CN103425329A - Optical filter component and touch display component - Google Patents
Optical filter component and touch display component Download PDFInfo
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- CN103425329A CN103425329A CN2013101138654A CN201310113865A CN103425329A CN 103425329 A CN103425329 A CN 103425329A CN 2013101138654 A CN2013101138654 A CN 2013101138654A CN 201310113865 A CN201310113865 A CN 201310113865A CN 103425329 A CN103425329 A CN 103425329A
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Abstract
The invention relates to an optical filter component and a touch display component. The optical filter component comprises a base material, a conducting layer, a shading matrix and color resists, wherein the conducting layer is arranged on the base material and comprises a first conductive pattern, second conductive patterns and a conductive bridge, the first conductive pattern and the second conductive patterns are arranged at intervals to form an induction structure, each second conductive pattern comprises a plurality of electrode blocks which are arranged at intervals and insulated to one another, adjacent electrode blocks are electrically connected through the conductive bridge, an insulating layer is arranged between the conductive bridge and the first conductive pattern, the shading matrix and the color resists are arranged on the insulating layer, the shading matrix comprises crossed grid lines which cross to form grids, and the color resists are formed in the grids. The optical filter component can achieve touch operation and a filtering function, and the thicknesses of electronic products are reduced.
Description
Technical field
The present invention relates to touch-screen, particularly relate to the touch display screen of a kind of optical filter box and this optical filter box of use.
Background technology
Touch-screen is a kind of inductive arrangement that receives the Touching controlling lamp input signal.Touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that the photoelectricity industry is a dark horse.
At present, having the electronic product that touches Presentation Function includes display screen and is positioned at the touch-screen on display screen, yet, touch-screen as with display screen assembly independently, when for some, realizing the electronic product of man-machine interaction, all need to be ordered according to the size of aobvious screen, assembled again afterwards, the assembling of existing touch-screen and display screen mainly contains two kinds of modes, be that frame pastes and full laminating, it is by the laminating of the edge of touch-screen and display screen that frame pastes, and full laminating is by whole laminating of the upper surface of the lower surface of touch-screen and display screen.
Display screen is as the composite module of polaroid, optical filter, Liquid Crystal Module and TFT etc., its thickness is larger, simultaneously, touch-screen and display screen are member independently, when electronic product is assembled, not only need complicated packaging technology, also can again increase thickness and the weight of electronic product, moreover, many one packaging technologies, just mean and increased the bad probability of product, greatly increase the production cost of product.
Summary of the invention
Based on this, the touch display screen that is necessary to provide the optical filter box that a kind of thickness is less and uses this optical filter box.
A kind of optical filter box comprises:
Base material;
Conductive layer, be arranged on described base material, described conductive layer comprises the first conductive pattern, the second conductive pattern and conducting bridge, described the first conductive pattern and the second conductive pattern space form induction structure, described the second conductive pattern comprises the electrode block of a plurality of spaces insulation, adjacent described electrode block is electrically connected to by described conducting bridge, between described conducting bridge and described the first conductive pattern, is provided with insulation course; And
Be arranged on shading matrix and chromatic photoresist on described insulation course, described shading matrix comprises cross one another ruling, described ruling intersection shaping grid, and described chromatic photoresist is formed in described grid.
Therein in embodiment, described conducting bridge comprises the bridging grid and is arranged on two bridging conducting blocks at described bridging grid two ends, and each bridging conducting block is electrically connected on an electrode block in described adjacent two electrode blocks.
In embodiment, described bridging grid is the conductive grid silk thread therein, and the live width of described conductive grid silk thread is 1～10 μ m, and line-spacing is 20～500 μ m.
In embodiment, on described conducting bridge, be provided with packed layer therein.
In embodiment, described the first conductive pattern and described the second conductive pattern comprise the continuous conduction grid therein, and described conductive grid is intersected to form by described conductive thread.
In embodiment, the width of described conductive thread is not more than the width between two adjacent chromatic photoresists therein.
In embodiment, the material of described conductive thread is at least one in gold, silver, copper, aluminium, zinc, tin and molybdenum therein.
In embodiment, the line-spacing of described conductive grid is the integral multiple of the ruling distance of described shading matrix therein.
In embodiment, the thickness of described shading matrix is not more than the thickness of described chromatic photoresist therein.
A kind of touch display screen, comprise the lower polaroid, TFT electrode, Liquid Crystal Module, public electrode, optical filter box and the upper polaroid that stack gradually, and described optical filter box is the as above described optical filter box of any one.
