CN103805963B - Film formation device - Google Patents
Film formation device Download PDFInfo
- Publication number
- CN103805963B CN103805963B CN201310424602.5A CN201310424602A CN103805963B CN 103805963 B CN103805963 B CN 103805963B CN 201310424602 A CN201310424602 A CN 201310424602A CN 103805963 B CN103805963 B CN 103805963B
- Authority
- CN
- China
- Prior art keywords
- outer rim
- cupola well
- film formation
- formation device
- filmogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000015572 biosynthetic process Effects 0.000 title claims abstract description 56
- 230000002093 peripheral effect Effects 0.000 claims description 34
- 239000000463 material Substances 0.000 claims description 16
- 239000002245 particle Substances 0.000 claims description 5
- 230000008676 import Effects 0.000 claims description 4
- 238000005520 cutting process Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 238000012423 maintenance Methods 0.000 abstract description 7
- 239000012528 membrane Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 5
- 238000005452 bending Methods 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- 239000011553 magnetic fluid Substances 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 230000033228 biological regulation Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 241000208340 Araliaceae Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 1
- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
- 208000031481 Pathologic Constriction Diseases 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 235000008434 ginseng Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 208000037804 stenosis Diseases 0.000 description 1
- 230000036262 stenosis Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
Abstract
The present invention provides a kind of film formation device, can cover main cupola well periphery in vertical film formation apparatus in a preferred way.In film formation device (1) involved by present embodiment, being moved through in the horizontal direction of outer rim (31) supports parts (33) and is limited.Therefore, outer rim (31) does not falls out and is able to maintain that and is supported by the state that parts (33) support.Further, it is possible to carry out rotating by outer rim (31) and make the thickness of attachment generally uniform throughout complete cycle.Therefore, it is possible to frequency of maintenance is greatly reduced.
Description
Technical field
The application advocates based on Japanese patent application filed in 9 days November in 2012 the 2012-247563rd
Priority.The entire disclosure of which is by with reference to being applied in this specification.
The present invention relates to a kind of film formation device.
Background technology
Ion plating method is such as had in the film build method being formed film by film forming matter surface.In ion plating method, make steaming
The filmogen sent out is at Dewar vessel internal diffusion, and makes filmogen be attached to by film forming matter surface.For from
In the film formation device of sub-plating method, there is the part in the filmogen of diffusion, to rest on this filmogen attached
Closely, the feelings being attached to be kept into the most main cupola well of main anode of membrane material and auxiliary electrode i.e. ring oven cylinder and pile up
Condition.Along with the accumulating amount of filmogen increases, there is the situation of main cupola well and the short circuit of ring oven cylinder.
As the method tackling above-mentioned necessity, the most as described in Patent Document 1, it is known to as follows
Method, i.e. configures the outer rim (cover) of multiple cover ring cupola well between main cupola well and ring oven cylinder, utilizes operation
The outer rim that device periodic replacement filmogen is piled up.
Patent documentation 1: Japanese Unexamined Patent Publication 2008-348318 publication
Wherein, the film formation device of patent documentation 1 is to be become by the thickness of slab direction of film forming matter with tabular by film forming matter
The horizontal film formation device of what is called carried in substantially the mode of vertical direction is configured at Dewar vessel.Therefore,
Overlapping multiple outer rims around main cupola well, but do not fix outer rim and simply place, it is possible to utilize operation
Device easily changes those outer rims.But, it is applicable to this structure be become by the thickness of slab direction of film forming matter
When the mode of general horizontal direction carries out the vertical film formation apparatus carried, there is loose outer rim and drop
Problem, thus cannot be suitable for.
Summary of the invention
Therefore, it is an object of the invention to provide one can cover in a preferred way in vertical film formation apparatus
The film formation device of main cupola well periphery.
Film formation device involved in the present invention is for heat filmogen by beam-plasma, and makes by becoming
The particle of membrane material gasification is attached to by the film formation device on film forming matter, and this film formation device possesses: as main sun
The main cupola well of pole, it has the hole running through to be kept into membrane material in the horizontal direction, and leads to filmogen
Enter beam-plasma, or be imported into beam-plasma；Outer rim, it surrounds main cupola well, and has teeth portion；Rotate
Portion, it gives the revolving force around main cupola well by the incompatible outside edge with the teeth portion card of outer rim；And support
Part, it is arranged between main cupola well and outer rim, limits the movement in the horizontal direction of outer rim, and by outer rim
Supporting is for rotating.
Film formation device involved in the present invention, owing to it is that main cupola well has the vertical of the hole run through in the horizontal direction
Formula film formation device, therefore surrounding the outer rim of main cupola well becomes and configures horizontally extendingly.Join for this
Put, limit the movement in the horizontal direction of outer rim by supporting parts.Therefore, outer rim can not drop and lead to
Cross supporting parts and maintain the state being supported by.Further, outer rim is endowed revolving force also via teeth portion from rotating part
Can rotate around main cupola well.Therefore, the filmogen evaporated can not be concentrated relative to outer rim
Adhere at one but adhere to equably throughout complete cycle.Therefore, it is possible to improve the deposition efficiency of each outer rim,
And frequency of maintenance can be greatly reduced.More than as, vertical film formation apparatus can cover master in a preferred way
Cupola well periphery.
In film formation device involved in the present invention, the attachment of the leading section cutting main cupola well can be installed in outer rim
The blade of thing.Thus, along with the rotation of outer rim, blade can cut the attachment of the leading section of main cupola well
Thing is while rotating.Thereby, it is possible to prevent attachment to be piled up in the leading section of main cupola well.
In film formation device involved in the present invention, can turn back towards inner circumferential side in the leading section of outer rim.According to this
Structure, even if attachment is stripped in outer rim, it is also possible to stop with the leading section being folded back.By
This, it is possible to prevent attachment from dropping from outer rim.
In film formation device involved in the present invention, supporting parts also can be made up of pottery.The thermostability of pottery is relatively
Height, when outer cause metal material is constituted, supporting parts can be set to the material different from the outer rim of supporting,
Therefore, it is possible to prevent sintering etc..Therefore, it is possible to make outer rim rotate swimmingly.
