CN112817211A - Plate making method of screen printing plate and prepared screen printing plate - Google Patents
Plate making method of screen printing plate and prepared screen printing plate Download PDFInfo
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- CN112817211A CN112817211A CN202110020889.XA CN202110020889A CN112817211A CN 112817211 A CN112817211 A CN 112817211A CN 202110020889 A CN202110020889 A CN 202110020889A CN 112817211 A CN112817211 A CN 112817211A
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- exposure
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- printing plate
- screen printing
- light source
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- 238000007650 screen-printing Methods 0.000 title claims abstract description 76
- 238000000034 method Methods 0.000 title claims abstract description 34
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 106
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 52
- 239000011261 inert gas Substances 0.000 claims abstract description 25
- 239000003292 glue Substances 0.000 claims description 33
- 238000005406 washing Methods 0.000 claims description 22
- 239000000853 adhesive Substances 0.000 claims description 20
- 230000001070 adhesive effect Effects 0.000 claims description 20
- 239000011521 glass Substances 0.000 claims description 20
- 239000011248 coating agent Substances 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 238000011049 filling Methods 0.000 claims description 12
- 238000007789 sealing Methods 0.000 claims description 11
- 238000001035 drying Methods 0.000 claims description 10
- 239000000839 emulsion Substances 0.000 claims description 8
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- 229920002120 photoresistant polymer Polymers 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 2
- 238000007664 blowing Methods 0.000 claims 3
- 239000001307 helium Substances 0.000 claims 1
- 229910052734 helium Inorganic materials 0.000 claims 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 21
- 239000001301 oxygen Substances 0.000 abstract description 21
- 229910052760 oxygen Inorganic materials 0.000 abstract description 21
- 230000005764 inhibitory process Effects 0.000 abstract description 11
- 238000003848 UV Light-Curing Methods 0.000 abstract description 2
- 238000002360 preparation method Methods 0.000 abstract description 2
- 230000000694 effects Effects 0.000 description 10
- 239000004033 plastic Substances 0.000 description 9
- 239000004744 fabric Substances 0.000 description 8
- 230000002452 interceptive effect Effects 0.000 description 7
- 238000007639 printing Methods 0.000 description 7
- 239000012945 sealing adhesive Substances 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000000861 blow drying Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000001723 curing Methods 0.000 description 5
- 238000004806 packaging method and process Methods 0.000 description 5
- 241000258957 Asteroidea Species 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000007687 exposure technique Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
Abstract
The invention discloses a plate making method of a screen and a prepared screen. The invention also discloses the screen printing plate prepared by the preparation method. In the invention, the oxygen near the gauze can be completely replaced by replacing the oxygen with nitrogen or inert gas. Replacing air with nitrogen or inert gas to reduce the occurrence of UV curing oxygen inhibition; the screen printing plate precision can be improved by adopting the parallel light source for exposure; the invention can improve the service life and the accuracy of the obtained screen printing plate.
Description
Technical Field
The invention relates to a plate making method of a screen plate, and further relates to the screen plate manufactured by the plate making method.
Background
With the updating and upgrading of modern consumer electronics, the replacement frequency and demand of mobile phones, computers and a plurality of intelligent terminals are more and more, the production quantity of essential interactive panels (glass and composite panel) on the mobile phones, the computers and the intelligent terminals is also more and more, a main process for producing the interactive panels is to screen decorative frames and screen functional ink, however, the screen printing plate adopted by the current screen printing ink on the market basically adopts a common exposure technology, and the exposure technology is easy to generate certain oxygen inhibition on the surface of photosensitive glue during exposure, so that the wear resistance of the photosensitive glue is poor, and the service life is short (the screen printing plate needs to be replaced after 3000 times of printing); in the prior art, the exposure is carried out by adopting a vacuum pumping mode, and the vacuum degree is generally-0.75 mpa. Because oxygen still exists near the gauze during vacuum pumping, air exists near the screen frame fixing area and the screen printing plate, exposure cannot be pumped away, and oxygen inhibition exists.
Moreover, the common exposure technique generally adopts a UV halogen lamp tube for exposure, and the light source is an oblique light source, which can easily cause the pattern to become larger and smaller (with larger tolerance (+ -0.1 mm)) and the jaggy of different degrees when the film edge is exposed.
