CN103646983A - 背发射极对称异质结太阳电池及其制备方法 - Google Patents
背发射极对称异质结太阳电池及其制备方法 Download PDFInfo
- Publication number
- CN103646983A CN103646983A CN201310632740.2A CN201310632740A CN103646983A CN 103646983 A CN103646983 A CN 103646983A CN 201310632740 A CN201310632740 A CN 201310632740A CN 103646983 A CN103646983 A CN 103646983A
- Authority
- CN
- China
- Prior art keywords
- thin film
- semiconductive thin
- silicon substrate
- film
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 85
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 85
- 239000010703 silicon Substances 0.000 claims abstract description 85
- 239000000758 substrate Substances 0.000 claims abstract description 64
- 239000010409 thin film Substances 0.000 claims description 129
- 239000010408 film Substances 0.000 claims description 90
- 238000002161 passivation Methods 0.000 claims description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 24
- 239000013078 crystal Substances 0.000 claims description 24
- 238000005984 hydrogenation reaction Methods 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 14
- 239000000377 silicon dioxide Substances 0.000 claims description 12
- 238000005516 engineering process Methods 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 8
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 8
- 239000002131 composite material Substances 0.000 claims description 7
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 7
- 238000002955 isolation Methods 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 4
- QTPKWWJYDWYXOT-UHFFFAOYSA-N [W+4].[O-2].[In+3] Chemical compound [W+4].[O-2].[In+3] QTPKWWJYDWYXOT-UHFFFAOYSA-N 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 230000000694 effects Effects 0.000 claims description 3
- 229910003437 indium oxide Inorganic materials 0.000 claims description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 2
- 229920005591 polysilicon Polymers 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 abstract description 12
- 238000009792 diffusion process Methods 0.000 abstract description 4
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 239000000969 carrier Substances 0.000 abstract 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 239000002800 charge carrier Substances 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/035281—Shape of the body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic Table
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310632740.2A CN103646983B (zh) | 2013-11-29 | 2013-11-29 | 背发射极对称异质结太阳电池及其制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310632740.2A CN103646983B (zh) | 2013-11-29 | 2013-11-29 | 背发射极对称异质结太阳电池及其制备方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103646983A true CN103646983A (zh) | 2014-03-19 |
CN103646983B CN103646983B (zh) | 2016-09-07 |
Family
ID=50252175
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310632740.2A Active CN103646983B (zh) | 2013-11-29 | 2013-11-29 | 背发射极对称异质结太阳电池及其制备方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN103646983B (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105552150A (zh) * | 2015-12-25 | 2016-05-04 | 常州天合光能有限公司 | 单面横向梯度掺杂异质结电池及其制备方法 |
CN106252449A (zh) * | 2016-08-26 | 2016-12-21 | 泰州中来光电科技有限公司 | 局部掺杂前表面场背接触电池及其制备方法和组件、系统 |
CN108682701A (zh) * | 2018-05-07 | 2018-10-19 | 张家港协鑫集成科技有限公司 | 太阳能电池及其制作工艺 |
CN111816731A (zh) * | 2020-07-10 | 2020-10-23 | 普乐新能源科技(徐州)有限公司 | 一种制作hbc电池背面掺杂非晶硅的方法 |
CN113540264A (zh) * | 2021-01-11 | 2021-10-22 | 宣城睿晖宣晟企业管理中心合伙企业(有限合伙) | 一种太阳能电池及其制备方法 |
CN114628543A (zh) * | 2020-11-27 | 2022-06-14 | 嘉兴阿特斯技术研究院有限公司 | 异质结太阳能电池及其制作方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001203376A (ja) * | 2000-01-18 | 2001-07-27 | Sharp Corp | 太陽電池 |
