CN217113045U - Large-diameter automatic exposure machine - Google Patents

Large-diameter automatic exposure machine Download PDF

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Publication number
CN217113045U
CN217113045U CN202220456997.1U CN202220456997U CN217113045U CN 217113045 U CN217113045 U CN 217113045U CN 202220456997 U CN202220456997 U CN 202220456997U CN 217113045 U CN217113045 U CN 217113045U
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China
Prior art keywords
exposure machine
light
automatic exposure
machine according
collimating lens
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CN202220456997.1U
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Chinese (zh)
Inventor
邹志新
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Changsha Lubang Photoelectric Technology Co ltd
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Changsha Lubang Photoelectric Technology Co ltd
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Abstract

The utility model provides an automatic exposure machine of heavy-calibre, includes the frame, installs optical path system and cooling system in the frame, optical path system includes light source, leaded light awl, first collimating lens, fly's eye lens, heavy-calibre speculum and second collimating lens in proper order according to the propagation route of light, and cooling system installs at the light source rear for dispel the heat to the light source. The utility model discloses an exposure machine leads light cone and fly's eye lens through quartz and combines together, has carried out twice homogenization to the light for exposure size of exposure machine is bigger in this application, the exposure energy is higher, and the exposure is more even.

Description

Large-diameter automatic exposure machine
Technical Field
The utility model relates to an optical equipment technical field, concretely relates to automatic exposure machine of heavy-calibre.
Background
With the progress of society, the performance requirements of people on electronic products such as smart phones, tablet computers, micro projectors and the like are continuously improved, the performance of the electronic products is good or bad and depends on the processing quality of the components of the electronic products to a great extent, wherein printed circuit boards, display panels, touch screens and the like are the most core components of the electronic products, so that the processing precision of the components is ensured, and the method is the first condition for producing and assembling high-quality electronic products. The exposure machine is the necessary equipment for producing and manufacturing the parts, and is professional equipment for manufacturing PCB circuit boards, semiconductors and high-precision fine lines. The exposure machine works on the principle that ultraviolet rays with UVA wavelength are emitted by a light source to transfer image information on a film or other transparent objects to a surface coated with photosensitive substances, more specifically, an optical system in the exposure machine needs to convert light emitted by the light source into ideal parallel light, then, patterns on a mask are transferred to a film below the mask in an equal size through the parallel light, and then, the patterns on the film are transferred to a substrate through etching. The exposure size, exposure energy and exposure uniformity of the exposure machine are all weight factors that affect the final machining accuracy throughout the manufacturing process.
SUMMERY OF THE UTILITY MODEL
The utility model aims at overcoming the above-mentioned not enough of prior art and providing an automatic exposure machine of heavy-calibre, its exposure size is big, and the exposure energy is high, and exposes more evenly.
The technical scheme of the utility model is that: the utility model provides an automatic exposure machine of heavy-calibre, includes the frame, installs optical path system and cooling system in the frame, optical path system includes light source, leaded light awl, first collimating lens, fly's eye lens, heavy-calibre speculum and second collimating lens in proper order according to the propagation route of light, and cooling system installs at the light source rear for dispel the heat to the light source.
Further, the heat dissipation system comprises a phase change heat sink and a silent fan, wherein the phase change heat sink is arranged between the light source and the silent fan.
Further, the light source is a high-power 405nm LED.
Further, the exposure machine further comprises a programmable linear direct current power supply for providing stable driving current for the LED.
Furthermore, the light guide cone, the first collimating lens and the fly-eye lens are sequentially arranged in an adjustable lens barrel, and the distances between the light guide cone and the first collimating lens and between the first collimating lens and the fly-eye lens can be adjusted, so that the divergence angle of the light beam can be adjusted. Preferably, the light guide cone is a quartz light guide cone, and the quartz light guide cone has the functions of light receiving and homogenization.
Furthermore, the large-caliber reflector is fixed on the frame through the reflector bracket, and the large-caliber reflector is used for deflecting the light rays by 90 degrees.
Furthermore, the second collimating lens is mounted on the frame through a lifting lens barrel, and the lifting lens barrel is used for adjusting the vertical height of the second collimating lens.
Furthermore, the exposure machine also comprises a controller and a shell, the shell wraps the rack, the light path system and the heat dissipation system, the shell is provided with a liquid crystal display, the controller is connected with the liquid crystal display and the programmable linear direct current power supply, and the controller is used for adjusting the exposure energy and the exposure time of the exposure machine.
Further, a counterweight base is arranged below the rack and made of a metal material, and preferably, the counterweight base is made of a high-density steel material.
