CN102899719A - Thin-film deposition system - Google Patents
Thin-film deposition system Download PDFInfo
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- CN102899719A CN102899719A CN2012103107162A CN201210310716A CN102899719A CN 102899719 A CN102899719 A CN 102899719A CN 2012103107162 A CN2012103107162 A CN 2012103107162A CN 201210310716 A CN201210310716 A CN 201210310716A CN 102899719 A CN102899719 A CN 102899719A
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- loader
- load plate
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Abstract
The invention discloses a thin-film deposition system, and especially relates to a thin-film deposition system in which carrier rotation is driven by friction force. The system comprises a carrier plate, a central disk and at least one carrier. The periphery of the central disk has a central inclined plane. The periphery of each carrier has a carrying inclined plane. The central inclined plane contacts the carrying inclined planes, such that the carriers can perform revolution and/or rotation under driving when the carrier plate or the central disk rotates. According to the thin-film deposition system provided by the invention, system element structure can be simplified, carrier arrangement density can be increased, and production capacity per unit time can be improved.
Description
Technical field
The present invention relates to a kind of thin film deposition system, relate in particular to a kind of thin film deposition system that utilizes frictional force to drive the loader rotation.
Background technology
Thin film deposition has been widely used in the surface treatment of multiple object, for example jewel, tableware, instrument, mould and/or semiconductor element, the characteristic such as homogeneity or heterogeneous film-shaped are formed in body surface, and be wear-resisting in order to improve, heat-resisting and/or anti-corrosion.Film deposition techniques is divided into two large classes usually, i.e. physical vapor deposition (PVD) and chemical vapour deposition (CVD).
According to the difference of deposition technique and processing parameter, the film of deposition can have monocrystalline, polycrystalline or non-crystal structure.Monocrystal thin films is often as very important epitaxial layer in the integrated circuit technology.For example, with the semiconductor fabrication epitaxial layer, and in shaping implantation hotchpotch, have accurate hotchpotch and the impurity such as oxygen-free and/or carbon with output.
In the chemical vapour deposition technique, include a kind of technology that is called metal organic chemical vapor deposition (MOCVD).In the MOCVD technology, one or more reactant gasess enter the reaction chamber that includes one or more substrates (one or more wafer) in order to carry one or more vapor-phase reactants and/or precursor (precursor).Heat in the mode of radio-frequency induction or resistance usually at the back side of substrate, in order to improve substrate and temperature on every side thereof, one or more chemical reactions will produce, and the reactant of one or more gas phases and/or precursor are converted to solid-state resultant and are deposited on the surface of substrate.
Whether good with the film forming processing quality of MOCVD, depend on stability, the control of temperature and the factors such as mode of importing reactant gases that reactor (reactor) internal gas flows, each parameter is great for the impact of sedimental homogeneity (uniformity).
In general, substrate rotating device can drive the wafer rotation, improves whereby wafer top gas concentration homogeneity, obtains consistent film thickness.Also can improve being heated evenly property of below by the rotation wafer, obtain better film quality.
Summary of the invention
For achieving the above object, the invention provides a kind of thin film deposition system, comprise: a load plate; One spider is arranged at the central position of load plate, and the periphery of spider has a central bevel; And at least one loader, be arranged on this load plate and be positioned at the spider periphery, in order to carry at least one substrate, the periphery of this at least one loader has a carrying inclined-plane and contacts with central bevel respectively.
Wherein, rotarily drive that at least one loader carries out a revolution to a load plate central shaft of load plate and when spider is fixing when not rotating, under carrying the inclined-plane and central bevel contacts, so that at least one loader carries out a rotation simultaneously when load plate.
Wherein, when this load plate drives this at least one loader one load plate central shaft of this load plate is carried out a revolution, can by control this spider one sense of rotation and speed, under this carries inclined-plane and this central bevel contacts, adjust a sense of rotation and the speed of this at least one loader.
Wherein, when this load plate is fixing when not rotating with this spider rotation, on this carrying inclined-plane and under this central bevel contacts, so that this at least one loader carries out a rotation.
Wherein, at least one loader, only have the carrying inclined-plane of a loader to contact with central bevel, and those carrying inclined-planes of any two loaders are in contact with one another and with opposite direction rotation.
Wherein, at least one loader, those carrying inclined-planes of any two loaders are in contact with one another and in the opposite direction rotation, and one of them carrying inclined-plane contacts this central bevel, and another carrying inclined-plane does not contact this central bevel.