Above-mentioned optical filter box can be realized touch control operation and optical filter function simultaneously, as an indispensable assembly in display screen, during for display screen, can directly make display screen there is touch controllable function, without assemble again a touch-screen on display screen, not only be conducive to reduce the thickness of electronic product, also greatly saved material and assembly cost simultaneously.
The accompanying drawing explanation
The structural representation of the touch display screen that Fig. 1 is an embodiment;
The structural representation that Fig. 2 is optical filter box shown in Fig. 1;
The structural representation of the conductive layer that Fig. 3 is an embodiment;
The structural representation of the optical filter box that Fig. 4 is an embodiment;
The structural representation of the optical filter box that Fig. 5 is another embodiment;
The structural representation of the conductive thread that Fig. 6 a is an embodiment;
The structural representation of the conductive thread that Fig. 6 b is another embodiment;
The structural representation of the conductive thread that Fig. 7 is another embodiment;
The structural representation of the conductive thread that Fig. 8 is an embodiment;
The structural representation of the conductive thread that Fig. 9 is another embodiment.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail.A lot of details have been set forth in the following description so that fully understand the present invention.But the present invention can implement much to be different from alternate manner described here, those skilled in the art can be in the situation that do similar improvement without prejudice to intension of the present invention, so the present invention is not subject to the restriction of following public concrete enforcement.
It should be noted that, when element is called as " being fixed in " another element, can directly can there be element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be directly connected to another element or may have centering elements simultaneously.
Unless otherwise defined, all technology that this paper is used are identical with the implication that belongs to the common understanding of those skilled in the art of the present invention with scientific terminology.The term used in instructions of the present invention herein, just in order to describe the purpose of specific embodiment, is not intended to be restriction the present invention.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
The present invention proposes a kind of optical filter box and uses the touch display screen of this optical filter box.This optical filter box can be realized touch operation and optical filter function, thereby makes touch display screen have the touch Presentation Function.
Refer to Fig. 1, the touch display screen 100 of an embodiment, comprise the lower polaroid 10, TFT electrode 20, Liquid Crystal Module 40, public electrode 50, diaphragm 60, optical filter box 200 and the upper polaroid 70 that stack gradually.
Structure and the function of the lower polaroid 10 of the present embodiment, TFT electrode 20, Liquid Crystal Module 40, public electrode 50, diaphragm 60 and upper polaroid 70 can be identical with existing product, do not repeat them here.
Be appreciated that for what to use backlight be polarized light source, as the OLED polarized light source, without lower polaroid 10, only need upper polaroid 70 to get final product.Diaphragm 60 also can omit.
But touch display screen 100 has tangible operation and polarized light function simultaneously, makes display screen have the touch Presentation Function.Display screen can be the LCDs of straight-down negative or side down light source.
Following emphasis is described optical filter box 200.
Refer to Fig. 2, optical filter box 200 comprises base material 22, conductive layer 24, shading matrix (Black Matrix) 26 and chromatic photoresist 28.
Refer to Fig. 2 and Fig. 3, conductive layer 24 is located on base material 22.Conductive layer 24 comprises the first conductive pattern 242 and the second conductive pattern 244 and conducting bridge 246, and the first conductive pattern 242 and the second conductive pattern 244 spaces formation induction structures.The conductive unit of the first conductive pattern 242 is continuous conductive unit, the conductive unit of the second conductive pattern 244 comprises the electrode block of a plurality of spaces insulation, the electrode block of space is electrically connected to by conducting bridge 246, between conducting bridge 246 and the first conductive pattern 242, is provided with insulation course 248.
Refer to Fig. 2 and Fig. 3, in an embodiment, conducting bridge 246 can be coated with conductive material by impression again and obtain, and conducting bridge 246 comprises bridging grid 21 and is arranged on the bridging conducting block 23 at bridging grid 21 two ends.Wherein put up a bridge grid 21 for the conductive grid silk thread, and for guaranteeing visually-clear, the live width of grid silk thread is 1～10 μ m, and line-spacing is 20～500 μ m.Bridging conducting block 23 is connected with the mesh lines of bridging grid 21, and penetrates insulation course 284, makes the mesh lines of conducting bridge 246 and the second corresponding conductive pattern 244 be connected.Preferably, bridge is taken at least two conductive threads 27 in corresponding the second conductive pattern 244 of conducting block 23 cross-over connections, to guarantee electrically the validity of overlap joint (if a broken string wherein, but other still conducting).
In forming conducting bridge 246 processes, can disposable impression form the conducting bridge with bridging grid 21 246 of arch; The mode that also can obtain consent with exposure imaging first forms the consent of conducting block, impression forms the lattice portion groove again, finally removes consent and once insert conductive material to form the conducting bridge 246 that has bridging grid 21 and be arranged on the bridging conducting block 23 at bridging grid 21 two ends.
