CN104325760A - Window film core functional layer and preparation method thereof - Google Patents
Window film core functional layer and preparation method thereof Download PDFInfo
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- CN104325760A CN104325760A CN201410629081.1A CN201410629081A CN104325760A CN 104325760 A CN104325760 A CN 104325760A CN 201410629081 A CN201410629081 A CN 201410629081A CN 104325760 A CN104325760 A CN 104325760A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
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Abstract
The invention discloses a window film core functional layer and a preparation method thereof. The window film core functional layer comprises a PET substrate thin film, and a first transparent oxide layer, a first composite metal layer, a second transparent oxide layer, a second composite metal layer, a third transparent oxide layer and an outer side seal layer which are sequentially deposited from bottom to top by magnetron sputtering. The preparation method of the window film core functional layer comprises the step of sequentially performing coating in six chambers of a six-chamber coiling type magnetron sputtering coating machine or a double-roller and three-chamber coiling type magnetron sputtering coating machine to form the magnetron sputtering layers. The window film core functional layer has the beneficial effects that an Au layer with the thickness of 3-10nm is deposited at the outer side of the third transparent oxide by magnetron sputtering, so that the infrared reflectivity is increased to 90% from 80%; the reflectivity of visible light is reduced while the infrared reflectivity is increased, so that the temperature in a chamber using the window film core functional layer is maintained to be constant while lighting is not influenced.
Description
Technical field
The present invention relates to optical field, be specifically related to a kind of method of fenestrated membrane Core Feature layer and this fenestrated membrane Core Feature layer of preparation.
Background technology
In recent years, domestic magnetron sputtering fenestrated membrane industry is just risen, Dan Yin, two silver even three silver medal structures can be widely used in fenestrated membrane production, but in the industrial production, the magnetic control fenestrated membrane production later stage also needs to carry out coating process and carries out compound, and this just allows fenestrated membrane inevitably contact with air, even in handling process with the contact of human body, also can accelerate the oxidation of fenestrated membrane.In the industry of low emissivity glass; to the anti-oxidation work no less important of coating; they can cover layer of plastic film on coated glass, and this layer film can carry out protection against oxidation in transit or before deep processing at coated glass, and the anti-oxidation term of validity of usual heat radiation glass is 1-2 month.But this kind of mode is not also suitable for fenestrated membrane industry, that can cause in production technology is complicated.Utilize magnetron sputtering technique, complete Dan Yin, (three silver medal structures are in two silver base for two silver and three silver medal structures, increase again one deck silver and metal oxide) film system after, recycling magnetron sputtering adds the gold of plating one deck 3-10nm, this layer of gold will improve the infrared reflectivity of fenestrated membrane greatly, and has good anti-oxidation effect.
Summary of the invention
The object of this invention is to provide a kind of method of fenestrated membrane Core Feature layer and this fenestrated membrane Core Feature layer of preparation, the method of multilayer silver structure oxidation can be prevented simultaneously, described fenestrated membrane Core Feature layer comprises PET base film and by the magnetron sputtering layer of magnetron sputtering deposition on described PET base film, described magnetron sputtering layer comprises the first transparent oxide layer be deposited on successively on described PET base film from bottom to top, first complex metal layer, second transparent oxide layer, second complex metal layer, 3rd transparent oxide layer and outside sealing, ultraviolet and infrared ray is kept out while controlling visible light transmissivity, and there are for infrared ray whole albedoes of more than 90%, real realization is to the obstruct of solar energy.But the fenestrated membrane relating to Nano Silver structure is very easily oxidized after ingress of air in process of production, therefore prevents the nanometer film oxidation of high-end two silver-colored structure from also having vital meaning, to overcome prior art above shortcomings.
The object of the invention is to be achieved through the following technical solutions:
A kind of fenestrated membrane Core Feature layer:
Comprise PET base film and by the magnetron sputtering layer of magnetron sputtering deposition on described PET base film, described magnetron sputtering layer comprises the first transparent oxide layer be deposited on successively on described PET base film, the first complex metal layer, the second transparent oxide layer, the second complex metal layer, the 3rd transparent oxide layer and outside sealing from bottom to top;
The material of described first transparent oxide layer, described second transparent oxide layer and described 3rd transparent oxide layer is the one in metal oxide, ITO or AZO;
Described first complex metal layer comprises an Ag layer from bottom to top and the first sealing metal level; Described second complex metal layer comprises the 2nd Ag layer from bottom to top and the second sealing metal level;
The material of a described Ag layer and described 2nd Ag layer is Ag, the thickness of a described Ag layer and described 2nd Ag layer is 10-15nm, the material of described first sealing metal level and the material of described second sealing metal level are for being Ti or NiCr alloy, and the thickness of described first sealing metal level and described second sealing metal level is 3-5nm;
The thickness of described PET base film is 20-200 μm, the thickness of described first transparent oxide layer is 30-40nm, and the thickness of described first complex metal layer is 13-20nm, the thickness of described second transparent oxide layer is 45-60nm, the thickness of described second complex metal layer is 13-20nm, the thickness of described 3rd transparent oxide layer is 30-40nm;
The material of described outside sealing is Au, and the thickness of described outside sealing is 3-10nm.
