CN103594592A - Flip-chip light-emitting diode with coarsened transparent electrodes - Google Patents

Flip-chip light-emitting diode with coarsened transparent electrodes Download PDF

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Publication number
CN103594592A
CN103594592A CN201310554460.4A CN201310554460A CN103594592A CN 103594592 A CN103594592 A CN 103594592A CN 201310554460 A CN201310554460 A CN 201310554460A CN 103594592 A CN103594592 A CN 103594592A
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emitting diode
layer
light
led
transparent electrode
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CN201310554460.4A
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CN103594592B (en
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张翠
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Liyang Technology Development Center
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LIYANG JIANGDA TECHNOLOGY TRANSFER CENTER Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • H01L33/385Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending at least partially onto a side surface of the semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0016Processes relating to electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40Materials therefor
    • H01L33/42Transparent materials

Abstract

The invention discloses a flip-chip light-emitting diode with coarsened transparent electrodes. The flip-chip light-emitting diode comprises a bearing substrate (1), a p-type reflecting electrode (2) on the bearing substrate (1), a p-type semi-conductor layer (4) on the p-type reflecting electrode (2), an active layer (5) on the p-type semi-conductor layer (4), a n-type semi-conductor layer (6) on the active layer (5) and transparent electrode layers (7) on the n-type semi-conductor layer (6), wherein the transparent electrode layers (7) cover the top face and the side faces of the whole flip-chip light-emitting diode body, and the whole surfaces of the transparent electrode layers (7) are provided with coarsened structures (9). The flip-chip light-emitting diode manufactured in the method can improve integration, simplifies the process and does not need a lead structure, and accordingly manufacturing cost is reduced, the light extraction efficiency can be improved, and the whole light-emitting efficiency is improved.

