CN103896375A - Waste water treating apparatus - Google Patents
Waste water treating apparatus Download PDFInfo
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- CN103896375A CN103896375A CN201310728262.5A CN201310728262A CN103896375A CN 103896375 A CN103896375 A CN 103896375A CN 201310728262 A CN201310728262 A CN 201310728262A CN 103896375 A CN103896375 A CN 103896375A
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Abstract
The invention provides a waste water treating apparatus which divides waste water with silicon crumbs into silicon crumbs and water without silicon crumbs. In this manner, silicon crumbs and water are effectively separated. The waste water treating apparatus comprises a dividing time storing portion (322) which calculates and stores the times of silicon crumb separation by a silicon attaching plate (21). A judging portion (323) is provided to judge if the times of silicon crumb separation are up to required times. An informing portion (324) in the apparatus is for informing the required satisfactory times. In this manner, a worsening silicon attaching plate (21) can be judged and taken out of a liquid groove (20) so that it can treat waste water for a long time by dividing silicon crumbs from water.
Description
Technical field
The present invention relates to the liquid separation that contains silicon bits to become the tripping device of silicon bits and liquid.
Background technology
In the manufacture of silicon device, exist silicon ingot is cut off and form silicon wafer operation, grind the operation of silicon wafer and a large amount of regions of being reticulation arranging on the surface of silicon wafer in form IC(Integrated Circuit: unicircuit), LSI(large scale integration: large-scale integrated circuit) etc. circuit each region is cut off and forms the operation etc. of silicon one by one along the cut-out line of regulation.In these operations, for example, carry out cooling for bite, processing stand, grind section are graded or wash away silicon bits and adopted water.
Silicon bits are fine particles, are contained in waste liquid with the state being suspended.On the other hand, in recent years, for the viewpoint of the recycling of Water reuse, silicon, require the waste liquid that contains silicon bits to be separated into silicon bits and the technology of the water of siliceous bits not, known by filter and centrifugal separation is carried out the method for physical sepn and utilize medicine to carry out chemically separated method (for example,, with reference to patent documentation 1).
But, in the method for physical sepn, exist the problem that mesh stops up or silicon grain passes unexpectedly occurs in the time filtering.Particularly in centrifugal separation, exist silicon grain and cross rare and make the inefficient situation of centrifugation with respect to the concentration of moisture.In addition, in chemically separated method, owing to using medicine, therefore existing the problem being difficult to liquid (water) recycling.Therefore, adopted the tripping device (for example,, with reference to patent documentation 2) that is separated into efficiently silicon bits and water by the silicon bits in silicon adsorption plate absorption waste liquid.
[patent documentation 1] Japanese kokai publication hei 8-164304 communique
[patent documentation 2] TOHKEMY 2012-024661 communique
But, in above-mentioned tripping device, scrape silicon by spacer plate and consider to be worth doing silicon bits are reclaimed, but by above-mentioned recovery repeatedly, have silicon adsorption plate surface irregularity, thus the problem that the yield of silicon bits reduces.
Summary of the invention
The present invention In view of the foregoing makes just, and its object is the waste liquid that contains silicon bits being separated into silicon bits and not in the tripping device of the water of siliceous bits, even also can efficiently waste liquid be separated into silicon bits and water through disengaging time.
