CN104540313B - Plasma jet generating device for atmospheric pressure hollow substrate electrode - Google Patents
Plasma jet generating device for atmospheric pressure hollow substrate electrode Download PDFInfo
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- CN104540313B CN104540313B CN201410830861.2A CN201410830861A CN104540313B CN 104540313 B CN104540313 B CN 104540313B CN 201410830861 A CN201410830861 A CN 201410830861A CN 104540313 B CN104540313 B CN 104540313B
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
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- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
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- 238000000034 method Methods 0.000 abstract description 6
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- Plasma Technology (AREA)
Abstract
The invention relates to an atmospheric pressure hollow substrate electrode plasma jet generating device. The device comprises a direct current discharge unit and a power supply for providing discharge voltage of the direct current discharge unit; the direct current discharge unit comprises an air duct and an electrode group; the electrode group comprises a high-voltage electrode and a grounding electrode which are cylindrical; the air duct is a hollow tube, and the upper end and the lower end of the air duct are respectively provided with an air inlet port and an air outlet port; the high-voltage electrode is arranged at the axial center of the gas-guide tube, and a hollow metal substrate unit for forming a narrow gas flow channel is also arranged at the ground electrode; the hollow metal substrate unit is cylindrical and is provided with a through hole along the axial direction. The invention provides the plasma jet generating device of the atmospheric hollow substrate electrode, which has simple operation process and low operation cost.
Description
Technical field
The invention belongs to technical field of plasma, is related to a kind of plasma producing apparatus, more particularly to a kind of air
Pressure hollow substrate electrode plasma jet flow generating apparatus, can be used for the surface treatment of metal material.
Background technology
In recent years, plasma technique is in wide spectrums such as physicss, chemistry, electronics, materialogy, and chemical metallurgies
Application-centered research is very active.Low temperature plasma is high because of its density, and gas temperature is low, and composition is controllable, and can produce
The various active species of life, can be used to change the surface characteristic of metal material.For metal surface properties modification, traditional low temperature
Plasma producing apparatus need high frequency electric source (radio frequency 13.56MHz or microwave 2.45GHz) to maintain the supply of discharge energy,
And work under hypobaric, need vacuum pump to carry out evacuation.Thus, processing equipment investment is big, high cost.
For the relative low pressure discharge plasma producing apparatus with vacuum equipment, atmospheric pressure gas plasma discharging
Body surface processing equipment eliminates vacuum equipment, in normal pressure atmospheric environment, just sample can be surface-treated.At this surface
Reason technology not only reduces operating cost, and improves work efficiency.Wherein, atmosphere pressure plasma jet flow (APPJ) is potential
Using value it is maximum.It is general using exchanging and pulsed discharge mode, in two electrodes for having dielectric isolation directly (sometimes
Using single electrode) occur electric discharge produce plasma, by gas flowing take plasma out of discharging chamber outside, formed
Plasma jet.Although APPJ is easy to contact with object to be treated surface, be conducive to improving the utilization rate of active specy,
Active specy in plasma, especially metal or nonmetallic ion, are only that treated sample is bombarded in the presence of air-flow
Surface.Thus, the speed and energy of active specy bombardment are subject to certain restrictions, and reduce plasma surface and expand the effect oozed
Rate, is unfavorable for applications of the APPJ in terms of metal surface modification and decontamination.
The content of the invention
In order to solve the technical problem in the presence of background technology, the present invention provides a kind of atmospheric pressure hollow substrate electrode etc.
Gas ions jet flow generating apparatus, with when solving atmosphere pressure plasma jet flow in prior art (APPJ) and working, metal or non-gold
Category ion bom bardment speed and energy are relatively low, the low problem of metal surface properties modification and detersive efficiency.
