CN204168591U - A kind of air forces down isothermal plasma generation device - Google Patents
A kind of air forces down isothermal plasma generation device Download PDFInfo
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- CN204168591U CN204168591U CN201420542200.5U CN201420542200U CN204168591U CN 204168591 U CN204168591 U CN 204168591U CN 201420542200 U CN201420542200 U CN 201420542200U CN 204168591 U CN204168591 U CN 204168591U
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- field electrode
- positioning sleeve
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- generation device
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Abstract
A kind of air forces down isothermal plasma generation device, comprise high-field electrode, upper high-field electrode positioning sleeve, high-field electrode back-moving spring, upper threeway, lower threeway, medium tube, metal tube, lower high-field electrode positioning sleeve, high-field electrode fixed block, wherein, upper high-field electrode positioning sleeve, upper threeway, medium tube, lower threeway, lower high-field electrode positioning sleeve connects successively, high-field electrode back-moving spring is placed in high-field electrode positioning sleeve, metal pipe sleeve is in the outside of medium tube, high-field electrode fixed block is positioned at the junction of lower threeway and lower high-field electrode positioning sleeve, high-field electrode is positioned at the shaft core position of medium tube, high-field electrode upper end is filament, by upper high-field electrode positioning sleeve axis place and the isometrical aperture of filament, connect high-field electrode back-moving spring, high-field electrode lower end is bar, embed high-field electrode fixed block, high-field electrode is connected with the high-pressure side of power supply by the first wire, metal tube is extremely connected by another of the second wire and power supply, and ground connection.
Description
Technical field
The utility model belongs to atmospheric pressure plasma field, and particularly a kind of air forces down isothermal plasma generation device.
Background technology
The advantages such as it is high that low temperature plasma has active group concentration, and reaction speed is fast, temperature is low, have a wide range of applications in a lot.The particularly low temperature plasma of operated at atmospheric pressure, breaks away from the dependence to vacuum, is widely used in environmental protection.Corona discharge and dielectric barrier discharge are the two kinds of common methods under atmospheric pressure producing low temperature plasma.It is large that corona discharge utilizes body surface sharply to locate field intensity, easily punctures air, thus easily produce electric discharge, but region of discharge is little and power density is not high; Dielectric barrier discharge (DBD) solid dielectric insulation is inserted discharge space inhibit arc through, thus the stable discharging formed between air gap, because air is difficult to ionization, carry out dielectric barrier discharge (DBD) in atmosphere just more difficult, need higher voltage.Dielectric barrier discharge is usually expressed as the filament-like discharges form of space-time random distribution, and voltage is higher, and filament-like discharges is more obvious, and Uniform discharge is poorer.In addition, the change of electrode structure can make the characteristic of dielectric barrier discharge change.Mainly contain parallel-plate and coaxial-type dielectric barrier discharge (DBD) device at present, although version has a lot of distortion, as CN202288940U, CN10238764A, CN103298234A etc., and have a lot of practical application.But under many circumstances, in order to avoid the shortcoming that air is difficult to ionize, mainly use inert gas or inert gas and other gas and vapor permeation to discharge.The present invention utilizes corona in air to discharge relatively easy feature, produces a large amount of electronic induction DBD and discharges, electric discharge is more prone to, discharges more even, and can improve air plasma discharge efficiency with corona discharge.
Utility model content
The purpose of this utility model is to provide the device that a kind of structure is simple, easily assemble, can produce in air pressure low temperature plasma.
