Summary of the invention
Based on this, it is necessary to provide polarisation-filtration module that a kind of thickness is less and use this polarisation-filtration module
Touch display screen.
A kind of polarisation-filtration module, including
Filtering assembly, including transparent substrates;And
Filter layer, including light shielding part and optical filtering portion, described light shielding part is intersected by gridline and is formed, described
Gridline intersects and forms multiple grid cells, and described optical filtering portion includes multiple filter unit, each described
Filter unit is contained in grid cell described in corresponding one;And
First impressing glue-line, is arranged at described transparent substrates homonymy, described first pressure with described filter layer stacking
Print glue-line offers the first groove;And
First conductive layer, is embedded at described first impressing glue-line, sets including multiple parallel interval in the first direction
The first conductive unit put, described first conductive unit includes the first conductive grid, described first conductive grid
Being intersected by the first conductive thread and formed, described first conductive thread intersects to form grid node, and described
One conductive thread is contained in described first groove;
Polarization elements, is attached to the described transparent substrates side away from described first conductive layer;Including polaroid,
And it being arranged at the second conductive layer of described polaroid side, described second conductive layer includes multiple along second party
The second conductive unit arranged to parallel interval, described second conductive unit includes the second conductive grid, described
Second conductive grid is intersected by the second conductive thread and is formed, and described second conductive thread intersects to form grid
Node;
Described first direction is not parallel with described second direction, described first conductive unit and described second conduction
Unit is mutually insulated on the thickness direction of described transparent substrates, described first conductive thread and the second conductive filament
The live width of the one of which in line be the distance of 0.2~5 μm and adjacent two grid nodes be 50~500 μm, separately
One entirely falls in described gridline in the projection of described filter layer.
Wherein in an embodiment, the live width of described first conductive thread is 0.2~5 μm and adjacent two nets
The distance of lattice node is 50~500 μm, and described second conductive thread entirely falls in institute in the projection of described filter layer
State gridline.
Wherein in an embodiment, the live width of described second conductive thread is not more than the live width of described gridline.
Wherein in an embodiment, described first conductive thread all falls within institute in the projection of described filter layer
State gridline.
Wherein in an embodiment, described second conductive layer is formed directly into the surface of described polaroid.
Wherein in an embodiment, described polarization elements also includes the second impressing glue-line, described second impressing
Glue-line coats the side of described polaroid, and described second impressing glue-line offers the second groove, and described second
Conductive thread is contained in described second groove.
Wherein in an embodiment, the thickness of described first conductive layer is not more than the degree of depth of described first groove,
The thickness of described second conductive layer is not more than the degree of depth of described second groove.
Wherein in an embodiment, the interval width of two adjacent first conductive units of described first conductive layer
Degree is 0.5~50 μm, and the interval width of two adjacent second conductive unit of described second conductive layer is an optical filtering
The width of unit.
Wherein in an embodiment, the first impressing glue-line being provided with the first conductive layer is positioned at described transparent substrates
And between described filter layer.
Wherein in an embodiment, being provided with the first impressing glue-line of the first conductive layer, to be positioned at described filter layer remote
Side from described transparent substrates.
A kind of touch display screen, including the TFT electrode stacked gradually, Liquid Crystal Module and described polarisation-filter
Optical module.
Above-mentioned polarisation-filtration module and use the touch display screen of this polarisation-filtration module, polarisation-filtration module
Touch operation, polarized light function and filtering functions can be realized, as in display screen indispensable three simultaneously
The combination of assembly, time in display screen, can directly make display screen have touch controllable function, it is not necessary to again in display
Assemble a touch screen on screen, not only contribute to reduce the thickness of electronic product, be the most also greatly saved material
And assembly cost.
Detailed description of the invention
Understandable for enabling the above-mentioned purpose of the present invention, feature and advantage to become apparent from, the most right
The detailed description of the invention of the present invention is described in detail.Elaborate in the following description a lot of detail with
It is easy to fully understand the present invention.But the present invention can come real to be a lot different from alternate manner described here
Executing, those skilled in the art can do similar improvement in the case of intension of the present invention, therefore this
Bright do not limited by following public being embodied as.
