CN104423176A - Optical system and exposure machine - Google Patents
Optical system and exposure machine Download PDFInfo
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- CN104423176A CN104423176A CN201310390462.4A CN201310390462A CN104423176A CN 104423176 A CN104423176 A CN 104423176A CN 201310390462 A CN201310390462 A CN 201310390462A CN 104423176 A CN104423176 A CN 104423176A
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Abstract
The invention is applicable to the technical field of optics, and provides an optical system, aiming at solving the problems that an ultraviolet exposure lamp is poor in parallelism degree and energy uniformity in the prior art. The optical system comprises a UV-LED area light source component for offering an area light source, a cold light mirror for reflecting ultraviolet light emitted from the UV-LED area light source component, a compound eye light evening component for receiving and transmitting the ultraviolet light reflected from the cold light mirror, an optical mirror for receiving the ultraviolet light transmitted from the compound eye light evening component and transmitting and/or reflecting the ultraviolet light, and a reflector for receiving the ultraviolet light reflected from the optical mirror, wherein the reflector is used for reflecting the received ultraviolet light to the surface of a negative film for pattern transfer. Furthermore, the invention also provides an exposure machine. According to the optical system, since the UV-LED area source component is used for emitting the ultraviolet light and offering the area light source, and the ultraviolet light is transmitted onto the surface of the negative film in a parallel manner after being reflected by virtue of a light system, the parallelism degree and the energy uniformity of the incident ultraviolet light can be guaranteed.
Description
Technical field
The invention belongs to optical technical field, particularly relate to a kind of optical system and there is the exposure machine of described optical system.
Background technology
Printed circuit board (PCB) (Printed Circuit Board, PCB), also known as printed circuit board (PCB) or printed-wiring board (PWB), being important electronic unit, is the supporter of electronic devices and components, is the supplier of electronic devices and components electrical connection.Because it adopts electron printing to make, therefore be called as " printing " circuit board.
Printed circuit board (PCB) needs just can obtain last product through multiple working procedure in process of production, wherein, important procedure is exactly the image transfer utilizing the method for optical exposure to carry out between egative film and printed circuit board (PCB), and exposure machine is the key equipment realizing image transfer, the quality, precision etc. of printed circuit board (PCB) depend on exposure quality to a great extent.In effective exposure area of exposure machine, the ultraviolet depth of parallelism, energy even degree etc. determine the exposure quality of system.Certainly, except needing except optical exposure in art of printed circuit boards, other large-tonnage products in semiconductor applications also need to use exposure system.
Ultraviolet exposure lamp produces exposure machine device core parts as printed-wiring board (PWB), and its energy consumption is large, and working service cost is high, mercurous and produce ozone etc., is advocating the current of energy-conserving and environment-protective, is day by day becoming the focus that industry is paid close attention to.2013 beginning, one about mercury forbid bar about the whole world more than 140 countries and regions reach common understanding, and by United Nations Environment Programme (UNEP) preside over sign " Minamata pact ", limit every profession and trade to the control of mercury composition and discharge capacity plan.Object is to reduce the threat of mercury to human body and global environment as far as possible.Novel energy-conserving and environment-protective ultraviolet source is adopted to substitute traditional UV exposure lamp imperative.And traditional exposure machine generally adopts scattered light as light source, be difficult to the depth of parallelism and the energy even degree that ensure bright dipping, have a strong impact on exposure quality.
In recent years along with the appearance of high-power UV-LED, for printed circuit board (PCB) exposure special source brings revolutionary change.Namely UV-LED sends out the diode (being the abbreviation of English Ultraviolet light emitting diode) of ultraviolet light, and its wavelength is 315nm-450nm.UV-LED area source is the one of UV-LED light source, and area source is only luminous pattern, is make UV-LED can send a complete continuous ultraviolet light face by specialized designs.Its energy-efficient, constant intensity of illumination, outstanding temperature control, almost nil maintenance cost.Impel UV-LED area source to substitute traditional exposure lamp and become development trend.
Summary of the invention
The object of the present invention is to provide a kind of optical system, there is the UV-LED surface light source component providing area source, be intended to solve the prior art middle-ultraviolet lamp exposure lamp depth of parallelism and the poor problem of energy even degree.
