Summary of the invention
Based on this, be necessary that providing a kind of is conducive to reducing the optical filter box of electronic product thickness and production cost and uses the touch display screen of this optical filter box.
A kind of optical filter box, comprising:
Glass baseplate, comprises the first surface and second surface that are oppositely arranged;
First impression glue-line, is arranged on the first surface, and described first impression glue-line offers the first groove away from the side of described first surface;
Shading matrix layer, be embedded at the first impression glue-line near the side of described first surface, comprise cross one another ruling, described ruling intersects to form multiple grid cell;
First conductive layer, comprises the first conductive pattern, and described first conductive pattern comprises continuous print first conductive grid, and described first conductive grid is intersected to form by the first conductive thread, and described first conductive thread is housed in described first groove;
Color light resistance layer, is arranged on the first surface of impression glue-line away from described glass baseplate, comprises multiple chromatic photoresist unit, and the projection of chromatic photoresist unit described in each on described shading matrix layer is arranged in a described grid cell;
Second impression glue-line, is arranged on described second surface, and described second impression glue-line offers the second groove; And
Second conductive layer, comprises the second conductive pattern, and described second conductive pattern comprises continuous print second conductive grid, and described second conductive grid is intersected to form by the second conductive thread, and described second conductive thread is housed in described second groove;
Wherein, described first conductive pattern and the spaced formation induction structure of described second conductive pattern.
Wherein in an embodiment, the width of described first conductive thread and described second conductive thread is 0.2 micron ~ 5 microns, and the distance of two adjacent grid nodes of described first conductive thread formation is 50 microns ~ 500 microns, the distance of two adjacent grid nodes that described second conductive thread is formed is 50 microns ~ 500 microns.
Wherein in an embodiment, the live width of described first conductive thread and described both second conductive threads wherein one is 0.2 micron ~ 5 microns, and the distance of two the adjacent grid nodes formed in described wherein one is 50 microns ~ 500 microns, another one falls in described ruling in the projection of described shading matrix layer.
Wherein in an embodiment, described first conductive thread and described second conductive thread all fall in described ruling in the projection of described shading matrix layer.
Wherein in an embodiment, the width of described first conductive thread and described second conductive thread is all less than the width of described ruling.
Wherein in an embodiment, described first conductive layer obtains multiple the first spaced conductive pattern by whole complete conductive grid is carried out break line treatment, and described second conductive layer obtains multiple the second spaced conductive pattern by whole complete conductive grid is carried out break line treatment.
Wherein in an embodiment, the interval width of two adjacent described first conductive patterns in described first conductive layer is 0.5 micron ~ 50 microns, and the interval width of two adjacent described second conductive patterns in described second conductive layer is 0.5 micron ~ 50 microns.
Wherein in an embodiment, described first conductive grid comprises multiple first grid cell, the projection of the first grid cell in described color light resistance layer described in each accommodates chromatic photoresist unit described at least one, described second conductive grid comprises multiple second grid cell, and the projection of the second grid cell in described color light resistance layer described in each accommodates chromatic photoresist unit described at least one.
Wherein in an embodiment, the degree of depth of described first groove is less than the thickness of described first impression glue-line, the thickness of described first conductive pattern is less than or equal to the degree of depth of described first groove, the degree of depth of described second groove is less than the thickness of described second impression glue-line, and the thickness of described second conductive pattern is not more than the degree of depth of described second groove.
A kind of touch display screen, comprise the film crystal pipe electrode, Liquid Crystal Module, optical filter box and the polaroid that stack gradually, described optical filter box is the optical filter box as above described in any one.
Above-mentioned optical filter box and use the touch display screen of this optical filter box, optical filter box can realize touch control operation and filtering functions simultaneously, as the combination of two assemblies indispensable in display screen, for in display screen time, can display screen be directly made to have touch controllable function, without the need to assembling a touch-screen on a display screen again, being not only conducive to the thickness reducing electronic product, also greatly having saved material and assembly cost simultaneously.
Embodiment
For enabling above-mentioned purpose of the present invention, feature and advantage become apparent more, are described in detail the specific embodiment of the present invention below in conjunction with accompanying drawing.Set forth a lot of detail in the following description so that fully understand the present invention.But the present invention can be much different from alternate manner described here to implement, those skilled in the art can when without prejudice to doing similar improvement when intension of the present invention, therefore the present invention is by the restriction of following public concrete enforcement.
