CN103336620A - Touch display screen, optical filter component of touch display screen and preparation method of optical filter component - Google Patents
Touch display screen, optical filter component of touch display screen and preparation method of optical filter component Download PDFInfo
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Abstract
An optical filter component comprises a substrate, a first conducting layer, an optical shading layer, an optical filtering layer, a base material layer and a second conducting layer. The substrate comprises a first surface and a second surface which are arranged oppositely. The optical shading layer adheres to the first surface, the first conducting layer is arranged on the optical shading layer, the base material layer adheres to the second surface, the second conducting layer is inlaid in the base material layer, and the second conducting layer and the first conducting layer are made to form an induction capacitor structure. Therefore, the optical filter component can achieve the functions of touch operation and optical filtering at the same time. The optical filter component serves as the combination of two essential components in a display screen, and when the optical filter component is used in the touch display screen, the display screen is directly made to have the touch function, a touch screen does not need to be assembled on the display screen, and the reduction of the thickness of electronic products is facilitated. In addition, when the touch display screen is prepared through the optical filter component, the laminating process is reduced one time, materials are saved, and production efficiency is improved. The invention further provides the touch display screen and a preparation method of the optical filter component.
Description
Technical field
The present invention relates to touch screen technology, particularly relate to a kind of touch display screen and optical filter box thereof and this optical filter box preparation method.
Background technology
Touch-screen is the inductive arrangement that can receive input signals such as touch.Touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that the photoelectricity industry is a dark horse.
At present, having the electronic product that touches Presentation Function includes display screen and is positioned at touch-screen on the display screen.Yet, touch-screen as with display screen assembly independently, when being used for the electronic product that some realize man-machine interactions, all need to order according to the size of display screen, assembling afterwards, to form touch display screen, is Presentation Function but touch display screen can have touch control operation simultaneously again.The assembling of existing touch-screen and display screen mainly contains dual mode, and namely frame pastes and full the applying.The frame subsides are to be fitted in the edge of touch-screen and display screen, and full applying is whole the applying of upper surface with lower surface and the display screen of touch-screen.
Display screen mainly comprises polaroid, optical filter module, Liquid Crystal Module and thin film transistor (TFT) (TFT, Thin Film Transistor), when being combined into display screen by polaroid, optical filter module, Liquid Crystal Module and thin film transistor (TFT), had bigger thickness, and when continuing on the display screen applying touch-screen, to further increase its thickness, thereby run counter to the lightening development trend of electronic product.
Summary of the invention
Based on this, be necessary to provide a kind of touch display screen and optical filter box and this optical filter box preparation method who is conducive to reduce electronic product thickness.
A kind of optical filter box comprises:
Substrate comprises first surface and the second surface that is oppositely arranged with described first surface;
First conductive layer is attached to described first surface, and described first conductive layer is the conductive grid that conductive thread intersects to form mutually, and described first conductive layer comprises a plurality of first grid cells;
Light shield layer, be positioned at described first conductive layer side of described substrate dorsad, so that described first conductive layer is held between described light shield layer and the described substrate, described light shield layer is the lattice-shaped structure that gridline intersects to form mutually, described light shield layer comprises a plurality of grid cells, and the projection of conductive thread on described light shield layer that forms described first conductive layer is positioned at described gridline;
Filter layer is attached to described first surface, and described filter layer comprises the filter unit that a plurality of intervals arrange, and a plurality of described filter units lay respectively in described a plurality of grid cell;
Hypothallus is attached to described second surface; And
Second conductive layer is embedded at described hypothallus, and described second conductive layer is the conductive grid that conductive thread intersects to form mutually, and the infall of conductive thread forms grid node, and described second conductive layer comprises a plurality of second grid cells.
Among embodiment, a described hypothallus side of described light shield layer dorsad offers the second grid groove therein, and described second conductive layer is solidify to form by the conductive material that is filled in the described second grid groove.
Among embodiment, the degree of depth of the described second grid groove is not less than the thickness of described second conductive layer therein.
Therein among embodiment, form the width of conductive thread of described first conductive layer less than the width of described gridline.