By magnetron sputtering, three layers of transparent oxide film, composite metal membrane and sealing metal are plated in successively the surface of the PET base film cleaned up, nanoscale fenestrated membrane Core Feature layer can be formed after optimal design is done to the condition deposited and thickness.Described fenestrated membrane Core Feature layer is through can by infrared light reflection while visible ray, described fenestrated membrane Core Feature layer is applied to fenestrated membrane, described fenestrated membrane is attached on glass, described fenestrated membrane Core Feature layer is by the infrared light reflection outside fenestrated membrane, prevent Infrared irradiation from entering in the chamber (as automobile bodies) of mounting glass, avoid causing the temperature in chamber to rise, often need to install an air-conditioner in chamber to carry out temperature adjustment to improve comfort level, and the operation of air-conditioning needs to consume mass energy, adopt the technical program can improve infrared light reflectance, reduce the infrared light entered in chamber, prevent the too fast rising of chamber indoor temperature, when described transparent oxide layer and described complex metal layer accomplish certain thickness (as being less than 300nm), passing through of visible ray can not be affected, while ensureing the temperature constant in chamber, not affect daylighting again.
Metal A g is good to infrared light, adopts argent to ensure that described fenestrated membrane Core Feature layer is to the reflecting properties of infrared light as a part for complex metal layer, the strong metal material of oxidation resistance is also deposited on the top of described Ag layer, as Ti or NiCr alloy, oxidation resistance due to Ag is more weak very easily oxidized, once the AgO formed after Ag oxidation no longer possesses good infrared light reflection performance, the infrared reflectivity of described fenestrated membrane Core Feature layer certainly will be affected, an Ag layer deposits the first sealing metal level, 2nd Ag layer deposits the second sealing metal level, in order to block the contact of Ag layer and oxygen, if there is no the protection of sealing metal level, at the first complex metal layer, also the second transparent oxide layer will be carried out after second complex metal layer deposition, 3rd transparent oxide layer deposition, the mist of argon gas and oxygen can be passed in corresponding chambers when transparent oxide deposits, the oxygen passed into can generate the lower AgO of infrared reflectivity with Ag layer generation chemical reaction, affect described fenestrated membrane Core Feature layer to infrared light reflectance, in addition, also can contact to be oxidized with the oxygen in air in the fenestrated membrane use procedure that described employing described fenestrated membrane Core Feature layer is made into and affect fenestrated membrane to infrared light reflectance, reduce the heat-blocking action of fenestrated membrane, sealing metal level is adopted to ensure that described first complex metal layer and described second complex metal layer are to infrared light reflectance.
The chemical property of Ti or NiCr alloy is stable many relative to Ag, especially the antioxygenic property under the former normal temperature is extremely stable, by Ti target or NiCr alloys target through magnetron sputtering deposition at the extremely low Ag layer of non-oxidizability and in being wrapped in by Ag layer, prevent the oxygen that passes in the 3rd chamber during deposition the second transparent oxide layer in the 3rd chamber that the oxidation of Ag layer, the oxygen that passes in the 5th chamber when the 5th chamber deposition the 3rd transparent oxide layer are oxidized Ag layer.Ensure that the IR reflectivity under described fenestrated membrane Core Feature layer Long-Time Service, extend the service life of described fenestrated membrane Core Feature layer.
Magnetron sputtering layer is six layers, can complete by a plated film in six magnetic control chambers.Target discharge order in six chambers, be followed successively by transparent oxide film, silver+sealing metal, transparent oxide film, Ag+ sealing metal, transparent oxide film, Au target, its thickness controls respectively at 30-40nm, 13-20nm, 45-60nm, 13-20nm, 30-40nm and 3-10nm, and the combination different according to each layer film thickness within the scope of this, different colours can be prepared, the fenestrated membrane Core Feature layer of Different Red external reflectance ability.