Invention effect
Main cupola well periphery can be covered in vertical film formation apparatus in a preferred way according to the present invention.
Accompanying drawing explanation
Fig. 1 is the vertical view section view of the structure of the film formation device involved by the 1st embodiment representing the present invention
Figure.
Fig. 2 is the side view cutaway drawing of the structure of the main cupola well mechanism periphery in enlarged representation Fig. 1.
Fig. 3 is the main cupola well in enlarged representation Fig. 2 and the side view cutaway drawing of outer rim.
Fig. 4 is the figure of gear and the rotating part observing Fig. 3 from X-axis negative direction.
Fig. 5 is the enlarged drawing of supporting parts peripheral structure.
Fig. 6 is main cupola well and the outer rim of the film formation device involved by the 2nd embodiment of the enlarged representation present invention
Side view cutaway drawing.
Fig. 7 is the figure observing the outer rim shown in Fig. 6 from X-axis positive direction.
Fig. 8 is main cupola well and the outer rim of the film formation device involved by the 3rd embodiment of the enlarged representation present invention
Side view cutaway drawing.
Fig. 9 is the figure of gear and the rotating part observing Fig. 8 from X-axis negative direction.
In figure: 1-film formation device, the main cupola well of 21-, 31-outer rim, 33-supports parts, and 39,91-gear,
40,90-teeth portion, 71-rotating part, 81-blade, Ma-filmogen.
Detailed description of the invention
Hereinafter, with reference to accompanying drawing, one embodiment of film formation device based on the present invention is described in detail.Separately
Outward, give same-sign to identical important document in the description of the drawings, and omit repeat specification.
[the 1st embodiment]
Fig. 1 is the vertical view cutaway drawing of the structure of an embodiment of the film formation device representing the present invention.Fig. 2 is
The side view cutaway drawing of the structure of the main cupola well mechanism periphery in enlarged representation Fig. 1.The film forming dress of present embodiment
Put 1 for the so-called ion plating apparatus used in ion plating method.It addition, for convenience of explanation, shown in Fig. 1
XYZ coordinate system.Y direction is that conveying is described later by the direction of film forming matter.X-direction be by film forming matter with after
The direction that the cupola well mechanism that states is opposed.Z-direction is the direction orthogonal with X-direction and Y direction.
As it is shown in figure 1, the film formation device 1 of present embodiment is so-called vertical film formation apparatus, i.e. by film forming matter
In the way of tabular is become horizontal direction by the thickness of slab direction of film forming matter, with will be upright by film forming matter or with from directly
Carried in the state that vertical state tilts is configured at Dewar vessel.Now, X-direction is horizontal direction
And be by the thickness of slab direction of film forming matter, Y direction is horizontal direction, and Z-direction becomes vertical direction.
The film formation device 1 of present embodiment possesses cupola well mechanism 2, conveying mechanism 3, ring oven cylinder 6, plasma
Source 7, pressure regulation device 8 and Dewar vessel 10.
Dewar vessel 10 has: conveying chamber 10a, its for conveying be formed filmogen film by film forming
Thing 11；Film forming room 10b, it makes filmogen Ma spread；Plasma mouth 10c, it will be from plasma source 7
The beam-plasma P irradiated is contained in Dewar vessel 10.Conveying chamber 10a, film forming room 10b and plasma mouth
10c is interconnected.Conveying chamber 10a is along predetermined conveying direction (the arrow A in figure) (along Y-axis) quilt
Set.Further, Dewar vessel 10 is made up of conductive material and is connected with earthing potential.
Conveying mechanism 3 keeps by film forming matter along conveying direction A conveying with the state opposed with filmogen Ma
11 by film forming matter holding member 16.Conveying mechanism 3 is by the multiple conveying rollers being arranged in conveying chamber 10a
15 are constituted.Conveying roller 15 configures at equal intervals along conveying direction A, same by film forming matter holding member 16 of supporting
Time, carry along conveying direction A.It addition, such as used glass substrate or plastics base by film forming matter 11
The plate-shaped members such as plate.
Plasma source 7 is barometric gradient type, its main part via be arranged on film forming room 10b sidewall etc.
Ion mouth 10c and be connected to film forming room 10b.Plasma source 7 generate beam-plasma P from plasma mouth
10c penetrates in film forming room 10b.The injection direction of beam-plasma P is arranged at turning of plasma mouth 10c
Control to coil (not shown).
Pressure regulation device 8 is connected to Dewar vessel 10, adjusts the pressure in Dewar vessel 10.Pressure is adjusted
Engagement positions 8 has the such as relief portion such as turbomolecular pump or cryopump, and measures the pressure in Dewar vessel 10
The piezometry portion of power.
Cupola well mechanism 2 is the mechanism for being kept into membrane material Ma.Cupola well mechanism 2 is arranged at Dewar vessel
In the film forming room 10b of 10, when conveying mechanism 3 is observed, the negative direction along X-direction configures.Cupola well mechanism
2 have main cupola well 21, and this main cupola well is to import the plasma from plasma source 7 injection to filmogen Ma
The main anode restrainting P or the main anode being imported into from the beam-plasma P of plasma source 7 injection.
As in figure 2 it is shown, main cupola well 21 has and is filled with the positive direction along X-direction of filmogen Ma and prolongs
The tubular filling part 21a stretched and the flange part 21b highlighted from filling part 21a.Main cupola well 21 is relative to very
The earthing potential that empty 10 is had remains positive potential, therefore attracts beam-plasma P.This beam-plasma
Be formed with in the horizontal direction on the filling part 21a of the main cupola well 21 that P is incident that (i.e. X-direction) run through passes through
Perforation 21c, to fill filmogen Ma.Further, the fore-end of filmogen Ma is at this through hole 21c
One end expose to film forming room 10b.