Among embodiment, the thickness of described filter layer is greater than the thickness of described light shield layer therein.
Among embodiment, the width that forms the conductive thread of described first conductive layer equals the width of described gridline therein.
Among embodiment, the thickness of described filter layer is greater than the thickness sum of described light shield layer and described first conductive layer therein.
Among embodiment, the conductive thread that forms described second conductive layer is positioned at described gridline in the projection of described light shield layer therein.
Therein among embodiment, form the width of conductive thread of described second conductive layer between 0.2 to 5 micron, the distance in described second grid cell between adjacent two grid nodes is between 50 to 500 microns.
Among embodiment, hold a described filter unit in the scope of each described first grid cell at least therein.
Among embodiment, described first conductive layer forms first conductive unit of many mutually insulateds therein, and described second conductive layer forms second conductive unit of many mutually insulateds.
A kind of touch display screen comprises the film crystal pipe electrode that stacks gradually, liquid crystal module, as optical filter box and go up polaroid as described in each in the above-mentioned power preferred embodiment, wherein, describedly goes up the side that polaroid is positioned at the described second conductive layer place.
A kind of optical filter box preparation method may further comprise the steps:
One substrate is provided, and described substrate comprises first surface and the second surface that is oppositely arranged with described first surface;
Form first conductive layer and be positioned at described first conductive layer light shield layer of a side of described substrate dorsad at described first surface, described light shield layer is the lattice-shaped structure that gridline intersects to form mutually, comprises a plurality of grid cells;
Apply photoresist respectively in described a plurality of grid cells, to form the filter unit that a plurality of intervals arrange, described a plurality of filter units form filter layer;
Apply impression glue and solidify to obtain hypothallus at described second surface, and make described hypothallus form the patterned second grid groove away from a side of described substrate;
Filled conductive material and make its curing in the described second grid groove is to form second conductive layer.
Therein among embodiment, describedly form first conductive layer and be positioned at described first conductive layer light shield layer of a side of described substrate dorsad at described first surface, described light shield layer is the lattice-shaped structure that gridline intersects to form mutually, comprises that the step of a plurality of grid cells is specially:
At described first surface plating conducting film or coated with conductive ink, to form conductive film layer;
In side coating black photoresist and the precuring of described substrate dorsad of described conductive film layer, to form the black photoresist layer;
Utilize exposure-development that described black photoresist layer is etched into lattice-shaped, to obtain described light shield layer;
The conductive film layer that is exposed to described light shield layer is carried out etching, described conductive film layer is etched into identical with described light shield layer shape latticed, to obtain described first conductive layer.
Therein among embodiment, describedly form first conductive layer and be positioned at described first conductive layer light shield layer of a side of described substrate dorsad at described first surface, described light shield layer is the lattice-shaped structure that gridline intersects to form mutually, comprises that the step of a plurality of grid cells is specially:
At described first surface plating conducting film or coated with conductive ink, to form conductive film layer;
Apply photoresist at described conductive film layer, and precuring adopts exposure-developing technique to be etched into described photoresist layer latticed to form photoresist layer;
The conductive film layer that is exposed to described photoresist layer is carried out etching, obtaining described first conductive layer, and remove described photoresist layer and be attached to part on described first conductive layer;
Apply black photoresist and precuring at described first conductive layer, to form the black photoresist layer, adopt exposure-developing technique that described black photoresist layer is etched into lattice-shaped structure, to obtain described light shield layer.
Above-mentioned optical filter box and using in the touch display screen of this optical filter box, optical filter box can be realized touch control operation and filtering functions simultaneously.As the combination of indispensable two assemblies in the display screen, when optical filter box is used for touch display screen, can directly make display screen have touch controllable function, need not to assemble a touch-screen at display screen again, thereby be conducive to reduce the thickness of electronic product.In addition, when utilizing above-mentioned optical filter box to prepare touch display screen, can reduce attaching process one time, thus but economical with materials and enhancing productivity also.
