CN104309195A - Window film core functional layer and method for manufacturing window film core functional layer - Google Patents
Window film core functional layer and method for manufacturing window film core functional layer Download PDFInfo
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- CN104309195A CN104309195A CN201410557944.9A CN201410557944A CN104309195A CN 104309195 A CN104309195 A CN 104309195A CN 201410557944 A CN201410557944 A CN 201410557944A CN 104309195 A CN104309195 A CN 104309195A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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Abstract
The invention discloses a window film core functional layer and a method for manufacturing the window film core functional layer. The window film core functional layer comprises a PET base thin film and a magnetron sputtering layer arranged on the PET base thin film, wherein the magnetron sputtering layer comprises a first transparent oxide layer, a first composite metal layer, a second transparent oxide layer, a second composite metal layer and a third transparent oxide layer which are sequentially arranged on the PET base thin film from bottom to top; and the method for manufacturing the window film core functional layer comprises the following step of sequentially carrying out magnetron sputtering film plating in five chambers of a five-chamber winding type magnetron sputtering film plating machine to form the magnetron sputtering layer. The window film core functional layer has the beneficial effects that the infrared light reflectivity is improved and the reflectivity of visible light is reduced, and the consumption of energy sources is saved; a metal layer is deposited and sealed at the upper part of an Ag layer so that the Ag layer is not contacted with oxygen and is not oxidized and the service life of the window film core functional layer is guaranteed; and the window film core functional layer can be manufactured in the five magnetron chambers in one step and the production efficiency is high.
Description
Technical field
The present invention relates to optical field, be specifically related to a kind of method of fenestrated membrane Core Feature layer and this fenestrated membrane Core Feature layer of making.
Background technology
In the U.S., magnetron sputtering technique has been widely used on the coating process of all kinds of substrate and material from the eighties in 20th century, and represents the technology of most significant end in coating process.But due to permanent blockade on new techniques, cause domestic market just to have correlation technique to introduce before and after 2000, before and after 2010, the rise of touch-screen industry allows domestic market be familiar with this technology gradually.Glass fenestrated membrane industry involved by this method be an important application of For Roll Coating Plant, but the fenestrated membrane product of this explained hereafter is also in the budding stage at home.
The production of current domestic fenestrated membrane is still based on dyeing film and aluminizer, and this low side fenestrated membrane does not have energy-saving effect completely and produces light pollution, is prohibitted the use by European & American Market.And in the field of magnetron sputtering fenestrated membrane, still based on imported product, developed country's product is in monopoly position.At home, even if having company's (being less than 5) of winding magnetic control sputtering coating machine, its technology and productivity also rest on the product of single plating (as Ag).The present invention all has detailed discussion from the design of material of nano-energy-saving film core layer to production equipment and working condition, and this technology can become the inevitable choice of high-end fenestrated membrane development.
Summary of the invention
The object of this invention is to provide a kind of reduce visible reflectance while improve the fenestrated membrane Core Feature layer of infrared light reflectance, also provide simultaneously make this Core Feature layer method to overcome prior art above shortcomings.
The object of the invention is to be achieved through the following technical solutions:
A kind of fenestrated membrane Core Feature layer, comprise the magnetron sputtering layer on PET base film and the described PET base film of deposition, described magnetron sputtering layer comprises the first transparent oxide layer be deposited on successively on described PET base film, the first complex metal layer, the second transparent oxide layer, the second complex metal layer and the 3rd transparent oxide layer from bottom to top.
By five chamber winding magnetic control sputterings, three layers of transparent oxide film and composite metal membrane are plated in successively the surface of clean PET base film, nanoscale fenestrated membrane Core Feature layer can be formed after optimal design is done to the condition deposited and thickness.Described fenestrated membrane Core Feature layer is through can by infrared light reflection while visible ray, described fenestrated membrane Core Feature layer is applied to fenestrated membrane, described fenestrated membrane is attached on glass, described fenestrated membrane Core Feature layer is by the infrared light reflection outside fenestrated membrane, prevent Infrared irradiation from entering in the chamber (as automobile bodies) of mounting glass, the temperature of chamber is caused to rise, often need to install an air-conditioner in chamber to carry out temperature adjustment to improve comfort level, and the operation of air-conditioning needs to consume mass energy, adopt the technical program can improve infrared light reflectance, reduce the infrared light entered in chamber, prevent the too fast rising of chamber indoor temperature, when described transparent oxide layer and described complex metal layer accomplish certain thickness (as being less than 300nm), passing through of visible ray can not be affected, while ensureing the temperature constant in chamber, not affect daylighting again.
