CN103700613A - Vacuum mechanical delivery system - Google Patents
Vacuum mechanical delivery system Download PDFInfo
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- CN103700613A CN103700613A CN201310699013.8A CN201310699013A CN103700613A CN 103700613 A CN103700613 A CN 103700613A CN 201310699013 A CN201310699013 A CN 201310699013A CN 103700613 A CN103700613 A CN 103700613A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68368—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used in a transfer process involving at least two transfer steps, i.e. including an intermediate handle substrate
Abstract
The embodiment of the invention provides a vacuum mechanical delivery system and relates to the field of automation. The vacuum mechanical delivery system can shorten the substrate replacing time and improve the yield of automatic production. The vacuum mechanical delivery system comprises a mechanical arm and a vacuum cavity, wherein the vacuum cavity comprises a telescopic supporting arm arranged on a cavity side wall opposite to a cavity door and a lifting needle arranged in the cavity; the telescopic supporting arm stretches towards the cavity door along the cavity side wall opposite to the cavity door; the lifting needle lifts towards the top of the cavity along the bottom of the cavity; the mechanical arm comprises a first grabbing plate and a second grabbing plate; the first grabbing plate is positioned on the upper side and the second grabbing plate is positioned on the lower side; the first and second grabbing plates are fixed together. The vacuum mechanical delivery system is used for automatically replacing substrates.
Description
Technical field
The present invention relates to automatic field, relate in particular to a kind of vacuum machine transfer system.
Background technology
Current TFT-LCD(Thin Film Transistor-Liquid Crystal Display, Thin Film Transistor-LCD) in factory, the vacuum mechanical-arm adopting when exchanging substrate for comprises that upper and lower two capture plate, and these two capture plate is separate control; That is, carrying out the exchanging in process of substrate, can only have one to capture plate and enter vacuum chamber at every turn, each captures plate can load separately a substrate; Wherein, the first 201 of the plates of crawl that are positioned at top are sent into pending substrate, are positioned at second of below and capture 202 substrates that take out after processing of plate.
Concrete, if Fig. 1 (a) is to 1(f) as shown in, when carrying out the exchanging for of substrate, described second captures plate 202 enters described vacuum chamber 10 under the effect of telescopic arm 204; So latter two captures plate rising together under the drive of support arm 203, and described second captures plate 202 takes the substrate after the processing being positioned on dipping needle 104 away in the process of this rising, and under the effect of described telescopic arm 204, exits described vacuum chamber 10; Then, two capture the plates a certain distance that declines, and described first captures plate 201 carries untreated substrate and enter described vacuum chamber 10 under the effect of described telescopic arm 204; So latter two captures plate next plays decline in the drive of described support arm 203, described first captures plate 201 is placed on described untreated substrate on described dipping needle 104 in the process of this decline, and under the effect of described telescopic arm 204, exits described vacuum chamber 10; Last described dipping needle 104 drops to ad-hoc location, prepares to process.
While adopting above-mentioned this structure to carry out exchanging for of substrate, need altogether six steps, wherein manipulator needs to enter for twice described vacuum chamber.If consider the time that upper chamber dooor opens and closes, in vacuum chamber, complete the activity duration that needs 32 seconds that exchanges for of a substrate, greatly limited the efficiency of volume production.
Summary of the invention
Embodiments of the invention provide a kind of vacuum machine transfer system, can reduce the time that substrate exchanges for, promote the output of automated production.
For achieving the above object, embodiments of the invention adopt following technical scheme:
A kind of vacuum machine transfer system is provided, comprises manipulator and vacuum chamber; Described vacuum chamber comprises the retractable support hand being arranged on the cavity wall relative with chamber door and is arranged on the dipping needle of inside cavity; Wherein, the direction of described retractable support hand along the cavity wall relative with chamber door to chamber door is flexible, the direction lifting of described dipping needle along cavity bottom to cavity top; Described manipulator comprises that the first crawl plate and second captures plate; Wherein, described first captures plate is positioned at top, and described second captures plate is positioned at below, and described first captures plate and described second and capture plate and be fixed together.