Wherein, central bevel or carrying inclined-plane are a uneven surface.
Wherein, central bevel is the aspect that radius increases from top to bottom, and the carrying inclined-plane is the aspect that radius dwindles from top to bottom.
Wherein, central bevel is the aspect that radius dwindles from top to bottom, and the carrying inclined-plane is the aspect that radius increases from top to bottom.
Wherein, more comprise a central shaft and at least one motor, wherein central shaft includes an internal layer axle and an outer axle, connects respectively spider and load plate, and at least one motor connects internal layer axle and an outer axle, can drive respectively the rotation of spider and load plate.
Wherein, more include: a shell of revolution connects load plate; One internal wheel is located at the bottom of shell of revolution; One driving gear meshes with internal wheel; And a motor, connect and the driving outer rotor.
Wherein, more comprise a chamber wall and a lid, wherein lid is combined with this chamber wall and is provided with one first buckling piece, and spider is provided with one second buckling piece; The first buckling piece and the second buckling piece can in conjunction with and spider is fixed in lid below.
Wherein, loader is made with graphite.
The invention reside in provides a kind of thin film deposition system, espespecially a kind of thin film deposition system that utilizes frictional force to drive the loader rotation, utilize the inclined-plane structure mutually to drive, not only can increase friction area, and have terrestrial attraction or gravity to cause to press down the area of can excessively not reducing friction after the running, more increase in addition hardness behind this bevel friction and reach effective drive loader rotation effect, the structure of simplified system element increases the density that loader disposes again, improves the production capacity of unit time.
Describe the present invention below in conjunction with the drawings and specific embodiments, but not as a limitation of the invention.
Description of drawings
Fig. 1 is the synoptic diagram of rotating mechanism one embodiment of the present invention.
Fig. 2 is the sectional view of rotating mechanism one embodiment as shown in Figure 1.
Fig. 3 is the sectional view of another embodiment of rotating mechanism of the present invention.
Fig. 4 is the sectional view of thin film deposition system one embodiment of the present invention.
Fig. 5 is the synoptic diagram of another embodiment of rotating mechanism of the present invention.
Fig. 6 is the synoptic diagram of the another embodiment of rotating mechanism of the present invention.
Fig. 7 is the synoptic diagram of the another embodiment of rotating mechanism of the present invention.
Fig. 8 is the synoptic diagram of the another embodiment of rotating mechanism of the present invention.
Wherein, Reference numeral:
10: rotating mechanism 12: load plate
121: load bearing seat 14: spider
141: 145: the second buckling pieces of central bevel
15: driver module 150: central shaft
151: internal layer axle 153: outer axle
155: motor 16: loader
161: carrying inclined-plane 18: substrate
30: rotating mechanism 35: driver module
350: shell of revolution 351: internal wheel
353: motor 355: driving gear
40: thin film deposition system 42: the chamber wall
44: 441: the first buckling pieces of lid
45: reaction chamber 451: exhaust-duct
46: air feeder 48: well heater
52: spider 521: central bevel
Loader 541 in 54: the first: the carrying inclined-plane
Loader 561 in 56: the second: the carrying inclined-plane
58: the three loaders 581: carrying inclined-plane
50: load plate 82: spider
821: central bevel 84: loader
841: the carrying inclined-plane
Embodiment
Please refer to Fig. 1, it is the synoptic diagram of rotating mechanism one embodiment of thin film deposition system of the present invention.As shown in the figure, the rotating mechanism 10 of thin film deposition system of the present invention includes: a load plate 12, a spider 14 and at least one loader 16.Wherein, spider 14 is arranged at the central position of load plate 12, and the periphery of spider 14 has a central bevel 141.Each loader 16 is arranged at the load bearing seat 121 on the load plate 12 and is positioned at the periphery of spider 14, respectively in order to carry at least one substrate 18.The periphery of each loader 16 has respectively a carrying inclined-plane 161, and each carries inclined-plane 161 and contacts with the central bevel 141 of spider 14 respectively.
Among one embodiment, when load plate 12 rotation, each loader 16 on the load plate 12 revolves round the sun facing to a load plate central shaft of load plate 12, and for example each loader 16 is around a circuit orbit or a rule rail moving.The spider 14 of the central position of control load plate 12 is fixed and is not rotated, or spider 14 and load plate 12 opposite spins, or spider 14 and load plate 12 equidirectional rotations, perhaps control center dish 14 and load plate 12 both when speed of relative movement is arranged, can utilize the frictional force on 161 on central bevel 141 and carrying inclined-plane, add that each loader 16 carries out revolution motion, drive each loader 16 and produce rotation facing to loader 16 axle center own, namely when load plate 12 each loader 16 of drive revolve round the sun, cooperate central bevel 141 and the frictional force of carrying inclined-plane 161, so that each carrier 16 produces rotations.Above-mentioned loader 16 is by revolving round the sun simultaneously and/or spinning motion reaches the purpose that forms the even thickness film.
