JP2020054957A - Waste liquid treatment apparatus - Google Patents

Abstract

To provide a waste liquid treatment apparatus which facilitates work for pulling out an anode plate from a liquid tank or inserting the anode plate into the liquid tank, without being disturbed by silicon chips.SOLUTION: A waste liquid treatment apparatus 1 which separates treated waste liquid mixed-in with silicon chips into silicon chips and fresh water, comprises: a liquid tank 2 that stores treated waste liquid L; cathode plates 30 arranged at equal intervals in the liquid tank 2 and charged in minus; anode plates 31 separated at a predetermined interval from the cathode plates 30 to oppose to the cathode plates 30, arranged in the liquid tank 2 to be insertably and drawably and charged in plus; drawing/inserting means 32 that holds upper parts of the anode plates 31 and draws out the anode plates 31 from the liquid tank 2 or inserts the plates into the liquid tank 2; and interval formation parts 309 protruding from at least both surfaces of the cathode plates 30 in order for the cathode plates 30 and the anode plates 31 to form prescribed intervals in the liquid tank 2.SELECTED DRAWING: Figure 4

Description

  The present invention relates to a waste liquid treatment apparatus for separating a processing waste liquid mixed with silicon waste into silicon waste and fresh water.

A cutting device that cuts silicon wafers with a grindstone or a grinding device that grinds silicon wafers with a grindstone contains silicon chips in the waste liquid generated by processing, and it is necessary to remove silicon chips when reusing the waste liquid. is there.
When the silicon dust is removed using the filter, the filter is clogged in a short time, so that the filter needs to be replaced frequently and the filter is wasted. As a countermeasure, a cathode plate and an anode plate are alternately arranged in a liquid tank containing waste liquid as disclosed in Patent Document 1 or Patent Document 2, and the charged silicon dust is adsorbed on the anode plate, and the cathode plate is removed. Fresh water is sucked from the plate side to enable recycling of waste liquid.

JP 2013-251435 A JP 2014-124576 A

  After the silicon chips have been adsorbed to some extent, the anode plate is taken out of the liquid tank, the adsorbed silicon chips are stripped off, and the anode plate is again attached to a predetermined position in the liquid tank and allowed to come in contact with the liquid. Since the anode plate needs to be disposed at a predetermined distance from the cathode plate, the inner surface of the liquid tank is provided with a guide groove for guiding the anode plate and extending in the depth direction.

  When a voltage is applied to charge the anode plate positively and adsorb the negatively charged silicon chips, the space between the anode plate and the recess of the guide groove is filled with silicon chips. Therefore, it is difficult to remove the anode plate from the liquid tank. Also, even if the anode plate can be taken out of the liquid tank, silicon dust remains in the guide groove, and after the silicon chip is peeled off from the anode plate, when the anode plate is inserted into the guide groove again, the guide groove is There is a problem that the remaining silicon dust hinders the anode plate from being inserted.

  Therefore, in the waste liquid treatment apparatus, there is a problem that when the anode plate is extracted from the liquid tank or when the anode plate is inserted into the liquid tank, the anode plate is not hindered by silicon dust and the above operation can be easily performed.

  The present invention for solving the above problems is a waste liquid treatment apparatus for separating a processing waste liquid mixed with silicon waste into silicon waste and fresh water, wherein a liquid tank for storing the processing waste liquid, and A negatively charged cathode plate disposed at a distance from the cathode plate, facing the cathode plate, spaced apart from the cathode plate at a predetermined interval, and capable of being inserted into and removed from the liquid tank and positively charged; Means for holding the top of the plate and extracting or inserting the anode plate from the liquid tank or inserting the anode plate into the liquid tank; and at least the cathode plate and the anode plate in the liquid tank to form the predetermined gap. And a space forming part protruding from both surfaces of the cathode plate.

  It is preferable that the anode plate has an overhanging portion whose upper portion projects outward on both sides, and the liquid tank has a positioning groove at an upper portion for positioning and mounting the overhanging portion.

