CN102586750A - Planar moving target mechanism - Google Patents
Planar moving target mechanism Download PDFInfo
- Publication number
- CN102586750A CN102586750A CN201210067553XA CN201210067553A CN102586750A CN 102586750 A CN102586750 A CN 102586750A CN 201210067553X A CN201210067553X A CN 201210067553XA CN 201210067553 A CN201210067553 A CN 201210067553A CN 102586750 A CN102586750 A CN 102586750A
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- China
- Prior art keywords
- pole shoe
- permanent magnet
- target
- negative electrode
- line slideway
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Abstract
The invention discloses a planar moving target mechanism. The mechanism comprises a frame, a back-and-forth transmission mechanism, two linear guide rail mechanisms, a pole shoe, a permanent magnet, and a cathode and a target which are positioned in a vacuum box, wherein the back-and-forth transmission mechanism is arranged in the middle of the frame; the two linear guide rail mechanisms are arranged on the upper part and the lower part of the frame respectively and are provided with at least one sliding block respectively; the pole shoe is arranged in the middle of the back-and-forth transmission mechanism; the upper end and the lower end of the pole shoe are fixed on the sliding blocks of the two linear guide rail mechanisms respectively; the permanent magnet is arranged on the pole shoe; the cathode is arranged at the bottom of the vacuum box above the permanent magnet; and the target is arranged above the cathode. Due to the movement of a magnetic field, electrons in a discharging area can be expanded, and the utilization rate of the target can be improved to 40 to 45 percent; and the effects of saving energy and reducing the cost are achieved.
Description
Technical field
The present invention relates to plated film and use sputtering target, specifically a kind of plane running target mechanism.
Background technology
At present; Rectangular Planar Magnetron Sputtering Target is because it is simple in structure; Have higher deposition, low substrate temperature, rete and substrate bonded firmly to be easy to maximize and not on industrial plated film, found broad application by advantages such as the substrate kind influences, but this system influence the homogeneity of plated film because the non-homogeneous utilization ratio (general utilization is at 10%-20%) that can reduce target of degrading of target surface in process of production; The arcing and the poisoning of target be can cause, product quality and production cycle had a strong impact on.Novel plane of motion target structure research and development can be brought up to 40%-45% with the utilization ratio of target, have great significance to improving product quality and reducing the generation cost.
Summary of the invention
The objective of the invention is low, the not high problem of plated film homogeneity of utilization ratio to the existing target of Rectangular Planar Magnetron Sputtering Target, propose a kind of plane running target mechanism; Make electronics runway expansion in the region of discharge through magnetic field mobile, target utilization can be brought up to 40%-45%.Play the effect of energy saving and cost lowering.
Technical scheme of the present invention is:
A kind of plane running target mechanism; It comprises framework, comes and goes transmission rig, two line slideway mechanisms, pole shoe, permanent magnet and is positioned at intravital negative electrode of vacuum chamber and target, and described round transmission rig is installed in the middle part of framework, and two line slideway mechanisms are installed in the top and the bottom of framework respectively; In the two line slideway mechanisms at least one slide block is housed respectively; Pole shoe is installed in the middle part that comes and goes transmission rig, and the upper/lower terminal of pole shoe is separately fixed on the slide block of two line slideway mechanisms, and permanent magnet is installed on the pole shoe; Negative electrode is installed in vacuum chamber bottom above permanent magnet, and target is installed in the top of negative electrode.
Negative electrode of the present invention is the copper backboard.
Water-cooled tube is equipped with in the inside of negative electrode of the present invention.
Slide block of the present invention is four, and two slide blocks are installed respectively in the two line slideway mechanisms, and four jiaos of pole shoe are separately fixed on four slide blocks.
Permanent magnet of the present invention is three, evenly is arranged on the pole shoe.
Round transmission rig of the present invention comprises servomotor and ball-screw, drives the pole shoe that is fixed on the ball-screw by servomotor and makes at the uniform velocity back and forth movement.
Beneficial effect of the present invention:
The present invention makes electronics runway expansion in the region of discharge through magnetic field mobile, and the target utilization can be brought up to 40%-45%.Play the effect of energy saving and cost lowering.
In the degree membrane process, adopt running target of the present invention, can improve membrane uniformity; Effectively prolong the life cycle of target.
Description of drawings
Fig. 1 is a main TV structure synoptic diagram of the present invention.
Fig. 2 is a cross-sectional view of the present invention.
Among the figure: 1, framework; 2, come and go transmission rig; 3, line slideway mechanism; 4, pole shoe;
5, permanent magnet; 6, negative electrode; 7, water-cooled tube; 8, target; 9, vacuum chamber;
10, slide block; 11, servomotor; 12, ball-screw.
Embodiment
Below in conjunction with accompanying drawing and embodiment the present invention is further described.
As shown in Figure 1; A kind of plane running target mechanism; It comprises framework 1, come and go transmission rig 2, two line slideway mechanisms 3, pole shoe 4, permanent magnet 5 and be positioned at the negative electrode 6 and the target 8 of vacuum chamber 9, and described round transmission rig 2 is installed in the middle part of framework 1, and two line slideway mechanisms 3 are installed in the top and the bottom of framework 1 respectively; At least one slide block 10 is housed respectively in the two line slideway mechanisms 3; Pole shoe 4 is installed in the middle part that comes and goes transmission rig 2, and the upper/lower terminal of pole shoe 4 is separately fixed on the slide block 10 of two line slideway mechanisms 3, and permanent magnet 5 is installed on the pole shoe 4; Negative electrode 6 is installed in vacuum chamber 9 bottoms above permanent magnet 5, and target 8 is installed in the top of negative electrode 6.