The present invention relates to a kind of liquid waste treating apparatus, it is for being separated into the waste liquid that contains silicon bits silicon bits and the water purification of siliceous bits not, described liquid waste treating apparatus is characterised in that, described liquid waste treating apparatus is by forming with lower member: be separated into silicon from waste liquid and consider to be worth doing with the recovery member that the isolated silicon of separating treatment member is considered to be worth doing is passed through in separating treatment member and the recovery of the water purification of siliceous bits, separating treatment member possesses: liquid bath, and it is for accumulating waste liquid; Silicon adsorption plate, it is with positive electricity and in liquid bath, equally spaced configured multiplely, and this silicon adsorption plate is for adsorbing the electronegative silicon bits of waste liquid; Negative plate, it is with negative electricity, and relatively alternately to have arranged multiple with silicon adsorption plate mode spaced apart with silicon adsorption plate; Take out of portion, it is disposed in the top of negative plate, and clarified liq is taken out of outside liquid bath; And electric field forming portion, it,, taking silicon adsorption plate as anode and taking negative plate as negative electrode, forms electric field between silicon adsorption plate and negative plate, reclaims member and possesses: separated part, and it is for isolating silicon bits from silicon adsorption plate; Adsorption plate moving part, it is for moving to separated part by silicon adsorption plate from the liquid bath of separating treatment member; And management component, its management silicon adsorption plate, management component possesses: adsorption time count section, its cumulative time of having adsorbed silicon according to each the silicon adsorption plate subtend silicon adsorption plate energising in each silicon adsorption plate is counted; Instruction department, it sends instruction, and described instruction represents that the silicon adsorption plate that cumulative time should have been passed through to specific time moves to separated part and isolates silicon bits from silicon adsorption plate; Separate number of times storage part, it is counted and stores the number of times of isolating silicon bits from silicon adsorption plate by separated part according to each the silicon adsorption plate in each silicon adsorption plate; And judging part, its judgement is stored in the separation number of times separating in number of times storage part and whether has reached the number of times specifying, described liquid waste treating apparatus possesses the portion of reporting, and the separation number of times that is judged as each silicon adsorption plate at judging part has reached the number of times of regulation, and this portion of reporting reports.
In liquid waste treating apparatus of the present invention, possess: separate number of times storage part, it is counted and store the number of times of isolating silicon bits from silicon adsorption plate according to each the silicon adsorption plate in each silicon adsorption plate; Judging part, its judgement is stored in the separation number of times separating in number of times storage part and whether has reached the number of times specifying; And report portion, its separation number of times that is judged as each silicon adsorption plate at judging part has reached the number of times of regulation to be reported, therefore reached for separating number of times the silicon adsorption plate of determining number of times specifying, can be judged as the silicon adsorption plate after deteriorated and take out from liquid bath, can efficiently the waste liquid that contains silicon bits be separated into silicon bits and water purification for a long time.
Brief description of the drawings
Fig. 1 is the in-built stereographic map that an example of liquid waste treating apparatus is shown.
Fig. 2 is the exploded perspective view that an example of the liquid bath that makes under the post-rift state of part and silicon adsorption plate and negative plate is shown.
Fig. 3 is illustrated in the sectional view that has formed the state of electric field between the silicon adsorption plate that is received in liquid bath and negative plate.
Fig. 4 is the schema that the contents processing in liquid waste treating apparatus is shown.
Label declaration
1: liquid waste treating apparatus; 2: separating treatment member; 20: liquid bath; 200: side plate; 200a: groove; 21: silicon adsorption plate; 210: engaged sheet; 211: connecting hole; 22: negative plate; 220: discharge portion; 221: suction tube; 222: suction port; 223: send mouth; 25: pump; 3: reclaim member; 30: separated part; 300: slit; 300a: flashboard; 301: separation vessel; 302: hydrogen is discharged member; 31: adsorption plate moving part; 32: management component; 320: adsorption time count section; 321: instruction department; 322: separate number of times storage part; 323: judging part; 324: report portion; 33: maintaining part; 330: base station; 331: chuck cylinder; 332: cylinder main body; 333: pin; 34: lifting unit; 340: vertical ball-screw; 341: guide rail; 342: band; 35: move horizontally portion; 350: horizontal ball-screw; 351: guide rail; 352: hang the portion of holding; 40: waste liquid containing box; 41: water purification water storage tank; 410: box main body; 411: froth breaking tilted plate; 412: supplying opening; 5: electric field forming portion; 50: anode; 51: negative electrode; 60: silicon bits case; 61: weighing scale; 7: discharge portion; 70: carry pipe arrangement; 71: open and close valve.
Embodiment
Liquid waste treating apparatus 1 shown in Fig. 1 possess from waste liquid be separated into silicon bits and the water purification of siliceous bits separating treatment member 2 and reclaim by the recovery member 3 of the isolated silicon bits of separating treatment member 2.
Separating treatment member 2 possesses liquid bath 20, and described liquid bath 20 is formed by the insulating element of synthetic resins etc. and accumulates the waste liquid as handling object.In the front of liquid bath 20, be provided with the waste liquid containing box 40 of receiving the waste liquid that contains silicon bits, by not shown pump, waste liquid is imported to liquid bath 20 from waste liquid containing box 40.As shown in Figure 2, liquid bath 20 is containers of upper opening, on the inner peripheral surface of the side plate 200 of length direction, is formed with the groove 200a extending in vertical direction.
