CN104241439A - 一种碲化镉薄膜太阳能电池的制备方法 - Google Patents
一种碲化镉薄膜太阳能电池的制备方法 Download PDFInfo
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- CN104241439A CN104241439A CN201310351320.7A CN201310351320A CN104241439A CN 104241439 A CN104241439 A CN 104241439A CN 201310351320 A CN201310351320 A CN 201310351320A CN 104241439 A CN104241439 A CN 104241439A
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- layer
- cdte
- rich
- deposition
- cadmium telluride
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- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 title claims abstract description 223
- 238000000034 method Methods 0.000 title abstract description 76
- 239000010409 thin film Substances 0.000 title abstract description 65
- 230000008859 change Effects 0.000 claims abstract description 24
- 229910004613 CdTe Inorganic materials 0.000 claims abstract description 7
- 238000002360 preparation method Methods 0.000 claims description 55
- 230000008021 deposition Effects 0.000 claims description 54
- 239000002659 electrodeposit Substances 0.000 claims description 29
- 239000007788 liquid Substances 0.000 claims description 29
- 239000011265 semifinished product Substances 0.000 claims description 26
- 238000010438 heat treatment Methods 0.000 claims description 25
- 229910052714 tellurium Inorganic materials 0.000 claims description 19
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 16
- 150000001661 cadmium Chemical class 0.000 claims description 14
- 239000000243 solution Substances 0.000 claims description 14
- 238000000137 annealing Methods 0.000 claims description 7
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 claims description 7
- 229910052724 xenon Inorganic materials 0.000 claims description 7
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 7
- 239000012670 alkaline solution Substances 0.000 claims description 4
- LHQLJMJLROMYRN-UHFFFAOYSA-L cadmium acetate Chemical compound [Cd+2].CC([O-])=O.CC([O-])=O LHQLJMJLROMYRN-UHFFFAOYSA-L 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 2
- XIEPJMXMMWZAAV-UHFFFAOYSA-N cadmium nitrate Inorganic materials [Cd+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XIEPJMXMMWZAAV-UHFFFAOYSA-N 0.000 claims description 2
- QCUOBSQYDGUHHT-UHFFFAOYSA-L cadmium sulfate Chemical compound [Cd+2].[O-]S([O-])(=O)=O QCUOBSQYDGUHHT-UHFFFAOYSA-L 0.000 claims description 2
- 229910000331 cadmium sulfate Inorganic materials 0.000 claims description 2
- NMHMNPHRMNGLLB-UHFFFAOYSA-N phloretic acid Chemical compound OC(=O)CCC1=CC=C(O)C=C1 NMHMNPHRMNGLLB-UHFFFAOYSA-N 0.000 claims description 2
- 239000002243 precursor Substances 0.000 claims description 2
- SITVSCPRJNYAGV-UHFFFAOYSA-L tellurite Chemical compound [O-][Te]([O-])=O SITVSCPRJNYAGV-UHFFFAOYSA-L 0.000 claims description 2
- LAJZODKXOMJMPK-UHFFFAOYSA-N tellurium dioxide Chemical group O=[Te]=O LAJZODKXOMJMPK-UHFFFAOYSA-N 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 18
- 230000005284 excitation Effects 0.000 abstract description 13
- 230000006872 improvement Effects 0.000 abstract description 2
- 238000007669 thermal treatment Methods 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 53
- 238000004070 electrodeposition Methods 0.000 description 33
- 210000001142 back Anatomy 0.000 description 30
- 238000004062 sedimentation Methods 0.000 description 25
- 239000011521 glass Substances 0.000 description 21
- 230000005540 biological transmission Effects 0.000 description 20
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 239000004065 semiconductor Substances 0.000 description 15
- 238000002389 environmental scanning electron microscopy Methods 0.000 description 14
- 239000012528 membrane Substances 0.000 description 14
- 238000004544 sputter deposition Methods 0.000 description 14
- 238000005229 chemical vapour deposition Methods 0.000 description 13
- 238000000224 chemical solution deposition Methods 0.000 description 11
- 238000004140 cleaning Methods 0.000 description 10
- 230000007613 environmental effect Effects 0.000 description 10
- 238000002202 sandwich sublimation Methods 0.000 description 10
- 238000007650 screen-printing Methods 0.000 description 10
- 238000010183 spectrum analysis Methods 0.000 description 10
