CN104018129B - A kind of vacuum coating production line cathode assembly - Google Patents
A kind of vacuum coating production line cathode assembly Download PDFInfo
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- CN104018129B CN104018129B CN201310688492.3A CN201310688492A CN104018129B CN 104018129 B CN104018129 B CN 104018129B CN 201310688492 A CN201310688492 A CN 201310688492A CN 104018129 B CN104018129 B CN 104018129B
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Abstract
The invention discloses a kind of vacuum coating production line cathode assembly, comprise cathode assembly and translation assembly, described cathode assembly is fixedly connected with translation assembly and with the motion translation of described translation assembly, the negative electrode in wherein said cathode assembly is planar magnetic control sputtering cathode.Compared with prior art, the advantage that the low-cost and easy-to that cathode assembly provided by the invention not only can maintain planar cathode is safeguarded, also target and bombardment track this advantage variable of rotating cathode is achieved, and the optional feature structure realizing translation is simple, can not vacuum leakproofness be affected, equally also can not become the uncertain factor in production line; Therefore, this cathode assembly has great economic worth, and environmental friendliness, decrease the waste of target, so its application prospect is very wide.
Description
Technical field
The present invention relates to vacuum coating production line technical field, specifically, relate to a kind of vacuum coating production line cathode assembly.
Background technology
Vacuum plating is a kind of technology preparing rete generation thin-film material in a vacuum, specifically the atom of vacuum indoor material emanate out from heating source get to plated object surface, comprise simple substance or the compound film such as metal, semi-conductor, isolator that are coated with crystalline state.Although chemical vapor deposition also adopts the vacuum means such as decompression, low pressure or plasma body, general vacuum plating refers to the method deposit film with physics.Vacuum plating has three kinds of forms, i.e. evaporation coating, sputter coating and ion plating.
Sputter coating is topmost method in vacuum plating, and this technology utilizes lotus energy particle bombardment target surface in a vacuum, makes by the particle deposition that pounds on substrate.In magnetron sputtering membrane process, very high to the specification of quality of magnetic-controlled sputtering coating equipment, and in magnetic-controlled sputtering coating equipment, magnetic control sputtering cathode is particularly important.Generally adopt planar magnetic control sputtering cathode (rear abbreviation " planar cathode ") or rotary magnetron sputtering negative electrode (rear abbreviation " rotating cathode ") at present.Planar cathode because of its bombardment track and target are all shortcomings that this structure of being fixedly installed designs, target material deposition utilization ratio very low (being less than 20%); Especially in use for some time, target material surface can form " runway shape " and sputter pit, not only can destroy the homogeneity of coatings, has a strong impact on stability and the homogeneity of later stage plated film; And need often to change target, bring inconvenience greatly to continuous seepage and cause the resource that target can not make full use of.The rotating cathode then researched and developed compares above-mentioned planar cathode, improves target utilization, effectively reduces to beat arc and target surface and fall slag, and technology stability is better, can eliminate the multiple advantages such as the sedimentary province again that planar cathode more easily formed; Because technology is immature, there will be and leak, leak gas and the phenomenon of negative electrode short circuit, have a strong impact on the quality of plated film and the work-ing life of equipment.Especially: 1, the structure of rotating cathode is more complicated, and optional feature is many, and need drive system to coordinate, the investment of equipment will apparently higher than planar cathode; 2, due to moving-member, in production, vacuum-sealing there will be leakage, although adopt replacing sealing that is the simplest, minimum degree, comparing planar cathode still needs higher maintenance cost; 3, rotating cathode adds the labile factor in production line, brings certain impact to the stability of production line.
