CN102442719A - Separating device - Google Patents
Separating device Download PDFInfo
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- CN102442719A CN102442719A CN2011103017725A CN201110301772A CN102442719A CN 102442719 A CN102442719 A CN 102442719A CN 2011103017725 A CN2011103017725 A CN 2011103017725A CN 201110301772 A CN201110301772 A CN 201110301772A CN 102442719 A CN102442719 A CN 102442719A
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Abstract
The present invention provides a separating device which can efficiently separates waste liquid which comprises silicon chips into silicon chips and water through a state that can be easily reused. The separating device comprises the following components: a liquid tank (21) which stores the waste liquid that comprises the silicon chips; and a silicon separating mechanism (22) which is configured in the liquid tank (21). The silicon separating mechanism (22) comprises the following components: an absorption plate (25) which is configured in the liquid tank (21) and absorbs silicon chips in the waste liquid; a silicon passing restriction component (26) which only allows passing of water in the waste liquid and restrains passing of the silicon chip; an absorption plate moving component (30); and a separating part (40).
Description
Technical field
The waste liquid that the present invention relates to contain the silicon bits is separated into the tripping device of silicon bits and liquid.
Background technology
In the manufacturing of silicon device, exist with silicon ingot cut off and form silicon wafer operation, unicircuit), LSI (large scale integration: large-scale integrated circuit) wait circuit and each zone cut off and operation of formation silicon one by one etc. along predetermined spacing track (cut-out line) grind the operation of silicon wafer and on the surface of silicon wafer, be and form IC (Integrated Circuit: in a large amount of zones of arranging on reticulation ground.In these operations, for example cool off, or wash away silicon bits and adopted water for cutting tool, processing stand, grind section are graded.
In recent years, from the viewpoint of utilizing again of Water reuse, silicon, hoped to have the technology that the waste liquid that contains the silicon bits is separated into silicon bits and not siliceous water.The silicon bits are trickle particles, and it is included in the waste liquid with outstanding turbid state.As this kind prior art, the known filtration and the physical method of spinning and the chemical process (for example, with reference to patent documentation 1) of using medicine.
Patent documentation 1: japanese kokai publication hei 8-164304 communique
Yet, in aforesaid physical method, exist the problem that mesh stops up or silicon grain passes unexpectedly take place when filtering.Particularly in centrifugal separation, exist silicon grain and cross rare with respect to the concentration of moisture and make the inefficient situation of spinning.In addition, in aforesaid chemical process, owing to use medicine, therefore exist and be difficult to problem that liquid (water) is utilized again.
Summary of the invention
The present invention In view of the foregoing makes just, and its purpose is to provide a kind of tripping device, and it can be separated into silicon bits and water with the waste liquid that contains the silicon bits with the state that utilizes again easily efficiently.
In order to solve above-mentioned problem reaching purpose, the present invention is characterized in that this tripping device comprises: the liquid bath that stores said waste liquid for the waste liquid that will contain the silicon bits is separated into the silicon bits and the tripping device of the liquid of siliceous bits not; With the silicon separation mechanism that is disposed in the said liquid bath, said silicon separation mechanism comprises: adsorption plate, and said adsorption plate positively charged, and the electronegative said silicon of absorption is considered to be worth doing in said waste liquid; And silicon passes confining member; Said silicon passes confining member and comprises that silicon passes confinement plate; This silicon passes confinement plate and said adsorption plate sets opposed to each other; And this silicon passes confinement plate and only allows that the liquid of said waste liquid passes and limits electronegative said silicon bits and pass, and said silicon passes confining member and comprises: housing, said housing are separated out and have passed the existing zone of liquid that said silicon passes confinement plate; And transporting portion, the said portion of transporting is configured in the said housing, and will pass the said waste liquid that said silicon passes confinement plate and transport outside the said liquid bath; Said tripping device has electric field and forms member; This electric field forms member, and to make said adsorption plate be anode, and making said silicon pass confinement plate is negative electrode, forms electric field between the confinement plate thereby pass at said adsorption plate and said silicon; Said tripping device has recovering mechanism; This recovering mechanism reclaims the silicon that is adsorbed in said adsorption plate, and said recovering mechanism comprises: the adsorption plate mobile member, and said adsorption plate mobile member makes said adsorption plate move with respect to said waste liquid; And separated part, said separated part makes silicon separate from said adsorption plate.