The common exposure platemaking process includes the following steps: 1. the selection of the silk screen can be divided into silk, nylon, polyester, stainless steel and the like, wherein the nylon silk screen is the most common silk screen in the market. 2. Selecting a screen frame: the net frame is divided into six types, namely a wood frame, an aluminum frame, an iron frame, a plastic frame, a stainless steel frame and a copper frame according to the material. 3. Pulling a net: and uniformly drawing the selected proper silk screen into the selected screen frame to form the screen printing plate. 4. And (3) washing the net: the special chemical is adopted to wash the screen, so that the stains on the screen can be removed, and the adhesion of the photosensitive emulsion is facilitated. 5. Coating: the photosensitive resist is uniformly coated on the screen by a scraper, the printing surface (the convex surface of the screen) is coated firstly, then the ink surface (the concave surface of the screen) is coated, and each side is generally coated for three times. The web was then dried, this process being the first time. If the thick screen is required, the thick screen can be coated for multiple times, namely after the first coating, the thick screen is immediately placed into an oven with the temperature of 30-40 ℃ for drying, and the screen is taken out for coating again, wherein the operation is the second coating. 6. And (3) drying: after the silk-screen photosensitive glue is coated, the silk-screen photosensitive glue is firstly kept stand for 1 to 2 minutes, then the silk screen is put into a drying oven at about 40 ℃ for drying, and the silk screen is taken out and put into a dark frame for standby after being dried. 7. Primary exposure: firstly, aligning the longitude and latitude of the silk screen by the film through a magnifier, wherein lines are parallel and vertical to the silk screen. And then, putting the position-corrected net into an exposure machine, adjusting the time, and opening a switch of the exposure machine to complete the first exposure after the net is sucked to vacuum. 8. Carrying out secondary exposure; and then putting the screen printing plate into an exposure machine, adjusting the time, and opening a switch of the exposure machine to complete the second exposure after the screen printing plate is sucked to vacuum. 9. And (3) developing: taking the silk screen from the exposure machine, removing the negative film, wetting two sides of the silk screen with warm non-pressure water (warm cold water is 20-30 ℃) for about 30-60 seconds, then thoroughly washing with a high-pressure water gun until the image is displayed, then absorbing the redundant water around with water absorption cloth, and then putting the silk screen into an oven at 30-40 ℃ for drying. 10. Checking and packaging: after the silk screen is dried, carefully checking whether the manufactured screen printing plate meets the production and processing requirements, and immediately performing screen sealing work if the screen printing plate meets the production and processing requirements so as to enable production personnel to be used for later use.
Therefore, air exists between an exposure lamp tube and a screen printing plate to be exposed of the existing exposure machine, an oxygen inhibition curing effect is generated due to the existence of the air, so that photosensitive paste on the screen printing plate is easy to wear in the use process after being exposed, and the service life is averagely within 3000 times.
An interactive panel: i.e. a panel applied on the interface of the interactive surface. The interactive interface is a channel for information exchange between people and the computer, a user inputs information to the computer through the interactive interface and operates the computer, and the computer provides information for the user through the interactive interface for reading, analysis and judgment.
And (3) silk-screen printing: screen printing is a short for "screen printing". The silk screen printing is that silk fabric, synthetic fiber fabric or metal screen is stretched on a screen frame, and a screen printing plate is manufactured by adopting a manual paint film engraving or photochemical plate making method. The modern screen printing technology is to use photosensitive material to make screen printing plate by means of photoengraving (the meshes of the image-text part on the screen printing plate are through holes, but the meshes of the non-image-text part are blocked).
Disclosure of Invention
The invention provides a plate making method of a screen plate, which aims to solve the technical problems of pattern enlargement and pattern reduction, saw teeth of different degrees and the like caused by short service life and low accuracy of the screen plate in the prior art.
According to one aspect of the invention, the screen printing plate prepared by adopting the plate making method is long in service life, high in accuracy and clear and uniform in pattern.
The plate making method of the screen printing plate selects a parallel light source for exposure, and introduces nitrogen or inert gas into an exposure space to replace the air in the exposure space before exposure, then starts exposure and continuously fills nitrogen or inert gas.
The method specifically comprises the following steps:
the method comprises the following steps: selecting a parallel light source exposure machine;
furthermore, the parallelism of the parallel light source is controlled to be less than or equal to 0.01 degree.