Furthermore, a threaded hole is formed in the counterweight base and used for fixing the exposure machine.
Compared with the prior art the beneficial effects of the utility model: the exposure machine of this application, lead light cone through quartz and carried out homogenization once to the light of LED outgoing in advance, because the collimation degree that enters into the light of fly-eye lens is higher, then the homogenization effect is better, this application adopts first collimation lens to lead the homogenized light of light cone to carry out the angle compression through quartz, at this moment, the collimation degree that enters into the light of fly-eye lens is higher, therefore the homogenization effect is better, the exposure machine of this application leads light cone and fly-eye lens through quartz and combines together, twice homogenization has been carried out to the light, make the exposure size of exposure machine bigger in this application, the exposure energy is higher, it is more even to expose.
Drawings
Fig. 1 is a schematic perspective view of embodiment 1 of the present invention;
fig. 2 is a schematic cross-sectional view of embodiment 1 of the present invention;
fig. 3 is a schematic perspective view of embodiment 1 of the present invention without the structure of the housing and the like;
in the figure: the system comprises a machine frame 1, a programmable linear direct current power supply 2, a ten thousand switch 3, a silent fan 4, a phase change heat radiator 5, a high-power 405nm LED 6, a quartz light guide cone 7, a first collimating lens 8, an adjustable lens barrel 9, a fly eye lens 10, a reflector bracket 11, a large-caliber reflector 12, a programmable liquid crystal display 13, a second collimating lens 14, a lifting lens barrel 15, a counterweight base 16 and a shell 17.
Detailed Description
The present invention will be described in further detail with reference to specific embodiments, wherein methods and functional components not specifically described are known in the art.
Example 1
As shown in fig. 1 to 3, the present embodiment is a large-aperture automatic exposure machine, which includes a frame 1, and an optical path system and a heat dissipation system installed on the frame 1, the optical path system sequentially includes a light source, a light guide cone, a first collimating lens 8, a fly eye lens 10, a large-aperture reflector 12 and a second collimating lens 14 according to a propagation route of light, and the heat dissipation system is installed behind the light source and is used for dissipating heat from the light source.
In this embodiment, the heat dissipation system includes a phase change heat sink 5 and a silent fan 4, wherein the phase change heat sink 5 is installed between the light source and the silent fan 4.
In this embodiment, the light source is a high-power 405nm LED 6, and the exposure machine further includes a programmable linear dc power supply 2 for providing a stable driving current for the LED lamp.
In this embodiment, the light guide cone, the first collimating lens 8 and the fly-eye lens 10 are sequentially installed in an adjustable lens barrel 9, and the distances between the light guide cone and the first collimating lens 8, and between the first collimating lens 8 and the fly-eye lens 10 can be adjusted, so as to adjust the divergence angle of the light beam. Preferably, the light guide cone is a quartz light guide cone 7, and the quartz light guide cone 7 has the functions of light collection and homogenization.
In this embodiment, the large-diameter reflector 12 is a large-diameter aluminum film reflector, the large-diameter reflector 12 is fixed on the frame 1 through the reflector bracket 11, and the large-diameter reflector 12 is used for deflecting light rays by 90 degrees.
In this embodiment, the second collimating lens 14 is mounted on the frame 1 through a lifting lens barrel 15, and the lifting lens barrel 15 is used for adjusting the vertical height of the second collimating lens 14.
In this embodiment, the exposure machine further includes a controller and a housing 17, the housing 17 wraps the rack 1, the optical path system and the heat dissipation system, the housing 17 is provided with a liquid crystal display 13 and a ten thousand-time switch 3 for starting or closing the power supply, the controller is connected with the liquid crystal display 13 and the programmable linear direct current power supply 2, the controller is used for adjusting the exposure energy and the exposure time of the exposure machine, and the controller adopts a PLC system. When the exposure machine is used specifically, a user can input a related instruction through the liquid crystal display screen, and the controller receives and identifies the instruction and then adjusts the exposure energy and the exposure time of the exposure machine.
In this embodiment, a counterweight base 16 is arranged below the frame 1, the counterweight base 16 is made of a high-density steel material, and a threaded hole is formed in the counterweight base 16 and used for fixing the exposure machine.
The exposure machine in this embodiment has the following main parameters: the exposure diameter is 6 inches, the divergence angle is less than 5 degrees, the maximum exposure power is more than 150mW/cm ^2, the polarization exposure power is more than 60mW/cm ^2, the power uniformity is more than 95 percent, and the power stability is more than 99.5 percent.
The above is only a partial embodiment of the present invention, and is not intended to limit the present invention, and to those skilled in the art, the present invention can have the combination and modification of the above various technical features, and those skilled in the art can replace the improvement, modification, equivalent replacement, or use the structure or method of the present invention in other fields to achieve the same effect without departing from the spirit and scope of the present invention, and all belong to the protection scope of the present invention.

