CN103861662B - 带有氧化铝阻隔层的防结焦催化剂涂层 - Google Patents
带有氧化铝阻隔层的防结焦催化剂涂层 Download PDFInfo
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- CN103861662B CN103861662B CN201210541299.2A CN201210541299A CN103861662B CN 103861662 B CN103861662 B CN 103861662B CN 201210541299 A CN201210541299 A CN 201210541299A CN 103861662 B CN103861662 B CN 103861662B
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- 239000003054 catalyst Substances 0.000 title claims abstract description 73
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 230000004888 barrier function Effects 0.000 title claims abstract description 39
- 238000004939 coking Methods 0.000 title claims abstract description 38
- 238000000034 method Methods 0.000 claims abstract description 73
- 239000011159 matrix material Substances 0.000 claims abstract description 71
- 230000008569 process Effects 0.000 claims abstract description 38
- 239000002002 slurry Substances 0.000 claims description 38
- 229910052782 aluminium Inorganic materials 0.000 claims description 27
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 26
- 238000010438 heat treatment Methods 0.000 claims description 18
- 238000005269 aluminizing Methods 0.000 claims description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 14
- 239000011651 chromium Substances 0.000 claims description 13
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 229910052804 chromium Inorganic materials 0.000 claims description 10
- 238000005253 cladding Methods 0.000 claims description 8
- 230000001590 oxidative effect Effects 0.000 claims description 8
- 238000007747 plating Methods 0.000 claims description 7
- 239000012298 atmosphere Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 238000005229 chemical vapour deposition Methods 0.000 claims description 5
- 229910002761 BaCeO3 Inorganic materials 0.000 claims description 3
- 229910002262 LaCrO3 Inorganic materials 0.000 claims description 3
- 229910002328 LaMnO3 Inorganic materials 0.000 claims description 3
- 229910021523 barium zirconate Inorganic materials 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 238000007750 plasma spraying Methods 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 230000005611 electricity Effects 0.000 claims 1
- 238000004062 sedimentation Methods 0.000 claims 1
- 238000007613 slurry method Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 80
- 239000000843 powder Substances 0.000 description 16
- 238000012360 testing method Methods 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 15
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 10
- 238000001291 vacuum drying Methods 0.000 description 10
- 229910000831 Steel Inorganic materials 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 229930195733 hydrocarbon Natural products 0.000 description 9
