CN103389827A - Light filter with touch effect, preparation method of light filter and touch display assembly - Google Patents

Light filter with touch effect, preparation method of light filter and touch display assembly Download PDF

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Publication number
CN103389827A
CN103389827A CN2013102824302A CN201310282430A CN103389827A CN 103389827 A CN103389827 A CN 103389827A CN 2013102824302 A CN2013102824302 A CN 2013102824302A CN 201310282430 A CN201310282430 A CN 201310282430A CN 103389827 A CN103389827 A CN 103389827A
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China
Prior art keywords
conductive
layer
conductive pattern
touch
pattern
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CN2013102824302A
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Chinese (zh)
Inventor
唐根初
刘伟
董绳财
唐彬
何世磊
Original Assignee
南昌欧菲光显示技术有限公司
深圳欧菲光科技股份有限公司
苏州欧菲光科技有限公司
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Priority to CN2013102824302A priority Critical patent/CN103389827A/en
Publication of CN103389827A publication Critical patent/CN103389827A/en

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Abstract

The invention relates to a light filter with touch effect. The light filter comprises a transparent base, a black light resistance layer and an R/G/B colored light resistance layer which cover the transparent base at intervals, wherein one side, far away from the transparent base, of the black light resistance layer is further covered with a grid-shaped conductive layer, the conductive layer comprises a first conductive pattern and a second conductive pattern which are arranged at intervals to form a sensing structure. The light filter with touch effect is provided with the conductive patterns for generating touch effect; and when the light filter is applied to a display assembly, the display assembly has touch effect and is small in thickness without additionally attaching a touch sensing device. Moreover, the invention further provides a touch display assembly using the light filter and a preparation method of the light filter.

Description

Optical filter, its preparation method and touch-control display module with the touch-control effect

Technical field

The present invention relates to the touch-control field, particularly relate to a kind of optical filter with the touch-control effect and preparation method thereof, and use the touch-control display module of this optical filter.

Background technology

At present, touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of information medium circle, has become the Chaoyang new high-tech industry that the photoelectricity industry is a dark horse.

For the touch-control display device, the display device element that is absolutely necessary, but the element (as optical filter) that forms display device itself does not possess the touch-control sensing effect.Therefore as shown in Figure 1, the touch-control display device is mainly obtained by the mode that use cementing agent 130 is fitted entirely or the frame subsides are made up by touch control induction device 110 and display device 120 at present, therefore, need a step with the technique of touch control induction device 110 and display device 120 laminatings during production, but the touch control display apparatus thickness that obtains like this is thicker.

Summary of the invention

Based on this, be necessary to propose a kind of optical filter with the touch-control effect, make the display device of using this optical filter possess the touch-control effect and thickness less; A kind of touch-control display module that uses this optical filter also is provided simultaneously; A kind of preparation method of the optical filter with the touch-control effect is provided in addition.

A kind of optical filter with the touch-control effect, comprise that transparent substrates, interval are covered in black light resistance layer and the R/G/B colorama resistance layer on described transparent substrates, wherein said black light resistance layer also is covered with and has latticed conductive layer away from a side of described transparent substrates, described conductive layer comprises the first conductive pattern and the second conductive pattern, and described the first conductive pattern and the second conductive pattern space arrange the formation induction structure.

Therein in embodiment, described black light resistance layer has lattice structure, the elementary cell of described R/G/B colorama resistance layer is positioned at described grid, described the first conductive pattern and the second conductive pattern are formed by the conductive thread on the gridline that is arranged on described black light resistance layer, and described conductive thread intersects the conductive grid unit that forms described the first conductive pattern and the second conductive pattern.

Therein in embodiment, described the first conductive pattern and the second conductive pattern obtain by the conductive layer etching that is arranged on described black light resistance layer, the conductive material of described conductive layer is selected from metal, metal alloy, conducting polymer, at least a in Graphene, carbon nano-tube, ITO and conductive ink.

Therein in embodiment, described the first conductive pattern arranges continuously, described the second conductive pattern is divided into a plurality of electrode blocks take described the first conductive pattern as interval, between the adjacent electrode piece by the conduction connection of putting up a bridge, described conduction put up a bridge and described the first conductive pattern between pass through insulator separation.

In embodiment, described surface of insulating layer is provided with latticed groove therein, and described conduction is put up a bridge and formed by the conductive material that is filled in described latticed groove.

Therein in embodiment, two conducting blocks that described conduction is latticed bridging wire and is positioned at two ends and with the bridging wire, is communicated with in the middle of putting up a bridge and comprising, described bridging wire is embedded in described surface of insulating layer, and described two conducting blocks penetrate described insulation course and are communicated to respectively an electrode block.

In embodiment, the live width of described bridging wire is 0.2~5 μ m, line-spacing 50~500 μ m therein.

Therein in embodiment, at least two conductive threads overlap joints in described conducting block and each second conductive pattern that is connected.

In embodiment, described conduction is put up a bridge and is utilized the electrically conducting transparent ink to put up a bridge therein, makes the electrode block of second conductive pattern at described conduction bridging two ends realize being electrically connected to and with described the first conductive pattern, not being connected.

Therein in embodiment, the live width of described conductive grid unit conductive thread be described black light resistance layer gridline live width 80%~120%.

In embodiment, described conductive grid unit is corresponding one by one with the elementary cell of described R/G/B colorama resistance layer therein.

Therein in embodiment, described conductive layer extends upward with second party on mutually orthogonal first direction, wherein on first direction or second direction or simultaneously on described first direction and second direction, the elementary cell of a plurality of complete R/G/B colorama resistance layers is held in the projection of conductive grid unit on described black light resistance layer.

Therein in embodiment, described conductive unit grid is done whole interrupting or the local continuous conductive thread of processing formation multirow that interrupts, multirow conductive thread compartment of terrain on the direction of row is connected simultaneously, forms the first conductive pattern and the second conductive pattern that a plurality of shape complementarities are semi-surrounding or entirely surround shape.

In embodiment, described conductive grid unit is the multiple lines and multiple rows setting, wherein has the equal integral body in conductive grid unit of multiple row or part to interrupt and form independently the first conductive pattern of multiple row therein; The conductive grid unit that is arranged in simultaneously same delegation and is positioned at described the first conductive pattern both sides is all interrupted by integral body or part, and form a plurality of electrode blocks take described the first conductive pattern as interval, described electrode block forms described the second conductive pattern, and on the direction of described row, described the second conductive pattern is formed with multirow.

In embodiment, the distances of two broken string nodes of the conductive thread of conductive grid unit are 0.5~50 μ m therein.

In embodiment, the thickness of described R/G/B colorama resistance layer is more than or equal to the integral thickness of black light resistance layer and conductive layer therein.

A kind of touch-control display module, comprise aforesaid optical filter with the touch-control effect.

Therein in embodiment, described touch-control display module comprises the upper polaroid that stacks gradually, described with alignment film, liquid crystal, lower alignment film and transistor electrodes on the optical filter of touch-control effect.