The embodiment of the present invention realizes like this, a kind of optical system, for Graphic transitions, comprise for sending ultraviolet and providing the UV-LED surface light source component of area source, for reflecting the cold mirror of the described ultraviolet that described UV-LED surface light source component sends, receive and the even optical assembly of compound eye of the described ultraviolet that cold mirror reflects described in transmission, receive described ultraviolet that the even optical assembly of described compound eye transmits and for transmission and/or reflect the optical frames of described ultraviolet and receive the catoptron of the described ultraviolet that described optical frames reflects, described catoptron is that the described ultraviolet received is reflexed to backsheet surface to carry out Graphic transitions.
Further, described optical frames is completely reflecting mirror, described catoptron comprises the first parallel mirror, the exiting surface of described UV-LED surface light source component, described backsheet surface and described optical frames place plane are parallel to each other, the central point of described cold mirror, the even optical assembly of described compound eye and described optical frames is located along the same line, described first parallel mirror be arranged at the sphere parallel mirror of described egative film upper front and the described ultraviolet light vertical incidence that will receive to described egative film.
Further, described optical frames is total transmissivity mirror, described catoptron comprises the second parallel mirror, the exiting surface of described UV-LED surface light source component, described backsheet surface and described optical frames place plane are parallel to each other, the central point of described cold mirror, the even optical assembly of described compound eye, described optical frames and described second parallel mirror is located along the same line, and described second parallel mirror is the sphere parallel mirror be arranged at below described egative film front and the described ultraviolet light vertical incidence extremely described egative film that will receive.
Further, described optical frames is dichroic mirror, described catoptron comprises the first parallel mirror and the second parallel mirror, the exiting surface of described UV-LED surface light source component, described backsheet surface and described optical frames place plane are parallel to each other, described cold mirror, the even optical assembly of described compound eye, the central point of described optical frames and described second parallel mirror is located along the same line, described first parallel mirror and described second parallel mirror are the sphere parallel mirror of the positive and negative both sides being symmetricly set in described egative film, and the described ultraviolet light vertical incidence extremely described egative film will received respectively.
Further, described UV-LED surface light source component comprise send described ultraviolet UV-LED light source, establish described UV-LED light source and described ultraviolet for being sent by described UV-LED light source focuses to the reflection shield on described cold mirror for the power supply and cover providing described UV-LED light source electric power.
Further, described UV-LED light source comprises substrate, is multiplely electrically connected on the UV-LED chip on described substrate and is attached at the optical lens on each described UV-LED chip, and described UV-LED chip is that array is evenly distributed.
Further, described cold mirror is loaded on above described UV-LED surface light source component, and angle between the mounting plane of described cold mirror and described UV-LED surface light source component is adjustable, described cold mirror surface is provided with the vapor-deposited film assembling the veiling glare launched for filtering described reflection shield.
Further, the even optical assembly of described compound eye comprises a pair convex lens in column and is attached at the evaporation rete of described convex lens surface.
The embodiment of the present invention realizes like this, a kind of exposure machine comprises the optical system of Graphic transitions, described optical system comprises for sending ultraviolet and providing the UV-LED surface light source component of area source, for reflecting the cold mirror of the described ultraviolet that described UV-LED surface light source component sends, receive and the even optical assembly of compound eye of the described ultraviolet that cold mirror reflects described in transmission, receive described ultraviolet that the even optical assembly of described compound eye transmits and for transmission and/or reflect the optical frames of described ultraviolet and receive the catoptron of the described ultraviolet that described optical frames reflects, described catoptron is that the described ultraviolet received is reflexed to backsheet surface to carry out Graphic transitions.
Further, described exposure machine also comprises the exposure room of illuminated table face for placing described egative film and accommodating described illuminated table face and described optical system, and the optical glass that described illuminated table face is more than 90% by transmittance is made.
Optical system provided by the invention utilizes UV-LED surface light source component send ultraviolet and provide area source, the even optical assembly of compound eye is reflexed to form pointolite through cold mirror, to ensure energy of light source, and through optical frames and catoptron, the ultraviolet received is reflexed to backsheet surface respectively to carry out exposure-processed to described egative film, the ultraviolet sent by described UV-LED area source is parallelly incident to backsheet surface after light system reflection, the parallel half-angle of ultraviolet be less than 2 degree and energy attenuation less.And the area source sent by UV-LED area source can expose the tow sides of egative film after described optical system reflection, substantially increases work efficiency simultaneously simultaneously.