The waste liquid treatment apparatus according to the present invention is a liquid tank that stores processing waste liquid, a cathode plate that is disposed at equal intervals in the liquid tank and that is negatively charged, and is separated from the cathode plate at a predetermined interval facing the cathode plate. An anode plate which is disposed in the liquid tank so as to be able to be inserted and removed and is positively charged; an insertion / extraction means for holding the upper part of the anode plate and extracting or inserting the anode plate from the liquid tank or inserting it into the liquid tank; And a gap forming portion that protrudes from at least both sides of the cathode plate to form a predetermined gap, when the anode plate is removed from the liquid tank, the anode plate is not inserted into the groove. It does not catch on the tank.
Further, when inserting the anode plate into the liquid tank, it is not necessary to aim at the groove, and a predetermined interval can be formed between the cathode plate and the anode plate by the interval forming portion. Further, since there is no groove in the liquid tank, a situation in which the silicon plate is clogged with silicon chips and the anode plate cannot be inserted as in the conventional case does not occur.

  In the waste liquid treatment apparatus according to the present invention, the anode plate is provided with an overhanging portion whose upper portion projects outward on both sides, and the liquid tank is provided with a positioning groove at the upper portion for positioning and placing the overhanging portion, thereby defining the liquid tank. When the anode plate is inserted at the position, the insertion can be made easier than before. Further, since the positioning groove is formed in the upper portion of the liquid tank, the positioning groove does not clog with silicon dust.

It is a perspective view showing an example of a waste liquid treating device. It is sectional drawing which shows arrangement | positioning of the anode plate and the cathode plate in a liquid tank. It is a perspective view which shows a liquid tank, an anode plate, and a cathode plate separately. It is sectional drawing explaining the state which inserted the anode plate in the liquid tank.

A waste liquid treatment apparatus 1 according to the present invention shown in FIG. 1 is an apparatus for separating a processing waste liquid mixed with silicon waste into silicon waste and fresh water, and a liquid tank 2 for storing the processing waste liquid and a liquid tank 2 at equal intervals. And a negatively charged cathode plate 30 (see FIG. 2). The cathode plate 30 faces the cathode plate 30 in the Y-axis direction, is separated from the cathode plate 30 at a predetermined interval, and is detachably provided in the liquid tank 2. An anode plate 31 to be positively charged; extraction / insertion means 32 for holding the upper part of the anode plate 31 and extracting the anode plate 31 from the liquid tank 2 or inserting it into the liquid tank 2; a cathode plate 30 and an anode plate 31 in the liquid tank 2; And at least a space forming portion 309 (see FIG. 2) protruding from both surfaces of the cathode plate 30 to form a predetermined space.
As shown in FIG. 1, each of the above components of the waste liquid treatment device 1 is housed in a rectangular parallelepiped casing 10 of the waste liquid treatment device 1.

The substantially rectangular parallelepiped box-shaped liquid tank 2 shown in FIGS. 1 to 3 is formed of, for example, an insulating member such as a synthetic resin, and has a rectangular bottom plate 21 (see FIGS. 2 and 3) in plan view and an outer periphery of the bottom plate 21. The processing waste liquid L including the silicon waste P can be stored in a space surrounded by the bottom plate 21 and each side wall as shown in FIG. In FIGS. 1 to 3, two side walls facing each other in the X-axis direction (only the back side in FIG. 2 is shown) are referred to as side walls 22a, and two side walls facing each other in the Y-axis direction are side walls 22b.
As shown in FIGS. 2 and 3, for example, a supply port 223 to which the other end of the liquid supply pipe 403 to which the processing waste liquid L is sent communicates is formed in a region below the side wall 22b.

As shown in FIG. 1, a waste liquid storage tank 40 for storing a processing waste liquid L containing silicon waste P is provided on the side of the liquid tank 2, and the waste liquid storage tank 40 is controlled by a pump 402 shown in FIG. , The processing waste liquid L is introduced into the liquid tank 2 through the liquid supply pipe 403.
An overflow pipe (not shown) for preventing the processing waste liquid L from overflowing is provided at the upper part of the liquid tank 2. The overflow pipe communicates with the waste liquid storage tank 40, and guides the processing waste liquid L overflowing from the liquid tank 2 to the waste liquid storage tank 40 again.

  The anode plate 31 is made of a material that is electrochemically noble, and is formed in a rectangular flat plate shape. For example, the anode plate 31 can be made of a material such as copper, silver, platinum, or gold. In the present embodiment, SUS is applied as the anode plate 31. The plurality of anode plates 31 are spaced from each other in a state where their surfaces are orthogonal to the longitudinal direction (Y-axis direction) of the liquid tank 2, in other words, in a state parallel to the width direction (X-axis direction) of the liquid tank 2. It is arranged.