Be the outside sealing of 3-10nm by magnetron sputtering deposition thickness in the outside of described 3rd transparent oxide, the material of described outside sealing is Au, and the infrared reflectivity of described fenestrated membrane Core Feature layer is compared does not have the Core Feature layer of outside sealing to be promoted to 90% from 80%; Separately, metal A u is inert material, and stable chemical performance chemical reaction can not occur under usual conditions, improves the antioxygenic property of described fenestrated membrane Core Feature layer, can not reduce, extend service life to infrared light reflectance along with the prolongation of service time.
Further, the 3rd complex metal layer and the 4th transparent oxide layer is deposited from the bottom up successively between described 3rd transparent oxide layer and described outside sealing, described 3rd complex metal layer comprises the 3rd Ag layer from bottom to top and the 3rd sealing metal level, the material of described 3rd Ag is Ag, the thickness of described 3rd Ag layer is 10-15nm, the material of described 3rd sealing metal level is Ti or NiCr alloy, the thickness of described 3rd sealing metal level is 3-5nm, the material that the material of described 4th transparent oxide layer is is metal oxide, one in ITO or AZO, the thickness of described 4th transparent oxide layer is 30-40nm.
Prepare the method for above-mentioned fenestrated membrane Core Feature layer, comprise the steps:
S1, carry out magnetron sputtering, at surface deposition first transparent oxide layer of PET base film at the first chamber of two roller three chamber winding magnetic control sputtering coating machine;
S2, carry out magnetron sputtering, at surface deposition first complex metal layer of the first transparent oxide layer at the second chamber of two roller three chamber winding magnetic control sputtering coating machine;
S3, carry out magnetron sputtering, at surface deposition second transparent oxide layer of the first complex metal layer at the 3rd chamber of two roller three chamber winding magnetic control sputtering coating machine;
S4, carry out magnetron sputtering, at surface deposition second complex metal layer of the second transparent oxide layer at the 4th chamber of two roller three chamber winding magnetic control sputtering coating machine;
S5, carry out magnetron sputtering, at surface deposition the 3rd transparent oxide layer of the second complex metal layer at the 5th chamber of two roller three chamber winding magnetic control sputtering coating machine;
S6, carry out magnetron sputtering, sealing outside the surface deposition of the 3rd transparent oxide layer at the 6th chamber of two roller three chamber winding magnetic control sputtering coating machine.
Further, magnetron sputtering process keeps the temperature constant in six chambers, and the temperature range in six chambers is 25-50 DEG C, prevents the heat produced in magnetron sputtering process from causing PET base film to be out of shape.
Further, two roller three chamber winding magnetic control sputtering coating machine comprises TCS and tension control system, in order to control the tensile force that in magnetron sputtering process, PET base film is subject to, prevents from causing PET film wrinkling uneven with plated film.
Preferably, step S1, step S3 and step S5 include: in corresponding chambers, and passing into volume ratio is the argon gas of 40:1-60:1 and the mist of oxygen, setting vacuum 10-6Torr, and plated film stablizes air pressure 0.5-1Pa; Target selects transparent oxide film, and wherein the material of transparent oxide film is the one in ITO, AZO or metal oxide; Transparent oxide film uniform deposition in first chamber, the 3rd chamber and the 5th chamber forms the first transparent oxide layer, the second transparent oxide layer and the 3rd transparent oxide layer respectively, makes the deposit thickness of the first transparent oxide layer, the second transparent oxide layer and the 3rd transparent oxide layer be respectively 30-40nm, 45-60nm and 30-40nm by controlling power.
Further, step S2 and step S4 includes: in corresponding chambers, pass into purity be not less than 99.99% argon gas, put into one and rotate Ag target and a Ti flat target, setting vacuum 10-6Torr, plated film stablizes air pressure 0.5-1Pa; Through magnetron sputtering, rotation Ag target and Ti flat target are deposited as Ag layer and Ti layer respectively successively, the thickness of Ag layer is made to be 10-15nm by controlling power, the thickness of Ti layer is that 3-5nm, Ag layer and Ti layer are deposited on the second chamber respectively and the 4th chamber forms the first complex metal layer and the second complex metal layer.
Further, in step S6, in the 6th chamber, pass into the argon gas that purity is not less than 99.99%, put into one and rotate Au target, setting vacuum 10-6Torr, plated film stablizes air pressure 0.5-1Pa; Rotate through magnetron sputtering formation outside, the surface sealing that Au target is deposited on described 3rd transparent oxide layer, the thickness making outside sealing by controlling power is 3-10nm.