Refer to Fig. 1, the touch display screen 100 of an embodiment, including the TFT electrode 20 stacked gradually,
Liquid Crystal Module 30 and polarisation-filtration module 60.Wherein it is possible at TFT electrode 20 away from Liquid Crystal Module 30
Side lower polaroid 10 is set, between Liquid Crystal Module 30 and polarisation-filtration module 60, public electrode is set
40, protecting film 50.
TFT electrode 20 includes glass-base 24 and the show electrode 22 being arranged on glass-base 24.Liquid crystal
Module 30 includes liquid crystal 32 and is held on the alignment film 34 of liquid crystal 32 both sides.The of polarisation-filtration module 60
One conductive layer 628 is towards Liquid Crystal Module 30.
It is appreciated that when use backlight is as polarized light source, such as OLED polarized light source, it is not necessary to use
Lower polaroid 10.In certain embodiments, when described touch display screen 100 is Radix Rumicis liquid crystal display screen, described
Liquid crystal 32 is that the TFT electrode 20 being positioned at its side drives, therefore can not separately set public electrode 40.This enforcement
The lower polaroid 10 of mode, TFT electrode 20, Liquid Crystal Module 30 and the structure of public electrode 40 and function can
With identical with existing product, do not repeat them here.
Polarisation-filtration module 60 has touch control operation, polarized light function and filtering functions simultaneously, makes touch show
Screen 100 has touch display function.Display screen can be straight-down negative or the LCDs of side entering type light source.
Following emphasis describes polarisation-filtration module 60.
Touching display device also to include controlling driving chip and flexible circuit board, for the purpose of simplifying the description, these are two years old
Part is shown without the most in this application.
Referring to Fig. 2 and Fig. 3, the polarisation-filtration module 60 of an embodiment, including filtering assembly 62 and polarisation
Assembly 64.
Optical filter box 62 includes that transparent substrates 622, filter layer 624, first imprint glue-line 626 and first
Conductive layer 628.Filter layer 624 and the first impressing glue-line 626 stacking are arranged at transparent substrates 622 homonymy.Thoroughly
Bright substrate 622 is the material of transparent insulation, such as glass, can be specifically sillico aluminate glass and calcium sodium glass
Glass, has good cohesive force through plasma treatment rear surface.General, the thickness of transparent substrates 622
May range from 0.1mm~0.5mm.
Filter layer 624 includes light shielding part 6242 and optical filtering portion 6244.Light shielding part 6242 is mutually handed over by gridline
Fork-shaped becomes, and gridline intersects and forms multiple grid cells 6243, and optical filtering portion 6244 includes multiple list that filters
Unit 6245, each filter unit 6245 is contained in a grid cell 6243 of correspondence.General, shading
The thickness range in portion 6242 and optical filtering portion 6244 is 0.5 μm~2 μm.
First impressing glue-line 626 offers the first groove 6262 away from the surface of transparent substrates 622, and first is recessed
Groove 6262 is the groove of mesh shape, and mesh shape can be preset to required figure as required.First conduction
Layer 628 is embedded at the first impressing glue-line 626, and namely the first conductive layer 628, first imprints glue-line 626 and
Filter layer 624 is respectively positioned on transparent substrates 622 homonymy, as in figure 2 it is shown, represent is provided with the first conductive layer
The first impressing glue-line 626 of 628 is between filter layer 624 and transparent substrates 622.As shown in Figure 4, table
The the first impressing glue-line 626 being provided with the first conductive layer 628 shown is positioned at filter layer 624 away from transparent substrates
The side of 622.First conductive layer 628 includes the first conductive unit that multiple parallel interval in the first direction is arranged
6282, so that multiple first conductive unit 6282 insulate.First conductive unit 6282 includes that some first leads
Power grid, the first conductive grid is intersected by the first conductive thread 6284 and is formed, the first conductive thread 6284
Intersecting to form grid node, the first conductive thread 6284 is contained in the first groove 6262.Embodiment at other
In, it is also possible to imprint glue-line 626 first and offer the first groove 6262 near the side of transparent substrates 622.