Optionally, described vacuum machine transfer system also comprises and is arranged on the cavity outside of described vacuum chamber and the spiral cylinder connecting with described retractable support palmistry; Wherein, described spiral cylinder is for controlling the flexible of described retractable support hand.
Further alternative, on the cavity wall relative with chamber door of described vacuum chamber, be provided with perforate, described retractable support hand is connected with described spiral cylinder by the perforate being arranged on described cavity wall; Wherein, described spiral cylinder also comprises the seal cover of the external part that is arranged on described retractable support hand, and the geomery of described seal cover and described perforate match.
Further, the cavity inner wall surface of the surface of described seal cover and described vacuum chamber is alumina insulation surface.
Optionally, described vacuum chamber also comprises the lifting platform that is arranged on cavity bottom; Wherein, described dipping needle is arranged on described lifting platform.
Optionally, described retractable support hand comprises two supporting plates of equal height; Described first captures plate and described second captures two supporting plates that plate also comprises respectively equal height; Wherein, the spacing between two supporting plates of the spacing between the spacing between two supporting plates of described the first crawl plate and two supporting plates of described the second crawl plate and described retractable support hand is different.
Further alternative, described manipulator also comprises the telescopic arm being connected with described the first crawl plate and described the second crawl plate and the support arm being connected with described telescopic arm; Wherein, described telescopic arm captures the flexible of plate and described the second crawl plate for fixing and controlling described first; Described support arm is for fixing and control lifting and the rotation of described telescopic arm.
Further, described vacuum machine transfer system also comprises the first motor of being connected with described telescopic arm, the second motor and the 3rd motor are connected with described support arm; Wherein, described the first motor is for controlling the flexible of described telescopic arm; Described the second motor and described the 3rd motor are respectively used to control lifting and the rotation of described support arm.
The embodiment of the present invention provides a kind of vacuum machine transfer system, comprises manipulator and vacuum chamber; Described vacuum chamber comprises the retractable support hand being arranged on the cavity wall relative with chamber door and is arranged on the dipping needle of inside cavity; Wherein, the direction of described retractable support hand along the cavity wall relative with chamber door to chamber door is flexible, the direction lifting of described dipping needle along cavity bottom to cavity top; Described manipulator comprises that the first crawl plate and second captures plate; Wherein, described first captures plate is positioned at top, and described second captures plate is positioned at below, and described first captures plate and described second and capture plate and be fixed together.
When described vacuum machine transfer system need to carry out exchanging for of substrate, pending substrate is positioned at described first and captures on plate, and the substrate after processing is positioned on described dipping needle.In the case, described first captures plate carries pending substrate and described second and captures together with plate and enter described vacuum chamber, and now described retractable support hand also extend out to the described first below that captures plate; Together with described the first crawl plate and described the second crawl plate, decline, described first captures plate sends pending substrate to described retractable support hand in the process declining; Meanwhile, described dipping needle declines with comparatively faster speed, sends the substrate after processing to described second and captures plate; Described second captures plate carries substrate and described first after processing and captures together with plate and exit described vacuum chamber, and now chamber door is closed; Described dipping needle rises and jack-up is positioned at described retractable support pending substrate on hand, and higher than described retractable support hand, now described retractable support hand is retracted, and described dipping needle carries pending substrate and declines, and prepares to process.
Hence one can see that, described manipulator only needs to enter described vacuum chamber once, by coordinating of the described retractable support hand with in described vacuum chamber and described dipping needle, just can completing substrate exchange for, thereby reduce the time that substrate exchanges for, promote the output of automated production.
Accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, to the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skills, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 (a) is to 1(f) for to utilize vacuum machine transfer system of the prior art to carry out the process schematic diagram that substrate exchanges for;
The structural representation of a kind of vacuum machine transfer system that Fig. 2 provides for the embodiment of the present invention;
The top plan view of the structure of a kind of vacuum machine transfer system that Fig. 3 provides for the embodiment of the present invention;
Fig. 4 (a) is to 4(d) for utilizing the vacuum machine transfer system that the embodiment of the present invention provides to carry out the process schematic diagram that substrate exchanges for.