Furthermore, the light source of the parallel light source exposure machine adopts an energy-saving UV light source. The central wavelength of the light source is 365-370 nm (the central wavelength of the existing common UV light source is 254 nm).
Furthermore, the light intensity of the parallel light source is UVA (ultraviolet A) 60-70 mW/CM2,UVB:0mW/CM2,UVC:10～20mW/CM2；
UVV:550～570mW/CM2。
The common UV light intensity is UVA of 120-130 mW/CM2,UVB:120～130mW/CM2,UVC:30～40mW/CM2；
UVV:110～120mW/CM2。
Since the effective curing wavelength currently used is UVV, the current energy-saving UV light source can reduce the exposure time under the same energy condition, for example: the UVV curing energy is 2000mj/cm2(ii) a The use of a common UV light source requires 17 s; only 4S is required with energy-saving light sources.
Further, a starfish integral exposure machine is preferably adopted. Preferably, the exposure space of the exposure machine is connected with a nitrogen or inert gas inlet pipe and a nitrogen or inert gas outlet pipe.
Furthermore, in order to facilitate the disassembly and assembly of the air inlet pipe and the air outlet tank, 5mm hard plastic pipes can be adopted for the pipe diameters of the nitrogen or inert gas inlet pipe and the air outlet pipe, and the joints of the hard plastic pipes and the machine table are sealed by adopting the clip-shaped joints.
Step two: coating photosensitive glue on the front surface of the stretched screen frame and the front surface of the screen cloth (preferably, the thickness of the photosensitive glue on the front surface is 10-12 mu m); then, preheating and baking the screen frame coated with the photosensitive adhesive on the front surface (preferably, the baking temperature is 60-80 ℃, the baking time is 20-40 minutes, and further preferably, the baking time is 70 ℃ for 30 minutes); then coating photosensitive glue on the back of the mesh (preferably, the thickness of the photosensitive glue on the back is 10-12 mu m); preheating and baking the screen frame coated with the photosensitive adhesive on the back (preferably, the baking temperature is 60-80 ℃, the baking time is 20-40 minutes, and further preferably, the baking time is 70 ℃ for 30 minutes) to obtain the screen frame coated with the photosensitive adhesive on the two sides;
further, the photosensitive glue is diazo photosensitive glue.
Further, in the second step, the thickness of the baked photosensitive emulsion on the front surface and the back surface of the silk screen is ensured to be 5-7 μm. The photoresist is controlled to have a suitable thickness in order to achieve both lifetime and pattern accuracy. The photosensitive resist is too thick, so that the printing film is thicker and the pattern is easy to generate saw teeth; if the photoresist is too thin, it may result in a reduced lifetime.
Step three: placing a glass photomask (namely a film to be exposed) on an exposure frame (the exposure frame can be lifted) of an exposure machine;
step four: and (3) placing the screen frame with the double sides coated with the photosensitive adhesive obtained in the step two between an exposure table top and a glass photomask of an exposure machine and fixing (preferably, fixing the position of the screen plate by using a fixing screw on the exposure table top), and putting down the exposure frame and fixing the distance between the exposure frame and the screen plate, so that the distance between the glass photomask and the screen plate is controlled to be 0.5-1 mm. The proper distance between the glass photomask and the screen printing plate is controlled, so that the photoresist and the photomask can be prevented from being stuck, and the irradiation deviation of the parallel light source can be well controlled.
Step five: pushing the exposure table board into the lower part (preferably the right lower part) of the parallel light source of the exposure machine according to the parallel track of the machine table; closing the exposure space of the exposure table top and sealing;
the exposure table top is pushed into the lower part of the parallel light source of the exposure machine according to the parallel track of the machine table, so that the position and the height of each exposure can be effectively ensured to be consistent.
Further, in step five, the exposure space is preferably sealed with a sealing tape.
Further, in the fifth step, it is preferable that the distance between the exposure light source and the film is 15. + -. 0.5 cm. The film is a photomask, the distance between the exposure light source and the film is controlled to be 15cm +/-0.5 cm, fine adjustment is mainly carried out according to the actual exposure effect, the distance control has the advantages that the space is saved, and the product quality is stable at the position of the light source.
Step six: introducing nitrogen or inert gas into the exposure space of the exposure table board to replace the air in the exposure space, then starting exposure, and continuously filling nitrogen or inert gas and exhausting;
filling nitrogen or inert gas for exposure, so that the surface of the screen printing plate is not in contact with the oxygen during exposure and only in contact with the nitrogen or the inert gas; reducing exposure to oxygen inhibition.