Preferably, the material of described first transparent oxide layer, described second transparent oxide layer and described 3rd transparent oxide layer is the one in metal oxide, ITO or AZO.
Preferably, described first complex metal layer comprises an Ag layer from bottom to top and the first sealing metal level; Described second complex metal layer comprises the 2nd Ag layer from bottom to top and the second sealing metal level.
Metal A g is good to infrared light, adopts argent to ensure that described fenestrated membrane Core Feature layer is to the reflecting properties of infrared light as a part for complex metal layer, sealing metal level is also deposited on the top of described Ag layer, sealing metal level adopts the metal material that oxidation resistance is strong, oxidation resistance due to Ag is more weak very easily oxidized, once the AgO formed after Ag oxidation no longer possesses good infrared light reflection performance (AgO and Ag preferably can be described herein under same thickness condition separately to infrared light reflectance), the infrared reflectivity of described fenestrated membrane Core Feature layer certainly will be affected, the contact of Ag layer and oxygen is blocked at Ag layer overburden sealing metal level, if there is no the protection of sealing metal level, at the first complex metal layer, also the second transparent oxide layer will be carried out after second complex metal layer deposition, 3rd transparent oxide layer deposition, the mist of argon gas and oxygen can be passed in corresponding chambers when transparent oxide deposits, the oxygen passed into can generate the lower AgO of infrared reflectivity with Ag layer generation chemical reaction, affect described fenestrated membrane Core Feature layer to infrared light reflectance, in addition, also can contact to be oxidized with the oxygen in air in the fenestrated membrane use procedure that described employing described fenestrated membrane Core Feature layer is made into and affect fenestrated membrane to infrared light reflectance, reduce the heat-blocking action of fenestrated membrane, sealing metal level is adopted to ensure that described first complex metal layer and described second complex metal layer are to infrared light reflectance.
Further, the material of described first sealing metal level and described second sealing metal level is Ti or NiCr alloy, the thickness of a described Ag layer and described second silver layer is 10-15nm, and the thickness of described first sealing metal level and described second sealing metal level is 3-5nm.
The chemical property of Ti or NiCr alloy is stable many relative to Ag, especially the antioxygenic property under the former normal temperature and stable, in the Ag layer that the sealing metal level become through magnetron sputtering deposition with Ti or NiCr alloy is extremely low by non-oxidizability is wrapped in, ensure that the IR reflectivity under described fenestrated membrane Core Feature layer Long-Time Service, extend the service life of described fenestrated membrane Core Feature layer.
Preferably, the thickness of described PET base film is 20-200 μm, the thickness of described first transparent oxide layer is 30-40nm, and the thickness of described first complex metal layer is 13-20nm, the thickness of described second transparent oxide layer is 45-60nm, the thickness of described second complex metal layer is 13-20nm, the thickness of described 3rd transparent oxide layer is 30-40nm.
Make the method for the fenestrated membrane Core Feature layer described in technique scheme, comprise the steps:
S1, carry out magnetron sputtering at the first chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition first transparent oxide layer of PET base film;
S2, carry out magnetron sputtering at the second chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition first complex metal layer of the first transparent oxide layer;
S3, carry out magnetron sputtering at the 3rd chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition second transparent oxide layer of the first complex metal layer;
S4, carry out magnetron sputtering at the 4th chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition second complex metal layer of the second transparent oxide layer;
S5, carry out magnetron sputtering at the 5th chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition the 3rd transparent oxide layer of the second complex metal layer.
Preferably, five chamber winding magnetic control sputtering coating machines should be equipped with high-end accurate traction and tension system, the strict tensile force controlled to PET film in coating process, prevent PET base film wrinkling uneven with plated film.