The technical scheme is that：A kind of atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus, including it is straight
Banish electric unit and the power supply for providing direct-current discharge cell discharge voltage；Above-mentioned direct-current discharge unit includes airway and electricity
Pole group；Above-mentioned electrode group includes a high-field electrode and a ground electrode for cylinder；The airway is hollow pipe, on
Lower two ends are respectively arranged with air inlet port and air outlet；Above-mentioned high-field electrode is placed in airway axial centre position, and which is special
Part be：It is additionally provided with to form the hollow metal base unit of narrow gas channel at above-mentioned ground electrode；In above-mentioned
Empty metallic substrates unit is in cylinder, and axially disposed has a through hole；The through hole and airway of hollow metal base unit
Coaxially；Above-mentioned ground electrode is L-shaped, and a right-angle side is cylinder coaxial with high-field electrode, and its end face is in airway outlet side
Facing each other with high-field electrode end face at mouthful, another right-angle side is cuboid, is connected with hollow metal base unit end face；
Current-limiting resistance is in series with also between above-mentioned direct-current discharge unit and power supply；
Above-mentioned power supply adopts direct current or the pulse power, and the frequency of the pulse power is 50Hz to 13.56MHz；
The material of above-mentioned airway is Muscovitum, glass, ceramics or politef；
Above-mentioned high-field electrode and ground electrode end face facing each other is plane；The material of the high-field electrode and ground electrode
Matter is aluminum, ferrum, copper, tungsten, nickel, tantalum, platinum, aluminium alloy, ferroalloy, copper alloy, tungsten alloy, nickel alloy, tantalum alloy；
The material of above-mentioned hollow metal base unit is aluminum or copper or aluminium alloy or copper alloy, and hollow metal base unit is led to
The aperture of bore portion is 4～100mm.
It is an advantage of the invention that：
1. relatively conventional low pressure discharge plasma producing apparatus, the present invention produce plasma under atmospheric environment
Jet, for metal material surface process, eliminates vacuum equipment, simplifies operating process, reduce operating cost.
2. the high frequency electric source of relatively conventional low pressure discharge plasma producing apparatus, the supply power supply of the present invention can be with
For DC source, the requirement to power-supply device is reduced.
3. relative to traditional atmosphere pressure plasma jet flow (APPJ), the plasma jet produced by apparatus of the present invention
Have under the collective effect of gas flowfield and DC electric field higher electron density, higher ion bom bardment speed and Geng Gao from
Sub- energy.
Description of the drawings
Fig. 1 is the hollow metal base unit structural representation of the present invention；
Fig. 2 is the direct-current discharge cellular construction top view of the present invention；
Fig. 3 is the direct-current discharge cellular construction upward view of the present invention；
Fig. 4 is atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus main body top view of the present invention；
Fig. 5 is atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus main body upward view of the present invention；
Fig. 6 is operating diagram of the present invention；
Wherein：11- through holes, 10- hollow metal base units, 20- direct-current discharge units, 21- airways, 22- high-tension electricities
Pole, 23- ground electrodes, 31- air inlet ports, 32- air outlets, 40- generating meanss agent structures, 41- power supplys, 42- current limlitings electricity
Resistance, 51- process sample, 52- plasma jets.
Specific embodiment
Referring to Fig. 1-6, the present invention proposes a kind of atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus, including
Direct-current discharge unit 20 and the power supply 41 for providing 20 discharge voltage of direct-current discharge unit；Direct-current discharge unit 20 includes inducing QI
Pipe and electrode group；Electrode group includes a high-field electrode 22 and a ground electrode 23 for cylinder；Airway 21 is hollow
Pipe, upper and lower ends are respectively arranged with air inlet port 31 and air outlet 32；High-field electrode 22 is placed in 21 axial centre position of airway
Put, be additionally provided with to form the hollow metal base unit 10 of narrow gas channel at ground electrode 23；Hollow metal substrate
Unit 10 is in cylinder, and axially disposed has a through hole；The through hole of hollow metal base unit 10 is coaxial with airway 21；
Ground electrode 23 is L-shaped, and a right-angle side is cylinder coaxial with high-field electrode 22, and its end face is at airway air outlet 32
Facing each other with 22 end face of high-field electrode, another right-angle side is cuboid, is connected with 10 end face of hollow metal base unit；Direct current
Current-limiting resistance is in series between discharge cell 20 and power supply 41 also；Power supply 41 adopts direct current or the pulse power, the frequency of the pulse power
Rate is 50Hz to 13.56MHz；The material of airway 21 is Muscovitum, glass, ceramics or politef；High-field electrode 22 and connect
The end face facing each other of ground electrode 23 is plane；The material of high-field electrode 22 and ground electrode 23 be aluminum, ferrum, copper, tungsten, nickel, tantalum,
Platinum, aluminium alloy, ferroalloy, copper alloy, tungsten alloy, nickel alloy, tantalum alloy；The material of hollow metal base unit 10 is aluminum or copper
Or aluminium alloy or copper alloy, the aperture of 10 throughhole portions of hollow metal base unit is 4～100mm.