Further, in the sixth step, the flow rate of the nitrogen or the inert gas is 1-3 m/s, and the replacement time is more than 3 min. If the flow rate of the nitrogen or the inert gas is too fast, the lifting effect is not assisted, the waste and the cost are increased due to too large consumption of the nitrogen or the inert gas, and the replacement effect of the oxygen in the exposure process is reduced due to too slow flow rate of the nitrogen or the inert gas, which is also not beneficial to reducing the cost.
Further, in the sixth step, the exposure power is 200-250 mw/cm2(ii) a The time is 30-40S. The exposure energy can be effectively determined by controlling the exposure power and time, and the exposure effect is improved.
Step seven: after exposure is finished, closing the nitrogen or inert gas filled and exhaust device, uncovering the sealing adhesive tape, and opening an exposure space;
step eight: taking out the exposed screen (and taking off the glass photomask for storage); washing an exposed area and an unexposed area on the screen;
further, in this step, the unexposed area shielded by the film needs to be cleaned. After cleaning, checking whether the cleaning is completely finished or not by light, and performing additional cleaning for more than 10 seconds on some places which are not cleaned in place.
Further, in the eighth step, the exposure area on the washing screen plate is washed by a pressure water gun; the water pressure is preferably 2. + -. 0.1 kgf. The edge of the photosensitive glue exposure area is easy to be flushed with a notch when the water pressure is too high, and the edge of the photosensitive glue exposure area is not flushed completely when the water pressure is too low.
Further, in the eighth step, the exposure area on the screen is washed, and the average washing time per dot is controlled to be more than 20s (preferably 20 to 22 s).
Step nine: taking out the washed screen printing plate and drying; then baking; and obtaining the screen printing plate.
Further, the blow-drying is preferably performed by a blower, and the blow-drying time is controlled to be more than or equal to 10s per area. More preferably, the air is blown to dry by a blower at normal temperature.
Further, in the ninth step, the baking temperature is preferably 60-80 ℃, and the baking time is preferably 20-40 minutes; further preferably baked at 70 ℃ for 30 minutes.
And further, taking out the manufactured screen printing plate, packaging by adopting a protective film, and storing on a screen printing plate frame for later use.
The invention also discloses the screen printing plate prepared by the preparation method.
The prior art adopts a vacuumizing mode for exposure, and because air cannot be pumped away in a screen frame fixing area and the vicinity of a screen plate during vacuumizing, an oxygen inhibition phenomenon exists during exposure to influence the exposure effect.
In the invention, the oxygen near the gauze can be completely replaced by replacing the oxygen with nitrogen or inert gas. Replacing air with nitrogen or inert gas to reduce the occurrence of UV curing oxygen inhibition; the screen printing plate precision can be improved by adopting the parallel light source for exposure; the invention can improve the service life and the accuracy of the obtained screen printing plate.
The invention is mainly applied to the silk-screen printing plate with higher requirements on the silk-screen precision (particularly the precision is +/-0.01 mm or even +/-0.001 mm) and longer requirements on the service life (particularly the service life is more than 10000 times); due to the excellent exposure effect and longer service life of the screen printing plate prepared by the invention, the printing cost of single production is greatly reduced, the reproducibility of the screen printing plate pattern is improved, and the printing edge effect is very sharp (the edge sawteeth are controlled within +/-0.001 mm).
The screen printing plate manufactured by the invention can solve the problem of incomplete curing of the surface of the photosensitive emulsion, effectively reduce oxygen inhibition and promote the curing of the surface of the photosensitive emulsion to be more than 10000 times. The existing light source adopts oblique exposure, which causes the manufactured screen pattern to have a size tolerance of +/-0.02 mm; the invention combines the exposure and the manufacturing process of the parallel light source, and the edge sawtooth effect is accurately controlled; so that the pattern accuracy reaches +/-0.001 mm; the printing edge jaggy effect is reduced.
In addition to the objects, features and advantages described above, other objects, features and advantages of the present invention are also provided. The present invention will be described in further detail below.
Detailed Description
The following examples of the present invention are described in detail, but the present invention can be implemented in many different ways which are defined and covered by the following.
Example 1
The plate making method of the halftone of the present embodiment specifically includes the following steps:
the method comprises the following steps: selecting a parallel light source exposure machine;
the parallelism of the parallel light source is controlled to be less than or equal to 0.01 degrees.