Refer to Fig. 4 and Fig. 5, conducting bridge 246 is realized by silk-screen or inkjet printing electrically conducting transparent ink.While adopting the impression mode, while adopting silk-screen or inkjet printing electrically conducting transparent ink, take 246 surfaces in conduction and cover again one deck packed layer 25, surface is filled and led up, so that surface smoothness when follow-up painting/plating shading matrix 26, chromatic photoresist 28.
Refer to Fig. 5, in one embodiment, the width of the conductive thread 27 of conductive layer 24 be less than the distance between two adjacent R/G/B chromatic photoresists, the live width of conductive thread 27 can be less than the grid line live width of shading matrix 26.Conductive layer 24 is annihilated fully shading matrix 26 times, and guarantees the first conductive pattern 242 and second conductive pattern 244 monolithic conductives of space insulation.In other embodiments, by conductive layer 24, below shading matrix 26 and chromatic photoresist 28, the conductive thread 27 that therefore needs only conductive layer 24 is not more than the width of base material 22.Due to whole complete being covered in over against the zone of 26 times correspondences of shading matrix of conductive thread 27, therefore can not affect light effect and user's experience effect, can be not etched when making shading matrix 26 and chromatic photoresist 26 and produce the broken string risk.
Refer to Fig. 6 a and Fig. 6 b, the first conductive pattern 242 and the second conductive pattern 244 are formed by the continuous conduction grid, and conductive grid is intersected to form by conductive thread 27, and the Basic Net ruling of conductive thread 27 can be regular polygon or random grid figure.Conductive thread 27 is by metal cladding on substrate of glass or is coated with the layer of metal conductive ink, form the grid silk thread of required conductive pattern through resist coating-exposure-operations such as development-etching, the material of metal level can be at least one in the metals such as gold, silver, copper, aluminium, zinc, tin, molybdenum again.
The basic grid shape of conductive thread 27 can become similar fitgures with chromatic photoresist 28 shapes, can be for example rectangle as shown in Figure 6 a, can be also bent limit shape as shown in Figure 6 b.The center line of the grid of conductive thread 27 overlaps with the center line of the grid line of shading matrix 26, the mesh lines of conductive thread 27 is apart from being the same axially integral multiple of adjacent two grid line distance between center lines of shading matrix 26, so that processing procedure, here can be divided into three kinds of situations: 1. only for example, on first axial (transverse axis), the conductive thread mesh lines is apart from being the same axially integral multiple of adjacent two distance between center lines of shading matrix 26, as shown in Figure 7; 2. only for example, at second axial (longitudinal axis) upper, the conductive thread mesh lines is apart from being the same axially integral multiple of adjacent two distance between center lines of shading matrix 26, as shown in Figure 8; 3. first axially and second axially on, the conductive thread mesh lines is apart from being all the same axially integral multiple of adjacent two distance between center lines of shading matrix 26, as shown in Figure 9.
Refer to Fig. 2 and Fig. 4, in one embodiment, the thickness of chromatic photoresist 28 can equal the thickness of shading matrix 26.The thickness that is preferably chromatic photoresist 28 is greater than shading matrix 26 thickness, as shown in Figure 5, can increase like this light emission rate of light.If (, the thickness of chromatic photoresist 28 is less than the integral thickness of shading matrix 26, looking that chromatic photoresist 28 is similar to is embedded in shading matrix 26, shading matrix 26 is lived the light shading, therefore from chromatic photoresist, 26 light out can only be seen from front, side is all blocked by shading matrix 26, is unfavorable for bright dipping).
When conductive layer 24 is the impression bridging structure, conducting bridge 246 can be coated with conductive material by impression again and obtain, and conducting bridge 246 comprises bridging grid 21 and is arranged on the bridging conducting block 23 at bridging grid 21 two ends.
While adopting disposable method for stamping to obtain the conduction rack bridge construction, its manufacturing process is as follows:
(1) at first carry out plasma (Plasma) on glass baseplate and process, remove the spot of glass surface, and make surface ion, increase cohesive force follow-up and chromatic photoresist and shading matrix;
(2) at glass baseplate whole of surface metal cladding or painting layer of metal conductive ink;
The present embodiment can adopt the conductive silver ink.