A kind of atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus, including hollow metal base unit and direct current
Discharge cell.The hollow metal base unit includes a through hole；The direct-current discharge unit includes an airway and two
Individual electrode, one of them is cylindrical pressure electrode, and another is ground electrode.The airway is with to cut-in operation gas
The air inlet port of body and allow gas spray air outlet.The high-field electrode is placed in airway center position, the ground connection
Electrode is L-shaped, and a right-angle side is cylinder, coaxial with high-field electrode, and its end face is at airway air outlet and high-field electrode
End face is facing each other；Another right-angle side is cuboid, is connected with substrate end face.
Working gas is chosen as noble gases, oxygen, propane, ammonia, nitrogen and hydrogen, or the gaseous mixture of above-mentioned gas
Body, the convenient flow of working gas are 0.01～10L/min.The preferred aluminum of hollow metal base unit, copper, and it is selected from these
The alloy that metal is constituted, the aperture of hollow via-hole part is 4～100mm, and the height of hollow space is 10～50mm.Direct-current discharge
The airway of unit is made up of insulant such as Muscovitum, glass, ceramics or politef, and inducing QI bore is 2～10mm, outward
Footpath is 4～12mm.The sparking electrode of direct-current discharge unit is by aluminum, ferrum, copper, tungsten, nickel, tantalum, platinum, and the alloy system of these metals
Into electrode diameter is 1～8mm.The discharging gap of direct-current discharge unit is preferably 5～15mm.For high-field electrode, there is provided direct current
Or pulse voltage, voltage magnitude is 100～10000V, and wherein pulse frequency is 50Hz to 13.56MHz.
At airway air outlet, above-mentioned high-field electrode end face is not more than 2mm with the spacing of inducing QI end surfaces.
The atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus that the present invention is provided are realized and are produced under atmospheric pressure
The low temperature plasma of raw high electron density, high ion bombardment speed and high ion energy.During work, high-field electrode passes through current limliting
Resistance connects the positive pole of power supply, and ground electrode connects the negative pole of power supply, and is grounded.Working gas is flowed into from the air inlet port of airway,
Through the annular region airway and electrode, spray from the air outlet of airway, the working gas inflow two of ejection is electric
Extremely just to discharge space.Because the metallic substrates connected with ground electrode are hollow structure, due to the effect of inertia, work as work gas
When rate of flow of fluid is sufficiently large, working gas continues to flow along original direction after discharge space is flowed through, and flows through the logical of metallic substrates
Hole.This feature promotes to be formed around the narrow high velocity air passage of discharge space.Suitable working gas is selected, gas is controlled
Flow, when two electrode applied voltages are sufficiently high, the gas in discharging gap is breakdown, produce under atmospheric environment low temperature etc. from
Daughter.Narrow gas channel constrains the space of plasma generation, prevents the excessive disperse of plasma, is conducive to high density
The generation of plasma.Under the collective effect of gas flowfield and DC electric field, formed with high electron density, high ion bombardment
The plasma jet of speed and high ion energy.The jet can be used to the surface treatment for carrying out plasma metal material.
The atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus that the present invention is provided, by a hollow metal substrate
Unit, a direct-current discharge unit and a power-supply device composition.Hollow metal base unit includes a through hole, by aluminum, copper
Or its alloy material is made.Direct-current discharge unit includes an airway, a high-field electrode and a ground electrode.Airway
There are two ports, one is air inlet port, and another is air outlet, and airway is by Muscovitum, glass, ceramics or politef
Make Deng insulant；, in cylinder, the center position being placed in inside airway, ground electrode are L-shaped, always for high-field electrode
The arm of angle is cylinder, coaxial with high-field electrode, and its end face is facing each other with high-field electrode end face at airway air outlet, separately
One right-angle side is cuboid, is connected with substrate end face.Two electrodes are heat-resisting metal material, can using aluminum, ferrum, copper, tungsten,
Nickel, tantalum, platinum, and the alloy of these metals, but it is not limited to above-mentioned material.Power-supply device provides direct current or pulse voltage, works as electricity
Press as, during pulse, its frequency can change to the radio frequency of 13.56MHz from power frequency；Power-supply device also is used for preventing aura including one
The current-limiting resistance discharged to arc discharge transformation.
During work, treated sample is placed on ground electrode.Working gas is flowed into from the air inlet port of airway, is worn
The annular region crossed between airway and high-field electrode, from air outlet spray, flow into two electrodes just to discharge space.When two
When between individual electrode, institute's making alive is sufficiently high, the working gas of discharge space is breakdown, stable plasma gas occurs and puts
Electricity.
Due to due to inertia and metallic substrates hollow structure, working gas continues to flow through metal along original flow direction
The through hole of substrate, it is therefore prevented that the generation of gas backstreaming, forms narrow high velocity air passage around discharge space.Narrow gas
Circulation road constrains the volume of plasma generation, prevents the excessive disperse of plasma, is conducive to the product of high-density plasma
It is raw.The direction of working gas travels is consistent with the direction of DC electric field, air-flow and electric field to the collective effect of ion simultaneously
Enhance the speed and energy of ion bom bardment sample surfaces.The plasma of high density, high ion bombardment speed and high ion energy
Body jet is very suitable for metal material surface process, i.e., expanded by plasma surface and oozed, change the mechanical property of metal device
Energy or Corrosion Protection, and remove the surface and oil contaminant of metal device.
The structure and the course of work of apparatus of the present invention is detailed further below.
In different drawings, give similar or identical apparatus structure schematic diagram.During Fig. 1 is the present invention
Empty 10 schematic diagram of metallic substrates cellular construction.Hollow metal base unit 10 includes a through hole 11.Fig. 2 is the direct current of the present invention
20 schematic diagram of discharge cell structure.Fig. 2 is top view；Fig. 3 is upward view.Direct-current discharge unit 20 includes airway 21, high pressure
Electrode 22, and ground electrode 23.Airway 21 has two ports, an air inlet port 31, an air outlet 32.High-field electrode
22 are placed in 21 center of airway；At the air outlet 32 of airway 21,22 end face of high-field electrode and 21 end face of airway
Spacing be not more than 2mm.Ground electrode 23 is L-shaped, and right-angle side is cylinder, and its end face is mutual with 22 end face of high-field electrode
Just right, spacing is 5～30mm；Another right-angle side is cuboid.Fig. 4 is atmospheric pressure hollow substrate electrode plasma of the present invention
Jet flow generating apparatus main body top view；Fig. 5 is atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus main body of the present invention
Upward view.Ground electrode 23 is connected with 10 end face of hollow metal substrate, and is fixed on hollow metal substrate 10.High-field electrode
22nd, ground electrode 23, and 11 coaxial placement of through hole.Fig. 6 is the operating diagram of the present invention.Atmospheric pressure hollow substrate electrode etc.
Gas ions jet flow generating apparatus overall structure 50, in addition to including agent structure 40, also including power-supply device 41 and for preventing
The current-limiting resistance 42 that glow discharge changes to arc discharge.The positive pole of power-supply device 41 is by current-limiting resistance 42 and high-field electrode 22
Connect, negative pole is connected with ground electrode 23, and is grounded.
During work, treated sample 51 is placed on ground electrode 23.Air inlet port of the working gas from airway 21
31 flow into, and flow through the annular region between high-field electrode 22 and airway 21, flow out from air outlet 32, into high-field electrode 22
With ground electrode 23 to discharge space.Because of the effect of inertia, working gas continues to flow into the through hole of hollow metal substrate 10
11.When the voltage being applied between high-field electrode 22 and ground electrode 23 is sufficiently high, there is gas between two electrodes 22 and 23
Body discharges, and under narrow high velocity air passage with electric field collective effect, produces high density, high ion bombardment speed and macroion
The plasma jet 52 of energy, the jet can be opposite to the treated sample 51 on ground electrode 23 and be surface-treated.
