Summary of the invention
Based on this, be necessary to provide a kind of being conducive to reduce the optical filter box of electronic installation thickness and use thisThe touch display screen of optical filter box.
A kind of optical filter box, comprising:
Glass baseplate; Comprise the first surface and the second surface that are oppositely arranged;
The first conductive layer, comprises the first conductive pattern on the first surface of being located at described glass baseplate, described inThe first conductive pattern comprises continuous conductive grid, and described conductive grid is intersected to form by conductive thread;
Impression glue-line, is arranged on described first surface and described the first conductive pattern described the first conductive patternCase is embedded the side near described first surface at described impression glue-line;
The second conductive layer, comprises being embedded at described impression glue-line and leads away from second of a side of described first surfaceElectrical pattern, described the second conductive pattern comprises the second continuous conductive grid, described the second conductive grid is byTwo conductive threads intersect to form, and described the first conductive pattern and described the second conductive pattern are at described impression glue-lineThickness direction on space form induction structure;
Shading matrix layer, is arranged on described second surface, and described shading matrix layer comprises cross one another latticeLine, described ruling intersects to form multiple grid cells; And
Colourama resistance layer, is arranged on described second surface, comprises multiple chromatic photoresists unit, described in eachChromatic photoresist unit is arranged in a described grid cell;
Wherein, in described the first conductive thread and the second conductive thread, wherein the live width of one is 0.2 micron~5Micron, in described the first conductive thread and the second conductive thread, another one falls in the projection of described shading matrix layerEnter in described ruling.
In an embodiment, the live width of described the first conductive thread is 0.2 micron~5 microns, adjacent thereinThe distance of two grid nodes is 50 microns~500 microns, and described the second conductive thread is at described shading matrix layerOn projection fall on the ruling of described shading matrix layer.
In an embodiment, the live width of described the second conductive thread is less than the width of described ruling therein.
In an embodiment, described the first conductive grid comprises multiple the first grid cells therein, and each is years oldOne grid cell accommodates at least one chromatic photoresist unit in the projection of described colourama resistance layer, and described second leadsPower grid comprises multiple the second grid cells, and each second grid cell holds in the projection of described colourama resistance layerReceive at least one chromatic photoresist unit.
In an embodiment, described the first conductive grid comprises multiple the first grid cells therein, describedTwo conductive grids comprise multiple the second grid cells, and each first grid cell is in the throwing of described colourama resistance layerThe quantity of the chromatic photoresist unit that shadow holds is not less than each second grid cell in described colourama resistance layerThe quantity of the chromatic photoresist unit that projection is held.
In an embodiment, described the first conductive layer is by breaking whole complete conductive grid thereinLine processing obtains the first conductive pattern of multiple spaces, and described the second conductive layer is by complete by wholeConductive grid breaks and processes the second conductive pattern that obtains multiple spaces.
Therein in an embodiment, two adjacent described the first conductive patterns in described the first conductive layerInterval width be 0.5 micron~50 microns, described the second conduction that in described the second conductive layer two are adjacentThe interval width of pattern is 0.5 micron~50 microns.
Therein in an embodiment, the thickness of described colourama resistance layer is more than or equal to described shading matrix layerThickness.
In an embodiment, described impression glue-line offers shape and mates with described the second conductive pattern thereinGroove, described the second conductive pattern is contained in described groove, the degree of depth of described groove is less than described impressionThe thickness of glue-line, the thickness of described the second conductive pattern is less than or equal to the degree of depth of described groove.
A kind of touch display screen, comprises the film crystal pipe electrode, Liquid Crystal Module, the filter set that stack graduallyPart and polaroid, described optical filter box is the as above optical filter box described in any one.
Above-mentioned optical filter box and use the touch display screen of this optical filter box, optical filter box can be simultaneously realNow touch operation and filtering functions, as the combination of indispensable two assemblies in display screen, for showingIn screen time, can directly make display screen there is touch controllable function, without assemble again a touch-screen on display screen, noOnly be conducive to reduce the thickness of electronic product, also greatly saved material and assembly cost simultaneously.
Detailed description of the invention
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing pairThe specific embodiment of the present invention is described in detail. Set forth in the following description a lot of details withBe convenient to fully understand the present invention. But the present invention can come real to be a lot different from alternate manner described hereExecute, those skilled in the art can do similar improvement without prejudice to intension of the present invention in the situation that, therefore thisThe bright restriction that is not subject to following public concrete enforcement.