- 150000002430 hydrocarbons Chemical class 0.000 description 9
- 239000010959 steel Substances 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 238000005336 cracking Methods 0.000 description 8
- 238000005235 decoking Methods 0.000 description 8
- 239000004215 Carbon black (E152) Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 239000012071 phase Substances 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 229910000951 Aluminide Inorganic materials 0.000 description 5
- 238000002441 X-ray diffraction Methods 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000011572 manganese Substances 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 239000002243 precursor Substances 0.000 description 5
- 238000004227 thermal cracking Methods 0.000 description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 239000004411 aluminium Substances 0.000 description 4
- 150000001399 aluminium compounds Chemical class 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- QFFVPLLCYGOFPU-UHFFFAOYSA-N barium chromate Chemical compound [Ba+2].[O-][Cr]([O-])(=O)=O QFFVPLLCYGOFPU-UHFFFAOYSA-N 0.000 description 3
- 229940083898 barium chromate Drugs 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 239000000571 coke Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000007792 gaseous phase Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 238000007431 microscopic evaluation Methods 0.000 description 3
- 239000010955 niobium Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 238000000197 pyrolysis Methods 0.000 description 3
- 238000004088 simulation Methods 0.000 description 3
- 238000007581 slurry coating method Methods 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 101150058765 BACE1 gene Proteins 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- 229910052777 Praseodymium Inorganic materials 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910052771 Terbium Inorganic materials 0.000 description 2
- 229920004890 Triton X-100 Polymers 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000000498 ball milling Methods 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000013036 cure process Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000003746 solid phase reaction Methods 0.000 description 2
- 238000010671 solid-state reaction Methods 0.000 description 2
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 2