As shown in Figure 3, the silicon adsorption plate 21 that is inserted into liquid bath 20 is connected with the anode 50 of the electric field forming portion 5 being made up of direct supply, positively charged and become anode, negative plate 22 is connected with the negative electrode 51 of direct supply 5, electronegative and become negative electrode, therefore between silicon adsorption plate 21 and negative plate 22, be formed with electric field.Silicon bits in waste liquid are electronegative, therefore repel from electronegative negative plate 22, are adsorbed to the silicon adsorption plate 22 of positively charged.What in addition, negative plate 22 possessed send mouthfuls 223 is communicated with transferpump 25.
As shown in Figure 1, reclaim member 3 and possess: separated part 30, the side that it is disposed in separating treatment member 2, makes silicon bits separate from silicon adsorption plate 21; Adsorption plate moving part 31, it moves to separated part 30 by silicon adsorption plate 21 from the liquid bath 20 of separating treatment member 2; And management component 32, it is electrically connected with silicon adsorption plate 21 and silicon adsorption plate 21 is managed.
Separated part 30 possesses: the separation vessel 301 of case shape, and it is provided with slit 300 and the lower opening that can pass through for silicon adsorption plate 21 at upper surface; Not shown a pair of scraping, it is located in separation vessel 301; With not shown rotating mechanism, it is for making scraping rotation.Be provided with flashboard 300a at slit 300, described flashboard 300a for for silicon adsorption plate 21 by and prevent entering of foreign matter.Scraping has elastic synthetic resins by rubber etc. and forms, and the silicon adsorption plate 21 being accommodated in separation vessel 301 is positioned to scraping each other.Scraping is formed as band plate-like, and length direction is made as parallel with the width of liquid bath 20.By utilizing rotating mechanism to drive scraping to make its rotation, the Surface Contact of the bottom of scraping and the silicon adsorption plate 21 in separation vessel 301 interior storages or separate.Rotating mechanism makes the central part of scraping around the axle center rotation parallel with the width of liquid bath 20.
Below separated part 30, be equipped with the silicon bits case 60 of receiving the silicon bits that reclaim by recovery member 3.Silicon bits case 60 is containers of upper opening, and described silicon bits case 60 is connected with the below of separated part 30, and the silicon that storage is separated by separated part 30 is considered to be worth doing.
And separated part 30 possesses hydrogen and discharges member 302, described hydrogen is discharged member 302 hydrogen producing from the silicon bits that are stored in silicon bits case 60 is discharged to outside.Hydrogen is discharged member 302 and is connected the wall of separation vessel 301, thereby by the inside and outside connection of separation vessel 301, the inside of separation vessel 301 is opened wide to atmosphere.
Below silicon bits case 60, be equipped with weighing scale 61.Weighing scale 61 is configured to possesses known load cell etc., measures the weight of silicon bits case 60, and exports measurement result to management component 32.
As shown in Figure 1, adsorption plate moving part 31 is disposed in the top of liquid bath 20, and possess keep silicon adsorption plate 21 maintaining part 33, make the lifting unit 34 of maintaining part 33 liftings and make maintaining part 33 and horizontal drive portion 35 that lifting unit 34 moves horizontally.
Maintaining part 33 have inside there is the base station 330 of nut and be installed on base station 330 below a pair of chuck cylinder 331, chuck cylinder 331 the width of liquid bath 20 spaced apart arrange.Chuck cylinder 331 is made up of following part: the cylinder main body 332 that is fixed on base station 330; And the pin 333 of freely coming in and going out from cylinder main body 332.Pin 333 is formed as being inserted into connecting hole 211 cylindric of the engaged sheet 210 that is formed at silicon adsorption plate 21.
Lifting unit 34 is by forming with lower component: the vertical ball-screw 340 stretching in vertical direction; The guide rail 341 arranging abreast with vertical ball-screw 340; And make using not shown electric motor as drive source that vertical ball-screw 340 rotates be with 342, be with 342 to become following structure: vertical ball-screw 340 is rotated, thereby the base station 330 of maintaining part 33 being guided and carrying out lifting by guide rail 341.And by the lifting of base station 330, the chuck cylinder 331 that is installed on base station 330 also carries out lifting, therefore can make silicon adsorption plate 21 liftings of the pin 333 that is engaged to chuck cylinder 331.