Description

The inverted light-emitting diode (LED) with alligatoring transparency electrode
Technical field
The invention belongs to technical field of semiconductors, particularly a kind of inverted light-emitting diode (LED) with alligatoring transparency electrode.
Background technology
The advantage of semiconductor light-emitting-diode is that luminous intensity is high, light directive property is strong, energy consumption is low, cheap for manufacturing cost etc., so its application is increasingly extensive, particularly aspect illumination, has the trend that replaces incandescent lamp and fluorescent lamp.The advantage of upside-down mounting (flip-chip) formula light-emitting diode is that heat dissipation characteristics is good and luminous efficiency is higher.And in recent years, in order to improve the brightness of light-emitting diode, developed the light-emitting diode of vertical stratification, with respect to positive assembling structure, i.e. the light-emitting diode of platform (mesa) structure, the light-emitting diode of vertical stratification has plurality of advantages.Two electrodes of light emitting diode with vertical structure are the both sides in light-emitting diode respectively, and electric current almost whole vertical currents is crossed semiconductor epitaxial layers, there is no the electric current of lateral flow, so CURRENT DISTRIBUTION is even, and the heat of generation is relatively less.And because two electrodes of vertical stratification are in both sides, therefore go out in photoreduction process and can not be subject to stopping of same lateral electrode, its light extraction efficiency is higher.
But the problem that the light-emitting diode of above-mentioned vertical stratification exists is, two electrodes are the both sides in light-emitting diode respectively, cause that integrated level is low, complex process, and also need pin configuration, and light to take out efficiency low.
Summary of the invention
In view of this, the present invention is directed to the problem of prior art, proposed a kind of inverted light-emitting diode (LED) with alligatoring transparency electrode.Structure and setting by the N-shaped electrode to this light-emitting diode and p-type electrode improve, and can improve integrated level, simplify technique, without pin configuration, thereby reduce manufacturing cost.And the inverted light-emitting diode (LED) with transparency electrode of the present invention can improve light and take out efficiency, thereby promote whole lighting efficiency.
The inverted light-emitting diode (LED) with alligatoring transparency electrode that the present invention proposes comprises:
Bearing substrate (1);
P-type reflecting electrode (2) on bearing substrate (1);
P-type semiconductor layer (4) on p-type reflecting electrode (2);
Active layer (5) on p-type semiconductor layer (4);
N-shaped semiconductor layer (6) on active layer (5); And
Transparent electrode layer (7) on N-shaped semiconductor layer (6),
Wherein transparent electrode layer (7) covers end face and the side of whole inverted light-emitting diode (LED), and the whole surface of transparent electrode layer (7) all has alligatoring structure (9).
Accompanying drawing explanation
Fig. 1 is the sectional view with the inverted light-emitting diode (LED) of alligatoring transparency electrode of the present invention;
Fig. 2 is the sectional view in the manufacture of the inverted light-emitting diode (LED) with alligatoring transparency electrode of the present invention;
Fig. 3 is the vertical view of the inverted light-emitting diode (LED) with alligatoring transparency electrode in the manufacture of Fig. 2.
Embodiment
Below with reference to Fig. 1-3, describe inverted light-emitting diode (LED) and the manufacture method thereof with alligatoring transparency electrode of the present invention in detail.For clarity sake, the equal not drawn on scale of each structure shown in accompanying drawing, and the present invention is not limited to structure shown in figure.
First with reference to figure 1, the inverted light-emitting diode (LED) with alligatoring transparency electrode comprises bearing substrate (1); P-type reflecting electrode (2) on bearing substrate (1); P-type semiconductor layer (4) on p-type reflecting electrode (2); Active layer (5) on p-type semiconductor layer (4); N-shaped semiconductor layer (6) on active layer (5); And the transparent electrode layer (7) on N-shaped semiconductor layer (6), wherein transparent electrode layer (7) covers end face and the side of whole inverted light-emitting diode (LED), and the whole surface of transparent electrode layer (7) all has alligatoring structure (9).
Bearing substrate (1) can be the metal material with highly reflective, for example the combination of Al, Au, Ag, Pt, Ni, Cu, Ti or above-mentioned metal material.
P-type reflecting electrode (2) is the metal material with highly reflective, for example the multi-layered electrode combining of Al, Au, Ag, Pt, Ni, Cu, Ti or above-mentioned metal material.
The material of p-type semiconductor layer (4), active layer (5) and N-shaped semiconductor layer (6) is for example III-V family semi-conducting material, for example GaN, AlN, InGaN, AlGaN etc.
Transparent electrode layer (7) is transparent conductive oxide (TCO), can be specifically tin indium oxide (ITO), ZnO, AZO, ATO, FTO, SnO 2deng in the laminated film of one or more or above-mentioned material.
And as shown in Fig. 1 and 3, p-type reflecting electrode (2) and the area of p-type semiconductor layer (4) in vertical view are less than the area of active layer (5) and N-shaped semiconductor layer (6), by etching, etch away part p-type reflecting electrode (2) and p-type semiconductor layer (4), thereby exposed portions serve active layer (5), thereby formation ledge structure, and in ledge structure, fill transparent insulating layer (3), for example Al 2o 3.And transparent electrode layer (7) covers end face and the side of whole inverted light-emitting diode (LED), specifically referring to Fig. 3, transparent electrode layer (7) covers the end face of inverted light-emitting diode (LED), namely cover whole N-shaped semiconductor layer (6), and cover the side of whole inverted light-emitting diode (LED), namely cover four sides of inverted light-emitting diode (LED).And transparent electrode layer (7) is as the n electrode of inverted light-emitting diode (LED), and in order to make as insulated from each other between the transparent electrode layer (7) of the n electrode of inverted light-emitting diode (LED) and p-type reflecting electrode (2), to prevent short circuit, there is above-mentioned transparent insulating layer (3) covering between the transparent electrode layer (7) of four sides of inverted light-emitting diode (LED) and p-type reflecting electrode (2).
And the whole surface of transparent electrode layer (7) all has alligatoring structure (9), alligatoring structure (9) forms as follows: titaniferous nanoparticle dispersion liquid is spin-coated on to the whole surface of transparent electrode layer (7), thereby forms individual layer titanium nanoparticulate thin films; Individual layer titanium nanoparticulate thin films is dried, form the mask layer of the required individual layer titanium nano particle of ICP etching; Utilize the mask layer of individual layer titanium nano particle to carry out ICP etching to transparent electrode layer (7), thereby form alligatoring structure (9) on the whole surface of transparent electrode layer (7); Remove the mask layer of individual layer titanium nano particle.And the roughness Ra of alligatoring structure (9) is 1nm-10nm, preferred 2.5nm, 3.5nm, 4.5nm, 6.5nm, 8.5nm, 9.5nm.
The manufacture method with the inverted light-emitting diode (LED) of alligatoring transparency electrode of the present invention is below described.Specifically with reference to Fig. 1-2.
(1) provide growth substrates, order forms N-shaped semiconductor layer (6), active layer (5), p-type semiconductor layer (4) and p-type reflecting electrode (2) thereon;
(2) part p-type semiconductor layer (4) and p-type reflecting electrode (2) are etched with to exposed portions serve active layer (5), thereby form ledge structure;
(3) transparent insulation material is filled into ledge structure, thereby forms transparent insulating layer (3);
(4) resulting structures is inverted, is arranged on bearing substrate (1) upper, and peels off growth substrates, thereby expose N-shaped semiconductor layer (6);
(5) at the upper transparent electrode layer (7) that forms of the N-shaped semiconductor layer (6) exposing;
(6) form groove (8), it penetrates transparent electrode layer (7), N-shaped semiconductor layer (6), active layer (5), transparent insulating layer (3), and groove (8) has madial wall (8b) and lateral wall (8a);
(7) in groove (8), fill the transparent conductive material for transparent electrode layer (7), for example ITO, ZnO, AZO, ATO, FTO, SnO 2deng in the laminated film of one or more or above-mentioned material;
(8) utilize lateral wall (8a) as cut-boundary, inverted light-emitting diode (LED) is cut, thereby remove partially transparent electrode layer (7), N-shaped semiconductor layer (6), active layer (5), transparent insulating layer (3), thereby all formed transparent electrode layer (7) on four sides of whole inverted light-emitting diode (LED) and end face;
(9) titaniferous nanoparticle dispersion liquid is spin-coated on to the whole surface of transparent electrode layer (7), thereby forms individual layer titanium nanoparticulate thin films; Individual layer titanium nanoparticulate thin films is dried, form the mask layer of the required individual layer titanium nano particle of ICP etching; Utilize the mask layer of individual layer titanium nano particle to carry out ICP etching to transparent electrode layer (7), thereby form alligatoring structure (9) on the whole surface of transparent electrode layer (7); Remove the mask layer of individual layer titanium nano particle.Form thus the inverted light-emitting diode (LED) with alligatoring transparency electrode of the present invention.
So far, detailed explanation of foregoing description inverted light-emitting diode (LED) and the manufacture method thereof with transparency electrode of the present invention, the light-emitting diode making with respect to existing method, the light-emitting diode that the method that the present invention proposes makes can improve integrated level, simplify technique, without pin configuration, thereby reduce manufacturing cost.And the inverted light-emitting diode (LED) with transparency electrode of the present invention can improve light and take out efficiency, thereby promote whole lighting efficiency.The embodiment describing is above only the preferred embodiments of the present invention, and it is not intended to limit the present invention.Those skilled in the art are not departing under the prerequisite of spirit of the present invention, can make any modification to the present invention, and protection scope of the present invention are limited to the appended claims.