Among another embodiment, when load plate 12 does not rotate and when only having spider 14 rotation, then each loader 16 is without revolution motion, but spider 14 rotations are lower, drive the frictional force on 161 on central bevel 141 and carrying inclined-plane, will drive each loader 16 and carry out rotation in original position.Again among the embodiment, it is lower that spider 14 and load plate 12 rotates simultaneously, and control both certain speeds than lower, also can produce pure revolution and without the rotation situation, and above-mentioned two embodiment rotating manners also can be in suitable control reactant generation than the uniform thickness film.
Please refer to Fig. 2, it is the sectional view of rotating mechanism one embodiment as shown in Figure 1.As shown in Figure 2, still include a driver module 15 in the thin film deposition system of one embodiment of the invention.This driver module 15 includes a central shaft 150 and at least one motor 155.
Wherein, load plate 12 supports with central shaft 150 with spider 14.Wherein, central shaft 150 includes an internal layer axle 151 and an outer axle 153, respectively in order to centre of support dish 14 and load plate 12.The below of central shaft 150 is provided with a motor 155 or a plurality of motor, in order to drive internal layer axle 151 and/or 153 rotations of outer axle, so as to driving spider 14 and/or load plate 12 rotations.
In one embodiment of this invention, when spider 14 fixing not rotations, and during load plate 12 rotation, load plate 12 drives at least one loader 16 and revolves round the sun, add under the frictional force on central bevel 141 and 161 on inclined-plane of carrying drives, at least one loader 16 simultaneously facing to its axle center with the direction rotation identical with load plate 12.
In another embodiment of the present invention, if spider 14 and load plate 12 are with opposite direction rotation, load plate 12 drives at least one loader 16 and revolves round the sun, add that under the frictional force on central bevel 141 and 161 on inclined-plane of carrying drives at least one loader 16 produces and the rotation of load plate 12 equidirectionals simultaneously.
In another embodiment of the present invention, if spider 14 and load plate 12 are with identical direction rotation, load plate 12 drives at least one loader 16 and revolves round the sun, add that under the frictional force on central bevel 141 and 161 on inclined-plane of carrying drives at least one loader 16 produces and the rotation of load plate 12 identical or different directions simultaneously.
In another embodiment of the present invention, if spider 14 and load plate 12, are controlled both certain speeds with identical direction rotation than lower, then can control at least one loader 16 and only revolve round the sun facing to the axle center of load plate 12, and not produce rotation, for example rotational velocity is zero.
In another embodiment of the present invention, if load plate 12 does not rotate during spider 14 rotation, then under the frictional force on central bevel 141 and 161 on carrying inclined-plane drives, at least one loader 16 will produce and spider 14 rightabout rotations, and without revolution.
Please refer to Fig. 3, it is the sectional view of another embodiment of rotating mechanism of thin film deposition system of the present invention.As shown in the figure, the rotating mechanism 30 of thin film deposition system of the present invention includes: a load plate 12, a spider 14, at least one loader 16 and a driver module 35.
Wherein, driver module 35 includes a shell of revolution 350 and a motor 353.Shell of revolution 350 is fixedly arranged on the below of load plate 12, and the bottom of shell of revolution 350 is provided with an internal wheel 351, and 353 in motor is connected with a driving gear 355, and is meshed with internal wheel 351 with driving gear 355.Drive driving gear 355 by motor 353, drive again internal wheel 351 and shell of revolution 350 rotations, and the load plate 12 that is fixedly arranged on the shell of revolution 350 also can be driven to rotate.The spider 14 of present embodiment can as shown in Figure 2, support with a central shaft 150.
Utilize the structure of present embodiment, can control equally drive load plate 12 and spider 14 respectively with fixingly do not rotate, rotating Vortex, reverse rotation, and different collocation mode on the rotating speed, the rotation that makes at least one loader 16 produce different rotating speeds or different directions, and the various aspect that revolves round the sun and do not revolve round the sun.This part is identical with the principle of specification of Fig. 3, is not repeated running.