It should be noted that, when element is called as " being fixed on " another element, it can be directly at anotherOn individual element or also can have an element placed in the middle. When an element is considered to " connection " another yuanPart, it can be directly connected to another element or may have centering elements simultaneously.
Unless otherwise defined, all technology and the scientific terminology using herein and belong to technology of the present inventionThe implication that the technical staff in field understands is conventionally identical. The art using in description of the present invention hereinLanguage, just in order to describe the object of specific embodiment, is not intended to be restriction the present invention. Use hereinTerm " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
The present invention proposes a kind of optical filter box and uses the touch display screen of this optical filter box. This optical filterAssembly can be realized and touch operation and optical filter function, thereby makes touch display screen have touch Presentation Function.
The lower polaroid 10 of the present embodiment, thin film transistor (TFT) (ThinFilmTransistor, TFT) electrode 20, liquidThe structure of crystal module 30, public electrode 40, diaphragm 50 and upper polaroid 60 and function can with existing productProduct are identical, do not repeat them here.
Be appreciated that for using backlight be polarized light source, as OLED polarized light source, without underPolaroid 10, only needs polaroid 60. Diaphragm 50 also can omit.
Optical filter box 200 has tangible operation and filtering functions simultaneously, makes display screen have the demonstration of touchFunction. Display screen can be the LCDs of straight-down negative or side entering type light source.
Following emphasis is described optical filter box 200.
Refer to Fig. 2, optical filter box 200 comprises transparent base 22, impression glue-line 24, the first conductive layer25, the second conductive layer 26, shading matrix layer (BlackMatrix, BM) 27, colourama resistance layer 28. FirstConductive layer 25 and the second conductive layer 26 spaces form induction structure.
Transparent base 22 comprises first surface 222 and second surface 224. Transparent base 22 is transparent insulation materialMatter, as glass, its material can be sillico aluminate glass or calcium soda-lime glass.
Impression glue-line 24 arranges on the first surface 222 and the first conductive layer 25 of transparent base 22, impression glueLayer 24 is transparence, and thickness is 2 microns~10 microns, does not affect overall light transmittance. Impression glue-line 24Material can be solvent-free ultra-violet curing acrylic resin, On Visible Light Cured Resin or heat reactive resin.
The first conductive layer 25 arranges on first surface 222, and is embedded at impression glue-line 24 near transparent baseOne side of 22 first surface 222. The first conductive layer 25 comprises the first conductive pattern 252. The first conductive patternCase 252 can be passed through plating/matel coated layer on transparent base 22, then obtains through etching. The material of metal level canTo be at least one in the metals such as gold, silver, copper, aluminium, zinc, tin and molybdenum.
Refer to Fig. 3, the first conductive pattern 252 comprises some the first conductive grids, and the first conductive grid is byOne conductive thread a intersects to form, and the first adjacent conductive thread a intersects to form grid node. The first conductive filamentThe basic grid that line a forms can be regular polygon, as square, rhombus, regular hexagon etc. First leadsThe basic grid that electricity silk thread a forms can also be random grid. The first conductive thread a can straight line, curve orBroken line. Refer to Fig. 2, in the present embodiment, the live width of the first conductive thread a is 0.2 micron~5 microns, leadsElectricity silk thread a intersects to form grid node mutually, and the distance between adjacent two grid nodes is 50 microns~500 micro-Rice, meeting under the condition of above-mentioned live width and spacing, can realize the transparent effect of the first conductive thread a,Be that naked eyes are invisible.
Refer to Fig. 2, the second conductive layer 26 is arranged on first table of impression glue-line 24 away from transparent base 22One side of face 222. The second conductive layer 26 comprises the second conductive pattern 262. The second conductive pattern 262 canBy offering shape and described the second conductive pattern 262 at impression glue-line 24 in the side away from transparent base 22The groove 242 of coupling, then make after filled conductive material cured in groove 242 structures. Groove 242 darkDegree is less than the thickness that impresses glue-line 24, and the thickness of the second conductive pattern 262 is less than or equal to the degree of depth of groove 242.The conductive material of filling can be metal, CNT, and Graphene, organic conductive macromolecule and ITO, excellentBe first metal, as nanometer silver paste. In the present embodiment, the second conductive thread b and the first conductive thread aMaterial identical. In other embodiment, the material of the second conductive thread b also can with the first conductive filamentThe material difference of line a. While adopting impression mode, the degree of depth of groove 242 is less than the thickness that impresses glue-line 24,The thickness of the conductive material of accommodating in groove 242 is less than or equal to the degree of depth of groove 242. Can avoid conductive layerIn successive process by scratch.