  The upper end surface of the anode plate 31 is provided with, for example, two engaged portions 310 protruding upward from a central portion in the width direction (X-axis direction) with an interval therebetween. The engaged portion 310 is formed in a rectangular plate shape, and has an engaged hole 310a penetrating in the X-axis direction at the center. The engaging pin 320a of the holding part 320 of the insertion / removal means 32 enters and engages with the engaged hole 310a.

  For example, as shown in FIGS. 1 and 3, in the waste liquid treatment apparatus 1 according to the present embodiment, the anode plate 31 includes an overhang portion 315 whose upper portion overhangs both lateral outer sides (± X direction sides), and the liquid tank 2 has an upper portion. And a positioning groove 27 for positioning and mounting the overhang portion 315. In addition, the waste liquid treatment apparatus 1 may be configured not to include the overhang portion 315 and the positioning groove 27.

  The overhang portion 315 is, for example, a prismatic protrusion, but may be a columnar protrusion. The positioning groove 27 of the liquid tank 2 is, for example, a groove formed in the upper end surface of the two side walls 22a in a concave shape in accordance with the outer shape of the overhang portion 315, but is not limited thereto. Groove may be used. The depth of the positioning groove 27 may be such that the overhang portion 315 slightly enters, and the groove width of the positioning groove 27 is such that the mounted overhang portion 315 can move slightly in the Y-axis direction. Any length is acceptable. Further, instead of the positioning groove 27, a positioning mark may be drawn on the upper end surfaces of the two side walls 22a.

For example, as shown in FIGS. 1 and 3, a plurality of support grooves 224 extending in the Z-axis direction are provided at predetermined intervals on the inner side surface of the two side walls 22 a facing each other in the X-axis direction of the liquid tank 2. The cathode plates 30 are provided in the liquid tank 2 in a state of being inserted into the respective support grooves 224 at predetermined intervals in the Y-axis direction. Each support groove 224 is alternately formed in the Y-axis direction with a positioning groove 27 formed on the upper end surface of the side wall 22a of the liquid tank 2. That is, a plurality of the cathode plates 30 are alternately arranged opposite to the anode plate 31 in the Y-axis direction, spaced apart from the anode plate 31, and are in parallel with the anode plate 31.
Note that, for example, the midpoint of the groove width of the positioning groove 27 for positioning the anode plate 31 substantially coincides with the midpoint between the two support grooves 224 sandwiching the positioning groove 27.

  The cathode plate 30 shown in FIGS. 2 and 3 is made of a material that is electrochemically noble, like the anode plate 31, and is formed in a rectangular flat plate shape. For example, the cathode plate 30 can be made of a material such as copper, silver, platinum, or gold. In the present embodiment, SUS is applied as the cathode plate 30.

  As shown in FIG. 2, a gap having a predetermined width is provided between the lower end of each of the cathode plates 30 and each of the anode plates 31 and the bottom plate 21 of the liquid tank 2, and the liquid flows into the liquid tank 2 from the supply port 223. The processing waste liquid L rises between the cathode plate 30 and the anode plate 31 through the gap.

The predetermined interval in the Y-axis direction between the cathode plate 30 and the anode plate 31 shown in FIG. 2 is formed by the interval forming portions 309 protruding from the both surfaces of the cathode plate 30 in the Y-axis direction. The space forming portion 309 is formed of, for example, resin and has a substantially semi-disc-shaped outer shape in the present embodiment, but is not limited to this shape, and protrudes in the Y-axis direction, for example. It may have an outer shape such as a substantially hemispherical shape, a conical shape, or a pyramid shape. As shown in FIG. 3, for example, two space forming portions 309 are arranged at a predetermined distance in the width direction (X-axis direction) in a region on the lower side of the surface of the cathode plate 30. The above may be provided. For example, the interval forming portion 309 provided so as to protrude from the cathode plate 30 may have an outer shape that extends elongated in the Z-axis direction, which is the direction in which the anode plate 31 is inserted and removed.
In the two anode plates 31 at one end and the other end in the Y-axis direction, only one surface thereof faces the cathode plate 30, and the other surface is formed of each side wall 22 b of the liquid tank 2. Facing the inner surface. Therefore, it is preferable to provide the interval forming portion 309 on the inner surface of each side wall 22b of the liquid tank 2 facing the anode plate 31.