Reference numeral:
10-vacuum chamber; 101-chamber door; 102-cavity wall; 103-lifting platform; 104-dipping needle; 105-retractable support hand; 106-perforate; 20-manipulator; 201-first captures plate; 202-second captures plate; 203-support arm; 204-telescopic arm; 30-spiral cylinder; 300-seal cover; Substrate after 501-processes; The substrate that 502-is pending.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, obviously, described embodiment is only the present invention's part embodiment, rather than whole embodiment.Embodiment based in the present invention, those of ordinary skills, not making the every other embodiment obtaining under creative work prerequisite, belong to the scope of protection of the invention.
The embodiment of the present invention provides a kind of vacuum machine transfer system, as shown in Figures 2 and 3, comprises vacuum chamber 10 and manipulator 20.Described vacuum chamber 10 comprises the retractable support hand 105 being arranged on the cavity wall 102 relative with chamber door 101 and the dipping needle 104 that is arranged on inside cavity; Wherein, the direction of described retractable support hand 105 along the cavity wall 102 relative with chamber door 101 to chamber door 101 is flexible, the direction lifting of described dipping needle 104 along cavity bottom to cavity top.Described manipulator 20 comprises that the first crawl plate 201 and second captures plate 202; Wherein, described first captures plate 201 is positioned at top, and described second captures plate 202 is positioned at below, and described first captures plate 201 and described second and capture plate 202 and be fixed together.
It should be noted that, the first, because capturing plate 202, described the first crawl plate 201 and described second is fixed together, and, described first captures plate 201 and described second captures the action that plate 202 can pass in and out described vacuum chamber 10 simultaneously and carry out lifting simultaneously; That is to say, described the first crawl plate 201 and described second captures plate 202 can simultaneous retractable and lifting.
The second, described retractable support hand 105 is arranged on the cavity wall 102 relative with described chamber door 101, and the direction along the cavity wall 102 relative with described chamber door 101 to described chamber door 101 is flexible; That is, described retractable support hand 105 is flexible in the direction of upper bottom surface that is parallel to described vacuum chamber 10, and consistent with described the first crawl plate 201 and the flexible direction of described the second crawl plate 202.
The 3rd, the direction lifting of described dipping needle 104 along cavity bottom to cavity top, that is, and the lifting in the direction of the upper bottom surface perpendicular to described vacuum chamber 10 of described dipping needle 104; By controlling the variation of the height of described dipping needle 104, can be from described crawl plate or described retractable support hand 105 by substrate jack-up or fall; Therefore, in order to guarantee the stationarity that substrate picks and places, described dipping needle 104 should at least comprise three dipping needles, just can, by described substrate jack-up or fall stably, prevent that substrate from coming off like this.
The 4th, because described manipulator 20 is arranged on the outside of described vacuum chamber 10, in order to prevent when the chamber of described vacuum chamber 10 door 101 is opened, gas outside vacuum chamber enter in a large number in vacuum chamber or vacuum chamber in residual gas for example toxic gas evaporate in a large number outside vacuum chamber, described manipulator 20 can be arranged in a transmission cavity, thereby reduce and extraneous direct contact.In the case, described vacuum machine transfer system can carry out exchanging for of substrate by described manipulator 20 between described vacuum chamber 10 and described transmission cavity.
The embodiment of the present invention provides a kind of vacuum machine transfer system, comprises vacuum chamber 10 and manipulator 20.Described vacuum chamber 10 comprises the retractable support hand 105 being arranged on the cavity wall 102 relative with chamber door 101 and the dipping needle 104 that is arranged on inside cavity; Wherein, the direction of described retractable support hand 105 along the cavity wall 102 relative with chamber door 101 to chamber door 101 is flexible, the direction lifting of described dipping needle 104 along cavity bottom to cavity top.Described manipulator 20 comprises that the first crawl plate 201 and second captures plate 202; Wherein, described first captures plate 201 is positioned at top, and described second captures plate 202 is positioned at below, and described first captures plate 201 and described second and capture plate 202 and be fixed together.