It should be noted that, when element is called as " being fixed on " another element, directly can there is element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be directly connected to another element or may there is centering elements simultaneously.
Unless otherwise defined, all technology used herein and scientific terminology are identical with belonging to the implication that those skilled in the art of the present invention understand usually.The object of term used in the description of the invention herein just in order to describe specific embodiment, is not intended to be restriction the present invention.Term as used herein " and/or " comprise arbitrary and all combinations of one or more relevant Listed Items.
The present invention proposes a kind of optical filter box and uses the touch display screen of this optical filter box.This optical filter box can realize touch operation and optical filter function, thus makes touch display screen have touch Presentation Function.
Refer to Fig. 1, the touch display screen 100 of an embodiment, comprise the lower polaroid 10, TFT electrode 20, Liquid Crystal Module 30, public electrode 40, diaphragm 50, optical filter box 200 and the polaroid 60 that stack gradually.
Structure and the function of the lower polaroid 10 of the present embodiment, TFT electrode 20, Liquid Crystal Module 30, public electrode 40, diaphragm 50 and upper polaroid 60 can be identical with existing product, do not repeat them here.
Be appreciated that for what use backlight to be polarized light source, as OLED polarized light source, then without the need to lower polaroid 10, only need polaroid 60.Diaphragm 50 also can omit.
Optical filter box 200 has tangible operation and filtering functions simultaneously, make the touch display screen 100 including optical filter box 200 have touch Presentation Function.Touch display screen 100 can be the LCDs of straight-down negative or side down light source.
Following emphasis describes optical filter box 200.
Refer to Fig. 2, optical filter box 200 comprises glass baseplate 21, shading matrix layer (BlackMatrix, BM) 22, first impresses glue-line 23, first conductive layer 24, color light resistance layer 25, second impresses glue-line 26 and the second conductive layer 27.First conductive layer 24 and the spaced formation induction structure of the second conductive layer 27.Each chromatic photoresist unit projection on shading matrix layer 22 of color light resistance layer 25 is arranged in a grid cell.
Glass baseplate 21 comprises the first surface 212 and second surface 214 that are oppositely arranged.Glass baseplate 21 is made up of the material of transparent insulation, such as glass, is preferably sillico aluminate glass or calcium soda-lime glass.
Shading matrix layer 22 is arranged on the first surface 212 of glass baseplate 21.Shading matrix layer 22 is in lattice-shaped, and be made up of cross one another ruling, ruling intersects to form multiple grid cell.The material of shading matrix layer 22 is photoresist with black dyes or crome metal, and it can adopt the processing procedures such as exposure, development to be formed.
First impression glue-line 23 is arranged on the first surface 212 of glass baseplate 21, and is covered by the shading matrix layer 22 being arranged on first surface 212.First impression glue-line 23 is transparence, and thickness is 2 microns ~ 10 microns, and object is to not affect overall transmittance.The material of the first impression glue-line 23 can be solvent-free ultra-violet curing acryl resin, On Visible Light Cured Resin or heat reactive resin.The first groove 232 is offered, for accommodating the first conductive layer 24 away from the side of first surface 212 at the first impression glue-line 23.The shape of the first groove 232 can be preset as required, adopts mould compacting to be formed.The degree of depth of the first groove 232 is less than the thickness of the first impression glue-line 23.
First conductive layer 24 is arranged on the side of the first impression glue-line 23 away from the first surface 212 of glass baseplate 21.In the present embodiment, the first conductive layer 24 is housed in the first groove 232.First conductive layer 24 can by post-cured obtained to filled conductive in the first groove 232.The conductive material of filling can be metal, carbon nano-tube, Graphene, organic conductive macromolecule and ITO.The thickness of the first conductive layer 24 is less than or equal to the degree of depth of the first groove 232, and the first conductive layer 24 can be avoided like this to be scraped off in successive process.In the present embodiment, the thickness of the first conductive layer 24 equals the degree of depth of the first groove 232.
First conductive layer 24 comprises multiple the first spaced conductive pattern 242, first conductive pattern 242 and comprises some first conductive grids, and the first conductive grid is intersected to form by the first conductive thread a, and the first adjacent conductive thread a intersects to form grid node.Refer to Fig. 3, the basic grid that the first conductive thread a is formed can be regular polygon, as square, rhombus, regular hexagon or random grid shape.First conductive thread a can straight line, curve or broken line.When for curve or broken line, can avoid producing serious Moire fringe phenomenon, improve Consumer's Experience sense further.