The density of plasma jet, the bombardment speed of ion and energy are mainly subject to electrode spacing, working gas flow,
And the impact of applied voltage.Electrode spacing preferably elects 5～15mm as；Working gas flow is typically in 0.01～10L/min；It is additional
Voltage is generally in 100～10000V, and discharge current is produced and maintains stable plasma to penetrate in several milliamperes to tens milliamperes magnitudes
The energy of stream is generally between several watts to tens watts.What deserves to be explained is, above-mentioned size or parameter be only present invention etc. from
One sample of daughter generating meanss, the size of the device are not restricted to above range.
Can be 1mm in two electrode diameter of apparatus of the present invention, electrode spacing is 6mm, and inducing QI bore is the condition of 1.7mm
Under, when working gas (argon) flow is 2L/min, and applied voltage is 2434V, plasma jet sprays to negative electrode from anode,
In disperse shape, be confined to two electrodes just to discharge space, and radial direction radius gradually increases.Now, discharge loop current-limiting resistance
100K Ω, maintenance voltage 234V of discharging, discharge current 22mA.Electrode material is ferrum, and cathode fall area potential is 165V, by formula
ne=j/ (E μeE) (electron density ne, unit charge e, electric field intensity E, electric current density j, and electron mobility μe) calculate
Electron number densitiy to plasma positive column is up to 1014Magnitude, 1 is higher by than common direct current glow discharge electron number densitiy～
2 orders of magnitude；Ion bom bardment speed reaches 2 × 103Cm/s, is 6 times when stationary gas discharge；Ion is moved along direction of an electric field
Dynamic, especially in cathode fall area, the presence of larger electric potential difference effectively raises ion bombardment energy.
Claims (6)
1. a kind of atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus, including direct-current discharge unit and straight for providing
Banish the power supply of electric unit discharge voltage；The direct-current discharge unit includes airway and electrode group；The electrode group includes one
Individual high-field electrode and a ground electrode for cylinder；The airway is hollow pipe, and upper and lower ends are respectively arranged with air inlet
Port and air outlet；The high-field electrode is placed in airway axial centre position, it is characterised in that：At the ground electrode also
It is provided with to form the hollow metal base unit of narrow gas channel；The hollow metal base unit is in cylinder, and
It is axially disposed to have a through hole；The high-field electrode is placed in airway center；At the air outlet of airway, high pressure
Electrode end surface is not more than 2mm with the spacing of inducing QI end surfaces；The ground electrode is L-shaped, a right-angle side be cylinder, its end face
Facing each other with high-field electrode end face at airway air outlet, spacing is 5～30mm, and another right-angle side is cuboid, with
Hollow metal base unit end face connects.
2. atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus according to claim 1, it is characterised in that：Institute
State.
3. atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus according to claim 1 and 2, its feature exist
In：The power supply adopts direct current or the pulse power, and the frequency of the pulse power is 50Hz to 13.56MHz.
4. atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus according to claim 3, it is characterised in that：Institute
The material for stating airway is Muscovitum, glass, ceramics or politef.
5. atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus according to claim 4, it is characterised in that：Institute
High-field electrode and ground electrode end face facing each other is stated for plane；The material of the high-field electrode and ground electrode be aluminum, ferrum,
Copper, tungsten, nickel, tantalum, platinum, aluminium alloy, ferroalloy, copper alloy, tungsten alloy, nickel alloy, tantalum alloy.
6. atmospheric pressure hollow substrate electrode plasma jet flow generating apparatus according to claim 5, it is characterised in that：Institute
The material for stating hollow metal base unit is aluminum or copper or aluminium alloy or copper alloy；The hole of hollow metal base unit throughhole portions
Footpath is 4～100mm.