Refer to Fig. 3, the second conductive pattern 262 comprises the second continuous conductive grid, the second conductive grid byThe second conductive thread b intersects to form. The basic grid that the second conductive thread b forms can be regular polygon,As square, rhombus or regular hexagon etc. What in other embodiments, the second conductive thread b formed is basicGrid can also be random grid. The second conductive thread b can straight line, curve or broken line. In the present embodiment,In the present embodiment, second projection of conductive thread b on shading matrix layer 26 falls into shading matrix layer 26In ruling. In the time that optical filter box 200 is applied to product, ordinary circumstance is embedded at the of impression glue-line 24One conductive layer 26 is more easily seen by user's naked eyes and is affected user's experience sense. So by the second conductive thread bFall within gridline and do not exceed gridline in the projection of shading matrix layer 26, do not affect light transmission, be conducive to carryHigh user's experience sense.
In another embodiment, the live width of the second conductive thread b is 0.2 micron~5 microns, the second conductive filamentLine b intersects to form grid node mutually, and the distance between adjacent two grid nodes is 50 microns~500 microns,Meeting under the condition of above-mentioned live width and spacing, can realize the transparent effect of the second conductive thread b, i.e. meatEye is invisible.
In one embodiment, refer to Fig. 4, the first conductive thread a of the first conductive layer 25 and the second conductionIn layer 26, the second conductive thread b all falls into the ruling of shading matrix layer 27 in the projection of shading matrix layer 27On. And the width of the first conductive thread a and the second conductive thread b is less than the width of ruling, to reduce conductionSilk thread a is exposed to the risk outside ruling.
In another embodiment, refer to Fig. 5, the first conductive thread a and second of the first conductive layer 25 leadsIn electricity layer 26, the second conductive thread b all falls into the lattice of shading matrix layer 27 in the projection of shading matrix layer 27On line. The live width of the first conductive thread a and the second conductive thread b can equate with the width of ruling. Like thisSilk thread live width can be done wide, to reduce the manufacture difficulty of conductive thread. And can not expose shading matrix layer 27 toChromatic photoresist region and affect chromatic photoresist go out light effect and product appearance effect.
Refer to Fig. 6, the first conductive pattern 252 and the second conductive pattern 262 can be for being processed and incited somebody to action by broken stringWhole complete conductive grid is separated to form. Wherein, multiple the first conductive patterns 252 and multiple the second conductionPattern 262 respectively space insulation forms induction structure. To the first conductive filament of whole the first conductive layer 25The line a processing (seeing square frame c place on figure) of breaking obtains the first conductive pattern 252 of space insulation,The first conductive thread a two internodal distance that breaks is 0.5 micron~50 microns. Multiple the first conductive patterns are ledElectricity 252 is separate, insulation. Equally, the second conductive thread b of whole the second conductive layer 26 is brokenLine processing is broken and is processed the second conductive pattern 262, the second conductive thread b two that obtain space insulationThe internodal distance that breaks is 0.5 micron~50 microns. That multiple the second conductive patterns conduct electricity is 262 separate,Insulation.
The base of the second conductive thread b in the first conductive thread a of the first conductive layer 25 and the second conductive layer 26This mesh shape can with the similar fitgures that are shaped as of shading matrix layer 27 grid. With colourama resistance layer 28The shape of chromatic photoresist unit 282 identical, the net that the first conductive thread a and the second conductive thread b formThe projection of the intersection point of lattice on shading matrix layer 27 overlaps with the ruling intersection point of shading matrix layer 27 respectively.
Refer to Fig. 7, in one embodiment, the first conductive grid 21 that the first conductive thread a forms comprisesMultiple the first grid cells 212, each first grid cell 212 accommodates in the projection of colourama resistance layer 28The second conductive grid 23 that at least one chromatic photoresist unit 282, the second conductive thread b form comprises multiple theTwo grid cells 232, each second grid cell 232 accommodates at least one in the projection of colourama resistance layer 28Chromatic photoresist unit 282.
In another embodiment, the first conductive grid 21 comprises multiple the first grid cell 212, the second conductionsGrid 23 comprises multiple the second grid cells 232, and each first grid cell 212 is in colourama resistance layer 28The quantity of the chromatic photoresist unit 282 that projection is held is not less than each second grid cell 23 at chromatic photoresistThe quantity of the chromatic photoresist unit 282 that the projection of layer 28 is held.
