CN103794717B - 一种包含介电层的嵌入型磁隧道结器件的制造方法 - Google Patents
一种包含介电层的嵌入型磁隧道结器件的制造方法 Download PDFInfo
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- CN103794717B CN103794717B CN201410072401.8A CN201410072401A CN103794717B CN 103794717 B CN103794717 B CN 103794717B CN 201410072401 A CN201410072401 A CN 201410072401A CN 103794717 B CN103794717 B CN 103794717B
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- 238000010276 construction Methods 0.000 claims abstract description 21
- 229910052751 metal Inorganic materials 0.000 claims abstract description 17
- 239000002184 metal Substances 0.000 claims abstract description 17
- 230000004888 barrier function Effects 0.000 claims abstract description 15
- 238000001259 photo etching Methods 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 10
- 238000000137 annealing Methods 0.000 claims abstract description 10
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 10
- 239000010703 silicon Substances 0.000 claims abstract description 10
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- 230000005415 magnetization Effects 0.000 claims abstract description 7
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 5
- 239000004065 semiconductor Substances 0.000 claims abstract description 5
- 238000012360 testing method Methods 0.000 claims abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 19
- 238000000151 deposition Methods 0.000 claims description 11
- 238000001020 plasma etching Methods 0.000 claims description 11
- 238000010884 ion-beam technique Methods 0.000 claims description 10
- 239000000377 silicon dioxide Substances 0.000 claims description 9
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 8
- 229910052697 platinum Inorganic materials 0.000 claims description 7
- 229910019236 CoFeB Inorganic materials 0.000 claims description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 6
- 229910052715 tantalum Inorganic materials 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 238000001451 molecular beam epitaxy Methods 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 4
- 229910052755 nonmetal Inorganic materials 0.000 claims description 4
- 229910019041 PtMn Inorganic materials 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 229910052681 coesite Inorganic materials 0.000 claims description 3
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- 230000005294 ferromagnetic effect Effects 0.000 claims description 3
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- 238000002164 ion-beam lithography Methods 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 229910052682 stishovite Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052905 tridymite Inorganic materials 0.000 claims description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 230000005290 antiferromagnetic effect Effects 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910000449 hafnium oxide Inorganic materials 0.000 claims 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
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- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
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- 238000007796 conventional method Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
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- 229910052731 fluorine Inorganic materials 0.000 description 2
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- 239000007789 gas Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
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- 230000003628 erosive effect Effects 0.000 description 1
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- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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CN201410072401.8A CN103794717B (zh) | 2014-02-28 | 2014-02-28 | 一种包含介电层的嵌入型磁隧道结器件的制造方法 |
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Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
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CN104134748B (zh) * | 2014-07-17 | 2017-01-11 | 北京航空航天大学 | 一种信息传感及存储器件及其制备方法 |
US10326075B2 (en) * | 2015-09-25 | 2019-06-18 | Intel Corporation | PSTTM device with multi-layered filter stack |
US9711713B1 (en) * | 2016-01-15 | 2017-07-18 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor structure, electrode structure and method of forming the same |
CN110050355B (zh) * | 2016-12-06 | 2023-06-23 | 艾沃思宾技术公司 | 磁阻设备及其方法 |
CN108242502B (zh) * | 2016-12-27 | 2021-04-27 | 上海磁宇信息科技有限公司 | 一种制备磁性隧道结的方法 |
CN109585645B (zh) * | 2017-09-28 | 2020-09-22 | 中电海康集团有限公司 | Mtj器件、其制作方法与mram |
KR102408685B1 (ko) * | 2017-10-16 | 2022-06-15 | 삼성전자주식회사 | 반도체 소자의 제조를 위한 공정 제어 방법 및 시스템 |
CN108091359B (zh) * | 2017-12-11 | 2021-05-25 | 江苏鲁汶仪器有限公司 | 一种磁隧道结及其制造方法 |
CN113887734B (zh) * | 2021-12-07 | 2022-04-22 | 北京芯可鉴科技有限公司 | 随机磁隧道结器件及应用方法 |
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US6673675B2 (en) * | 2002-04-11 | 2004-01-06 | Micron Technology, Inc. | Methods of fabricating an MRAM device using chemical mechanical polishing |
US6885074B2 (en) * | 2002-11-27 | 2005-04-26 | Freescale Semiconductor, Inc. | Cladded conductor for use in a magnetoelectronics device and method for fabricating the same |
EP1719181A4 (en) * | 2004-01-14 | 2010-08-25 | Ibm | GRADIENT DEPOSITION OF CVD MATERIALS WITH LOW K |
US7098495B2 (en) * | 2004-07-26 | 2006-08-29 | Freescale Semiconducor, Inc. | Magnetic tunnel junction element structures and methods for fabricating the same |
CN100517640C (zh) * | 2006-12-05 | 2009-07-22 | 中芯国际集成电路制造(上海)有限公司 | 半导体器件的制造方法和半导体器件 |
US7579197B1 (en) * | 2008-03-04 | 2009-08-25 | Qualcomm Incorporated | Method of forming a magnetic tunnel junction structure |
CN102347439A (zh) * | 2010-07-30 | 2012-02-08 | 中芯国际集成电路制造(上海)有限公司 | 磁阻存储器的形成方法 |
CN102376875B (zh) * | 2010-08-24 | 2013-08-14 | 中芯国际集成电路制造(上海)有限公司 | 磁阻存储器的形成方法 |
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Effective date of registration: 20231222 Address after: Room 1605, Building 1, No. 117 Yingshan Red Road, Huangdao District, Qingdao City, Shandong Province, 266400 Patentee after: Qingdao Haicun Microelectronics Co.,Ltd. Address before: 100191 rooms 504a and 504b, 5th floor, 23 Zhichun Road, Haidian District, Beijing Patentee before: Zhizhen storage (Beijing) Technology Co.,Ltd. |
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