Polarization elements 64 is attached in transparent substrates 622 away from the side of the first conductive layer 628.Polarization elements
64 include polaroid 642 and the second conductive layer 644.Second impressing glue-line 646 is arranged at polaroid 642 1
Side, the second conductive layer 644 includes the second conductive unit 6442 that multiple parallel interval in a second direction is arranged,
So that multiple second conductive units 6442 insulate.Second conductive unit 6442 includes some second conductive grids,
Second conductive grid is intersected by the second conductive thread 6444 and is formed, the second conductive thread 6444 X-type
Become grid node.
Wherein, first direction is not parallel with second direction, the first conductive unit 6282 and the second conductive unit 6442
On transparent substrates 622 thickness direction, mutually insulated forms induction structure.First conductive thread 6284 and second
The live width of the one of which in conductive thread 6444 is that the distance of 0.2~5 μm and adjacent two grid nodes is
50~500 μm, another one entirely falls in gridline in the projection of filter layer 624.
Above-mentioned polarisation-filtration module 60, is arranged at optical filter box 62, the second conduction by the first conductive layer 628
Layer 644 is arranged at polarization elements 64, then is fitted with polarization elements 64 by optical filter box 62, the first conduction
Layer 628 with second conductive layer 644 interval arrange constitute capacitive sensing structure, can realize simultaneously touch operation,
Polarized light function and filtering functions, and without carrying out design of putting up a bridge, reduce task difficulty.By polarisation-optical filtering
When module 60 is applied to display screen, display screen can be directly made to have touch controllable function, it is not necessary to group the most on a display screen
Fill a touch screen, not only contribute to reduce the thickness of electronic product, be also greatly saved material and assembly cost.
When the live width of the first conductive layer 628 and the conductive thread of the second conductive layer 644 one of which be 0.2~5 μm and
In this conductive layer, the distance of adjacent two grid nodes is 50~during 500 μm, can reach visually-clear, reduces
Fraction defective and production cost;Because light shielding part 6242 has opaqueness, the conductive thread of another conductive layer exists
The projection of filter layer 624 entirely falls in gridline, can make conductive thread a without departing from gridline, thus not
Filter layer 624 can be blocked, it is ensured that filter layer 624 has good light transmittance.
Wherein in an embodiment, the live width of the first conductive thread 6284 is 0.2~5 μm and adjacent two nets
The distance of lattice node is 50~800 μm, and the second conductive thread 6444 entirely falls in the projection of filter layer 624
Gridline.As in figure 2 it is shown, represent be the live width of the first conductive thread 6284 be 0.2~5 μm and adjacent two
The distance of individual grid node is 50~800 μm, and the second conductive thread 6444 is whole in the projection of filter layer 624
Falling into gridline, the live width of the second conductive thread 6444 is less than the live width of gridline.In other embodiments,
The live width of the second conductive thread 6444 can also be equal to the live width of gridline.When polarisation-optical filter module is applied to
During product, it is generally that transparent substrates 622 is provided with the side of the second conductive layer 644 towards user, therefore
And the second conductive layer 644 being arranged at polaroid 642 is easier to be seen by user's naked eyes and affect Consumer's Experience
Sense.So the second conductive thread 6444 is entirely fallen in gridline and without departing from grid in the projection of filter layer 624
Ruling, the live width of the first conductive thread 6284 is that the distance of 0.2~5 μm and adjacent two grid nodes is
50~500 μm, make visually-clear, are conducive to improving Consumer's Experience sense.In other embodiments, also may be used
All fall within gridline the first conductive thread 6284 being arranged in the projection of filter layer 624, carry further
High Consumer's Experience sense.
As shown in Figure 4, in embodiment two, expression is that the first conductive thread 6284 is at filter layer 624
Projection entirely falls in gridline, and the second conductive thread 6444 live width is 0.2~5 μm and adjacent two grid nodes
Distance be 50~500 μm, and the live width of this second conductive thread 6444 is less than the live width of gridline.At it
In its embodiment, the live width of the first conductive thread 6284 can also be equal to the live width of gridline.Wherein, first
Conductive thread 6284 and the second conductive thread 6444 are straight line, curve or broken line.First conductive thread 6284
With the second conductive thread 6444 without given shape requirement, reduce production requirement.
