CN103556130A - Mechanical autorotating MOCVD (metalorganic chemical vapor deposition) accessory substrate tray - Google Patents
Mechanical autorotating MOCVD (metalorganic chemical vapor deposition) accessory substrate tray Download PDFInfo
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- CN103556130A CN103556130A CN201310552093.4A CN201310552093A CN103556130A CN 103556130 A CN103556130 A CN 103556130A CN 201310552093 A CN201310552093 A CN 201310552093A CN 103556130 A CN103556130 A CN 103556130A
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Abstract
The invention discloses a mechanical autorotating MOCVD (metalorganic chemical vapor deposition) accessory substrate tray which comprises a substrate placed plate, a substrate gear and a first drive mechanism, wherein a substrate to be subjected to vapor deposition is placed on the substrate placed plate; the substrate gear is fixedly connected below the substrate placed plate; the first drive mechanism drives the substrate gear to rotate along a first direction, and the substrate gear drives the substrate placed plate to rotate. The mechanical autorotating MOCVD accessory substrate tray disclosed by the invention breaks a prejudice of thinking that the substrate placed plate can not be driven by a gear, but can be driven by an air flow in the prior art. According to the invention, the substrate placed plate is running more smoothly under the driving of the gear, so that the effect of vapor deposition is better.
Description
Technical field
The present invention relates to gas phase deposition technology field, relate in particular to the secondary liner tray of a kind of mechanical type rotation MOCVD.
Background technology
Vapour deposition is to utilize physics, the chemical process occurring in gas phase, at substrate surface, forms functional or ornamental metal, nonmetal or compound coat.Common vapour deposition has MOCVD, is exactly organometallics chemical vapour deposition.In order to make vapour deposition more even, improve the quality of deposition, the pallet of carrier substrate need to rotate equably.The homogeneity of pallet temperature and the homogeneity of rotation are all the inhomogeneity important factor that affects the epitaxy sheet that substrate forms by vapour deposition.And in prior art, be by gas channel is set below pallet, allow air-flow drive pallet rotation.Therefore the stability of air-flow and seem particularly important with the interactively of pallet.
For obtaining the epitaxy sheet of the substrate that homogeneity is high, existing people develops a kind of new-type substrate pallet.Above-mentioned substrate pallet is consisted of a main turntable and a plurality of substrate pallets that are positioned on main turntable.Main turntable and a plurality of substrate pallet, when work, all move in the mode of uniform rotation.Please refer to Fig. 1, what Fig. 1 showed is main turntable.The peripheral part of main turntable is provided with a plurality of putting positions 33 of putting substrate pallet.On main turntable in Fig. 1, have 6 putting positions, and putting position can not be over 7 in actual applications.Reason is can see in Fig. 1, and putting position place is provided with the gas channel of arc, and the substrate pallet being seated on main turntable is to rely on the air-flow springing up in gas channel to drive substrate pallet to a direction rotation.And the supporting capacity of air-flow is limited, if surpass 7 substrate pallets, will cause rotary speed unstabilization fixed.The middle part 34 of main turntable and centre hole 35 are for putting the driving mechanism of main turntable self.Main turntable, under the drive of driving mechanism, rotates to the direction contrary with arc gas channel.Main turntable drives all substrate pallets to rotate to same direction, and all substrate pallets rotate to another direction with respect to main turntable.Main turntable is the equal of revolution, and substrate pallet is the equal of autobiography.Substrate such as Sapphire Substrate is seated on substrate pallet.Each substrate pallet can be put a substrate, also can put a plurality of substrates.In the situation that putting a plurality of substrate, on substrate pallet, comprise the cylindrical supporting spring that a plurality of edges are each other tangent to each other, on each cylindrical supporting spring, put a substrate.
Main turntable and substrate pallet rotate to two contrary directions like this, are objectively equivalent to accelerate the velocity of rotation of substrate, so that vapour deposition is more even.
In the secondary liner tray of existing rotation MOCVD, adopting air-flow to drive substrate pallet is in order to keep clean and tidy, avoids other transmission rig in the process of gearing friction, to produce the growth quality that fine particle thing disturbs epitaxy sheet.
In this manner, the homogeneity of substrate pallet temperature and the homogeneity of gas stream mainly depend on revolution and the rotation of above-mentioned main turntable and substrate pallet.