Ring oven cylinder 6 is the impressed current anode with the electric magnet for induction plasma bundle P.Ring oven cylinder 6 configures
Around the filling part 21a of main cupola well 21 being kept into membrane material Ma.Ring oven cylinder 6 have coil 6a,
Permanent magnet 6b and annular container 6c, coil 6a and permanent magnet 6b are housed inside in annular container 6c.
Ring oven cylinder 6 controls to incide the plasma of filmogen Ma according to the size of the electric current of flowing in coil 6a
Bundle P towards or incide main cupola well 21 beam-plasma P towards.
Filmogen Ma can illustrate the insulating sealing materials such as transparent conductive material, SiON such as ITO and ZnO.
When filmogen Ma is made up of insulating properties material, if irradiating beam-plasma P, the most main cupola well to main cupola well 21
21 are heated by the electric current from beam-plasma P, the fore-end evaporation of filmogen Ma, by etc.
The filmogen particle Mb of ion beam P ion is to film forming room's 10b internal diffusion.Further, filmogen Ma
When being made up of conductive material, if irradiating beam-plasma P to main cupola well 21, then beam-plasma P is the most incident
To filmogen Ma, the fore-end of filmogen Ma is heated and evaporates, by beam-plasma P ion
Filmogen particle Mb to film forming room's 10b internal diffusion.Filmogen grain to film forming room's 10b internal diffusion
Sub-Mb moves to the X-axis positive direction of film forming room 10b, is attached to by film forming matter 11 in conveying chamber 10a
Surface.It addition, the solids that filmogen Ma is the cylindrical shape being configured to predetermined length, multiple film forming
Material Ma is disposably filled in cupola well mechanism 2.Further, according to the consumption of filmogen Ma, from cupola well
The X-axis negative direction side of mechanism 2 is sequentially extruded filmogen Ma, so that the filmogen Ma of side foremost
Fore-end and the upper end of main cupola well 21 keep predetermined position relationship.As in figure 2 it is shown, in cupola well mechanism 2
X-axis negative direction side be provided with introduction part 22, this introduction part is from the one-tenth in the outside being arranged at Dewar vessel 10
Membrane material feedway (not shown) imports filmogen Ma to the filling part 21a of main cupola well 21.Import
Portion 22 runs through the wall portion 10d of Dewar vessel 10 and extends to the X-axis of the filling part 21a with main cupola well 21
The position that leading section in negative direction is opposed.Introduction part 22 has makes filmogen along X-direction extension
The through hole 22a that Ma passes through.Further, it is provided with in the through hole 22a of introduction part 22 for main stove
The pressure ram 23 of the filling part 21a film extrusion material Ma of cylinder 21.
The cupola well mechanism 2 of the film formation device 1 involved by present embodiment possesses cover structure 30, and this cover structure is used
In preventing because during in film forming, filmogen Ma is piled up in around main cupola well 21 the main cupola well 21 and ring caused
The short circuit of cupola well 6.With reference to Fig. 2～Fig. 5, this cover structure 30 is described in detail.Fig. 3 is shown in Fig. 2
The filling part 21a of main cupola well 21 and the enlarged drawing of structure of outer rim 31 periphery.Fig. 4 is from X-axis losing side
To observing gear 39 and the figure of rotating part 71.Fig. 5 is the enlarged drawing of supporting parts 33 peripheral structure.
As shown in Figures 2 and 3, cover structure 30 possesses: outer rim 31, and it surrounds the filling part of main cupola well 21
21a；Inner cover 32, it is surrounding the filling part 21a of main cupola well 21 than outer rim 31 more inner circumferential side side；Supporting
Parts 33, outer rim 31 is supported as rotating by it；And driving structure 34, it is used for making outer rim 31
Rotate.It addition, in film formation device 1 involved by present embodiment, outer rim 31 is arranged to relative to master
The filling part 21a of cupola well 21 is eccentric, the central axis CL1 of filling part 21a and the central axis of outer rim 31
Though CL2 is parallel to each other, but it arranges position mutually internally inconsistent (with reference to Fig. 3 and Fig. 4).But central axis
The position relationship of CL1 and central axis CL2 is not limited to shown in the accompanying drawing of present embodiment, it is also possible to for
Consistent with each other.
As it is shown on figure 3, outer rim 31 has end container for cylindrical shape.Outer rim 31 has: side of sidewall portion 36, its bag
Enclose the filling part 21a of main cupola well 21；Bottom 37, it is arranged on the side of sidewall portion of base end side (X-axis negative direction)
The end of 36；Lid 38, it is arranged on bottom 37；And gear 39, it is provided with teeth portion 40.Further,
The through hole 42 of filling part 21a and the inner cover 32 being inserted through main cupola well 21 it is formed with in outer rim 31.From center
Axis CL2 direction is observed, and through hole 42 is in the circle centered by this central axis CL2.
The side of sidewall portion 36 of outer rim 31 is gradually warpage at film forming room's 10b side opening towards side.That is, sidewall
Portion 36 is along with expanding to outer peripheral side towards front (X-axis positive direction).In present embodiment, side of sidewall portion
36 have towards front successively from side, bottom 37: horizontal part 36a, and it prolongs in the horizontal direction from bottom 37
Stretch；Rake 36b, it is to tilt relative to central axis CL2 in the way of the expansion of front；Bending
Portion 36c, it is bent into and expands further from the front of rake 36b；Horizontal part 36d, it is from bending
The front end of portion 36c is horizontally extending；And leading section 36e, it is with substantially vertical with central axis CL2
Mode turn back towards inner circumferential side.So turn back to inner circumferential side due to leading section 36e, and by this leading section
The spatial portion SP that section is U-shaped is formed in the region that 36e, bending section 36c and horizontal part 36d surround
The part of Pericarpium Pyri pattern (Fig. 3 possesses).It is attached to the filmogen D2 of outer rim 31 or is attached to main stove
When the filmogen D1 of cylinder 21 is stripped, it is possible to the leading section 36e of the filmogen D1 being stripped to turn back
Stop, and spatial portion SP can be lodged in order to avoid dropping from outer rim 31.It addition, outer rim 31
The shape of side of sidewall portion 36 is not limited to the shape of present embodiment, can use variously-shaped.Such as, also
Can expand in the way of being gradually curved towards front.And, although in order to ensure larger space portion SP
And arrange horizontal part 36d so that section is U-shaped, but the shape of spatial portion SP does not limit.Example
As, it is also possible to it is not provided with horizontal part 36d and directly turns back from bending section 36c or rake 36b.Further,
Can also be without turning back in leading section.