Further, step S1, step S3 and step S5 include: in the corresponding chambers of described five chamber winding magnetic control sputtering coating machines, passing into volume ratio is the argon gas of 40:1-60:1 and the mist of oxygen, setting vacuum 10-6Torr, and plated film stablizes air pressure 0.5-1Pa; Target selects transparent oxide film, and the material that wherein transparent oxide film is is the one in ITO, AZO or metal oxide; Transparent oxide film uniform deposition in first chamber, the 3rd chamber and the 5th chamber forms the first transparent oxide layer, the 3rd transparent oxide layer and the 5th transparent oxide layer respectively, makes the deposit thickness of the first transparent oxide layer, the 3rd transparent oxide layer and the 5th transparent oxide layer be respectively 30-40nm, 45-60nm and 30-40nm by controlling power.
Wherein, ITO is tin-doped indium oxide electro-conductive glass, and AZO is the ZnO transparent conductive glass of aluminium doping.
Further, step S2 and step S4 includes: in the corresponding chambers of described five chamber winding magnetic control sputtering coating machines, pass into purity be not less than 99.99% argon gas, put into one and rotate Ag target and a Ti flat target, setting vacuum 10-6Torr, plated film stablizes air pressure 0.5-1Pa; Through magnetron sputtering, rotation Ag target and Ti flat target are deposited as Ag layer and Ti layer respectively successively, by controlling power, to make the thickness of Ag layer be the thickness of 10-15nmTi layer be that 3-5nm, Ag layer and Ti layer are deposited on the second chamber respectively and the 4th chamber forms the first complex metal layer and the second complex metal layer.
Preferably, keep the temperature remained constant of the first chamber, the second chamber, the 3rd chamber, the 4th chamber and the 5th chamber in magnetron sputtering process, and temperature range is 25 DEG C-50 DEG C.Prevent the too high heat produced in magnetron sputtering that causes of temperature from causing PET film to be out of shape.
In the technical program, magnetron sputtering layer is five layers, can complete by a plated film in five magnetic control chambers.Target discharge order in five chambers, be followed successively by transparent oxide film/silver+sealing metal/transparent oxide film /+sealing sealing metal/transparent oxide film, its thickness controls respectively at 30-40nm, 13-20nm, 45-60nm, 13-20nm and 30-40nm, and the combination different according to each layer film thickness within the scope of this, different colours can be prepared, the fenestrated membrane Core Feature layer of Different Red external reflectance ability.
Beneficial effect of the present invention is:
Improve while infrared reflectivity and reduce visible light reflectance, do not affect daylighting again while temperature constant in the chamber ensureing to employ this fenestrated membrane Core Feature layer, reduce the air-conditioning use amount in chamber, economize energy consumption; Ag in the first complex metal layer and the second complex metal layer is arranged the sealing metal level that antioxygenic property is strong, prevent the oxidation of Ag layer, the contact of Ag layer and oxygen is blocked at Ag layer overburden sealing metal level, ensure that described first complex metal layer and described second complex metal layer are to infrared light reflectance, ensure the service life of described fenestrated membrane Core Feature layer; Described making described fenestrated membrane Core Feature layer once completes in five magnetic control chambers, and production efficiency is high; Through hole controls power to be undertaken regulating to prepare different colours by the thickness of each layer in magnetron sputtering layer, and the fenestrated membrane Core Feature layer of Different Red external reflectance ability, meets diversified needs, enrich product line, improves the market competitiveness.
Accompanying drawing explanation
Fig. 1 is the profile of fenestrated membrane Core Feature layer of the present invention.
In figure, 1, PET base film; 2, magnetron sputtering layer; 21, the first transparent oxide layer; 22, the first complex metal layer; 221, an Ag layer; 222, the first sealing metal level; 23, the second transparent oxide layer; 24, the second complex metal layer; 241, the 2nd Ag layer; 242, the second sealing metal level; 25, the 3rd transparent oxide layer.
Detailed description of the invention
Embodiment one
As shown in Figure 1, a kind of fenestrated membrane Core Feature layer, comprise PET base film 1 and be located at the magnetron sputtering layer 2 on described PET base film 1, described magnetron sputtering layer 2 comprise be deposited on successively from bottom to top described on the first transparent oxide layer 21, first complex metal layer 22, second transparent oxide layer 23, second complex metal layer 24 and the 3rd transparent oxide layer 25.The material of described first transparent oxide layer 21, described second transparent oxide layer 23 and described 3rd transparent oxide layer 25 is the one in metal oxide, ITO or AZO.