Wherein, substrate pallet spinning motion principle is: by setting in advance the gas stream passage of spiral, at the substrate pallet putting position 33 of main turntable, go out, thereby gas can be imported/be derived by the gas stream passage of above-mentioned spiral, and then can make substrate pallet slight fluctuation, thereby reach, make the substrate pallet can be unsettled and the object of rotation.
But under vacant state, certainly will cannot guarantee that the rotating speed of substrate pallet keeps the even of height.
Summary of the invention
The object of the present invention is to provide more stable, the more uniform substrate pallet of a kind of rotation.
Another object of the present invention is to provide a kind of can produce the more secondary liner tray of mechanical type rotation MOCVD of high quality epitaxial growth sheet.
For this reason, the invention provides the secondary liner tray of a kind of mechanical type rotation MOCVD, comprising: substrate storing dish, on it, put and need by the substrate of vapour deposition; Substrate gear, it is fixed in the below of substrate storing dish; The first driving mechanism, it drives described substrate gear to be rotated in a first direction, and substrate storing dish rotates described in substrate gear driven.
Preferably, the secondary liner tray of described mechanical type rotation MOCVD also comprises: air extractor, it carries out the operation of bleeding below described substrate gear.
Preferably, the secondary liner tray of described mechanical type rotation MOCVD also comprises: rotating disk, and it is driven and is rotated in a second direction, by the second drive unit, and described second direction is contrary with first direction;
On described rotating disk, be provided with described substrate storing dish and described the first driving mechanism, described substrate storing dish, along with described rotating disk swallow second direction is rotated, is rotated in a first direction with respect to described rotating disk again under the effect of the first driving mechanism.
Preferably, in the secondary liner tray of described mechanical type rotation MOCVD, gear centered by described the first driving mechanism, it is arranged on the top, center of described rotating disk, described sun-wheel is meshed with described substrate gear, and described sun-wheel is with respect to described dial rotation.
Preferably, in the secondary liner tray of described mechanical type rotation MOCVD, described substrate storing dish has a plurality of, be evenly distributed on the edge section of described rotating disk, the substrate gear of each substrate storing dish below all meshes with the sun-wheel that is positioned at center of turntable top, and sun-wheel rotates and drives all substrate storing dishes to rotate.
Preferably, in the secondary liner tray of described mechanical type rotation MOCVD, also comprise: cover cap, it covers the top of rotating disk, and cover cap upper shed, and substrate storing dish stretches out from opening part.
Preferably, in the secondary liner tray of described mechanical type rotation MOCVD, each substrate storing dish comprises a plurality of substrates storing platforms, and each substrate is put on platform and put a substrate.
Preferably, the secondary liner tray of described mechanical type rotation MOCVD also comprises: housing, described rotating disk is arranged on the bottom of housing, substrate storing dish is also positioned at housing, the sidewall of housing has hollow sandwich, and the position higher than substrate holding tray of sidewall is provided with a plurality of pores that connect with hollow sandwich.
Preferably, in the secondary liner tray of described mechanical type rotation MOCVD, described air extractor is carried out the operation of bleeding in housing.
The invention has the beneficial effects as follows: contriver found through experiments, below substrate storing dish, gear is set, by geartransmission, driving substrate storing disc spins to produce floats to the trifling of substrate top, also can not affect the growth quality of the epitaxy sheet of vapour deposition on substrate.Having overcome thus substrate storing dish must be by the technology prejudice of air stream drives.And, can also below substrate storing dish, air extractor be set, with in time, by fricative trifling the siphoning away of gear, avoid floating to substrate top.
And with gear driven substrate storing dish, obviously than the stability driving with air-flow and homogeneity, promote a lot.
Accompanying drawing explanation
Fig. 1 is in prior art, the structural representation of main turntable;
Fig. 2 is the structural representation of the secondary liner tray of mechanical type rotation MOCVD of the present invention;
Fig. 3 is the schematic top plan view of the secondary liner tray of mechanical type rotation MOCVD of the present invention.
Embodiment
Below in conjunction with accompanying drawing, the present invention is described in further detail, to make those skilled in the art can implement according to this with reference to specification sheets word.
As shown in Figure 2, the secondary liner tray of mechanical type rotation MOCVD provided by the invention comprises: substrate storing dish 3, and on it, put and need by the substrate of vapour deposition.As shown in Figure 3, substrate 54 is placed on substrate storing dish 3.In each substrate storing dish 3 in Fig. 3, be provided with a plurality of substrates 54, be 7 in Fig. 3.