Referring to Fig. 4 and Fig. 5, in embodiment two and embodiment three, the second conductive layer 644 is formed directly into
The surface of described polaroid 642.A surface-coated or plating at polaroid 642 set conductive material, coating
Photoresist, is exposed development, makes photoresist form multiple second conductive unit 6442 described photoresist;
Etching, to remove the conductive material exposed part beyond the second conductive unit 6442 district, is formed and has multiple the
Second conductive layer 644 of two conductive units 6442.So, the second conductive layer 644 is directly formed and polarisation
Sheet 642 surface, advantageously reduces the thickness of polarization elements 64.Such as Fig. 4, expression is the second conductive layer 644
It is formed at the polaroid 642 surface away from transparent substrates 622.Such as Fig. 5, expression is the second conductive layer 644
It is formed at the polaroid 642 surface near transparent substrates 622.
Referring to Fig. 6 and Fig. 7, in embodiment four and embodiment five, polarization elements 64 includes the second impressing
Glue-line 646, the second impressing glue-line 646 coats the side of polaroid 642, the second impressing glue-line 646 away from
The surface of polaroid 642 offers the second groove 6462, and the conductive thread of the second conductive layer 644 is contained in
Two grooves 6462.The second impressing glue-line 646 is formed, in the second pressure at polarization elements 64 surface coating impressing glue
Print glue-line 646 offers the second groove 6462 away from the surface of polaroid 642, and the second groove 6462 is grid-shaped
The groove of shape, mesh shape can be preset to required figure as required, fills conductive material in the second groove
6462 solidify to form the second conductive thread 6444, and the second conductive thread 6444 intersects and forms the second conduction
Layer 644.By arranging the second impressing glue-line 646, and the second impressing glue-line 646 is imprinted the second groove 6462,
Second groove 6462 is filled conductive material the most again and sintering curing forms the second conductive layer 644, operation letter
Just and cost is relatively low, also ensure that polarisation-filtration module 60 has relatively low sheet resistance, higher printing opacity simultaneously
Rate and less thickness etc..In other embodiments, it is also possible at the second impressing glue-line 646 near partially
The second groove 6462 is offered in the side of mating plate 642.
In the present embodiment, the material of the first impressing glue-line 626 and the second impressing glue-line 646 is solvent-free purple
Outer solidification acryl resin, thickness is 2~10 μm.First impressing glue-line 626 and the second impressing glue-line 646 are
Transparence, does not affect the transmitance of entirety.In other embodiments, the first impressing glue-line 626 and second
The material of impressing glue-line 646 can also be On Visible Light Cured Resin or heat reactive resin.
Conductive material can be metal, CNT, Graphene, organic conductive macromolecule or ITO, is formed
The conductive grid being made up of conductive thread.It is preferably metal, such as nanometer silver paste.When selecting metal, can drop
Low resistance and reduction touch the energy consumption of display screen.So, the first conductive layer 628 and the second conductive layer 644
The material selected only is expanded to all suitable conductive materials with transparent material by tradition;When conductive material is selected
During metal material, resistance can be substantially reduced and reduce the energy consumption touching display screen.
Referring to Fig. 6 and Fig. 7, in embodiment four and embodiment five, the thickness of the first conductive layer 628 is little
In the degree of depth of the first groove 6262, and/or the thickness of the second conductive layer 644 is not more than the second groove 6462
The degree of depth.Specific in the present embodiment, the thickness of the first conductive layer 628 is less than the thickness of the first groove 6262,
The degree of depth of the first groove 6262 is less than the thickness of the first impressing glue-line 626.Second conductive layer 644 is less than second
The degree of depth of groove 6462, the degree of depth of the second groove 6462 is less than the thickness of the second impressing glue-line 646, permissible
The first conductive layer 628 and the second conductive layer 644 is prevented to be scraped off in subsequent technique after being formed.