Bottom 37 from the end of the base end side (X-axis negative direction) of side of sidewall portion 36 to become with central axis CL2
Expand towards inner circumferential side for substantially vertical mode.Bottom 37 in its center axis with central axis CL2 mono-
Cause is circular.Further, bottom 37 has the inner peripheral surface 37c(reference of the part constituting through hole 42
Fig. 5).It addition, for the detailed construction of this through hole 42, together will enter with the explanation of supporting parts 33
Row is aftermentioned.The end face of end face 37a(X axle negative direction of the base end side of bottom 37) on be formed with circular trough portion
37b, to install lid 38.On this groove portion 37b, circular lid 38 is installed.The center of lid 38
Axis is consistent with the central axis CL2 of outer rim 31.After assembling supporting parts 33, lid 38 is installed on
Bottom 37, thus, as preventing lid that these supporting parts 33 deviate from playing a role.Lid 38 has
There is the inner peripheral surface 38c of the part constituting through hole 42.
Gear 39 is in circular, for being formed with the ring-type external gear of teeth portion 40 at outer peripheral face.Gear 39
Central axis is consistent with the central axis CL2 of outer rim 31.Gear 39 is installed on the base end side of lid 38
The end face of end face 38a(X axle negative direction).It addition, the end 39a of the base end side of gear 39 is from non-rotating
Flange part 21b slightly separated.Teeth portion 40 is pressed certain in the way of surrounding the filling part 21a of main cupola well 21
It is arranged at intervals with multiple (with reference to Fig. 4).Gear 39 has the inner peripheral surface of the part constituting through hole 42
39c。
Bottom 37, lid 38 and gear 39 interfix (with reference to Fig. 4 and Fig. 5) by screw 46.
On bottom 37, lid 38 and the gear 39 multiple positions around central axis CL2 by this screw 46 admittedly
Fixed.According to this structure, the teeth portion 40 of gear 39 is endowed revolving force from driving structure 34, thus tooth
Wheel 39 rotates, and includes the outer rim 31 of gear 39, lid 38, bottom 37 and side of sidewall portion 36 with this
Entirety rotates.It addition, in present embodiment, side of sidewall portion 36 and bottom 37 are integrally formed, relative to
Bottom 37, lid 38 is constituted as independent assembly.Wherein, the structure of outer rim 31 is not limited to this
Plant structure, it is also possible to integral with gear 39 for lid 38 part.
Inner cover 32 possesses: cover portion 48, and it covers the filling part 21a of main cupola well 21；And flange part 49, its
It is arranged at the end in the cover portion 48 of the base end side of main cupola well 21.It is formed on inner cover 32 and makes main cupola well 21
The through hole 51 that filling part 21a is inserted through.Through hole 51 runs through cover portion 48 and flange part in the horizontal direction
49, for the circular through hole that its center axis is consistent with the central axis CL1 of main cupola well 21.
Cover portion 48 is configured to extend along this filling part 21a in the way of surrounding the filling part 21a of main cupola well 21
Substantially cylindric.The central axis in cover portion 48 is consistent with the central axis CL1 of main cupola well 21.Cover portion 48
Leading section 48a extend to the front of filling part 21a, and cover the outer peripheral face 21e of this filling part 21a
A part.In present embodiment, the leading section 48a in cover portion 48 is not up to leading section 21d, filling part
Expose though a part of region near the leading section 21d of 21a has, but the position of leading section 48a not spy
Do not limit, it is also possible to reach leading section 21d.The inner peripheral surface 48b in cover portion 48 constitutes the through hole of inner cover 32
The part of 51, and it is formed with gap between the outer peripheral face 21e of inner peripheral surface 48b and filling part 21a.Separately
Outward, it is also possible to be not provided with cover portion 48 and be only provided for the flange part 49 of supporting supporting parts 33.
Flange part 49 from the end of the base end side (X-axis negative direction) in cover portion 48 to become with central axis CL2
Expand towards outer circumferential side for substantially vertical mode.Flange part 49 in its center axis with central axis CL2
Consistent is circular.It addition, in Fig. 3, owing to filling part 21a and cover portion 48 top in figure is eccentric,
Therefore it is shown in the section of the flange part 49 on the upside of paper relative to central axis CL2 to narrow.Flange part 49 with
The mode that the end face 49a of its base end side (X-axis negative direction) connects with the flange part 21b of main cupola well 21 is propped up
Hold, and be fixed (with reference to Fig. 5) with this flange part 21b by bolt 53.It addition, flange part 49
The end face 49b of front (X-axis positive direction) be set to the front (X of the bottom 37 with outer rim 31
Axle positive direction) end face 37d become the most same face.The outer peripheral face 49c of flange part 49 with outer rim
The mode that the through hole 42 of 31 forms gap is opposed.Further, outer peripheral face 49c is formed it is supported by parts
33 faces supported, for its detailed construction, together will carry out aftermentioned with the explanation of supporting parts 33.Flange
The inner peripheral surface 49d in portion 49 constitutes a part for the through hole 51 of inner cover 32, and in a part for inner circumferential side
There is the part of diameter stenosis, thus, a part of inner peripheral surface 49d and the outer peripheral face 21e of filling part 21a
Contact.So, inner cover 32 contacts with the outer peripheral face 21e of filling part 21a in a part for through hole 51,
Therefore easily filling part 21a is covered inner cover 32, and also is prevented from loosening of inner cover 32.