Further, described first complex metal layer 22 comprises Ag layer 221 and a first sealing metal level 222 from bottom to top; Described second complex metal layer 24 comprises the 2nd Ag layer 241 and the second sealing metal level 242 from bottom to top.The material of described first sealing metal level 222 and described second sealing metal level 242 is Ti or NiCr alloy, the thickness of a described Ag layer 221 and described second silver layer 241 is 10-15nm, and the thickness of described first sealing metal level 222 and described second sealing metal level 242 is 3-5nm.The thickness of described PET base film 1 is 100 μm, the thickness of described first transparent oxide layer 21 is 30nm, and the thickness of described first complex metal layer 22 is 13nm, the thickness of described second transparent oxide layer 23 is 45nm, the thickness of described second complex metal layer 24 is 13nm, the thickness of described 3rd transparent oxide layer 25 is 30nm.
Make the method for the fenestrated membrane Core Feature layer described in technique scheme, comprise the steps: area to be 30cm × 30cm, thickness is carry out following steps after the cleaning of 50 μm:
S1, carry out magnetron sputtering at the first chamber of five chamber winding magnetic control sputtering coating machines, surface deposition first transparent oxide layer 21, controlling power is that 20kW is to ensure that the deposit thickness of described first transparent oxide layer 21 is for 30nm;
S2, carry out magnetron sputtering at the second chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition first complex metal layer 22 of the first transparent oxide layer 21, controlling power is that 5kW is to ensure that the deposit thickness of described first complex metal layer 22 is for 13nm, the thickness of a wherein said Ag layer 221 is 10nm, and the thickness of described first sealing metal level 222 is 3nm;
S3, carry out magnetron sputtering at the 3rd chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition second transparent oxide layer 23 of the first complex metal layer 22, controlling power is that 20kW is to ensure that the deposit thickness of described second transparent oxide layer 23 is for 45nm;
S4, carry out magnetron sputtering at the 4th chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition second complex metal layer 24 of the second transparent oxide layer 23, controlling power is that 5kW is to ensure that the deposit thickness of described second complex metal layer 24 is for 13nm, the thickness of wherein said 2nd Ag layer 241 is 10nm, and the thickness of described second sealing metal level 242 is 3nm;
S5, carry out magnetron sputtering at the 5th chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition the 3rd transparent oxide layer 25 of the second complex metal layer 24, controlling power is that 20kW is to ensure that the deposit thickness of described 3rd transparent oxide layer 25 is for 30nm.
It should be noted that, five chamber winding magnetic control sputtering coating machines should be equipped with high-end accurate traction and tension system, the strict tensile force controlled to PET film in coating process, prevent from causing PET film wrinkling uneven with plated film.
Wherein, step S1, step S3 and step S5 include: in the corresponding chambers of described five chamber winding magnetic control sputtering coating machines, passing into volume ratio is the argon gas of 40:1-60:1 and the mist of oxygen, setting vacuum 10-6Torr, and plated film stablizes air pressure 0.5-1Pa; Target selects transparent oxide film, and the material that wherein transparent oxide film is is the one in ITO, AZO or metal oxide; Transparent oxide film uniform deposition in first chamber, the 3rd chamber and the 5th chamber forms the first transparent oxide layer 21, the 3rd transparent oxide layer 25 and the 5th transparent oxide layer respectively, by control power make the deposit thickness of the first transparent oxide layer 21, the 3rd transparent oxide layer 25 and the 5th transparent oxide layer be respectively 30-40nm, 45-60nm and; 30-40nm.
Step S2 and step S4 includes: in the corresponding chambers of described five chamber winding magnetic control sputtering coating machines, pass into purity be not less than 99.99% argon gas, put into one and rotate Ag target and a Ti flat target, setting vacuum 10-6Torr, plated film stablizes air pressure 0.5-1Pa; Through magnetron sputtering, rotation Ag target and Ti flat target are deposited as Ag layer respectively successively, described Ag layer comprises Ag layer 221 and second silver layer 241, the thickness of two-layer Ag layer is made to be 10-15nm by controlling power, the thickness of Ti layer is that 3-5nm, Ag layer and Ti layer are deposited on the second chamber respectively and the 4th chamber forms the first complex metal layer 22 and the second complex metal layer 24.