Be equipped with the discharge portion 7 of discharging water purification from liquid bath 20 in the front of liquid bath 20.The open and close valve 71 that discharge portion 7 possesses the conveying pipe arrangement 70 of the side that is disposed in liquid bath 20 and links with conveying pipe arrangement 70.
Above waste liquid containing box 40, be equipped with water purification water storage tank 41, described water purification water storage tank 41 is stored the water purification by the isolated not siliceous bits of separating treatment member 2.Water purification water storage tank 41 possesses box main body 410, for eliminating inclination froth breaking plate 411 and multiple supplying opening 412 of bubble of water purification.
Froth breaking tilted plate 411 is formed as length direction along box main body 410 in the acclivitous tabular of upper and lower, and box main body 410 is divided into upper and lower two spaces.Between the long side of froth breaking tilted plate 411 and the inwall of box main body 410, be provided with the gap of passing through for water purification.
Supplying opening 412 is supplied to the water purification of discharging from relief outlet 7 in box main body 410.Supplying opening 412 is provided with conveying pipe arrangement 70 and the open and close valve 71 of the discharge portion 7 of equal amts.Supplying opening 412 connects the top of box main body 410.
The action of the liquid waste treating apparatus 1 forming as above with reference to the flowchart text of Fig. 4 below.
In liquid waste treating apparatus 1, between silicon adsorption plate 21 and negative plate 22, form electric field by the electric field forming portion 5 shown in Fig. 3.On the other hand, the waste liquid with silicon bits producing in milling apparatus, topping machanism etc. is received in the waste liquid containing box 40 for the treatment of unit 1.
In the time being made as the state of closing open and close valve 71, the waste liquid in waste liquid containing box 40 is received into liquid bath 20, waste liquid accumulates in liquid bath 20, becomes silicon adsorption plate 21 and negative plate 22 is immersed in the state in waste liquid.
Accumulate the waste liquid of amount of regulation in liquid bath 20 time, open all open and close valves 71.Before opening all open and close valves 71, the silicon bits with negative electric charge are adsorbed to the silicon adsorption plate 21 of positively charged.On the other hand, remove water purification after silicon bits and attracted from the suction port 222 on the top that is disposed in the negative plate 22 shown in Fig. 3 by pump 25, arrive the supplying opening 412 shown in Fig. 1 through sending mouthfuls 223, and be directed to water purification water storage tank 41(step S1).
Form the adsorption time count section 320 of management component 32 according to each silicon adsorption plate 21, the cumulative time of adsorbing silicon to switching on the anode 50 of electric field forming portion 5 is counted (step S2).And, in the time existing this cumulative time to pass through the silicon adsorption plate 21 of specific time, instruction is passed out to adsorption plate moving part 31 and separated part 30 by instruction department 321, and described instruction makes this silicon adsorption plate 21 move to separated part 30 and separates and remove silicon bits (step S3, S4) from this silicon adsorption plate 21.On the other hand, when in the situation that does not exist accumulation adsorption time through the silicon adsorption plate of specific time, proceed from the processing (step S3, S1) of waste liquid divided silicon bits.
In the time should separating the instruction of removing silicon bits from instruction department 321 output, by under the management of carrying out at management component 32, make horizontal ball-screw 350 rotate, maintaining part 33 moved to want silicon adsorption plate 21 that divided silicon considers to be worth doing directly over.And, under this state, while falling maintaining part 33 by vertical ball-screw 340 is rotated, chuck cylinder 331 is navigated on the horizontal direction prolongation of engaged sheet 210 of silicon adsorption plate 21.
Then,, by making the pin 333 of chuck cylinder 331 outstanding from cylinder main body 332, in the connecting hole 211 that is formed at engaged sheet 210, insert and engagement pin 333.And, by making vertical ball-screw 340 make retaining member 33 increase towards rotating backward, silicon adsorption plate 21 is lifted to the top of liquid bath 20 under this state.
Like this silicon adsorption plate 21 is lifted to liquid bath 20 above time, under the control of carrying out at management component 32, close the neighbour's of the silicon adsorption plate 21 after mentioning open and close valve 71, and stop the conveying to water purification water storage tank 41 since then.