The technical solution of the utility model is as follows:
Air forces down isothermal plasma generation device, comprise high-field electrode, upper high-field electrode positioning sleeve, high-field electrode back-moving spring, upper threeway, lower threeway, medium tube, metal tube, lower high-field electrode positioning sleeve, high-field electrode fixed block, wherein, upper high-field electrode positioning sleeve, upper threeway, medium tube, lower threeway, lower high-field electrode positioning sleeve connects successively, high-field electrode back-moving spring is placed in high-field electrode positioning sleeve, metal pipe sleeve is in the outside of medium tube, high-field electrode fixed block is positioned at the junction of lower threeway and lower high-field electrode positioning sleeve, high-field electrode is positioned at the shaft core position of medium tube, high-field electrode upper end is filament, by upper high-field electrode positioning sleeve axle center place and the isometrical aperture of filament, connect high-field electrode back-moving spring, high-field electrode lower end is bar, embed high-field electrode fixed block, high-field electrode is connected with the high-pressure side of power supply by the first wire, metal tube is extremely connected by another of the second wire and power supply, and ground connection.
Described air forces down isothermal plasma generation device, wherein, described high-field electrode is alternately formed by connecting by the bar of the filament of diameter≤0.15 millimeter and diameter≤10 millimeter, and high-field electrode is positioned at the bar part of the part of metal tube and the length ratio of filament portion is 10 ~ 5:1.
Described air forces down isothermal plasma generation device, wherein, and larger than the diameter of the bar part of high-field electrode 2 ~ 10 millimeters of the internal diameter of described medium tube.
Described air forces down isothermal plasma generation device, and wherein, described first wire is the copper conductor that outer cover has high pressure resistant insulation rubber.
Described air forces down isothermal plasma generation device, and wherein, described power supply is intermediate frequency or pulsed high voltage generator, and frequency is 5 ~ 20KHz.
In addition, in order to process large discharge gas, can, by parallel for above-mentioned many cover plasma device air inlets, large discharge gas be processed by device.
beneficial effect
The first, the filament portion of the utility model mesohigh electrode produces corona discharge when low pressure, converts corona dielectric barrier discharge during high pressure to, and the bar part of high-field electrode produces dielectric barrier discharge.
Second, the utility model utilizes corona in air to discharge the feature easily excited, corona discharge and dielectric barrier discharge are combined, utilize corona discharge to produce a large amount of electronics and reduce dielectric barrier discharge puncture voltage, overcome adverse effect that existing air plasma generator is difficult to excite by air, stronger plasma can be produced, and Uniform discharge improves, air plasma discharge efficiency can be improved, be conducive to pending gas and fully react.
3rd, the utility model structure is simple, be easy to assembling.
Accompanying drawing explanation
Fig. 1 is the generalized section of the utility model structure;
Wherein: 1 be high-field electrode, 2 be upper high-field electrode positioning sleeve, 3 be high-field electrode back-moving spring, 4 be upper threeway, 5 be lower threeway, 6 be medium tube, 7 be metal tube, 8 be lower high-field electrode positioning sleeve, 9 be air inlet for high-field electrode fixed block, 10 is the first wire, 11 for power supply, 12 is the second wire, 13,14 for gas outlet.
Embodiment
Below in conjunction with drawings and Examples, the utility model is described in further detail.
embodiment 1
As shown in Figure 1, a kind of air forces down isothermal plasma generation device, comprises high-field electrode 1, upper high-field electrode positioning sleeve 2, high-field electrode back-moving spring 3, upper threeway 4, lower threeway 5, medium tube 6, metal tube 7, lower high-field electrode positioning sleeve 8, high-field electrode fixed block 9, wherein, upper high-field electrode positioning sleeve 2, upper threeway 4, medium tube 6, lower threeway 5, lower high-field electrode positioning sleeve 8 connects successively, high-field electrode back-moving spring 3 is placed in high-field electrode positioning sleeve 2, metal tube 7 is enclosed within outside medium tube 6, high-field electrode fixed block 9 is positioned at the junction of lower threeway 5 and lower high-field electrode positioning sleeve 8, high-field electrode 1 is positioned at the shaft core position of medium tube 6, high-field electrode 1 upper end is filament, by upper high-field electrode positioning sleeve 2 axis place and the isometrical aperture of filament, connect high-field electrode back-moving spring 3, high-field electrode 1 lower end is bar, high-field electrode fixed block 9 is embedded by welding or screw thread, high-field electrode 1 is connected with the high-pressure side of power supply 11 by the first wire 10, metal tube 7 is extremely connected by another of the second wire 12 and power supply 11, and ground connection, wherein, filament in high-field electrode 1 is connected (noticing during welding that both axle center are identical) by argon arc welding with bar part, by adjustment high-field electrode upper end filament and the link position of high-field electrode back-moving spring 3, high-field electrode 1 strained exceptionally straight and be positioned at the shaft core position of medium tube 6.With the first wire 10, high-field electrode 1 upper end filament is connected with the high-pressure side of power supply 11; Metal tube 7 is connected with another level of power supply 11 by the second wire 12, and ground connection; The air inlet 13 of upper threeway 4 imports pending gas, and the gas after process is by outlet 14 gas outlet of lower threeway 5.