The planar cathode be most widely used at present is rectangular plane magnetic control negative electrode, is the predominate architecture of magnetron sputtering plane class target.Its advantage is that the restriction that the material of target is subject to is few, generally can adopt direct-cooled structure to sheet metal, can adopt an air-cooled structure to other precious metal, unmanageable metal and hard brittle material (as silicon, graphite, ITO sinter target etc.).The sputtering area of this negative electrode is large, and integral manufacturing and maintenance cost are all lower.But the maximum inferior position of rectangle plane target is the low target utilization because the unique physical process of magnetron sputtering causes.The typical etch shape of its target surface is as depicted in figs. 1 and 2, wider above, below width shrink continuously, to last become a dark and thin groove.But the utilization ratio promoting planar cathode becomes of paramount importance research contents in planar cathode application and research and development.The splitter adopting and add high magnetic permeability in magnetic structure is had in existing planar cathode product, the Distribution of Magnetic Field of negative electrode is changed with this, improve the homogeneity of the parallel induction distribution of target material surface, namely improve the width of target etching, therefore improve the utilization ratio of target to a certain extent.But this cathode assembly is subject to the impact of dimensional precision own and high-intensity magnetic field magnetism, and especially when mounted, assembly precision is difficult to the requirement meeting design accuracy.Chinese patent CN201778106U discloses the rectangular plane magnetic control cathode structure in a kind of vacuum coating film equipment, and this cathode construction to some extent solves the problems referred to above, but its target utilization still can not reach qualitative leap.Chinese patent CN201770767U discloses a kind of cathode assembly of vacuum plating, and the technical problem that this patent mainly solves is a simplified the operation changing target, has saved the time changed needed for target, does not solve the low technical problem of target utilization.Chinese patent CN201981253U discloses a kind of rectangle plane magnetron sputtering cathode, for the shortcoming of sputter cathode being provided with anode frame, eliminates anode frame, simplifies the structure; In addition improve shielding case structure, avoid this problem of Shielding Case grounding; The improvement of this planar cathode is also for improving the utilization ratio of target.
Therefore, how to make full use of planar cathode advantage in field of vacuum coating, especially its low cost, easy care, improve the stability homogeneity of target utilization and plated film, be still a technical barrier urgently to be resolved hurrily.
Summary of the invention
For the problems referred to above that prior art exists, the object of this invention is to provide one and greatly improve planar cathode target utilization, and the vacuum coating production line cathode assembly of the simple low cost of structure.
For achieving the above object, the technical solution used in the present invention is as follows:
A kind of vacuum coating production line cathode assembly, comprises cathode assembly and translation assembly, and cathode assembly is fixedly connected with translation assembly and with the motion translation of translation assembly, wherein negative electrode is planar magnetic control sputtering cathode; Cathode assembly is connected by an insulating part with translation assembly.
Preferably, cathode assembly comprises target, target backboard, magnet and yoke, and target backboard surrounding is with insulating mat, and target is fixedly connected with target backboard, and magnet is fixed on yoke, and yoke connects insulating part; Enter electricity when target backboard sputters for negative electrode, the casing of the plated film chamber now in production line is anode, this insulating mat with in prior art for realizing target backboard and casing insulate, and in whole cathode assembly, only target backboard is charged.
More preferably, target backboard and magnet opposite face have a groove, and magnet is positioned at described groove but does not contact described target backboard.
More preferably, magnet with the translation in groove of translation assembly, thus realizes width increase in magnetic field in cathode assembly, increases target etch areas, improves target utilization, fix this defect with the bombardment track overcoming prior art midplane negative electrode; And by by the translation in the groove that target backboard has of magnet battle array, the target-substrate distance in original planar cathode and target surface magneticstrength can be maintained, and make this cathode assembly space structure compact, the thickness of whole cathode assembly can with do not improve front close, without the need to adjusting plated film chamber and even whole production line because of cathode assembly of the present invention; In addition, in this cathode assembly, target is still fixing, thus can avoid moving due to target the uncertain factor brought and causing the instability of production line.
