CN208517527U - A kind of supporting arrangement of chemical vapor deposition stove - Google Patents
A kind of supporting arrangement of chemical vapor deposition stove Download PDFInfo
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- CN208517527U CN208517527U CN201821256185.2U CN201821256185U CN208517527U CN 208517527 U CN208517527 U CN 208517527U CN 201821256185 U CN201821256185 U CN 201821256185U CN 208517527 U CN208517527 U CN 208517527U
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Abstract
The utility model discloses a kind of supporting arrangement of chemical vapor deposition stove, including the alternating supporting device for alternately being supported to matrix, the alternately supporting device includes at least two groups supporting member and the driven mechanism for driving supporting member alternating support substrate；Wherein, the driven mechanism includes the power mechanism that at least two sliding slots and driving supporting member move in sliding slot；The sliding slot includes supporting section and alternately section, the height of the alternately section are lower than the height of supporting section；When the lower end of supporting member is moved to supporting section, the upper end is supported on the lower end surface of matrix, and when the lower end of supporting member is moved to alternately section, the upper end is far from matrix；When work, at least one group supporting member is located on supporting section.This supporting arrangement not only can be of different sizes with bearing mass matrix, and the notch of no film will not be generated at bearing, enabling matrix surface, equably primary depositing improves deposition quality to required film, reduces production cost.
Description
Technical field
The utility model relates to chemical vapor depsotition equipments, and in particular to a kind of supporting arrangement of chemical vapor deposition stove.
Background technique
Chemical vapor deposition, English abbreviation CVD, be most widely used in semi-conductor industry be used to deposit a variety of materials
The technology of material, including large-scale insulating materials, most metals material and metal alloy compositions.Generally, chemical vapor deposition
The gaseous starting materials that product can be understood as two or more are imported into a reaction chamber, are sent out between right latter two raw material
Angry phase pyrolysis forms a kind of new material, deposits in matrix wafer surface, so that matrix obtains better surface
Mass effect；Wherein, gas raw material are generally metal vapors, volatile metal halide, hydride or Organometallic and close
The gases such as object.In chemical vapor deposition process, being uniformly distributed for gas raw material can accelerate deposition rate, and make film layer
Compactness and uniformity it is more preferable, wherein the uniformity of deposition film is of crucial importance for matrix.
In existing cvd furnace, generallys use planetary rotation mechanism and carry out band kinetoplast rotation, to be obtained on matrix
Uniform deposition film.The turntable of a revolution is arranged in the planetary rotation mechanism, several are arranged on turntable for placing base
The supporting arrangement of body, each supporting arrangement, can also be with kinetoplast rotations, so that each position of matrix when revolving with turntable
It can be with uniform deposition.Since the period of chemical vapor deposition is longer, by placing supporting arrangement in settling chamber, to support deposition base
Body allows matrix to stack placement in settling chamber, to achieve the purpose that batch production, be conducive to improve production efficiency,
Lower production cost.
But existing supporting arrangement generally supports matrix using fixed three-point support method, wherein existing
Deficiency below；
1, since matrix is fixedly supported upon on the supporting member of supporting arrangement, the position of bearing lacks the heavy of reaction gas
Product forms the notch without film, and therefore, the gases such as oxygen, ammonia can corrode the inner substrate of matrix from the indentation, there of no film,
To reduce the service life of matrix.If filling up the notch without film, need to carry out secondary deposition, waste of manpower object
Power improves production cost.
2, in deposition work, effect is obstructed in order to reduce supporting arrangement to what reaction gas was spread, enables film
It being uniformly deposited on matrix, the thickness of the supporting member of use is smaller, it is only applicable to support lighter matrix, and it is not suitable for weight
Measure big matrix.
Utility model content
The purpose of the utility model is to overcome above-mentioned problem, the branch for providing a kind of chemical vapor deposition stove is installed
It sets, the matrix which not only can be of different sizes with bearing mass, and the notch of no film will not be generated at bearing, so that
Matrix surface equably primary depositing both can improve the quality of deposition, also reduce production cost to required film.