Accompanying drawing explanation
Fig. 1 is the structural representation of the optical system that the embodiment of the present invention provides.
Fig. 2 is the schematic perspective view of the UV-LED light source that the embodiment of the present invention provides.
Fig. 3 is the structural representation of the UV-LED light source that the embodiment of the present invention provides.
Fig. 4 is the structural representation of the exposure machine that the embodiment of the present invention provides.
Embodiment
In order to make object of the present invention, technical scheme and advantage clearly understand, below in conjunction with drawings and Examples, the present invention is further elaborated.Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
Referring to Fig. 1, the optical system 10 provided in the specific embodiment of the invention is for Graphic transitions, this optical system 10 comprises for sending ultraviolet to provide the UV-LED surface light source component 11 of area source, for reflecting the cold mirror 12 of the described ultraviolet that UV-LED surface light source component 11 sends, receive and the even optical assembly 13 of compound eye of the ultraviolet that cold mirror 12 reflects described in transmission, receive the described ultraviolet of described compound eye even optical assembly 13 transmission and transmission and/or reflect the optical frames 14 of described ultraviolet and receive the catoptron 15 of ultraviolet of described optical frames 14 reflection, the described ultraviolet received is reflexed to egative film 30 surface to carry out Graphic transitions by described catoptron 15.This optical system 10 utilizes UV-LED surface light source component 11 send ultraviolet and provide area source, the even optical assembly 13 of compound eye is reflexed to form pointolite through cold mirror 12, namely, pointolite is converted to by area source, to ensure energy of light source, and after through optical frames 14, the ultraviolet that even for compound eye optical assembly 13 transmits is carried out transmission and/or reflection, catoptron 15 receives the ultraviolet of described optical frames 14 reflection, and the ultraviolet received is reflexed to egative film 30 surface to carry out exposure-processed to egative film 30, the ultraviolet sent by described UV-LED area source is parallel after ultraviolet systematic reflection is incident to egative film 30 surface, the parallel half-angle of ultraviolet be less than 2 degree and energy attenuation less.Preferably, described egative film 30 can be the photographic film of printed circuit board (PCB) or other scribble the substrate of photoactive substance.
Please refer to Fig. 1, further, described optical frames 14 is completely reflecting mirror, described catoptron 15 comprises the first parallel mirror 15a, the exiting surface of described UV-LED surface light source component 11, described egative film 30 surface and described optical frames 14 place plane are parallel to each other, the central point of described cold mirror 12, the even optical assembly of described compound eye 13 and described optical frames 14 is located along the same line, described first parallel mirror 15a be arranged at the sphere parallel mirror of described egative film 30 upper front and the described ultraviolet light vertical incidence that will receive to described egative film 30.Understandably, it is mutually vertical with egative film 30 that the exiting surface of UV-LED surface light source component 11, egative film 30 and optical frames 14 place plane be arranged to ensure that UV-LED surface light source component 11 sends the direction of ultraviolet in parallel, area source through optical system 10 launch parallel be incident to egative film 30 surface, to ensure the depth of parallelism of the ultraviolet being incident to egative film 30 surface.Alternatively, described UV-LED surface light source component 11, described egative film 30 and optical frames 14 horizontal positioned.Cold mirror 12, the central point of the even optical assembly 13 of compound eye and optical frames 14 is located along the same line, optical frames 14 is arranged between egative film 30 and the even optical assembly 13 of compound eye, in ultraviolet transmission lines, optical frames 14 is between the even optical assembly 13 of compound eye and the first parallel mirror 15a, the ultraviolet reflected through cold mirror 12 is all incident on the even optical assembly 13 of compound eye, and by the even optical assembly of compound eye 13, described ultraviolet is all transmitted through on optical frames 14, by optical frames 14, ultraviolet is all reflexed on the first parallel mirror 15a, and by the first parallel mirror 15a, ultraviolet light is reflexed on egative film 30, like this, effectively can ensure that ultraviolet loses reduction in transmitting procedure.