When described vacuum machine transfer system need to carry out exchanging for of substrate, pending substrate 502 is positioned at described first and captures on plate 201, and the substrate 501 after processing is positioned on described dipping needle 104.In the case, as shown in Figure 4 (a), described first captures plate 201 carries pending substrate 502 and described second and captures together with plate 202 and enter described vacuum chamber 10, and now described retractable support hand 105 also extend out to described first and captures plate 201 belows; As shown in Figure 4 (b), described first captures plate 201 and described second captures together with plate 202 and declines, and described first captures plate 201 sends pending substrate 502 to described retractable support hand 105 in the process declining; Meanwhile, described dipping needle 104 declines with comparatively faster speed, sends the substrate 501 after processing to described second and captures plate 202; As shown in Figure 4 (c), described second captures plate 202 carries substrate 501 and described first after processing and captures together with plate 201 and exit described vacuum chamber 10, and now chamber door 101 is closed; As shown in Fig. 4 (d), described dipping needle 104 rises and jack-up is positioned at the pending substrate 502 on described retractable support hand 105, and higher than described retractable support hand 105, now described retractable support hand 105 is retracted; Described dipping needle 104 carries pending substrate 502 and declines, and prepares to process.
Hence one can see that, described manipulator 20 only needs to enter described vacuum chamber 10 once, by coordinating of the described retractable support hand 105 with in described vacuum chamber 10 and described dipping needle 104, just can completing substrate exchange for, thereby reduce the time that substrate exchanges for, promote the output of automated production.
Optionally, shown in figure 2, described vacuum machine transfer system also comprises outside the cavity that is arranged on described vacuum chamber 10 and the spiral cylinder 30 being connected with described retractable support hand 105; Wherein, described spiral cylinder 30 is for controlling the flexible of described retractable support hand 105.
Here it should be noted that, the length of described retractable support hand 105 is fixed., in fact the flexible of described retractable support hand 105 refer to that the relative position of described retractable support hand 105 in described spiral cylinder 30 can change; That is to say, when described retractable support hand 105 stretches out, it can extend out to described spiral cylinder 30 outsides, when described retractable support hand 105 is retracted, it can be retracted to described spiral cylinder 30 inside, but in whole process, can there is not any variation in the overall length of described retractable support hand 105.
Wherein, selecting spiral cylinder 30 as the flexible power of described retractable support hand 105, is the advantages such as volume is little because described spiral cylinder 30 has, mounting design convenient, the easy adjusting of speed and strength; In addition, the driving medium of described spiral cylinder 30 is gas, can length of run control, and is difficult for producing spark, is therefore widely used in large-scale production line.
On this basis, shown in figure 2, on the cavity wall 102 relative with chamber door 101 of described vacuum chamber 10, be provided with perforate 106, described retractable support hand 105 is connected with described spiral cylinder 30 by the perforate 106 being arranged on described cavity wall 102; Wherein, described spiral cylinder 30 also comprises the seal cover 300 of the external part that is arranged on described retractable support hand 106, and the geomery of described seal cover 300 and described perforate 106 match.
When described retractable support hand 105 stretches out under the promotion of described spiral cylinder 30, described retractable support hand 105 enters the inside of described vacuum chamber 10 by being arranged on the cavity wall relative with chamber door 101 102 the above perforate 106, now described seal cover 300 is separated with perforate 106 on described cavity wall 102; When described retractable support hand 105 is retracted under the pulling of described spiral cylinder 30, described retractable support hand 105 is retracted to described spiral cylinder 30 inside by described perforate 106, now described seal cover 300 is chimeric with the perforate 106 on described cavity wall 102, realizes the sealing of described vacuum chamber 10.
In order to ensure the sealing of described vacuum chamber 10, need make described seal cover 300 and the perforate 106 on described cavity wall 102 closely be entrenched togather; Therefore, further, the cavity inner wall surface of the surface of described seal cover 300 and described vacuum chamber 10 can be fine and close alumina insulation surface.
In addition, optional, shown in figure 2, described vacuum chamber 10 can also comprise the lifting platform 103 that is arranged on cavity bottom; Wherein, described dipping needle 104 is arranged on described lifting platform 103.