Supporting parts 33 are disposed between main cupola well 21 and outer rim 31 and for limiting the level of outer rim 31
Movement on direction (X-direction) and vertical direction (Z-direction) and for supporting the rotation of outer rim 31
The parts turned.In present embodiment, between outer rim 31 and inner cover 32, set around central axis CL2
It is equipped with multiple supporting parts 33.Supporting parts 33 are preferably capable the spheroid making outer rim 31 rotate.But as long as
Being the shape that outer rim 31 can be made to rotate, the shape of supporting parts 33 is just not particularly limited, and the most also may be used
Think cylinder etc..Further, the material of supporting parts 33 is also not particularly limited, but preferably suitable ceramic
And charcoal.When being suitable for this material, by be set to thermostability higher and with constitute outer rim 31 and the metal of inner cover 32
Material (such as, copper or rustless steel) different material and prevent sintering, it is not necessary to use lubricating oil just can make
Outer rim 31 rotates swimmingly.Wherein, the material as supporting parts 33 can also suitable metal material.
Here, utilize Fig. 5 that the structure of supporting parts 33 periphery is described in detail.As it is shown in figure 5,
The surface of the through hole 42 of outer rim 31 is formed the groove portion 54 for accommodating supporting parts 33.And
And, the outer peripheral face 49c of the flange part 49 of inner cover 32 is formed prominent circular prominent to outer peripheral side
Portion 56, is formed with the groove portion 57 for accommodating supporting parts 33 on the outer peripheral face of this protuberance 56.Outward
The groove portion 54 of edge 31 side is formed on mutually opposing position, by this groove portion with the groove portion 57 of inner cover 32 side
54 and groove portion 57 surround space in be filled with multiple supporting parts 33.
Its section of groove portion 54 is V shape, be formed from bottom 37 inner peripheral surface 37c inclined plane 58 with
The inclined plane 59 of the inner peripheral surface 38c being formed at lid 38 is constituted.Inclined plane 58 is formed as from base end side court
Side (towards X-axis positive direction) rolls tiltedly to inner circumferential forward, at central axis CL2(with reference to Fig. 3) week
Enclose and formed throughout through hole 42 complete cycle.Inclined plane 59 is formed as from base end side towards front (towards X
Axle positive direction) tilt to outer peripheral side, at central axis CL2(with reference to Fig. 3) around whole throughout through hole 42
Week and formed.Its section of groove portion 57 is V shape, is formed from the inclined plane 61 of protuberance 56 and tilts
Face 62 is constituted.Inclined plane 61 is formed as from base end side towards front (towards X-axis positive direction) to periphery
Roll tiltedly, at central axis CL2(with reference to Fig. 3) around formed throughout protuberance 56 complete cycle.Inclined plane
62 are formed as rolling tiltedly towards front (towards X-axis positive direction) to inner circumferential from base end side, at central axis
CL2(is with reference to Fig. 3) around formed throughout protuberance 56 complete cycle.
Inclined plane 58,59,61,62 is respectively by contacting (allowing the most loosening) with supporting parts 33
It is supported by.According to this structure, relative to the main cupola well 21 fixed and inner cover 32, outer rim 31 can be suitable
Freely rotate, and while limiting the movement in the vertical direction (Z-direction) of outer rim 31, also limit
Movement in horizontal direction (X-direction).It addition, the section shape in groove portion 54,57 is not limited to as above
The V shape stated, as long as the shape of the movement that can limit in the horizontal direction of outer rim 31 and vertical direction
Shape, it becomes possible to use variously-shaped.For example, it is also possible to be U-shaped or rectangular shape.
It addition, the end face 49b that the protuberance 56 of inner cover 32 side is formed at from flange part 49 divides to base end side
On the position opened, between this end face 49b and protuberance 56, therefore it is formed with difference of height (jump).Court
To this difference of height part, outer rim 31 is formed with the inner peripheral surface 37c of bottom 37 from this outer rim 31
The protuberance 63 prominent to inner circumferential side.The protuberance 63 of outer rim 31 side and the protuberance 56 of inner cover 32 side with
The mode alternateed configures, and thus the section shape in the gap between outer rim 31 and inner cover 32 is than supporting
Parts 33 are located further forward on the region of side becomes the shape being bent into crank-like.Thereby, it is possible to suppression is steamed
The particle of the filmogen sent out enters near supporting parts 33.
Return Fig. 2 and Fig. 3, the structure driving structure 34 is illustrated.As shown in Figures 2 and 3, drive
Dynamic structure has: rotating part 71, and it gives revolving force to outer rim 31；Axle portion 72, its axle supports this rotation
Portion 71；And drive division 73, it makes axle portion 72 rotate.Wall is run through from the outside of Dewar vessel 10 in axle portion 72
Portion 10d and extend to the position of the teeth portion 40 of outer rim 31 along X-direction.Drive division 73 is arranged at vacuum
The outside of container 10, and there is rotary shaft 73a extended along Z-direction.In order to axle portion 72, transmission is driven
The revolving force in dynamic portion 73, rotary shaft 73a is provided with bevel gear 74, the end in axle portion 72 is provided with
The bevel gear 76 of this bevel gear 74 engaging.Wherein, the biography of the revolving force between drive division 73 and axle portion 72
Pass mechanism and be not limited to this structure, it is possible to use various mechanism.Further, at the wall portion 10d of Dewar vessel 10
Outside be provided with magnetic fluid bearing 77, axle portion 72 inserts this magnetic fluid bearing 77 and to Dewar vessel
Extend in 10.Dewar vessel 10 is vacuum sealed by magnetic fluid bearing 77.It addition, in axle portion 72
Half-way on insulation shaft joint and machinery shaft joint etc. can be set, but figure omits diagram.