Negative electrode 6 of the present invention is the copper backboard; Water-cooled tube 7 is equipped with in the inside of negative electrode 6, carries out the negative electrode cooling, prevents that apparatus overheat from damaging.
As shown in Figure 2, slide block 10 of the present invention is four,, two slide blocks 10 are installed in the two line slideway mechanisms 3 respectively, four jiaos of pole shoe 4 are separately fixed on four slide blocks 10.
Permanent magnet 5 of the present invention is three, evenly is arranged on the pole shoe 4.
Negative electrode water-cooled of the present invention is directly accomplished in the copper backboard that target binds; Magnet evenly is arranged on the pole shoe pure iron plate;, utilize the to-and-fro movement of servomotor to drive the ball-screw that is fixed on the pure iron plate and make at the uniform velocity back and forth movement with the fixing pure iron plate of line slideway in the direction that is parallel to target surface.
The present invention does not relate to all identical with the prior art prior art that maybe can adopt of part and realizes.
Claims (6)
1. plane running target mechanism; It is characterized in that it comprises framework (1), comes and goes transmission rig (2), two line slideway mechanisms (3), pole shoe (4), permanent magnet (5) and is positioned at the negative electrode (6) and the target (8) of vacuum chamber (9); Described round transmission rig (2) is installed in the middle part of framework (1); Two line slideway mechanisms (3) are installed in the top and the bottom of framework (1) respectively; In the two line slideway mechanisms (3) at least one slide block (10) is housed respectively; Pole shoe (4) is installed in the middle part of round transmission rig (2), and the upper/lower terminal of pole shoe (4) is separately fixed on the slide block (10) of two line slideway mechanisms (3), and permanent magnet (5) is installed on the pole shoe (4); Negative electrode (6) is installed in vacuum chamber (9) bottom in permanent magnet (5) top, and target (8) is installed in the top of negative electrode (6).
2. plane according to claim 1 running target mechanism is characterized in that described negative electrode (6) is the copper backboard.
3. plane according to claim 1 running target mechanism is characterized in that water-cooled tube (7) is equipped with in the inside of described negative electrode (6).
4. plane according to claim 1 running target mechanism is characterized in that described slide block (10) is four,, two slide blocks (10) are installed in the two line slideway mechanisms (3) respectively, four jiaos of pole shoe (4) are separately fixed on four slide blocks (10).
5. plane according to claim 1 running target mechanism is characterized in that described permanent magnet (5) is three, is to be arranged on the pole shoe (4).
6. plane according to claim 1 running target mechanism; It is characterized in that described round transmission rig (2) comprises servomotor (11) and ball-screw (12), drive the pole shoe (4) that is fixed on the ball-screw (12) by servomotor (11) and make at the uniform velocity back and forth movement.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210067553XA CN102586750A (en) | 2012-03-14 | 2012-03-14 | Planar moving target mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210067553XA CN102586750A (en) | 2012-03-14 | 2012-03-14 | Planar moving target mechanism |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102586750A true CN102586750A (en) | 2012-07-18 |
Family
ID=46475966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210067553XA Pending CN102586750A (en) | 2012-03-14 | 2012-03-14 | Planar moving target mechanism |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102586750A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104018129A (en) * | 2013-12-16 | 2014-09-03 | 湘潭宏大真空技术股份有限公司 | Cathode device for vacuum coating production line |
| CN104498886A (en) * | 2014-12-17 | 2015-04-08 | 北京四方继保自动化股份有限公司 | Method and device for improving utilization rate of magnetron sputtering flat target material |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2342361A (en) * | 1998-10-09 | 2000-04-12 | Beijing Zhentao Int L Ti Gold | Planar unbalanced magnetron sputtering cathode |
| CN2656432Y (en) * | 2003-09-11 | 2004-11-17 | 深圳豪威真空光电子股份有限公司 | Rotary type magnetic controlled sputtering target |
| CN201006891Y (en) * | 2006-08-28 | 2008-01-16 | 深圳豪威真空光电子股份有限公司 | Movable magnetic pole type scan sputter source |
-
2012
- 2012-03-14 CN CN201210067553XA patent/CN102586750A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2342361A (en) * | 1998-10-09 | 2000-04-12 | Beijing Zhentao Int L Ti Gold | Planar unbalanced magnetron sputtering cathode |
| CN2656432Y (en) * | 2003-09-11 | 2004-11-17 | 深圳豪威真空光电子股份有限公司 | Rotary type magnetic controlled sputtering target |
| CN201006891Y (en) * | 2006-08-28 | 2008-01-16 | 深圳豪威真空光电子股份有限公司 | Movable magnetic pole type scan sputter source |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104018129A (en) * | 2013-12-16 | 2014-09-03 | 湘潭宏大真空技术股份有限公司 | Cathode device for vacuum coating production line |
| CN104018129B (en) * | 2013-12-16 | 2016-03-09 | 湘潭宏大真空技术股份有限公司 | A kind of vacuum coating production line cathode assembly |
| CN104498886A (en) * | 2014-12-17 | 2015-04-08 | 北京四方继保自动化股份有限公司 | Method and device for improving utilization rate of magnetron sputtering flat target material |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20120718 |