The purpose of this utility model is achieved through the following technical solutions:
A kind of supporting arrangement of chemical vapor deposition stove supports machine including the alternating for alternately being supported to matrix
Structure, the alternately supporting device include at least two groups supporting member and the driven machine for driving supporting member alternating support substrate
Structure；
Wherein, the driven mechanism includes at least two sliding slot on support plate in a ring being arranged in and for driving
The power mechanism that dynamic supporting member moves in sliding slot；The sliding slot includes supporting section and alternately section, the height of the alternately section are low
In the height of supporting section；Every set supporting includes at least two supporting members, and is circumferentially evenly distributed on the upper of sliding slot
Side；
When the lower end of supporting member is moved to supporting section, the upper end is supported on the lower end surface of matrix, when the lower end of supporting member
When being moved to alternately section, the upper end is far from matrix；When work, at least one group supporting member is located on supporting section.
The principle of above-mentioned supporting arrangement is:
Generally, before deposition work starts, first matrix to be deposited is put on the bearer, then starts cvd furnace, driven
Turn disk is rotated, and is passed through reaction gas.During rotating with turntable, power mechanism driving supporting member is being supported
It is rotated on plate, so that supporting member moves in a circle along sliding slot；Wherein, when supporting member is located at supporting section, the upper end is supported on
The lower end surface of matrix, when supporting member is located at alternately section, the upper end is far from matrix, so being arranged at least two in the utility model
Set supporting, every set supporting include at least two supporting members.For example, two set supportings are provided with, respectively first group and
It two groups, is moved along sliding slot, firstly, first group and second group is located on supporting section simultaneously, i.e., matrix is supported simultaneously, connect
The first set supporting be moved to alternately in section, the second set supporting still moves on supporting section, at this time the second set supporting pair
Matrix is supported, and then the first set supporting is moved on supporting section, is carried out simultaneously to matrix for first group and second group at this time
Bearing, then the second set supporting is moved in alternately section, and the first set supporting supports matrix at this time, the second last group
Supporting member is moved on supporting section, is supported simultaneously to matrix for first group and second group at this time, and a circulation is completed；Above-mentioned
During deposition, two set supportings successively alternately support matrix, so as to avoid generating deposition notch.
One preferred embodiment of the utility model, wherein further include multiple bars thrown away for preventing matrix to be centrifuged.
Preferably, the bar is three, and direction circumferentially is uniformly arranged.Before being vapor-deposited, by base
Body is put on supporting member, so that matrix is located at the inside of three bars, the stability based on triangle, in matrix rotation process
In, bar can provide stable blocking for matrix, and matrix is avoided to be thrown out of due to by centrifugal force.
Preferably, the vertical projection semicircular in shape structure of the bar, in this way, being centrifuged in matrix as turntable rotates
When, bar blocks matrix, wherein sharp collision can occur to avoid the edge with matrix for semicircular structure, to protect
Good deposition film.
One preferred embodiment of the utility model, wherein the power mechanism includes the actuating arm being connected between bar
With for drive bar carry out spinning motion self-rotation wheel；
The supporting member passes through actuating arm and the vertically extending top in support plate by sliding shaft sleeve.When work, certainly
Under the driving of runner, bar carries out spinning motion, to drive supporting member to move along sliding slot, when supporting member is moved to alternately section
When, supporting member moves down along sliding shaft sleeve, far from matrix, alternately gives matrix to other set supportings, then reaction gas
It is deposited on corresponding bearing position on matrix.
One preferred embodiment of the utility model, wherein the lower section of bar is arranged in the self-rotation wheel, and lower end is equipped with rotation
Gear；The rotating gear is fixedly connected with turntable and concentric fixation gear engages.By above structure, when turntable carries out
When rotation, spinning motion so that rotating gear be driven to rotate, and then is transferred to self-rotation wheel and bar with rotation by fixed gear
On；A power is shared with turntable, cost of manufacture can be reduced.
One preferred embodiment of the utility model, wherein the bottom end of the self-rotation wheel is connected to turntable by axial bearing
On；The lower end of the support plate passes through the center of rotation of self-rotation wheel by fixed column and turntable extends down, and is fixed on turntable
On.