As a kind of preferred version, translation assembly is followed successively by moving member, slide rail part, fabricated section and strut member from outside to inside, wherein moving member is connected with the slide block in insulating part and slide rail part respectively, and fabricated section is connected with the slide rail in slide rail part, and fabricated section is connected with strut member; Now moving member in slide rail part during slide block translation by translation in the lump thereupon, so translation insulating part, translation cathode assembly then, thus realize the translation of cathode assembly, the especially translation of magnet.
As another kind of preferred version, translation assembly is followed successively by moving member, ball-screw part, fabricated section and strut member from outside to inside, wherein moving member is connected with the nut in insulating part and ball-screw part respectively, and fabricated section is connected with the mounting block in ball-screw part, and fabricated section is connected with strut member; Now moving member in ball-screw part nut with during the translation of screw rod rotary drive by translation in the lump thereupon, so translation insulating part, translation cathode assembly then, thus realize the translation of cathode assembly, the especially translation of magnet.
Another object of the present invention is to provide a kind of vacuum coating production line cathode assembly, more stable and firm with implementation structure, especially translation modular support Li Gengjia, and the translation of cathode assembly is more stable, wherein translation assembly comprises a moving member, a slide rail part, a ball-screw part, fabricated section and strut member; With said structure unlike, slide rail part comprises a slide block and a slide rail, and slide block coordinates with slide rail, and slide block slides on slide rail; Ball-screw part comprises a nut, a screw rod and a mount pad, and screw rod is arranged on mount pad, screw rod and nut screw connection, and during bolt rotary, nut can move along screw rod; Slide block on moving member in difference connecting sliding rail part and the nut of ball-screw part, the slide rail in fabricated section difference connecting sliding rail part and the mount pad of ball-screw part; Now moving member translation under the common effect of slide rail part and ball-screw part, wherein ball-screw part is as the main driving of moving member translation, slide rail part as moving member translation from driving and become load bearing support.
As further preferred version, in order to realize the automatization campaign of translation assembly, ball-screw part is electrically connected a motor, and by the nut translation in motor driven ball screws part, the slide block then in transmission slide rail part, to realize the translation of cathode assembly.
As further preferred version, motor is a servomotor, by a toothed belt transmission ball-screw part.
As further preferred version, translation assembly at least comprises two slide rail parts and is distributed in the both sides of ball-screw part, with better load-bearing cathode assembly, makes this cathode assembly translation more stable and uniform.
As further preferred version, translation assembly also comprises a photoelectric sensor, is divided into the both sides of the screw rod of ball-screw part, automatically comes and goes translation to realize nut on screw rod; Realized by the turning direction controlling screw rod after induction nut location signal especially by by photoelectric sensor.
As a kind of preferred version, the magnet in cathode assembly can select various magnet battle array of the prior art, or multiple magnet arrangement forms, or customizes shaping magnet and form.
Another object of the present invention is to provide a kind of vacuum coating production line cathode assembly, easily be installed in this production line to realize this cathode assembly, and the negative electrode needed for can configuring according to production line demand, this cathode assembly also comprises a connection piece, this web member is flexibly connected with the casing of the plated film chamber in vacuum coating production line, and translation assembly connects this web member.
As a kind of preferred version, described flexible connection is hinged, specifically realizes by a hinge.
As a kind of preferred version, when this cathode assembly is multiple, this web member is same a connection piece, and now, multiple cathode assembly is connected on this web member altogether.
As further preferred version, web member is a back up pad.
As further preferred version, the insulating material that insulating part and insulating mat adopt is selected from as tetrafluoroethylene, synthetic glass or nylon.