Basic grid unit (the first grid cell 212, the of the first conductive thread a and the second conductive thread bTwo grid cells 232) projection in colourama resistance layer 28 holds respectively at least one chromatic photoresist unit282, be wherein divided into four kinds of situations:
1, basic grid unit b) of first conductive thread a(the second conductive thread (the first grid cell 212,The second grid cell 232) corresponding one by one with chromatic photoresist unit 282, the first conductive thread a(second leadsElectricity silk thread grid lines b) is apart from being shading matrix layer 27 and adjacent two distance between center lines, as shown in Figure 7.2, only for example, at first axial (transverse axis) upper, first conductive thread a(the second conductive thread grid b)Line-spacing is the same axially integral multiple of adjacent two distance between center lines of shading matrix layer 27, in X directionThe first throwing of conductive thread a(the second conductive thread basic grid unit b) on shading matrix layer 27Shadow comprises multiple complete chromatic photoresist unit 282, as shown in Figure 8. 3, only axially (for example vertical secondAxle) upper, first conductive thread a(the second conductive thread grid lines distance b) is that shading matrix layer 27 is sameAxially the integral multiple of adjacent two distance between center lines, leads at the first conductive thread a(second of y directionThe inclusive projection multiple complete chromatic photoresists of electricity silk thread basic grid unit b) on shading matrix layer 27Unit 282, as shown in Figure 9. 4, first axially and second axially on, the first conductive thread a(secondConductive thread grid lines b) is apart from being all same axially adjacent two distance between center lines of shading matrix layer 27Integral multiple, at first conductive thread a(the second conductive thread basic grid b) of transverse axis and y directionThe projection of unit on shading matrix layer 27 all comprises multiple complete chromatic photoresist unit 282, as Figure 10Shown in.
In one embodiment, the live width of the first conductive thread a is 0.2 micron~5 microns, adjacent two netsThe distance of lattice node is 50 microns~500 microns, the second projection of conductive thread b on shading matrix layer 27Fall on the ruling of shading matrix layer 27. The first conductive grid comprises multiple the first grid cells, the second conductionGrid comprises multiple the second grid cells, and each first grid cell 282 is in the projection institute of colourama resistance layer 28The quantity of the chromatic photoresist unit 282 holding is not less than each second grid cell 282 in colourama resistance layer 28The quantity of the chromatic photoresist unit 282 that holds of projection. Due to the first conductive thread a of the first conductive layerThinner, thus require mesh-density larger than the mesh-density of the second conductive layer, to reduce two conductive layers resistanceDifference, is conducive to promote the sensitivity of touch-screen.
Refer to Figure 11, shading matrix layer 27 is arranged on the second surface 224 of transparent base 22. ShadingMatrix layer 27 comprises cross one another ruling, and these rulings intersect to form multiple grid cells. Grid cell is usedIn accommodating chromatic photoresist material. The material of shading matrix layer 27 is with the photoresist of black dyes or crome metal,It can adopt exposure, developing manufacture process to obtain.
Colourama resistance layer 28 is arranged on the second surface 224 of transparent base 22. Colourama resistance layer 28 comprisesMultiple chromatic photoresists unit 282, each chromatic photoresist unit 282 is arranged in a corresponding grid cell. ColorThe material of coloured light resistance layer 28 can be the photoresist with coloured dye, for example red (red, R), green (green,G), the color such as blue (blue, B), colourama resistance layer 28 can adopt exposure, developing manufacture process acquisition. ColoredPhotoresist layer 28 is distributed among the grid cell that shading matrix layer 27 forms, i.e. colourama resistance layer 28 and shadingMatrix layer 27 is distributed on the second surface 224 of transparent base 22. In the present embodiment, chromatic photoresistThe chromatic photoresist of layer 28 is R/G/B chromatic photoresist.
As shown in figure 11, the thickness of colourama resistance layer 28 is greater than the thickness of shading matrix layer 27, like this canIncrease the light emission rate of light. If the thickness of colourama resistance layer 28 is less than the thickness of shading matrix layer 27, seeThe colourama resistance layer 28 that gets on is similar to and is embedded in shading matrix layer 27, and shading matrix layer 27 covers light,Therefore from colourama resistance layer, 26 light out can only be seen from front, and side is easily by shading matrix layer 27Block, be unfavorable for bright dipping. And the thickness of working as colourama resistance layer 28 is greater than the thickness of shading matrix layer 27, coloured silkThe top of coloured light resistance layer 28 is similar to and embeds in impression glue-line 24, and impression glue-line 24 is by between chromatic photoresistGap is filled and led up, and impression glue-line 24 plays the effect of protection chromatic photoresist and grid moulding simultaneously. At otherIn embodiment, the thickness of colourama resistance layer 28 equals the thickness of shading matrix layer 27.