- -1 timber Substances 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- 229910000789 Aluminium-silicon alloy Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 229910015372 FeAl Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical group [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910001005 Ni3Al Inorganic materials 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910052773 Promethium Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium chloride Substances Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910001593 boehmite Inorganic materials 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000010835 comparative analysis Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013058 crude material Substances 0.000 description 1
- 239000010779 crude oil Substances 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- 230000007850 degeneration Effects 0.000 description 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 238000005194 fractionation Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- 239000003906 humectant Substances 0.000 description 1
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000001802 infusion Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 210000001161 mammalian embryo Anatomy 0.000 description 1
- 239000004531 microgranule Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- VQMWBBYLQSCNPO-UHFFFAOYSA-N promethium atom Chemical compound [Pm] VQMWBBYLQSCNPO-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000002296 pyrolytic carbon Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 229910000601 superalloy Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052713 technetium Inorganic materials 0.000 description 1
- GKLVYJBZJHMRIY-UHFFFAOYSA-N technetium atom Chemical compound [Tc] GKLVYJBZJHMRIY-UHFFFAOYSA-N 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- FRNOGLGSGLTDKL-UHFFFAOYSA-N thulium atom Chemical compound [Tm] FRNOGLGSGLTDKL-UHFFFAOYSA-N 0.000 description 1
- 229940126680 traditional chinese medicines Drugs 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0215—Coating
- B01J37/0225—Coating of metal substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
- B01J8/06—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds in tube reactors; the solid particles being arranged in tubes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/002—Mixed oxides other than spinels, e.g. perovskite
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/02—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the alkali- or alkaline earth metals or beryllium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/10—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of rare earths
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/24—Chromium, molybdenum or tungsten
- B01J23/26—Chromium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/32—Manganese, technetium or rhenium
- B01J23/34—Manganese
-
- B01J35/30—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0215—Coating
- B01J37/0217—Pretreatment of the substrate before coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0215—Coating