The light source of the parallel light source exposure machine adopts an energy-saving UV light source. The central wavelength of the light source is 365 nm.
The light intensity of the parallel light source is UVA:60mW/CM2,UVB:0mW/CM2,UVC:10mW/CM2；UVV:550mW/CM2。
And adopting a starfish integral exposure machine. The exposure space of the exposure machine is connected with a nitrogen inlet pipe and a nitrogen outlet pipe.
In order to facilitate the disassembly and assembly of the air inlet pipe and the air outlet tank, the pipe diameters of the nitrogen inlet pipe and the air outlet pipe are 5mm hard plastic pipes, and the joints of the hard plastic pipes and the machine platform are sealed by adopting a square joint.
Step two: coating photosensitive glue with the thickness of 10-12 microns on the front surface of the screen cloth of the screen frame stretched with the screen; then putting the screen frame coated with the photosensitive adhesive on the front surface into an oven to preheat and bake for 30 minutes at 70 ℃; then coating photosensitive glue with the thickness of 10-12 microns on the back of the mesh cloth; placing the screen frame coated with the photosensitive adhesive on the back into an oven, and preheating and baking the screen frame at 70 ℃ for 30 minutes to obtain a screen frame coated with the photosensitive adhesive on the two sides;
the photosensitive glue is diazo photosensitive glue.
And in the second step, ensuring that the thicknesses of the baked photosensitive emulsion on the front surface and the back surface of the silk screen are both 5-7 microns.
Step three: placing a glass photomask (namely a film to be exposed) on an exposure frame (the exposure frame can be lifted) of an exposure machine;
step four: putting the screen frame with the double surfaces coated with the photosensitive adhesive, which is obtained in the step two, between an exposure table board and a glass photomask of an exposure machine, fixing the position of the screen plate by using a fixing screw on the exposure table board, putting down the exposure frame, and fixing the distance between the exposure frame and the screen plate, so that the distance between the glass photomask and the screen plate is controlled to be 0.5-1 mm;
step five: pushing the exposure table board into the position right below the parallel light source of the exposure machine according to the parallel track of the machine table; closing the exposure space of the exposure table top and sealing;
and in the fifth step, sealing the exposure space by using a sealing adhesive tape.
And in the fifth step, the distance between the exposure light source and the film is 15 cm.
Step six: introducing nitrogen into the exposure space of the exposure table board to replace the air in the exposure space, then starting exposure, and continuously filling nitrogen and exhausting;
filling nitrogen for exposure, so that the surface of the screen is free from oxygen contact during exposure and only in contact with the nitrogen; reducing exposure to oxygen inhibition.
In the sixth step, the nitrogen flow rate is 1m/s, and the replacement time is 3 min.
In the sixth step, exposure is carried out at 200mw/cm2；30S。
Step seven: after exposure is finished, closing the nitrogen filling and exhausting device, uncovering the sealing adhesive tape, and opening an exposure space;
step eight: taking out the exposed screen (and taking off the glass photomask for storage); washing an exposed area and an unexposed area on the screen;
in this step, the unexposed area that is shaded by the film needs to be cleaned. After the cleaning, the liquid is checked to see whether the liquid is completely washed out or not, and some parts which are not washed in place are washed for 10 seconds.
And step eight, washing the exposure area on the washing screen plate by adopting a 2kgf pressure water gun.
And step eight, washing the exposure area on the screen printing plate, and controlling the washing time of each point position to be 20s averagely.
Step nine: taking out the washed screen printing plate, and drying the screen printing plate by using a blower at normal temperature; then baking; and obtaining the screen printing plate.
The blow-drying time is controlled to be more than or equal to 10 s/each area.
And step nine, baking for 30 minutes at 70 ℃.
And taking out the manufactured screen printing plate, packaging the screen printing plate by adopting a protective film, and storing the screen printing plate on a screen printing plate frame for later use.
Example 2
The plate making method of the halftone of the present embodiment specifically includes the following steps:
the method comprises the following steps: selecting a parallel light source exposure machine;
the parallelism of the parallel light source is controlled to be less than or equal to 0.01 degrees.
The light source of the parallel light source exposure machine adopts an energy-saving UV light source. The central wavelength of the light source is 365 nm.