According to the present invention, can realize a kind of tripping device, it can be separated into silicon bits and water with the waste liquid that contains the silicon bits with the state that utilizes again easily efficiently.
Description of drawings
Fig. 1 is the stereographic map of the tripping device that relates to of first embodiment of the present invention.
Fig. 2 is the exploded perspective view that is accommodated in the silicon separation mechanism in the liquid bath that illustrates in the tripping device that first embodiment of the present invention relates to.
Fig. 3 is the stereographic map that is accommodated in the silicon separation mechanism in the liquid bath that illustrates in the tripping device that first embodiment of the present invention relates to.
Fig. 4 is the IV-IV sectional view of Fig. 3.
Fig. 5 is lifting arm and the major portion stereographic map of the fastened component between the adsorption plate in the tripping device that relates to of explanation first embodiment of the present invention.
Fig. 6 is illustrated in the tripping device that first embodiment relates to the side-view that adsorption plate is disposed at the operation between the scraper plate.
Fig. 7 is the side-view that is illustrated in the tripping device that first embodiment relates to the operation that scrapes with scraper plate clamping adsorption plate and with the silicon bits.
Fig. 8 is the stereographic map that the tripping device that second embodiment of the present invention relates to is shown.
Fig. 9 is illustrated in the side-view that cylindric brush is separated and adsorption plate is configured to the operation between the cylindric brush.
Thereby Figure 10 is the side-view that is illustrated in the operation that adsorption plate is risen the silicon bits are scraped.
Figure 11 is the stereographic map that the tripping device that the 3rd embodiment of the present invention relates to is shown.
Figure 12 is the exploded perspective view that the tripping device that the 3rd embodiment relates to is shown.
Figure 13 is the XIII-XIII sectional view of Figure 11.
Label declaration
10,10A, 10B: tripping device; 21,51: liquid bath; 20: the tripping device main body; 22,60: the silicon separation mechanism; 25,61: adsorption plate; 26,62: silicon passes confining member; 26C: transport portion; 26B: silicon passes confinement plate; 4: waste liquid; 4A: water; 40,72: separated part; 41,71: returnable; 5: the silicon bits; 70: rotary driving part (adsorption plate mobile member).
Embodiment
Below, explain as the tripping device that is used for the mode of embodiment of the present invention with reference to accompanying drawing.But, accompanying drawing is merely schematically, should be noted that the size etc. of particulate size and parts is different with the situation of reality.In addition, accompanying drawing has also comprised the relation and the ratio distinct portions of mutual size each other.
(first embodiment)
Fig. 1～Fig. 7 shows the tripping device 10 that first embodiment of the present invention relates to.As shown in Figure 1, this tripping device 10 comprises tripping device main body 20, adsorption plate mobile member 30 and separated part 40.In addition, adsorption plate mobile member 30 constitutes recovering mechanism with separated part 40.
(tripping device main body)
At first, tripping device main body 20 is described.Like Fig. 1～shown in Figure 4, tripping device main body 20 comprises liquid bath 21 and the silicon separation mechanism 22 that is configured in this liquid bath 21.As shown in Figure 4, the waste liquid 4 that contains silicon bits 5 in the water is fed into liquid bath 21.
Like Fig. 1～shown in Figure 4, silicon separation mechanism 22 disposes alternately: adsorption plate 25, and it is configured in the liquid bath 21 and absorption silicon bits 5 in waste liquid 4; And silicon passes confining member 26, its with these adsorption plate 25 opposed mode configured separate, and only allow that water 4A in the waste liquid 4 passes and limits silicon bits 5 and passes.