Please refer to Fig. 1, further, described optical frames 14 is total transmissivity mirror, described catoptron 15 comprises the second parallel mirror 15b, the exiting surface of described UV-LED surface light source component 11, described egative film 30 surface and described optical frames 14 place plane are parallel to each other, described cold mirror 12, the even optical assembly 13 of described compound eye, the central point of described optical frames 14 and described second parallel mirror 15b is located along the same line, described second parallel mirror 15b is the sphere parallel mirror be arranged at below described egative film 30 front and the described ultraviolet light vertical incidence extremely described egative film 30 that will receive.Understandably, it is mutually vertical with egative film 30 that the exiting surface of UV-LED surface light source component 11, egative film 30 and optical frames 14 place plane be arranged to ensure that UV-LED surface light source component 11 sends the direction of ultraviolet in parallel, area source through optical system 10 launch parallel be incident to egative film 30 surface, to ensure the depth of parallelism of the ultraviolet being incident to egative film 30 surface.Alternatively, described UV-LED surface light source component 11, described egative film 30 and optical frames 14 horizontal positioned.Cold mirror 12, the even optical assembly 13 of compound eye, the central point of optical frames 14 and the second parallel mirror 15b is located along the same line, optical frames 14 is arranged between egative film 30 and the even optical assembly 13 of compound eye, in ultraviolet transmission lines, optical frames 14 is between the even optical assembly 13 of compound eye and the second parallel mirror 15b, the ultraviolet reflected through cold mirror 12 is all incident on the even optical assembly 13 of compound eye, and by the even optical assembly of compound eye 13, described ultraviolet is all transmitted through on optical frames 14, by optical frames 14, ultraviolet is all transmitted through on the second parallel mirror 15b, and by the second parallel mirror 15b, ultraviolet light is reflexed on egative film 30, like this, effectively can ensure that ultraviolet loses reduction in transmitting procedure.
Please refer to Fig. 1, further, described optical frames 14 is dichroic mirror, described catoptron 15 comprises the first parallel mirror 15a and the second parallel mirror 15b, the exiting surface of described UV-LED surface light source component 11, described egative film 30 surface and described optical frames 14 place plane are parallel to each other, described cold mirror 12, the even optical assembly 13 of described compound eye, the central point of described optical frames 14 and described second parallel mirror 15b is located along the same line, described first parallel mirror 15a and described second parallel mirror 15b is the sphere parallel mirror of the positive and negative both sides being symmetricly set in described egative film 30, and the described ultraviolet light vertical incidence extremely described egative film 30 will received respectively.Understandably, it is mutually vertical with egative film 30 that the exiting surface of UV-LED surface light source component 11, egative film 30 and optical frames 14 place plane be arranged to ensure that UV-LED surface light source component 11 sends the direction of ultraviolet in parallel, area source through optical system 10 launch parallel be incident to egative film 30 surface, to ensure the depth of parallelism of the ultraviolet being incident to egative film 30 surface.Alternatively, described UV-LED surface light source component 11, described egative film 30 and optical frames 14 horizontal positioned.Cold mirror 12, the even optical assembly 13 of compound eye, the central point of optical frames 14 and the second parallel mirror 15b is located along the same line, optical frames 14 is arranged between egative film 30 and the even optical assembly 13 of compound eye, in ultraviolet transmission lines, optical frames 14 is at the even optical assembly 13 of compound eye and between the first parallel mirror 15a and the second parallel mirror 15b, described first parallel mirror 15a is relative with the minute surface of described second parallel mirror 15b and be symmetrical arranged about egative film 30, the ultraviolet reflected through cold mirror 12 is all incident on the even optical assembly 13 of compound eye, and by the even optical assembly of compound eye 13, described ultraviolet is all transmitted through on optical frames 14, ultraviolet reflexed to the first parallel mirror 15a by optical frames 14 in the mode of dividing equally and be transmitted through the second parallel mirror 15b, and by the first parallel mirror 15a and the second parallel mirror 15b, ultraviolet light is reflexed on egative film 30 respectively, namely the tow sides of egative film 30 are exposed simultaneously, substantially increase work efficiency, like this, effectively can ensure that ultraviolet loses reduction in transmitting procedure.More preferably, the ultraviolet light that the ultraviolet light of 50% is reflexed to the first parallel mirror 15a and 50% by optical frames 14 is transmitted through on the second parallel mirror 15b, realize egative film 30 tow sides uniform exposure simultaneously, and ensure that the ultraviolet energy that the first parallel mirror 15a and the second parallel mirror 15b launch is substantially identical, and then ensure exposure quality.Alternatively, be installed on the both sides up and down of egative film 30 first parallel mirror 15a and the second parallel mirror 15b regulatable steering angle degree, the angle that can penetrate ultraviolet according to optical frames 14 carries out corresponding adjustment, is incident on illuminated table face 20 to ensure that the ultraviolet after reflecting is parallel.