Claims (4)

1. an inverted light-emitting diode (LED) with alligatoring transparency electrode, comprising:
Bearing substrate (1);
P-type reflecting electrode (2) on bearing substrate (1);
P-type semiconductor layer (4) on p-type reflecting electrode (2);
Active layer (5) on p-type semiconductor layer (4);
N-shaped semiconductor layer (6) on active layer (5); And
Transparent electrode layer (7) on N-shaped semiconductor layer (6),
Wherein transparent electrode layer (7) covers end face and the side of whole inverted light-emitting diode (LED), and the whole surface of transparent electrode layer (7) all has alligatoring structure (9).
2. inverted light-emitting diode (LED) according to claim 1, the roughness Ra of wherein alligatoring structure (9) is 1nm-10nm, preferably 2.5nm, 3.5nm, 4.5nm, 6.5nm, 8.5nm, 9.5nm.
3. inverted light-emitting diode (LED) according to claim 2, wherein transparent insulating layer (3) is clamped between the transparent electrode layer (7) and the p-type reflecting electrode (2) on bearing substrate (1) of the side that covers inverted light-emitting diode (LED), so that transparent electrode layer (7) is insulated from each other with p-type reflecting electrode (2), and transparent insulating layer (3) is for example Al 2o 3.
4. inverted light-emitting diode (LED) according to claim 3, wherein transparent electrode layer (7) is ITO, ZnO, AZO, ATO, FTO, SnO 2deng in the laminated film of one or more or above-mentioned material.
CN201310554460.4A 2013-11-08 2013-11-08 There is the inverted light-emitting diode (LED) of alligatoring transparency electrode Active CN103594592B (en)