  In the present embodiment, a DC voltage is applied between the anode plate 31 and the cathode plate 30 (see FIG. 2). That is, the positive (+) side of the DC power supply DC is electrically connected to the anode plate 31 and is positively charged in the processing waste liquid L. The anode plate 31 is used to adsorb the silicon waste P that is positively charged in the processing waste liquid L and is negatively charged in the processing waste liquid L. On the other hand, the negative (-) side of the DC power supply DC is electrically connected to the cathode plate 30 and is negatively charged in the processing waste liquid L.

  The processing waste liquid (fresh water) from which the silicon waste P has been roughly removed by the anode plate 31 is sent to a fresh water storage tank 41 provided in the housing 10 by the fresh water sending means 38 shown in FIG. The plurality of fresh water delivery means 38 shown in FIGS. 1 to 3 are connected to, for example, fresh water suction pipes 381 which are attached to the upper portions of the plurality of cathode plates 30 and whose both ends in the Y-axis direction are closed, and each of the fresh water suction pipes 381. It has a connecting pipe 383 and an opening / closing valve 382 disposed on the connecting pipe 383. As shown in FIGS. 2 and 3, on the side surface of the fresh water suction pipe 381, a plurality of fresh water suction ports 381 a are formed at regular intervals along the extending direction (X-axis direction) of the pipe.

  The connection pipe 383 is bent, for example, toward the rear side wall 22 a extending above the fresh water suction pipe 381, penetrates through the side wall 22 a of the liquid tank 2, and further bends downward toward the fresh water storage tank 41, thereby forming a fresh water storage tank. It is connected to a supply port 412 (see FIG. 1) described later. The fresh water suction pipe 381 and the connection pipe 383 feed the fresh water from which the silicon chips P have been roughly removed by the anode plate 31 to the fresh water storage tank 41 from inside the liquid tank 2. The on-off valve 382 is configured to open and close the flow path in the connection pipe 383.

  As shown in FIG. 1, above the waste liquid storage tank 40, a fresh water storage tank 41 that stores fresh water that does not include the silicon waste P separated in the liquid tank 2 is disposed. The fresh water storage tank 41 includes a tank body 410, a defoaming inclined plate 411 that is obliquely disposed in the tank body 410 for eliminating bubbles in the fresh water, and a plurality of supply ports 412. The supply ports 412 are provided, for example, in the same number as the fresh water suction pipes 381 and the open / close valves 382 of the fresh water delivery means 38. The supply port 412 penetrates the upper part of the tank body 410.

  A pulling-out means 32 for holding the upper part of the anode plate 31 shown in FIG. 1 and pulling out the anode plate 31 from the liquid tank 2 or inserting it into the liquid tank 2 is horizontally moved above the liquid tank 2 by a Y-axis direction moving means 34. It is reciprocable in the axial direction. The Y-axis direction moving means 34 fixed to the inner side wall of the housing 10 includes a horizontal ball screw 340 provided in parallel with the longitudinal direction (Y-axis direction) of the liquid tank 2, and a motor 343 for driving the horizontal ball screw 340 to rotate. , A pair of guide rails 341 for horizontal movement extending in the Y-axis direction, and a movable member 342 whose inner nut is screwed into the horizontal ball screw 340 and the lower surfaces at both ends are in sliding contact with the guide rail 341. Then, when the horizontal ball screw 340 is rotated by the driving of the motor, the insertion / removal means 32 fixed to the movable member 342 is guided by the guide rail 341 and moves in the Y-axis direction. The horizontal ball screw 340 and the guide rail 341 have a length extending over the separating portion 50 shown in FIG. 1 for separating the silicon dust P from the anode plate 31 from above the liquid tank 2. By moving the anode plate 31 in the axial direction, the anode plate 31 held by the holding unit 320 of the insertion / extraction unit 32 can be moved from the liquid tank 2 to the separation unit 50.