Like Fig. 1～shown in Figure 5, in the rising wood central authorities of adsorption plate 25, separate on the width of adsorption plate 25 predetermined space ground to above give prominence to and be provided with a pair of sheet 25A that is stuck.As shown in Figure 5, the said sheet 25A that is stuck is the orthogonal tabular body, and disposes with mode opposite each other.Be formed with along what the width of adsorption plate 25 connected in the central authorities that respectively are stuck sheet 25A and be stuck hole 25h.At the said engagement part 37A that is stuck the adsorption plate mobile member of stating after sheet 25A inserts each other 30, and the engaging of being located at engagement part 37A with the mode that can stretch out and submerge is inserted in projection 38 be stuck hole 25h.
Like Fig. 2 and shown in Figure 4; Silicon passes confining member 26 and comprises that the framework 26A of rectangular shape and cancellous a pair of silicon pass confinement plate 26B, and this cancellous a pair of silicon passes confinement plate 26B and is provided with in parallel to each other with the mode of the both-side opening face of blocking this framework 26A.In addition, as shown in Figure 4, be provided with the 26C of the portion that transports of tubular in the center upper portion of framework 26A, the lower ending opening portion of the 26C of the portion that transports of this tubular is positioned at a pair of silicon and passes between the confinement plate 26B.Connect in this upper end that transports the 26C of portion and to transport pipe 27, transport pipe 27 via this water 4A is transported the outside.
Like Fig. 1～shown in Figure 4, adsorption plate 25 passes confining member 26 and alternately is configured to pass the mutual opposed mode of confinement plate 26B and silicon with silicon.Silicon in this embodiment pass confinement plate 26B be configured to adsorption plate 25 at a distance of the for example distance about 4mm and with adsorption plate 25 almost parallels.Making adsorption plate 25 and silicon pass distance between the confinement plate 26B like this is that reason about 4mm is: electric field weakens because distance becomes far then, and is preferably approaching as far as possible therefore aspect the silicon adsorptive power of guaranteeing adsorption plate 25.In addition, a pair of silicon passes confinement plate 26B and framework 26A and constitutes and will pass the housing that water 4A that said silicon passes confinement plate 26B separates.That is, constitute silicon and pass confining member 26 through pass the housing that confinement plate 26B constitutes and the portion 26C of transporting by framework 26A and a pair of silicon.
It is identical with above-mentioned adsorption plate 25 that silicon passes confinement plate 26B, is that copper (Cu), silver (Ag), platinum (Pt), gold (Au) etc. form by your material on the electrochemistry preferably, and that in this embodiment, adopt is stainless steel (SUS316, SUS304 etc.).It is cancellous structure that this silicon passes confinement plate 26B, colludes the function of hanging silicon bits 5 but also can not have with mesh, can be through making it electronegative and electronegative silicon bits are produced the mesh fineness of the degree of repulsion.By the way, in this embodiment, silicon is passed confinement plate 26B be set at 500 pieces/inch reticulattion.
In tripping device main body 20; Adsorption plates 25 in the liquid bath 21 and silicon pass confining member 26 and are set to shortlyer than the width dimensions in the liquid bath 21, and waste liquid 4 can pass the gap between the inwall of confining member 26 and liquid bath 21 and in whole liquid bath 21, circulates through gap between the inwall of these adsorption plates 25 and liquid bath 21 and silicon.Therefore, adsorption plate everywhere 25 in being present in liquid bath 21 and silicon pass and have waste liquid 4 in the space between the confining member 26.
(adsorption plate mobile member)
As shown in Figure 1, adsorption plate mobile member 30 is extended with pair of guide rails 31 along directions X respectively in the both sides of the Y of liquid bath 21 direction.These guide rails 31 are configured to longer than the length of the directions X of liquid bath 21, thus the both sides of the separated part of stating after also being present in 40.In addition, in this embodiment, it is the channel material of the long strip shape of コ word shape that pair of guide rails 31 for example adopts the cross section.
Between pair of guide rails 31, be provided with ball-screw 32 with guide rail 31 equal lengths.One end of ball-screw 32 rotates freely that the earth's axis is supported on shaft supporting part 33, and said shaft supporting part 33 is located at the distolateral of guide rail 31.The rotating driveshaft of the other end of ball-screw 32 and pulse motor 34 links.