Then, adsorption plate moving part 31 is by horizontal ball-screw 350 is rotated, by the maintaining part 33 that keeps silicon adsorption plate 21 move to separated part 30 directly over.And, by being rotated, vertical ball-screw 340 falls maintaining part 33, silicon adsorption plate 21 is inserted in separation vessel 301 through slit 300.Now, the not shown a pair of scraping that separated part 30 possesses becomes the parallel state in compartment of terrain that is spaced from each other.
After silicon adsorption plate 21 is fallen, make the bottom contact silicon adsorption plate 21 of scraping, and under this state, make vertical ball-screw 340 make maintaining part 33 towards rotating backward and when the silicon adsorption plate 21 that keeps rises, along with silicon adsorption plate 21 rises, scrape and isolate silicon bits (step S5) by scraping.Isolated silicon bits are received in silicon bits case 60.
The separation number of times storage part 322 that forms management component 32 is guaranteed the storage area of the separation number of times of storing silicon adsorption plate 21 according to each silicon adsorption plate, after step S5 completes, the separation number of times of this silicon adsorption plate 21 is upwards counted and stored in separation number of times storage part 322 (step S6).
The judging part 323 that forms management component 32 judges whether the separation number of times that separation number of times storage part 322 is stored has reached the number of times (step S7) specifying, reach in the case of being judged as separation number of times the number of times of regulation, reported this situation (step S8) from reporting portion 324 to operator.Think that the separation number of times of silicon bits has reached the silicon adsorption plate 21 of number of times of regulation deteriorated due to detached job, therefore can be by this taking-up silicon adsorption plate 21 from liquid bath 20, and again another silicon adsorption plate is received into liquid bath 20, efficiently the waste liquid that contains silicon bits is separated into silicon bits and water purification for a long time.
As mentioned above, liquid waste treating apparatus 1 can adsorb silicon bits by the silicon adsorption plate 21 of positively charged, and waste liquid is separated into silicon bits and water purification.Therefore, the waste liquid that contains silicon bits can be made as to recycling state efficiently.
In addition, reached specific time in the cumulative time of absorption silicon bits, carried out the removal of silicon bits from silicon adsorption plate 21, therefore can remove silicon bits the opportune moment before adsorptive power reduces.And, carry out above-mentioned management according to each in each silicon adsorption plate 21, therefore can maintain all the time adsorptive power according to each silicon adsorption plate.
And, according in each silicon adsorption plate 21 each to separate number of times count, reached the silicon adsorption plate 21 of the number of times of regulation for separation number of times, can be by reporting this situation, silicon adsorption plate after deteriorated is replaced by new silicon adsorption plate, therefore can efficiently the waste liquid that contains silicon bits be separated into silicon bits and water purification for a long time.
Claims (1)
1. a liquid waste treating apparatus, the waste liquid that contains silicon bits is separated into silicon bits and the water purification of siliceous bits not by it,
This liquid waste treating apparatus is characterised in that,
This liquid waste treating apparatus is made up of following part:
Separating treatment member, it is separated into silicon bits and the water purification of siliceous bits not from waste liquid; And
Reclaim member, it reclaims by the isolated silicon bits of this separating treatment member,
This separating treatment member possesses:
Liquid bath, it accumulates this waste liquid;
Silicon adsorption plate, it is with positive electricity and for adsorbing the electronegative silicon bits of this waste liquid, and this silicon adsorption plate has equally spaced configured multiple in this liquid bath;
Negative plate, it is with negative electricity, and with relative with this silicon adsorption plate and alternately arranged multiple with this silicon adsorption plate mode spaced apart;
Take out of portion, it is disposed in the top of this negative plate and for clarified liq being taken out of outside this liquid bath; And
Electric field forming portion, it forms electric field taking this silicon adsorption plate as anode and taking this negative plate as negative electrode between this silicon adsorption plate and this negative plate,