JP2005322780A (ja) * | 2004-05-10 | 2005-11-17 | Toyota Motor Corp | 太陽電池 |
CN101097969A (zh) * | 2006-06-30 | 2008-01-02 | 通用电气公司 | 包括所有背面接触结构的光电器件以及相关处理 |
CN202363468U (zh) * | 2011-12-08 | 2012-08-01 | 常州天合光能有限公司 | 点接触背发射极异质结太阳电池 |
CN102714229A (zh) * | 2010-01-06 | 2012-10-03 | 荷兰能源建设基金中心 | 太阳能电池和用于制造这种太阳能电池的方法 |
CN203760487U (zh) * | 2013-11-29 | 2014-08-06 | 常州天合光能有限公司 | 背发射极对称异质结太阳电池 |
-
2013
- 2013-11-29 CN CN201310632740.2A patent/CN103646983B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001203376A (ja) * | 2000-01-18 | 2001-07-27 | Sharp Corp | 太陽電池 |
JP2005322780A (ja) * | 2004-05-10 | 2005-11-17 | Toyota Motor Corp | 太陽電池 |
CN101097969A (zh) * | 2006-06-30 | 2008-01-02 | 通用电气公司 | 包括所有背面接触结构的光电器件以及相关处理 |
CN102714229A (zh) * | 2010-01-06 | 2012-10-03 | 荷兰能源建设基金中心 | 太阳能电池和用于制造这种太阳能电池的方法 |
CN202363468U (zh) * | 2011-12-08 | 2012-08-01 | 常州天合光能有限公司 | 点接触背发射极异质结太阳电池 |
CN203760487U (zh) * | 2013-11-29 | 2014-08-06 | 常州天合光能有限公司 | 背发射极对称异质结太阳电池 |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105552150A (zh) * | 2015-12-25 | 2016-05-04 | 常州天合光能有限公司 | 单面横向梯度掺杂异质结电池及其制备方法 |
CN106252449A (zh) * | 2016-08-26 | 2016-12-21 | 泰州中来光电科技有限公司 | 局部掺杂前表面场背接触电池及其制备方法和组件、系统 |
CN106252449B (zh) * | 2016-08-26 | 2017-09-26 | 泰州中来光电科技有限公司 | 局部掺杂前表面场背接触电池及其制备方法和组件、系统 |
CN108682701A (zh) * | 2018-05-07 | 2018-10-19 | 张家港协鑫集成科技有限公司 | 太阳能电池及其制作工艺 |
CN108682701B (zh) * | 2018-05-07 | 2021-06-04 | 张家港协鑫集成科技有限公司 | 太阳能电池及其制作工艺 |
CN111816731A (zh) * | 2020-07-10 | 2020-10-23 | 普乐新能源科技(徐州)有限公司 | 一种制作hbc电池背面掺杂非晶硅的方法 |
CN111816731B (zh) * | 2020-07-10 | 2022-03-29 | 普乐新能源科技(徐州)有限公司 | 一种制作hbc电池背面掺杂非晶硅的方法 |
CN114628543A (zh) * | 2020-11-27 | 2022-06-14 | 嘉兴阿特斯技术研究院有限公司 | 异质结太阳能电池及其制作方法 |
CN113540264A (zh) * | 2021-01-11 | 2021-10-22 | 宣城睿晖宣晟企业管理中心合伙企业(有限合伙) | 一种太阳能电池及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
CN103646983B (zh) | 2016-09-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN109244194B (zh) | 一种低成本p型全背电极晶硅太阳电池的制备方法 | |
US10084107B2 (en) | Transparent conducting oxide for photovoltaic devices | |
CN203760487U (zh) | 背发射极对称异质结太阳电池 | |
TW201733140A (zh) | 串接太陽電池及其製造方法 | |
JP5424800B2 (ja) | デュアルドーピングを備えたヘテロ接合光電池及びその製造方法 | |
CN110707159A (zh) | 一种正背面全面积接触钝化的p型晶硅太阳电池及其制备方法 | |
CN105870215A (zh) | 一种背面钝化接触电池电极结构及其制备方法 | |
JP2010219527A (ja) | バックコンタクト単一ヘテロ接合型太陽電池の製造方法及びバックコンタクト単一ヘテロ接合型太陽電池 | |
CN103646983A (zh) | 背发射极对称异质结太阳电池及其制备方法 | |
CN202363468U (zh) | 点接触背发射极异质结太阳电池 | |
CN103199143B (zh) | N型掺氢晶化硅钝化的异质结太阳能电池器件 | |
CN104733557B (zh) | Hit太阳能电池及提高hit电池的短路电流密度的方法 | |
CN205657066U (zh) | 一种背面钝化接触电池电极结构 | |
CN103117329B (zh) | 异质结mwt电池及其制作方法、载片舟 | |
CN113410328A (zh) | 一种晶硅异质结太阳能电池 | |
CN106057926A (zh) | 具有叠层异质结结构的钝化发射极太阳电池及其制备方法 | |
CN107275432B (zh) | 一种晶体硅太阳能电池及其制备方法 | |
CN103985778B (zh) | 具有选择性发射极的异质结太阳能电池及其制备方法 | |
CN106449850B (zh) | 一种高效硅基异质结双面电池及其制备方法 | |
CN108615775B (zh) | 一种叉指背接触异质结单晶硅电池 | |
US8889981B2 (en) | Photoelectric device | |
CN112768549A (zh) | 一种高光电转换效率的hjt电池及其制备方法 | |
CN103227228B (zh) | P型硅衬底异质结电池 | |
JP2008227269A (ja) | 光電変換素子、太陽電池モジュール、太陽光発電システム | |
CN215220744U (zh) | 一种高光电转换效率的hjt电池 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 213031, No. 2, Tianhe Road, Xinbei Industrial Park, Jiangsu, Changzhou Patentee after: TRINA SOLAR Co.,Ltd. Address before: 213031, No. 2, Tianhe Road, Xinbei Industrial Park, Jiangsu, Changzhou Patentee before: trina solar Ltd. Address after: 213031, No. 2, Tianhe Road, Xinbei Industrial Park, Jiangsu, Changzhou Patentee after: trina solar Ltd. Address before: 213031, No. 2, Tianhe Road, Xinbei Industrial Park, Jiangsu, Changzhou Patentee before: CHANGZHOU TRINA SOLAR ENERGY Co.,Ltd. |