Please refer to Fig. 1, further, described UV-LED surface light source component 11 comprise send described ultraviolet UV-LED light source 111, for providing the power supply 112 of described UV-LED light source 111 electric energy and cover to establish described UV-LED light source 111 and described ultraviolet for being sent by described UV-LED light source 111 focuses to the reflection shield 115 on described cold mirror 12.Understandably, UV-LED light source 111 sends the area source of the ultraviolet light with complete continuous wavelength, the main crest of this ultraviolet light is 365nm, and there is no infrared light, namely do not have infrared thermal radiation, like this, the ultraviolet reflexing to egative film 30 surface through optical system 10 can not produce temperature increase, avoid film harmomegathus phenomenon, thus ensure the quality of the rear Graphic transitions of exposure.Power supply 112 provides the 500w DC power supply device of current adjustment, the ultraviolet light that reflection shield 115 sends for focusing on UV-LED light source 110 for described UV-LED light source 111, makes the light path of the area source after focusing present trapezoidal collimated light.Alternatively, this reflection shield 115 can be substituted by other focusing structures, so that area source is converted to macro-energy pointolite, ensures energy of light source.In addition, this optical exposure system also can comprise cooling device further, in the present embodiment, cooling device is specially for providing cold wind with the pressure fan 118 of UV-LED light source 111 described in cooling, described pressure fan 118 is installed on UV-LED surface light source component 11 side and makes corresponding UV-LED light source 112 place of air outlet, to prevent UV-LED lamp pearl temperature in luminescence process from raising and produce power decay, and improve job stability and the life-span of UV-LED light source 111.
Alternatively, to be that array is evenly distributed by multiple pointolite UV-LED lamp pearl form described UV-LED area source 111, and the area source energy that the quantity of UV-LED lamp pearl is formed by it is determined, and is limited with the gross energy 500 watts of area source.Understandably, the area source sending ultraviolet light is formed after array is arranged, area source obtains pointolite after cold mirror 12 reflects, and the area source homogeneity that UV-LED lamp pearl produces reaches more than 85%, and ultraviolet transmission is stable, illuminance is stronger, energy is higher, homogeneity is changed, instant igniting, without the need to standby, at once reach 100% power UV export, do not affect by extraneous factor, thus ensure the uniformity coefficient of the ultraviolet be incident on egative film 30, to promote exposure quality.Adopt UV-LED lamp pearl as the light source producing area source, do not need during use to carry out preheating to lamp pearl and not containing noxious material (such as, mercury), more meet the requirement of safety, environmental protection.
Please refer to Fig. 2 and Fig. 3, preferably, described UV-LED light source 111 comprises substrate 1111, is multiplely electrically connected on the UV-LED chip 1112 on described substrate 1111 and is attached at the optical lens 1113 on each described UV-LED chip 1112, and described UV-LED chip is that array is evenly distributed.Alternatively, described UV-LED chip 1112 is high-power LED chip, and wavelength is 365nm, and this UV-LED chip 1112 is welded on substrate 1111.Alternatively, optical lens 1113 adopts the quartz glass of high transmission rate, this optical lens 1113 comprises the sticking part fitted on UV-LED chip 1112 and the semisphere convex lens be positioned at above described sticking part, the ultraviolet light towards surrounding dispersion utilizing these semisphere convex lens to be sent by UV-LED chip 1112 adjusts, and this ultraviolet light is concentrated parallel.This UV-LED light source 111 is arranged to arrange by pointolite UV-LED chip array and is formed, namely after array is arranged, form the area source sending ultraviolet light, area source obtains pointolite after cold mirror 12 reflects, the area source homogeneity that UV-LED light source 110 produces reaches more than 85%, and ultraviolet transmission is stable, do not affect by extraneous factor, thus ensure the uniformity coefficient of the ultraviolet be incident on printed circuit board (PCB) 30, to promote exposure quality.More preferably, this UV-LED light source 111 also comprises and is arranged at substrate 1111 surface with the heat-conducting layer 1114 of the heat conducting UV-LED chip 1112 and produce and be positioned at described heat-conducting layer 1114 surface with the heat sink 1115 dispelled the heat to described UV-LED chip 1112, described heat-conducting layer 1114 and described UV-LED chip 1112 are positioned at relative two surfaces of substrate 1111, and described heat-conducting layer 1114 is between substrate 1111 and heat sink 1115.This heat sink 1115 is made of aluminum.