One preferred embodiment of the utility model, wherein the top and bottom end of the supporting member are equipped with spin, in this way,
When actuating arm is rotated, supporting member can be moved in sliding slot by spin, frictional force when greatly reducing mobile, so that
Alternately holding action is more smooth；In addition, supporting member can be rolled by spin in the lower end surface of matrix, so that reaction gas can
To be uniformly deposited on the position that supporting member and substrate contact are crossed.
One preferred embodiment of the utility model, wherein the supporting member is two groups, and every group includes three supporting members；Institute
Stating sliding slot is two, and supporting section therein and alternating section are three；
Along radial direction, the alternating section in two sliding slots is staggered.I.e. along radial direction, in two sliding slots
Alternating section be not overlapped, by above-mentioned setting, under the premise of providing stable bearing for matrix, simplify supporting arrangement knot
Structure deposits reaction gas more fully.
The utility model has the advantages that compared with prior art
1, in the supporting arrangement of the utility model, supporting member is supported matrix with alternating, in alternate mistake
Cheng Zhong, when wherein support distal is from matrix, reaction gas can be deposited on corresponding position on matrix, so matrix
On be not in no film deposition notch.
2, of different sizes so as to bearing mass since the supporting arrangement of the utility model is supported on the lower end surface of matrix
Matrix, enabling matrix surface, equably primary depositing improves the quality of deposition to required film, reduces production cost.
Detailed description of the invention
Fig. 1 is broken section of the supporting arrangement of the chemical vapor deposition stove of the utility model when carrying out deposition work
Figure.
Fig. 2-4 is the top view that the spin in Fig. 1 is slided on support plate, and dash area is alternating section in figure；Wherein, scheme
2 are moved to top view when supporting section for two groups of spin simultaneously, and Fig. 3 is moved to vertical view when alternately section for wherein one group of spin
Figure, Fig. 3 are top view when another group of spin is moved to alternately section.
Fig. 5 is by two sliding slot linearization(-sation)s in Fig. 1 and schematic diagram placed side by side.
Specific embodiment
In order to make those skilled in the art better understand the technical solution of the utility model, below with reference to embodiment and
Attached drawing is further described the utility model, but the embodiments of the present invention is not limited only to this.
Referring to Fig. 1-5, the supporting arrangement of the chemical vapor deposition stove in the present embodiment, including for alternately to matrix 12 into
Row bearing alternating supporting device, it is described alternately supporting device include at least two groups supporting member 1 and for drive supporting member 1 replace
The driven mechanism of support substrate 12.
The driven mechanism includes at least two sliding slot on support plate 13 in a ring being arranged in and for driving
The power mechanism that supporting member 1 moves in sliding slot；The sliding slot includes supporting section 2 and alternating section 3, the height of the alternately section 3
Lower than the height of supporting section 2；Every set supporting 1 includes at least two supporting members 1, and is circumferentially evenly distributed on sliding slot
Top；When the lower end of supporting member 1 is moved to supporting section 2, the upper end is supported on the lower end surface of matrix 12, when supporting member 1
When lower end is moved to alternately section 3, the upper end is far from matrix 12；When work, at least one group supporting member 1 is located on supporting section 2.
Referring to fig. 2-5, in the present embodiment, the supporting member 1 is two groups, and every group includes three supporting members 1；The sliding slot
It is two, supporting section 2 therein and alternating section 3 are three；Along radial direction, the alternating section 3 in two sliding slots is interlocked
Setting, i.e., along radial direction, the alternating section 3 in two sliding slots is not overlapped, so that two set supportings 1 be prevented to be located at friendship simultaneously
For in section 3, supports and fall down so that matrix 12 lacks.By above-mentioned setting, stable bearing is being provided for matrix 12
Under the premise of, simplify the structure of supporting arrangement, reaction gas is more fully deposited.