Please refer to Fig. 4, it is for the sectional view of thin film deposition system one embodiment of the present invention.As shown in the figure, thin film deposition system 40 of the present invention includes a cavity, a load plate 12, a spider 14, at least one loader 16, an air feeder 46 and at least one well heater 48.Wherein, cavity includes a chamber wall 42 and a lid 44.Load plate 12 is arranged in the cavity, chamber wall 42 combinations on lid 44 and load plate 12 next doors are arranged on the load plate 12, and load plate 12 central positions are provided with a spider 14, and 16 peripheries of being located at spider 14 on this load plate of loader are respectively in order to carry at least one substrate (not shown).Well heater 48 is arranged at the below of load plate 12, in order to each base plate heating.Air feeder 46 can design and lid 44 combination or separate modes, in order to reactant gases to be provided.After reactant gases enters reaction chamber 45, add the triggering of upper substrate and peripheral temperature thereof and produce chemical reaction, and produce solid-state resultant and be deposited on the substrate.Reacted gas is then discharged outside the cavity via exhaust-duct 451.
Wherein, the periphery of spider 14 has a central bevel 141, and the periphery of loader 16 has respectively a carrying inclined-plane 161.The carrying inclined-plane 161 of loader 16 contacts with the central bevel 141 of spider 14 respectively.When load plate 12 and spider 14 arrange in pairs or groupss rotation in a different manner, can because of the frictional force of central bevel 141 with carrying inclined-plane 161, drive loader 16 and produce the various different collocation modes that revolve round the sun from rotation.Revolve round the sun or rotation by loader 16, can improve the homogeneity of the substrate top gas concentration of carrying on the loader 16, also can improve the homogeneity of basal plate heated, so as to the quality of raising film and the homogeneity of film thickness.
In one embodiment of this invention, this load plate 12 and spider 14 can be selected to drive respectively with driver module shown in Figure 2 15, also can select to drive with driver module shown in Figure 3 35.
In one embodiment of this invention, this lid 44 can be provided with one first buckling piece 441, and this spider 14 also is provided with one second corresponding buckling piece 145.After the first buckling piece 441 and 145 combinations of the second buckling piece, spider 14 can be fixed in the below of lid 44.
In one embodiment of this invention, the first buckling piece one end can external motor, rotates this first buckling piece 441 and drives spider 14 rotations by motor.
Please refer to Fig. 5, it is the synoptic diagram of another embodiment of rotating mechanism of thin film deposition system of the present invention.As shown in the figure, be provided with a spider 52 and a plurality of loader (for example the first loader 54, the second loader 56 and the 3rd loader 58) on the load plate 50 of present embodiment.Spider 52 has a central bevel 521, and each loader 54,56,58 has respectively a carrying inclined-plane 541,561,581.Wherein carrying inclined-plane 541 is in contact with one another with central bevel 521, after load plate 50 rotations, carrying inclined-plane 541 produces reverse direction rotation (or spider 52 and the 54 generation reverse direction rotations of the first loader) with central bevel 521, and the carrying inclined-plane that respectively is in contact with one another, as carry inclined-plane 541 and 561, carrying inclined-plane 561 is in contact with one another with 581 etc., also produce reverse direction and rotate.Certainly we also can only have spider 52 to rotarily drive the first loader 54, go to drive by the first loader 54 again as the second loader 56 and the 58 generation rotations of the 3rd loader.Perhaps load plate 50 rotates to drive 54 rotations of the first loader with spider 52 with equidirectional or different directions among the embodiment, and then goes to drive as the second loader 56 and 58 generation rotation and the revolution of the 3rd loader by the first loader 54.
In the present embodiment, only the carrying inclined-plane 541 of the first loader 54 contacts with the central bevel 521 of spider 52, and the inclined-plane (for example carrying inclined-plane 561,581) of all the other loaders (for example the second loader 56, the 3rd loader 58) sequentially contacts with the inclined-plane of last loader (for example the first loader 54, the second loader 56) respectively.By contacting of the first loader 54 and spider 52, when adding load plate 50 and/or spider 52 rotation, drive each loader 54,56,58 revolution and/or rotations.
Utilize the structure of present embodiment, can reduce the distance between each loader, more loaders are set in limited load plate 50 scopes, so as to increasing the number of substrates that to carry, improve the output between unit.