It should be noted that in magnetron sputtering process the temperature remained constant kept in five chambers, and temperature range is 25 DEG C-50 DEG C.
The present embodiment is less than 10% to visible light reflectance, is more than 60% to the reflectivity of infrared light (1000nm wave band).
Comparative example one
The present embodiment is relative to the difference of embodiment one: magnetron sputtering layer 2 only comprises the first transparent oxide layer 21, first complex metal layer 22, second transparent oxide layer 23, the present embodiment is 14% be greater than 10% in embodiment one to visible light reflectance, to infrared light reflectance be less than 50% (1000nm wave band) be less than embodiment a kind of 60%.
Embodiment two
The power controlling the first chamber is 30kW, and the deposit thickness making described first transparent oxide layer 21 is 40nm.
The power controlling the second chamber is 15kW, the deposit thickness making described first complex metal layer 22 is 20nm, the deposit thickness of a wherein said Ag layer 221 and Ag layer 241 is 15nm, and the deposit thickness of described first sealing metal level 222 and described second sealing metal level 242 is 5nm.
The power controlling the 3rd chamber is 30kW, and the deposit thickness making described second transparent oxide layer 23 is 60nm.
The power controlling the 4th chamber is 5kW, and the deposit thickness making described second complex metal layer 24 is 20nm, and the deposit thickness of wherein said Ag layer 221 is 15nm, and the deposit thickness of described sealing metal level 222 is 5nm.
The power controlling the 5th chamber is 30kW, and the deposit thickness making described 3rd transparent oxide layer 25 is 40nm.
The present embodiment is less than 10% to visible light reflectance, is more than 70% to the reflectivity of infrared light (1000nm wave band).
Embodiment three
The power controlling the first chamber is 25kW, and the deposit thickness making described first transparent oxide layer 21 is 35nm.
The power controlling the second chamber is 10kW, the deposit thickness making described first complex metal layer 22 is 16.5nm, the deposit thickness of a wherein said Ag layer 221 and Ag layer 241 is 12.5nm, and the deposit thickness of described first sealing metal level 222 and described second sealing metal level 242 is 4nm.
The power controlling the 3rd chamber is 25kW, and the deposit thickness making described second transparent oxide layer 23 is 52.5nm.
The power controlling the 4th chamber is 10kW, and the deposit thickness making described second complex metal layer 24 is 16.5nm, and the deposit thickness of wherein said Ag layer 221 is 12.5nm, and the deposit thickness of described sealing metal level 222 is 4nm.
The power controlling the 5th chamber is 25kW, and the deposit thickness making described 3rd transparent oxide layer 25 is 35nm.
The present embodiment is less than 10% to visible light reflectance, is more than 65% to the reflectivity of infrared light (1000nm wave band).
The present invention is not limited to above-mentioned preferred forms; anyone can draw other various forms of products under enlightenment of the present invention; no matter but any change is done in its shape or structure; every have identical with the application or akin technical scheme, all drops within protection scope of the present invention.
Claims (10)
1. a fenestrated membrane Core Feature layer, it is characterized in that: comprise PET base film and be deposited on the magnetron sputtering layer on described PET base film, described magnetron sputtering layer comprises the first transparent oxide layer be deposited on successively on described PET base film, the first complex metal layer, the second transparent oxide layer, the second complex metal layer and the 3rd transparent oxide layer from bottom to top.
2. fenestrated membrane Core Feature layer according to claim 1, is characterized in that: the material of described first transparent oxide layer, described second transparent oxide layer and described 3rd transparent oxide layer is the one in metal oxide, ITO or AZO.
3. fenestrated membrane Core Feature layer according to claim 1, is characterized in that: described first complex metal layer comprises an Ag layer from bottom to top and the first sealing metal level; Described second complex metal layer comprises the 2nd Ag layer from bottom to top and the second sealing metal level.
4. fenestrated membrane Core Feature layer according to claim 3, it is characterized in that: the material of described first sealing metal level and described second sealing metal level is Ti or NiCr alloy, the thickness of a described Ag layer and described second silver layer is 10-15nm, and the thickness of described first sealing metal level and described second sealing metal level is 3-5nm.