The light intensity of the parallel light source is UVA:70mW/CM2,UVB:0mW/CM2,UVC:20mW/CM2；UVV:570mW/CM2。
And adopting a starfish integral exposure machine. The exposure space of the exposure machine is connected with a nitrogen inlet pipe and a nitrogen outlet pipe.
In order to facilitate the disassembly and assembly of the air inlet pipe and the air outlet tank, the pipe diameters of the nitrogen inlet pipe and the air outlet pipe are 5mm hard plastic pipes, and the joints of the hard plastic pipes and the machine platform are sealed by adopting a square joint.
Step two: coating photosensitive glue on the front surface of the stretched screen frame, wherein the thickness of the photosensitive glue is 10-12 mu m; then putting the screen frame coated with the photosensitive adhesive on the front surface into an oven, and preheating and baking for 30 minutes at 70 ℃; then coating photosensitive glue on the back of the mesh cloth, wherein the thickness of the photosensitive glue is 10-12 mu m; placing the screen frame coated with the photosensitive adhesive on the back into an oven, and preheating and baking the screen frame at 70 ℃ for 30 minutes to obtain a screen frame coated with the photosensitive adhesive on the two sides;
the photosensitive glue is diazo photosensitive glue.
And in the second step, ensuring that the thicknesses of the baked photosensitive emulsion on the front surface and the back surface of the silk screen are both 5-7 microns.
Step three: placing a glass photomask (namely a film to be exposed) on an exposure frame (the exposure frame can be lifted) of an exposure machine;
step four: putting the screen frame with the double surfaces coated with the photosensitive adhesive, which is obtained in the step two, between an exposure table board of an exposure machine and a glass photomask and fixing the screen frame, putting down an exposure frame and fixing the distance between the exposure frame and a screen plate, so that the distance between the glass photomask and the screen plate is controlled to be 0.5-1 mm;
step five: pushing the exposure table board into the position right below the parallel light source of the exposure machine according to the parallel track of the machine table; closing the exposure space of the exposure table top and sealing;
and in the fifth step, sealing the exposure space by using a sealing adhesive tape.
And in the fifth step, the distance between the exposure light source and the film is 15 cm.
Step six: introducing nitrogen into the exposure space of the exposure table board to replace the air in the exposure space, then starting exposure, and continuously filling nitrogen and exhausting;
filling nitrogen for exposure, so that the surface of the screen is free from oxygen contact during exposure and only in contact with the nitrogen; reducing exposure to oxygen inhibition.
In the sixth step, the nitrogen flow rate is 3m/s, and the replacement time is 4 min.
In the sixth step, exposure is carried out at 250mw/cm2；40S。
Step seven: after exposure is finished, closing the nitrogen filling and exhausting device, uncovering the sealing adhesive tape, and opening an exposure space;
step eight: taking out the exposed screen (and taking off the glass photomask for storage); washing an exposed area and an unexposed area on the screen;
in this step, the unexposed area that is shaded by the film needs to be cleaned. After the cleaning, the liquid is checked to see whether the liquid is completely washed out or not, and some parts which are not washed in place are washed for 10 seconds.
And step eight, washing the exposure area on the washing screen plate by adopting a water gun with the pressure of 2 kgf.
And step eight, washing the exposure area on the screen printing plate, and controlling the washing time of each point position to be 20s averagely.
Step nine: taking out the washed screen printing plate, and drying the screen printing plate by using a blower at normal temperature; then baking the mixture for 30 minutes at 70 ℃; and obtaining the screen printing plate.
The blow-drying time is controlled to be more than or equal to 10 s/each area.
In the ninth step, the baking temperature is preferably 60-80 ℃, and the baking time is 20-40 minutes.
And taking out the manufactured screen printing plate, packaging the screen printing plate by adopting a protective film, and storing the screen printing plate on a screen printing plate frame for later use.
Example 3
The plate making method of the halftone of the present embodiment specifically includes the following steps:
the method comprises the following steps: selecting a parallel light source exposure machine;
the parallelism of the parallel light source is controlled to be less than or equal to 0.01 degrees.
The light source of the parallel light source exposure machine adopts an energy-saving UV light source. The central wavelength of the light source is 365 nm.
The light intensity of the parallel light source is UVA:65mW/CM2,UVB:0mW/CM2,UVC:15mW/CM2；UVV:560mW/CM2。
And adopting a starfish integral exposure machine. The exposure space of the exposure machine is connected with a nitrogen inlet pipe and a nitrogen outlet pipe.