On each pair of guide rails 31 of the both sides that are disposed at liquid bath 21, be provided with the mode that erects and transport pillar 35, said bottom of transporting pillar 35 is supported to along guide rail 31,31 and slides freely at directions X.Saidly a pair ofly transport that pillar 35 is configured to the bottom and ball-screw 32 screws togather, and synchronously carry out shift action along directions X along with the rotation of ball-screw 32.
Be provided with up-down driving part 36 in a pair of mutual opposed face side of transporting pillar 35.In addition, set up the lifting arm 37 that carries out lifting action at a pair of pillar 35 that transports.The both ends of this lifting arm 37 are passed along the vertical direction (Z direction) and are formed at the slit portion 36A of up-down driving part 36 and link with cylinder mechanism that not shown up-down drives usefulness, and this cylinder mechanism is equipped on the inside of up-down driving part 36.Lifting arm 37 is configured to keeping carrying out lifting action under the horizontal state through cylinder mechanism.In the central lower of the width of lifting arm 37, what the outstanding engagement part 37A that is provided with towards the below, this engagement part 37A were inserted into adsorption plate 25 is stuck sheet 25A each other.As shown in Figure 5, in this engagement part width two ends of 37A for example are provided with engaging with projection 38 with the mode that can stretch out through the not shown driving mechanism that has adopted solenoid coil etc. and submerge.Be inserted at engagement part 37A and be stuck under the sheet 25A state each other, engaging is given prominence to and is inserted into projection 38 and is stuck among the 25h of hole, and lifting arm 37 engages with adsorption plate 25 thus.
(separated part)
As shown in Figure 1, separated part 40 comprises: returnable 41, and it reclaims silicon bits 5; Supporting plate 42, it is arranged on two upper lateral parts of the width (Y direction) of said returnable 41 with the mode that erects opposed to each other; Scraper plate 43, it is with the supporting plate 42 that is spaced from each other predetermined space and parallel mode and is set up in pair of opposed each other; And rotation adjustment driving part 45, itself and turning axle 43A (with reference to Fig. 6, Fig. 7) binding of said scraper plate 43.This rotation adjustment driving part 45 comprises not shown rotary driving source, and can be shifted between the approaching each other position of the upper side of position and the scraper plate 43 shown in Figure 7 of almost parallel each other at scraper plate shown in Figure 6 43.
(action of tripping device 10 and effect)
At first; Like Fig. 2 and shown in Figure 4; In tripping device main body 20, when forming electric field, in silicon separation mechanism 22 when applying voltage by voltage applying circuit 28; Such effect is arranged: the silicon bits 5 in the adsorption plate 25 absorption waste liquids 4, and the silicon silicon that passes confining member 26 passes confinement plate 26B and utilizes repulsion that the silicon bits 5 in the waste liquid 4 are kept clear of.Silicon passes confinement plate 26B and silicon bits 5 in the waste liquid 4 can't be passed and only makes water 4A pass through to silicon to pass in the confining member 26.The water 4A that stores in silicon passes confining member 26 can transport the outside and utilizes from transporting the 26C of portion.And adsorption plate 25 is in the state of the absorption of carrying out silicon bits 5.
When keeping such state, the lifting arm 37 of adsorption plate mobile member 30 is moved to the predetermined adsorption plate 25 that stores silicon bits 5.In this case, control to make and transport pillar 35 and move to the Xf direction with driving pulse phonomoter 34.
Then, make the not shown cylinder mechanism work of being located in the up-down driving part 36 that transports pillar 35, lifting arm 37 is risen.In addition, till lifting arm 37 is configured to move to adsorption plate 25 is hung in the position of top of liquid bath 21.