Referring to Fig. 1, this supporting arrangement further includes three bars 4 thrown away for preventing matrix 12 to be centrifuged, and circumferentially
Direction be uniformly arranged.Before being vapor-deposited, matrix 12 is put on supporting member 1, so that matrix 12 is located at three bars 4
Inside, the stability based on triangle, in 12 rotation process of matrix, bar 4 can provide stable blocking for matrix 12,
Matrix 12 is avoided to be thrown out of due to by centrifugal force.
The vertical projection semicircular in shape structure of the bar 4, in this way, when matrix 12 is centrifuged as turntable 8 rotates, gear
Bar 4 blocks matrix 12, wherein sharp collision can occur to avoid the edge with matrix 12 for semicircular structure, to protect
Good deposition film.
Referring to Fig. 1, the power mechanism include the actuating arm 5 being connected between bar 4 and for drive bar 4 carry out from
The dynamic self-rotation wheel 6 of transhipment；The supporting member 1 passes through actuating arm 5 and the vertically extending top in support plate 13 by sliding shaft sleeve.
When work, under the driving of self-rotation wheel 6, bar 4 carries out spinning motion and works as bearing so that supporting member 1 be driven to move along sliding slot
When part 1 is moved to alternately section 3, supporting member 1 moves down along sliding shaft sleeve, far from matrix 12, so that matrix 12 alternately be given
Other set supportings 1, then reaction gas is deposited on corresponding bearing position over substrate 12.
Referring to Fig. 1, the lower section of bar 4 is arranged in the self-rotation wheel 6, and lower end is equipped with rotating gear 7；The rotating gear 7
It is fixedly connected with turntable 8 and concentric fixation gear 9 engages.By above structure, when turntable 8 is rotated, fixed tooth
Wheel 9 so that rotating gear 7 be driven to rotate, and then spinning motion is transferred on self-rotation wheel 6 and bar 4 with rotation；With turntable
8 share a power, can reduce cost of manufacture.
Referring to Fig. 1, the bottom end of the self-rotation wheel 6 is connected on turntable 8 by axial bearing 10；Under the support plate 13
End passes through the center of rotation of self-rotation wheel 6 by fixed column 11 and turntable 8 extends down, and is fixed on turntable 8.
Referring to Fig. 1-5, the top and bottom end of the supporting member 1 are equipped with spin 1-1, in this way, being rotated in actuating arm 5
When, supporting member 1 can be moved in sliding slot by spin 1-1, frictional force when greatly reducing mobile, so that alternately holding action
It is more smooth；In addition, supporting member 1 can be rolled by spin 1-1 in the lower end surface of matrix 12, allow reaction gas uniform
Ground is deposited on the position that supporting member 1 was contacted with matrix 12.
Referring to fig. 2-5, the working principle of above-mentioned supporting arrangement is:
Generally, before deposition work starts, first matrix 12 to be deposited is placed on supporting member 1, then starts cvd furnace,
Driving turntable 8 is rotated, and is passed through reaction gas.During rotating with turntable 8, power mechanism drives supporting member 1
It is rotated on support plate 13, so that supporting member 1 moves in a circle along sliding slot；Wherein, when supporting member 1 is located at supporting section 2,
Upper end is supported on the lower end surface of matrix 12, and when supporting member 1 is located at alternately section 3, the upper end is far from matrix 12, so the present embodiment
In, two set supportings 1 are provided with, respectively first group and second group, are moved along sliding slot, firstly, first group and second group is same
When be located on supporting section 2, such as Fig. 2, i.e., matrix 12 is supported simultaneously, then the first set supporting 1 is moved to alternately section 3
On, the second set supporting 1 still moves on supporting section 2, and such as Fig. 3, the second set supporting 1 supports matrix 12 at this time, so
The first set supporting 1 is moved on supporting section 2 afterwards, is supported simultaneously to matrix 12 for first group and second group at this time, and then the
Two set supportings 1 are moved in alternately section 3, and such as Fig. 4, the first set supporting 1 supports matrix 12 at this time, the second last group
Supporting member 1 is moved on supporting section 2, is supported simultaneously to matrix 12 for first group and second group at this time, and a circulation is completed；?
During above-mentioned deposition, two set supportings 1 successively alternately support matrix 12, lack so as to avoid generating deposition
Mouthful.