Please refer to Fig. 1, described cold mirror 12 is installed on above described UV-LED surface light source component 11, and angle between described cold mirror 12 and UV-LED surface light source component 11 is adjustable, described cold mirror 12 surface is provided with the vapor-deposited film (not shown) assembling the veiling glare launched for filtering described reflection shield 115.Vapor-deposited film is utilized to filter the veiling glare gone out through reflection shield 115 focus emission, area source is made to change highly purified ultraviolet light into, be installed on above UV-LED surface light source component 11 this cold mirror 12 regulatable steering angle degree, the area source produced to make UV-LED surface light source component 11 through this cold mirror 12 again focus reflection on the even optical assembly 13 of compound eye, to ensure energy of light source.Alternatively, hinge or other angle adjusting mechanisms is adopted to be installed on above UV-LED surface light source component 11 by cold mirror 12, according to actual needs, regulate the angle between cold mirror 12 and UV-LED surface light source component 11, to ensure that all ultraviolets of area source reflex on the even optical assembly 13 of compound eye through this cold mirror 12.
Please refer to Fig. 1, the even optical assembly of described compound eye 13 comprises a pair convex lens (sign) in column and is attached at the evaporation rete (not shown) of described convex lens surface.Alternatively, evaporation rete is formed at described convex lens surface.Described convex lens are symmetrical arranged and are transmitted through on optical frames 14 with the ultraviolet after being reflected by cold mirror 12.Alternatively, the material of these convex lens is quartz, and ultraviolet penetrance is 99.8%.The even optical assembly 13 of this compound eye is installed between illuminated table face 20 and UV-LED surface light source component 11, short transverse is between UV-LED surface light source component 11 and cold mirror 12, and in ultraviolet transmission lines between cold mirror 12 and optical frames 14, like this, can ensure that the ultraviolet reflected through cold mirror 12 is incident on convex lens completely, and ultraviolet is transmitted through on optical frames 14.
Please refer to Fig. 1 and Fig. 4, the exposure machine provided in the specific embodiment of the invention also comprises the optical system 10 for Graphic transitions, described optical system 10 comprises for sending ultraviolet to provide the UV-LED surface light source component 11 of area source, for reflecting the cold mirror 12 of the described ultraviolet that UV-LED surface light source component 11 sends, receive and the even optical assembly 13 of compound eye of the ultraviolet that cold mirror 12 reflects described in transmission, receive the described ultraviolet of described compound eye even optical assembly 13 transmission and transmission and/or reflect the optical frames 14 of described ultraviolet, receive the catoptron 15 of the ultraviolet of described optical frames 14 reflection, described catoptron 15 is that the described ultraviolet received is reflexed to backsheet surface to carry out Graphic transitions.This optical system 10 utilizes UV-LED surface light source component 11 send ultraviolet and provide area source, the even optical assembly 13 of compound eye is reflexed to form pointolite through cold mirror 12, namely, pointolite is converted to by area source, to ensure energy of light source, and after through optical frames 14, the ultraviolet that even for compound eye optical assembly 13 transmits is carried out transmission and/or reflection, and receive by catoptron 15 ultraviolet that described optical frames 14 reflects, and the ultraviolet received is reflexed to egative film 30 surface to carry out exposure-processed to egative film 30, the ultraviolet sent by described UV-LED area source is parallel after ultraviolet systematic reflection is incident to egative film 30 surface, the parallel half-angle of ultraviolet is less than 2 degree, circuit esolving degree can reach below 50UM/UM, energy attenuation is less, be only 1% of the fluorescent tube in conventional 1000 hour serviceable life.Preferably, described egative film 30 can be the photographic film of printed circuit board (PCB) or other scribble the substrate of photoactive substance.In the present embodiment, the optical system 10 that exposure machine adopts has whole feature of the optical system 10 that the various embodiments described above provide and corresponding effect, does not repeat herein.