Compared with prior art, what the present invention initiated realizes the translation of planar cathode in sputter coating process, thus the defect of fixing in this design avoided due to its target and bombardment track, significantly improve the utilization ratio of target, the target utilization of this cathode assembly can reach 35 ~ 40% after testing, on target line, the replacement cycle is extended for 7 ~ 10 days, obviously be better than the planar cathode of other structures, and the extreme value that planar cathode utilization ratio of the prior art is difficult to more than 30% can be broken through, still can maintain preferably plated film stability and homogeneity; In addition, this cathode assembly structure is simple, and without the need to the complete processing of Special complex, each functional element used all can adopt commercially available part, and rational in infrastructure between each parts, and dismounting is easy.To sum up state, the advantage that the low-cost and easy-to that cathode assembly provided by the invention not only can maintain planar cathode is safeguarded, also target and bombardment track this advantage variable of rotating cathode is achieved, and the optional feature structure realizing translation is simple, can not vacuum leakproofness be affected, equally also can not become the uncertain factor in production line; Therefore, this cathode assembly has great economic worth, and environmental friendliness, decrease the waste of target, so its application prospect is very wide.
Accompanying drawing explanation
Fig. 1 is the typical etch shape figure of the target surface of prior art midplane negative electrode;
Fig. 2 is the typical etch shape figure of the target surface of prior art midplane negative electrode;
Fig. 3 is the assembling schematic diagram of vacuum coating production line cathode assembly provided by the invention;
Fig. 4 is the vertical view cutaway drawing of vacuum coating production line cathode assembly provided by the invention;
Fig. 5 is that sectional view is looked on a left side for vacuum coating production line cathode assembly provided by the invention;
Fig. 6 is the enlarged view of moving portion A-A in vacuum coating production line cathode assembly provided by the invention;
Fig. 7 is the etched shape figure of target surface in vacuum coating production line cathode assembly provided by the invention;
Fig. 8 is the etched shape figure of the target surface of prior art midplane negative electrode;
Fig. 9 is the target sectional view of vacuum coating production line cathode assembly provided by the invention and prior art planar cathode.
Embodiment
Do to illustrate in detail, intactly further to the present invention below in conjunction with embodiment and accompanying drawing.
Fig. 3 ~ 6 are the structural representation of vacuum coating production line cathode assembly provided by the invention.Wherein, Fig. 3 is the assembling schematic diagram of this cathode assembly, as shown in Figure 3, this cathode assembly comprises: cathode assembly 10 and translation assembly 20, cathode assembly 10 is fixedly connected with translation assembly 20 and with the motion translation of translation assembly 20, wherein negative electrode is that planar magnetic control sputtering cathode cathode assembly is connected by an insulating part 30 with translation assembly.
Fig. 4 is the vertical view cutaway drawing of vacuum coating production line cathode assembly provided by the invention; Fig. 5 is that sectional view is looked on a left side for vacuum coating production line cathode assembly provided by the invention.As shown in Figure 4 and Figure 5, cathode assembly 10 is followed successively by target 11, target backboard 12, magnet 13 and yoke 14 from outside to inside, is provided with insulating mat 15 between target backboard 12 and magnet 13, and target 11 is fixedly connected with target backboard 12, magnet 13 is fixed on yoke 14, and yoke 14 connects insulating part 30.Entering electricity when target backboard 12 sputters is negative electrode, and the casing of the plated film chamber now in production line is anode, and this insulating mat 15 insulate with casing for realizing target backboard 12 with in prior art, and in whole cathode assembly, only target backboard 12 is charged.
The insulating material that insulating part 30 and insulating mat 15 preferably adopt is selected from as tetrafluoroethylene, synthetic glass or nylon.
Target backboard 12 and magnet 13 opposite face have a groove 121, and magnet 13 is positioned at groove 121 but does not contact described target backboard 12.
Fig. 7 is the etched shape figure of target surface in vacuum coating production line cathode assembly provided by the invention.Magnet 13 with translation assembly 20 translation in groove 121, thus realizes width increase in magnetic field in cathode assembly 10, increases target etch areas (as shown with 7), improves target utilization, fix this defect with the bombardment track overcoming prior art midplane negative electrode; And pass through the translation in the groove that target backboard 12 has of magnet battle array, the target-substrate distance in original planar cathode and target surface magneticstrength can be maintained, and make this cathode assembly space structure compact, the thickness of whole cathode assembly can with do not improve front close, without the need to adjusting plated film chamber and even whole production line because of cathode assembly of the present invention; In addition, in this cathode assembly, target is still fixing, thus can avoid moving due to target the uncertain factor brought and causing the instability of production line.