The secondary liner tray of described mechanical type rotation MOCVD also comprises: air extractor (not shown), it carries out the operation of bleeding below described substrate gear.If gear, in the process of engagement, produces trifling or fines like this, can by air extractor, from below, be taken away in time, and avoid spreading to top, pollute vapor deposition processes.
The secondary liner tray of described mechanical type rotation MOCVD also comprises: rotating disk 1, and it is driven and is rotated in a second direction, by the second drive unit, and described second direction is contrary with first direction.The second drive unit can be also a motor, and the output shaft of motor can be deep in the axis hole at rotating disk 1 middle part, drives thus rotating disk 1 rotation.During rotating disk 1 rotation, be positioned at rotating disk 1 substrate holding tray 3 above also along with rotating disk 1 rotates.But meanwhile, substrate holding tray 3 also rotates in the opposite direction with respect to rotating disk 1.
On rotating disk 1, be provided with described substrate storing dish 3 and described the first driving mechanism, described substrate storing dish, along with described rotating disk swallow second direction is rotated, is rotated in a first direction with respect to described rotating disk again under the effect of the first driving mechanism.
In the secondary liner tray of described mechanical type rotation MOCVD, gear 2 centered by described the first driving mechanism, it can be arranged on by axle 22 top, center of described rotating disk.Axle 22 is inserted in the axis hole 11 at rotating disk 1 center.Described sun-wheel 2 is meshed with described substrate gear 54, and described sun-wheel 2 (also having demonstrated a kind of gear 56 that is positioned at middle part in Fig. 3) is with respect to described dial rotation.Sun-wheel 2 and 54 engagements of substrate gear, when sun-wheel 2 rotation, substrate gear 54 all can rotate like this.
In the secondary liner tray of described mechanical type rotation MOCVD, described substrate storing dish has a plurality of, in Fig. 3, is 8, and the substrate pallet of having broken through air stream drives can not surpass the boundary of 7.Substrate storing dish is evenly distributed on the edge section of described rotating disk 1, and the substrate gear of each substrate storing dish below all meshes with the sun-wheel that is positioned at center of turntable top, and sun-wheel rotates and drives all substrate storing dishes to rotate.
In the secondary liner tray of described mechanical type rotation MOCVD, also comprise: cover cap 4, it covers the top of rotating disk, and cover cap 4 upper sheds, and substrate storing dish stretches out from opening part.It is in order further to prevent that the fricative smalls of gear from dropping on the epitaxy sheet of substrate that cover cap 4 is set.
In the secondary liner tray of described mechanical type rotation MOCVD, each substrate storing dish comprises a plurality of substrates storing platforms, and each substrate is put on platform and put a substrate.As shown in Figure 3, at a substrate, put on platform and put 7 substrates 54.
The secondary liner tray of described mechanical type rotation MOCVD also comprises: housing (not shown), described rotating disk is arranged on the bottom of housing, substrate storing dish is also positioned at housing, the sidewall of housing has hollow sandwich, and the position higher than substrate holding tray of sidewall is provided with a plurality of pores that connect with hollow sandwich.Rotating disk and substrate storing dish are all positioned at housing like this, and above substrate storing dish sidepiece, namely the side-walls of housing, is provided with pore.When air extractor is carried out when operation of bleeding below substrate storing dish, can by pore, affect the gas of substrate top, make the gas of vapour deposition more even, and also can prevent from being subject to trifling impact.
In the secondary liner tray of described mechanical type rotation MOCVD, described air extractor is carried out the operation of bleeding in housing.
It is work-ing life that the present invention has greatly improved product.Be approximately only 3～6 months the work-ing life of the pallet that conventional air drives, and price is at 30,000 dollars.And the present invention can extend the life-span of pallet more than at least one times, cost also decreases.
Although embodiment of the present invention are open, as above it is not restricted to listed utilization in specification sheets and embodiment, and it can be applied to various applicable the field of the invention completely.For those skilled in the art, can easily realize other modification.Therefore do not deviating under the universal that claim and equivalency range limit, the present invention is not limited to specific details and illustrates here and the legend of describing.
Claims (9)
1. the secondary liner tray of mechanical type rotation MOCVD, is characterized in that, comprising:
Substrate storing dish, puts and needs by the substrate of vapour deposition on it;
Substrate gear, it is fixed in the below of substrate storing dish;
The first driving mechanism, it drives described substrate gear to be rotated in a first direction, and substrate storing dish rotates described in substrate gear driven.