In embodiment, described conductive layer is towards a side at described liquid crystal place therein.

A kind of preparation method of the optical filter with the touch-control effect, comprise the steps:

Cover the black light resistance layer on the surface of transparent substrates;

Surface in the black light resistance layer covers conductive layer;

At conductive layer surface coated polymeric layer, and by exposure-developing makes the shape of residual polymeric layer corresponding with the shape of the first conductive pattern and the second conductive pattern;

Utilize described polymeric layer to be mask layer, described conductive layer is carried out etching, obtain the conductive unit grid of the first conductive pattern and the second conductive pattern;

Utilize described polymeric layer and conductive layer to be mask layer, described black light resistance layer is carried out etching, obtain the gridline of black light resistance layer;

Remove the polymeric layer of described conductive layer surface;

Plate or coat the R/G/B chromatic photoresist in the grid of black light resistance layer.

In embodiment, described the second conductive pattern is divided into a plurality of electrode blocks take described the first conductive pattern as interval therein.

In embodiment, the preparation method of described optical filter with the touch-control effect also comprises the steps: therein

Adopt inkjet printing or screen printing technique to cover the layer of transparent insulation course at the second conductive pattern and the first conductive pattern intersection;

Adopt inkjet printing or screen printing technique to cover the layer of transparent conductive ink on described transparent insulating layer and put up a bridge as conduction, make the electrode block of second conductive pattern at described conduction bridging two ends realize being electrically connected to and with described the first conductive pattern, not being connected.

In embodiment, the preparation method of described optical filter with the touch-control effect also comprises the steps: therein

Surface at described R/G/B colorama resistance layer and described the first conductive pattern and the second conductive pattern covers the layer of transparent insulation course again;

Use with the impression block of the conduction bridging structural correspondence that needs and impress on described transparent insulating layer, make the protuberance of the impression block of corresponding conduction bridging two ends conducting block press to penetrate bright insulation course and with the electrode block of second conductive pattern at corresponding interval, be connected, obtain and conduct electricity the nested groove of bridging structure;

To filled conductive material in above-mentioned groove and solidify, the conduction that obtains being communicated with adjacent two electrode blocks is put up a bridge.

In embodiment, the preparation method of described optical filter with the touch-control effect also comprises the steps: therein

Surface at described R/G/B colorama resistance layer and described the first conductive pattern and the second conductive pattern covers one deck photoresist again, and utilize mask plate to expose to described photoresist, and by developing, two conducting block corresponding positions of in follow-up conduction, putting up a bridge obtain respectively two photoresist mask layers that are connected with the electrode block of the second conductive pattern;

Surface to described conductive layer with the photoresist mask layer is coated with the layer of transparent insulation course again, and the position between described two photoresist mask layers impresses out latticed bridging wire grooves and solidifies;

Described photoresist mask layer is removed, to form the conducting block groove that is communicated with surface of insulating layer and electrode block;

To filled conductive material in described bridging wire grooves and described conducting block groove and solidify, the conduction that obtains being communicated with adjacent two electrode blocks is put up a bridge.

In embodiment, described conductive material is selected from metal, metal alloy, conducting polymer therein, at least a in Graphene, carbon nano-tube, ITO and conductive ink.

In embodiment, described at conductive layer surface coated polymeric layer therein, and in the shape that makes residual polymeric layer by exposure-the develop step corresponding with the shape of the first conductive pattern and the second conductive pattern:

Described polymeric layer is carried out etching, form the latticed pattern of multiple lines and multiple rows;

Described grid is interrupted processing, obtain the first consistent with the first conductive pattern shape respectively pattern and consistent the second pattern with the second conductive pattern shape.

Therein in embodiment, described interrupting is treated to: described grid is interrupted as integral body or interrupt part, form the continuous mesh lines of multirow and be connected multirow mesh lines compartment of terrain on the direction of row simultaneously, form the first pattern and the second pattern that shape complementarity is semi-surrounding or entirely surrounds shape; Or the grid of multiple row is all made integral body or local interrupted and form independently first pattern consistent with the first conductive pattern shape of multiple row, the grid that will be arranged in simultaneously same delegation and be positioned at described the first pattern both sides all makes integral body or processing is interrupted in part, and form a plurality of the second pattern units take described the first pattern as interval, described the second pattern unit forms second pattern consistent with described the second conductive pattern shape, and on the direction of described row, form described the second pattern of multirow.

Therein in embodiment, described at conductive layer surface coated polymeric layer, and in the shape make residual polymeric layer by exposure-the develop step corresponding with the shape of the first conductive pattern and the second conductive pattern, after the coated polymeric layer is photoresist, utilize exposure-developing technique only to cover photoresist on the grid grid line of corresponding the first conductive pattern of needs and the second conductive pattern, it is complete latticed making residual photoresist, consistent with the grid shape of required black light resistance layer; Simultaneously

In the step of the described polymeric layer of removing described conductive layer surface and described plating or coat between the step of R/G/B chromatic photoresist further comprising the steps of in the grid of black light resistance layer:

Remove the residual polymeric layer of described conductive layer surface, and then again cover the one layer of polymeric layer, and by exposure-develop, the first conductive pattern and the second conductive pattern polymeric layer of processing corresponding position that need to break is removed;

Be mask layer with the described polymeric layer that again covers, described conductive layer is carried out etching again, obtain separate, the first conductive pattern of insulation after broken string is processed and the conductive thread of the second conductive pattern;

The described polymeric layer that again covers is removed.

Above-mentioned optical filter with the touch-control effect, be provided with to produce the conductive pattern of touch-control effect, need not other sticking touch control induction installation while being applied to display module and can guarantee that display module possesses the touch-control effect and thickness is little.

The preparation method of above-mentioned optical filter with the touch-control effect, the gridline of conductive layer and black light resistance layer is to utilize same mask layer to carry out etching, the conductive grid unit of conductive layer does not need to aim at the grid of black light resistance layer, reduce task difficulty, obtain easily the optical filter with the touch-control effect.

The optical filter of above-mentioned touch-control display module is with the touch-control effect, therefore possess the touch-control effect and thickness little.

Description of drawings

Fig. 1 is the structural representation of traditional touch-control display device;

Fig. 2 is the schematic diagram with the partial structurtes of the optical filter of touch-control effect;

Fig. 3 is the cross-sectional view of the optical filter of embodiment one;

Fig. 4 is the structural representation of conductive layer of the optical filter of embodiment one;

Fig. 5 is the schematic diagram of the first generation type of the first conductive pattern of optical filter of embodiment one and the second conductive pattern;

Fig. 6 is the schematic diagram of the second generation type of the first conductive pattern of optical filter of embodiment one and the second conductive pattern;

Fig. 7 to Figure 10 is the conductive grid unit of conductive layer and four kinds of different corresponding situations of the elementary cell of optical filter colorama resistance layer R/G/B;

Figure 11 is the cross-sectional view of the optical filter of embodiment two;

Figure 12 is the structural representation of conductive layer of the optical filter of embodiment two;

Figure 13 is the schematic diagram of the first generation type of the first conductive pattern of optical filter of embodiment two and the second conductive pattern;

Figure 14 is the schematic diagram of the second generation type of the first conductive pattern of optical filter of embodiment two and the second conductive pattern;

Figure 15 is the schematic diagram of the another kind of bridge formation mode of conductive layer of the optical filter of embodiment two;

Figure 16 is the schematic diagram of another bridge formation mode of conductive layer of the optical filter of embodiment two;

Figure 17 is the exploded view of use with the touch-control display module of the optical filter of touch-control effect.

