Detailed description of the invention
Understandable for enabling the above-mentioned purpose of the present invention, feature and advantage to become apparent from, the most right
The detailed description of the invention of the present invention is described in detail.Elaborate in the following description a lot of detail with
It is easy to fully understand the present invention.But the present invention can come real to be a lot different from alternate manner described here
Executing, those skilled in the art can do similar improvement in the case of intension of the present invention, therefore this
Bright do not limited by following public being embodied as.
Refer to Fig. 1, the touch display screen 100 of an embodiment, including the lower polaroid 10 stacked gradually,
TFT electrode 20, Liquid Crystal Module 30, public electrode 40, protecting film 50 and polarisation-filtration module 60.
TFT electrode 20 includes glass-base 24 and the show electrode 22 being arranged on glass-base 24.Liquid crystal
Module 30 includes liquid crystal 32 and is positioned at the alignment film 34 of liquid crystal 32 both sides.
It is appreciated that when use backlight is as polarized light source, such as OLED polarized light source, it is not necessary to use
Lower polaroid 10.The lower polaroid 10 of present embodiment, TFT electrode 20, Liquid Crystal Module 30 and common electrical
The structure of pole 40 and function can be identical with existing product, do not repeat them here.
Touch display screen 100 and there is touch operation, polarized light function and filtering functions simultaneously, make display screen have
There is touch display function.Display screen can be straight-down negative or the LCDs of side entering type light source.
Following emphasis describes polarisation-filtration module 60.
Touching display device also to include controlling driving chip and flexible circuit board, for the purpose of simplifying the description, these are two years old
Part is shown without the most in this application.
Referring to Fig. 2 and Fig. 3, the polarisation-filtration module 60 of an embodiment, including filtering assembly 62 and polarisation
Assembly 64.
Filtering assembly 62 include transparent substrates 622, first imprint glue-line the 623, first conductive layer 624 and
Light filter substrate.The generally transparent glass of transparent substrates 622.Light filter substrate includes shading matrix 626 and colour
Photoresistance 628.First impressing glue-line 623 coats a table of the close substratum transparent 63 of transparent substrates 622
Face, the first conductive layer 624 is embedded the surface away from transparent substrates 622 at the first impressing glue-line 623.Filter
Light substrate is arranged on another surface (i.e. opposing with the first impressing glue 623 surface) of transparent substrates 622.
Shading matrix 626 includes that cross one another ruling c, cross one another ruling c form grid, chromatic photoresist 628
It is formed in grid.
Polarization elements 64 is arranged on first conductive layer 624 side away from transparent substrates 622.Polarization elements 64
Glue-line 646 and the second conductive layer 644 is imprinted including polaroid 642, second.Second impressing glue-line 646 is coated with
In a surface of polaroid 642, the second conductive layer 644 is embedded at the second impressing glue-line 646 away from polarisation
The surface of sheet 642.First conductive layer 624 of filtering assembly 62 and polarization elements 64 are by substratum transparent 63
Laminating.
In conjunction with Fig. 3, the first conductive layer 624 includes the first of multiple spaced insulation extended in a first direction
Conductive unit 6242.The adjacent distance between the first conductive unit 6242 can be 0.5 μm~50 μm.Phase
First conductive unit 6242 of spacer insulator is by being obtained by break line treatment by the first conductive layer 624 mutually
's.
Each first conductive unit 6242 includes that multiple continuous print is intersected by the first conductive thread a and is formed
First conductive grid.
First conductive thread a projection on light filter substrate and ruling c alignment.
Shading matrix 626 is the photoresist with black dyes, and it can use exposure, development to make.Color
Coloured light resistance 628 is the photoresist with coloured dye, and it can use exposure, development to make.Chromatic photoresist
628 generally comprise red (red, R) photoresistance, green (green, G) photoresistance or indigo plant (blue, B) photoresistance,
For making incident illumination be transformed into monochromatic light, it is achieved filtering functions.
In conjunction with Fig. 3, the second conductive layer 644 includes the second of multiple spaced insulation extended in a second direction
Conductive unit 6442.The adjacent distance between the second conductive unit 6442 can be 0.5 μm~50 μm.Phase
Second conductive unit 6442 of spacer insulator is by being obtained by break line treatment by the second conductive layer 644 mutually
's.
Each second conductive unit 6442 includes that multiple continuous print is intersected by the second conductive thread b and is formed
Second conductive grid.Second conductive thread b projection on light filter substrate and ruling c alignment.