The above-mentioned optical filter box 200 with touch-control effect, its manufacturing process is as follows:
(1) first carry out Plasma processing at first surface and the second surface of glass baseplate, remove glassOne, second surface is dirty, and makes surface ion, increases follow-up and cohesive force other material.
(2) at whole metal cladding of first surface of glass baseplate or be coated with (this enforcement of layer of metal conductive inkExample is adopted as argent),
(3) be then coated with one deck photoresist, through overexposure-developing technique, only retain and cover the first conductive patternThe photoresist of part, removes all the other local photoresists;
(4) utilize metal etch liquid to carry out etching to above-mentioned metal level, obtain the first conductive pattern of required patternThe conductive thread of case.
(5) at above-mentioned whole coating impression glue (the present embodiment of glass basic surface that covers the first conductive patternAdopt PMMAUV cured resin), and use the impression block being nested with the second conductive pattern at impression glue tableFace impresses and solidifies, and obtains the grid groove of required the second conductive pattern;
(6), to filled conductive material in the grid groove of the second conductive pattern and solidify, conductive material can beMetal, CNT, Graphene, organic conductive macromolecule and ITO, form the conduction that conductive thread formsGrid; Be preferably metal (as nanometer silver paste);
(7) covering layer protective layer at the whole face of impression glue-line and the second conductive pattern surface (can be to be coated with/to plateTransparency protected rete, final products retain; Also can be one deck intermediate process diaphragm, finally remove),To avoid affecting the effect of the second conductive pattern in the time making the pattern of shading matrix layer and colourama resistance layer.
(8) at whole painting/plating light screening material of second surface of substrate of glass;
(9) adopt exposure-developing technique, the light screening material in chromatic photoresist region is removed, obtain shading squareBattle array layer.
(10) plate/coat R/G/B chromatic photoresist in corresponding region gradation, obtain colourama resistance layer.
Wherein, be intermediate process diaphragm when what use in above-mentioned the 7th step, after the 10th step, also need byIt removes)
In the touch display screen of above-mentioned optical filter box and this optical filter box of use, comprise glass substrate, establishPut at the upper impression glue-line of glass substrate first surface, be distributed in the first conductive layer of the both sides of impression glue-lineWith the second conductive layer, and be arranged on shading matrix layer and the colourama resistance layer on glass substrate second surface, theOne conductive layer and the insulation of the second conductive layer space form induction structure. As indispensable in display screenAn assembly, during for display screen, can directly make display screen have touch controllable function, without again at display screenUpper assembling one touch-screen, is not only conducive to reduce the thickness of electronic product, also greatly saved simultaneously material andAssembly cost. The preparation technology of this optical filter box is simple, operates controlledly, and cost is lower, applicable to workIndustryization is produced.
Further, in the first conductive thread and the second conductive thread, wherein the live width of one is 0.2 micron~5Micron, and the distance of adjacent two grid nodes is 50 microns~500 microns, described the first conductive thread and theIn two conductive threads, another one falls on described ruling in the projection of described shading matrix layer. Ensure thus visionTransparent effect is better. And conductive layer is arranged on the both sides of impression glue-line, has avoided the scratch of conductive layer. Meanwhile,
In addition, above-mentioned optical filter box and touch display screen also tool have the following advantages:
(1) first conductive thread obtains by metal etch; The second conductive thread adopts impression mode to make,The material that conductive pattern is selected can only expand all suitable conductive materials to transparent material by tradition. WhenWhen the conductive material of conductive thread is selected metal material, can greatly reduce resistance and reduce the energy consumption of touch-screen.
(2) the above-mentioned optical filter box with touch controllable function is double-deck conductive structure, without the design of putting up a bridge,Greatly reduce task difficulty.
(3) above-mentioned conductive pattern adopts metal grill structure, adopts imprint process to manufacture, compared to biographyThe ITO film of system is as the technique of conductive layer, and mesh shape can a step form, and technique is simple, does not need to spatterThe expensive device such as plating, evaporation, yield is high, is applicable to large area, production in enormous quantities. And if with metal generationFor ITO, material cost reduces greatly, owing to not needing to use etching technics, can not cause conductiveWaste, and environmentally friendly.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed,But can not therefore be interpreted as the restriction to the scope of the claims of the present invention. It should be pointed out that for this areaThose of ordinary skill, without departing from the inventive concept of the premise, can also make some distortion andImprove, these all belong to protection scope of the present invention. Therefore, the protection domain of patent of the present invention should be with appendedClaim is as the criterion.