Embodiment

Fig. 2 is the schematic diagram with the partial structurtes of the optical filter 200 of touch-control effect.This optical filter 200 comprise be arranged on transparent substrates (not shown in Fig. 2), interval is covered in black light resistance layer 220 and R/G/B colorama resistance layer 230 on transparent substrates.Wherein, black light resistance layer 220 is the photoresist with black dyes, and it is lattice structure, and the R/G/B elementary cell of R/G/B colorama resistance layer 230 is plated or is coated in grid region.Simultaneously, the gridline of black light resistance layer 220 is provided with latticed conductive layer 240.This conductive layer 240 is divided into the first conductive pattern and the second conductive pattern, and the first conductive pattern and the separate insulation of the second conductive pattern and interval arrange the formation induction structure, make optical filter 200 possess the touch-control ability.Be described in detail below in conjunction with concrete example.

Embodiment one

Please refer to Fig. 3 to Figure 10, be the cross-sectional view of the optical filter 300 of embodiment one.Optical filter 300 comprises transparent substrates 310, is covered in black light resistance layer 320 and R/G/B colorama resistance layer 330 on transparent substrates 310, and is covered in the conductive layer 340 on black light resistance layer 320.

Transparent substrates 310 can be sillico aluminate glass or calcium soda-lime glass.Black light resistance layer 320 is lattice structure, and the R/G/B elementary cell of R/G/B colorama resistance layer 330 is plated or is coated in grid region, and black light resistance layer 320 and R/G/B colorama resistance layer 330 intervals are arranged.Conductive layer 340 is to be located on the one side of black light resistance layer 320 away from transparent substrates 310.Conductive layer 340 is the conductive thread on the gridline that is arranged on black light resistance layer 320, and conductive thread intersects to form conductive grid unit 342 mutually.The live width of the conductive thread of conductive grid unit 342 be described black light resistance layer 320 gridline live width 80%~120%.Conductive layer 340 divides again the first conductive pattern 344 and the second conductive pattern 346 that arranges at interval and form induction structure, possesses the touch-control effect while making optical filter 300 application.The first conductive pattern 344 can be to connect separately lead-in wire with being connected conductive pattern 346, with control chip, to communicate.After conductive layer 340 forms, the thickness of R/G/B colorama resistance layer 330 is more than or equal to the integral thickness of black light resistance layer 320 and conductive layer 340, the light emission rate in R/G/B chromatic photoresist zone can be increased like this, the situation of the light that sends less than R/G/B chromatic photoresist zone can be avoided occurring from the side.

In the present embodiment, the first conductive pattern 344 and the second conductive pattern 346 are individual layer multipoint configurations, they are to obtain by conductive layer 340 after etchings are set on black light resistance layer 320 and R/G/B colorama resistance layer 330, and are to use broken string to process to obtain the first conductive pattern 344 and the second conductive pattern 346 independent of one another and insulation in this process.Please refer to Fig. 5 and Fig. 6, conductive layer 340 extends on mutually orthogonal first direction X and second direction Y, and the conductive grid unit 342 of conductive layer 340 is the multiple lines and multiple rows setting, each corresponding R/G/B unit, conductive grid unit 342.Herein, be respectively the direction of row and column with first direction X and second direction Y, the mode that broken string is processed is: conductive unit grid 342 is interrupted (as shown in Figure 5) as integral body or processing (as shown in Figure 6) is interrupted in part, form the continuous conductive thread of multirow, multirow conductive thread compartment of terrain on second direction Y is connected simultaneously, form thus the first conductive pattern 344 and the second conductive pattern 346 that a plurality of independent, shape complementarities are semi-surrounding or entirely surround shape, the distances of two broken string nodes of the conductive thread of conductive grid unit 342 are generally 0.5~50 μ m.Herein, compartment of terrain is connected can comprise multiple situation, in the present embodiment, clips the conductive thread of delegation's the second conductive pattern 346 in two row conductive threads of the first conductive pattern 344, can certainly be the conductive thread that clips two row the second conductive patterns 346.

As shown in Figure 7, in above-described embodiment, it is in the situation that each corresponding R/G/B unit, conductive grid unit 342 carries out that broken string is processed.But it may be noted that also can there be other corresponding situation conductive grid unit 342 and R/G/B unit.Please refer to Fig. 8, on first direction X, the elementary cell of a plurality of R/G/B colorama resistance layers 330 is held in the projection of conductive grid unit 342 on black light resistance layer 220.Please refer to Fig. 9, on second direction Y, the elementary cell of a plurality of R/G/B colorama of the projection of a conductive grid unit 342 on black light resistance layer 220 resistance layer 330.Please refer to Figure 10, on first direction X and second direction Y, the elementary cell of a plurality of R/G/B colorama resistance layers 330 is held in the projection of conductive grid unit 342 on black light resistance layer 220 simultaneously.

Optical filter 300 preparation methods of the present embodiment are as follows:

Step 1, on the surface of transparent substrates, cover the black light resistance layer.At first use beam-plasma to carry out bombardment processing on glass baseplate such as sillico aluminate glass or calcium soda-lime glass, remove the dirty of glass surface, and make surface ion, increase the cohesive force of follow-up transparent substrates and black and colorama resistance layer.Then, whole face is coated with or plates the photoresist with black dyes on the surface of transparent substrates, forms the black light resistance layer.

Step 2, on the surface of black light resistance layer, cover conductive layer.At plated surface one deck conducting film of black light resistance layer or be coated with one deck conductive ink as conductive layer.The conductive material of conductive layer can also be metal simple-substance such as argent, metal alloy, conducting polymer, Graphene, carbon nano-tube, ITO etc.

Step 3, at conductive layer surface coated polymeric layer, and by exposure-developing makes the shape of residual polymeric layer corresponding with the shape of the first conductive pattern and the second conductive pattern.After the coated polymeric layer is photoresist, utilize exposure-developing technique only to cover photoresist on the grid grid line of corresponding the first conductive pattern of needs and the second conductive pattern, other place (comprises needs broken string zone, the mode of its interrupt line is with reference to associated description in figure 7 to Figure 10 and preamble) photoresist remove, the shape of the polymeric layer under residual like this is just corresponding with the shape of the first conductive pattern of needs and the second conductive pattern.