Wherein, the length of described dipping needle 104 is fixed.Here, the lifting of described dipping needle 104 refers to that the height that described dipping needle 104 exposes described lifting platform 103 parts can change; When described dipping needle 104 rises, described lifting platform 103 inside exist a certain power that described dipping needle 104 is lifted, and the part that makes described dipping needle 104 expose described lifting platform 103 increases gradually; When described dipping needle 104 declines, described lifting platform 103 inside exist a certain power that described dipping needle 104 is fallen, and the part that makes described dipping needle 104 expose described lifting platform 103 reduces gradually.
Based on foregoing description, with reference to the top plan view shown in figure 3, for the stationarity that guarantees that substrate picks and places, described retractable support hand 105 can comprise two supporting plates of equal height; Described first captures plate 201 and described second captures two supporting plates that plate 202 also can comprise respectively equal height; Wherein, the spacing between two supporting plates of the spacing between the spacing between two supporting plates of described the first crawl plate 201 and two supporting plates of described the second crawl plate 202 and described retractable support hand 105 is different.
Like this, when described first captures plate 201 and described second and captures plate 202 and enter the cavity of described vacuum chamber 10 and carry out the exchanging for of substrate, just can guarantee that described the first crawl plate 201 and described second captures plate 202 and described retractable support hand 105 mutual collision can not occur in the process of lifting, thereby guarantee the normal operation of this vacuum machine transfer system.
It should be noted that, can adopt two supporting plates of retractable support hand 105 described in two spiral cylinder 30 Synchronization Control here.
Further, with reference to figure 4(a) shown in, described manipulator 20 can also comprise support arm 203 and telescopic arm 204, described the first crawl plate 201 and described second captures plate 202 and is connected with described support arm 203 by described telescopic arm 204.Like this, when described support arm 203 rises or declines, just can capture plate 202 by described the first crawl plate 201 of described telescopic arm 204 drives and described second and rise or decline, and described telescopic arm 204 can also be controlled the flexible of described the first crawl plate 201 and described the second crawl plate 202.
Known based on foregoing description, when described vacuum machine transfer system is in running order, described manipulator 20 only needs to enter exchanging for that described vacuum chamber 10 once just can completing substrate.In order further to improve the operating efficiency of described vacuum machine transfer system, described vacuum machine transfer system can comprise a plurality of described vacuum chambers 10; Wherein, a plurality of described vacuum chambers 10 can be separately positioned on the different azimuth of described manipulator 20.Now, described manipulator 20 can from different described vacuum chamber 10 between realize exchanging for of substrate.
Because described manipulator 20 comprises the telescopic arm 204 being connected with described the first crawl plate 201 and described the second crawl plate 202 and the support arm 203 being connected with described telescopic arm 204, in the situation that described vacuum machine transfer system comprises a plurality of described vacuum chamber 10, described support arm 203 not only can be controlled described first by described telescopic arm 204 and capture the lifting that plate 201 and described second captures plate 202, further, can also control described first by described telescopic arm 204 and capture the rotation that plate 201 and described second captures plate 202.
; when described manipulator 20 completed and the first vacuum chamber between the exchanging for of substrate after; described support arm 203 can capture plate 202 rotations by described the first crawl plate 201 of described telescopic arm 204 controls and described second and extremely be positioned at the second vacuum chamber of different azimuth with described the first vacuum chamber; described manipulator 20 carries out exchanging for of substrate again and between described the second vacuum chamber, by that analogy.So just, can realize exchanging for of substrate between described manipulator 20 and a plurality of described vacuum chamber 10, thereby improve the operating efficiency of described vacuum machine transfer system.
On this basis, further, described vacuum machine transfer system can also comprise the first motor of being connected with described telescopic arm 204, the second motor and the 3rd motor are connected with described support arm 203; Wherein, described the first motor is for controlling the flexible of described telescopic arm 204; Described the second motor and described the 3rd motor are respectively used to control lifting and the rotation of described support arm 203.
To provide a specific embodiment to describe the operation principle of described vacuum machine transfer system below.
Described vacuum machine conveyor system applications is in the production of TFT-LCD factory, the vacuum reaction chamber that described vacuum chamber 10 is dry etching equipment, and described manipulator 20 is positioned at transmission cavity, and described substrate is the glass substrate for the manufacture of array base palte.