Wherein, the material of described high-field electrode 1 is stainless steel, and be alternately formed by connecting by the bar of the filament of diameter≤0.15 millimeter and diameter≤10 millimeter, high-field electrode 1 is positioned at the bar part of the part of metal tube 7 and the length ratio of filament portion is 10 ~ 5:1; Larger than the diameter of the bar part of high-field electrode 14 millimeters of the internal diameter of medium tube 6; The material of high-field electrode fixed block 9 is nichrome; The material of the first wire 10 is copper, and outer cover has high pressure resistant insulation rubber; The material of the second wire 12 is copper, the material of described upper high-field electrode positioning sleeve 2, lower high-field electrode positioning sleeve 8 is polytetrafluoroethylene, the material of described upper threeway 4, lower threeway 5, medium tube 6 is polytetrafluoroethylene, the material of described metal tube 7 is stainless steel, described power supply 11 is medium-frequency high-voltage power supply, and frequency 5 ~ 20KHz is adjustable.
The present embodiment air forces down isothermal plasma generation device, design parameter is: high-field electrode 1 filament portion diameter 0.1 millimeter, bar section diameter 10 millimeters, quartz glass medium tube 6 internal diameter 16 millimeters, external diameter 24 millimeters, length 24 centimetres, be enclosed within Cu metal tubes 7 internal diameter 20 millimeters outside quartz ampoule, external diameter 24 millimeters, length 24 centimetres, in Cu metal tubes 7 length 24 cm range, from top to bottom, bar, thread-length is respectively 5 centimetres of rods and 1 centimetre of filament replaces appearance 4 times; Upper threeway 4, lower threeway 5, upper high-field electrode positioning sleeve 2, lower high-field electrode positioning sleeve 8 are processed by polytetrafluoroethylene, working gas is that compressed air is by after two-way flowmeter, one tunnel directly passes into mixing chamber, Bubbling method of leading up in addition is carried 2-chloroethylethyl thioether and is entered mixing chamber, just can the concentration of control 2-chloroethylethyl thioether by the flow that controls two-way flowmeter, mixed gas is by air inlet 13 gatherer of upper threeway 4.Power supply 11 is CTP-2000K medium-frequency high-voltage power supply, only pure air is led to during on-test, light is there is in pipe when high pressure is added to 14KV, explanation corona discharge starts, when being raised to 17KV, brightness obviously increases, and illustrates that dielectric barrier discharge starts, now starts to pass into 2-chloroethylethyl thioether gaseous mixture and carry out decontamination experimental study, when total flow is 1.5 liters/min, 2-chloroethylethyl thioether entrance concentration is lower than 180mgm
-3time, after device, can't detect 2-chloroethylethyl thioether.