Magnet 13 in cathode assembly 10 can select various magnet battle array of the prior art, or multiple magnet arrangement forms, or customizes shaping magnet and form.Target 11 is fixedly connected with target backboard 12, and magnetic stripe 13 is realized by countersunk screw with being fixedly connected with of yoke 14.
Fig. 6 is the enlarged view of moving portion A-A in vacuum coating production line cathode assembly provided by the invention.As shown in Figures 2 to 6, translation assembly 20 comprises moving member 21, slide rail part 22, ball-screw part 23, fabricated section 24 and a strut member 25; Slide rail part 22 comprises slide block 221 and a slide rail 222, and slide block 221 coordinates with slide rail 222, and slide block 221 slides on slide rail 222; Ball-screw part 23 comprises nut 231, screw rod 232 and a mount pad 233, and screw rod 232 is arranged on mount pad 233, and screw rod 232 coordinates with nut 231, and when screw rod 232 rotates, nut 231 can move along screw rod 232; Slide block 221 on moving member 21 in difference connecting sliding rail part 22 and the nut 231 of ball-screw part 23, when nut 231 translation of ball-screw 23, moving member 21 translation, moving member 21 is connected with slide block 221, and such moving member 21 is with movable slider 221 to move on slide rail 222; Slide rail 222 in fabricated section 24 difference connecting sliding rail part 22 and the mount pad 233 of ball-screw part 23; Moving member 21 translation under the common effect of slide rail part 22 and ball-screw 23, wherein ball-screw part 23 is as the main driving of moving member 21 translation, slide rail part 22 as moving member 21 translation from driving and become load bearing support.
In order to prevent in this cathode assembly other assemblies except cathode assembly 10 charged, especially translation assembly 20 is charged, and this cathode assembly comprises an insulating part 30 further, and cathode assembly 10 is connected by an insulating part 30 with translation assembly 20.Insulating part 30 is connected with the yoke 14 of cathode assembly 10 and the moving member 21 of translation assembly 20 simultaneously.Preferably, insulating part 30 is connected by countersunk screw with the yoke 14 of cathode assembly 10 and the moving member 21 of translation assembly 20.
In order to realize the automatization campaign of translation assembly 20, translation assembly 20 comprises a motor 26 further, ball-screw part 23 is electrically connected a motor 26, the screw rod 232 in ball-screw part 23 is driven to rotate by motor 26, then nut 231 translation on screw rod 232 is made, then the slide block 221 in transmission slide rail part 22, to realize the translation of cathode assembly 10.Motor 26 is preferably a servomotor, by a toothed belt transmission ball-screw part 23.
The slide rail part 22 of translation assembly at least comprises two slide rail parts 222 and is distributed in the both sides of ball-screw part 23.
Translation assembly 20 also comprises a photoelectric sensor 27, is divided into the both sides of the screw rod 232 of ball-screw part 23, automatically comes and goes translation to realize nut 221 on screw rod 222; Realized by the turning direction controlling screw rod 222 after induction nut 221 position signal especially by by photoelectric sensor 27.
Easily be installed in this production line to realize this cathode assembly, and the negative electrode needed for can configuring according to production line demand, this cathode assembly 10 also comprises a connection piece 16, this web member 16 is flexibly connected with the casing of the plated film chamber in vacuum coating production line, and translation assembly 20 connects this web member 16.This web member 16 is flexibly connected with the casing of the plated film chamber in vacuum coating production line, and this flexible connection is preferably hinged, specifically realizes by a hinge 28.When this cathode assembly is multiple, this web member 16 is same a connection piece, and now, multiple cathode assembly is connected on this web member 16 altogether, and web member 16 is preferably a back up pad 161.As one preferably embodiment, this back up pad 161 is bolted with strut member 25.It should be noted that, gap between back up pad 161 to strut member 25 is directly proportional to cathode sputtering intensity, when the distance between back up pad 161 and strut member 25 is larger, and cathode sputtering intensity enhancing, distance between back up pad 161 and strut member 25 more hour, cathode sputtering strength reduction.Therefore, this cathode assembly can ensure the plated film homogeneity in production line and stability according to the magnetic intensity of target fine setting back up pad 161 with strut member 25 spacing h, in addition, after target uses for some time, target need not be changed by reducing h and still can maintain magnetic intensity needed for target, improve the utilization ratio of target.