In order to facilitate the disassembly and assembly of the air inlet pipe and the air outlet tank, the pipe diameters of the nitrogen inlet pipe and the air outlet pipe are 5mm hard plastic pipes, and the joints of the hard plastic pipes and the machine platform are sealed by adopting a square joint.
Step two: coating photosensitive glue on the front surface of the stretched screen frame, wherein the thickness of the photosensitive glue is 10-12 mu m; then putting the screen frame coated with the photosensitive adhesive on the front surface into an oven, and preheating and baking for 40 minutes at 60 ℃; then coating photosensitive glue on the back of the mesh cloth, wherein the thickness of the photosensitive glue is 10-12 mu m; putting the screen frame coated with the photosensitive adhesive on the back into an oven, and preheating and baking the screen frame at 60 ℃ for 40 minutes to obtain a screen frame coated with the photosensitive adhesive on the two sides;
the photosensitive glue is diazo photosensitive glue.
And in the second step, ensuring that the thicknesses of the baked photosensitive emulsion on the front surface and the back surface of the silk screen are both 5-7 microns.
Step three: placing a glass photomask (namely a film to be exposed) on an exposure frame (the exposure frame can be lifted) of an exposure machine;
step four: putting the screen frame with the double surfaces coated with the photosensitive adhesive obtained in the step two between an exposure table top and a glass photomask of an exposure machine and fixing (preferably, fixing the position of the screen plate by using a fixing screw on the exposure table top), putting down an exposure frame and fixing the distance between the exposure frame and the screen plate, so that the distance between the glass photomask and the screen plate is controlled to be 0.5-1 mm;
step five: pushing the exposure table board into the position right below the parallel light source of the exposure machine according to the parallel track of the machine table; closing the exposure space of the exposure table top and sealing;
and in the fifth step, sealing the exposure space by using a sealing adhesive tape.
And in the fifth step, the distance between the exposure light source and the film is 15 cm.
Step six: introducing nitrogen into the exposure space of the exposure table board to replace the air in the exposure space, then starting exposure, and continuously filling nitrogen and exhausting;
filling nitrogen for exposure, so that the surface of the screen is free from oxygen contact during exposure and only in contact with the nitrogen; reducing exposure to oxygen inhibition.
In the sixth step, the nitrogen flow rate is 2m/s, and the replacement time is 5 min.
In the sixth step, exposure is carried out at 220mw/cm2；40S。
Step seven: after exposure is finished, closing the nitrogen filling and exhausting device, uncovering the sealing adhesive tape, and opening an exposure space;
step eight: taking out the exposed screen (and taking off the glass photomask for storage); washing an exposed area and an unexposed area on the screen;
in this step, the unexposed area that is shaded by the film needs to be cleaned. After the cleaning, the liquid is checked to see whether the liquid is completely washed out or not, and some parts which are not washed in place are washed for 10 seconds.
And step eight, washing the exposure area on the washing screen plate by adopting a water gun with the pressure of 2 kgf.
And step eight, washing the exposure area on the screen printing plate, and controlling the washing time of each point position to be 20s averagely.
Step nine: taking out the washed screen printing plate, and drying the screen printing plate by using a blower at normal temperature; then baking for 20 minutes at 80 ℃; and obtaining the screen printing plate.
The blow-drying time is controlled to be more than or equal to 10 s/each area.
And taking out the manufactured screen printing plate, packaging the screen printing plate by adopting a protective film, and storing the screen printing plate on a screen printing plate frame for later use.
Example 4
The conditions were the same as in example 1 except that argon exposure was used instead of nitrogen exposure in step six.
Comparative example 1
The conditions were the same as in example 1 except that in step six, vacuum condition exposure was used instead of nitrogen gas exposure.
Comparative example 2
Except that the common UV light is adopted for exposure in the first step, the other conditions and the process are the same as the example 1, and the intensity of the common UV light is UVA:120mW/CM2,UVB:120mW/CM2,UVC:30mW/CM2；UVV:110mW/CM2。
Comparative example 3
The conditions were the same as in example 1 except that the ordinary UV exposure was used in the first step and the nitrogen exposure was replaced by the vacuum exposure in the sixth step.