Referring to Fig. 6 and Fig. 7, in embodiment four and embodiment five, optical filtering portion 6244 includes multiple optical filtering
Unit 6245.Filter unit 6245 is the chromatic photoresist of printing opacity, is specially the photoresist shape with coloured dye
Become, exposure-development processing procedure can be used.Filter unit 6245 the reddest (red, R) photoresistance, green (green,
G) photoresistance or indigo plant (blue, B) photoresistance, be used for making incident illumination be transformed into monochromatic light, it is achieved filtering functions.
Light shielding part 6242 is the side that the photoresist with black dyes is formed at transparent substrates 622, and light shielding part
6242 in lattice-shaped, has opaqueness, can use exposure-development processing procedure.Grid cell 6243 in lattice-shaped
For square so that the photoresistance arrangement in optical filtering portion 6244 is more compact and uniform.Light shielding part 6242 can be prevented effectively from
Chromatic photoresist colour contamination each other, and the contrast of R, G, B light can be increased.
The above-mentioned optical filter box 62 with touch controllable function, as shown in Figure 6 and Figure 7 there is touch control operation merit
Polarisation-the filtration module 60 of energy, when the first conductive layer 628 and the second conductive layer 644 all use impressing mode system
Standby, and the first conductive layer 628 and the first impressing glue-line 626 cover in filter layer 624 away from transparent substrates 622
During side, its manufacturing process is as follows:
(1) first the surface of glass baseplate 622 carries out plasma (Plasma) process, remove surface
Dirty, and make surface ionizing, increase follow-up and other material cohesive force.
(2) in the whole topcoating/plating in a surface of glass baseplate 622 with the photoresist layer of black dyes.
(3) use exposure-development technology, the photoresist in filter unit 6245 region is removed, form grid
The light shielding part 6242 of shape.
(4) R/G/B chromatic photoresist is set by several times at grid cell 6243, forms optical filtering portion 6244, with
To concrete light shielding part 6242 and the filter layer 624 in optical filtering portion 6244.
(5) filter layer 624 away from glass baseplate 622 surface be coated with impressing glue (the present embodiment use
PMMA UV solidifies resin), form the first impressing glue-line 626, and by the conduction with the first conductive layer 628
The impression block that grid is nested imprints on the first impressing glue surface and solidifies, and obtains leading with required first
First groove 6262 of electric layer 628 coupling, the first groove 6262 is latticed.
(6) in the first groove 6262, fill conductive material and solidify.Conductive material can be metal simple-substance
Or alloy, CNT, Graphene, organic conductive macromolecule or ITO, formed and intersected by conductive thread
The conductive grid constituted.Preferably, conductive material is metal (such as nanometer silver paste), obtains with the first conduction
The optical filter box 62 of layer 628.
(7) at surface coating impressing glue (the present embodiment employing polymethyl methacrylate of polaroid 642
(polymethylmethacrylate, PMMA) UV solidifies resin), form the second impressing glue-line 646, and
The impression block being nested with the conductive grid with the second conductive layer 644 imprints on the second impressing glue surface
And solidify, obtaining the second groove 6462 mated with required second conductive layer 644, the second groove 6462 is net
Trellis.
(8) filling conductive material in the second groove 6462 and solidify, conductive material can be metal simple-substance
Or alloy, CNT, Graphene, organic conductive macromolecule or ITO, formed and intersected by conductive thread
The conductive grid constituted.Preferably, conductive material is metal (such as nanometer silver paste), obtains with the second conduction
The polarization elements 64 of layer 644.
(9) by optical filter box 62 away from the side of the first conductive layer 628 with the second conductive layer 644
Polarization elements 64 bondd by transparent adhesive and solidify, obtain the polarisation with touch control operation function
-filtration module 60.
Polarisation-the filtration module 60 with touch control operation function as shown in Figure 2, when the first conductive layer 628 leads to
Prepared by overvoltage India side formula, the first conductive layer 628 and the first impressing glue-line 626 are respectively positioned on filter layer 624 with saturating
Between bright substrate 622, and when the second conductive layer 644 is prepared by the way of being coated with or plate and etching, it makes
Process is as follows:
(1) first the surface of glass baseplate 622 carries out plasma (Plasma) process, remove surface
Dirty, and make surface ionizing, increase follow-up and other material cohesive force.