In order to ensure the comprehensive of detected touch location and simplified processing process, improve production efficiency, the
One direction is arranged in a mutually vertical manner with second direction.In the present embodiment, first direction horizontally set, second party
To longitudinally disposed.In other embodiments, it is also possible to be first direction be longitudinally disposed, second direction is horizontal
To setting, additionally, first direction and second direction can also be off plumbs.First conductive unit 6242 with
Second conductive unit 6442 is the most spaced and insulation forms induction structure.
First conductive layer 624 and the second conductive layer 644 are by respectively in the first impressing glue-line 623 and the second pressure
Imprint out conductive pattern groove on print glue-line 646, then in conductive pattern groove, fill conductive material and solidify
Prepare.
The degree of depth of conductive pattern groove is less than the thickness of the first impressing glue-line 623, meanwhile, conductive pattern groove
The degree of depth less than second impressing glue-line 642 thickness.
For convenience of explanation, being not particularly illustrated below is the first conductive thread or the situation of the second conductive thread
Under, the first conductive thread and the second conductive thread are referred to as conductive thread.
Conductive thread thickness is not more than the degree of depth of conductive pattern groove.
Conductive material can be metal simple-substance, alloy, CNT, Graphene, organic conductive macromolecule or
Tin indium oxide (ITO).In one preferably embodiment, conductive material is metal, such as nanometer silver paste.
In the present embodiment, the material of the first impressing glue-line is solvent-free ultra-violet curing acryl resin.The
One impressing glue-line is transparence, does not affect the transmitance of entirety.In other embodiments, the first impressing glue
The material of layer can also be On Visible Light Cured Resin or heat reactive resin.The thickness of the first impressing glue-line can be
2 μm~10 μm.
In the present embodiment, the material of the second impressing glue-line is solvent-free ultra-violet curing acryl resin.The
Two impressing glue-lines are transparence, do not affect the transmitance of entirety.In other embodiments, the second impressing glue
The material of layer can also be On Visible Light Cured Resin or heat reactive resin.The thickness of the second impressing glue-line can be
2 μm~10 μm.Above-mentioned thickness direction refer to transparent substrates 622, first imprint glue-line 623, substratum transparent 63,
Polaroid 642 or the thickness direction of the second impressing glue-line 646.
In an embodiment as illustrated in figure 2, polaroid 642 is arranged on the surface of substratum transparent, the first conduction
Separated by polaroid 642 and substratum transparent between layer 624 and the second conductive layer 644.Certainly, at other
In embodiment, as shown in Figure 4, the second impressing glue-line 642 is arranged at the close substratum transparent of polaroid 646
Surface on, on the surface of the close substratum transparent that the second conductive layer 644 is arranged on the second impressing glue 642,
Separated by substratum transparent between first conductive layer 624 and the second conductive layer 644.
It is appreciated that polarisation-filtration module 60 can also be not provided with the first impressing glue-line 623 and the second impressing glue
Layer 646, refer to Fig. 5 to Fig. 6.Certainly, polarisation-filtration module 60 can also be not provided with the first impressing glue
Layer 623 or the second impressing glue-line 646, refer to Fig. 7 to Fig. 8.
As shown in Figure 5 and Figure 6, polarisation-filtration module 60 is not provided with the first impressing glue-line and the second impressing glue
Layer.First conductive layer 624 is arranged on a surface of transparent substrates 622.Second conductive layer 644 is arranged on
One surface of polaroid 642.Now, the first conductive layer 624 and the second conductive layer 644 are by being coated with or plating
Prepared by the mode that conductive layer etches again.
In the embodiment as shown in fig .5, polaroid 642 is arranged on the surface of substratum transparent, the first conduction
Separated by polaroid 642 and substratum transparent between layer 624 and the second conductive layer 644.Certainly, at other
In embodiment, as shown in Figure 6, the second conductive layer 644 is set directly at the close transparent adhesive tape of polaroid 642
On the surface of layer, separated by substratum transparent between the first conductive layer 624 and the second conductive layer 644.
As shown in Figure 7 and Figure 8, polarisation-filtration module 60 is provided with the second impressing glue-line 646, but is not provided with
First impressing glue-line.First conductive layer 624 is arranged on the transparent substrates 622 surface away from light filter substrate.This
Time, the first conductive layer 624 is prepared by the way of being coated with or plate conductive layer and etching.Second conductive layer 644 is embedding
It is arranged on the second print glue-line 646 surface away from polaroid.Second conductive layer 644 is imprinted with mode to be prepared.
Certainly, in other embodiments, polarisation-filtration module 60 can be provided with the first impressing glue-line, but does not sets
Put the second impressing glue-line.Now, the second conductive layer 644 is prepared by the way of being coated with or plate conductive layer and etching.
First conductive layer 624 is imprinted with mode to be prepared.