Preferably, before step S1, the surface of PET base film is cleaned.
Beneficial effect of the present invention is:
Be the outside sealing of 3-10nm by magnetron sputtering deposition thickness in the outside of described 3rd transparent oxide, the material of described outside sealing is Au, and the infrared reflectivity of described fenestrated membrane Core Feature layer is compared does not have the Core Feature layer of outside sealing to be promoted to 90% from 80%; Separately, metal A u is inert material, and stable chemical performance chemical reaction can not occur under usual conditions, improves the antioxygenic property of described fenestrated membrane Core Feature layer, can not reduce, extend service life to infrared light reflectance along with the prolongation of service time;
Improve while infrared reflectivity and reduce visible light reflectance, do not affect daylighting again while temperature constant in the chamber ensureing to employ this fenestrated membrane Core Feature layer, reduce the air-conditioning use amount in chamber, economize energy consumption; Respectively by magnetron sputtering deposition first sealing metal level and the second sealing metal level on Ag in the first complex metal layer and the second complex metal layer, the material of described first sealing metal level and strong Ti or the NiCr alloy of material selection antioxygenic property of described second sealing metal level, prevent the oxidation of Ag layer, the contact of Ag layer and oxygen is blocked at Ag layer overburden sealing metal level, ensure that described first complex metal layer and described second complex metal layer are to infrared light reflectance, ensure the service life of described fenestrated membrane Core Feature layer; Described making described fenestrated membrane Core Feature layer once completes in five magnetic control chambers, and production efficiency is high; Through hole controls power to be undertaken regulating to prepare different colours by the thickness of each layer in magnetron sputtering layer, and the fenestrated membrane Core Feature layer of Different Red external reflectance ability, meets diversified needs, enrich product line, improves the market competitiveness.
The obtained nano-energy-saving film of the method is utilized to be widely used in automobile, building waits glass door and window pad pasting etc., glass after pad pasting is by the characteristic of nano material itself, can control sunlight and select, ultraviolet and infrared ray is kept out while controlling visible light transmissivity, and there are for infrared ray whole albedoes of more than 90%, really realize the obstruct to solar energy.
Accompanying drawing explanation
Fig. 1 is the generalized section of the fenestrated membrane Core Feature layer of an embodiment;
Fig. 2 is the generalized section of the fenestrated membrane Core Feature layer of another embodiment.
In figure, 1, PET base film; 2, magnetron sputtering layer; 21, the first transparent oxide layer; 22, the first complex metal layer; 221, an Ag layer; 222, the first sealing metal level; 23, the second transparent oxide layer; 24, the second complex metal layer; 241, the 2nd Ag layer; 242, the second sealing metal level; 25, the 3rd transparent oxide layer; 26, the 3rd complex metal layer; 261, the 3rd Ag layer; 262, the 3rd sealing metal level; 27, the 4th transparent oxide layer; 3, outside sealing.
Detailed description of the invention
Embodiment one
As shown in Figure 1, a kind of fenestrated membrane Core Feature layer, comprise PET base film 1 and be located at the magnetron sputtering layer 2 on described PET base film 1, described magnetron sputtering layer 2 comprise be deposited on successively from bottom to top described on the first transparent oxide layer 21, first complex metal layer 22, second transparent oxide layer 23, second complex metal layer 24, the 3rd transparent oxide layer 25 and outside sealing 3.The material of described first transparent oxide layer 21, described second transparent oxide layer 23 and described 3rd transparent oxide layer 25 is the one in metal oxide, ITO or AZO.
Further, described first complex metal layer 22 comprises Ag layer 221 and a first sealing metal level 222 from bottom to top; Described second complex metal layer 24 comprises the 2nd Ag layer 241 and the second sealing metal level 242 from bottom to top.The material of a described Ag layer 221 and described 2nd Ag layer 241 is Ag, the material of described first sealing metal level 222 and the material of described second sealing metal level 242 are Ti or NiCr alloy, the thickness of a described Ag layer 221 and described second silver layer 241 is 10nm, and the thickness of described first sealing metal level 222 and described second sealing metal level 242 is 3nm.The material of described outside sealing 3 is Au, the thickness of described outside sealing 3 is 3nm, the thickness of described PET base film 1 is 100 μm, the thickness of described first transparent oxide layer 21 is 30nm, and the thickness of described first complex metal layer 22 is 13nm, the thickness of described second transparent oxide layer 23 is 45nm, the thickness of described second complex metal layer 24 is 13nm, the thickness of described 3rd transparent oxide layer 25 is 30nm.