Then, 34 retrograde rotations of driving pulse phonomoter make and transport pillar 35 and move to the Xr direction, the adsorption plate of being sling 25 arrive returnable 41 a pair of scraper plate 43 position each other above in make and transport the mobile of pillar 35 and stop.In addition, as shown in Figure 6 at this moment, scraper plate 43 is set in the position of plate face along vertical direction, and forms the state that is parallel to each other.
Then, as shown in Figure 6, make not shown cylinder mechanism work, make lifting arm 37 insert scraper plate 43 each other, the upper end of adsorption plate 25 is dropped to till scraper plate 43 position each other.Then, as shown in Figure 7, make 45 work of rotation adjustment driving part, so that the top of scraper plate 43 is closer to each other.Then, as shown in Figure 7, rise through making lifting arm 37, can will scrape in the returnable 41 attached to the silicon bits 5 on the surface of adsorption plate 25 with scraper plate 43.
For the adsorption plate 25 that so has been removed silicon bits 5, driving pulse phonomoter 34 is so that transport pillar 35 and move to the Xf direction, when adsorption plate 25 arrives the top in the original position in the liquid baths 21, makes to transport the mobile of pillar 35 and stop.Then, make not shown cylinder mechanism work, lifting arm 37 is descended, adsorption plate 25 is configured in the original position in the liquid bath 21.Then, make not shown driving mechanism work, engaging is stuck hole 25h extraction with projection 38 from what be stuck sheet 25A, remove engaging of lifting arm 37 and adsorption plate 25 thus.
Then, carry out operation same as described above and get final product for next removing adsorption plate 25 with divided silicon bits 5.Like this, can reclaim silicon bits 5 from all adsorption plates 25 in the liquid bath 21.Also can control, so that the schedule operating time of every separated tripping device 10 can automatically carry out so a series of operation.
Like this, the silicon bits 5 that are recovered in the returnable 41 for example can be implemented drying treatment, and realize utilizing again.In this embodiment, through many silicon is passed confining member 26 and adsorption plate 25, can efficiently the waste liquid 4 that contains silicon bits 5 be separated into silicon bits 5 and water 4A with the state that utilizes again easily.
(variation of first embodiment)
Fig. 8～Figure 10 shows the tripping device 10A that the variation of first embodiment of the present invention relates to.This variation replaces with a pair of cylindric brush 46 with a pair of scraper plate 43 in the tripping device 10 of above-mentioned first embodiment, and the tripping device 10 of other structures and first embodiment is roughly the same.
Like Fig. 9 and shown in Figure 10, cylindric brush 46 forms fluffing around turning axle 46A, and forms through rotation and contact the silicon that will be attached to adsorption plate 25 with adsorption plate 25 and consider 5 to be worth doing and scrape.In addition, in this variation, the turning axle 46A of cylindric brush 46 is configured to can be through not shown driving mechanism between position of leaving each other shown in Figure 9 and mutual approaching position shown in Figure 10, be shifted each other.
In this variation; Shown in figure 10; The turning axle 46A of a pair of cylindric brush 46 is configured to respect to the adsorption plate that carries out vertical motion 25 rotation round about each other, and the brush periphery that contacts with adsorption plate 25 is the opposite direction rotation of ascent direction to the travel direction with adsorption plate 25.
In addition, in this variation, the turning axle 46A of cylindric brush 46 constitutes can be can leaving and approaching mode moves each other, yet can constitute also that bristle with cylindric brush 46 prolongs and the fixing position of turning axle 46A.
(second embodiment)
Figure 11～Figure 13 shows the tripping device 10B that second embodiment of the present invention relates to.This tripping device 10B comprises silicon separation mechanism 60, the rotary driving part 70 as the adsorption plate mobile member, separated part 72 and the returnable 71 that is configured in the side of silicon separation mechanism 60.In this embodiment, recovering mechanism is made up of rotary driving part 70 and separated part 72.In addition, the silicon in this embodiment passes the structure of confining member 62 and passes the identical of confining member 26 with the silicon of above-mentioned first embodiment, therefore omits its explanation.