As shown in Figures 3 and 4, rotating part 71 is engaged by the teeth portion 40 of the gear 39 having with outer rim 31
Teeth portion 78 gear constitute.The teeth portion 78 of rotating part 71 is arranged to outward around axle portion 72 at equal intervals
The teeth portion 40 of the gear 39 of edge 31 engages.Further, rotating part 71 is in the periphery of the teeth portion 40 of outer rim 31
Side is arranged on the position can engaged with this teeth portion 40.As long as it addition, can engage with teeth portion 40, then
Rotating part 71 can also be arranged on any position, and the position around central axis CL2 is also not limited to Fig. 4
Shown position, it is also possible to be arranged on any position.By this driving structure 34, outer rim 31 is preferred
Carry out every 1 hour rotating the continuous low speed rotation about 1～10 circles.
Then, the effect of film formation device 1 involved by present embodiment, effect are illustrated.
First, in order to compare with the film formation device 1 involved by present embodiment, to conventional horizontal one-tenth
The structure of the outer rim of film device illustrates.In horizontal film formation device, around main cupola well overlapping multiple outside
Edge, but do not fix outer rim and the most simply configuration, if filmogen has been piled up, then from internal layer side is taken out successively
Edge is replaced.Wherein, when changing outer rim, staff is manually operated special operation device and enters
The replacing of row outer rim.Operation device can enumerate such as staff from the outside of Dewar vessel to extruding, drawing
Stretch, rotate, the bar freely that hangs out and hang in of outer rim carries out operating and hang over the dress being replaced in outer rim
Put.Or, can enumerate and change the dress of outer rim from the top manual operation telescopic operation device of main cupola well
Put.During by this conventional outer rim structure be applicable to vertical film formation apparatus, become and make outer rim join from conventional
Put the configuration of (bottom of outer rim is arranged in the lower section of vertical direction) vertical tilt, therefore there is outer rim along water
Square to falling down and the problem such as come off from main cupola well and drop.So, the structure of conventional outer rim exists cannot
The problem being highly suitable for vertical film formation apparatus.
On the contrary, the mobile quilt in the horizontal direction of outer rim 31 in the film formation device 1 involved by present embodiment
Supporting parts 33 limit.Therefore, outer rim 31 does not falls out and is able to maintain that and is supported by parts 33 supporting
State.
Here, about vertical film formation apparatus, it is set to only fixed bearing outer rim to prevent dropping of outer rim
Bottom structure time, it has to release this fixing support and carry out withdrawing device, therefore cannot use conventional operation
Device carries out the replacing of outer rim, and during maintenance expense, frequency of maintenance likely uprises.But, present embodiment
In, outer rim 31 can be endowed revolving force via teeth portion 40 from rotating part 71 and around the filling of main cupola well 21
Portion 21a rotates.Thus, the filmogen evaporated will not concentrate at one attached relative to outer rim 31
, but can adhere to equably throughout complete cycle.Such as, the attachment of filmogen D2 as shown in Figure 3
The segment set that thing is the most shown in the figure grows, it is possible to make it adhere to throughout complete cycle.Therefore, it is possible to
Improve the deposition efficiency of each outer rim 31.That is, when using the structure of only fixed bearing outer rim, if in outer rim
A part of attachment grow, how much be also required to tie up even if then not growing at other part attachments
Protect.And in the present embodiment, rotated by outer rim 31 and the thickness of attachment can be made big throughout complete cycle
Cause uniformly.Therefore, it is possible to frequency of maintenance is greatly reduced.Further, in present embodiment, by big for outer rim 31
During type, it is possible to reduce frequency of maintenance further.Such as, when the diameter of outer rim 31 is set to A times, outward
The surface area of edge 31 becomes A2 times, also the most sometimes is able to frequency of maintenance is set to (power of 1/A).And
In previous methods, service intervals is determined by the distance between main cupola well and outer rim, therefore can only be set to
About 1/A.Further, according to present embodiment without overlapping multiple outer rims, it is possible to reduce outer rim.According to
On, vertical film formation apparatus can cover main cupola well periphery in a preferred way.
Further, such as conventional horizontal film formation device, overlapping multiple outer rims and by operation device with manual operation
When being replaced, need to temporarily cease the irradiation of beam-plasma in operation process, additionally, due to being manual work
, therefore there is the problem that the running rate of film formation device declines in industry.But, in present embodiment, pass through outer rim
The spinning movement freely of 31, it is possible to prevent the short circuit of main cupola well 21 and ring oven cylinder 6.Further, outer rim 31
Deposition efficiency higher, the most in a long time without safeguarding, until next time safeguard during without stopping
Stop the irradiation of beam-plasma and film formation device can be made to continuously run.Therefore, with the structure phase of conventional outer rim
Ratio, it is possible to increase the running rate of film formation device 1.
Further, in the film formation device 1 involved by present embodiment, the leading section 36e of outer rim 31 is towards interior
Turn back in all sides.According to this structure, it is possible to stop with the leading section 36e being folded back and be intended to fall in outer rim 31
The attachment of the filmogen fallen.Thereby, it is possible to prevent the attachment of filmogen from dropping from outer rim 31.
[the 2nd embodiment]
In the cover structure 130 of the film formation device involved by the 2nd embodiment shown in Fig. 6 and Fig. 7, arrange
There is the removal of the blade 81 of the attachment with the filmogen near the leading section 21d cutting main cupola well 21
Structure 80, the most in this, with the cover structure 30 of the film formation device 1 involved by the 1st embodiment
Different.
As shown in FIG. 6 and 7, the removal structure 80 of cover structure 130 is by arranging a pair in outer rim 31
Scraper 85 is constituted.Each scraper 85 is disposed relative to central axis CL2 and is on the position of 180 °.
Wherein, number and the configuration of scraper 85 are not particularly limited, and can be 1, it is also possible to be 3 with
On.
Scraper 85 has can carry out the structure stretched, and tool relative to the filling part 21a of main cupola well 21
Standby: removing component 82, it has blade 81；Supporting mass 83, it supports this removing component 82；Spring
84, it is packed in supporting mass 83.Removing component 82 is towards master from side of sidewall portion 36 side of outer rim 31
The columnar part that the filling part 21a of cupola well 21 extends to radially inner side, is formed with blade 81 in its front end.