(3) coating photoresist, utilize exposure-development-etching technique to obtain the first conductive pattern and second conductive pattern of required conductive pattern;
(4) be coated with again layer of transparent UV glue as insulation course on the surface of above-mentioned conductive thread layer, impress and be cured with the impression block with required bridging structural correspondence, here need to carry out the contraposition processing, make the bridging conducting block at corresponding bridging two ends penetrate bright UV glue and be connected with second conductive pattern at corresponding interval;
(5), to filled conductive material in the grid groove of conducting bridge and conducting block groove and solidify, obtain conductive layer;
(6) whole painting/plating light screening material (light screening material is black UV glue or crome metal), if light screening material is black UV glue, adopt exposure-developing technique, and the light screening material in chromatic photoresist zone is removed, and obtains shading matrix; If light screening material is crome metal, first be coated with one deck photoresist again through overexposure-development-etching technique, the light screening material in chromatic photoresist zone is removed, obtain shading matrix;
(7) the R/G/B chromatic photoresist is plated/coats in the regional gradation of having removed light screening material in correspondence, obtains chromatic photoresist.
When conductive layer 24 is the impression bridging structure, and the mode that adopts exposure imaging to obtain consent first forms the consent of conducting block, impression forms the lattice portion groove again, finally removes consent and once insert conductive material to form while obtaining the conduction rack bridge construction, and its manufacturing process is as follows:
(1) at first carry out the Plasma processing on glass baseplate, remove the dirty of glass surface, and make surface ion, increase cohesive force follow-up and chromatic photoresist and light screening material;
(2) at glass baseplate whole of surface metal cladding or painting layer of metal conductive ink;
The present embodiment can adopt the conductive silver ink.
(3) coating photoresist, utilize exposure-development-etching technique to obtain the conductive thread layer of required conductive pattern;
(4) be coated with again photoresist layer on the surface of above-mentioned conductive thread layer, and utilize mask plate to be exposed, develop photoresist layer, take the conducting block corresponding position at two bridges of follow-up conducting bridge and obtain respectively the photoresist mask layer, this step also can with together with step 3, realize;
(5) be coated with again layer of transparent UV glue as insulation course to the conductive thread layer surface with the photoresist mask layer, impress and be cured with the impression block with required bridging structural correspondence, here need to carry out the contraposition processing, make the grid two ends of conducting bridge be connected with the photoresist mask layer;
(6) described photoresist mask layer is removed, to form the conducting block groove that is communicated with the second corresponding conductive pattern and conduction bridging surface mesh ruling;
(7), to filled conductive material in described bridging grid wire grooves and described conducting block groove and solidify, the conduction that obtains being communicated with corresponding adjacent two conductive units of the second conductive pattern is put up a bridge.
(8) whole painting/plating light screening material (light screening material is black UV glue or crome metal), if light screening material is black UV glue, adopt exposure-developing technique, and the light screening material in chromatic photoresist zone is removed, and obtains shading matrix; If light screening material is crome metal, first be coated with one deck photoresist again through overexposure-development-etching technique, the light screening material in chromatic photoresist zone is removed, obtain shading matrix;
(9) the R/G/B chromatic photoresist is plated/coats in the regional gradation of having removed light screening material in correspondence.
When the conducting bridge 246 of conductive layer 24 is electrically conducting transparent ink bridging structure, its manufacturing process is as follows:
(1) at first carry out the Plasma processing on glass baseplate, remove the dirty of glass surface, and make surface ion, increase cohesive force follow-up and chromatic photoresist and light screening material;
(2) at glass baseplate whole of surface metal cladding or painting layer of metal conductive ink (the present embodiment can adopt the conductive silver ink);
(3) coating photoresist, utilize exposure-development-etching technique to obtain the conductive thread layer of required conductive pattern;
(4) adopt inkjet printing or screen printing technique to cover the layer of transparent insulation course in needs bridging zone;
(5) adopt inkjet printing or screen printing technique to cover the layer of transparent electrically conductive ink as bridging on above-mentioned transparent insulating layer, make second conductive pattern at interval, bridge two ends realize being electrically connected to, and be not communicated with the first conductive pattern.
(6) more whole apply the layer of transparent resin as packed layer, by surfacing;
(7) whole painting/plating light screening material (light screening material is black UV glue or crome metal), if light screening material is black UV glue, adopt exposure-developing technique, and the light screening material in chromatic photoresist zone is removed, and obtains shading matrix; If light screening material is crome metal, first be coated with one deck photoresist again through overexposure-development-etching technique, the light screening material in chromatic photoresist zone is removed, obtain shading matrix;
(8) the R/G/B chromatic photoresist is plated/coats in the regional gradation of having removed light screening material in correspondence, obtains chromatic photoresist.
The present invention has following advantage:
(1) optical filter box in the present invention can be realized touch control operation and optical filter function simultaneously, as an indispensable assembly in display screen, during for display screen, can directly make display screen there is touch controllable function, without assemble again a touch-screen on display screen, not only be conducive to reduce the thickness of electronic product, also greatly saved material and assembly cost simultaneously.