In addition, in order to process large discharge gas, can, by parallel for above-mentioned many cover plasma device air inlets, large discharge gas be processed by device.
embodiment 2
The present embodiment is identical with embodiment 1 structure, and difference is:
Wherein, the material of described high-field electrode 1 is nichrome, alternately be formed by connecting by the filament of diameter 0.15 millimeter and the bar of diameter 8 millimeters, high-field electrode 1 is positioned at the bar part of the part of metal tube 7 and the length ratio of filament portion is 6:1, the length of bar part and filament portion is respectively 6cm, 1cm, larger than the diameter of the bar part of high-field electrode 2 10 millimeters of the internal diameter of medium tube 6; The material of high-field electrode fixed block 9 is stainless steel or nichrome; The material of the first wire 10 is copper, and outer cover has high pressure resistant insulation rubber; The material of the second wire 12 is copper, the material of described upper high-field electrode positioning sleeve 2, lower high-field electrode positioning sleeve 8 is polytetrafluoroethylene, the material of described upper threeway 4, lower threeway 5, medium tube 6 is quartz glass, the material of described metal tube 7 is copper, described power supply 11 is pulsed high voltage generator, centre frequency 10KHz.
embodiment 3
The present embodiment is identical with embodiment 1 structure, and difference is:
Wherein, the material of described high-field electrode 1 is nichrome, alternately be formed by connecting by the filament of diameter 0.12 millimeter and the bar of diameter 6 millimeters, high-field electrode 1 is positioned at the bar part of the part of metal tube 7 and the length ratio of filament portion is 7:1, the length of bar part and filament portion is respectively 7cm, 1cm, and the material of high-field electrode fixed block 9 is stainless steel; The material of the first wire 10 is copper, and outer cover has high pressure resistant insulation rubber; The material of the second wire 12 is copper, the material of described upper high-field electrode positioning sleeve 2, lower high-field electrode positioning sleeve 8 is polytetrafluoroethylene, the material of described upper threeway 4, lower threeway 5, medium tube 6 is pottery, the material of described metal tube 7 is aluminium, described power supply 11 is medium-frequency high-voltage power supply, and frequency 5-20KHz is adjustable.
In addition, in order to process large discharge gas, can, by parallel for above-mentioned many cover plasma device air inlets, large discharge gas be processed by device.
Claims (5)
1. an air forces down isothermal plasma generation device, it is characterized in that: comprise high-field electrode (1), upper high-field electrode positioning sleeve (2), high-field electrode back-moving spring (3), upper threeway (4), lower threeway (5), medium tube (6), metal tube (7), lower high-field electrode positioning sleeve (8), high-field electrode fixed block (9), wherein, upper high-field electrode positioning sleeve (2), upper threeway (4), medium tube (6), lower threeway (5), lower high-field electrode positioning sleeve (8) connects successively, high-field electrode back-moving spring (3) is placed in high-field electrode positioning sleeve (2), metal tube (7) is enclosed within the outside of medium tube (6), high-field electrode fixed block (9) is positioned at the junction of lower threeway (5) and lower high-field electrode positioning sleeve (8), high-field electrode (1) is positioned at the shaft core position of medium tube (6), high-field electrode (1) upper end is filament, by upper high-field electrode positioning sleeve (2) axle center place and the isometrical aperture of filament, connect high-field electrode back-moving spring (3), high-field electrode (1) lower end is bar, embed high-field electrode fixed block (9), high-field electrode (1) is connected by the high-pressure side of the first wire (10) with power supply (11), metal tube (7) is extremely connected by another of the second wire (12) and power supply (11), and ground connection.
2. air according to claim 1 forces down isothermal plasma generation device, it is characterized in that, described high-field electrode (1) is alternately formed by connecting by the bar of the filament of diameter≤0.15 millimeter and diameter≤10 millimeter, and high-field electrode (1) is positioned at the bar part of the part of metal tube (7) and the length ratio of filament portion is 10 ~ 5:1.
3. air according to claim 1 and 2 forces down isothermal plasma generation device, it is characterized in that, larger than the diameter of the bar part of high-field electrode (1) 2 ~ 10 millimeters of the internal diameter of described medium tube (6).