- B01J37/0225—Coating of metal substrates
- B01J37/0226—Oxidation of the substrate, e.g. anodisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0238—Impregnation, coating or precipitation via the gaseous phase-sublimation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10G—CRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
- C10G75/00—Inhibiting corrosion or fouling in apparatus for treatment or conversion of hydrocarbon oils, in general
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10G—CRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
- C10G9/00—Thermal non-catalytic cracking, in the absence of hydrogen, of hydrocarbon oils
- C10G9/14—Thermal non-catalytic cracking, in the absence of hydrogen, of hydrocarbon oils in pipes or coils with or without auxiliary means, e.g. digesters, soaking drums, expansion means
- C10G9/16—Preventing or removing incrustation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
- C23C10/30—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes using a layer of powder or paste on the surface
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0209—Pretreatment of the material to be coated by heating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/06—Compressing powdered coating material, e.g. by milling
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/10—Coating starting from inorganic powder by application of heat or pressure and heat with intermediate formation of a liquid phase in the layer
- C23C24/103—Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides
- C23C24/106—Coating with metal alloys or metal elements only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/10—Oxidising
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/80—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/06—Details of tube reactors containing solid particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/78—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with alkali- or alkaline earth metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/83—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with rare earths or actinides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/84—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/85—Chromium, molybdenum or tungsten
- B01J23/86—Chromium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
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Abstract
本发明涉及一种工件,该工件包括金属基体、防结焦催化剂层、以及设置在金属基体和防结焦催化剂层之间的氧化铝阻挡层。本发明还涉及制造该工件的工艺方法。
Description
技术领域
本发明一般涉及一种适合用于如重质石油的热裂解反应装置的工件,具体地,涉及一种具有用来防止结焦和堵塞的防结焦催化剂涂层和用来防止该催化剂层钝化的氧化铝阻挡层的工件,以及制造该工件的方法。
背景技术