In one preferably embodiment, the first conductive layer 624 is by the way of being coated with or plate conductive layer and etching
Preparation.Second conductive layer 644 is imprinted with mode to be prepared.This mainly due to transparent substrates 622 relative to
The resin film of polaroid 642, more resistant to high temperature, is more suitable for carrying out plated film.
In the embodiment as shown in figure 7, polaroid 642 is arranged on the surface of substratum transparent, the first conduction
Separated by polaroid 642 and substratum transparent between layer 624 and the second conductive layer 644.Certainly, at other
In embodiment, as shown in Figure 8, the second conductive layer 644 is set directly at the surface of substratum transparent, and first leads
Separated by substratum transparent between electric layer 624 and the second conductive layer 644.
In conjunction with the ruling c of Fig. 9, the first conductive thread a and the second conductive thread b and shading matrix 626 at sky
All it is directed between.First conductive thread a can be straight line, it is also possible to for curve, in other examples,
First conductive thread a can also be broken line.Second conductive thread b can be straight line, it is also possible to for curve,
In other examples, the second conductive thread b can also be broken line.Fig. 9 illustrate only the first conduction
Layer 624 and the second conductive layer 644 are the schematic diagram that impressing is made, and in actual applications, are not intended to first
Conductive layer 624 and the preparation method of the second conductive layer 644.Figure 4 above is not drawn into substratum transparent to Fig. 9,
But the substratum transparent in Fig. 4 to Fig. 9 is identical with Fig. 2, may be contained within described filtering assembly 62 and described
Between polarization elements 64.
Refer to Figure 10 to Figure 13, the first conductive thread and the second conductive thread all with the lattice of shading matrix 626
Line is directed at, and the first conductive thread and the second conductive thread are referred to as conductive thread A.First conductive grid and
The projection on light filter substrate of two conductive grids can surround R photoresistance, G photoresistance or the B light that integer is complete
Resistance.
In embodiment as shown in Figure 10, the conductive grid that conductive thread A is formed throwing on light filter substrate
Shadow and R photoresistance, G photoresistance or B photoresistance one_to_one corresponding, the most each first conductive grid one R photoresistance of encirclement,
G photoresistance or B photoresistance.
In embodiment as shown in figure 11, only on first axial (such as transverse axis), conductive thread A shape
Multiple complete R photoresistances, G photoresistance or B photoresistance are surrounded in the conductive grid become projection on light filter substrate.
In embodiment as shown in figure 12, only on second axial (the such as longitudinal axis), conductive thread A shape
Multiple complete R photoresistances, G photoresistance or B photoresistance are surrounded in the conductive grid become projection on light filter substrate.
In as shown for example in fig.13, on first axial (transverse axis) and second axial (longitudinal axis),
Multiple complete R photoresistance, G are all surrounded in the conductive grid that conductive thread A is formed projection on light filter substrate
Photoresistance or B photoresistance.
Polarisation-the filtration module 60 with touch control operation function as shown in Figure 2 and Figure 4, when the first conductive layer
624 and second conductive layer 644 when all using impressing mode to prepare, its manufacturing process is as follows:
(1) first the surface of transparent substrates 622 carries out plasma (ionizing) process, remove the dirty of surface
Dirt, and make surface ionizing, increase follow-up and other material cohesive force.
(2) in the whole topcoating/plating in a surface of transparent substrates 622 with the photoresist layer of black dyes.
(3) use exposure-development technology, the photoresist with black dyes in chromatic photoresist region removed,
Form shading matrix.
(4) plate in the region eliminating the photoresist with black dyes or coat R/G/B chromatic photoresist by several times.
(5) at another surface of transparent substrates 622 coating impressing glue, (the present embodiment uses PMMA UV
Solidification resin), and the impression block being nested with the conductive pattern with the first conductive layer imprints glue surface first
Imprint and solidify, obtaining the conductive pattern groove of required first conductive layer.
(6) in the conductive pattern groove of the first conductive layer, fill conductive material and solidify.Conductive material is permissible
For metal simple-substance or alloy, CNT, Graphene, organic conductive macromolecule or ITO, form the first conduction
The conductive grid that silk thread is constituted.Preferably, conductive material is metal (such as nanometer silver paste), obtains with first
The filtering assembly 62 of conductive layer 624.
(7) at surface coating impressing glue (the present embodiment employing poly-methyl methacrylate of polaroid 642
Ester (polymethylmethacrylate, PMMA) UV solidifies resin), and with the leading of the second conductive layer
The impression block that electrical pattern is nested imprints on the second impressing glue surface and solidifies, and obtains required second and leads
The conductive pattern groove of electric layer.