Claims (10)

1. The utility model provides an automatic exposure machine of heavy-calibre, includes the frame, installs light path system and cooling system in the frame, its characterized in that: the light path system sequentially comprises a light source, a light guide cone, a first collimating lens, a fly-eye lens, a large-aperture reflector and a second collimating lens according to the propagation route of light rays, and the heat dissipation system is arranged behind the light source and used for dissipating heat of the light source; the light guide cone is a quartz light guide cone.
2. A large-caliber automatic exposure machine according to claim 1, wherein: the heat dissipation system comprises a phase change heat radiator and a mute fan, wherein the phase change heat radiator is arranged between the light source and the mute fan.
3. A large-caliber automatic exposure machine according to claim 1, wherein: the light source is a high-power LED.
4. A large-caliber automatic exposure machine according to claim 3, wherein: the LED driving circuit also comprises a programmable linear direct current power supply which is used for providing stable driving current for the LED.
5. A large-caliber automatic exposure machine according to claim 1, wherein: the light guide cone, the first collimating lens and the fly-eye lens are sequentially arranged in an adjustable lens barrel, and the distances between the light guide cone and the first collimating lens and between the first collimating lens and the fly-eye lens can be adjusted, so that the divergence angle of light beams can be adjusted.
6. A large-caliber automatic exposure machine according to claim 1, wherein: the large-caliber reflector is fixed on the rack through the reflector bracket and used for deflecting light rays by 90 degrees.
7. A large-caliber automatic exposure machine according to claim 1, wherein: the second collimating lens is mounted on the frame through a lifting lens barrel, and the lifting lens barrel is used for adjusting the vertical height of the second collimating lens.
8. A large-caliber automatic exposure machine according to claim 4, characterized in that: the exposure machine further comprises a controller and a shell, the shell wraps the rack, the light path system and the heat dissipation system, the shell is provided with a liquid crystal display, the controller is connected with the liquid crystal display and the programmable linear direct current power supply, and the controller is used for adjusting exposure energy and exposure time of the exposure machine.
9. A large-caliber automatic exposure machine according to claim 1, wherein: and a counterweight base is arranged below the rack and is made of a metal material.
10. A large-caliber automatic exposure machine according to claim 9, wherein: and a threaded hole is formed in the counterweight base and used for fixing the exposure machine.
CN202220456997.1U 2022-03-04 2022-03-04 Large-diameter automatic exposure machine Active CN217113045U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202220456997.1U CN217113045U (en) 2022-03-04 2022-03-04 Large-diameter automatic exposure machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202220456997.1U CN217113045U (en) 2022-03-04 2022-03-04 Large-diameter automatic exposure machine

Publications (1)

Publication Number Publication Date
CN217113045U true CN217113045U (en) 2022-08-02

Family

ID=82601152

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202220456997.1U Active CN217113045U (en) 2022-03-04 2022-03-04 Large-diameter automatic exposure machine

Country Status (1)

Country Link
CN (1) CN217113045U (en)

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