为了防止在重质石油热裂解过程中使用的工件上形成结焦和堵塞,常用各种防结焦催化剂来减少或防止结焦。比如,研究发现钙钛矿催化剂对于消除和(或)减少热裂解如乙烯裂解工艺中所用的锅炉管上的结焦具有很好的效果。防结焦的催化剂一般镀覆在需要接触高温下被处理的重质石油物料的工件内表面上。对于在重质石油热裂解的工艺中所使用的工件,即便是镀覆有防结焦的催化剂,也需要进行常规的(长期的或重复的)除焦处理,以将堆积在工件壁上的焦炭沉淀物除去。一种典型的除焦过程一般涉及在氧化条件下将焦炭沉淀物氧化形成二氧化碳和其他产物。然而,在所述除焦过程中(氧化条件下)的加热条件下,有些防结焦催化剂,如钙钛矿催化剂可能会与工件基体扩散出来的某些元素发生反应,导致催化剂的催化活性下降。比如,在除焦过程中,由含铬材料制成的锅炉管上的钙钛矿催化剂可能会与从该锅炉管扩散出来的铬发生反应,生成没有催化活性的物质。因此,需要提供一种可用于热裂解工艺的工件,其上有防结焦催化剂层,该催化剂层不会被其所覆盖的基体中扩散出来的元素钝化导致失效。
发明内容
本发明的一方面涉及一种工件,该工件包括金属基体、防结焦催化剂层、以及在该金属基体和防结焦催化剂层之间的氧化铝阻挡层。
本发明的另一方面涉及一种工艺,该工艺包括以下步骤:对金属基体进行镀铝;对镀铝后的金属基体进行热处理以形成覆盖所述金属基体的氧化铝阻挡层;以及在所述氧化铝阻挡层上镀覆防结焦催化剂层。
附图说明
通过结合附图对于本发明的实施例进行描述,可以更好地理解本发明,在附图中:
图1为一个工件的示意图,该工件在其金属基体和催化剂镀层之间有氧化铝阻挡层。
具体实施方式
本文中所使用的近似性的语言可用于定量表述,表明在不改变基本功能的情况下可允许数量有一定的变动。因此,用“大约”、“左右”等语言所修正的数值不限于该准确数值本身。在一些实施例中,“大约”或“左右”表示允许其修正的数值在正负百分之十(10%)的范围内变化,比如,“大约100”表示的可以是90到110之间的任何数值。此外,在“大约第一数值到第二数值”的表述中,“大约”同时修正第一数值和第二数值两个数值。在某些情况下,近似性语言可能与测量仪器的精度有关。
本发明中所提及的数值包括从低到高一个单元一个单元增加的所有数值,此处假设任何较低值与较高值之间间隔至少两个单元。举例来说,如果说了一个组分的数量或一个工艺参数的值,比如,温度,压力,时间等等,是从1到90,20到80较佳,30到70最佳,是想表达15到85,22到68,43到51,30到32等数值都已经明白的列举在此说明书中。对于小于1的数值,0.0001,0.001,0.01或者0.1被认为是比较适当的一个单元。前述例子仅作举例说明之用,实际上,所有在列举的最低到最高值之间的数值组合均被视为以类似方式清楚地列在本说明书中。
除有定义外,本文中所用的技术和科学术语具有与本发明所述领域技术人员普遍理解的相同含义。本文所用的术语“第一”、“第二”等并不表示任何顺序、数量或重要性,而只是用于区别一种元件和另一种元件。并且,所述“一”或“一个”不表示数量的限定,而是表示存在一个的相关项目。
在高温下处理原料的工件,比如,在烃类热裂解过程中使用的工件,其用于接触被处理的烃类原料的内表面上一般镀覆有一层防结焦催化剂,用来防止结焦和堵塞。在本发明的实施例中,在金属基体和防结焦催化剂层之间设置有氧化铝阻挡层,该氧化铝阻挡层可防止一种或多种会导致催化剂失效的元素从所述金属基体扩散到催化剂层中去。
本发明所称“反应装置”是指石化流程中使用的裂解炉管、管路接头、反应容器和辐射管或卷中的至少一种。反应装置可以是一个裂解炉,其包括燃烧室,通过燃烧室运行着一个管阵列。该管阵列和相应的配件总共有几百米。管列阵可包括直管和弯管。
在基体和防结焦催化剂层之间有氧化铝阻挡层的工件可用于应避免焦炭堆积的烃类裂解反应装置中。该反应装置可以是任何可用于烃类裂解的反应装置。在一些实施例中,该反应装置包括裂解炉管、管路接头、反应容器和辐射管或卷中的至少一种。在一些实施例中,反应装置内置有温度在大约500°C到大约1000°C的炉管的燃烧室。
本发明所称“烃类裂解”包括但不限于如乙烷、丙烷、丁烷和石脑油等烃类在水蒸气重量百分比为约30%到约70%时于反应装置中裂解以制取如乙烯和丙烯等低碳烯烃。诸如原油经过常压或减压分馏获得的渣油等烃类有时也在反应装置中裂解,反应温度为约480°C到约600°C,水蒸汽重量百分比为约1%到约2%。
本发明所称“焦炭”包括但不限于来自煤、石油、木材、烃及其他含碳物质的含碳固体或液体或形成含碳固体或液体的微粒或高分子,例如,烃类裂解炉里存在的炭黑、焦油及热解碳。
本发明的一个方面提供了一种包括氧化铝阻挡层的工件。如图1所示,工件100包括金属基体102、防结焦催化剂层104、以及形成于金属基体102和防结焦催化剂层104之间的氧化铝阻挡层106。在所述金属基体102和氧化铝阻挡层106之间可能还会有铝化物层(未图示)。所述金属基体102可以是任何形状。在一个实施例中,所述金属基体为一个管状物,其具有一个用来接触在高温下被处理的氧化性原料的内表面,所述氧化铝阻挡层覆盖管状物的内表面,而防结焦催化剂层形成于所述氧化铝阻挡层上。所述金属基体102可由包括但不限于铁基合金、镍基合金和钴几合金的金属材料制成。对于用于热裂解工艺的工件,其基体可包含铬、镍和铁中的至少一种,在一个具体的实施例中,其基体由一种含铬、镍和铁的金属材料制成。非限制性地举例来说,合适的金属材料包括25Cr20Ni钢、35Cr45Ni钢、以及镍基超合金。在一些实施例中,所述基体中铝的质量百分含量小于3%,或更进一步地,小于0.05%。
所述防结焦催化剂层104中的催化剂可以是化学式为AaBbCcDdO3-δ的钙钛矿材料,其中,0<a<1.2,0≤b≤1.2,0.9<a+b≤1.2,0<c<1.2,0≤d≤1.2,0.9<c+d≤1.2,-0.5<δ<0.5;
A选自钙(Ca)、锶(Sr)、钡(Ba)及其组合;
B选自锂(Li)、钠(Na)、钾(K)、铷(Rb)及其组合;
C选自铈(Ce)、锆(Zr)、锑(Sb)、镨(Pr)、钛(Ti)、铬(Cr)、锰(Mn)、铁(Fe)、钴(Co)、镍(Ni)、镓(Ga)、锡(Sn)、铽(Tb)及其组合;
D选自镧(La)、铈(Ce)、镨(Pr)、钕(Nd)、钷(Pm)、钐(Sm)、铕(Eu)、钆(Gd)、铽(Tb)、镝(Dy)、钬(Ho)、铒(Er)、铥(Tm)、镱(Yb)、镥(Lu)、钪(Sc)、钛(Ti)、钒(V)、铬(Cr)、锰(Mn)、铁(Fe)、钴(Co)、镍(Ni)、铜(Cu)、锌(Zn)、钇(Y)、锆(Zr)、铌(Nb)、钼(Mo)、锝(Tc)、钌(Ru)、铑(Rh)、钯(Pd)、银(Ag)、镉(Cd)、铪(Hf)、钽(Ta)、钨(W)、铼(Re)、锇(Os)、铱(Ir)、铂(Pt)、金(Au)、镓(Ga)、铟(In)、锡(Sn)、锑(Sb)及其组合。
