CN103484876B - 一种除锈浆料 - Google Patents

一种除锈浆料 Download PDF

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Publication number
CN103484876B
CN103484876B CN201310434445.6A CN201310434445A CN103484876B CN 103484876 B CN103484876 B CN 103484876B CN 201310434445 A CN201310434445 A CN 201310434445A CN 103484876 B CN103484876 B CN 103484876B
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rust cleaning
cleaning slurry
kilogram
slurry
aluminum oxide
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CN103484876A (zh
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杨龙兴
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Xuzhou Bochuang Construction Development Group Co.,Ltd.
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Wuxi Yanggong Machinery Manufacturing Co Ltd
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Abstract

本发明一种除锈浆料,该浆料含有10~30wt%的氧化铝抛光粉,1~3wt%的十八烷基三乙氧基硅烷,0.1~3wt%的硬脂酸,1~2wt%的乙二醇,0.1~1wt%的磷酸,0.1~1wt%的二氧化锰,0.1~0.5wt%表面活性剂,余量为水。采用本发明的除锈浆料在完成除去铁制器件表面的铁锈的同时,在表面能形成一层保护膜,从而阻止铁器重新生锈。

Description

一种除锈浆料
技术领域
本发明涉及一种用于金属表面抛光的浆料。
背景技术
铁制器件在与空气的长期接触过程中不可避免会发生一定程度氧化,特别是在潮湿环境下,使器件表面产生一层铁锈,现有除锈处理剂虽然能除去表面的铁锈,但除锈后的铁如不进行防腐处理,在表面很快会又被氧化而失去金属光泽,甚至重新产生铁锈。
发明内容
本发明的目的是提供了一种除锈浆料。
为了实现上述目的,本发明提供了如下的技术方案:
一种除锈浆料,含有10~30wt%的氧化铝抛光粉,1~3wt%的十八烷基三乙氧基硅烷,0.1~3wt%的硬脂酸,1~2wt%的乙二醇,0.1~1wt%的磷酸,0.1~1wt%的二氧化锰,0.1~0.5wt%表面活性剂,余量为水。
进一步,所述氧化铝抛光粉的粒径为4~50μm。
进一步,所述表面活性剂为十二烷基磺酸钠或壬基酚聚氧乙烯醚NP-10。
采用本发明的除锈浆料在完成除去铁制器件表面的铁锈的同时,在表面能形成一层保护膜,从而阻止铁器重新生锈。
具体实施方式
以下对本发明的优选实施例进行说明,应当理解,此处所描述的优选实施例仅用于说明和解释本发明,并不用于限定本发明。
实施例1
一种除锈浆料,由1公斤氧化铝抛光粉(粒径为4~15μm的α-Al2O3),0.3公斤的十八烷基三乙氧基硅烷(CAS:7399-00-0),0.2公斤的硬脂酸,0.1公斤的乙二醇,0.01公斤的磷酸,0.01公斤的二氧化锰,0.01公斤的十二烷基磺酸钠和8.37公斤的水,研磨混合均匀后得到。
实施例2
一种除锈浆料,由2公斤氧化铝抛光粉(粒径为10~25μm的α-Al2O3),0.2公斤的十八烷基三乙氧基硅烷,0.3公斤的硬脂酸,0.1公斤的乙二醇,0.1公斤的磷酸,0.1公斤的二氧化锰,0.05公斤的十二烷基磺酸钠和7.15公斤的水,研磨混合均匀后得到。
实施例3
一种除锈浆料,由3公斤氧化铝抛光粉(粒径为25~50μm的α-Al2O3),0.1公斤的十八烷基三乙氧基硅烷,0.01公斤的硬脂酸,0.2公斤的乙二醇,0.05公斤的磷酸,0.05公斤的二氧化锰,0.03公斤的壬基酚聚氧乙烯醚NP-10和6.56公斤的水,研磨混合均匀后得到。
该除锈浆料的使用:用打磨布沾上浆料,在铁制器具表面进行打磨,直至器具显出金属光泽后,然后放置10~20分钟,最后用水冲洗即可。
以上所述仅为本发明的优选实施例而已,并不用于限制本发明,尽管参照前述实施例对本发明进行了详细的说明,对于本领域的技术人员来说,其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换。凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。

Claims (3)

1.一种阻止铁器重新生锈的除锈浆料,含有10~30wt%的氧化铝抛光粉,1~3wt%的十八烷基三乙氧基硅烷,0.1~3wt%的硬脂酸,1~2wt%的乙二醇,0.1~1wt%的磷酸,0.1~1wt%的二氧化锰,0.1~0.5wt%表面活性剂,余量为水。
2.根据权利要求1所述的除锈浆料,其特征在于,所述氧化铝抛光粉的粒径为4~50μm。
3.根据权利要求1所述的除锈浆料,其特征在于,所述表面活性剂为十二烷基磺酸钠或壬基酚聚氧乙烯醚NP-10。
CN201310434445.6A 2013-09-23 2013-09-23 一种除锈浆料 Active CN103484876B (zh)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002002706A1 (en) * 2000-07-05 2002-01-10 Cabot Microelectronics Corporation Polishing composition for metal cmp
CN1440449A (zh) * 2000-07-05 2003-09-03 卡伯特微电子公司 用于cmp的含硅烷的抛光组合物
CN1809620A (zh) * 2003-04-21 2006-07-26 卡伯特微电子公司 用于cmp的涂覆金属氧化物颗粒
CN101058713A (zh) * 2001-10-31 2007-10-24 日立化成工业株式会社 研磨液及研磨方法
CN101928521A (zh) * 2009-06-26 2010-12-29 盟智科技股份有限公司 研浆组成物及使用该研浆组成物的金属镶嵌结构制造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002002706A1 (en) * 2000-07-05 2002-01-10 Cabot Microelectronics Corporation Polishing composition for metal cmp
CN1440449A (zh) * 2000-07-05 2003-09-03 卡伯特微电子公司 用于cmp的含硅烷的抛光组合物
CN101058713A (zh) * 2001-10-31 2007-10-24 日立化成工业株式会社 研磨液及研磨方法
CN1809620A (zh) * 2003-04-21 2006-07-26 卡伯特微电子公司 用于cmp的涂覆金属氧化物颗粒
CN101928521A (zh) * 2009-06-26 2010-12-29 盟智科技股份有限公司 研浆组成物及使用该研浆组成物的金属镶嵌结构制造方法

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