Description of drawings
Fig. 1 is the structural representation of touch display screen in the preferred embodiment of the present invention;
Fig. 2 is the layer structure synoptic diagram of optical filter box in the touch display screen shown in Figure 1;
Fig. 3 is the stereographic map of optical filter box shown in Figure 2;
Fig. 4 to Fig. 6 is the partial enlarged drawing of optical filter box shown in Figure 3;
Fig. 7 is the layer structure synoptic diagram of optical filter box among another embodiment;
Fig. 8 is the layer structure synoptic diagram of optical filter box among another embodiment;
Fig. 9 is the schematic flow sheet of optical filter box preparation method among the embodiment;
Figure 10 is the schematic flow sheet that forms light shield layer and first conductive layer among the embodiment;
Figure 11 is the schematic flow sheet that forms light shield layer and first conductive layer among another embodiment;
Figure 12 is the structural representation of first conductive layer among the embodiment;
Figure 13 is the structural representation of first conductive layer among another embodiment.
Embodiment
For the ease of understanding the present invention, with reference to relevant drawings the present invention is described more fully below.Provided preferred embodiment of the present invention in the accompanying drawing.But the present invention can realize with many different forms, be not limited to embodiment described herein.On the contrary, provide the purpose of these embodiment be make the understanding of disclosure of the present invention comprehensively thorough more.
Need to prove that when element is called as " being fixed in " another element, can directly can there be element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be to be directly connected to another element or may to have element placed in the middle simultaneously.
Unless otherwise defined, the employed all technology of this paper are identical with the implication that belongs to those skilled in the art's common sense of the present invention with scientific terminology.Employed term is not intended to be restriction the present invention just in order to describe the purpose of specific embodiment in instructions of the present invention herein.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
See also Fig. 1, the touch display screen 10 in the preferred embodiment of the present invention comprises following polaroid 101, film crystal pipe electrode 102, liquid crystal module 103, public electrode 104, the optical filter box 100 that stacks gradually and goes up polaroid 105.
Touch display screen can be the LCDs of straight-down negative or side entering type light source.Thin film transistor (TFT) (TFT) electrode 102 comprises glass-base 1021 and the show electrode 1023 that is arranged on the glass-base 1021.Liquid crystal module 103 comprises liquid crystal bulk layer 1032 and is held on the alignment film 1034 of liquid crystal bulk layer 1032 both sides.
See also Fig. 2 and Fig. 3, in the present embodiment, optical filter box 100 comprises substrate 110, first conductive layer 120, light shield layer 130, filter layer 140, hypothallus 150 and second conductive layer 160.Wherein:
The second surface (figure is mark not) that substrate 110 comprises first surface (figure is mark not) and is oppositely arranged with first surface.110 carryings of substrate and protective effect, and substrate 110 light-permeables.Concrete, the material of substrate 110 can be sillico aluminate glass or calcium soda-lime glass.
See also Fig. 4, first conductive layer 120 is attached to first surface.The conductive grid that first conductive layer 120 intersects to form mutually for conductive thread, first conductive layer 120 comprise first grid cell (figure is mark not).Specifically in the present embodiment, first conductive layer 120 forms first conductive unit (figure is mark not) of many mutually insulateds.
In the present embodiment, first conductive layer 120 is formed by the conductive material that is attached to first surface.Concrete, can to form conductive film layer, carry out etching to conductive film layer again by at the surface of light shield layer 130 plating conducting film or coated with conductive material, obtain patterned first conductive layer 120.Wherein, the material that is used for plated film can be gold, silver, copper etc. and has the metal of less resistive rate or ITO etc., and the conductive material that is used for applying can be conductive ink etc.
In the present embodiment, the conductive thread that forms first conductive layer 120 can be straight line, curve or broken line.
Further, when the conductive thread that forms first conductive layer 120 was straight line, the center line of conductive thread alignd with the center line of gridline 131, thereby can make the width of conductive thread bigger as much as possible, to increase the reliability of first conductive layer 120.The conductive thread that forms first conductive layer 120 can also be for being curve or broken line.