在一些具体的实施例中,所述防结焦催化剂是选自改性LaCrO3、改性LaMnO3、BaCeO3、BaZrO3,BaCexZr(1-x)O3,BaCexY(1-x)O3及其组合,其中0≤x≤1。特别地,所述催化剂可为BaCe0.7Zr0.3O3。
在一些实施例中,所述防结焦催化剂层104中的催化剂为三斜霞石。本发明所称“三斜霞石”包括但不限于具有氧化钠-稳定(或嵌入或富有)的高三斜霞石晶体结构的材料,即拥有一定数量氧化钠嵌入立方主晶格且群体对称为P213或的晶体结构的物质。
所述氧化铝阻挡层106为致密的α-氧化铝阻挡层,可阻止铬等干扰元素从基体102扩散到催化剂层104中。在一些实施例中,所述氧化铝阻挡层106的厚度为约0.01微米到约10微米,或更进一步地,为约1微米到约5微米。
通过对所述金属基体镀铝然后再进行热处理,可形成一层覆盖所述金属基体的氧化铝阻挡层,再往所述氧化铝阻挡层上涂覆防结焦的催化剂,如钙钛矿,可形成一层催化剂层。除了所述氧化铝阻挡层外,所述金属基体和催化剂层之间还可能有其他附加层。比如,在一些实施例中,在形成所述氧化铝阻挡层后,所述在镀铝的过程中形成的铝化物层可能仍然存在,因此在金属基体和氧化铝阻挡层之间还有铝化物层。可通过化学气相沉积法(chemical vapor deposition,CVD)、浆料涂覆法、电镀法、热浸渍法或喷涂法等方法对所述金属基体进行镀铝。
若用化学气相沉积法对所述金属基体进行镀铝,可将所述金属基体放置到一个真空炉中,在约为0.1-5.0Pa的压力和约为800-1200°C或更进一步地约为800-1100°C的温度下焙烧约2-24小时。适合用作镀铝的前体化合物包括气相氯化铝(AlCl3)以及在镀铝的条件下可生成气相AlCl3的材料。气相的镀铝前体化合物可输送到给金属基体镀铝的真空炉中。固相的镀铝前体化合物可与金属基体一起放置到真空炉内。在一个具体的实施例中,气相AlCl3是用氢气为载气输送到所述真空炉的。在一个具体的实施例中,以包括铝、铁和氯化铵(NH4Cl)的固体粉末为镀铝前体化合物,与金属基体一起放置到真空炉中,在真空炉内的条件下,铝和NH4Cl发生反应生成气相AlCl3。所述固体粉末中所含的铁起到缓冲剂的作用,减慢铝和NH4Cl之间的反应。可向真空炉中通入氢气来辅助所述镀铝的过程。所述焙烧的时间取决于所需的阻挡层的厚度,时间越长,产生的涂层越厚。
若用浆料涂覆法对所述金属基体进行镀铝,可将一种含铝的浆料涂覆到金属基体上,再对该涂覆有浆料的金属基体进行热处理。浆料中的铝扩散到所述金属基体的表面区域,在金属基体的表面形成金属铝化物层。在一些具体的实施例中,所述金属基体通过如美国专利US7,569,283、US7,332,024和US7,829,142所描述的浆料涂覆法进行镀铝,该等美国专利US7,569,283、US7,332,024和US7,829,142的内容以引用的方式全部纳入本文。
可使用各种不同成分的浆料。除了上述美国专利US7,569,283、US7,332,024和US7,829,142中所描述的浆料之外,还可使用如美国专利US7,270,852、US7,449,241和US7,896,962中所描述的浆料成分,该等美国专利US7,270,852、US7,449,241和US7,896,962的内容在此以引用的方式全部纳入本文。所述浆料可通过水拭法、油漆法、离心法、喷涂法、填充并排出法、或浸渍法涂覆到所述金属基体上。
在一个具体的实施例中,所述浆料的成分包括铝基粉末、氧化硅(colloidalsilica)和甘油。其中所述铝基粉末可以是任何铝的质量百分含量大于75%的粉末,如铝粉、铝-硅合金粉及其组合。所述涂覆有一层浆料的金属基体在约50-250°C的温度下进行几小时的硬化处理,以干燥所述浆料层,再对其进行一个三阶段加热的焙烧处理和一个两阶段的扩散热处理。在所述扩散热处理过程中,所述浆料中的铝扩散到所述金属基体中以在金属基体表面形成金属铝化物(如FeAl、CrAl和Ni3Al)层。
所述镀铝后的金属基体可在约800°C至约1100°C,或更进一步地,在约900°C至约1000°C的温度下,压力约0.05-0.5Pa的氧化气氛中进行热处理,在该热处理的过程中,所述金属铝化物被氧化,形成一个覆盖所述金属基体的氧化铝阻挡层。可能还会有部分金属铝化物保留在所述金属基体和氧化铝阻挡层之间。
所述防结焦的催化剂可通过等离子喷涂、化学气相沉积或浆料涂覆法等方法涂覆到所述氧化铝阻挡层上。在一些实施例中,可通过浆料涂覆法将一种钙钛矿催化剂涂覆到所述氧化铝阻挡层上。一种通过浆料涂覆法将钙钛矿催化剂涂覆到氧化铝阻挡层上的工艺包括以下步骤:制备一种包含钙钛矿催化剂的浆料;在所述金属基体上涂敷一层所述浆料;然后烧结所述涂覆有浆料的金属基体。所述浆料可用钙钛矿催化剂粉末和有机粘结剂、润湿剂和溶剂中的至少一种制备而成。在烧结所述涂覆有浆料的金属基体之前,可在一个比烧结温度更低的温度下将所述浆料层干燥。在一个具体的实施例中,所述涂覆有浆料的金属基体在约100°C的温度下进行干燥,然后在约900-1100°C的温度下在氩气气氛中烧结约2-5小时。
在一些具体的实施例中,采用了一种如第11/63324号美国专利申请中所描述的浆料成分和浆料涂覆方法,该第11/63324号美国专利申请的内容在此以引用的方式全部纳入本文。一种包括钙钛矿催化剂和一种无机材料的浆料被涂覆到工件(反应装置)的表面,其中所述无机材料包括氧化铈、氧化锌、氧化锡、氧化锆、勃姆石和二氧化硅中的至少一种。在约1000°C的温度下烧结所述浆料涂层,形成一个覆盖所述工件表面的钙钛矿催化剂层。
实例1
在本实例中,以九个25Cr20Ni钢制成的取样片(样品)作基体,其中所述25Cr20Ni钢制成的取样片的以质量百分比表示的成分如下表所示。
C | Si | Mn | Cr | Ni | Fe |
0.13% | 0.48% | 1.35% | 26.25% | 21% | 余量 |
所述取样片先用粗砂纸打磨,再进行Al2O3喷沙处理,然后在酒精中进行超声清洁。然后用化学气相沉积镀铝法对所述清洁后的取样片进行镀铝,镀铝的参数为:
压力:0.8Pa
温度:1050°C
时间:6小时
镀铝过程中以具有下表所示组分(质量百分比)的固体粉末作为前体化合物。
Al | NH4Cl | Fe |
50% | 3% | 余量 |