Please refer to Fig. 4, further, this exposure machine also comprises the exposure room 40 of illuminated table face 20 for placing described egative film and accommodating described illuminated table face 20 and described optical system, and the optical glass that described illuminated table face 20 is more than 90% by transmittance is made.Understandably, described illuminated table face 20 is between exposure frame 1 and UV-LED surface light source component 11, the ultraviolet reflected through catoptron 15 exposes on egative film 30 through illuminated table face 20, the illuminated table face 20 of high transmission rate is adopted to place egative film 30 to ensure that ultraviolet illumination is incident upon the energy on egative film 30, to ensure the uniformity coefficient of the ultraviolet energy be incident on egative film 30.This exposure room 40 is airtight chamber's structure, and illuminated table face 20 and optical system 10 to be installed in this exposure room 40 and to utilize this optical system 10 ultraviolet that UV-LED light source 110 sends to be projected to the egative film 30 being positioned over illuminated table face 20 carries out exposure-processed.Should also comprise base plate 50, cover plate 60 and around the sidewall 70 be arranged between base plate 50 and cover plate 60 by according to mechanism 2, this base plate 50, cover plate 60 and sidewall 70 form this exposure room 40.Described catoptron 15 is installed on cover plate 60 and/or base plate 50, and cold mirror 12 is installed on cover plate 60, and described UV-LED light source 110 assembly and the even optical assembly 13 of compound eye are installed on the worktable that be arranged in parallel with illuminated table face 20.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all any amendments done within the spirit and principles in the present invention, equivalent replacement and improvement etc., all should be included within protection scope of the present invention.
Claims (10)
1. an optical system, for Graphic transitions, it is characterized in that, comprise for sending ultraviolet and providing the UV-LED surface light source component of area source, for reflecting the cold mirror of the described ultraviolet that described UV-LED surface light source component sends, receive and the even optical assembly of compound eye of the described ultraviolet that cold mirror reflects described in transmission, receive described ultraviolet that the even optical assembly of described compound eye transmits and for transmission and/or reflect the optical frames of described ultraviolet and receive the catoptron of the described ultraviolet that described optical frames reflects, the described ultraviolet received is reflexed to backsheet surface to carry out Graphic transitions by described catoptron.
2. optical system as claimed in claim 1, it is characterized in that, described optical frames is completely reflecting mirror, described catoptron comprises the first parallel mirror, the exiting surface of described UV-LED surface light source component, described backsheet surface and described optical frames place plane are parallel to each other, the central point of described cold mirror, the even optical assembly of described compound eye and described optical frames is located along the same line, described first parallel mirror be arranged at the sphere parallel mirror of described egative film upper front and the described ultraviolet light vertical incidence that will receive to described egative film.
3. optical system as claimed in claim 1, it is characterized in that, described optical frames is total transmissivity mirror, described catoptron comprises the second parallel mirror, the exiting surface of described UV-LED surface light source component, described backsheet surface and described optical frames place plane are parallel to each other, the central point of described cold mirror, the even optical assembly of described compound eye, described optical frames and described second parallel mirror is located along the same line, and described second parallel mirror is the sphere parallel mirror be arranged at below described egative film front and the described ultraviolet light vertical incidence extremely described egative film that will receive.
4. optical system as claimed in claim 1, it is characterized in that, described optical frames is dichroic mirror, described catoptron comprises the first parallel mirror and the second parallel mirror, the exiting surface of described UV-LED surface light source component, described backsheet surface and described optical frames place plane are parallel to each other, described cold mirror, the even optical assembly of described compound eye, the central point of described optical frames and described second parallel mirror is located along the same line, described first parallel mirror and described second parallel mirror are the sphere parallel mirror of the positive and negative both sides being symmetricly set in described egative film, and the described ultraviolet light vertical incidence extremely described egative film will received respectively.