Blade 81 has outer peripheral face 21e pair near the leading section 21d with filling part 21a and this leading section 21d
The shape answered.Supporting mass 83 possesses the cylindric sheath portion 83a of receiving removing component 82 and by tightening
The fixing fixed part 83b of side of sidewall portion 36 with outer rim 31.In sheath portion 83a, the front of spring 84 with
The bottom surface of the recess 82a being arranged at removing component 82 links, and base end side links with fixed part 83b.Cause
This, relative to the filling part 21a of main cupola well 21, it is possible to generation compresses pressing of the blade 81 of removing component 82
Pressure.
According to said structure, along with the rotation of outer rim 31, the blade 81 of scraper 85 is also along main cupola well 21
Filling part 21a rotates, therefore, it is possible to wipe leading section 21d and the outer peripheral face being attached to this filling part 21a off
The attachment of 21e.Further, outer rim 31 is eccentric, even if thus relative to the filling part 21a of main cupola well 21
Distance between the fixed part 83b and filling part 21a of scraper 85 changes, owing to scraper 85 is can
Utilizing spring 84 to carry out the structure stretched, therefore blade 81 is not affected by the change of this distance and can be wiped off
Attachment near the 21d of leading section.More than according to, it is possible to prevent attachment in the leading section of main cupola well 21
Pile up near 21d.
[the 3rd embodiment]
In the cover structure 230 of the film formation device involved by the 3rd embodiment shown in Fig. 8 and Fig. 9, it is suitable for
Gear 91 involved by ring-type internal gear replaces the gear 39 involved by ring-type external gear, mainly at this
On point, different from the cover structure 30 of the film formation device 1 involved by the 1st embodiment.
As shown in FIG. 6 and 7, outer rim 31 possesses the gear 91 in inner circumferential side with teeth portion 90.Further,
Drive structure 134 to be set to rotating part 71 and be configured in the inner circumferential side of gear 91.That is, structure 134 is driven
Rotating part 71 and axle portion 72 be arranged in radially with the filling part 21a close proximity of main cupola well 21
On.Further, as it does so, be formed on the flange part 49 of inner cover 32 and the flange part 21b of main cupola well 21
For configuring rotating part 71 and the through hole in axle portion 72 and recess.It addition, configure rotating part 71 to inner circumferential side
And during axle portion 72, cause magnetic fluid bearing 77 and bevel gear 76 etc. to produce with introduction part 22 and interfere (ginseng
Examine Fig. 2), the most sometimes cannot use and make axle portion 72 directly to the outside knot extended of Dewar vessel 10
Structure.Now, by arranging not shown revolving force transmission mechanism, revolving force is transmitted to axle portion 72.
The present invention is not limited to above-mentioned embodiment.
Such as, in above-mentioned embodiment, between main cupola well 21 and outer rim 31, it is provided with inner cover 32, outside
Supporting parts 33 it are provided with but it also may omit inner cover 32 between edge 31 and inner cover 32.Now, leading
The mounting groove of supporting parts 33 is set on cupola well 21, support is set between main cupola well 21 and outer rim 31
Part 33.
Further, in above-mentioned embodiment, in order to arrange teeth portion 40,90 in outer rim 31, and employ with
The gear 39,91 of bottom 37 splits but it also may do not use this gear 39,91, and use in bottom 37
Outer peripheral face and inner peripheral surface itself formed teeth portion 40,90 structure.
Claims (4)
1. a film formation device, filmogen is heated by beam-plasma, and makes by this film formation device
The particle gasified by described filmogen is attached to by film forming matter, and described film formation device possesses:
As the main cupola well of main anode, it has to be formed and runs through in the horizontal direction to keep described filmogen
Hole filling part and at base end side from prominent the 1st flange part of above-mentioned filling part, and to described film forming
Material imports described beam-plasma, or is imported into described beam-plasma；
Inner cover, it has the cover portion of the described filling part covering described main cupola well and is arranged on described main cupola well
The 2nd flange part of end in described cover portion of described base end side；
Outer rim, its described filling part surrounding described main cupola well and described inner cover, and there is the described master of encirclement
Cupola well and along with the side of sidewall portion expanded to outer peripheral side towards front, the described base that is arranged on described main cupola well
The bottom of end of the described side of sidewall portion of side, teeth portion and the described filling part of the described main cupola well of confession and institute
State the through hole that inner cover is inserted through；
Rotating part, it gives described main cupola well by incompatible with the described teeth portion card of described outer rim to described outer rim
Revolving force around；And
Supporting parts, it is arranged between described 2nd flange part and described outer rim, limits the water of described outer rim
Movement square upwards, and described outer rim is supported as rotating,
It is formed with gap between outer peripheral face and the through hole of described outer rim of described 2nd flange part,
The outer peripheral face of described 2nd flange part is formed circular protuberance prominent to outer peripheral side,
The inner peripheral surface of the described bottom of described outer rim is formed the protuberance prominent to inner circumferential side,
In the way of the protuberance of described outer edge side and the protuberance of described 2nd flange part side alternate, institute
State the protuberance of outer edge side to be arranged in described horizontal direction and more lean on than the protuberance of described 2nd flange part side
The described front of described side of sidewall portion,
Described supporting parts are arranged on the protuberance of described 2nd flange part side and the described bottom of described outer rim
Between inner peripheral surface.
Film formation device the most according to claim 1, wherein,
The blade of the attachment of the leading section cutting described main cupola well is installed in described outer rim.
Film formation device the most according to claim 1 and 2, wherein,
The leading section of described outer rim is folded back towards inner circumferential side.