In one embodiment, the live width of the first conductive thread a is 0.2 micron ~ 5 microns, first conductive thread a intersects to form grid node mutually, distance between two adjacent grid nodes is 50 microns ~ 500 microns, under the condition meeting above-mentioned live width and spacing, can realize the transparent effect of the first conductive thread a, namely naked eyes are invisible.Therefore, the first projection of conductive thread a on shading matrix layer 22 is aimed at shading matrix layer 22 or misalignment all can.Refer to Fig. 2, in the present embodiment, the first conductive thread a and shading matrix layer 22 are misalignment, can reduce manufacture difficulty like this.Refer to Fig. 4, as preferred scheme, the first projection of conductive thread a on shading matrix layer 22 is aimed at the ruling of shading matrix layer 22, can reduce the first conductive thread a like this and be exposed to risk outside ruling.
In another embodiment, the first conductive thread a is in the ruling that the projection of shading matrix layer 22 falls into shading matrix layer 22.Please continue to refer to Fig. 4, the first conductive thread a width is less than the width of ruling, is exposed to risk outside ruling to reduce the first conductive thread a.Refer to Fig. 5, the width of the first conductive thread a is equal with the width of ruling.It is comparatively large that the width of the first conductive thread a can do, to reduce the manufacture difficulty of the first conductive thread a.Ensure that the first conductive thread a can not expose shading matrix layer 22 to chromatic photoresist region and affect light-out effect and the product appearance effect of chromatic photoresist simultaneously.
Refer to Fig. 6, color light resistance layer 25 is arranged on the first impression glue-line 23 away from first surface 212.Color light resistance layer 25 comprises multiple chromatic photoresist unit 252.Chromatic photoresist unit 252, in the projection of shading matrix layer 22 and the spaced setting of ruling, avoids the light through chromatic photoresist unit 252 can not be interlaced, affects visual effect.In the present embodiment, among the grid cell that the projective distribution of each chromatic photoresist unit 252 on shading matrix layer 22 is formed at the ruling of shading matrix layer 22.The material of color light resistance layer 25 can be the photoresist with coloured dye, the color such as such as red (red, R), green (green, G), blue (blue, B).In the present embodiment, the chromatic photoresist of color light resistance layer 25 is R/G/B chromatic photoresist.Color light resistance layer 25 can adopt the processing procedures such as exposure, development to be formed.
Second impression glue-line 26 is arranged on the second surface 214 of glass baseplate 21.Second impression glue-line 26 is transparence, and thickness is 2 microns ~ 10 microns, and object is to not affect overall transmittance.The material of the second impression glue-line 26 can be solvent-free ultra-violet curing acryl resin, On Visible Light Cured Resin or heat reactive resin.Second impression glue-line 26 offers the second groove 262, for accommodating the second conductive layer 27.The shape of the second groove 262 can be preset as required, adopts mould compacting to be formed.The degree of depth of the second groove 262 is less than the thickness of the second impression glue-line 26.
In the present embodiment, the second conductive layer 27 comprises multiple the second spaced conductive pattern 272.Second conductive pattern 272 can by obtained after filled conductive material cured in the second groove 262.The thickness of the second conductive pattern 272 is less than or equal to the degree of depth of the second groove 262.The conductive material of filling can be metal, and carbon nano-tube, Graphene, organic conductive macromolecule and ITO, be preferably metal, as nanometer silver paste.When adopting impression mode, the degree of depth of the second groove 262 is less than the thickness of the second impression glue-line 26, and in the second groove 262, the thickness of the conductive material of collecting is less than or equal to the degree of depth of the second groove 262.The second conductive layer 27 can be avoided to be scraped off in successive process.In the present embodiment, the thickness of the second conductive layer 27 equals the degree of depth of the second groove 262.
Please again consult Fig. 3, the second conductive pattern 272 comprises continuous print second conductive grid, and the second conductive grid is intersected to form by the second conductive thread b.The basic grid that second conductive thread b is formed can be regular polygon, as square, rhombus, regular hexagon or random grid.Second conductive thread b can straight line, curve or broken line.When for curve or broken line, can avoid producing serious Moire fringe phenomenon, improve Consumer's Experience sense further.