5. the fenestrated membrane Core Feature layer according to any one of claim 1-4, it is characterized in that: the thickness of described PET base film is 20-200 μm, the thickness of described first transparent oxide layer is 30-40nm, and the thickness of described first complex metal layer is 13-20nm, the thickness of described second transparent oxide layer is 45-60nm, the thickness of described second complex metal layer is 13-20nm, the thickness of described 3rd transparent oxide layer is 30-40nm.
6. make the method for fenestrated membrane Core Feature layer according to claim 1, it is characterized in that: comprise the steps:
S1, carry out magnetron sputtering at the first chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition first transparent oxide layer of PET base film;
S2, carry out magnetron sputtering at the second chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition first complex metal layer of the first transparent oxide layer;
S3, carry out magnetron sputtering at the 3rd chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition second transparent oxide layer of the first complex metal layer;
S4, carry out magnetron sputtering at the 4th chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition second complex metal layer of the second transparent oxide layer;
S5, carry out magnetron sputtering at the 5th chamber of five chamber winding magnetic control sputtering coating machines, at surface deposition the 3rd transparent oxide layer of the second complex metal layer.
7. the method for making fenestrated membrane Core Feature layer according to claim 6, is characterized in that: five chamber winding magnetic control sputtering coating machines comprise traction and tension system, in case major structure becomes, PET film is wrinkling and plated film uneven.
8. the method for making fenestrated membrane Core Feature layer according to claim 6, it is characterized in that: step S1, step S3 and step S5 include: in the corresponding chambers of described five chamber winding magnetic control sputtering coating machines, passing into volume ratio is the argon gas of 40:1-60:1 and the mist of oxygen, setting vacuum 10-6Torr, plated film stablizes air pressure 0.5-1Pa; Target selects transparent oxide film, and wherein the material of transparent oxide film is the one in ITO, AZO or metal oxide;
Transparent oxide film uniform deposition in first chamber, the 3rd chamber and the 5th chamber forms the first transparent oxide layer, the 3rd transparent oxide layer and the 5th transparent oxide layer respectively, makes the deposit thickness of the first transparent oxide layer, the 3rd transparent oxide layer and the 5th transparent oxide layer be respectively 30-40nm, 45-60nm and 30-40nm by controlling power.
9. the method for the making fenestrated membrane Core Feature layer according to any one of claim 6, it is characterized in that: step S2 and step S4 includes: in the corresponding chambers of described five chamber winding magnetic control sputtering coating machines, pass into purity be not less than 99.99% argon gas, put into one and rotate Ag target and a Ti flat target, setting vacuum 10-6Torr, plated film stablizes air pressure 0.5-1Pa; Through magnetron sputtering, rotation Ag target and Ti flat target are deposited as Ag layer and Ti layer respectively successively, the thickness of Ag layer is made to be 10-15nm by controlling power, the thickness of Ti layer is that 3-5nm, Ag layer and Ti layer are deposited on the second chamber respectively and the 4th chamber forms the first complex metal layer and the second complex metal layer.
10. the method for the making fenestrated membrane Core Feature layer according to any one of claim 6-9, it is characterized in that: the temperature remained constant keeping the first chamber, the second chamber, the 3rd chamber, the 4th chamber and the 5th chamber in magnetron sputtering process, and temperature range is 25 DEG C-50 DEG C.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410557944.9A CN104309195A (en) | 2014-10-20 | 2014-10-20 | Window film core functional layer and method for manufacturing window film core functional layer |
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| CN201410557944.9A CN104309195A (en) | 2014-10-20 | 2014-10-20 | Window film core functional layer and method for manufacturing window film core functional layer |
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| CN104309195A true CN104309195A (en) | 2015-01-28 |
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| CN (1) | CN104309195A (en) |
Cited By (3)
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| CN105670528A (en) * | 2015-12-31 | 2016-06-15 | 合肥乐凯科技产业有限公司 | Building window film |
| CN108118307A (en) * | 2018-02-08 | 2018-06-05 | 广东中钛节能科技有限公司 | Flexible intelligent spectral selection thermal isolation film and preparation method thereof |
| CN112552833A (en) * | 2020-07-24 | 2021-03-26 | 九江力达科技有限公司 | Safe heat-insulation roof car cover film and preparation method thereof |
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