Wherein, the shape step corresponding with the shape of the first conductive pattern and the second conductive pattern of residual polymeric layer comprised:

Described polymeric layer is carried out etching, form the latticed pattern of multiple lines and multiple rows;

Described grid is interrupted processing,, obtain the first consistent with the first conductive pattern shape respectively pattern and consistent the second pattern with the second conductive pattern shape.The mode that wherein interrupts processing is;

Described grid is interrupted as integral body or interrupt part, form the continuous mesh lines of multirow and be connected multirow mesh lines compartment of terrain on the direction of row simultaneously, form the first pattern and the second pattern that a plurality of shape complementarities are semi-surrounding or entirely surround shape.The mode that specifically interrupts also can with reference in preamble about the description of Fig. 7 to Figure 10.

Step 4, utilize described polymeric layer to be mask layer, described conductive layer is carried out etching, obtain separate, the first conductive pattern of insulation and the conductive unit grid of the second conductive pattern.Process owing to also having carried out broken string as the polymeric layer of mask layer before this, just directly obtained the first separate conductive pattern and the second conductive pattern when described conductive layer is carried out etching.

Step 5, utilize described polymeric layer and conductive layer to be mask layer, described black light resistance layer is carried out etching, obtain the gridline of black light resistance layer.Still utilize aforementioned under residual polymeric layer and conductive layer as mask layer, utilize etching solution to carry out etching to the black light resistance layer, just obtained the gridline of black light resistance layer, the shape of the first conductive pattern and the conductive thread of the second conductive pattern is consistent with gridline.

Step 6, remove the polymeric layer of described conductive layer surface.

Step 7, plating or coat the R/G/B chromatic photoresist in the grid of black light resistance layer.The R/G/B chromatic photoresist is plated/coats in gradation in the grid region of correspondence, has just obtained black light resistance layer and colorama resistance layer that interval arranges.

In the preparation method of above-mentioned optical filter 300, the gridline of conductive layer and black light resistance layer is to utilize same mask layer to carry out etching, and the conductive grid unit of conductive layer does not need to aim at the grid of black light resistance layer, reduces task difficulty.In addition, because conductive thread is consistent with the gridline shape of black light resistance layer, and be covered in the side of black light resistance layer away from substrate of glass, even therefore the conductive thread vision is opaque, also can be sheltered from by the black light resistance layer, the user can not see conductive thread in use, thereby improve the user, experiences.The optical filter that the present embodiment obtains, the gridline of black light resistance layer is consistent with the shape of the conductive thread of the first conductive pattern and the second conductive pattern, also exists broken string to process.

The another kind of preparation method of the optical filter 300 of above-described embodiment is as follows:

Step 1, on the surface of transparent substrates, cover the black light resistance layer.At first use beam-plasma to carry out bombardment processing on glass baseplate such as sillico aluminate glass or calcium soda-lime glass, remove the dirty of glass surface, and make surface ion, increase the cohesive force of follow-up transparent substrates and black and colorama resistance layer.Then, whole face is coated with or plates the photoresist with black dyes on the surface of transparent substrates, forms the black light resistance layer.

Step 2, on the surface of black light resistance layer, cover conductive layer.At plated surface one deck conducting film of black light resistance layer or be coated with one deck conductive ink as conductive layer.The conductive material of conductive layer can also be metal simple-substance such as argent, metal alloy, conducting polymer, Graphene, carbon nano-tube, ITO etc.

Step 3, at conductive layer surface coated polymeric layer, and by exposure-developing makes the shape of residual polymeric layer corresponding with the shape of the first conductive pattern and the second conductive pattern.After the coated polymeric layer is photoresist, utilize exposure-developing technique only to cover photoresist on the grid grid line of corresponding the first conductive pattern of needs and the second conductive pattern, the photoresist in other place (not comprising the broken string zone) is removed, residual like this photoresist is complete latticed, and is consistent with the grid shape of required black light resistance layer.

Step 4, utilize described polymeric layer to be mask layer, described conductive layer is carried out etching, obtain the conductive grid consistent with above-mentioned residual photoresist shape, should be noted that the conductive grid of this moment is complete grid, the processing of also breaking.

Step 5, utilize described polymeric layer and conductive layer to be mask layer, described black light resistance layer is carried out etching, obtain the gridline of black light resistance layer.Still utilize aforementioned under residual polymeric layer and conductive layer as mask layer, utilize etching solution to carry out etching to the black light resistance layer, just obtained the gridline of black light resistance layer, should be noted that the gridline of the black light resistance layer that the present embodiment obtains is complete grid, the processing of breaking.

Step 6, remove the residual polymeric layer of described conductive layer surface (because this polymeric layer is photoresist, when the black light resistance layer is carried out etching, this polymeric layer also can suffer etching, shape is destroyed, need to re-start and cover), again cover again the one layer of polymeric layer, and by exposure-develop, the first conductive pattern and the second conductive pattern polymeric layer of processing corresponding position that need to break is removed.Again after being coated with polymeric layer and being photoresist, utilize exposure-developing technique that the first conductive pattern and the second conductive pattern regional photoresist that need to break is removed (mode of its interrupt line is with reference to associated description in figure 7 to Figure 10 and preamble).

Step 7, utilize described polymeric layer to be mask layer, described conductive layer is carried out etching again, obtain separate, the first conductive pattern of insulation after broken string is processed and the conductive thread of the second conductive pattern.

Step 8, polymeric layer is removed.

Step 9, plating or coat the R/G/B chromatic photoresist in the grid of black light resistance layer.The R/G/B chromatic photoresist is plated/coats in gradation in the grid region of correspondence, has just obtained black light resistance layer and colorama resistance layer that interval arranges.

In the preparation method of above-mentioned optical filter 300, the gridline of conductive layer and black light resistance layer is to utilize same mask layer to carry out etching, and the conductive grid unit of conductive layer does not need to aim at the grid of black light resistance layer, reduces task difficulty.In addition,, because conductive thread is covered in the side of black light resistance layer away from substrate of glass,, even therefore the conductive thread vision is opaque, can be sheltered from by the black light resistance layer, the user can not see conductive thread in use yet, thereby improve the user, experiences.Further, the black light resistance layer of the optical filter that the present embodiment makes is complete grid, and the processing of breaking, so can prevent that the black light resistance layer from affecting user's experience because broken string causes light leak.

Embodiment two

Please refer to Figure 11 to Figure 14, be the cross-sectional view of the optical filter 400 of embodiment two.Optical filter 400 comprises transparent substrates 410, is covered in black light resistance layer 420 and R/G/B colorama resistance layer 430 on transparent substrates 410, and is covered in the conductive layer 440 on black light resistance layer 420.

With embodiment one, transparent substrates 410 can be sillico aluminate glass or calcium soda-lime glass.Black light resistance layer 420 is lattice structure, and the R/G/B elementary cell of R/G/B colorama resistance layer 430 is plated or is coated in grid region, and black light resistance layer 420 and R/G/B colorama resistance layer 430 intervals are arranged.Conductive layer 440 is to be located on the one side of black light resistance layer 420 away from transparent substrates 410.