On this basis, the specific works step of described vacuum machine transfer system is as follows:
S101, with reference to figure 4(a) shown in, the telescopic arm 204 of described manipulator 20, under the effect of described the first motor, is controlled described first and is captured glass substrate and described second that plate 201 carries question response and capture together with plate 202 and enter vacuum reaction chamber; Now, described spiral cylinder 30 promotes the below that described retractable support hand 105 extend out to described the first crawl plate 201.
Wherein, the height of described retractable support hand 105 is positioned at the top of the reacted glass substrate on described dipping needle 104.
S102, with reference to figure 4(b) shown in, the support arm 203 of described manipulator 20, under the effect of described the second motor, is controlled described first by described telescopic arm 204 and is captured plate 201 and described second and capture together with plate 202 and decline; Described first captures plate 201 sends the glass substrate of described question response to described retractable support hand 105 in the process declining.
Meanwhile, described dipping needle 104, under the effect of described lifting platform 103, declines with comparatively faster speed, sends reacted glass substrate to described second and captures plate 202.
S103, with reference to figure 4(c) shown in, described second captures plate 202 carries described reacted glass substrate and described first and captures together with plate 201 and exit described vacuum reaction chamber, with back cavity door 101, closes.
S104, with reference to figure 4(d) shown in, described dipping needle 104 rises under the effect of described lifting platform 103, and jack-up is positioned at the glass substrate of the described question response on described retractable support hand 105, and higher than described retractable support hand 105.
Now, described spiral cylinder 30 is controlled described retractable support hand 105 and is retracted, and the described seal cover 300 that is positioned at described retractable support hand 105 external parts is chimeric with the perforate 106 on described cavity wall 102, realizes the sealing of described vacuum reaction chamber.
The glass substrate that S105, described dipping needle 104 carry described question response declines, and prepares to process.
By above-mentioned steps S101-S105, described manipulator 20 only needs to enter described vacuum reaction chamber once, just can between described vacuum reaction chamber and described transmission cavity, complete the transmission of glass substrate, thereby shorten the time that exchanges for of described glass substrate; In addition, exchanging in process of described glass substrate, because described manipulator 20 is positioned at described transmission cavity, can avoid like this gas outside described vacuum reaction chamber enter in a large number residual gas in described vacuum reaction chamber and in described vacuum reaction chamber for example toxic gas evaporate in a large number outside described vacuum reaction chamber.
On this basis, when described manipulator 20 also needs and carries out the transmission of described glass substrate described in other between vacuum chamber 10, described vacuum machine transfer system can drive described the first crawl plate 201 and described second to capture plate 202 rotations to vacuum chamber described in other 10, to carry out exchanging for of described glass substrate by support arm described in described the 3rd Electric Machine Control 203.
The above; be only the specific embodiment of the present invention, but protection scope of the present invention is not limited to this, is anyly familiar with those skilled in the art in the technical scope that the present invention discloses; can expect easily changing or replacing, within all should being encompassed in protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection range of described claim.
Claims (8)
1. a vacuum machine transfer system, comprises manipulator and vacuum chamber; It is characterized in that,
Described vacuum chamber comprises the retractable support hand being arranged on the cavity wall relative with chamber door and is arranged on the dipping needle of inside cavity; Wherein, the direction of described retractable support hand along the cavity wall relative with chamber door to chamber door is flexible, the direction lifting of described dipping needle along cavity bottom to cavity top;
Described manipulator comprises that the first crawl plate and second captures plate; Wherein, described first captures plate is positioned at top, and described second captures plate is positioned at below, and described first captures plate and described second and capture plate and be fixed together.
2. vacuum machine transfer system according to claim 1, is characterized in that, described vacuum machine transfer system also comprises and is arranged on the cavity outside of described vacuum chamber and the spiral cylinder connecting with described retractable support palmistry;
Wherein, described spiral cylinder is for controlling the flexible of described retractable support hand.
3. vacuum machine transfer system according to claim 2, is characterized in that, on the cavity wall relative with chamber door of described vacuum chamber, is provided with perforate, and described retractable support hand is connected with described spiral cylinder by the perforate being arranged on described cavity wall;
Wherein, described spiral cylinder also comprises the seal cover of the external part that is arranged on described retractable support hand, and the geomery of described seal cover and described perforate match.