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Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101075652A (en) * 2006-09-05 2007-11-21 武汉迪源光电科技有限公司 Production of coarsening electrode for high-brightness packed LED chip and vertical LED chip
CN101257075A (en) * 2008-03-13 2008-09-03 鹤山丽得电子实业有限公司 Light emitting diode device and manufacturing method thereof
US20090014748A1 (en) * 2007-07-11 2009-01-15 Sony Corporation Method of electrically connecting element to wiring, method of producing light-emitting element assembly, and light-emitting element assembly
CN101351899A (en) * 2005-12-29 2009-01-21 罗姆股份有限公司 Semiconductor light emitting device and method for manufacturing the same
CN101702419A (en) * 2009-10-30 2010-05-05 华南师范大学 Surface roughening method of p-GaN layer or ITO layer in GaN-based LED chip structure
CN102163673A (en) * 2010-02-18 2011-08-24 Lg伊诺特有限公司 Light emitting device and light emitting device package
US20110204396A1 (en) * 2010-02-24 2011-08-25 Kabushiki Kaisha Toshiba Semiconductor light emitting device and method for manufacturing same
CN102214764A (en) * 2010-04-12 2011-10-12 Lg伊诺特有限公司 Light emitting device, light emitting device package, and lighting system
CN102870216A (en) * 2010-03-31 2013-01-09 欧司朗光电半导体有限公司 Optoelectronic semiconductor chip
CN103378253A (en) * 2012-04-17 2013-10-30 江门市奥伦德光电有限公司 Novel surface roughening method for GaN-based light emitting diode

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101351899A (en) * 2005-12-29 2009-01-21 罗姆股份有限公司 Semiconductor light emitting device and method for manufacturing the same
CN101075652A (en) * 2006-09-05 2007-11-21 武汉迪源光电科技有限公司 Production of coarsening electrode for high-brightness packed LED chip and vertical LED chip
US20090014748A1 (en) * 2007-07-11 2009-01-15 Sony Corporation Method of electrically connecting element to wiring, method of producing light-emitting element assembly, and light-emitting element assembly
CN101257075A (en) * 2008-03-13 2008-09-03 鹤山丽得电子实业有限公司 Light emitting diode device and manufacturing method thereof
CN101702419A (en) * 2009-10-30 2010-05-05 华南师范大学 Surface roughening method of p-GaN layer or ITO layer in GaN-based LED chip structure
CN102163673A (en) * 2010-02-18 2011-08-24 Lg伊诺特有限公司 Light emitting device and light emitting device package
US20110204396A1 (en) * 2010-02-24 2011-08-25 Kabushiki Kaisha Toshiba Semiconductor light emitting device and method for manufacturing same
CN102870216A (en) * 2010-03-31 2013-01-09 欧司朗光电半导体有限公司 Optoelectronic semiconductor chip
CN102214764A (en) * 2010-04-12 2011-10-12 Lg伊诺特有限公司 Light emitting device, light emitting device package, and lighting system
CN103378253A (en) * 2012-04-17 2013-10-30 江门市奥伦德光电有限公司 Novel surface roughening method for GaN-based light emitting diode

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Effective date of registration: 20170724

Address after: Li Cheng Zhen Dong Da Jie Liyang city of Jiangsu Province, Changzhou City, No. 182

Patentee after: Liyang Technology Development Center

Address before: Li Town of Liyang City, Jiangsu province 213300 Changzhou City Dongmen Street No. 67

Patentee before: LIYANG JIANGDA TECHNOLOGY TRANSFER CENTER CO., LTD.