通过所述化学气相沉积镀铝工艺,在各取样片的表面形成一个铝化物层。将九个镀铝后的取样片清洗之后,将其中的八个(样品1-8)进行热处理以使铝化物氧化形成氧化铝层,而将剩余的一个(样品9)留着用于直接涂覆催化剂层。在热处理过程中,所述八个镀铝后的取样片被放置一个真空炉中,该真空炉在约3小时内被加热到约900°C至约1000°C,然后被充入空气至压力达约0.05Pa至约0.5Pa,保持约20小时到约30小时。基于比较分析的目的,所述八个取样片被分成四组,分别以不同的参数进行热处理,具体的热处理参数如下表所示。
样品 | 温度(°C) | 压力(Pa) | 时间(小时) |
1 | 1000 | 0.05 | 20 |
2 | 1000 | 0.05 | 20 |
3 | 900 | 0.05 | 30 |
4 | 900 | 0.05 | 30 |
5 | 900 | 0.5 | 20 |
6 | 900 | 0.5 | 20 |
7 | 1000 | 0.5 | 30 |
8 | 1000 | 0.5 | 30 |
经过所述热处理之后,在所述八个取样片上分别形成了一个厚度约为1-5微米的氧化铝层。通过比较所述分别形成于样品1-8上的氧化铝层的厚度,发现氧化铝层的厚度随着热处理温度和时间的增大而增大,并随着热处理压力的减小而增大。
再通过浆料涂覆工艺,在样品1-8(镀铝并氧化后的样品)、样品9(镀铝但未氧化的样品)和一个无覆盖的25Cr20Ni钢样品(样品10,既未镀铝也未氧化)上分别形成防结焦催化剂层,该浆料涂覆工艺包括以下步骤:
(1)催化剂(BaCe0.7Zr0.3O3)粉末制备
所述催化剂(BaCe0.7Zr0.3O3)粉末通过固相反应(solid-state reaction)的方法获得。在乙醇中混合高纯度碳酸钡、氧化锆、氧化铈和氧化钇粉末(均来自中国上海国药集团化学试剂有限公司),并球磨12小时。然后将制得的混合物在1450°C下空气中烘干并煅烧6小时,从而制得BaCe0.7Zr0.3O3粉末。将制得的粉末与酒精混合,然后再球磨12小时,等酒精干后,获得了催化剂细粉(d50=1.5um)。
(2)浆料制备
将31.37克用前述方法制得的BaCe0.7Zr0.3O3粉末加到一个塑料罐中;将46.72克CeO2溶胶(在水中的质量百分含量为20%,Alfa Aesar #12730)加入到所述塑料罐中,用作无机粘结剂来提高BaCe0.7Zr0.3O3的涂层强度;添加4.41克甘油,以提高浆料的润湿能力;添加12.63克PVA(质量百分含量为10%的水溶液)以获得良好的以获得良好的生胚涂层强度;再添加10ul的Triton X100,用作消泡剂。具体的配方如下表所示。
BaCe0.7Zr0.3O3 | 31.37克 |
CeO2溶液 | 46.72克 |
甘油 | 4.41克 |
PVA | 12.63克 |
Triton X100 | 10ul |
将所述塑料罐安装到高速混合器中,以2000RPM的转速混合3分钟,获得均匀的浆料。
(3)浆料的涂布
将各样品浸入所述浆料中使其涂上一层浆料,干燥所述浆料层,再将有干燥的浆料层的样品放到烧结炉中,在1000°C下氩气气氛中烧结3小时,再以约1-6℃/分钟的冷却速度将样品冷却,这样,各样品上镀覆上了一层BaCe0.7Zr0.3O3催化剂层。结果发现,与样品9相比,样品1-8上的催化剂层的附着性能明显更好,而样品9上的催化剂层部分剥落。
所述样品10(BaCe0.7Zr0.3O3直接镀覆在无覆盖的25Cr20Ni钢基体上)在900°C下空气氧化气氛中模拟加速除焦试验,试验发现,在空气中氧化8小时之后,样品上的BaCe0.7Zr0.3O3催化剂层转变成黄色(铬酸钡的颜色)。将样品取出做X射线衍射(XRD)显微分析,分析结果显示催化剂层中的主要成分为铬酸钡。BaCe0.7Zr0.3O3已和铬发生反应生成了铬酸钡。XRD分析后,对样品10进行模拟裂解试验,发现在模拟裂解试验中样品10上的催化剂层几乎已经失效。
将样品1-8在900°C下空气中模拟除焦过程进行200小时疲劳测试,其间每隔50小时将样品取出做XRD显微分析。分析结果显示,样品1-8上的催化剂持续了200小时而没有发生退化。此外,实验发现,经过200小时后,样品1-8上的催化剂层与基体之间仍有良好的附着力。再对所述经过200小时疲劳测试后的样品1-8进行了模拟裂解试验,在该模拟裂解试验中样品1-8上的催化剂显示了良好的防结焦性能。
实例2
在本实例中,用35Cr45Ni钢制成的取样片作基体,以实例1中所述的工艺流程制备了样品,其中35Cr45Ni钢制成的取样片的以质量百分比表示的成分如下表所示。
Ni | Cr | Si | C | Nb | Fe |
45% | 35% | 2.5% | 0.45% | 1.5% | 余量 |
通过实例1中所述的工艺流程,在各样品上镀有一层BaCe0.7Zr0.3O3催化剂。
类似地,将获得的样品在900°C下空气中模拟除焦过程进行200小时疲劳测试,其间每隔50小时将样品取出做XRD显微分析。分析结果显示,这些样品上的催化剂持续了200小时而没有发生退化。此外,实验发现,经过200小时后,这些样品上的催化剂层与基体之间仍有良好的附着力。再对所述经过200小时疲劳测试后的样品进行了模拟裂解试验,在该模拟裂解试验中样品上的催化剂显示了良好的防结焦性能。
实例3
在本实例中,以和实例1中成分相同的25Cr20Ni钢制成的取样片作基体,以和实例1类似但镀铝工艺不同的流程制备了样品。本实例中采用了一种与实例1不同的工艺对取样片进行了镀铝。
在本实例的镀铝过程中,对取样片进行Al2O3喷沙处理,然后在约240°C的烤箱中进行约4小时的热脱脂处理。然后在取样片上涂覆一层含铝的浆料,该浆料的以质量百分比表示的成分为:8%的甘油、32%的LP-30氧化硅、45%的铝粉(颗粒尺寸约为10微米)和15%的铝-硅合金粉。在入口空气压力约为40Psi的条件下将所述浆料涂覆到所述取样片上,在各取样片上涂上厚度为约43微米到约89微米的一层浆料。将所述涂有浆料的取样片放入烤箱中进行硬化处理,将烤箱加热到约80°C保持约1小时,再加热到约120°C保持约0.5小时,再加热到约220°C保持约1小时。然后将所述取样片放入一个真空炉中,加热至约649°C保持约15分钟,同时往该真空炉中输入氩气使炉内压力达到0.5托(626.5Pa),然后再加热到约871°C保持约2小时。这样,浆料中的铝扩散到取样片中,在各取样片的表面形成铝化物的涂层。然后,将炉中的取样片冷却后取出并将其上的残渣磨去。
然后再用实例1中的工艺流程对所述取样片进行热处理以形成氧化铝层,并在氧化铝层上涂覆形成BaCe0.7Zr0.3O3催化剂层。