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| CN201410830861.2A CN104540313B (en) | 2014-12-26 | 2014-12-26 | Plasma jet generating device for atmospheric pressure hollow substrate electrode |
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| CN201410830861.2A CN104540313B (en) | 2014-12-26 | 2014-12-26 | Plasma jet generating device for atmospheric pressure hollow substrate electrode |
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| CN104540313A CN104540313A (en) | 2015-04-22 |
| CN104540313B true CN104540313B (en) | 2017-04-19 |
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| CN107389255A (en) * | 2017-07-11 | 2017-11-24 | 中国科学院工程热物理研究所 | High frequency sound pressure sensor based on direct current glow discharge plasma principle |
| CN108322983B (en) * | 2018-01-26 | 2024-05-31 | 中国科学院西安光学精密机械研究所 | Floating electrode reinforced dielectric barrier discharge dispersion plasma jet generating device |
| CN115243439A (en) * | 2022-07-28 | 2022-10-25 | 中国科学院苏州生物医学工程技术研究所 | Non-contact high-voltage pulse device |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1689216A1 (en) * | 2005-02-04 | 2006-08-09 | Vlaamse Instelling Voor Technologisch Onderzoek (Vito) | Atmospheric-pressure plasma jet |
| CN102946685A (en) * | 2012-10-15 | 2013-02-27 | 中国科学院西安光学精密机械研究所 | Atmospheric pressure induced air dielectric barrier discharge low-temperature plasma generating device |
| CN103074569A (en) * | 2013-01-29 | 2013-05-01 | 电子科技大学 | Atmosphere glow discharge low-temperature plasma coating device |
| CN103533733A (en) * | 2013-10-17 | 2014-01-22 | 中国科学院西安光学精密机械研究所 | Atmospheric pressure magnetic field enhanced low-temperature plasma electric brush generating device |
| CN204014244U (en) * | 2014-05-13 | 2014-12-10 | 南京华科皓纳电气科技有限责任公司 | A kind of plasma producing apparatus for air-treatment |
| CN204518205U (en) * | 2014-12-26 | 2015-07-29 | 中国科学院西安光学精密机械研究所 | Plasma jet generating device for atmospheric pressure hollow substrate electrode |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003338398A (en) * | 2002-05-17 | 2003-11-28 | Sekisui Chem Co Ltd | Discharge plasma processing method and apparatus therefor |
| WO2008072390A1 (en) * | 2006-12-12 | 2008-06-19 | Osaka Industrial Promotion Organization | Plasma producing apparatus and method of plasma production |
| CN101227790B (en) * | 2008-01-25 | 2011-01-26 | 华中科技大学 | Plasma jet apparatus |
| JP2011171056A (en) * | 2010-02-17 | 2011-09-01 | National Institute Of Advanced Industrial Science & Technology | Solution plasma discharge device |
-
2014
- 2014-12-26 CN CN201410830861.2A patent/CN104540313B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1689216A1 (en) * | 2005-02-04 | 2006-08-09 | Vlaamse Instelling Voor Technologisch Onderzoek (Vito) | Atmospheric-pressure plasma jet |
| CN102946685A (en) * | 2012-10-15 | 2013-02-27 | 中国科学院西安光学精密机械研究所 | Atmospheric pressure induced air dielectric barrier discharge low-temperature plasma generating device |
| CN103074569A (en) * | 2013-01-29 | 2013-05-01 | 电子科技大学 | Atmosphere glow discharge low-temperature plasma coating device |
| CN103533733A (en) * | 2013-10-17 | 2014-01-22 | 中国科学院西安光学精密机械研究所 | Atmospheric pressure magnetic field enhanced low-temperature plasma electric brush generating device |
| CN204014244U (en) * | 2014-05-13 | 2014-12-10 | 南京华科皓纳电气科技有限责任公司 | A kind of plasma producing apparatus for air-treatment |
| CN204518205U (en) * | 2014-12-26 | 2015-07-29 | 中国科学院西安光学精密机械研究所 | Plasma jet generating device for atmospheric pressure hollow substrate electrode |
Non-Patent Citations (1)
| Title |
|---|
| 非平衡等离子体增强燃烧的光谱诊断研究;汤洁;《博士学位论文》;20130615;全文 * |
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