Conductive layer 440 is the conductive thread on the gridline that is arranged on black light resistance layer 420, and conductive thread intersects to form conductive grid unit 442 mutually.The live width of conductive grid unit 442 conductive threads be described black light resistance layer 420 gridline live width 80%~120%.Conductive layer 440 divides again the first conductive pattern 444 and the second conductive pattern 446 that arranges at interval and form induction structure, makes optical filter 400 possess the touch-control effect.After conductive layer 440 forms, the thickness of R/G/B colorama resistance layer 430 is more than or equal to the integral thickness of black light resistance layer and conductive layer, the light emission rate in R/G/B chromatic photoresist zone can be increased like this, the situation of the light that sends less than R/G/B chromatic photoresist zone can be avoided occurring from the side.

In the present embodiment, the conductive pattern of conductive layer 440 is to adopt conduction bridging mode.Conductive layer 440 comprises the first conductive pattern 444 and the second conductive pattern 446, wherein the first conductive pattern 444 arranges continuously, the second conductive pattern 446 is divided into a plurality of electrode blocks 4462 take the first conductive pattern 444 as interval, put up a bridge and 448 connect by conduction between adjacent electrode piece 4462, and conduction is put up a bridge and isolated by insulation course 450 between the 448 and first conductive pattern 444.Conduction bridging 448 can adopt conductive ink to obtain by silk-screen or inkjet printing, also can obtain by the impression mode, will further describe hereinafter.

Similar with embodiment one, the first conductive pattern 444 and the second conductive pattern 446 obtain by etching on conductive layer 440, and are to use broken string to process to obtain the first conductive pattern 444 and the second conductive pattern 446 independent of one another and insulation in this process.Please refer to Figure 13 and Figure 14, conductive layer 440 extends on mutually orthogonal first direction X and second direction Y, and the conductive grid unit 442 of conductive layer 440 is the multiple lines and multiple rows setting, each corresponding R/G/B unit, conductive grid unit 442.Herein, be respectively the direction of row and column with first direction X and second direction Y, the mode that broken string is processed is: on X on first direction, have the conductive grid unit 442 of multiple row to be interrupted processings (ginseng Figure 13) by integral body or first conductive pattern 444 of processing (ginseng Figure 14) with the formation multiple row interrupted in part; Meanwhile, the conductive grid unit that is arranged in same delegation and is positioned at the first conductive pattern 444 both sides is all interrupted by integral body or part, and form a plurality of electrode blocks 4462 take the first conductive pattern 444 as interval, and on second direction Y, there is the conductive grid unit 442 of multirow to do the above-mentioned processing that interrupts, form thus a plurality of the second conductive patterns 446.An electrode block 4462 can comprise one or more conductive grids unit 442.

Identical with embodiment one, in the present embodiment, also can there be multiple corresponding situation each conductive grid unit 342 with the R/G/B unit.That is, can be on first direction or second direction or simultaneously on described first direction and second direction, the elementary cell of a plurality of complete R/G/B colorama resistance layers 430 is held in the projection of conductive grid unit 442 on black light resistance layer 420.

Please refer to Figure 11, when conduction was built bridge 448 employing electrically conducting transparent ink, optical filter 400 the first preparation methods of the present embodiment were as follows:

Step 1, on the surface of transparent substrates, cover the black light resistance layer.At first use beam-plasma to carry out bombardment processing on glass baseplate such as sillico aluminate glass or calcium soda-lime glass, remove the dirty of glass surface, and make surface ion, increase the cohesive force of follow-up transparent substrates and black and colorama resistance layer.Then, be coated with or plate the photoresist with black dyes in the surperficial front of transparent substrates, form the black light resistance layer.

Step 2, on the surface of black light resistance layer, cover conductive layer.At plated surface one deck conducting film of black light resistance layer or be coated with one deck conductive ink as conductive layer.The conductive material of conductive layer can be metal simple-substance such as argent, metal alloy, conducting polymer, Graphene, carbon nano-tube, ITO.

Step 3, at conductive layer surface coated polymeric layer, and by exposure-developing makes the shape of residual polymeric layer corresponding with the shape of the first conductive pattern and the second conductive pattern.After the coated polymeric layer is photoresist, utilize exposure-developing technique only to cover photoresist on the grid grid line of corresponding the first conductive pattern of needs and the second conductive pattern, other place (comprises needs broken string zone, the mode of broken string is with reference to associated description in figure 7 to Figure 10 and preamble) photoresist remove, the shape of the polymeric layer under residual like this is just corresponding with the shape of the first conductive pattern of needs and the second conductive pattern.

Wherein, the shape step corresponding with the shape of the first conductive pattern and the second conductive pattern of residual polymeric layer specifically comprised:

Described polymeric layer is carried out etching, form the latticed pattern of multiple lines and multiple rows;

Described grid is interrupted processing, obtain the first consistent with the first conductive pattern shape respectively pattern and consistent the second pattern with the second conductive pattern shape.The mode that wherein interrupts processing is:

The grid of multiple row is all made integral body or local interrupted and form independently first pattern consistent with the first conductive pattern shape of multiple row, the grid that will be arranged in simultaneously same delegation and be positioned at described the first pattern both sides all makes integral body or processing is interrupted in part, and form a plurality of the second pattern units take described the first pattern as interval, described the second pattern unit forms second pattern consistent with described the second conductive pattern shape, and on the direction of described row, form described the second pattern of multirow.The mode that specifically interrupts can with reference in preamble about the description of Fig. 7 to Figure 10.The purpose that interrupts is to make the shape of polymeric layer consistent with the pattern form of conductive layer, so that conductive layer is carried out etching.

Step 4, utilize described polymeric layer to be mask layer, described conductive layer is carried out etching, obtain separate, the insulation the first conductive pattern and the conductive unit grid of the second conductive pattern, wherein the second conductive pattern is divided into a plurality of electrode blocks take the first conductive pattern as interval.Wherein, utilize the second pattern unit etching will obtain the electrode block of the second conductive pattern.

Step 5, utilize described polymeric layer and conductive layer to be mask layer, described black light resistance layer is carried out etching, obtain the gridline of black light resistance layer.Still utilize polymeric layer under residual as mask layer, utilize etching solution to carry out etching to the black light resistance layer, just obtained the gridline of black light resistance layer, the conductive thread shape of the first conductive pattern and the second conductive pattern is consistent with gridline.

Step 6, remove the polymeric layer of described conductive layer surface.

Step 7, plating or coat the R/G/B chromatic photoresist in the grid of black light resistance layer.The R/G/B chromatic photoresist is plated/coats in gradation in corresponding grid region, has just obtained black light resistance layer and colorama resistance layer that interval arranges.

Step 8, employing inkjet printing or screen printing technique cover the layer of transparent insulation course at the second conductive pattern and the first conductive pattern intersection.Namely at needs bridge formation place, cover the layer of transparent insulation course.

Step 9, employing inkjet printing or screen printing technique cover the layer of transparent conductive ink and put up a bridge as conduction on described transparent insulating layer, make the electrode block of second conductive pattern at described conduction bridging two ends realize being electrically connected to and with described the first conductive pattern, not being connected.The material of electrically conducting transparent ink is electrically conducting transparent macromolecular material or the conductive ink that comprises the nanometer grade gold metal particles, solidifies after-vision transparent.