In the present embodiment, form the width of conductive thread of first conductive layer 120 less than the width of gridline 131.For reaching the visually-clear effect, the conductive thread that forms first conductive layer 120 must be blocked by gridline 131.Therefore, expose the scope of blocking of gridline 131 for preventing conductive thread, form the width of conductive thread of first conductive layer 120 less than the width of gridline 131.Because the width of gridline 131 is greater than the width of the conductive thread of first conductive layer 120, so first conductive layer 120 is coated by light shield layer 130, the integrally-built thickness that both form equals the thickness of light shield layer.
Further, in the present embodiment, the thickness of filter layer 140 is greater than the thickness of light shield layer 130.Therefore, can prevent from being blocked by light shield layer 130 or first conductive layer 120 from the light of filter unit 141 side outgoing, thereby increase light emission rate.
See also Fig. 7, in another embodiment, the width that forms the conductive thread of first conductive layer 120 equals the width of gridline 131.Therefore, when forming first conductive layer 120 and light shield layer 130, can form positive conductive film layer and black photoresist layer at first surface successively earlier, successively black photoresist layer and conductive film layer be carried out etching again, just can obtain light shield layer 130 and first conductive layer 120 of preset shape.In the process that is shaped, need not to introduce new mask plate, thereby can simplify preparation flow.
Further, the thickness of filter layer 140 is greater than the thickness sum of light shield layer 130 and first conductive layer 120.Therefore, can make filter layer 140 protrude from the surface of light shield layer 130 and first conductive layer 120, thereby prevent from being blocked by light shield layer 130 and first conductive layer 120 from the light of filter unit 141 side outgoing, and then increase light emission rate.
Please consult Fig. 1 to Fig. 4 again, filter layer 140 is attached to first surface.Filter layer 140 comprises the filter unit 141 that a plurality of intervals arrange.A plurality of filter units 141 lay respectively in a plurality of grid cells, thus by gridline 131 with a plurality of 141 single separating of filter unit.Filter unit 141 can be respectively by the RGB(red green blue tricolor that is coated on first surface) chromatic photoresist forms, and has filtering functions.The light that sends from backlight filters through filter unit 141, can obtain the light of corresponding color respectively.The throughput of light in different colours filter unit 141 of control backlight can be mixed obtaining the shades of colour mixed light, and then be realized multicoloured demonstration.In the present embodiment, grid cell is square, thereby the shape of filter unit 141 also is defined as square, and then makes that the colour developing of a plurality of filter units 141 is more even.Be appreciated that grid cell also can be triangle, circle or other are irregularly shaped.
In the present embodiment, hold a filter unit 141 in the scope of each first grid cell at least.Concrete, first grid cell can with filter unit 141 one to one or one-to-many.As shown in Figure 4, only comprise a filter unit 141 in the scope of first grid cell; As shown in Figure 5, comprise same a plurality of filter units 141 on axially in the scope of first grid cell; As shown in Figure 6, comprise a plurality of orthogonal a plurality of filter units 141 on axially in the scope of first grid cell.Therefore, at most only a conductive thread need be set on every gridline, thereby the density of conductive grid is reduced, be convenient to processing.
Second conductive layer 160 is embedded at hypothallus 150.Specifically in the present embodiment, second conductive layer 160 public electrode 104 settings dorsad.Wherein, second conductive layer 160 and first conductive layer 120 lay respectively at the both sides of substrate 110, both be oppositely arranged and between at interval hypothallus 150 and substrate 110.Therefore, form the inductance capacitance structure between second conductive layer 160 and first conductive layer 120, thereby make optical filter box 110 can realize touch-control and filtering functions simultaneously.The conductive grid that second conductive layer 160 intersects to form mutually for conductive thread, second conductive layer 160 comprise a plurality of second grid cells (figure is mark not).Specifically in the present embodiment, second conductive layer 160 forms second conductive unit (figure is mark not) of many mutually insulateds.
Wherein, the conductive grid of second conductive layer 160 can be regular polygon, also can be random grid.When the conductive grid of second conductive layer 160 is random grid, can effectively avoid interfering, thereby avoid forming Moire fringe at touch display screen 10, promote display effect.