5. optical system as claimed in claim 1, it is characterized in that, described UV-LED surface light source component comprise send described ultraviolet UV-LED light source, establish described UV-LED light source and described ultraviolet for being sent by described UV-LED light source focuses to the reflection shield on described cold mirror for the power supply and cover providing described UV-LED light source electric power.
6. optical system as claimed in claim 5, it is characterized in that, described UV-LED light source comprises substrate, is multiplely electrically connected on the UV-LED chip on described substrate and is attached at the optical lens on each described UV-LED chip, and described UV-LED chip is that array is evenly distributed.
7. the optical system as described in claim 1 to 6 any one, it is characterized in that, described cold mirror is installed on the light-emitting face of described UV-LED surface light source component, and angle between described cold mirror and described UV-LED surface light source component is adjustable, described cold mirror surface is provided with the vapor-deposited film assembling the veiling glare launched for filtering described reflection shield.
8. the optical system as described in claim 1 to 6 any one, is characterized in that, the even optical assembly of described compound eye comprises a pair convex lens in column and is attached at the evaporation rete of described convex lens surface.
9. an exposure machine, comprise the optical system of Graphic transitions, it is characterized in that, described optical system comprises for sending ultraviolet and providing the UV-LED surface light source component of area source, for reflecting the cold mirror of the described ultraviolet that described UV-LED surface light source component sends, receive and the even optical assembly of compound eye of the described ultraviolet that cold mirror reflects described in transmission, receive described ultraviolet that the even optical assembly of described compound eye transmits and for transmission and/or reflect the optical frames of described ultraviolet and receive the catoptron of the described ultraviolet that described optical frames reflects, the described ultraviolet received is reflexed to backsheet surface to carry out Graphic transitions by described catoptron.
10. exposure machine as claimed in claim 9, is characterized in that, also comprise the exposure room of illuminated table face for placing described egative film and accommodating described illuminated table face and described optical system, the optical glass that described illuminated table face is more than 90% by transmittance is made.
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105589302A (en) * | 2016-03-14 | 2016-05-18 | 东莞王氏港建机械有限公司 | Ultraviolet light exposure system capable of emitting light in parallel and exposure machine |
| CN106970508A (en) * | 2017-05-25 | 2017-07-21 | 苏州灯龙光电科技有限公司 | A kind of parallel exposing machine light source module |
| CN108490744A (en) * | 2018-05-15 | 2018-09-04 | 东莞市中誉光电科技有限公司 | UV-LED optical systems and exposure machine |
| CN108508708A (en) * | 2018-04-08 | 2018-09-07 | 河南百合特种光学研究院有限公司 | A kind of UV-LED exposure light sources holder |
| CN108762004A (en) * | 2018-04-08 | 2018-11-06 | 河南百合特种光学研究院有限公司 | A kind of UV-LED light sources exposure simulation platform |
| CN109270807A (en) * | 2018-12-06 | 2019-01-25 | 复旦大学 | A kind of dual sided tag laser explosure equipment |
| CN112817211A (en) * | 2021-01-08 | 2021-05-18 | 湖南松井新材料股份有限公司 | Plate making method of screen printing plate and prepared screen printing plate |
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| CN105589302A (en) * | 2016-03-14 | 2016-05-18 | 东莞王氏港建机械有限公司 | Ultraviolet light exposure system capable of emitting light in parallel and exposure machine |
| CN106970508A (en) * | 2017-05-25 | 2017-07-21 | 苏州灯龙光电科技有限公司 | A kind of parallel exposing machine light source module |
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| CN108490744A (en) * | 2018-05-15 | 2018-09-04 | 东莞市中誉光电科技有限公司 | UV-LED optical systems and exposure machine |
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| CN109270807A (en) * | 2018-12-06 | 2019-01-25 | 复旦大学 | A kind of dual sided tag laser explosure equipment |
| CN112817211A (en) * | 2021-01-08 | 2021-05-18 | 湖南松井新材料股份有限公司 | Plate making method of screen printing plate and prepared screen printing plate |
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Application publication date: 20150318 |