In the first preparation method of above-mentioned optical filter 400, the gridline of conductive layer and black light resistance layer is to utilize same mask layer to carry out etching, and the conductive grid unit of conductive layer does not need to aim at the grid of black light resistance layer, reduces task difficulty.In addition, because conductive thread is consistent with the gridline shape of black light resistance layer, and be covered in the black light resistance layer away from substrate of glass one side, even therefore the conductive thread vision is opaque, can be sheltered from by the black light resistance layer, the user can not see conductive thread in use yet, thereby improve the user, experiences.The optical filter that the present embodiment obtains, the gridline of black light resistance layer is consistent with the shape of the conductive thread of the first conductive pattern and the second conductive pattern, also exists broken string to process.

The above-mentioned electrically conducting transparent ink that utilizes is as follows as the second preparation method of the optical filter 400 of conduction bridging:

Step 1, on the surface of transparent substrates, cover the black light resistance layer.At first use beam-plasma to carry out bombardment processing on glass baseplate such as sillico aluminate glass or calcium soda-lime glass, remove the dirty of glass surface, and make surface ion, increase the cohesive force of follow-up transparent substrates and black and colorama resistance layer.Then, whole face is coated with or plates the photoresist with black dyes on the surface of transparent substrates, forms the black light resistance layer.

Step 2, on the surface of black light resistance layer, cover conductive layer.At plated surface one deck conducting film of black light resistance layer or be coated with one deck conductive ink as conductive layer.The conductive material of conductive layer can also be metal simple-substance such as argent, metal alloy, conducting polymer, Graphene, carbon nano-tube, ITO etc.

Step 3, at conductive layer surface coated polymeric layer, and by exposure-developing makes the shape of residual polymeric layer corresponding with the shape of the first conductive pattern and the second conductive pattern.After the coated polymeric layer is photoresist, utilize exposure-developing technique only to cover photoresist on the grid grid line of corresponding the first conductive pattern of needs and the second conductive pattern, the photoresist in other place (not comprising the broken string zone) is removed, residual like this photoresist is complete latticed, and is consistent with the grid shape of required black light resistance layer.

Step 4, utilize described polymeric layer to be mask layer, described conductive layer is carried out etching, obtain the conductive grid consistent with above-mentioned residual photoresist shape, should be noted that the conductive grid of this moment is complete grid, the processing of also breaking.

Step 5, utilize described polymeric layer and conductive layer to be mask layer, described black light resistance layer is carried out etching, obtain the gridline of black light resistance layer.Still utilize aforementioned under residual polymeric layer and conductive layer as mask layer, utilize etching solution to carry out etching to the black light resistance layer, just obtained the gridline of black light resistance layer, should be noted that the gridline of the black light resistance layer that the present embodiment obtains is complete grid, the processing of breaking.

Step 6, remove the residual polymeric layer of described conductive layer surface (because this polymeric layer is photoresist, when the black light resistance layer is carried out etching, this polymeric layer also can suffer etching, shape is destroyed, need to re-start and cover), again cover again the one layer of polymeric layer, and by exposure-develop, the first conductive pattern and the second conductive pattern polymeric layer of processing corresponding position that need to break is removed.Again after being coated with polymeric layer and being photoresist, utilize exposure-developing technique that the first conductive pattern and the second conductive pattern regional photoresist that need to break is removed (mode of its interrupt line is with reference to associated description in figure 7 to Figure 10 and preamble).

Step 7, utilize the described polymeric layer that again covers to be mask layer, described conductive layer is carried out etching again, obtain separate, the first conductive pattern of insulation after broken string is processed and the conductive thread of the second conductive pattern.

Step 8, the described polymeric layer that again covers is removed.

Step 9, plating or coat the R/G/B chromatic photoresist in the grid of black light resistance layer.The R/G/B chromatic photoresist is plated/coats in gradation in the grid region of correspondence, has just obtained black light resistance layer and colorama resistance layer that interval arranges.

Step 10, employing inkjet printing or screen printing technique cover the layer of transparent insulation course at the second conductive pattern and the first conductive pattern intersection.Namely at needs bridge formation place, cover the layer of transparent insulation course.

Step 11, employing inkjet printing or screen printing technique cover the layer of transparent conductive ink and put up a bridge as conduction on described transparent insulating layer, make the electrode block of second conductive pattern at described conduction bridging two ends realize being electrically connected to and with described the first conductive pattern, not being connected.The material of electrically conducting transparent ink is electrically conducting transparent macromolecular material or the conductive ink that comprises the nanometer grade gold metal particles, solidifies after-vision transparent.

In the preparation method of above-mentioned optical filter 400, the gridline of conductive layer and black light resistance layer is to utilize same mask layer to carry out etching, and the conductive grid unit of conductive layer does not need to aim at the grid of black light resistance layer, reduces task difficulty.In addition,, because conductive thread is covered in the side of black light resistance layer away from substrate of glass,, even therefore the conductive thread vision is opaque, can be sheltered from by the black light resistance layer, the user can not see conductive thread in use yet, thereby improve the user, experiences.Further, the black light resistance layer of the optical filter that the present embodiment makes is complete grid, and the processing of breaking, so can prevent that the black light resistance layer from affecting user's experience because broken string causes light leak.

The conduction bridge formation 448 of the optical filter 400 of the present embodiment can also adopt the impression mode to form, please refer to Figure 15, impression can be to obtain conduction with disposable method for stamping to build bridge 448, namely after completing the step of plating/coating the R/G/B chromatic photoresist, carries out following steps:

Steps A, on the surface of described colorama resistance layer and described the first conductive pattern and the second conductive pattern, cover again the layer of transparent insulation course.

The impression block of the conduction bridging structural correspondence of step B, use and needs impresses on described transparent insulating layer, make the protuberance of the impression block of corresponding conduction bridging two ends conducting block press to penetrate bright insulation course and with the electrode block of second conductive pattern at corresponding interval, be connected, obtain and conduct electricity the nested groove of bridging structure.Please refer to Figure 16, tie up on insulation course 450 and impress out latticed groove, the two ends of this groove directly penetrate insulation course 450, and the centre of this groove does not penetrate insulation course 450.

Step C, to filled conductive material in above-mentioned groove and solidify, the conduction that obtains being communicated with adjacent two electrode blocks is put up a bridge.Conductive material can be metal simple-substance such as Nano Silver, metal alloy, conducting polymer, Graphene, carbon nano-tube, ITO etc.Please refer to Figure 16, the two ends of conduction bridge formation 448 respectively are communicated with the electrode block of second conductive pattern 446.