In the present embodiment, the second projection of conductive thread b on shading matrix layer 22 falls in the ruling of shading matrix layer 22.When being applied to product when optical filter box 200, the second conductive layer 27 that generalized case is embedded at the second impression glue-line 26 is more easily seen by user's naked eyes and affects Consumer's Experience sense.So the second conductive thread b is fallen within gridline in the projection of shading matrix layer 22 and does not exceed gridline, do not affect light transmission, be conducive to improving Consumer's Experience sense.
In one embodiment, refer to Fig. 4, the second conductive thread b all falls on the ruling of shading matrix layer 22 in the projection of shading matrix layer 22.And the width of the second conductive thread b is less than the width of ruling, be exposed to risk outside ruling to reduce conductive thread a.
In another embodiment, refer to Fig. 5, the second conductive thread b all falls on the ruling of shading matrix layer 22 in the projection of shading matrix layer 22.The width of the second conductive thread b can be equal with the width of ruling.It is comparatively large that the width of such second conductive thread b can do, to reduce the manufacture difficulty of the second conductive thread b.And shading matrix layer 22 to chromatic photoresist region can not be exposed and affect light-out effect and the product appearance effect of chromatic photoresist.
In another embodiment, refer to Fig. 6, the live width of the second conductive thread b is 0.2 micron ~ 5 microns, second conductive thread b intersects to form grid node mutually, distance between two adjacent grid nodes is 50 microns ~ 500 microns, under the condition meeting above-mentioned live width and spacing, can realize the transparent effect of the second conductive thread b, namely naked eyes are invisible.Therefore, the second projection of conductive thread b on shading matrix layer 22 is aimed at shading matrix layer 22 or misalignment all can.Embodiment is as shown in Figure 6 misalignment, can reduce manufacture difficulty like this.
Refer to Fig. 7 and Fig. 8, the first conductive pattern 242 and the second conductive pattern 272 are double-deck multipoint configuration, and it can for being separated to form whole complete conductive grid, to realize multiple point touching structure by break line treatment.Wherein, multiple first conductive pattern 242 and multiple second conductive pattern 272 spaced insulation formation induction structure respectively.As shown in Figure 7, to whole face first conductive layer 24(second conductive layer 26) by the first conductive thread a(second conductive thread b of full line or permutation) disappearance cuts off, and obtains multiple the first spaced conductive pattern 242(second conductive pattern 272).Wherein, two adjacent the first conductive pattern 242(second conductive patterns 272) the width being spaced apart a chromatic photoresist unit 252.Multiple first conductive pattern 242(second conductive pattern 262) separate, insulation.As shown in Figure 8, carrying out the first conductive pattern 242, first conductive thread a two that break line treatment (see square frame c place on figure) obtains spaced insulation internodal distance that breaks to the first conductive thread a of whole face first conductive layer 24 is 0.5 micron ~ 50 microns.Multiple first conductive pattern 252 is separate, insulation.Equally, carrying out break line treatment to the second conductive thread b of whole face second conductive layer 27, to carry out the second conductive pattern 272, second conductive thread b two that break line treatment obtains spaced insulation internodal distance that breaks be 0.5 micron ~ 50 microns.Multiple second conductive pattern 272 is separate, insulation.
Refer to Fig. 9, wherein, the first conductive grid 28 that the first conductive thread a of the first conductive layer 24 is formed comprises multiple first grid cell 282, and each first grid cell 282 accommodates at least one chromatic photoresist unit 252 in the projection of color light resistance layer 25.The second conductive grid 29 that in second conductive layer 27, second conductive thread b is formed comprises multiple second grid cell 292, and each second grid cell 292 accommodates at least one chromatic photoresist unit 252 in the projection of color light resistance layer 25.First grid cell 282 and the second grid cell 292 can be described as basic grid unit.