(8) filling conductive material in the conductive pattern groove of the second conductive layer and solidify, conductive material is permissible
For metal simple-substance or alloy, CNT, Graphene, organic conductive macromolecule or ITO, form the first conduction
The conductive grid that silk thread is constituted.Preferably, conductive material is metal (such as nanometer silver paste), obtains with second
The polarization elements 64 of conductive layer 644.
(9) by the filtering assembly 62 with the first conductive layer 624 and the polarisation with the second conductive layer 644
Assembly 64 is bondd by transparent adhesive and solidifies, and obtains the polarisation-optical filtering mould with touch control operation function
Block 60.
Polarisation-the filtration module 60 with touch control operation function as shown in Figure 5 and Figure 6, when the first conductive layer
624 and second conductive layer 644 all by be coated with or plating conductive layer etch again by the way of realize time, its manufacturing process is such as
Under:
(1) first the surface of transparent substrates 622 is carried out plasma process, remove the dirty of surface, and make
Surface ionizing, increase follow-up and other material cohesive force.
(2) in a whole topcoating in surface of transparent substrates 622 or plating with the photoresist layer of black dyes.
(3) use exposure-development technology, the photoresist with black dyes in chromatic photoresist region removed,
Form shading matrix.
(4) plate in the region eliminating the photoresist with black dyes or coat R/G/B chromatic photoresist by several times.
(5) in whole of another surface of transparent substrates 622 plating conductive layer or painting one layer of conductive ink (conduction
Material can be metal simple-substance, metal alloy, CNT, Graphene, organic conductive macromolecule or ITO;
In the present embodiment, conductive material is silver ink), form conductive layer.
(6) it is coated with a layer photoetching glue on the electrically conductive, through exposure-development technology, only retains covering first and lead
The photoresist of the conductive pattern portions of electric layer 624, removes the photoresist in remaining place.
(7) utilize lithographic technique that above-mentioned conductive layer is etched, obtain first leading of separate, insulation
Electric unit, thus obtain the filtering assembly 62 with the first conductive layer 624.
(8) at whole an of surface of polaroid 642 plating conductive layer or one layer of conductive ink (conductive material of painting
Can be metal simple-substance, metal alloy, CNT, Graphene, organic conductive macromolecule or ITO.This reality
Executing in example, conductive material is silver ink), form conductive layer.
(9) it is coated with a layer photoetching glue, through exposure-development technology, only retains and cover the second conductive layer 644
The photoresist of conductive pattern portions, the photoresist in remaining place is removed.
(10) utilize lithographic technique that above-mentioned conductive layer is etched, obtain separate, insulation second
Conductive unit, thus obtain the polarization elements 64 with the second conductive layer 644.
(11) by the filtering assembly 62 with the first conductive layer 624 and the polarisation with the second conductive layer 644
Assembly 64 is bondd by transparent adhesive and solidifies, and obtains the polarisation-optical filtering mould with touch control operation function
Block 60.
Polarisation-the filtration module 60 with touch control operation function as shown in Figure 7, when the first conductive layer 624 leads to
Cross and be coated with or prepared by the plating mode that etches again of conductive layer, when the second conductive layer 644 uses impressing mode to prepare, its
Manufacturing process is as follows:
(1) first the surface of transparent substrates 622 is carried out plasma process, remove the dirty of surface, and make
Surface ionizing, increase follow-up and other material cohesive force.
(2) in a whole topcoating in surface of transparent substrates 622 or plating with the photoresist layer of black dyes.
(3) use exposure-development technology, the photoresist with black dyes in chromatic photoresist region removed,
Form shading matrix.
(4) plate in the region eliminating the photoresist with black dyes or coat R/G/B chromatic photoresist by several times.
(5) one layer of ito film is plated on whole of another surface of transparent substrates 622.
(6) it is coated with a layer photoetching glue on ito film surface, through exposure-development technology, only retains covering the
The photoresist of the conductive pattern portions of one conductive layer 624, removes the photoresist in remaining place.
(7) utilize lithographic technique that above-mentioned ito film is etched, obtain first leading of separate, insulation
Electric unit, thus obtain the filtering assembly 62 with the first conductive layer 624.
(8) in a surface coating impressing glue (the present embodiment employing PMMA UV solidification of polaroid 642
Resin), and the impression block being nested with the conductive pattern with the second conductive layer carries out on the second impressing glue surface
Imprint and solidify, obtaining the conductive pattern groove of required second conductive layer.