- 238000009718 spray deposition Methods 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- 238000001291 vacuum drying Methods 0.000 description 10
- 230000008569 process Effects 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- PDWBGRKARJFJGI-UHFFFAOYSA-N 2-phenylcyclohexa-2,4-dien-1-one Chemical compound O=C1CC=CC=C1C1=CC=CC=C1 PDWBGRKARJFJGI-UHFFFAOYSA-N 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 5
- 235000011114 ammonium hydroxide Nutrition 0.000 description 5
- 238000005137 deposition process Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 229910021607 Silver chloride Inorganic materials 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000003486 chemical etching Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 3
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005685 electric field effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 238000003969 polarography Methods 0.000 description 1
- BFPJYWDBBLZXOM-UHFFFAOYSA-L potassium tellurite Chemical group [K+].[K+].[O-][Te]([O-])=O BFPJYWDBBLZXOM-UHFFFAOYSA-L 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1828—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1864—Annealing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/543—Solar cells from Group II-VI materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201310351320.7A CN104241439B (zh) | 2013-06-09 | 2013-08-13 | 一种碲化镉薄膜太阳能电池的制备方法 |
Applications Claiming Priority (4)
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CN201310231496 | 2013-06-09 | ||
CN201310231496.9 | 2013-06-09 | ||
CN2013102314969 | 2013-06-09 | ||
CN201310351320.7A CN104241439B (zh) | 2013-06-09 | 2013-08-13 | 一种碲化镉薄膜太阳能电池的制备方法 |
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Publication Number | Publication Date |
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CN104241439A true CN104241439A (zh) | 2014-12-24 |
CN104241439B CN104241439B (zh) | 2017-06-13 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104638052A (zh) * | 2013-11-06 | 2015-05-20 | 恒基伟业知识产权管理顾问(北京)有限公司 | 制备碲化镉薄膜太阳能电池碲化镉吸收层的电化学沉积方法 |
CN104851931A (zh) * | 2015-04-14 | 2015-08-19 | 湖南共创光伏科技有限公司 | 具有梯度结构的碲化镉薄膜太阳能电池及其制造方法 |
CN104965015A (zh) * | 2015-06-18 | 2015-10-07 | 河海大学 | 一种碲化镉电极的制备方法及应用 |
CN105405900A (zh) * | 2015-10-29 | 2016-03-16 | 北京大学深圳研究院 | 一种碲化镉太阳能电池及其制备方法 |
CN106449810A (zh) * | 2016-11-25 | 2017-02-22 | 中国科学院电工研究所 | 一种CdTe/CIGS梯度吸收层薄膜太阳能电池及其制备方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0280594A (ja) * | 1988-09-14 | 1990-03-20 | Fujitsu Ltd | アモルファス水素化シリコン膜の形成方法 |
US20050098204A1 (en) * | 2003-05-21 | 2005-05-12 | Nanosolar, Inc. | Photovoltaic devices fabricated from nanostructured template |
CN102097537A (zh) * | 2009-12-11 | 2011-06-15 | 通用电气公司 | 制作薄膜太阳能电池的过程 |
CN102392282A (zh) * | 2011-11-26 | 2012-03-28 | 济南大学 | 一种在水相碱性条件下电化学制备碲化镉半导体薄膜的方法 |
CN102544189A (zh) * | 2010-12-14 | 2012-07-04 | 无锡尚德太阳能电力有限公司 | 一种薄膜太阳电池及其制备方法 |
CN102779864A (zh) * | 2012-07-19 | 2012-11-14 | 中山大学 | 一种碲化镉薄膜电池及其制备方法 |
-
2013
- 2013-08-13 CN CN201310351320.7A patent/CN104241439B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0280594A (ja) * | 1988-09-14 | 1990-03-20 | Fujitsu Ltd | アモルファス水素化シリコン膜の形成方法 |
US20050098204A1 (en) * | 2003-05-21 | 2005-05-12 | Nanosolar, Inc. | Photovoltaic devices fabricated from nanostructured template |
CN102097537A (zh) * | 2009-12-11 | 2011-06-15 | 通用电气公司 | 制作薄膜太阳能电池的过程 |
CN102544189A (zh) * | 2010-12-14 | 2012-07-04 | 无锡尚德太阳能电力有限公司 | 一种薄膜太阳电池及其制备方法 |
CN102392282A (zh) * | 2011-11-26 | 2012-03-28 | 济南大学 | 一种在水相碱性条件下电化学制备碲化镉半导体薄膜的方法 |
CN102779864A (zh) * | 2012-07-19 | 2012-11-14 | 中山大学 | 一种碲化镉薄膜电池及其制备方法 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104638052A (zh) * | 2013-11-06 | 2015-05-20 | 恒基伟业知识产权管理顾问(北京)有限公司 | 制备碲化镉薄膜太阳能电池碲化镉吸收层的电化学沉积方法 |
CN104638052B (zh) * | 2013-11-06 | 2017-01-04 | 恒基伟业知识产权管理顾问(北京)有限公司 | 制备碲化镉薄膜太阳能电池碲化镉吸收层的电化学沉积方法 |
CN104851931A (zh) * | 2015-04-14 | 2015-08-19 | 湖南共创光伏科技有限公司 | 具有梯度结构的碲化镉薄膜太阳能电池及其制造方法 |
CN104965015A (zh) * | 2015-06-18 | 2015-10-07 | 河海大学 | 一种碲化镉电极的制备方法及应用 |
CN105405900A (zh) * | 2015-10-29 | 2016-03-16 | 北京大学深圳研究院 | 一种碲化镉太阳能电池及其制备方法 |
CN106449810A (zh) * | 2016-11-25 | 2017-02-22 | 中国科学院电工研究所 | 一种CdTe/CIGS梯度吸收层薄膜太阳能电池及其制备方法 |
CN106449810B (zh) * | 2016-11-25 | 2017-11-14 | 中国科学院电工研究所 | 一种CdTe/CIGS梯度吸收层薄膜太阳能电池及其制备方法 |
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