In addition, conduction bridging 448 can also be that the mode that first adopts exposure imaging to obtain consent first forms the consent of conducting block, then impresses the latticed groove of formation, and then the filled conductive material forms and puts up a bridge.Under this kind situation, please refer to Figure 16, two conducting blocks 4484 that are latticed bridging wire 4482 and are positioned at two ends and with bridging wire 4482, are communicated with in the middle of conduction bridging 448 comprises, the wire 4482 of wherein putting up a bridge is embedded in insulation course 450 surfaces, two conducting blocks 4484 penetrate described insulation course 450 and are communicated to respectively an electrode block 4462, each conducting block 4484 at least with the electrode block 4462 that is connected in two conductive threads overlap joint, conduction put up a bridge 448 with the first conductive pattern 444 between separate by described insulation course.The live width of bridging wire 4482 is 0.2~5 μ m, and line-spacing 50~500 μ m, to guarantee the transparency of conduction bridging 448.Particularly, after the plating of completing steps seven/coat the R/G/B chromatic photoresist, carry out following steps:

Steps A, on the surface of described colorama resistance layer and described the first conductive pattern and the second conductive pattern, cover again one deck photoresist, and utilize mask plate to expose to described photoresist, and by developing, two conducting block corresponding positions of in follow-up conduction, putting up a bridge obtain respectively two photoresist mask layers that are connected with the electrode block of the second conductive pattern.

Step B, to the surface of described conductive layer with the photoresist mask layer, be coated with the layer of transparent insulation course, the position between described two photoresist mask layers impresses out latticed bridging wire grooves and solidifies again.

Step C, described photoresist mask layer is removed, to form the conducting block groove that is communicated with surface of insulating layer and electrode block.

Step D, to filled conductive material in described bridging wire grooves and described conducting block groove and solidify, the conduction that obtains being communicated with adjacent two electrode blocks is put up a bridge.Photoetching glue laminated mask layer is removed rear formation consent, this consent namely obtains the conducting block 4482 at two ends after filled conductive material and curing, form latticed bridging wire 4484 in the bridging wire grooves after the filled conductive material, namely present state as shown in figure 16.

Please refer to Figure 17; the application also provides a kind of touch-control display module 500, comprises the upper polaroid 510, the optical filter 520 with the touch-control effect, diaphragm 530, public electrode 540, upper alignment film 550, liquid crystal 560, lower alignment film 570, transistor electrodes 580 and the lower polaroid 590 that stack gradually.Optical filter 520 can be selected aforesaid optical filter 300 or optical filter 400, make touch-control display module 500 possess the touch-control display effect and thickness less.The conductive layer of optical filter 520 is towards a side at liquid crystal 560 places.

It may be noted that if touch-control display module 500 uses backlight to be polarized light source,, as OLED Organic Light Emitting Diode (Organic Light Emitting Diode) polarized light source, need not lower polaroid 590, only have upper polaroid 510 to get final product.In certain embodiments, when transistor electrodes 580 is the thin film transistor (TFT) of wide-angle liquid crystal structure, without public electrode 540 and diaphragm 530.

The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the scope of the claims of the present invention.Should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.

Claims (28)