Please refer to Fig. 6, it is the synoptic diagram of the another embodiment of rotating mechanism of thin film deposition system of the present invention.As shown in the figure, the load plate 50 at present embodiment is provided with a spider 52, a plurality of the first loader 54 and a plurality of the second loader 56.One of them first loader 54 and one the second loader 56 consists of one group and be in contact with one another and form both and rotate in the opposite direction, wherein the carrying inclined-plane 541 (inner dotted line) of each the first loader 54 contacts with the central bevel 521 of spider 52 respectively, the carrying inclined-plane 561 of each the second loader 56 (inner solid line) respectively with carrying inclined-plane 541 contacts of corresponding the first loader 54.Each loader 54,56 arranges around spider 52.By contacting of each first loader 54 and spider 52, when adding load plate 50 and/or spider 52 rotation, drive respectively each first loader 54 and each second loader 56 produces revolution and/or rotations.
In the present embodiment, except the distance that can reduce between each loader, each loader still can have better rotation motivating force, and the rotating speed of each loader is comparatively average.
Please refer to Fig. 7, it is the synoptic diagram of the another embodiment of rotating mechanism of thin film deposition system of the present invention.As shown in the figure, the load plate 50 at present embodiment is provided with a spider 52, a plurality of the first loader 54 and a plurality of the second loader 56 (illustrating as simple take first loader 54 and second loader 56 at this).Wherein, the carrying inclined-plane 541 of each first loader 54 contacts with the central bevel 521 of spider 52 respectively, and arranges around spider 52.The carrying inclined-plane 561 of each second loader 56 respectively with carrying inclined-plane 541 contacts of corresponding the first loader 54, and arrange around the periphery of the first loader 54.
Utilize the structure of present embodiment, can more loader 54,56 be set in larger load plate 50, so as to increasing the number of substrates that to carry, so as to improving the production capacity of unit time.
Please refer to Fig. 8, it is the synoptic diagram of the another embodiment of rotating mechanism of thin film deposition system of the present invention.Among aforementioned each embodiment, all increase from top to bottom as radius take spider 14,52 central bevel 141,521, and carrying inclined-plane 161,541 aspects of dwindling from top to bottom for radius of each loader 16 and the first loader 54 describe.Central bevel 821 of the present invention and carrying inclined-plane 841 also can be as shown in Figure 8, and namely the central bevel 821 of spider 82 is dwindled from top to bottom for radius, and the aspect that the carrying inclined-plane 841 of each loader 84 increases from top to bottom for radius.All the other structures are then identical with aforementioned each embodiment.Above-mentioned inclined-plane structure drives mutually, not only can increase friction area, and has terrestrial attraction or gravity to cause to press down, and the area of can excessively not reducing friction after the running more increases in addition hardness and reaches effective drive loader rotation effect behind this bevel friction.
Among aforementioned each embodiment, two inclined-planes that are in contact with one another (for example central bevel 141,821 or the carrying inclined-plane 161,841) be that a uneven surface is for better.
Among aforementioned each embodiment, each loader with graphite-made as better.
Utilize the rotating mechanism of thin film deposition system of the present invention, but the structure of simplified system element increases the density that loader disposes, and improves the production capacity of unit time.
Certainly; the present invention also can have other various embodiments; in the situation that does not deviate from spirit of the present invention and essence thereof; those of ordinary skill in the art can make according to the present invention various corresponding changes and distortion, but these corresponding changes and distortion all should belong to the protection domain of claim of the present invention.
Claims (12)
1. a thin film deposition system is characterized in that, comprises:
One load plate;
One spider is arranged at the central position of this load plate, and the periphery of this spider has a central bevel; And
At least one loader is arranged on this load plate and is positioned at the spider periphery, and in order to carry at least one substrate, the periphery of this at least one loader has a carrying inclined-plane and contacts with this central bevel respectively.
2. thin film deposition system according to claim 1, it is characterized in that, one load plate central shaft of this load plate is carried out a revolution and fix when not rotating when this spider when this load plate rotarily drives this at least one loader, under this carries inclined-plane and this central bevel contacts, so that this at least one loader carries out a rotation simultaneously.
3. thin film deposition system according to claim 1, it is characterized in that, when this load plate drives this at least one loader one load plate central shaft of this load plate is carried out a revolution, can be by control this spider one sense of rotation and speed, under this carries inclined-plane and this central bevel contacts, adjust a sense of rotation and the speed of this at least one loader.
4. thin film deposition system according to claim 1 is characterized in that, when this load plate is fixing when not rotating with this spider rotation, on this carrying inclined-plane and under this central bevel contacts, so that this at least one loader carries out a rotation.