类似地,将获得的样品在900°C下空气中模拟除焦过程进行200小时疲劳测试,其间每隔50小时将样品取出做XRD显微分析。分析结果显示,这些样品上的催化剂持续了200小时而没有发生退化。此外,实验发现,经过200小时后,这些样品上的催化剂层与基体之间仍有良好的附着力。再对所述经过200小时疲劳测试后的样品进行了模拟裂解试验,在该模拟裂解试验中样品上的催化剂显示了良好的防结焦性能。
本发明可用其他的不违背本发明的精神或主要特征的具体形式来概述。因此,无论从哪一点来看,本发明的上述实施方案都只能认为是对本发明的说明而不能限制本发明,本发明的范围是由权利要求书界定,而不是由上述界定的,因此,在与本发明的权利要求书相当的含义和范围内的任何改变,都应认为是包括在权利要求书的范围内。
Claims (20)
1.一种工件,其包括:
金属基体;
防结焦催化剂层;以及
在所述金属基体和防结焦催化剂层之间的氧化铝阻挡层,所述氧化铝阻挡层可阻止干扰元素从所述金属基体扩散到所述防结焦催化剂层,其中所述干扰元素包括铬。
2.如权利要求1所述的工件,其中所述金属基体为管状物,该管状物具有内表面,所述氧化铝阻挡层覆盖所述管状物的内表面,所述防结焦催化剂层形成于所述氧化铝阻挡层上。
3.如权利要求1所述的工件,其中所述金属基体包括镍和铁中的至少一种与铬。
4.如权利要求1所述的工件,其中所述金属基体中铝的质量百分含量小于3%。
5.如权利要求1所述的工件,其中所述金属基体中铝的质量百分含量小于0.05%。
6.如权利要求1所述的工件,其中所述防结焦催化剂包括钙钛矿。
7.如权利要求6所述的工件,其中所述钙钛矿选自改性LaCrO3、改性LaMnO3、BaCeO3、BaZrO3、BaCexZr(1-x)O3、BaCexY(1-x)O3及其组合,其中0≤x≤1。
8.如权利要求7所述的工件,其中所述钙钛矿为BaCexZr(1-x)O3,其中0≤x≤1。
9.如权利要求7所述的工件,其中所述钙钛矿为BaCe0.7Zr0.3O3。
10.一种工艺,其包括:
对金属基体进行镀铝;
对镀铝后的金属基体进行热处理以形成覆盖所述金属基体的氧化铝阻挡层;以及
在所述氧化铝阻挡层上形成防结焦催化剂层,其中,
所述氧化铝阻挡层可阻止干扰元素从所述金属基体扩散到所述防结焦催化剂层,所述干扰元素包括铬。
11.如权利要求10所述的工艺,其中所述金属基体为管状物,所述氧化铝阻挡层覆盖所述管状物的内表面。
12.如权利要求10所述的工艺,其中金属基体是通过化学气相沉积法、浆料涂覆法、电镀法、热浸渍法或喷涂法进行镀铝的。
13.如权利要求12所述的工艺,其中所述金属基体是通过化学气相沉积法或浆料涂覆法进行镀铝的。
14.如权利要求10所述的工艺,其中所述对镀铝后的金属基体进行热处理的步骤包括在800℃到1100℃的温度下在氧化气氛中加热所述镀铝后的金属基体。
15.如权利要求10所述的工艺,其中所述防结焦催化剂层是通过等离子喷涂法、化学气相沉积法或浆料涂覆法涂覆到所述氧化铝阻挡层上的。
16.如权利要求10所述的工艺,其中所述防结焦催化剂包括钙钛矿。
17.如权利要求16所述的工艺,其中所述钙钛矿选自改性LaCrO3、改性LaMnO3、BaCeO3、BaZrO3、BaCexZr(1-x)O3、BaCexY(1-x)O3及其组合,其中0≤x≤1。
18.如权利要求17所述的工艺,其中所述钙钛矿为BaCexZr(1-x)O3,其中0≤x≤1。
19.一种以权利要求10所述的工艺制备的涂层金属基体。
20.一种包括以权利要求10所述的工艺制备的涂层金属基体的设备。
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CN106902831A (zh) * | 2015-12-23 | 2017-06-30 | 通用电气公司 | 防结焦的催化材料、保护制品防止结焦的方法以及有防结焦涂层的制品 |
CN105885486A (zh) * | 2016-06-20 | 2016-08-24 | 天津大学 | 一种抑制炉管结焦的复合涂料、其制备方法和由其制得的复合涂层 |
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-
2012
- 2012-12-13 CN CN201210541299.2A patent/CN103861662B/zh active Active
-
2013
- 2013-11-20 ES ES13808299T patent/ES2937243T3/es active Active
- 2013-11-20 MY MYPI2015001214A patent/MY168293A/en unknown
- 2013-11-20 WO PCT/US2013/070863 patent/WO2014092944A1/en active Application Filing
- 2013-11-20 PL PL13808299.5T patent/PL2931422T3/pl unknown
- 2013-11-20 KR KR1020157018633A patent/KR20150095831A/ko not_active Application Discontinuation
- 2013-11-20 US US14/651,240 patent/US9901892B2/en active Active
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Also Published As
Publication number | Publication date |
---|---|
EP2931422B1 (en) | 2023-01-04 |
US9901892B2 (en) | 2018-02-27 |
MY168293A (en) | 2018-10-23 |
ES2937243T3 (es) | 2023-03-27 |
EP2931422A1 (en) | 2015-10-21 |
KR20150095831A (ko) | 2015-08-21 |
US20150306558A1 (en) | 2015-10-29 |
PL2931422T3 (pl) | 2023-02-27 |
CN103861662A (zh) | 2014-06-18 |
WO2014092944A1 (en) | 2014-06-19 |
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