  The insertion / removal means 32 includes a vertical plate 329 having an upper end fixed to the movable member 342, a vertical ball screw 321 provided on a side surface of the vertical plate 329 in parallel with the depth direction (Z-axis direction) of the liquid tank 2, and a vertical ball screw 321, a pair of guide rails 322 extending in the Z-axis direction, and a holding portion 320 in which an internal nut is screwed into the vertical ball screw 321 and a side surface slidably contacts the guide rail 322. I have. When the vertical ball screw 321 is rotated by driving of the motor, the holding portion 320 is guided by the guide rail 322 and moves in the Z-axis direction.

  The holding portion 320 for holding the anode plate 31 of the insertion / removal means 32 includes, for example, a plate-like member 320d in which an internal nut is screwed to the vertical ball screw 321 and a pair of chuck cylinders 320c provided on the lower surface of the plate-like member 320d. And The pair of chuck cylinders 320c are arranged at intervals in the width direction (X-axis direction) of the liquid tank 2. The pair of chuck cylinders 320c include a cylinder body 320b attached to the plate member 320d, and an engagement pin 320a provided to be able to protrude and retract from the cylinder body 320b in the width direction (X-axis direction) of the liquid tank 2. ing. The pair of chuck cylinders 320c are, for example, in a state where engagement pins 320a protruding from the cylinder body 320b approach each other in the X-axis direction. Each of the engagement pins 320a is inserted into each of the engagement holes 310a of each of the engagement portions 310 of the anode plate 31 when the descending holding portion 320 projects from the cylinder main body 320b in a state positioned above the anode plate 31. Be fitted. As a result, the holding portion 320 of the insertion / removal unit 32 holds the anode plate 31.

  The separating unit 50 shown in FIG. 1 for separating the silicon waste P from the anode plate 31 includes a housing 500 having an opening at an upper portion into which the anode plate 31 enters. It has a pair of scrapers (not shown) that can sandwich the surface from both sides in the Y-axis direction.

  Below the separation unit 50, a silicon waste tank 56 for storing the silicon waste P peeled off from the anode plate 31 is provided. The silicon waste tank 56 is a container having an open top, is connected to the lower part of the separation unit 50, and stores the silicon waste P separated and dropped in the separation unit 50.

  For example, the separation unit 50 includes a hydrogen gas discharging unit 57 that discharges hydrogen gas generated from the silicon waste P stored in the silicon waste tank 56 to the outside. The hydrogen gas discharging means 57 opens the inside of the separation unit 50 to the atmosphere by penetrating the wall of the housing 500 of the separation unit 50.

Hereinafter, with reference to FIGS. 1, 2 and 4, in the waste liquid treatment apparatus 1, the anode plate 31 is extracted from the liquid tank 2, and the silicon chips P attached to the anode plate 31 are peeled off. Further, a case where the anode plate 31 after the silicon dust P is peeled off is inserted into the liquid tank 2 will be described.
1 and 2, the processing waste liquid L is stored in the liquid tank 2, and the anode plate 31 and the cathode plate 30 are immersed in the processing waste liquid L. Then, the positive (+) of the DC power supply DC is supplied to the anode plate 31, and the negative (−) of the DC power supply DC is supplied to the cathode plate 30. As a result, an electric field is formed between the anode plate 31 and the cathode plate 30. Then, as shown in FIG. 2, the silicon dust P mixed into the processing waste liquid L and charged negatively (−) repels from the negatively charged cathode plate 30 by electrophoresis, The positive electrode plate 31 is attracted to the (+) charged anode plate 31.

After a certain amount of silicon dust P is adsorbed by the anode plate 31, the motor 343 of the Y-axis direction moving means 34 shown in FIG. The holding part 320 of the insertion / removal means 32 is positioned directly above the base 31.
For example, when the motor 343 of the above-described Y-axis direction moving means 34 is a pulse motor operated by a drive pulse supplied from a pulse oscillator (not shown), the control means (not shown) supplies the motor 343 By counting the number of driving pulses to be performed, the amount of movement of the insertion / removal unit 32 in the Y-axis direction is calculated and realized.

  For example, when the motor 343 of the Y-axis direction moving means 34 is a servomotor, a rotary encoder is connected to the servomotor, and the rotary encoder is connected to the servo amplifier, the operation signal is sent from the servo amplifier to the motor 343. Is supplied, the rotary encoder outputs an encoder signal (the number of rotations of the servo motor) to the servo amplifier. Then, based on the encoder signal received by the servo amplifier, the amount of movement of the insertion / removal unit 32 in the Y-axis direction is calculated to realize the above-described positioning.