The course of action of this cathode assembly is: motor 26 drives the screw rod 232 in ball-screw part 23 to rotate, nut 231 in ball-screw 23 is along screw rod 232 translation, nut 231 is connected with moving member 21, nut 231 drives moving member 21 to move, moving member 21 is connected with cathode assembly 10 by insulating part 30, and such moving member 21 drives cathode assembly 10 to move; Nut 231 due to ball-screw part 23 can not bear the weight of cathode assembly 10, moving member 21 is connected with the slide block 221 of slide rail part 22, slide block 221 coordinates with slide rail 222, like this when nut 231 drives moving member 21 to move, slide block 221 on moving member 21 moves along slide rail 222, alleviates the weight that nut 231 bears.
Target utilization and plated film stability and homogeneity test experience
After cathode assembly as provided by the invention in above-mentioned Standard, metal targets-niobium target is adopted to be example, adopt the method (Zhao Jiaxue etc. calculating target utilization in prior art, the discussion of common magnetic control spattering target utilization ratio and method of calculation thereof, nucleosynthesis and plasma physics, in March, 2007), calculate the same target utilization in multiple cathode assemblies of different production line and target replacement cycle, concrete data are as shown in table 1:
Table 1
| Numbering | Target utilization | Replacement cycle |
| Production line 1 | 35% | 7 days |
| Production line 2 | 38% | 9 days |
| Production line 3 | 35% | 8 days |
| Production line 4 | 36% | 9 days |
| Production line 5 | 40% | 10 days |
Fig. 7 is the etching figure (using after 3 ~ 4 days) of the target surface of above-mentioned production line 1, Fig. 8 is the target surface etching figure of the same metal target adopting fixed planar cathode, Fig. 7 and Fig. 8 compares, and the etch areas of the target in this cathode assembly obviously increases, and whole target surface all can sputter; Fig. 9 is that (a-quadrant is prior art target section to the target Profile Correlation schematic diagram of above-mentioned two negative electrodes when need change target, B region is target section of the present invention), as shown in Figure 9, the target utilization of cathode assembly provided by the invention is obviously better than prior art midplane negative electrode (through contrast of weighing, it is more complete that target of the present invention uses), and whole etch areas is more even, the etching curvilinear slope of target obviously reduces, and sputters more uniform and stable.In addition, detect the coating effects in above-mentioned production line respectively, compared with the planar cathode of prior art, no significant difference, stability and the homogeneity of the plated film of the vacuum coating production line of this cathode assembly are good.
From the above results: cathode assembly provided by the invention, the utilization ratio of target can be promoted greatly, and the stability of plated film and good uniformity; Compared to the prior art of fixed planar cathode, there is significance beneficial effect.
Finally be necessary described herein: above embodiment is only for being described in more detail technical scheme of the present invention; can not be interpreted as limiting the scope of the invention, some nonessential improvement that those skilled in the art's foregoing according to the present invention is made and adjustment all belong to protection scope of the present invention.