5. thin film deposition system according to claim 1 is characterized in that, in this at least one loader, only has the carrying inclined-plane of a loader to contact with central bevel, and those carrying inclined-planes of any two loaders are in contact with one another and with opposite direction rotation.
6. thin film deposition system according to claim 1, it is characterized in that in this at least one loader, those carrying inclined-planes of any two loaders are in contact with one another and in the opposite direction rotation, one of them carrying inclined-plane contacts this central bevel, and another carrying inclined-plane does not contact this central bevel.
7. thin film deposition system according to claim 1 is characterized in that, this central bevel maybe this carrying inclined-plane is a uneven surface.
8. thin film deposition system according to claim 1 is characterized in that, this central bevel is the aspect that radius increases from top to bottom, and this carrying inclined-plane is the aspect that radius dwindles from top to bottom.
9. thin film deposition system according to claim 1 is characterized in that, this central bevel is the aspect that radius dwindles from top to bottom, and this carrying inclined-plane is the aspect that radius increases from top to bottom.
10. thin film deposition system according to claim 1, it is characterized in that, more comprise a central shaft and at least one motor, wherein this central shaft includes an internal layer axle and an outer axle, connect respectively this spider and this load plate, this at least one motor connects this internal layer axle and an outer axle, drives respectively the rotation of this spider and this load plate.
11. thin film deposition system according to claim 1 is characterized in that, more includes:
One shell of revolution connects this load plate;
One internal wheel is located at the bottom of this shell of revolution;
One driving gear is with this internal wheel engagement; And
One motor connects and drives this outer rotor.
12. thin film deposition system according to claim 1 is characterized in that, more comprises a chamber wall and a lid, wherein this lid is combined with this chamber wall and is provided with one first buckling piece, and this spider is provided with one second buckling piece; This first buckling piece and the second buckling piece can in conjunction with and this spider is fixed in this lid below.
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| CN2012103107162A CN102899719A (en) | 2012-08-28 | 2012-08-28 | Thin-film deposition system |
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| CN2012103107162A CN102899719A (en) | 2012-08-28 | 2012-08-28 | Thin-film deposition system |
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| CN102899719A true CN102899719A (en) | 2013-01-30 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103556130A (en) * | 2013-11-07 | 2014-02-05 | 北京希睿思科技有限公司 | Mechanical autorotating MOCVD (metalorganic chemical vapor deposition) accessory substrate tray |
| CN103806095A (en) * | 2014-02-18 | 2014-05-21 | 中国科学院半导体研究所 | Planetary rotary tray device |
| CN109285756A (en) * | 2018-10-12 | 2019-01-29 | 苏州晋宇达实业股份有限公司 | A kind of silicon wafer placement driving device of ion implantation apparatus |
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| CN102199761A (en) * | 2011-05-10 | 2011-09-28 | 绿种子能源科技股份有限公司 | Thin film deposition apparatus |
| CN102639761A (en) * | 2009-10-09 | 2012-08-15 | 克里公司 | Multi-rotation epitaxial growth apparatus and reactors incorporating same |
| CN102719809A (en) * | 2011-06-16 | 2012-10-10 | 绿种子科技(潍坊)有限公司 | Thin film deposition system |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102639761A (en) * | 2009-10-09 | 2012-08-15 | 克里公司 | Multi-rotation epitaxial growth apparatus and reactors incorporating same |
| CN102199761A (en) * | 2011-05-10 | 2011-09-28 | 绿种子能源科技股份有限公司 | Thin film deposition apparatus |
| CN102719809A (en) * | 2011-06-16 | 2012-10-10 | 绿种子科技(潍坊)有限公司 | Thin film deposition system |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103556130A (en) * | 2013-11-07 | 2014-02-05 | 北京希睿思科技有限公司 | Mechanical autorotating MOCVD (metalorganic chemical vapor deposition) accessory substrate tray |
| CN103806095A (en) * | 2014-02-18 | 2014-05-21 | 中国科学院半导体研究所 | Planetary rotary tray device |
| CN103806095B (en) * | 2014-02-18 | 2016-02-10 | 中国科学院半导体研究所 | Planetary device for rotating trays |
| CN109285756A (en) * | 2018-10-12 | 2019-01-29 | 苏州晋宇达实业股份有限公司 | A kind of silicon wafer placement driving device of ion implantation apparatus |
| CN109285756B (en) * | 2018-10-12 | 2024-04-30 | 江苏晋誉达半导体股份有限公司 | Silicon wafer placement driving device of ion implanter |
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Application publication date: 20130130 |