dryer forms windstream forward to blow forward the water on described substrate on described substrate surface.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410719858.3A CN104588351A (en) | 2014-12-02 | 2014-12-02 | Substrate cleaning device and method for cleaning substrate using the same |
| PCT/CN2014/094526 WO2016086470A1 (en) | 2014-12-02 | 2014-12-22 | Substrate cleaning device and method for cleaning substrate using same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410719858.3A CN104588351A (en) | 2014-12-02 | 2014-12-02 | Substrate cleaning device and method for cleaning substrate using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104588351A true CN104588351A (en) | 2015-05-06 |
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ID=53114602
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410719858.3A Pending CN104588351A (en) | 2014-12-02 | 2014-12-02 | Substrate cleaning device and method for cleaning substrate using the same |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN104588351A (en) |
| WO (1) | WO2016086470A1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104941869A (en) * | 2015-07-03 | 2015-09-30 | 深圳市华星光电技术有限公司 | Coating device |
| CN106733858A (en) * | 2017-02-07 | 2017-05-31 | 赵恒祥 | A kind of battery cleaning machine and cleaning |
| CN107597672A (en) * | 2017-09-19 | 2018-01-19 | 合肥惠科金扬科技有限公司 | A kind of manufacture method of the cleaning assembly of substrate cleaning apparatus |
| WO2020051998A1 (en) * | 2018-09-10 | 2020-03-19 | 惠科股份有限公司 | Washing method and washing device |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107254796B (en) * | 2017-08-09 | 2024-02-02 | 玖龙纸业（太仓）有限公司 | Dry net cleaning device |
| CN113926807A (en) * | 2021-11-20 | 2022-01-14 | 湖南特种金属材料有限责任公司 | Automatic cleaning device for manganous manganic oxide hydrogen discharge pipeline |
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| CN201086071Y (en) * | 2007-08-23 | 2008-07-16 | 潍坊潍柴零部件机械有限公司 | Through type cleaning machine |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104941869A (en) * | 2015-07-03 | 2015-09-30 | 深圳市华星光电技术有限公司 | Coating device |
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| US11541437B2 (en) | 2018-09-10 | 2023-01-03 | HKC Corporation Limited | Cleaning method and cleaning device |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2016086470A1 (en) | 2016-06-09 |
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Application publication date: 20150506 |