  Next, as the vertical ball screw 321 rotates in the insertion / removal means 32, the holding portion 320 descends, and the pair of chuck cylinders 320 c extend the engaged hole 310 a of the engaged portion 310 of the anode plate 31 in the X-axis direction. Positioned on the line.

  Further, the engagement pins 320a of the pair of chuck cylinders 320c protrude from the cylinder body 320b, so that they are inserted into the engagement holes 310a of the engagement portion 310. Then, in this state, the vertical ball screw 321 rotates in the reverse direction, so that the holding portion 320 rises, and the anode plate 31 is pulled out of the liquid tank 2. Here, the liquid tank 2 does not have a groove that positions the anode plate 31 as in the conventional case and extends in the depth direction of the liquid tank 2, and thus the anode plate 31 is not inserted into the groove. The anode plate 31 to which the silicon dust P has adhered can be easily pulled out of the liquid tank 2 without the anode plate 31 getting caught in the tank 2.

  Next, the Y-axis direction moving unit 34 moves the holding unit 320 holding the anode plate 31 to just above the separating unit 50 by rotating the horizontal ball screw 340. When the vertical ball screw 321 rotates in the insertion / removal unit 32, the holding unit 320 descends, and the anode plate 31 is inserted into the housing 500 of the separation unit 50. At this time, a pair of scrapers (not shown) provided in the housing 500 of the separation unit 50 are in parallel with each other at intervals in the Y-axis direction.

  After the anode plate 31 descends into the housing 500, a pair of scrapers sandwich the surface of the anode plate 31. In this state, the holding portion 320 holding the anode plate 31 of the insertion / removal unit 32 is pulled up, for example, upward, so that the pair of scrapers peel off the silicon dust P attached to the anode plate 31. The silicon waste P peeled off from the anode plate 31 is stored in a silicon waste tank 56.

  When the anode plate 31 from which the silicon dust P has been stripped further rises and is lifted above the separation unit 50, the horizontal movement of the Y-axis direction moving means 34 in the direction opposite to the direction in which the anode plate 31 is transported to the separation unit 50. The ball screw 340 is rotated, and the anode plate 31 is moved to a position above the original storage location of the liquid tank 2 and positioned.

When the motor 343 of the Y-axis direction moving means 34 is a pulse motor, the positioning is realized by counting the number of drive pulses supplied to the motor 343 by a control means (not shown). Alternatively, when the motor 343 of the Y-axis direction moving unit 34 is a servo motor, the servo amplifier is realized by receiving an encoder signal from a rotary encoder.
Alternatively, as in the waste liquid treatment apparatus 1 of the present embodiment, the anode plate 31 includes an overhang portion 315 having an upper portion projecting outward on both sides, and the liquid tank 2 has a positioning groove 27 for positioning and mounting the overhang portion 315 on the upper portion. In the case where the positioning groove 27 is provided, for example, an optical sensor or the like for detecting the positioning groove 27 may be provided in the holding section 320 and the positioning groove 27 may be detected by the optical sensor.

In any case where the positioning of the anode plate 31 above the original storage location of the liquid tank 2 is realized by any of the above-described methods, the positioning does not require high accuracy and may be slightly shifted. No problem. This is because, in the waste liquid treatment apparatus 1 according to the present invention, the liquid tank 2 does not include a groove that positions the anode plate 31 and extends in the depth direction of the liquid tank 2 as in the related art. This is because the cathode plate 30 and the anode plate 31 are provided with the interval forming portions 309 protruding from at least both surfaces of the cathode plate 30 in order to form a predetermined interval in the Y-axis direction in 2.
Further, in the present embodiment, in the two anode plates 31 at one end and the other end in the Y-axis direction, only one surface is opposed to the cathode plate 30, and the other surface is the liquid tank 2. Of each side wall 22b. Therefore, by providing the interval forming portion 309 on the inner wall surface of each side wall 22 b of the liquid tank 2 facing the anode plate 31, a predetermined distance is also provided between the two anode plates 31 and each side wall 22 b of the liquid tank 2. Is preferred because it can be formed.