This recovery member possesses:
Separated part, it isolates silicon bits from this silicon adsorption plate;
Adsorption plate moving part, it moves to this separated part by this silicon adsorption plate from this liquid bath of this separating treatment member; And
Management component, it manages this silicon adsorption plate,
This management component possesses:
Adsorption time count section, its cumulative time of having adsorbed silicon according to this silicon adsorption plate energising of each subtend in each silicon adsorption plate is counted;
Instruction department, it sends instruction, and this instruction represents that the silicon adsorption plate that this cumulative time should have been passed through to specific time moves to separated part and isolates silicon bits from this silicon adsorption plate;
Separate number of times storage part, it is counted and stores the number of times of isolating silicon bits from this silicon adsorption plate by this separated part according to each in each silicon adsorption plate; And
Judging part, whether the separation number of times that its judgement is stored in this separation number of times storage part has reached the number of times specifying,
This liquid waste treating apparatus possesses the portion of reporting, and the separation number of times that is judged as each silicon adsorption plate at this judging part has reached the number of times of regulation, and this portion of reporting reports.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012-282585 | 2012-12-26 | ||
| JP2012282585A JP6093566B2 (en) | 2012-12-26 | 2012-12-26 | Waste liquid treatment equipment |
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| Publication Number | Publication Date |
|---|---|
| CN103896375A true CN103896375A (en) | 2014-07-02 |
| CN103896375B CN103896375B (en) | 2017-09-12 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201310728262.5A Active CN103896375B (en) | 2012-12-26 | 2013-12-25 | Liquid waste treating apparatus |
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| JP (1) | JP6093566B2 (en) |
| CN (1) | CN103896375B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107792915A (en) * | 2017-11-12 | 2018-03-13 | 江苏瑞尔隆鼎实业有限公司 | A kind of V-type oil scraping plate applied to oil-sewage separation device |
| JP2020054957A (en) * | 2018-10-02 | 2020-04-09 | 株式会社ディスコ | Waste liquid treatment apparatus |
| JP7364341B2 (en) * | 2019-02-13 | 2023-10-18 | 株式会社ディスコ | Waste liquid treatment equipment |
| JP7235605B2 (en) * | 2019-06-25 | 2023-03-08 | 株式会社ディスコ | Sludge drying equipment |
| JP7464416B2 (en) | 2020-03-17 | 2024-04-09 | 株式会社ディスコ | Processing powder recovery device |
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| JP2010022998A (en) * | 2008-07-24 | 2010-02-04 | Mitsubishi Electric Corp | Air cleaning apparatus |
| TW201145736A (en) * | 2010-04-30 | 2011-12-16 | Tessera Inc | Electrode conditioning in an electrohydrodynamic fluid accelerator device |
| CN102442719A (en) * | 2010-10-07 | 2012-05-09 | 株式会社迪思科 | Separating device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3970536A (en) * | 1974-08-22 | 1976-07-20 | Hydromation Filter Company | Liquid treating method and apparatus |
| JPS61133155A (en) * | 1984-12-01 | 1986-06-20 | Toupure Kk | Electrostatic purifier of liquid |
| JPH01245868A (en) * | 1988-03-29 | 1989-10-02 | Nec Kansai Ltd | Treatment of waste liquid |
| JPH09167752A (en) * | 1995-12-14 | 1997-06-24 | Mitsubishi Electric Corp | Method and device for chemical solution treatment |
| JPH11253838A (en) * | 1998-03-10 | 1999-09-21 | Ishikawajima Hanyoki Service Co Ltd | Solid-liquid separation of particulates mixed liquid and device therefor in silicon wafer production process |
| JP5638300B2 (en) * | 2010-07-20 | 2014-12-10 | 株式会社ディスコ | Separation device |
| JP5868150B2 (en) * | 2011-12-06 | 2016-02-24 | 株式会社ディスコ | Waste liquid treatment equipment |
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2012
- 2012-12-26 JP JP2012282585A patent/JP6093566B2/en active Active
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010022998A (en) * | 2008-07-24 | 2010-02-04 | Mitsubishi Electric Corp | Air cleaning apparatus |
| TW201145736A (en) * | 2010-04-30 | 2011-12-16 | Tessera Inc | Electrode conditioning in an electrohydrodynamic fluid accelerator device |
| CN102442719A (en) * | 2010-10-07 | 2012-05-09 | 株式会社迪思科 | Separating device |
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| Publication number | Publication date |
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| CN103896375B (en) | 2017-09-12 |
| JP2014124576A (en) | 2014-07-07 |
| JP6093566B2 (en) | 2017-03-08 |
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