(9) filling conductive material in the conductive pattern groove of the second conductive layer and solidify, conductive material is permissible
For metal simple-substance or alloy, CNT, Graphene, organic conductive macromolecule or ITO, form the first conduction
The conductive grid that silk thread is constituted;Preferably, conductive material is metal (such as nanometer silver paste), obtains with second
The polarization elements 64 of conductive layer 644.
(10) by the filtering assembly 62 with the first conductive layer 624 and the polarisation with the second conductive layer 644
Assembly 64 is bondd by transparent adhesive and solidifies, and obtains the polarisation-optical filtering mould with touch control operation function
Block 60.
Above-mentioned polarisation-the filtration module 60 with touch control operation function, when the first conductive layer 624 uses impressing side
Prepared by formula, when the second conductive layer 644 is prepared by the way of being coated with or plate conductive layer and etching, and its manufacturing process
As follows:
(1) first the surface of transparent substrates 622 is carried out plasma process, remove the dirty of surface, and make
Surface ionizing, increase follow-up and other material cohesive force.
(2) in the whole topcoating/plating in a surface of transparent substrates 622 with the photoresist layer of black dyes.
(3) use exposure-development technology, the photoresist with black dyes in chromatic photoresist region removed,
Form shading matrix 626.
(4) plate in the region eliminating the photoresist with black dyes or coat R/G/B chromatic photoresist by several times
628。
(5) at another surface of transparent substrates 622 coating impressing glue, (the present embodiment uses PMMA UV
Solidification resin), and the impression block being nested with the conductive pattern with the first conductive layer imprints glue surface first
Imprint and solidify, obtaining the conductive pattern groove of required first conductive layer.
(6) in the conductive pattern groove of the first conductive layer, fill conductive material and solidify.Conductive material is permissible
For metal simple-substance or alloy, CNT, Graphene, organic conductive macromolecule or ITO, form the first conduction
The conductive grid that silk thread is constituted.Preferably, conductive material is metal (such as nanometer silver paste), obtains with first
The filtering assembly 62 of conductive layer 624.
(7) at whole an of surface of polaroid 642 plating conductive layer or one layer of conductive ink (conductive material of painting
Can be metal simple-substance, metal alloy, CNT, Graphene, organic conductive macromolecule or ITO.This reality
Executing in example, conductive material is silver ink), form conductive layer.
(8) it is coated with a layer photoetching glue, through exposure-development technology, only retains and cover the second conductive layer 644
The photoresist of conductive pattern portions, the photoresist in remaining place is removed.
(9) utilize lithographic technique that above-mentioned conductive layer is etched, obtain second leading of separate, insulation
Electric unit, thus obtain the polarization elements 64 with the second conductive layer 644.
(10) by the filtering assembly 62 with the first conductive layer 624 and the polarisation with the second conductive layer 644
Assembly 64 is bondd by transparent adhesive and solidifies, and obtains the polarisation-optical filtering mould with touch control operation function
Block 60.
Above-mentioned polarisation-filtration module 60 can realize touch operation, polarized light function and filtering functions simultaneously, as
An indispensable assembly in display screen, when above-mentioned polarisation-filtration module 60 is in display screen, can be direct
Make display screen have touch controllable function, it is not necessary to assemble touch screen the most on a display screen, not only contribute to reduce electronics
The thickness of product, is the most also greatly saved material and assembly cost.
First conductive thread and the second conductive thread are the most all directed at the ruling of shading matrix, and such
One conductive thread and the second conductive thread will not expose the region of shading matrix affects coloured silk to chromatic photoresist region
The light-out effect of coloured light resistance and product appearance effect.The width of the first conductive thread and the second conductive thread is not required to
It is the least, as long as satisfied first conductive thread and the projection on light filter substrate of second conductive thread fall in shading
On matrix.
The material that first conductive layer and the second conductive layer are selected by tradition only with transparent material expand to all properly
Conductive material;When metal material selected by conductive material, resistance can be substantially reduced and reduce touch screen
Energy consumption.
Above-mentioned polarisation-the filtration module 60 with touch controllable function is bilayer conductive structure, it is not necessary to carries out bridging and sets
Meter, is substantially reduced task difficulty.
Use above-mentioned polarisation-filtration module 60, owing to the first conductive layer is located at transparent substrates away from light filter substrate
Side, the second conductive layer is located at the side of polaroid, can reduce liquid crystal display
(LiquidCrystalDisplay, LCD) signal disturbing to touch-control effect.
Embodiment described above only have expressed the several embodiments of the present invention, and it describes more concrete and detailed,
But therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that, for this area
Those of ordinary skill for, without departing from the inventive concept of the premise, it is also possible to make some deformation and
Improving, these broadly fall into protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be with appended
Claim is as the criterion.