(2) in a surface coating impressing glue (the present embodiment employing PMMA UV solidification of glass baseplate 622
Resin), form the first impressing glue-line 626, and the pressure being nested with the conductive grid with the first conductive layer 628
Die plate imprints on the first impressing glue surface and solidifies, and obtains mating with required first conductive layer 628
First groove 6262, the first groove 6262 is latticed.
(3) in the first groove 6262, fill conductive material and solidify.Conductive material can be metal simple-substance
Or alloy, CNT, Graphene, organic conductive macromolecule or ITO, formed and intersected by conductive thread
The conductive grid constituted.Preferably, conductive material is metal (such as nanometer silver paste), obtains the first conductive layer 628.
(4) it is provided with the surface painting of the first conductive layer 628 at the first impressing glue-line 626 or plates with black dyes
Photoresist layer.
(5) use exposure-development technology, the photoresist in filter unit 6245 region is removed, form grid
The light shielding part 6242 of shape.
(6) R/G/B chromatic photoresist is set by several times at grid cell 6243, forms optical filtering portion 6244, obtain
There is the filter layer 624 in light shielding part 6242 and optical filtering portion 6244, thus obtain with the first conductive layer 628
Optical filter box 62.
(7) at a whole topcoating in the surface/plating conductive material of polaroid 642, conductive material can be metal simple-substance,
Metal alloy, CNT, Graphene, organic conductive macromolecule or ITO.
(8) it is coated with a layer photoetching glue on polaroid 642 surface being provided with conductive material, utilizes and the second conduction
Photoresist is exposed-develops by the mask plate that the conductive grid of layer 644 is corresponding, only retains and covers the second conduction
The photoresist of the conductive grid part of layer 644, removes the photoresist in remaining place.
(9) utilize lithographic technique that above-mentioned conductive material is etched, obtain separate, insulation second
Conductive unit 6442, thus obtain the polarization elements 64 with the second conductive layer 644.
(10) by optical filter box 62 away from the side of the first conductive layer 628 with the second conductive layer 644
Polarization elements 64 bondd by transparent adhesive and solidify, obtain the polarisation with touch control operation function
-filtration module 60.
Wherein in an embodiment, the thickness in optical filtering portion 6244 is not less than the thickness of light shielding part 6242.Also
I other words the thickness of filter unit 6245 is more than or equal to the thickness of gridline.Thickness when optical filtering portion 6244
When degree is more than the thickness of light shielding part 6242, the light appeared from optical filtering portion 6244, not only from front it will be seen that
From side it can be seen that, such that it is able to increase optical filtering portion 6244 light emission rate.
Wherein in an embodiment, the second conductive grid and filter unit 6245 similar fitgures each other, second
The centrage of conductive thread 6444 overlaps with the centrage of gridline in the projection of filter layer 624, and i.e. second leads
Electrical filament line 6444 alignment grid ruling.Second conductive grid is intersected to form by the second conductive thread 6444, grid
Unit 6243 is formed by gridline segmentation, and filter unit 6245 is formed at grid cell 6243.So
The shape that can make the second conductive grid is identical with the shape of filter unit 6245 but varies in size, and i.e. second leads
Power grid and filter unit 6245 similar fitgures each other, ensure that the second conductive thread 6444 is at filter layer simultaneously
The projection of 624 is without departing from gridline.Further reduce the second conductive thread 6444 and expose gridline region
Probability.
Wherein in an embodiment, adjacent first conductive unit 6282 is provided with interval, and adjacent second is led
Electric unit 6442 is provided with interval, with mutually insulated.As it is shown in figure 9, represent is the as shown in Figure 2
The interval schematic diagram of multiple first conductive units 6282 of one conductive layer 628.As shown in Figure 8, expression is
The interval schematic diagram of multiple second conductive units 6442 in the second conductive layer 644 as shown in Figure 2.Specifically,
The interval width of two adjacent first conductive units 6282 of the first conductive layer 6282 is 0.5~50 μm, now
Can be lacked by full line or permutation conductive thread, cut off.Two phases of described second conductive layer 644
The width that interval width is a filter unit 6245 of adjacent second conductive unit 6442, now can be by leading
Electrical filament line marginal portion disappearance is cut off.In other embodiments, when the first of the first conductive layer 628
Conductive thread 6284 when the projection of filter layer 624 all falls within gridline, the two of the first conductive layer 628
Individual the first adjacent conductive unit 6282 can also be single with two adjacent second conductions of the second conductive layer 644
The interval width of unit 6442 is the same, is the width of a filter unit 6245, as shown in Figure 8.