Like Figure 11 and shown in Figure 12, a plurality of adsorption plates 61 are configured with separating the predetermined space parallel, and are fixed by the state that turning axle 63 connects integratedly with central part.These turning axle 63 quilt axles are bearing in the axle support holes 52A of the U word shape that is formed at a pair of axle support 52, and said a pair of axle support 52 is arranged on mutual opposed two positions of the rising wood of liquid bath 51.In addition, in this embodiment, set up not shown anticreep parts, break away from from axle support 52 to avoid turning axle 63 to block a mode of the opened portion on the top of support holes 52A.
The constituent material of this adsorption plate 61 is identical with above-mentioned first embodiment, can enumerate copper (Cu), silver (Ag), platinum (Pt), gold (Au) etc., but that in this embodiment, adopt is stainless steel (SUS316, SUS304 etc.).In addition, the constituent material of turning axle 63 is by having the intensity that can support a plurality of adsorption plates 61 and forming with metallic substance that adsorption plate 61 conducts.
The roughly lower part that makes adsorption plate 61 that is set to the diameter dimension of adsorption plate 61 immerses and supplies in the waste liquid 4 of liquid bath 51.Shown in figure 11, adsorption plate 61 links at turning axle 63 has the rotary driving part 70 as the adsorption plate mobile member.In this embodiment, be rotated driving through utilizing rotary driving part 70, adsorption plate 61 rotation is moved, thereby the part in the waste liquid 4 of being immersed in of adsorption plate 61 is moved to not and waste liquid 4 position contacting.
Like Figure 11 and shown in Figure 12, near a side's of turning axle 63 end 63A, what be set with the outside that is disposed at liquid bath 51 coaxially is transmitted gear 64.In addition, the outside of liquid bath 51 transmitted gear 64 near, the earth's axis is supported with rotation transmitter shaft 65 to rotate freely with turning axle 63 parallel modes.Be set with coaxially and the transmission gear 66 that is transmitted gear 64 engagements at this rotation transmitter shaft 65.In addition, rotation transmitter shaft 65 links with phonomoter 67.Above-mentioned gear 64, rotation transmitter shaft 65, transmission gear 66 and the phonomoter 67 of being transmitted constituted rotary driving part 70.
In addition; An end 63A of turning axle 63 contacts with the non-rotation contact component 68 of cylindrical shape; The non-rotation contact component 68 of this cylindrical shape can be along the moving axially of turning axle 63, and by whisker 69 to the direction E application of force that will this non-rotation contact component 68 be crimped on the end face of end 63A.Shown in figure 11, this non-rotation contact component 68 is connected with the anode side of voltage applying circuit 81, thereby makes adsorption plate 61 positively chargeds via turning axle 63.
Then, effect and the action to tripping device 10B describes.In the tripping device 10B of this embodiment, also silicon bits 5 are adsorbed on adsorption plate 61 through be used for identical with above-mentioned first embodiment.When driven in rotation driving part 70 made adsorption plate 61 rotation, the scraping blade 72A of separated part 72 will scrape attached to the silicon bits 5 on the surface of the both sides of adsorption plate 61.The silicon bits 5 that scrape on the separated part 72 fall and are recovered to returnable 71 along with the inclination of separated part 72.
More than, second embodiment is illustrated, according to this embodiment, have following effect: adsorption plate 61 is not taken out, the absorption action of adsorption plate 61 is stopped, just can carrying out the recovery of silicon bits 5 from liquid bath 51.In addition, the effect of the tripping device 10 that relates to of other effects of this embodiment and above-mentioned first embodiment is identical.
More than, each embodiment that possesses a plurality of adsorption plates is illustrated, yet under situation, also can uses the present invention certainly with the separation mechanism that possesses single adsorption plate.In addition, adsorption plate and the silicon shape and structure that passes confining member also is not limited to above-mentioned each embodiment.
Utilizability in the industry
As stated, the tripping device that the present invention relates to is useful for the utilizationization again by the waste liquid of generations such as the cut-out of silicon, separation, is specially adapted to field of semiconductor processing.