1. optical filter with the touch-control effect, comprise that transparent substrates, interval are covered in black light resistance layer and the R/G/B colorama resistance layer on described transparent substrates, it is characterized in that, wherein said black light resistance layer also is covered with and has latticed conductive layer away from a side of described transparent substrates, described conductive layer comprises the first conductive pattern and the second conductive pattern, and described the first conductive pattern and the second conductive pattern space arrange the formation induction structure.
2. the optical filter with the touch-control effect according to claim 1, it is characterized in that, described black light resistance layer has lattice structure, the elementary cell of described R/G/B colorama resistance layer is positioned at described grid, described the first conductive pattern and the second conductive pattern are formed by the conductive thread on the gridline that is arranged on described black light resistance layer, and described conductive thread intersects the conductive grid unit that forms described the first conductive pattern and the second conductive pattern.
3. the optical filter with the touch-control effect according to claim 2, it is characterized in that, described the first conductive pattern and the second conductive pattern obtain by the conductive layer etching that is arranged on described black light resistance layer, the conductive material of described conductive layer is selected from metal, metal alloy, conducting polymer, at least a in Graphene, carbon nano-tube, ITO and conductive ink.
4. the optical filter with the touch-control effect according to claim 2, it is characterized in that, described the first conductive pattern arranges continuously, described the second conductive pattern is divided into a plurality of electrode blocks take described the first conductive pattern as interval, between the adjacent electrode piece by the conduction connection of putting up a bridge, described conduction put up a bridge and described the first conductive pattern between pass through insulator separation.
5. the optical filter with the touch-control effect according to claim 4, is characterized in that, described surface of insulating layer is provided with latticed groove, and described conduction is put up a bridge and formed by the conductive material that is filled in described latticed groove.
6. according to claim 4 or 5 described optical filters with the touch-control effect, it is characterized in that, two conducting blocks that described conduction is latticed bridging wire and is positioned at two ends and with the bridging wire, is communicated with in the middle of putting up a bridge and comprising, described bridging wire is embedded in described surface of insulating layer, and described two conducting blocks penetrate described insulation course and are communicated to respectively an electrode block.
7. the optical filter with the touch-control effect according to claim 6, is characterized in that, the live width of described bridging wire is 0.2~5 μ m, line-spacing 50~500 μ m.
8. the optical filter with the touch-control effect according to claim 6, is characterized in that, described conducting block overlaps with two conductive threads in each second conductive pattern that is connected at least.
9. the optical filter with the touch-control effect according to claim 4, it is characterized in that, described conduction is put up a bridge and is utilized the electrically conducting transparent ink to put up a bridge, and makes the electrode block of second conductive pattern at described conduction bridging two ends realize being electrically connected to and with described the first conductive pattern, not being connected.
10. the optical filter with the touch-control effect according to claim 2, is characterized in that, the live width of described conductive grid unit conductive thread be described black light resistance layer gridline live width 80%~120%.
11., according to the optical filter with the touch-control effect claimed in claim 2, it is characterized in that, described conductive grid unit is corresponding one by one with the elementary cell of described R/G/B colorama resistance layer.
12. according to the optical filter with the touch-control effect claimed in claim 2, it is characterized in that, described conductive layer extends upward with second party on mutually orthogonal first direction, wherein on first direction or second direction or simultaneously on described first direction and second direction, the elementary cell of a plurality of complete R/G/B colorama resistance layers is held in the projection of conductive grid unit on described black light resistance layer.
13. the optical filter with the touch-control effect according to claim 2, it is characterized in that, described conductive unit grid is done whole interrupting or the local continuous conductive thread of processing formation multirow that interrupts, multirow conductive thread compartment of terrain on the direction of row is connected simultaneously, forms the first conductive pattern and the second conductive pattern that a plurality of shape complementarities are semi-surrounding or entirely surround shape.
14. the optical filter with the touch-control effect according to claim 2, is characterized in that, described conductive grid unit is the multiple lines and multiple rows setting, wherein has the equal integral body in conductive grid unit of multiple row or part to interrupt and form independently the first conductive pattern of multiple row; The conductive grid unit that is arranged in simultaneously same delegation and is positioned at described the first conductive pattern both sides is all interrupted by integral body or part, and form a plurality of electrode blocks take described the first conductive pattern as interval, described electrode block forms described the second conductive pattern, and on the direction of described row, described the second conductive pattern is formed with multirow.
15., according to the described optical filter with the touch-control effect of claim 13 or 14, it is characterized in that, the distance of two broken string nodes of the conductive thread of conductive grid unit is 0.5~50 μ m.
16. the optical filter with the touch-control effect according to claim 1 and 2, is characterized in that, the thickness of described R/G/B colorama resistance layer is more than or equal to the integral thickness of black light resistance layer and conductive layer.
17. a touch-control display module, is characterized in that, comprises the optical filter with the touch-control effect as described in arbitrary claim in claim 1 to 16.
18. touch-control display module according to claim 17, is characterized in that, described touch-control display module comprises the upper polaroid that stacks gradually, described with alignment film, liquid crystal, lower alignment film and transistor electrodes on the optical filter of touch-control effect.
19. touch-control display module according to claim 18, is characterized in that, described conductive layer is towards a side at described liquid crystal place.
20. the preparation method with the optical filter of touch-control effect, is characterized in that, comprises the steps:
Cover the black light resistance layer on the surface of transparent substrates;
Surface in the black light resistance layer covers conductive layer;
At conductive layer surface coated polymeric layer, and by exposure-developing makes the shape of residual polymeric layer corresponding with the shape of the first conductive pattern and the second conductive pattern;
Utilize described polymeric layer to be mask layer, described conductive layer is carried out etching, obtain the conductive unit grid of the first conductive pattern and the second conductive pattern;
Utilize described polymeric layer and conductive layer to be mask layer, described black light resistance layer is carried out etching, obtain the gridline of black light resistance layer;
Remove the polymeric layer of described conductive layer surface;
Plate or coat the R/G/B chromatic photoresist in the grid of black light resistance layer.
21. the preparation method of the optical filter with the touch-control effect according to claim 20, is characterized in that, described the second conductive pattern is divided into a plurality of electrode blocks take described the first conductive pattern as interval.
22. the preparation method of the optical filter with the touch-control effect according to claim 21, is characterized in that, the preparation method of described optical filter with the touch-control effect also comprises the steps:
Adopt inkjet printing or screen printing technique to cover the layer of transparent insulation course at the second conductive pattern and the first conductive pattern intersection;
Adopt inkjet printing or screen printing technique to cover the layer of transparent conductive ink on described transparent insulating layer and put up a bridge as conduction, make the electrode block of second conductive pattern at described conduction bridging two ends realize being electrically connected to and with described the first conductive pattern, not being connected.
23. the preparation method of the optical filter with the touch-control effect according to claim 21, is characterized in that, the preparation method of described optical filter with the touch-control effect also comprises the steps:
Surface at described R/G/B colorama resistance layer and described the first conductive pattern and the second conductive pattern covers the layer of transparent insulation course again;
Use with the impression block of the conduction bridging structural correspondence that needs and impress on described transparent insulating layer, make the protuberance of the impression block of corresponding conduction bridging two ends conducting block press to penetrate bright insulation course and with the electrode block of second conductive pattern at corresponding interval, be connected, obtain and conduct electricity the nested groove of bridging structure;
To filled conductive material in above-mentioned groove and solidify, the conduction that obtains being communicated with adjacent two electrode blocks is put up a bridge.
24. the preparation method of the optical filter with the touch-control effect according to claim 21, is characterized in that, the preparation method of described optical filter with the touch-control effect also comprises the steps:
Surface at described R/G/B colorama resistance layer and described the first conductive pattern and the second conductive pattern covers one deck photoresist again, and utilize mask plate to expose to described photoresist, and by developing, two conducting block corresponding positions of in follow-up conduction, putting up a bridge obtain respectively two photoresist mask layers that are connected with the electrode block of the second conductive pattern;
Surface to described conductive layer with the photoresist mask layer is coated with the layer of transparent insulation course again, and the position between described two photoresist mask layers impresses out latticed bridging wire grooves and solidifies;
Described photoresist mask layer is removed, to form the conducting block groove that is communicated with surface of insulating layer and electrode block;
To filled conductive material in described bridging wire grooves and described conducting block groove and solidify, the conduction that obtains being communicated with adjacent two electrode blocks is put up a bridge.
25. the preparation method of according to claim 23 or 24 described optical filters with the touch-control effect is characterized in that described conductive material is selected from metal, metal alloy, conducting polymer, at least a in Graphene, carbon nano-tube, ITO and conductive ink.
26. the preparation method of the optical filter with the touch-control effect according to claim 20, it is characterized in that, described at conductive layer surface coated polymeric layer, and in the shape make residual polymeric layer by exposure-the develop step corresponding with the shape of the first conductive pattern and the second conductive pattern:
Described polymeric layer is carried out etching, form the latticed pattern of multiple lines and multiple rows;
Described grid is interrupted processing, obtain the first consistent with the first conductive pattern shape respectively pattern and consistent the second pattern with the second conductive pattern shape.
27. the preparation method of the optical filter with the touch-control effect according to claim 26, it is characterized in that, described interrupting is treated to: described grid is interrupted as integral body or interrupt part, form the continuous mesh lines of multirow and be connected multirow mesh lines compartment of terrain on the direction of row simultaneously, form the first pattern and the second pattern that shape complementarity is semi-surrounding or entirely surrounds shape; Or the grid of multiple row is all made integral body or local interrupted and form independently first pattern consistent with the first conductive pattern shape of multiple row, the grid that will be arranged in simultaneously same delegation and be positioned at described the first pattern both sides all makes integral body or processing is interrupted in part, and form a plurality of the second pattern units take described the first pattern as interval, described the second pattern unit forms second pattern consistent with described the second conductive pattern shape, and on the direction of described row, form described the second pattern of multirow.
28. the preparation method of the optical filter with the touch-control effect according to claim 20, it is characterized in that, described at conductive layer surface coated polymeric layer, and in the shape make residual polymeric layer by exposure-the develop step corresponding with the shape of the first conductive pattern and the second conductive pattern, after the coated polymeric layer is photoresist, utilize exposure-developing technique only to cover photoresist on the grid grid line of corresponding the first conductive pattern of needs and the second conductive pattern, it is complete latticed making residual photoresist, consistent with the grid shape of required black light resistance layer; Simultaneously
In the step of the described polymeric layer of removing described conductive layer surface and described plating or coat between the step of R/G/B chromatic photoresist further comprising the steps of in the grid of black light resistance layer:
Remove the residual polymeric layer of described conductive layer surface, and then again cover the one layer of polymeric layer, and by exposure-develop, the first conductive pattern and the second conductive pattern polymeric layer of processing corresponding position that need to break is removed;
Be mask layer with the described polymeric layer that again covers, described conductive layer is carried out etching again, obtain separate, the first conductive pattern of insulation after broken string is processed and the conductive thread of the second conductive pattern;
The described polymeric layer that again covers is removed.
CN2013102824302A 2013-07-05 2013-07-05 Light filter with touch effect, preparation method of light filter and touch display assembly CN103389827A (en)

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Application publication date: 20131113