The strength of the common UV light is UVA:120mW/CM2,UVB:120mW/CM2,UVC:30mW/CM2；UVV:110mW/CM2。
The performance of the screen plates obtained in examples 1 to 3 and comparative examples 1 to 3 was examined. The results of the tests are shown in Table 1.
Qualified detection standard of sawteeth: the printing of the protruding portion or missing portion is 0.05mm or less, only one of the portions equal to 0.05mm or less, or two of the portions smaller than 0.05mm are acceptable (OK), and the out-of-range is unacceptable (NG).
TABLE 1 results of performance test of the screen plates obtained in examples 1 to 3 and comparative examples 1 to 3
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A plate making method of a screen is characterized in that a parallel light source is selected for exposure, nitrogen or inert gas is introduced into an exposure space to replace air in the exposure space before exposure, then exposure is started, and the nitrogen or inert gas is continuously filled.
2. The method for making a screen plate according to claim 1, comprising the steps of:
the method comprises the following steps: selecting a parallel light source exposure machine;
step two: coating photosensitive glue on the front surface of the screen frame stretched with the screen; then preheating and baking the screen frame coated with the photosensitive adhesive on the front surface; then coating photosensitive glue on the back of the mesh; preheating and baking the screen frame coated with the photosensitive adhesive on the back surface to obtain the screen frame coated with the photosensitive adhesive on the two surfaces;
step three: placing the glass photomask on an exposure frame of an exposure machine;
step four: putting the screen frame with the double surfaces coated with the photosensitive adhesive obtained in the step two between an exposure table board of an exposure machine and a glass photomask and fixing, putting down an exposure frame and fixing the distance between the exposure frame and a screen printing plate;
step five: pushing the exposure table board into the lower part of a parallel light source of the exposure machine according to the parallel track of the machine table; closing the exposure space of the exposure table top and sealing;
step six: introducing nitrogen or inert gas into the exposure space of the exposure table board to replace the air in the exposure space, then starting exposure, and continuously filling nitrogen or inert gas and exhausting;
the inert gas is at least one of argon and helium;
step seven: after exposure is finished, closing the nitrogen or inert gas filled and exhaust device, and opening an exposure space;
step eight: taking out the exposed screen printing plate; washing an exposed area and an unexposed area on the screen;
step nine: taking out the washed screen printing plate and drying; then baking; and obtaining the screen printing plate.
3. The method for making a screen plate according to claim 1 or 2, wherein in the first step, the parallelism of the parallel light source is controlled to 0.01 ° or less;
the light source of the parallel light source exposure machine adopts a UV light source;
the light intensity of the parallel light source is UVA (ultraviolet A) 60-70 mW/CM2,UVB:0mW/CM2,UVC:10～20mW/CM2；UVV:550～570mW/CM2。
4. The plate making method of a screen printing plate according to claim 1 or 2, wherein in the second step, the thickness of the front side photoresist is 10 to 12 μm; and/or the thickness of the back side photosensitive glue is 10-12 mu m;
baking for two times, wherein the baking temperature is 60-80 ℃, and the baking time is 20-40 minutes;
the photosensitive glue is diazo photosensitive glue;
the thickness of the photosensitive emulsion on the front surface and the back surface of the silk screen after baking is 5-7 mu m.
5. The method for making a screen printing plate according to claim 1 or 2, wherein in the fifth step, the exposure space is sealed with a sealing tape; the distance between the exposure light source and the film is 15 +/-0.5 cm.
6. The plate-making method of a screen printing plate according to claim 1 or 2, wherein in the sixth step, the flow rate of the nitrogen gas or the inert gas is 1 to 3m/s, and the replacement time is 3min or more; exposure is 200 to 250mw/cm2；30～40S。
7. The method for making a plate of a screen printing plate according to claim 1 or 2, wherein in the eighth step, the exposed area on the screen printing plate is washed by a pressure water gun.
8. The method for making a screen plate according to claim 1 or 2, wherein in the eighth step, the exposure region on the screen plate is washed, and the washing time per dot is controlled to be 20 seconds or more on average.
9. The method for plate-making of a screen printing plate according to claim 1 or 2, wherein in the ninth step, a blowing dryer is selected for blowing dry, and the blowing dry time is controlled to be not less than 10 s/each area;
in the ninth step, the baking temperature is 60-80 ℃, and the baking time is 20-40 minutes.
10. A screen printing plate produced by the plate making method according to claims 1 to 9.
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