4. vacuum machine transfer system according to claim 3, is characterized in that, the cavity inner wall surface of the surface of described seal cover and described vacuum chamber is alumina insulation surface.
5. vacuum machine transfer system according to claim 1, is characterized in that, described vacuum chamber also comprises the lifting platform that is arranged on cavity bottom;
Wherein, described dipping needle is arranged on described lifting platform.
6. vacuum machine transfer system according to claim 1, is characterized in that, described retractable support hand comprises two supporting plates of equal height;
Described first captures plate and described second captures two supporting plates that plate also comprises respectively equal height;
Wherein, the spacing between two supporting plates of the spacing between the spacing between two supporting plates of described the first crawl plate and two supporting plates of described the second crawl plate and described retractable support hand is different.
7. vacuum machine transfer system according to claim 1, is characterized in that, described manipulator also comprises the telescopic arm being connected with described the first crawl plate and described the second crawl plate and the support arm being connected with described telescopic arm;
Wherein, described telescopic arm captures the flexible of plate and described the second crawl plate for fixing and controlling described first;
Described support arm is for fixing and control lifting and the rotation of described telescopic arm.
8. vacuum machine transfer system according to claim 7, is characterized in that, described vacuum machine transfer system also comprises the first motor of being connected with described telescopic arm, the second motor and the 3rd motor are connected with described support arm;
Wherein, described the first motor is for controlling the flexible of described telescopic arm;
Described the second motor and described the 3rd motor are respectively used to control lifting and the rotation of described support arm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201310699013.8A CN103700613B (en) | 2013-12-18 | 2013-12-18 | A kind of vacuum mechanical delivery system |
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| CN201310699013.8A CN103700613B (en) | 2013-12-18 | 2013-12-18 | A kind of vacuum mechanical delivery system |
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| CN103700613A true CN103700613A (en) | 2014-04-02 |
| CN103700613B CN103700613B (en) | 2016-02-03 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104201142B (en) * | 2014-07-07 | 2017-02-08 | 京东方科技集团股份有限公司 | Mechanical arm and vacuum reaction device |
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| US5162047A (en) * | 1989-08-28 | 1992-11-10 | Tokyo Electron Sagami Limited | Vertical heat treatment apparatus having wafer transfer mechanism and method for transferring wafers |
| EP0975009A1 (en) * | 1998-07-22 | 2000-01-26 | Asm Japan K.K. | Wafer transfer mechanism |
| JP2006248680A (en) * | 2005-03-10 | 2006-09-21 | Hitachi Plant Technologies Ltd | Support structure of telescopic arm in transfer machine |
| CN1913098A (en) * | 2005-08-11 | 2007-02-14 | 中微半导体设备(上海)有限公司 | Loading umloading device of semiconductor processing piece and its loading and unloading method |
| CN201397812Y (en) * | 2009-05-20 | 2010-02-03 | 北京金盛微纳科技有限公司 | Sample wafer delivery device |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5162047A (en) * | 1989-08-28 | 1992-11-10 | Tokyo Electron Sagami Limited | Vertical heat treatment apparatus having wafer transfer mechanism and method for transferring wafers |
| EP0975009A1 (en) * | 1998-07-22 | 2000-01-26 | Asm Japan K.K. | Wafer transfer mechanism |
| JP2006248680A (en) * | 2005-03-10 | 2006-09-21 | Hitachi Plant Technologies Ltd | Support structure of telescopic arm in transfer machine |
| CN1913098A (en) * | 2005-08-11 | 2007-02-14 | 中微半导体设备(上海)有限公司 | Loading umloading device of semiconductor processing piece and its loading and unloading method |
| CN201397812Y (en) * | 2009-05-20 | 2010-02-03 | 北京金盛微纳科技有限公司 | Sample wafer delivery device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104201142B (en) * | 2014-07-07 | 2017-02-08 | 京东方科技集团股份有限公司 | Mechanical arm and vacuum reaction device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103700613B (en) | 2016-02-03 |
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