Above-mentioned is the preferable embodiment of the utility model, but the embodiments of the present invention is not by above content
It limits, change, modification, substitution, combination, the letter made under other any spiritual essence and principles without departing from the utility model
Change, should be equivalent substitute mode, be included within the protection scope of the utility model.
Claims (9)
1. a kind of supporting arrangement of chemical vapor deposition stove, which is characterized in that including the friendship for alternately being supported to matrix
For supporting device, the alternately supporting device includes at least two groups supporting member and the friendship for driving supporting member alternating support substrate
For driving mechanism；
Wherein, the driven mechanism includes at least two sliding slot on support plate in a ring being arranged in and for driving branch
The power mechanism that bearing member moves in sliding slot；The sliding slot includes supporting section and alternately section, the height of the alternately section are lower than branch
Hold the height of section；Every set supporting includes at least two supporting members, and is circumferentially evenly distributed on the top of sliding slot；
When the lower end of supporting member is moved to supporting section, the upper end is supported on the lower end surface of matrix, when the lower end of supporting member is mobile
To when replacing section, the upper end is far from matrix；When work, at least one group supporting member is located on supporting section.
2. the supporting arrangement of chemical vapor deposition stove according to claim 1, which is characterized in that further include multiple for preventing
Only matrix is centrifuged the bar thrown away.
3. the supporting arrangement of chemical vapor deposition stove according to claim 2, which is characterized in that the bar is three,
And direction circumferentially is uniformly arranged.
4. the supporting arrangement of chemical vapor deposition stove according to claim 2, which is characterized in that the vertical throwing of the bar
Shadow semicircular in shape structure.
5. the supporting arrangement of chemical vapor deposition stove according to claim 1, which is characterized in that the power mechanism includes
The actuating arm being connected between bar and the self-rotation wheel for driving bar progress spinning motion；
The supporting member passes through actuating arm and the vertically extending top in support plate by sliding shaft sleeve.
6. the supporting arrangement of chemical vapor deposition stove according to claim 5, which is characterized in that the self-rotation wheel setting exists
The lower section of bar, lower end are equipped with rotating gear；The rotating gear is fixedly connected with turntable and concentric fixation gear engages.
7. the supporting arrangement of chemical vapor deposition stove according to claim 6, which is characterized in that the bottom end of the self-rotation wheel
It is connected on turntable by axial bearing；The lower end of the support plate passes through the center of rotation and turntable of self-rotation wheel by fixed column
Extend down, and is fixed on turntable.
8. the supporting arrangement of chemical vapor deposition stove according to claim 1, which is characterized in that the top of the supporting member
Spin is equipped with bottom end.
9. the supporting arrangement of chemical vapor deposition stove according to claim 1, which is characterized in that the supporting member is two
Group, every group includes three supporting members；The sliding slot is two, and supporting section therein and alternating section are three；
Along radial direction, the alternating section in two sliding slots is staggered.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821256185.2U CN208517527U (en) | 2018-08-03 | 2018-08-03 | A kind of supporting arrangement of chemical vapor deposition stove |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821256185.2U CN208517527U (en) | 2018-08-03 | 2018-08-03 | A kind of supporting arrangement of chemical vapor deposition stove |
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| CN208517527U true CN208517527U (en) | 2019-02-19 |
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| CN201821256185.2U Active CN208517527U (en) | 2018-08-03 | 2018-08-03 | A kind of supporting arrangement of chemical vapor deposition stove |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108707877A (en) * | 2018-08-03 | 2018-10-26 | 深圳市石金科技股份有限公司 | A kind of supporting arrangement of chemical vapor deposition stove |
-
2018
- 2018-08-03 CN CN201821256185.2U patent/CN208517527U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108707877A (en) * | 2018-08-03 | 2018-10-26 | 深圳市石金科技股份有限公司 | A kind of supporting arrangement of chemical vapor deposition stove |
| CN108707877B (en) * | 2018-08-03 | 2024-07-05 | 深圳市石金科技股份有限公司 | Supporting device of chemical vapor deposition furnace |
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