  As the vertical ball screw 321 rotates in the insertion / removal means 32, as shown in FIG. 4, the holding part 320 holding the anode plate 31 after the silicon dust P has been peeled off descends, and Then, the anode plate 31 lands on the processing waste liquid L. Here, since the liquid tank 2 does not have a groove extending in the depth direction as in the related art, a situation in which the silicon plate P is clogged in the conventional groove and the anode plate 31 cannot be inserted into the liquid tank 2 is considered. Does not occur.

  Even if there is a slight shift in the position of the anode plate 31 above the original storage location of the liquid tank 2, the cathode plate 30 and the reinserted anode plate 31 in the liquid tank 2 have a predetermined position in the Y-axis direction. Form an interval. That is, the anode plate 31 descending in the liquid tank 2 first comes into contact with the slope of the interval forming portion 309 formed on the cathode plate 30. For example, the interval forming portion 309 has a substantially semi-disc-like, substantially hemispherical, conical or pyramid-shaped outer shape (that is, an outer shape having a slope), and the anode plate 31 is provided on the slope of the space forming portion 309. The position in the Y-axis direction is lowered toward the gap between the interval forming portions 309 of the adjacent cathode plates 30 while sliding, while the position is corrected.

  As a result, the anode plate 31 descends to a predetermined depth in the liquid tank 2, so that the cathode plate 30 and the anode plate 31 are formed in the liquid tank 2 with a predetermined interval formed by the interval forming unit 309. Further, the overhang portion 315 of the anode plate 31 is placed on the positioning groove 27 formed on the upper portion of the liquid tank 2. In addition, it is preferable that the positioning groove 27 is, for example, a groove having a V-shaped cross section, so that the position correction at the time of inserting the anode plate 31 can be performed more smoothly when there is a deviation in the positioning. Since the positioning groove 27 is formed on the upper part of the liquid tank 2, the positioning groove 27 is not clogged with the silicon dust P.

  The waste liquid treatment apparatus 1 according to the present invention is not limited to the present embodiment, and the shape, size, and the like of each component of the waste liquid treatment apparatus 1 illustrated in the accompanying drawings are not limited thereto. However, it can be appropriately changed within a range where the effects of the present invention can be exhibited.

1: Waste liquid treatment apparatus 10: Housing 2: Liquid tank 21: Bottom plate 22a: Side wall 224: Support groove 27: Positioning groove 22b: Side wall 223: Supply port P: Silicon dust L: Processing waste liquid 30: Cathode plate 309: Interval formation Part 31: Anode plate 310: Engaged part 310a: Engaged hole 315: Projecting part 32: Insertion / removal means
320: holding portion 320d: plate member 320c: pair of chuck cylinders 320a: engagement pin 320b: cylinder body 329: vertical plate 321: vertical ball screw 322: pair of guide rails 34: Y-axis direction moving means 340: horizontal ball screw 341 : Guide rail 342: movable member 38: fresh water sending means 381: fresh water suction pipe 381 a: fresh water suction port 382: open / close valve 382: connecting pipe 40: waste liquid storage tank 402: pump 403: liquid supply pipe 41: fresh water storage tank 410: Tank body 411: Defoaming inclined plate 412: Supply port 50: Separator 500: Housing 56: Silicon waste tank 57: Hydrogen gas discharging means

Claims (2)

A waste liquid treatment device that separates processing waste liquid mixed with silicon waste into silicon waste and fresh water,
A liquid tank for storing the processing waste liquid,
A cathode plate disposed at equal intervals in the liquid tank and negatively charged,
An anode plate which is disposed so as to face the cathode plate and is separated from the cathode plate at a predetermined interval so as to be removable from the liquid tank and is positively charged;
Withdrawing and inserting means for holding the upper part of the anode plate and extracting the anode plate from the liquid tank or inserting it into the liquid tank;
A waste liquid treatment apparatus comprising: a gap forming section that at least protrudes from both surfaces of the cathode plate to form the predetermined gap between the cathode plate and the anode plate in the liquid tank. The anode plate has an overhanging portion whose upper portion projects outward on both sides,
The liquid tank is provided with a positioning groove for positioning and mounting the overhang on the upper part,
The waste liquid treatment device according to claim 1.

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