The method of the fenestrated membrane Core Feature layer of preparation described in technique scheme, comprise the steps: area to be 30cm × 30cm, thickness is carry out following steps after 50 μm cleaning up:
S1, carry out magnetron sputtering at the first chamber of two roller three chamber winding magnetic control sputtering coating machine, surface deposition first transparent oxide layer 21, controlling power is that 20kW is to ensure that the deposit thickness of described first transparent oxide layer 21 is for 30nm;
S2, carry out magnetron sputtering at the second chamber of two roller three chamber winding magnetic control sputtering coating machine, at surface deposition first complex metal layer 22 of the first transparent oxide layer 21, controlling power is that 5kW is to ensure that the deposit thickness of described first complex metal layer 22 is for 13nm, the thickness of a wherein said Ag layer 221 is 10nm, and the thickness of described first sealing metal level 222 is 3nm;
S3, carry out magnetron sputtering at the 3rd chamber of two roller three chamber winding magnetic control sputtering coating machine, at surface deposition second transparent oxide layer 23 of the first complex metal layer 22, controlling power is that 20kW is to ensure that the deposit thickness of described second transparent oxide layer 23 is for 45nm;
S4, carry out magnetron sputtering at the 4th chamber of two roller three chamber winding magnetic control sputtering coating machine, at surface deposition second complex metal layer 24 of the second transparent oxide layer 23, controlling power is that 5kW is to ensure that the deposit thickness of described second complex metal layer 24 is for 13nm, the thickness of wherein said 2nd Ag layer 241 is 10nm, and the thickness of described second sealing metal level 242 is 3nm;
S5, carry out magnetron sputtering at the 5th chamber of two roller three chamber winding magnetic control sputtering coating machine, at surface deposition the 3rd transparent oxide layer 25 of the second complex metal layer 24, controlling power is that 20kW is to ensure that the deposit thickness of described 3rd transparent oxide layer 25 is for 30nm;
S6, carry out magnetron sputtering, sealing 3 outside the surface deposition of the 3rd transparent oxide layer 25 at the 6th chamber of two roller three chamber winding magnetic control sputtering coating machine, controlling power is that 5kW makes the thickness of outside sealing 3 be 3nm.
It should be noted that, two roller three chamber winding magnetic control sputtering coating machine should be equipped with high-end accurate traction and tension system, the strict tensile force controlled to PET film in coating process, prevents from causing PET film wrinkling uneven with plated film.
Wherein, step S1, step S3 and step S5 include: in the corresponding chambers of described five chamber winding magnetic control sputtering coating machines, passing into volume ratio is the argon gas of 40:1-60:1 and the mist of oxygen, setting vacuum 10-6Torr, and plated film stablizes air pressure 0.5-1Pa; Target selects transparent oxide film, and the material that wherein transparent oxide film is is the one in ITO, AZO or metal oxide; Transparent oxide film uniform deposition in first chamber, the 3rd chamber and the 5th chamber forms the first transparent oxide layer 21, second transparent oxide layer 23 and the 3rd transparent oxide layer 25 respectively.
Step S2 and step S4 includes: in the corresponding chambers of described five chamber winding magnetic control sputtering coating machines, pass into purity be not less than 99.99% argon gas, put into one and rotate Ag target and a Ti flat target, setting vacuum 10-6Torr, plated film stablizes air pressure 0.5-1Pa; Through magnetron sputtering, rotation Ag target and Ti flat target are deposited as Ag layer respectively successively, described Ag layer comprises an Ag layer 221 and the second silver layer 241, Ag layer and Ti layer and is deposited on the second chamber respectively and the 4th chamber forms the first complex metal layer 22 and the second complex metal layer 24.
In step S6, in the 6th chamber, pass into the argon gas that purity is not less than 99.99%, put into one and rotate Au target, setting vacuum 10-6Torr, plated film stablizes air pressure 0.5-1Pa; Formation outside, the surface sealing 3 that Au target is deposited on described 3rd transparent oxide layer 25 is rotated through magnetron sputtering.
It should be noted that in magnetron sputtering process the temperature remained constant kept in five chambers, and temperature range is 25 DEG C-50 DEG C.
The present embodiment is less than 10% to visible light reflectance, is more than 65% to the reflectivity of infrared light (1000nm wave band).
