CN104081491A - 带电粒子线装置用隔音罩以及带电粒子线装置 - Google Patents

带电粒子线装置用隔音罩以及带电粒子线装置 Download PDF

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Publication number
CN104081491A
CN104081491A CN201380007222.XA CN201380007222A CN104081491A CN 104081491 A CN104081491 A CN 104081491A CN 201380007222 A CN201380007222 A CN 201380007222A CN 104081491 A CN104081491 A CN 104081491A
Authority
CN
China
Prior art keywords
mentioned
blimp
charged particle
cylindrical body
line apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201380007222.XA
Other languages
English (en)
Chinese (zh)
Inventor
武藤大辅
菊池秀树
上田浩大
长冲功
高野靖
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Publication of CN104081491A publication Critical patent/CN104081491A/zh
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • G—PHYSICS
    • G10—MUSICAL INSTRUMENTS; ACOUSTICS
    • G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
    • G10K11/00—Methods or devices for transmitting, conducting or directing sound in general; Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
    • G10K11/16—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
    • G—PHYSICS
    • G10—MUSICAL INSTRUMENTS; ACOUSTICS
    • G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
    • G10K11/00—Methods or devices for transmitting, conducting or directing sound in general; Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
    • G10K11/16—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
    • G10K11/172—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general using resonance effects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0216—Means for avoiding or correcting vibration effects

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Acoustics & Sound (AREA)
  • Multimedia (AREA)
  • Soundproofing, Sound Blocking, And Sound Damping (AREA)
CN201380007222.XA 2012-03-13 2013-02-18 带电粒子线装置用隔音罩以及带电粒子线装置 Pending CN104081491A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012-055233 2012-03-13
JP2012055233A JP5838106B2 (ja) 2012-03-13 2012-03-13 荷電粒子線装置用防音カバー及び荷電粒子線装置
PCT/JP2013/053788 WO2013136909A1 (ja) 2012-03-13 2013-02-18 荷電粒子線装置用防音カバー及び荷電粒子線装置

Publications (1)

Publication Number Publication Date
CN104081491A true CN104081491A (zh) 2014-10-01

Family

ID=49160828

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380007222.XA Pending CN104081491A (zh) 2012-03-13 2013-02-18 带电粒子线装置用隔音罩以及带电粒子线装置

Country Status (5)

Country Link
US (1) US20150041676A1 (https=)
JP (1) JP5838106B2 (https=)
CN (1) CN104081491A (https=)
DE (1) DE112013000944T8 (https=)
WO (1) WO2013136909A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115901831A (zh) * 2014-12-22 2023-04-04 应用材料公司 用于检查基板的设备、用于检查基板的方法、大面积基板检查设备及其操作方法
JP2017050046A (ja) 2015-08-31 2017-03-09 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US11687008B2 (en) * 2018-02-22 2023-06-27 Applied Materials, Inc. Method for automated critical dimension measurement on a substrate for display manufacturing, method of inspecting a large area substrate for display manufacturing, apparatus for inspecting a large area substrate for display manufacturing and method of operating thereof
US20250054723A1 (en) * 2023-08-10 2025-02-13 Fei Company Thermal conditioning enclosure for a charged particle instrument

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090195760A1 (en) * 2008-01-31 2009-08-06 Asml Netherlands B.V. Lithographic Apparatus, Method and Device Manufacturing Method
JP2009220652A (ja) * 2008-03-14 2009-10-01 Tokai Rubber Ind Ltd 防音カバー
WO2011158458A1 (ja) * 2010-06-16 2011-12-22 株式会社 日立ハイテクノロジーズ 荷電粒子線装置および防音カバー

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0769706B2 (ja) * 1993-01-21 1995-07-31 株式会社東和製作所 吸音ゴム板
JP2006079870A (ja) * 2004-09-08 2006-03-23 Hitachi High-Technologies Corp 荷電粒子線装置
JP2008009014A (ja) * 2006-06-28 2008-01-17 Kobe Steel Ltd 多孔質防音構造体
JP5308006B2 (ja) * 2006-11-02 2013-10-09 株式会社神戸製鋼所 吸音構造体
JP5537386B2 (ja) * 2010-11-09 2014-07-02 株式会社日立ハイテクノロジーズ 荷電粒子線装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090195760A1 (en) * 2008-01-31 2009-08-06 Asml Netherlands B.V. Lithographic Apparatus, Method and Device Manufacturing Method
JP2009220652A (ja) * 2008-03-14 2009-10-01 Tokai Rubber Ind Ltd 防音カバー
WO2011158458A1 (ja) * 2010-06-16 2011-12-22 株式会社 日立ハイテクノロジーズ 荷電粒子線装置および防音カバー

Also Published As

Publication number Publication date
JP5838106B2 (ja) 2015-12-24
DE112013000944T5 (de) 2014-12-11
US20150041676A1 (en) 2015-02-12
DE112013000944T8 (de) 2014-12-24
WO2013136909A1 (ja) 2013-09-19
JP2013191333A (ja) 2013-09-26

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PB01 Publication
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SE01 Entry into force of request for substantive examination
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WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20141001