4. air according to claim 1 and 2 forces down isothermal plasma generation device, it is characterized in that, described first wire (10) has the copper conductor of high pressure resistant insulation rubber for outer cover.
5. air according to claim 1 forces down isothermal plasma generation device, it is characterized in that, described power supply (11) is intermediate frequency or pulsed high voltage generator, and frequency is 5 ~ 20KHz.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420542200.5U CN204168591U (en) | 2014-09-22 | 2014-09-22 | A kind of air forces down isothermal plasma generation device |
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|---|---|---|---|
| CN201420542200.5U CN204168591U (en) | 2014-09-22 | 2014-09-22 | A kind of air forces down isothermal plasma generation device |
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| CN204168591U true CN204168591U (en) | 2015-02-18 |
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| CN201420542200.5U Expired - Fee Related CN204168591U (en) | 2014-09-22 | 2014-09-22 | A kind of air forces down isothermal plasma generation device |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104979155A (en) * | 2015-06-16 | 2015-10-14 | 上海交通大学 | Six-DOF (Degree of Freedom) microplasma jet machining platform system |
| CN105934064A (en) * | 2016-06-12 | 2016-09-07 | 上海大学 | Single-dielectric barrier low-temperature plasma reactor |
| CN106658931A (en) * | 2016-10-19 | 2017-05-10 | 南京航空航天大学 | Portable atmospheric pressure normal temperature plasma jet generating device |
| CN109644546A (en) * | 2016-09-02 | 2019-04-16 | 夏普株式会社 | Plasma generating element |
| CN112788827A (en) * | 2019-11-07 | 2021-05-11 | 中国石油化工股份有限公司 | Gas discharge method for enhancing plasma intensity |
| CN113546257A (en) * | 2021-08-17 | 2021-10-26 | 东华理工大学 | Handheld high-energy active ion generating device and using method thereof |
| CN113731325A (en) * | 2021-09-03 | 2021-12-03 | 重庆大学 | Device for synthesizing nitrogen oxide by air plasma |
-
2014
- 2014-09-22 CN CN201420542200.5U patent/CN204168591U/en not_active Expired - Fee Related
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104979155A (en) * | 2015-06-16 | 2015-10-14 | 上海交通大学 | Six-DOF (Degree of Freedom) microplasma jet machining platform system |
| CN105934064A (en) * | 2016-06-12 | 2016-09-07 | 上海大学 | Single-dielectric barrier low-temperature plasma reactor |
| CN109644546A (en) * | 2016-09-02 | 2019-04-16 | 夏普株式会社 | Plasma generating element |
| CN106658931A (en) * | 2016-10-19 | 2017-05-10 | 南京航空航天大学 | Portable atmospheric pressure normal temperature plasma jet generating device |
| CN112788827A (en) * | 2019-11-07 | 2021-05-11 | 中国石油化工股份有限公司 | Gas discharge method for enhancing plasma intensity |
| CN112788827B (en) * | 2019-11-07 | 2024-02-27 | 中国石油化工股份有限公司 | Gas discharge method for enhancing plasma intensity |
| CN113546257A (en) * | 2021-08-17 | 2021-10-26 | 东华理工大学 | Handheld high-energy active ion generating device and using method thereof |
| CN113546257B (en) * | 2021-08-17 | 2022-09-30 | 东华理工大学 | Handheld high-energy active ion generating device and using method thereof |
| CN113731325A (en) * | 2021-09-03 | 2021-12-03 | 重庆大学 | Device for synthesizing nitrogen oxide by air plasma |
| CN113731325B (en) * | 2021-09-03 | 2022-05-13 | 重庆大学 | Device for synthesizing nitrogen oxide by air plasma |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150218 Termination date: 20170922 |
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| CF01 | Termination of patent right due to non-payment of annual fee |