Comparative example one
The present embodiment is relative to the difference of embodiment one: magnetron sputtering layer 2 only comprises the first transparent oxide layer 21, first complex metal layer 22, second transparent oxide layer 23, second complex metal layer 24 and the 3rd transparent oxide layer 25, do not comprise outside sealing 3, the present embodiment is less than 10% to visible light reflectance, equaling to visible light reflectance in embodiment one, is less than 60% to be less than in embodiment one infrared light reflectance 65% to infrared light reflectance (1000nm wave band).
Embodiment two
The present embodiment is relative to the difference of embodiment one: the power controlling the first chamber is 30kW, and the deposit thickness making described first transparent oxide layer 21 is 40nm.
The power controlling the second chamber is 15kW, and the deposit thickness making described first complex metal layer 22 is 20nm, and the deposit thickness of a wherein said Ag layer 221 is 15nm, described first sealing metal level 222 and deposit thickness be 5nm.
The power controlling the 3rd chamber is 30kW, and the deposit thickness making described second transparent oxide layer 23 is 60nm.
The power controlling the 4th chamber is 15kW, and the deposit thickness making described second complex metal layer 24 is 20nm, and wherein the deposit thickness of the 2nd Ag layer 221 is 15nm, and the deposit thickness of the second sealing metal level 222 is 5nm.
The power controlling the 5th chamber is 30kW, makes the deposit thickness of the 3rd transparent oxide layer 25 be 40nm.
The power controlling the 6th chamber is 10kW, and the deposit thickness making outside sealing 3 is 10nm.
The present embodiment is less than 10% to visible light reflectance, is more than 80% to the reflectivity of infrared light (1000nm wave band).
Embodiment three
The present embodiment is relative to the difference of embodiment one: the power controlling the first chamber is 25kW, and the deposit thickness making described first transparent oxide layer 21 is 35nm.
The power controlling the second chamber is 10kW, and the deposit thickness making described first complex metal layer 22 is 16.5nm, and the deposit thickness of a wherein said Ag layer 221 is 12.5nm, and the deposit thickness of described first sealing metal level 222 is 4nm.
The power controlling the 3rd chamber is 25kW, and the deposit thickness making described second transparent oxide layer 23 is 52.5nm.
The power controlling the 4th chamber is 15kW, and the deposit thickness making described second complex metal layer 24 is 16.5nm, and wherein the deposit thickness of the 2nd Ag layer 221 is 12.5nm, and the deposit thickness of the second sealing metal level 222 is 4nm.
The power controlling the 5th chamber is 25kW, and the deposit thickness making described 3rd transparent oxide layer 25 is 35nm.
The power controlling the 6th chamber is 7.5kW, makes the deposit thickness of described outside sealing 3 be 6.5nm.
The present embodiment is less than 10% to visible light reflectance, is more than 73% to the reflectivity of infrared light (1000nm wave band).
Embodiment four
Compare embodiment one, the present embodiment deposits the 3rd complex metal layer 26 and the 4th transparent oxide layer 27 from the bottom up successively between described 3rd transparent oxide layer 25 and described outside sealing 3, as shown in Figure 2, described 3rd complex metal layer 26 comprises the 3rd Ag layer 261 from bottom to top and the 3rd sealing metal level 262, the material of described 3rd Ag layer 261 is Ag, the thickness of described 3rd Ag layer 261 is 10nm, the material of described 3rd sealing metal level 262 is Ti or NiCr alloy, the thickness of described 3rd sealing metal level 262 is 3nm, the material that the material of described 4th transparent oxide layer 27 is is metal oxide, one in ITO or AZO, the thickness of described 4th transparent oxide layer 27 is 30nm.
The preparation method of the present embodiment:
The present embodiment adopts two roller four chamber winding magnetic control sputtering coating machine, first chamber of the present embodiment is identical with the S1-S5 step in embodiment one to the magnetron sputtering in the 5th chamber, 8th chamber of the present embodiment is identical with the S6 step of embodiment one, and the magnetron sputtering step S52 carried out in the magnetron sputtering step S51 carried out in the 7th chamber of the present embodiment and the 8th chamber is as follows respectively:
S51, carry out magnetron sputtering at the second chamber of two roller three chamber winding magnetic control sputtering coating machine, at surface deposition first complex metal layer 22 of the first transparent oxide layer 21, controlling power is that 5kW is to ensure that the deposit thickness of described first complex metal layer 22 is for 13nm, the thickness of a wherein said Ag layer 221 is 10nm, and the thickness of described first sealing metal level 222 is 3nm;
S52, carry out magnetron sputtering at the first chamber of two roller three chamber winding magnetic control sputtering coating machine, surface deposition first transparent oxide layer 21, controlling power is that 20kW is to ensure that the deposit thickness of described first transparent oxide layer 21 is for 30nm.