(2) while preparing optical filter box of the present invention, cover conductive layer on substrate of glass, deposit respectively again light screening material and chromatic photoresist, obtain shading matrix and chromatic photoresist, conductive layer is covered by shading matrix, therefore from the illumination that projects into of optical filter direction while being mapped to conductive grid, even conductive grid is opaque, can be sheltered from by shading matrix, so the user can not see conductive grid in use yet, therefore can not affect the user and experience.Can prevent the conductive layer oxidation, guarantee electric conductivity simultaneously.
(3), when conductive pattern is selected metal material, can reduce greatly resistance to reduce the energy consumption of touch-screen.
(4) material that conductive pattern is selected only expands all suitable conductive materials to transparent material by tradition, when conductive pattern is selected metal material, can reduce greatly resistance to reduce the energy consumption of touch-screen.
(5) above-mentioned conductive pattern adopts the metal grill structure, adopts imprint process to be manufactured, the technique compared to traditional ITO film as conductive layer, mesh shape can one step forming, and technique is simple, does not need the expensive device such as sputter, evaporation, yield is high, is applicable to large tracts of land, production in enormous quantities.
(6) conductive pattern adopts the metal grill structure, is convenient to blade coating technique, and produces agglomeration effect while preventing sintering and cause wire fracture.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (10)
1. an optical filter box, is characterized in that, comprising:
Base material;
Conductive layer, be arranged on described base material, described conductive layer comprises the first conductive pattern, the second conductive pattern and conducting bridge, described the first conductive pattern and the second conductive pattern space form induction structure, described the second conductive pattern comprises the electrode block of a plurality of spaces insulation, adjacent described electrode block is electrically connected to by described conducting bridge, between described conducting bridge and described the first conductive pattern, is provided with insulation course; And
Be arranged on shading matrix and chromatic photoresist on described insulation course, described shading matrix comprises cross one another ruling, described ruling intersection shaping grid, and described chromatic photoresist is formed in described grid.
2. optical filter box according to claim 1, it is characterized in that, described conducting bridge comprises the bridging grid and is arranged on two bridging conducting blocks at described bridging grid two ends, and each bridging conducting block is electrically connected on an electrode block in described adjacent two electrode blocks.
3. optical filter box according to claim 2, is characterized in that, described bridging grid is the conductive grid silk thread, and the live width of described conductive grid silk thread is 1～10 μ m, and line-spacing is 20～500 μ m.
4. optical filter box according to claim 1, is characterized in that, on described conducting bridge, is provided with packed layer.
5. optical filter box according to claim 1, is characterized in that, described the first conductive pattern and described the second conductive pattern comprise the continuous conduction grid, and described conductive grid is intersected to form by described conductive thread.
6. optical filter box according to claim 5, is characterized in that, the width of described conductive thread is not more than the width between two adjacent chromatic photoresists.
7. optical filter box according to claim 5, is characterized in that, the material of described conductive thread is at least one in gold, silver, copper, aluminium, zinc, tin and molybdenum.
8. optical filter box according to claim 5, is characterized in that, the line-spacing of described conductive grid is the integral multiple of the ruling distance of described shading matrix.
9. optical filter box according to claim 1, is characterized in that, the thickness of described shading matrix is not more than the thickness of described chromatic photoresist.
10. a touch display screen, is characterized in that, comprises the lower polaroid, TFT electrode, Liquid Crystal Module, public electrode, optical filter box and the upper polaroid that stack gradually, and described optical filter box is the described optical filter box of claim 1～7 any one.
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| CN2013101138654A CN103425329A (en) | 2013-04-02 | 2013-04-02 | Optical filter component and touch display component |
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| CN2013101138654A CN103425329A (en) | 2013-04-02 | 2013-04-02 | Optical filter component and touch display component |
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| CN111384136A (en) * | 2020-02-27 | 2020-07-07 | 武汉天马微电子有限公司 | Display panel and display device |
| CN114995683A (en) * | 2022-08-04 | 2022-09-02 | 湖南兴威新材料有限公司 | Single-sided capacitive touch screen and manufacturing method thereof |
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Effective date of registration: 20170630 Address after: 330000 Jiangxi city of Nanchang Province Economic and Technological Development Zone HUANGJIAHU Road Applicant after: Nanchang OFilm Tech. Co.,Ltd. Address before: North to the East, 330013 in Jiangxi province Nanchang city Nanchang economic and technological development zones clove road Longtan ditch Applicant before: Nanchang Ofilm Display Tech Co.,Ltd. |
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