Claims (1)
1. tripping device, it is separated into the silicon bits and the tripping device of the liquid of siliceous bits not for the waste liquid that will contain the silicon bits, it is characterized in that,
This tripping device comprises:
Store the liquid bath of said waste liquid; With
Be disposed at the silicon separation mechanism in the said liquid bath,
Said silicon separation mechanism comprises:
Adsorption plate, said adsorption plate positively charged, and the electronegative said silicon of absorption is considered to be worth doing in said waste liquid; And
Silicon passes confining member, and said silicon passes confining member and comprises that silicon passes confinement plate, and this silicon passes confinement plate and said adsorption plate sets opposed to each other, and this silicon passes confinement plate and only allow that the liquid of said waste liquid passes and limits electronegative said silicon bits and passes,
Said silicon passes confining member and comprises:
Housing, said housing are separated out and have passed the existing zone of liquid that said silicon passes confinement plate; And
Transport portion, the said portion of transporting is configured in the said housing, and will pass the said waste liquid that said silicon passes confinement plate and transport outside the said liquid bath,
Said tripping device has electric field and forms member, and this electric field forms member, and to make said adsorption plate be anode, and making said silicon pass confinement plate is negative electrode, forms electric field between the confinement plate thereby pass at said adsorption plate and said silicon,
Said tripping device has recovering mechanism, and this recovering mechanism reclaims the silicon that is adsorbed in said adsorption plate,
Said recovering mechanism comprises:
The adsorption plate mobile member, said adsorption plate mobile member makes said adsorption plate move with respect to said waste liquid; And
Separated part, said separated part make silicon separate from said adsorption plate.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010-227852 | 2010-10-07 | ||
| JP2010227852A JP2012081385A (en) | 2010-10-07 | 2010-10-07 | Separation apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102442719A true CN102442719A (en) | 2012-05-09 |
| CN102442719B CN102442719B (en) | 2015-09-02 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110301772.5A Active CN102442719B (en) | 2010-10-07 | 2011-10-08 | Tripping device |
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| Country | Link |
|---|---|
| JP (1) | JP2012081385A (en) |
| CN (1) | CN102442719B (en) |
| TW (1) | TW201249523A (en) |
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| CN105384173A (en) * | 2014-09-01 | 2016-03-09 | 株式会社迪思科 | Method and device for recovering microsilica |
| CN109734159A (en) * | 2018-12-20 | 2019-05-10 | 河南宝联环保科技有限公司 | A kind of efficient process water adsorption plant of adjustable magnetic force |
| CN111359272A (en) * | 2020-04-14 | 2020-07-03 | 中国电建集团港航建设有限公司 | Cleaning device for residual water pond sediment mud |
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- 2010-10-07 JP JP2010227852A patent/JP2012081385A/en active Pending
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2011
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103896375A (en) * | 2012-12-26 | 2014-07-02 | 株式会社迪思科 | Waste water treating apparatus |
| CN103896375B (en) * | 2012-12-26 | 2017-09-12 | 株式会社迪思科 | Liquid waste treating apparatus |
| CN105384173A (en) * | 2014-09-01 | 2016-03-09 | 株式会社迪思科 | Method and device for recovering microsilica |
| CN105384173B (en) * | 2014-09-01 | 2022-05-03 | 株式会社迪思科 | Method and apparatus for recovering silicon powder |
| CN109734159A (en) * | 2018-12-20 | 2019-05-10 | 河南宝联环保科技有限公司 | A kind of efficient process water adsorption plant of adjustable magnetic force |
| CN111359272A (en) * | 2020-04-14 | 2020-07-03 | 中国电建集团港航建设有限公司 | Cleaning device for residual water pond sediment mud |
| CN111359272B (en) * | 2020-04-14 | 2022-01-04 | 中国电建集团港航建设有限公司 | Cleaning device for residual water pond sediment mud |
| CN112171412A (en) * | 2020-10-12 | 2021-01-05 | 陈福育 | Semiconductor material production technical equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201249523A (en) | 2012-12-16 |
| CN102442719B (en) | 2015-09-02 |
| JP2012081385A (en) | 2012-04-26 |
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