The present embodiment is less than 10% to visible light reflectance, is more than 70% to the reflectivity of infrared light (1000nm wave band).
The present invention is not limited to above-mentioned preferred forms; anyone can draw other various forms of products under enlightenment of the present invention; no matter but any change is done in its shape or structure; every have identical with the application or akin technical scheme, all drops within protection scope of the present invention.
Claims (9)
1. a fenestrated membrane Core Feature layer, is characterized in that:
Comprise PET base film and by the magnetron sputtering layer of magnetron sputtering deposition on described PET base film, described magnetron sputtering layer comprises the first transparent oxide layer be deposited on successively on described PET base film, the first complex metal layer, the second transparent oxide layer, the second complex metal layer, the 3rd transparent oxide layer and outside sealing from bottom to top;
The material of described first transparent oxide layer, described second transparent oxide layer and described 3rd transparent oxide layer is the one in metal oxide, ITO or AZO;
Described first complex metal layer comprises an Ag layer from bottom to top and the first sealing metal level; Described second complex metal layer comprises the 2nd Ag layer from bottom to top and the second sealing metal level;
The material of a described Ag layer and described 2nd Ag layer is Ag, the thickness of a described Ag layer and described 2nd Ag layer is 10-15nm, the material of described first sealing metal level and the material of described second sealing metal level are for being Ti or NiCr alloy, and the thickness of described first sealing metal level and described second sealing metal level is 3-5nm;
The thickness of described PET base film is 20-200 μm, the thickness of described first transparent oxide layer is 30-40nm, and the thickness of described first complex metal layer is 13-20nm, the thickness of described second transparent oxide layer is 45-60nm, the thickness of described second complex metal layer is 13-20nm, the thickness of described 3rd transparent oxide layer is 30-40nm;
The material of described outside sealing is Au, and the thickness of described outside sealing is 3-10nm.
2. fenestrated membrane Core Feature layer according to claim 1, it is characterized in that: between described 3rd transparent oxide layer and described outside sealing, deposit the 3rd complex metal layer and the 4th transparent oxide layer from the bottom up successively, described 3rd complex metal layer comprises the 3rd Ag layer from bottom to top and the 3rd sealing metal level, the material of described 3rd Ag is Ag, the thickness of described 3rd Ag layer is 10-15nm, the material of described 3rd sealing metal level is Ti or NiCr alloy, the thickness of described 3rd sealing metal level is 3-5nm, the material that the material of described 4th transparent oxide layer is is metal oxide, one in ITO or AZO, the thickness of described 4th transparent oxide layer is 30-40nm.
3. prepare the method for fenestrated membrane Core Feature layer according to claim 1, it is characterized in that:
Comprise the steps:
S1, carry out magnetron sputtering, at surface deposition first transparent oxide layer of PET base film at the first chamber of two roller three chamber winding magnetic control sputtering coating machine;
S2, carry out magnetron sputtering, at surface deposition first complex metal layer of the first transparent oxide layer at the second chamber of two roller three chamber winding magnetic control sputtering coating machine;
S3, carry out magnetron sputtering, at surface deposition second transparent oxide layer of the first complex metal layer at the 3rd chamber of two roller three chamber winding magnetic control sputtering coating machine;
S4, carry out magnetron sputtering, at surface deposition second complex metal layer of the second transparent oxide layer at the 4th chamber of two roller three chamber winding magnetic control sputtering coating machine;
S5, carry out magnetron sputtering, at surface deposition the 3rd transparent oxide layer of the second complex metal layer at the 5th chamber of two roller three chamber winding magnetic control sputtering coating machine;
S6, carry out magnetron sputtering, sealing outside the surface deposition of the 3rd transparent oxide layer at the 6th chamber of two roller three chamber winding magnetic control sputtering coating machine.
4. the method preparing fenestrated membrane Core Feature layer according to claim 3 is characterized in that: magnetron sputtering process keeps the temperature constant in six chambers, and the temperature range in six chambers is 25-50 DEG C, prevent the heat produced in magnetron sputtering process from causing PET base film to be out of shape.
5. the method preparing fenestrated membrane Core Feature layer according to claim 4 is characterized in that: two roller three chamber winding magnetic control sputtering coating machine comprises TCS and tension control system, in order to control the tensile force that in magnetron sputtering process, PET base film is subject to, prevent from causing PET film wrinkling uneven with plated film.