Claims (9)
1. a vacuum coating production line cathode assembly, is characterized in that: comprise cathode assembly and translation assembly, and described cathode assembly is with the motion translation of described translation assembly, and the negative electrode in wherein said cathode assembly is planar magnetic control sputtering cathode; Described cathode assembly is connected by an insulating part with translation assembly, wherein:
Described cathode assembly comprises target, target backboard, magnet and yoke, and described target backboard surrounding is with insulating mat, and described target is fixedly connected with target backboard, and described magnet is fixed on yoke, and described yoke connects insulating part; Described target backboard and magnet opposite face have a groove, and described magnet is positioned at described groove but does not contact described target backboard; Described magnet is with motion translation in described groove of described translation assembly;
Described translation assembly is followed successively by moving member, slide rail part and ball-screw part, fabricated section and strut member from outside to inside, slide block in wherein said moving member difference connecting sliding rail part and the nut of ball-screw part, slide rail in fabricated section difference connecting sliding rail part and the mounting block of ball-screw part, and described fabricated section is connected with strut member;
Described insulating part connects the yoke of described cathode assembly and the moving member of translation assembly simultaneously;
Described cathode assembly also comprises a connection piece, and web member is a back up pad; Described web member is flexibly connected with the casing of the plated film chamber in vacuum coating production line, and described translation component activity connects described web member, and the gap between the strut member of back up pad and translation assembly is adjustable;
Described translation assembly at least comprises two slide rail parts and is distributed in the both sides of ball-screw part;
Described translation assembly also comprises a photoelectric sensor, is divided into the both sides of the screw rod of ball-screw part.
2. vacuum coating production line cathode assembly as claimed in claim 1, is characterized in that: described ball-screw part drives through motor, is rotated by screw rod in motor electric drive ball-screw part.
3. vacuum coating production line cathode assembly as claimed in claim 2, is characterized in that: described motor is a servomotor, comprises a rotating shaft, and engage the screw rod in described rotating shaft and ball-screw part by a Timing Belt, transmitting balls leading screw part.
4. vacuum coating production line cathode assembly as claimed in claim 1, is characterized in that: the magnet in cathode assembly selects magnet battle array.
5. vacuum coating production line cathode assembly as claimed in claim 4, is characterized in that: described magnet battle array forms through multiple magnet arrangement, or customizes shaping magnet and form.
6. vacuum coating production line cathode assembly as claimed in claim 1, is characterized in that: the casing of the plated film chamber in described web member and vacuum coating production line is hinged.
7. vacuum coating production line cathode assembly as claimed in claim 1, is characterized in that: when described cathode assembly is multiple, corresponding web member is same a connection piece.
8. vacuum coating production line cathode assembly as claimed in claim 1, is characterized in that: described insulating part insulating material used is selected from tetrafluoroethylene, synthetic glass or nylon.
9. vacuum coating production line cathode assembly as claimed in claim 4, is characterized in that: described insulating mat insulating material used is selected from tetrafluoroethylene, synthetic glass or nylon.
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101506404A (en) * | 2005-11-17 | 2009-08-12 | 应用材料股份有限公司 | Flexible magnetron including partial rolling support and centering pins |
| CN102586750A (en) * | 2012-03-14 | 2012-07-18 | 无锡康力电子有限公司 | Planar moving target mechanism |
| CN203021645U (en) * | 2012-12-31 | 2013-06-26 | 上海子创镀膜技术有限公司 | Movable planar magnetron sputtering target |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US7101466B2 (en) * | 2003-09-19 | 2006-09-05 | Kdf Electronic + Vacuum Services Inc | Linear sweeping magnetron sputtering cathode and scanning in-line system for arc-free reactive deposition and high target utilization |
| WO2013001715A1 (en) * | 2011-06-30 | 2013-01-03 | キヤノンアネルバ株式会社 | Sputtering device |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101506404A (en) * | 2005-11-17 | 2009-08-12 | 应用材料股份有限公司 | Flexible magnetron including partial rolling support and centering pins |
| CN102586750A (en) * | 2012-03-14 | 2012-07-18 | 无锡康力电子有限公司 | Planar moving target mechanism |
| CN203021645U (en) * | 2012-12-31 | 2013-06-26 | 上海子创镀膜技术有限公司 | Movable planar magnetron sputtering target |
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