As shown in Figure 10, expression is the second conductive thread 6444 of the second conductive layer 644 as shown in Figure 2
When projecting to filter layer 624, each second conductive grid accommodates a filter unit 6245.Such as Figure 14 institute
Showing, expression is that the first conductive thread 6284 of the first conductive layer 628 as shown in Figure 2 projects to filter layer
When 624, each first conductive grid accommodates at least one filter unit 6245.Because each grid cell
6243 all to there being a conductive grid, so the density of conductive grid is relatively big, electric conductivity is preferable.
As shown in Figure 11 to Figure 13, expression is the second conduction of the second conductive layer 644 as shown in Figure 2
When silk thread 6444 projects on filter layer 624, each second conductive grid accommodates the optical filtering list of at least two
Unit 6245, can come according to the requirement of the coating weight to the resistance requirement of the second conductive layer 644 and conductive material
Determine filter unit 6245 quantity accommodated.Now can be divided into three kinds of situations, with laterally as X-axis, vertically horizontal
To direction be Y-axis.As shown in figure 11, the most in the X-axis direction, each the second of the second conductive layer 644
Conductive grid projection on filter layer 624 accommodates at least two filter unit 6245.As shown in figure 12, only
In the Y-axis direction, the projection on filter layer 624 of each second conductive grid of the second conductive layer 644 is held
Receive at least two filter unit 6245.As shown in figure 13, simultaneously in X-axis and Y direction, second leads
The projection on filter layer 624 of each second conductive grid of electric layer 644 accommodates at least two filter unit
6245。
As shown in Figure 15 to Figure 17, expression is the first conduction of the first conductive layer 628 as shown in Figure 2
When silk thread 6284 projects to filter layer 624, each first conductive grid accommodates at least two filter unit
6245, can come certainly according to the requirement of the coating weight to the resistance requirement of the first conductive layer 628 and conductive material
Filter unit 6245 quantity that constant volume is received.The most also three kinds of situations can be divided into, with laterally as X-axis, vertically horizontal
To direction be Y-axis.As shown in figure 15, the most in the X-axis direction, each the of the first conductive layer 628
The projection on filter layer 624 of one conductive grid accommodates at least two filter unit 6245.As shown in figure 16,
The most in the Y-axis direction, each first conductive grid of the first conductive layer 628230 throwing on filter layer 624
Shadow accommodates at least two filter unit 6245.As shown in figure 17, simultaneously in X-axis and Y direction, the
The projection on filter layer 624 of each first conductive grid of one conductive layer 628 accommodates at least two and filters single
Unit 6245.
Specific in the present embodiment, described first conductive grid is in the filter of the projection receiving of described filter layer 624
Light unit 6245 quantity is not more than the optical filtering in the projection receiving of described filter layer 624 of described second conductive grid
Unit 6245 quantity.Because the live width of the first conductive thread 6284 of the first conductive grid be 0.2~5 μm and
The distance of adjacent two grid nodes is 50~500 μm, second conductive thread 6444 of the second conductive grid
The no more than live width of gridline.So the live width of the second conductive thread 6444 is relatively big, resistance is relatively
Little.So described first conductive grid is counted at the filter unit 6245 of the projection receiving of described filter layer 624
Amount is arranged to the most described second conductive grid filter unit in the projection receiving of described filter layer 624
6245 quantity, that is to say the density of the first conductive grid density more than the second conductive grid, thus reduce the
The resistance of one conductive layer 628, it is to avoid the resistance difference of two conductive layers is the biggest.
Embodiment described above only have expressed the several embodiments of the present invention, and it describes more concrete and detailed,
But therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that, for this area
Those of ordinary skill for, without departing from the inventive concept of the premise, it is also possible to make some deformation and
Improving, these broadly fall into protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be with appended
Claim is as the criterion.