6. the method preparing fenestrated membrane Core Feature layer according to claim 5 is characterized in that: step S1, step S3 and step S5 include: in corresponding chambers, passing into volume ratio is the argon gas of 40:1-60:1 and the mist of oxygen, setting vacuum 10-6Torr, plated film stablizes air pressure 0.5-1Pa; Target selects transparent oxide film, and wherein the material of transparent oxide film is the one in ITO, AZO or metal oxide;
Transparent oxide film uniform deposition in first chamber, the 3rd chamber and the 5th chamber forms the first transparent oxide layer, the second transparent oxide layer and the 3rd transparent oxide layer respectively, makes the deposit thickness of the first transparent oxide layer, the second transparent oxide layer and the 3rd transparent oxide layer be respectively 30-40nm, 45-60nm and 30-40nm by controlling power.
7. the method preparing fenestrated membrane Core Feature layer according to claim 6 is characterized in that: step S2 and step S4 includes: in corresponding chambers, pass into purity be not less than 99.99% argon gas, put into one and rotate Ag target and a Ti flat target, setting vacuum 10-6Torr, plated film stablizes air pressure 0.5-1Pa; Through magnetron sputtering, rotation Ag target and Ti flat target are deposited as Ag layer and Ti layer respectively successively, the thickness of Ag layer is made to be 10-15nm by controlling power, the thickness of Ti layer is that 3-5nm, Ag layer and Ti layer are deposited on the second chamber respectively and the 4th chamber forms the first complex metal layer and the second complex metal layer.
8. the method preparing fenestrated membrane Core Feature layer according to claim 7 is characterized in that: in step S6, the argon gas that purity is not less than 99.99% is passed in the 6th chamber, put into one and rotate Au target, setting vacuum 10-6Torr, plated film stablizes air pressure 0.5-1Pa; Rotate through magnetron sputtering formation outside, the surface sealing that Au target is deposited on described 3rd transparent oxide layer, the thickness making outside sealing by controlling power is 3-10nm.
9. the method preparing fenestrated membrane Core Feature layer according to claim 3, is characterized in that: clean the surface of PET base film before step S1.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105172261A (en) * | 2015-09-06 | 2015-12-23 | 汕头万顺包装材料股份有限公司 | Optical radiation barrier film |
| CN108118307A (en) * | 2018-02-08 | 2018-06-05 | 广东中钛节能科技有限公司 | Flexible intelligent spectral selection thermal isolation film and preparation method thereof |
| CN110818280A (en) * | 2019-12-02 | 2020-02-21 | 惠州市万合玻璃科技有限公司 | Production process of multilayer coated glass |
| CN113719221A (en) * | 2021-08-17 | 2021-11-30 | 福建恒春织造股份有限公司 | Magic tape window membrane convenient to installation is dismantled and is accomodate |
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| US5939188A (en) * | 1991-07-15 | 1999-08-17 | Pilkington Aerospace, Inc. | Transparent coating systems for improving the environmental durability of transparency substrates |
| CN101929590A (en) * | 2009-06-22 | 2010-12-29 | 核工业西南物理研究院 | Solar control-low radiation type heat-insulation membrane system |
| CN204340319U (en) * | 2014-11-10 | 2015-05-20 | 邹申秀 | Fenestrated membrane Core Feature layer |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5939188A (en) * | 1991-07-15 | 1999-08-17 | Pilkington Aerospace, Inc. | Transparent coating systems for improving the environmental durability of transparency substrates |
| CN101929590A (en) * | 2009-06-22 | 2010-12-29 | 核工业西南物理研究院 | Solar control-low radiation type heat-insulation membrane system |
| CN204340319U (en) * | 2014-11-10 | 2015-05-20 | 邹申秀 | Fenestrated membrane Core Feature layer |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105172261A (en) * | 2015-09-06 | 2015-12-23 | 汕头万顺包装材料股份有限公司 | Optical radiation barrier film |
| CN108118307A (en) * | 2018-02-08 | 2018-06-05 | 广东中钛节能科技有限公司 | Flexible intelligent spectral selection thermal isolation film and preparation method thereof |
| CN110818280A (en) * | 2019-12-02 | 2020-02-21 | 惠州市万合玻璃科技有限公司 | Production process of multilayer coated glass |
| CN113719221A (en) * | 2021-08-17 | 2021-11-30 | 福建恒春织造股份有限公司 | Magic tape window membrane convenient to installation is dismantled and is accomodate |
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| CN104325760B (en) | 2017-02-15 |
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