2. the secondary liner tray of mechanical type rotation MOCVD as claimed in claim 1, is characterized in that, also comprises:
Air extractor, it carries out the operation of bleeding below described substrate gear.
3. the secondary liner tray of mechanical type rotation MOCVD as claimed in claim 2, is characterized in that, also comprises:
Rotating disk, it is driven and is rotated in a second direction, by the second drive unit, and described second direction is contrary with first direction;
On described rotating disk, be provided with described substrate storing dish and described the first driving mechanism, described substrate storing dish, along with described rotating disk swallow second direction is rotated, is rotated in a first direction with respect to described rotating disk again under the effect of the first driving mechanism.
4. the secondary liner tray of mechanical type rotation MOCVD as claimed in claim 3, it is characterized in that, gear centered by described the first driving mechanism, it is arranged on the top, center of described rotating disk, described sun-wheel is meshed with described substrate gear, and described sun-wheel is with respect to described dial rotation.
5. the secondary liner tray of mechanical type rotation MOCVD as claimed in claim 4, it is characterized in that, described substrate storing dish has a plurality of, be evenly distributed on the edge section of described rotating disk, the substrate gear of each substrate storing dish below all meshes with the sun-wheel that is positioned at center of turntable top, and sun-wheel rotates and drives all substrate storing dishes to rotate.
6. the secondary liner tray of mechanical type rotation MOCVD as claimed in claim 5, is characterized in that, also comprises:
Cover cap, it covers the top of rotating disk, and cover cap upper shed, and substrate storing dish stretches out from opening part.
7. the secondary liner tray of the mechanical type rotation MOCVD as described in claim 5 or 6, is characterized in that, each substrate storing dish comprises a plurality of substrates storing platforms, and each substrate is put on platform and put a substrate.
8. the secondary liner tray of mechanical type rotation MOCVD as claimed in claim 7, is characterized in that, also comprises:
Housing, described rotating disk is arranged on the bottom of housing, and substrate storing dish is also positioned at housing, and the sidewall of housing has hollow sandwich, and the position higher than substrate holding tray of sidewall is provided with a plurality of pores that connect with hollow sandwich.
9. the secondary liner tray of mechanical type rotation MOCVD as claimed in claim 8, is characterized in that, described air extractor is carried out the operation of bleeding in housing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310552093.4A CN103556130A (en) | 2013-11-07 | 2013-11-07 | Mechanical autorotating MOCVD (metalorganic chemical vapor deposition) accessory substrate tray |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310552093.4A CN103556130A (en) | 2013-11-07 | 2013-11-07 | Mechanical autorotating MOCVD (metalorganic chemical vapor deposition) accessory substrate tray |
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| CN103556130A true CN103556130A (en) | 2014-02-05 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112080735A (en) * | 2020-10-12 | 2020-12-15 | 佛仪科技(佛山)有限公司 | Tray device for vapor chemical deposition |
| CN113690172A (en) * | 2021-06-30 | 2021-11-23 | 华灿光电（浙江）有限公司 | Graphite substrate for improving wavelength uniformity of epitaxial wafer |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102899719A (en) * | 2012-08-28 | 2013-01-30 | 绿种子材料科技股份有限公司 | Thin-film deposition system |
| CN203613261U (en) * | 2013-11-07 | 2014-05-28 | 北京希睿思科技有限公司 | Mechanical autorotation MOCVD (metal organic chemical vapor deposition) auxiliary substrate tray |
-
2013
- 2013-11-07 CN CN201310552093.4A patent/CN103556130A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102899719A (en) * | 2012-08-28 | 2013-01-30 | 绿种子材料科技股份有限公司 | Thin-film deposition system |
| CN203613261U (en) * | 2013-11-07 | 2014-05-28 | 北京希睿思科技有限公司 | Mechanical autorotation MOCVD (metal organic chemical vapor deposition) auxiliary substrate tray |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112080735A (en) * | 2020-10-12 | 2020-12-15 | 佛仪科技(佛山)有限公司 | Tray device for vapor chemical deposition |
| CN113690172A (en) * | 2021-06-30 | 2021-11-23 | 华灿光电（浙江）有限公司 | Graphite substrate for improving wavelength uniformity of epitaxial wafer |
| CN113690172B (en) * | 2021-06-30 | 2023-10-13 | 华灿光电（浙江）有限公司 | Graphite substrate for improving wavelength uniformity of epitaxial wafer |
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