In the present embodiment, hypothallus 150 dorsad a side of substrate 110 offer the second grid groove, 151, the second conductive layers 160 and solidify to form by the conductive material that is filled in the second grid groove 151.Concrete, conductive material can be metal (as Nano Silver), carbon nano-tube, Graphene, organic conductive macromolecule and ITO.Therefore, when forming second conductive layer 160, can pass through the impressing mould one-shot forming, the pattern that obtains presetting, and need not be by graphical etching, thereby simplify flow process and save cost.
Further, the degree of depth of the second grid groove 151 is more than or equal to the thickness of second conductive layer 160.Therefore, second conductive layer 160 can be coated in the second grid groove 151 fully, thereby can form effectively protection to second conductive layer 160, prevents scratch second conductive layer 160 in follow-up applying process, and then influences the quality of product.
In the present embodiment, the conductive thread that forms second conductive layer 160 is positioned at gridline 131 in the projection of light shield layer 130.Further, the center line that forms the conductive thread of second conductive layer 160 aligns with the center line of gridline 131.Therefore, light shield layer 130 can effectively block the conductive thread of second conductive layer 160, thereby avoids the user can see conductive thread and experience lf being influenced in use.In addition, because conductive thread is blocked, thereby not high for the width requirement of conductive thread, the width that namely is not more than gridline 131 gets final product.Therefore, can make (need not to do very thin) easy to make, and wideer conductive thread easy fracture not, and then can promote the reliability of second conductive layer 160.
See also Fig. 8, in another embodiment, comprise a conductive thread that forms second conductive layer 160 at least, its projection at light shield layer 130 is positioned at grid cell.Because the projection of conductive thread is positioned at grid cell, blocks so make gridline 131 not form effectively the conductive thread that forms second conductive layer 160.And in touch display screen 10, must make the user can't observe conductive thread again.In order to reach visually-clear, further, form the width of conductive thread of second conductive layer 160 between 0.2 to 5 micron, the infall of conductive thread forms grid node in second grid cell, and the distance between two adjacent grid nodes is between 50 to 500 microns.
In the touch display screen 10 of optical filter box 100 and use optical filter box 100, optical filter box 100 can be realized touch control operation and filtering functions simultaneously.As the combination of indispensable two assemblies in the display screen, when optical filter box 100 is used for touch display screen 10, can directly make display screen have touch controllable function, need not to assemble a touch-screen at display screen again, thereby be conducive to reduce the thickness of electronic product.In addition, when utilizing optical filter box 100 preparation touch display screens, can reduce attaching process one time, thus but economical with materials and enhancing productivity also.
In addition, the present invention also provides a kind of optical filter box preparation method.
See also Fig. 9, Figure 12 and Figure 13, in one embodiment, the optical filter box preparation method comprises step S110～S150:
Step S110 provides a substrate, and substrate comprises first surface and the second surface that is oppositely arranged with first surface.
Substrate plays carrying and protective effect, and light-permeable.The material of substrate and the effect as mentioned above, so do not repeat them here.Before carrying out subsequent step, also can carry out pre-service to substrate, the surface of substrate is cleaned, and made the first surface ionization, thus the adhesive ability of enhancing first surface.
Step S120 forms first conductive layer and is positioned at first conductive layer light shield layer of a side of substrate dorsad at first surface, and light shield layer is the lattice-shaped structure that gridline 131 intersects to form mutually, comprises a plurality of grid cells.
Concrete, light shield layer can be solidify to form at first surface by the non-transparent material such as photoresist, printing ink and shading resin of band black dyes.Light shield layer is intersected to form mutually by many gridlines 131, comprising a plurality of grid cells.The zone that first surface is corresponding with grid cell is not covered by non-transparent material, so light-permeable.
Step S130 applies photoresist respectively in a plurality of grid cells, to form the filter unit that a plurality of intervals arrange, a plurality of filter units form filter layer.
The zone that the corresponding first surface of grid cell is not covered by non-transparent material applies photoresist to this zone, just can obtain a plurality of filter units after it is solidified.Photoresist is rgb light resistance material, according to the three primary colors principle, after the light mixing through different filter units, can obtain the light of other multiple colors.Because filter unit is positioned at grid cell, so gridline 131 separates a plurality of filter units separately.
Step S140 applies impression glue and solidifies to obtain hypothallus at second surface, and makes hypothallus form the patterned second grid groove away from a side of substrate.
Concrete, will impress glue earlier and be coated on second surface, again the impression glue laminated is printed to form the second grid groove of substrate dorsad, treat its curing after, just can obtain hypothallus.Impression glue is transparence, does not influence whole transmitance.In the present embodiment, the material of impression glue is solvent-free ultra-violet curing acrylic resin, and its thickness is 2～10 microns.It is pointed out that in other embodiments impression glue material can also be visible-light curing resin, heat reactive resin etc.
Step S150, filled conductive material and make its curing in the second grid groove is to form second conductive layer.
Concrete, conductive material can be metal (as Nano Silver), carbon nano-tube, Graphene, organic conductive macromolecule and ITO.Therefore, when forming second conductive layer, can pass through the impressing mould one-shot forming, the pattern that obtains presetting, and need not be by graphical etching, thereby the simplification flow process.Special when using ITO as conductive material, owing to need not etching, thus reduced waste of material, and then save cost.In addition, adopt the second grid groove to form second conductive layer, make conductive material be not limited to traditional ITO, thereby increased the selection face of conductive material.
See also Figure 10, in one embodiment, above-mentioned steps 120 is specially:
Step S121 is at first surface plating conducting film or coated with conductive ink, to form conductive film layer.
Step S123 is in conductive film layer side coating black photoresist and the precuring of substrate dorsad, to form the black photoresist layer;
Step S125 utilizes exposure-development that the black photoresist layer is etched into lattice-shaped.
Concrete, lattice-shaped is the shape of light shield layer.Because photoresist is photosensitive material, just the black photoresist layer can be etched into lattice-shaped by exposure-developing technique, thereby obtain light shield layer.
Step S127 carries out etching to the conductive film layer that is exposed to light shield layer, conductive film layer is etched into identical with the light shield layer shape latticed, to obtain first conductive layer.
Because the general conductive material etching solution that adopts carries out etching to conductive film layer, so can not produce reaction with photoresist layer.Therefore, can utilize the gridline 131 of light shield layer as mask plate, conductive film layer is carried out etching, conductive film layer is etched into latticed, thereby obtain first conductive layer.
In the present embodiment, because conductive film layer is etched with when forming first conductive layer, adopt light shield layer as mask plate, can not be less than the width of the gridline 131 of light shield layer so form that the width of the conductive thread of first conductive layer can only equal.
In the present embodiment, also can be when forming first conductive layer, to the conductive thread that forms first conductive layer processing of breaking, to obtain first conductive unit 121 of many mutually insulateds.Concrete, when utilizing exposure-development that the black photoresist layer is carried out etching, will also remove with the black photoresist of 20 corresponding regions, the first conductive layer broken string place on the black photoresist layer.Therefore, when the gridline 131 with light shield layer is mask plate when conductive film layer is carried out etching, first conductive layer can be divided into first conductive unit 121 of a plurality of mutually insulateds (each other predeterminable range) at interval.
Owing to have identical broken string place 20 on the light shield layer in the present embodiment and first conductive layer.Therefore, light shield layer also is divided into the lattice-shaped band of many spaces.In order not influence visual effect, need make broken string place 20 visions of light shield layer invisible.As shown in figure 12, in the present embodiment, the broken string of first conductive layer is 0.5 to 50 micron breach for a width of offering at conductive thread.Therefore, the spacing between the breakpoint of the gridline 131 of light shield layer is less, is in outside the visual range, thereby can not influences visual effect.
See also Figure 11, in another embodiment, above-mentioned steps 120 is specially:
Step S221 is at first surface plating conducting film or coated with conductive ink, to form conductive film layer.
Step S223 applies photoresist at conductive film layer, and precuring adopts exposure-developing technique photoresist layer to be etched into latticed to form photoresist layer.
Concrete, photoresist layer is etched into identical latticed of conductive grid with first conductive layer.Because exposure-develop and can accurately control, thus earlier photoresist layer is formed latticed, again with latticed photoresist layer as mask plate, and then conductive film layer be etched with obtain first conductive layer.
Step S225 carries out etching to the conductive film layer that is exposed to photoresist layer, obtaining first conductive layer, and removes photoresist layer and is attached to part on first conductive layer.
The same, generally adopt the conductive material etching solution to carry out etching, so photoresist layer can not be etched.Owing to patterned photoresist layer is arranged in advance as mask, thereby can fast conductive film layer be etched into latticed first conductive layer.After obtaining first conductive layer, carry out exposure imaging again, just the photoresist of remnants can be removed.
In the present embodiment, also first conductive layer can be divided into first conductive unit 121 of many mutually insulateds.Concrete, when photoresist layer is carried out etching, will also remove with the photoresist of 20 corresponding regions, the first conductive layer broken string place on the photoresist layer.Therefore, when patterned photoresist layer carries out etching as mask plate to conductive film layer, first conductive layer can be divided into first conductive unit 121 of a plurality of mutually insulateds (interval predeterminable range each other).
Step S227 applies black photoresist and precuring at first conductive layer, to form the black photoresist layer, adopts exposure-developing technique that the black photoresist layer is etched into lattice-shaped structure, to obtain light shield layer.
In the present embodiment, the width that forms the conductive thread of first conductive layer depends on the mesh width of photoresist layer.Therefore, by the precision of control exposure imaging, can make the conductive thread that forms first conductive layer equal gridline 131 width, also can make the conductive thread that forms first conductive layer less than gridline 131 width.
In addition because light shield layer is formed at after first conductive layer, the etching of first conductive layer not with the gridline 131 of light shield layer as mask plate.Therefore, the gridline 131 of light shield layer and the broken string place of first conductive layer 20 corresponding zones can keep, thereby make light shield layer form complete lattice-shaped structure.As shown in figure 13, in the present embodiment, the broken string of first conductive layer can be the disappearance of permutation or full line conductive thread, thereby makes between two first adjacent conductive units 121 greatlyyer at interval, and insulation effect is better.
By above-mentioned color filter preparation method, can obtain a kind of optical filter box, this optical filter box can be realized touch control operation and filtering functions simultaneously.As the combination of indispensable two assemblies in the display screen, when this optical filter box is used for touch display screen, can directly make display screen have touch controllable function, need not to assemble a touch-screen at display screen again, thereby be conducive to reduce the thickness of electronic product.In addition, when utilizing optical filter box to prepare touch display screen, can reduce attaching process one time, thus but economical with materials and enhancing productivity also.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (15)
1. an optical filter box is characterized in that, comprising:
Substrate comprises first surface and the second surface that is oppositely arranged with described first surface;
First conductive layer is attached to described first surface, and described first conductive layer is the conductive grid that conductive thread intersects to form mutually, and described first conductive layer comprises a plurality of first grid cells;
Light shield layer, be positioned at described first conductive layer side of described substrate dorsad, so that described first conductive layer is held between described light shield layer and the described substrate, described light shield layer is the lattice-shaped structure that gridline intersects to form mutually, described light shield layer comprises a plurality of grid cells, and the projection of conductive thread on described light shield layer that forms described first conductive layer is positioned at described gridline;
Filter layer is attached to described first surface, and described filter layer comprises the filter unit that a plurality of intervals arrange, and a plurality of described filter units lay respectively in described a plurality of grid cell;
Hypothallus is attached to described second surface; And
Second conductive layer is embedded at described hypothallus, and described second conductive layer is the conductive grid that conductive thread intersects to form mutually, and the infall of conductive thread forms grid node, and described second conductive layer comprises a plurality of second grid cells.
2. optical filter box according to claim 1 is characterized in that, a described hypothallus side of described light shield layer dorsad offers the second grid groove, and described second conductive layer is solidify to form by the conductive material that is filled in the described second grid groove.
3. optical filter box according to claim 2 is characterized in that, the degree of depth of the described second grid groove is not less than the thickness of described second conductive layer.
4. optical filter box according to claim 1 is characterized in that, forms the width of conductive thread of described first conductive layer less than the width of described gridline.
5. optical filter box according to claim 4 is characterized in that, the thickness of described filter layer is greater than the thickness of described light shield layer.
6. optical filter box according to claim 1 is characterized in that, the width that forms the conductive thread of described first conductive layer equals the width of described gridline.
7. optical filter box according to claim 6 is characterized in that, the thickness of described filter layer is greater than the thickness sum of described light shield layer and described first conductive layer.
8. optical filter box according to claim 1 is characterized in that, the conductive thread that forms described second conductive layer is positioned at described gridline in the projection of described light shield layer.
9. according to claim 1 or 8 described optical filter boxes, it is characterized in that, form the width of conductive thread of described second conductive layer between 0.2 to 5 micron, the distance in described second grid cell between adjacent two grid nodes is between 50 to 500 microns.
10. optical filter box according to claim 1 is characterized in that, holds a described filter unit in the scope of each described first grid cell at least.
11. optical filter box according to claim 1 is characterized in that, described first conductive layer forms first conductive unit of many mutually insulateds, and described second conductive layer forms second conductive unit of many mutually insulateds.
12. touch display screen, it is characterized in that, comprise the film crystal pipe electrode that stacks gradually, liquid crystal module, as above-mentioned claim 1～11 optical filter box and go up polaroid as described in each, wherein, describedly go up the side that polaroid is positioned at the described second conductive layer place.
13. an optical filter box preparation method is characterized in that, may further comprise the steps:
One substrate is provided, and described substrate comprises first surface and the second surface that is oppositely arranged with described first surface;
Form first conductive layer and be positioned at described first conductive layer light shield layer of a side of described substrate dorsad at described first surface, described light shield layer is the lattice-shaped structure that gridline intersects to form mutually, comprises a plurality of grid cells;
Apply photoresist respectively in described a plurality of grid cells, to form the filter unit that a plurality of intervals arrange, described a plurality of filter units form filter layer;
Apply impression glue and solidify to obtain hypothallus at described second surface, and make described hypothallus form the patterned second grid groove away from a side of described substrate;
Filled conductive material and make its curing in the described second grid groove is to form second conductive layer.
14. optical filter box preparation method according to claim 13, it is characterized in that, describedly form first conductive layer and be positioned at described first conductive layer light shield layer of a side of described substrate dorsad at described first surface, described light shield layer is the lattice-shaped structure that gridline intersects to form mutually, comprises that the step of a plurality of grid cells is specially:
At described first surface plating conducting film or coated with conductive ink, to form conductive film layer;
In side coating black photoresist and the precuring of described substrate dorsad of described conductive film layer, to form the black photoresist layer;
Utilize exposure-development that described black photoresist layer is etched into lattice-shaped, to obtain described light shield layer;
The conductive film layer that is exposed to described light shield layer is carried out etching, described conductive film layer is etched into identical with described light shield layer shape latticed, to obtain described first conductive layer.
15. optical filter box preparation method according to claim 13, it is characterized in that, describedly form first conductive layer and be positioned at described first conductive layer light shield layer of a side of described substrate dorsad at described first surface, described light shield layer is the lattice-shaped structure that gridline intersects to form mutually, comprises that the step of a plurality of grid cells is specially:
At described first surface plating conducting film or coated with conductive ink, to form conductive film layer;
Apply photoresist at described conductive film layer, and precuring adopts exposure-developing technique to be etched into described photoresist layer latticed to form photoresist layer;
The conductive film layer that is exposed to described photoresist layer is carried out etching, obtaining described first conductive layer, and remove described photoresist layer and be attached to part on described first conductive layer;
Apply black photoresist and precuring at described first conductive layer, to form the black photoresist layer, adopt exposure-developing technique that described black photoresist layer is etched into lattice-shaped structure, to obtain described light shield layer.
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