Basic grid cell configuration can be similar fitgures with the shape of the grid cell of shading matrix layer 22.Namely similar to the shape of the chromatic photoresist unit 252 of color light resistance layer 25, the projection of intersection point on shading matrix layer 22 of the grid of the first conductive thread a and the second conductive thread b overlaps with the ruling intersection point of shading matrix layer 22 respectively.At least one chromatic photoresist unit 252 is held in the projection of basic grid unit in color light resistance layer 25 of the first conductive thread a and the second conductive thread b respectively, is wherein specifically divided into four kinds of situations:
1, the first conductive thread a(second conductive thread b) basic grid unit at the projection of color light resistance layer 25 and chromatic photoresist unit 252 one_to_one corresponding, as shown in Figure 9.2, at the first conductive thread a(second conductive thread b of X direction) basic grid unit comprise multiple complete chromatic photoresist unit 252 in the projection of color light resistance layer 25, as shown in Figure 10.3, at the first conductive thread a(second conductive thread b of y direction) basic grid unit comprise multiple complete chromatic photoresist unit 252 in the projection of color light resistance layer 25, as shown in figure 11.4, at the first conductive thread a(second conductive thread b of transverse axis and y direction) the projection of basic grid unit color light resistance layer 25 all comprise multiple complete chromatic photoresist unit 252, as shown in figure 12.
The above-mentioned optical filter box 200 with touch-control effect, its manufacturing process is as follows:
(1) first carry out Plasma process at the first surface of glass baseplate and second surface, removing first, second surface of glass dirty, and make surface ionizing, increase cohesive force that is follow-up and other material.
(2) at whole of the first surface of glass baseplate painting/plating shading matrix material;
(3) adopt exposure-developing technique, go the shading matrix material in a part of region to remove; Obtain shading matrix layer, be made up of cross one another ruling.
(4) first surface whole the coating impression glue (the present embodiment adopts PMMAUV cured resin) again of shading matrix layer is covered at above-mentioned glass baseplate, obtain the first impression glue-line, and impress film surface with the impression block be nested with the first conductive pattern first and carry out impressing and solidifying, obtain the first groove of required first conductive pattern;
(5) solidify to filled conductive material in the first groove, conductive material can be metal, carbon nano-tube, Graphene, organic conductive macromolecule and ITO, forms the conductive grid that conductive thread is formed; Be preferably metal (as nanometer silver paste), obtain the first conductive layer.
(6) plate/coat R/G/B chromatic photoresist material at above-mentioned first impression glue and the first conductive pattern surface corresponding region gradation again, obtain color light resistance layer, color light resistance layer the projection of shading matrix layer and shading matrix layer spaced.
(7) (can be the clear protective film layer being coated with/plating, final products retain to cover layer protective layer in whole face, above-mentioned RGB color light resistance layer surface; Also can be one deck intermediate process diaphragm, finally remove), to avoid the material result affecting glass first surface when making the second conductive pattern.
(8) at second surface coating impression glue (the present embodiment adopts PMMAUV cured resin) of glass baseplate, obtain the second impression glue-line, and impress glue surface with the impression block be nested with the second conductive pattern second and carry out impressing and solidifying, obtain the second groove of required second conductive pattern;
(9) solidify to filled conductive material in the second groove, conductive material can be metal, carbon nano-tube, Graphene, organic conductive macromolecule and ITO, forms the conductive grid that conductive thread is formed; Be preferably metal (as nanometer silver paste) (if in above-mentioned 7th step for intermediate process diaphragm, also need to be removed after the 9th step).
Above-mentioned optical filter box and use the touch display screen of this optical filter box, optical filter box can realize touch control operation and filtering functions simultaneously, as the combination of two assemblies indispensable in display screen, for in display screen time, can display screen be directly made to have touch controllable function, without the need to assembling a touch-screen on a display screen again, being not only conducive to the thickness reducing electronic product, also greatly having saved material and assembly cost simultaneously.The preparation technology of this optical filter box is simple, and operate controlled, cost is lower, is applicable to suitability for industrialized production.
In addition, above-mentioned optical filter box and touch display screen also tool have the following advantages:
The material that (1) first conductive pattern and the second conductive pattern are selected only can expand all suitable conductive materials to transparent material by tradition.When metal material selected by conductive material, greatly can reduce resistance and reduce the energy consumption of touch-screen.
(2) the above-mentioned optical filter box with touch controllable function is bilayer conductive structure, without the need to carrying out bridging design, greatly reduces task difficulty.
(3) above-mentioned conductive pattern adopts metal mesh structure, adopts imprint process to manufacture, compared to the technique of traditional ito film as conductive layer, mesh shape can a step be formed, and technique is simple, does not need the expensive device such as sputter, evaporation, yield is high, is applicable to large area, production in enormous quantities.And if replace ITO with metal, material cost reduces greatly, owing to not needing to use etching technics, can not cause the waste of conductive, and environmentally friendly.
The above embodiment only have expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.