Film formation device the most according to claim 1 and 2, wherein,
Described supporting parts are made up of pottery.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012247563A JP5832985B2 (en) | 2012-11-09 | 2012-11-09 | Deposition equipment |
| JP2012-247563 | 2012-11-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103805963A CN103805963A (en) | 2014-05-21 |
| CN103805963B true CN103805963B (en) | 2017-01-04 |
Family
ID=50703332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310424602.5A Active CN103805963B (en) | 2012-11-09 | 2013-09-17 | Film formation device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5832985B2 (en) |
| KR (1) | KR101513192B1 (en) |
| CN (1) | CN103805963B (en) |
| TW (1) | TWI477627B (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006348318A (en) * | 2005-06-13 | 2006-12-28 | Sumitomo Heavy Ind Ltd | Hearth mechanism, handling mechanism and film-forming apparatus |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5490912A (en) * | 1994-05-31 | 1996-02-13 | The Regents Of The University Of California | Apparatus for laser assisted thin film deposition |
| JP2001000854A (en) * | 1999-06-23 | 2001-01-09 | Sumitomo Heavy Ind Ltd | Device for removing deposit and vapor deposition system |
| EP1136587B1 (en) * | 2000-03-23 | 2013-05-15 | Hitachi Metals, Ltd. | Deposited-film forming apparatus |
| JP3732074B2 (en) | 2000-07-11 | 2006-01-05 | 住友重機械工業株式会社 | Deposition equipment |
| JP2002180240A (en) | 2000-12-20 | 2002-06-26 | Sumitomo Heavy Ind Ltd | Film forming apparatus |
| KR20050072946A (en) * | 2004-01-08 | 2005-07-13 | 삼성전자주식회사 | An apparatus for deposition with high uniformity |
| JP2006346765A (en) * | 2005-06-13 | 2006-12-28 | Sumitomo Heavy Ind Ltd | Handling device |
| JP2006348334A (en) | 2005-06-14 | 2006-12-28 | Sumitomo Heavy Ind Ltd | Hearth mechanism and hearth-replacing device |
| TWI364126B (en) * | 2007-11-23 | 2012-05-11 | Ind Tech Res Inst | Plasma assisted apparatus for forming organic film |
| JP2010013701A (en) * | 2008-07-03 | 2010-01-21 | Sanyo Shinku Kogyo Kk | Plasma generator and film deposition apparatus |
| JP2010126797A (en) * | 2008-11-28 | 2010-06-10 | Tokyo Electron Ltd | Film deposition system, semiconductor fabrication apparatus, susceptor for use in the same, program and computer readable storage medium |
| US9297072B2 (en) * | 2008-12-01 | 2016-03-29 | Tokyo Electron Limited | Film deposition apparatus |
| JP2013147677A (en) * | 2010-04-28 | 2013-08-01 | Ulvac Japan Ltd | Film deposition system |
| SG185413A1 (en) * | 2010-05-06 | 2012-12-28 | Univ Virginia Patent Found | Spotless arc directed vapor deposition (sa-dvd) and related method thereof |
| JP2012054508A (en) * | 2010-09-03 | 2012-03-15 | Tokyo Electron Ltd | Film deposition apparatus |
| JP2012140671A (en) * | 2010-12-28 | 2012-07-26 | Canon Tokki Corp | Film-forming apparatus |
| JP5456716B2 (en) * | 2011-03-30 | 2014-04-02 | 住友重機械工業株式会社 | Deposition equipment |
-
2012
- 2012-11-09 JP JP2012247563A patent/JP5832985B2/en active Active
-
2013
- 2013-09-09 TW TW102132351A patent/TWI477627B/en active
- 2013-09-12 KR KR1020130109625A patent/KR101513192B1/en active IP Right Grant
- 2013-09-17 CN CN201310424602.5A patent/CN103805963B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006348318A (en) * | 2005-06-13 | 2006-12-28 | Sumitomo Heavy Ind Ltd | Hearth mechanism, handling mechanism and film-forming apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101513192B1 (en) | 2015-04-17 |
| TW201418492A (en) | 2014-05-16 |
| KR20140060221A (en) | 2014-05-19 |
| JP2014095125A (en) | 2014-05-22 |
| CN103805963A (en) | 2014-05-21 |
| TWI477627B (en) | 2015-03-21 |
| JP5832985B2 (en) | 2015-12-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11293101B2 (en) | Method based on multi-source deposition for fabricating perovskite film | |
| US10428424B2 (en) | Tray device, reaction chamber and MOCVD apparatus | |
| CN102021522B (en) | Sputtering-type film coating device | |
| CN102154690A (en) | Method and device for forming tray in planetary epitaxial growth equipment | |
| CN103805963B (en) | Film formation device | |
| CN203569185U (en) | Chemical vapor deposition device, substrate tray and rotary shaft | |
| CN102534527A (en) | Magnetron sputtering source and magnetron sputtering equipment | |
| JP6152981B2 (en) | Silicon carbide single crystal | |
| JP2014066673A (en) | Rate sensor, linear source, and vapor depositing apparatus | |
| US20150056386A1 (en) | Device for depositing carbon film and method for depositing carbon film | |
| JP2008007806A (en) | Sputtering film deposition apparatus, manufacturing method of sealing film, and organic el element | |
| CN211001954U (en) | Metering device of pill packing machine | |
| JP6959696B2 (en) | Substrate processing device arranged inside the process chamber and its operation method | |
| KR20150071850A (en) | Gas discharge pipe and ingot growing apparatus having the same | |
| CN104046962B (en) | A kind of axially strength drives planetary rotation device | |
| CN107881082A (en) | Strain improvement sample storing unit | |
| CN203007385U (en) | Device for even vacuum coating on side surfaces of large batch of cylinders | |
| CN208420737U (en) | Lamp inspection machine rotates bottle holder component | |
| CN112080735A (en) | Tray device for vapor chemical deposition | |
| CN220183430U (en) | Device capable of measuring weight of crystal in silicon carbide growth process | |
| CN110686789A (en) | Adjustable inductor | |
| CN202898521U (en) | Film forming device | |
| CN209378060U (en) | A kind of filling for capsule filling machine/plus powder regulating device | |
| CN109797377A (en) | Wafer carrier and equipment of metal organic chemical vapor deposition | |
| CN210708172U (en) | Bubble cap machine is used in capsule production |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |