CN103336618B - Polarisation filtration module and its preparation method and touch display screen - Google Patents
Polarisation filtration module and its preparation method and touch display screen Download PDFInfo
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Abstract
A kind of polarisation filtration module, including polarizer component and optical filter box, polarizer component includes polaroid and is arranged at the first conductive layer of polaroid side, and optical filter box includes transparent substrates and the filter layer being positioned at transparent substrates the same side and the second conductive layer.Polarisation filtration module can realize touch operation, polarised light function and filtering functions simultaneously, as an assembly indispensable in display screen, when above-mentioned polarisation filtration module is in display screen, display screen can be directly made to have touch controllable function, without assembling touch-screen the most on a display screen, not only contribute to reduce the thickness of electronic product, be the most also greatly saved material and assembly cost.Additionally, present invention also offers a kind of touch display screen and a kind of polarisation filtration module preparation method.
Description
Technical field
The present invention relates to flat panel display technology field, particularly relate to a kind of polarisation filtration module with it side of making
Method and touch display screen.
Background technology
Touch-screen is the inductive arrangement that can receive the input signals such as touch.It is the finest that touch-screen imparts information
New looks, are extremely attractive brand-new information interactive devices.The development of touch screen technology causes domestic
The common concern of external information medium circle, it has also become the Chaoyang new high-tech industry that photovoltaic industry is a dark horse.
At present, the electronic product with touch display function all includes display screen and the touch being positioned on display screen
Screen.Touch-screen is as the assembly with display screen independence, when realizing the electronic product of man-machine interaction for some,
It is required to the size according to display screen order, assembles the most again, touch display screen to be formed, touch
Touching that display screen can have simultaneously can touch control operation and display function.Existing touch-screen and the assembling master of display screen
Two ways to be had, i.e. frame are pasted and entirely fit.Frame patch is by the edge laminating of touch-screen with display screen, entirely pastes
Conjunction is by whole of the upper surface laminating of the lower surface of touch-screen Yu display screen.
Traditional display screen mainly includes polaroid, optical filter box, Liquid Crystal Module and TFT(Thin Film
Transistor, thin film transistor (TFT)), there is bigger thickness, and continued laminating touch-screen on display screen
Time, the thickness that touches display screen be will be further increased.
Summary of the invention
Based on this, it is necessary to provide a kind of polarisation filtration module reducing reduction electronic product thickness to make with it
Make method and touch display screen.
A kind of polarisation filtration module, including: polarizer component, including polaroid, and it is arranged at described polarisation
First conductive layer of sheet side, described first conductive layer includes that multiple the most spaced first leads
Electric unit；Optical filter box, including transparent substrates, and be positioned at described transparent substrates the same side filter layer and
Second conductive layer, described filter layer includes light shielding part and optical filtering portion, and described light shielding part is intersected by gridline
Being formed, described gridline intersects and forms multiple grid cells；Described optical filtering portion includes multiple filter unit,
Each described filter unit is contained in grid cell described in corresponding one；Described second conductive layer includes multiple
The second conductive unit that parallel interval is arranged in a second direction, each described second conductive unit is by conductive thread
Intersect formation, and described second conductive unit includes some grid cells；Described first direction and second party
To being not parallel to each other, described first conductive unit and the second conductive unit insulate at thickness direction；Described second leads
The conductive thread of each grid cell of electric layer falls within grid cell described in the projection correspondence of described filter layer
Gridline on.
Wherein in an embodiment, the conductive thread of described second conductive layer is wide with described gridline.
Wherein in an embodiment, described first conductive unit is intersected by conductive thread and is formed, described
The conductive thread of the first conductive layer all falls within described gridline in the projection of described filter layer.
Wherein in an embodiment, described polaroid includes polaroid body and is arranged at described polaroid originally
The impressing glue-line of body side, described impressing glue-line offers groove away from the side of described polaroid body, institute
State the first conductive layer and be contained in described groove.
Wherein in an embodiment, the degree of depth of described groove less than the thickness of described impressing glue-line, described the
The conductive thread thickness of one conductive layer is not more than the degree of depth of described groove.
Wherein in an embodiment, the interval width of two adjacent described first conductive units is 0.5 micron
～50 microns, the interval width of two adjacent described second conductive units is 0.5 micron～50 microns.
Wherein in an embodiment, described second conductive layer is arranged at described light shielding part away from described transparent base
The side at the end, or be arranged between described light shielding part and described transparent substrates.
Wherein in an embodiment, described polarisation filtration module also includes substratum transparent, described transparent substrates
Side away from described filter layer and the second conductive layer is glued with described polarizer component by described substratum transparent
Connect.
A kind of polarisation filtration module, including:
Polarizer component, including polaroid, and is arranged at the first conductive layer of described polaroid side, described
First conductive layer includes the first conductive unit that multiple parallel interval in the first direction is arranged, each described first
Conductive unit is intersected by conductive thread and is formed, and described conductive thread intersects formation grid node；
Optical filter box, including transparent substrates, and is positioned at the filter layer and second of described transparent substrates the same side
Conductive layer, described filter layer includes light shielding part and optical filtering portion, and described light shielding part is intersected by gridline and formed,
Described gridline intersects and forms multiple grid cells；Described optical filtering portion includes multiple filter unit, each
Described filter unit is contained in grid cell described in corresponding one；Described second conductive layer includes multiple along
The second conductive unit that two direction parallel interval are arranged, each described second conductive unit is mutual by conductive thread
Intersect to form；
Described first direction is not parallel to each other with second direction, and described first conductive unit and the second conductive unit exist
Thickness direction insulate；The conductive thread live width of described first conductive layer is 0.2 micron～5 microns, and adjacent two
The distance of individual grid node is 50 microns～800 microns；The conductive thread of described second conductive layer is in described optical filtering
The projection of layer falls within described gridline.
Wherein in an embodiment, the conductive thread of described second conductive layer is wide with described gridline.
Wherein in an embodiment, described polaroid includes polaroid body and is arranged at described polaroid originally
The impressing glue-line of body side, described impressing glue-line offers groove away from the side of described polaroid body, institute
State the first conductive layer and be contained in described groove.
Wherein in an embodiment, the degree of depth of described groove less than the thickness of described impressing glue-line, described the
The conductive thread thickness of one conductive layer is not more than the degree of depth of described groove.
Wherein in an embodiment, the interval width of two adjacent described first conductive units is 0.5 micron
～50 microns, the interval width of two adjacent described second conductive units is 0.5 micron～50 microns.
Wherein in an embodiment, described second conductive layer is arranged at described light shielding part away from described transparent base
The side at the end, or be arranged between described light shielding part and described transparent substrates.
Wherein in an embodiment, described polarisation filtration module also includes substratum transparent, described transparent substrates
Side away from described filter layer and the second conductive layer is glued with described polarizer component by described substratum transparent
Connect.
A kind of touch display screen, including the TFT electrode stacked gradually, Liquid Crystal Module and above-mentioned any one
Polarisation filtration module.
A kind of polarisation filtration module preparation method, comprises the following steps:
Form the first conductive layer in polaroid side, obtain polarizer component；Described first conductive layer includes many
The first conductive unit that individual parallel interval in the first direction is arranged, each described first conductive unit is by conductive filament
Line intersects formation；
Utilize mask plate to use exposure etching technique, form filter layer and the second conduction in transparent substrates the same side
Layer, obtains optical filter box；Described filter layer includes light shielding part and optical filtering portion, and described light shielding part is by gridline
Intersect formation, and described gridline intersects and forms multiple grid cells；Described optical filtering portion includes multiple
Filter unit, each described filter unit is contained in grid cell described in corresponding one；Described second conduction
Layer includes the second conductive unit that multiple parallel interval in a second direction is arranged, each described second conductive unit
Intersected by conductive thread and formed；Described first direction is not parallel to each other with second direction, described first conduction
Unit and the second conductive unit insulate at thickness direction；The conductive thread of described second conductive layer is in described optical filtering
The projection of layer falls within described gridline;
Described transparent substrates is connected with described polarizer component away from the side of described filter layer and the second conductive layer
Connect, obtain polarisation filtration module.
Wherein in an embodiment, described form the first conductive layer in polaroid side, obtain polaroid group
The step of part comprises the following steps:
At polaroid body side coating impressing glue, obtain imprinting glue-line；Described polaroid body and impressing glue
Layer constitutes described polaroid；
Described impressing glue-line is imprinted away from the side of described polaroid body and solidifies, obtains groove；
In described groove, fill conductive material and solidify, forming described first conductive layer, obtain described polarisation
Chip module.
Wherein in an embodiment, the described mask plate employing exposure etching technique that utilizes, same in transparent substrates
Side forms filter layer and the second conductive layer, and the step obtaining optical filter box comprises the following steps:
In the described transparent substrates one whole topcoating of side surface or plating with the photoresist of black dyes, initially hidden
Photosphere;
At the plating of whole of described initial light shield layer surface or painting conductive material, obtain initial conductive layer；
It is coated with the first photoresist layer on described initial conductive layer surface, utilizes the grid line chart with described light shielding part
First mask plate corresponding to case is exposed development to described first photoresist layer；
Described initial conductive layer is etched, obtains initial second conductive layer；Described initial second conductive layer
Conductive pattern consistent with the pattern of described first mask plate；
Described initial light shield layer is etched, obtains light shielding part；The gridline pattern of described light shielding part and institute
The pattern stating the first mask plate is consistent；
It is coated with the second photoresist layer at described initial second conductive layer surface, utilizes and described second conductive layer
Second mask plate corresponding to broken position is exposed development to described second photoresist layer；
Described initial second conductive layer is etched, described initial second conductive layer is divided into multiple parallel
Spaced second conductive unit, obtains described second conductive layer；
In the grid cell that the gridline of described light shielding part is constituted, plate or be coated with filter unit successively, formed and filter
Portion, obtains described filter layer；Described transparent substrates, the second conductive layer and filter layer i.e. constitute described optical filter
Assembly.
Wherein in an embodiment, described the described transparent substrates one whole topcoating of side surface or plating with black
The photoresist of dyestuff, before obtaining the step of initial light shield layer, comprises the following steps:
Described transparent substrates one side surface is carried out plasma treatment；Described initial light shield layer is formed at described
Bright substrate surface after described plasma treatment.
Wherein in an embodiment, the described mask plate employing exposure etching technique that utilizes, same in transparent substrates
Side forms filter layer and the second conductive layer, and the step obtaining optical filter box comprises the following steps:
At the plating of whole of described transparent substrates one side surface or painting conductive material, obtain initial conductive layer；
In the whole topcoating in described initial conductive layer surface or plating with the photoresist of black dyes, obtain initial shading
Layer;
Utilize the mask plate corresponding with the conductive pattern of described second conductive layer that described initial light shield layer is exposed
Photodevelopment；
Described initial light shield layer is etched, obtains described light shielding part；
Described initial conductive layer is etched, described conductive layer is divided into that multiple parallel interval is arranged
Two conductive units, obtain described second conductive layer；The gridline pattern of described light shielding part and described second conduction
The conductive pattern of layer is consistent；
In the grid cell that the gridline of described light shielding part is constituted, plate or be coated with filter unit successively, formed and filter
Portion, obtains described filter layer；Described transparent substrates, the second conductive layer and filter layer i.e. constitute described optical filter
Assembly.
Wherein in an embodiment, at the plating of whole of described transparent substrates one side surface or painting conductive material,
Before the step of conductive layer, comprise the following steps:
Described transparent substrates one side surface is carried out plasma treatment；Described conductive layer is formed at described transparent base
Surface after described plasma treatment, the end.
Above-mentioned polarisation filtration module and touch display screen, and prepared by above-mentioned polarisation filtration module preparation method
Polarisation filtration module, touch operation, polarised light function and filtering functions can be realized, as display screen simultaneously
In an indispensable assembly, time in display screen, can directly make display screen have touch controllable function, nothing
Need to assemble touch-screen the most on a display screen, not only contribute to reduce the thickness of electronic product, the most significantly save
Material and assembly cost are saved.
Accompanying drawing explanation
Fig. 1 is the structure chart of polarisation filtration module in an embodiment；
Fig. 2 is the first conductive layer and the structure chart of the second conductive layer in an embodiment；
Fig. 3 is optical filter box and the structure chart of the second conductive layer conductive thread in an embodiment；
Fig. 4 is optical filter box and the structure chart of the second conductive layer conductive thread in another embodiment；
Fig. 5 is polarizer component and the structure chart of the first conductive layer conductive thread in an embodiment；
Fig. 6 is polarizer component and the structure chart of the first conductive layer conductive thread in another embodiment；
Fig. 7 is the structure chart of polarisation filtration module in another embodiment；
Fig. 8 is the structure chart of polarisation filtration module in another embodiment；
Fig. 9 is the structure chart of polarisation filtration module in another embodiment；
Figure 10 is the flow chart of polarisation filtration module preparation method in an embodiment.
Detailed description of the invention
Understandable for enabling the above-mentioned purpose of the present invention, feature and advantage to become apparent from, the most right
The detailed description of the invention of the present invention is described in detail.Elaborate in the following description a lot of detail with
It is easy to fully understand the present invention.But the present invention can come real to be a lot different from alternate manner described here
Executing, those skilled in the art can do similar improvement in the case of intension of the present invention, therefore this
Bright do not limited by following public being embodied as.
It should be noted that when element is referred to as " being fixed on " another element, and it can be directly at another
On individual element or element placed in the middle can also be there is.When an element is considered as " connection " another yuan
Part, it can be directly to another element or may be simultaneously present centering elements.
Unless otherwise defined, all of technology used herein and scientific terminology and the technology belonging to the present invention
The implication that the technical staff in field is generally understood that is identical.The art used the most in the description of the invention
Language is intended merely to describe the purpose of specific embodiment, it is not intended that in limiting the present invention.Used herein
Term " and/or " include the arbitrary and all of combination of one or more relevant Listed Items.
A kind of polarisation filtration module, as depicted in figs. 1 and 2, including polarizer component 100 and filter set
Part 200.
Polarizer component 100 includes polaroid 110 and is arranged at the first conductive layer 120 of polaroid 110 side,
First conductive layer 120 includes the most spaced multiple first conductive unit 122, each first conduction
Unit 122 can be parallel to each other, and the first conductive unit 122 can be obtained by break line treatment, or directly passes through
The groove of impressing predetermined pattern refills conductive material and obtains.
Optical filter box 200 includes transparent substrates 210, and is positioned at the filter layer of transparent substrates 210 the same side
220 and second conductive layer 230, filter layer 220 includes light shielding part 222 and optical filtering portion 224, light shielding part 222
Being intersected by gridline and formed, gridline intersects and forms multiple grid cells 223；Optical filtering portion 224 wraps
Including multiple filter unit 225, each filter unit 225 is contained in a grid cell 223 of correspondence；Second
Conductive layer 230 includes the second conductive unit 232 that multiple parallel interval in a second direction is arranged, and each second leads
Electric unit 232 is intersected by conductive thread and is formed, and the second conductive unit 232 can pass through break line treatment equally
Obtain.
Transparent substrates 210 can be glass, polymethyl methacrylate (PMMA) or poly terephthalic acid second
The optically transparent materials such as diol ester (PET) are made.In the present embodiment, transparent substrates 210 is substrate of glass, can
Reduce production cost.Light shielding part 222 is the photoresist with black dyes, and it can use exposure, development
Form specific pattern.Optical filtering portion 224 is the photoresist with coloured dye, equally uses exposure, shows
Shadow forms specific pattern.Optical filtering portion 224 include some periodic arrangement red (red, R) filter unit,
Green (green, G) filter unit and indigo plant (blue, B) filter unit, be used for making incident light be transformed into monochrome
Light, it is achieved filtering functions.
First conductive layer 120 and the second conductive layer 230 can be nesa coating, such as tin indium oxide (ITO) film,
Or the reticulated conductive layer interlocked for conductive thread, conductive thread can be metal simple-substance line, metal conjunction
In gold thread, carbon nano tube line, Graphene line, organic conductive macromolecule line or tin indium oxide (ITO) line extremely
Few one.In the present embodiment, the first conductive layer 120 and the second conductive layer 230 form for conductive thread is staggered
Reticulated conductive layer, and the conductive thread of the first conductive layer 120 and the second conductive layer 230 is metal simple-substance
Line, such as silver wire, can improve electric conductivity.
First direction is not parallel to each other with second direction, and the first conductive unit 122 and the second conductive unit 232 exist
Thickness direction insulation forms Inductance and Capacitance.The interval width of two the first adjacent conductive units 122 can be 0.5 micro-
Rice is to 50 microns, and the interval width of two the second adjacent conductive units 232 is alternatively 0.5 micron to 50 microns.
Wherein in an embodiment, the conductive thread of the first conductive layer 120 and the second conductive layer 230 is mutual
Intersecting to form grid node, the conductive thread live width of the first conductive layer 120 is 0.2 micron～5 microns, and phase
The distance of adjacent two grid nodes is 50 microns～800 microns, to ensure the first conductive layer 120 visually-clear,
I.e. ensureing that visible light transmittance rate is more than 80%, now the first conductive layer 120 conductive thread is at filter layer 220
Projection can fall within gridline, it is possible to does not fall within gridline.The conductive thread of the second conductive layer 230 is in filter
The projection of photosphere 220 falls within gridline, it is to avoid conductive thread is exposed to optical filtering portion 224 and affects optical filtering portion
224 go out light and appearance.Second conductive unit 232 includes some grid cells, in the present embodiment second
The conductive thread of each grid cell of conductive layer 230 correspondence can fall within a grid in the projection of filter layer 220
On the gridline of unit 223.In like manner, the conductive thread of the second conductive layer 230 is in the projection of filter layer 220
Also can not fall within gridline, the conductive thread of the second conductive layer 230 uses transparent material, or to its live width
It is defined ensureing the second conductive layer 230 visually-clear with grid node distance.
In another embodiment, the conductive thread of the first conductive layer 120 and the second conductive layer 230 is at filter layer
The projection of 220 all falls within gridline, it is to avoid conductive thread is exposed to optical filtering portion 224 and affects optical filtering portion 224
Go out light and appearance.It is appreciated that the conductive thread live width at this point for the first conductive layer 120, and
The distance of adjacent two grid nodes can be construed as limiting, it is possible to is not construed as limiting.Operate for convenience, can be limited
The conductive thread live width of one conductive layer 120, can further low conduction less than the gridline live width of light shielding part 222
Silk thread is exposed to the risk that gridline is lateral.
Wherein in an embodiment, as shown in Figure 3 and Figure 4, the conductive thread of the second conductive layer 230 with
The gridline of light shielding part 222 is wide, and the second conductive layer 230 can use exposure etching to make, and is making second
During the gridline of the conductive thread of conductive layer 230 and light shielding part 222, the exposure of same mask plate, erosion can be used
Scribe, it is not necessary to be directed at, reduce task difficulty.It is appreciated that the conduction of the second conductive layer 230
Silk thread width is also smaller than the gridline width of light shielding part 222.
Seeing Fig. 5 and 6, the first conductive layer 120 includes multiple grid cell, and grid cell can be the most polygon
Shape grid, such as square, rhombus, regular hexagon etc., it is also possible to be random grid, can be according to actual conditions
Working condition selects, and reduces production requirement.The conductive thread of the first conductive layer 120 can be straight line,
Curve, it is also possible to be broken line, can select according to actual conditions working condition, reduce production requirement.
The linear of wire silk thread being appreciated that the second conductive layer 230 can also be straight line, curve or broken line, institute
The shape of the grid cell constituted can be square, rhombus, regular hexagon etc., it is also possible to is random grid.
Wherein in an embodiment, as shown in Fig. 1, Fig. 5 and Fig. 7, polaroid 110 includes that polaroid is originally
Body 112, may also include impressing glue-line 114, and impressing glue-line 114 is arranged at polaroid body 112 side, the
One conductive layer 120 can use impressing mode to be formed at polaroid 110, specifically can be at impressing glue-line 114 away from partially
The side of mating plate body 112 imprints out the groove corresponding with the conductive pattern structure of the first conductive layer 120, then
Filling conductive material in groove and solidify prepared first conductive layer 120, the i.e. first conductive layer 120 is contained in recessed
Groove.
Impressing glue-line 114 is transparence, does not affect the transmitance of entirety.The material of impressing glue-line 114 specifically may be used
For solvent-free ultra-violet curing acryl resin, it is also possible to for On Visible Light Cured Resin or heat reactive resin.Impressing
The thickness of glue-line 114 can be 2 μm～10 μm, both can avoid because of impressing that glue-line 114 is the thinnest makes groove the most shallow,
And cause imprinting the first conductive layer 120 obtained and cross the thin electric conductivity that affects, also can avoid imprinting glue-line 114
Blocked up and cause polarizer component 100 blocked up.The present embodiment further groove degree of depth is less than the thickness of impressing glue-line 114
Degree, the conductive thread thickness of the first conductive layer 120 is not more than the degree of depth of groove, can avoid the first conductive layer 120
Exposed and be scraped off in subsequent technique.
In another embodiment, as shown in Fig. 6, Fig. 8 and Fig. 9, polaroid 110 also can only include polaroid
Body 112, does not include imprinting glue-line 114, and the first conductive layer 120 is directly arranged at polaroid body 112 1
Side, the first conductive layer 120 specifically by being coated with or plate conductive layer at polaroid body 112, then can expose etching
Mode prepare.
Second conductive layer 230 also by being coated with or can plate conductive layer, then prepared by the mode exposing etching.Second leads
Electric layer 230 may be disposed at the light shielding part 222 side away from transparent substrates 210, as Fig. 1, Fig. 3, Fig. 7,
Shown in Fig. 8 and Fig. 9.Second conductive layer 230 may also set up between light shielding part 222 and transparent substrates 210,
As shown in Figure 4.
Wherein in an embodiment, polarisation filtration module may also include substratum transparent (not shown in accompanying drawing),
Transparent substrates 210 passes through substratum transparent and polaroid away from the side of filter layer 220 and the second conductive layer 230
Assembly 100 is bonding.Specifically, transparent substrates 210 can be by substratum transparent and polaroid 110 away from
One side bonds of the first conductive layer 120, as illustrated in figures 1 and 8, it is also possible to be with inclined by substratum transparent
Mating plate 110 arranges a side bonds of the first conductive layer 120, as shown in figures 7 and 9.It is appreciated that
In other embodiments, polarisation filtration module also may not include substratum transparent, and transparent substrates 210 is by its other party
Formula is connected with polarizer component 100.
Above-mentioned polarisation filtration module, can realize touch operation, polarised light function and filtering functions simultaneously, as
An indispensable assembly in display screen, time in display screen, can directly make display screen have touch-control merit
Can, it is not necessary to assemble touch-screen the most on a display screen, not only contribute to reduce the thickness of electronic product, also simultaneously
It is greatly saved material and assembly cost.
The material that first conductive layer 120 and the second conductive layer 230 are selected only is expanded to transparent material by tradition
All suitable conductive materials；When metal material selected by conductive material, resistance and reduction can be substantially reduced
The energy consumption of touch-screen.
The above-mentioned polarisation filtration module with touch controllable function is bilayer conductive structure, it is not necessary to carry out design of putting up a bridge,
It is substantially reduced task difficulty.Use above-mentioned polarisation filtration module, liquid crystal display (Liquid Crystal can be reduced
Display, LCD) signal disturbing to touch-control effect.
Present invention also offers a kind of touch display screen, can be straight-down negative or the liquid crystal of side entering type light source
Display screen.Touch TFT electrode, Liquid Crystal Module and above-mentioned polarisation filtration module that display screen includes stacking gradually.
Owing to polarisation filtration module has touch operation, polarised light function and filtering functions simultaneously, make touch display screen
There is touch display function.Not only contribute to reduce the thickness of electronic product, be the most also greatly saved material
And assembly cost.
Additionally, present invention also offers a kind of polarisation filtration module preparation method, as shown in Figure 10, including with
Lower step:
Step S110: form the first conductive layer in polaroid side, obtain polarizer component.
First conductive layer includes the first conductive unit that multiple parallel interval in the first direction is arranged, each first
Conductive unit is intersected by conductive thread and is formed.First conductive unit can be obtained by break line treatment, or
Directly it is imprinted with the groove of predetermined pattern to refill conductive material and obtain.
Wherein in an embodiment, step S110 can comprise the following steps that
At polaroid body side coating impressing glue, obtain imprinting glue-line.Polaroid body and impressing glue-line structure
Become polaroid.
Impressing glue-line is imprinted away from the side of polaroid body and solidifies, obtains groove.
In groove, fill conductive material and solidify, forming the first conductive layer, obtain polarizer component.
I.e. in the present embodiment, polaroid includes polaroid body and is arranged at the impressing glue of polaroid body side
Layer, the first conductive layer is contained in the impressing glue-line side away from polaroid body.
Impressing glue-line is transparence, does not affect the transmitance of entirety.The material of impressing glue-line is concretely without molten
Agent ultra-violet curing acryl resin, it is also possible to for On Visible Light Cured Resin or heat reactive resin.Impressing glue-line
Thickness can be 2 μm～10 μm, both can avoid because of impressing that glue-line is the thinnest makes groove the most shallow, and causes imprinting
To the first conductive layer cross and thin affect electric conductivity, also can avoid imprinting glue-line blocked up and cause polarizer component
Blocked up.The present embodiment further groove degree of depth is less than the thickness of impressing glue-line, the conductive thread thickness of the first conductive layer
It is not more than the degree of depth of groove, the first conductive layer can be avoided exposed and be scraped off in subsequent technique.
In another embodiment, step S110 can also be directly to be coated with or plating conductive layer at polaroid body, then
The mode of exposure etching forms the first conductive layer, i.e. polaroid and does not include imprinting glue-line.
Step S120: utilize mask plate to use exposure etching technique, form filter layer in transparent substrates the same side
With the second conductive layer, obtain optical filter box.
Filter layer includes light shielding part and optical filtering portion, and light shielding part is intersected by gridline and formed, and gridline is mutual
Intersect to form multiple grid cell；Optical filtering portion includes that multiple filter unit, each filter unit are contained in correspondence
A grid cell in；Second conductive layer includes that the second conduction that multiple parallel interval in a second direction is arranged is single
Unit, each second conductive unit is intersected by conductive thread and is formed, and the second conductive unit equally can be by disconnected
Line processes and obtains.
Transparent substrates can be glass, polymethyl methacrylate (PMMA) or polyethylene terephthalate
The optically transparent materials such as ester (PET) are made.In the present embodiment, transparent substrates is substrate of glass, it is possible to decrease produce
Cost.Light shielding part is the photoresist with black dyes, and it can use exposure, development to form specific figure
Case.Optical filtering portion is the photoresist with coloured dye, equally uses exposure, development to form specific figure
Case.Optical filtering portion includes that many dry red (red, R) filter units of periodic arrangement, green (green, G) filter
Unit and indigo plant (blue, B) filter unit, be used for making incident light be transformed into monochromatic light, it is achieved filtering functions.
First conductive layer and the second conductive layer can be nesa coating, such as tin indium oxide (ITO) film, or are
The reticulated conductive layer that conductive thread interlocks, conductive thread can be metal simple-substance line, metal alloy wire,
At least one in carbon nano tube line, Graphene line, organic conductive macromolecule line or tin indium oxide (ITO) line.
In the present embodiment, the conductive thread of the first conductive layer and the second conductive layer is metal simple-substance line, such as silver wire,
Electric conductivity can be improved.
First direction is not parallel to each other with second direction, and the first conductive unit and the second conductive unit are at thickness direction
Insulation forms Inductance and Capacitance.The interval width of two the first adjacent conductive units can be 0.5 micron to 50 microns,
The interval width of two the second adjacent conductive units is alternatively 0.5 micron to 50 microns.
Wherein in an embodiment, the conductive thread of the first conductive layer and the second conductive layer intersects formation
Grid node, the conductive thread live width of the first conductive layer is 0.2 micron～5 microns, and adjacent two grids joint
The distance of point is 50 microns～800 microns, to ensure the first conductive layer visually-clear, i.e. ensures visible light transmission
Rate is more than 80%, and now the first conductive layer conductive thread can fall within gridline in the projection of filter layer, it is possible to
Do not fall within gridline.In the present embodiment, the conductive thread of the second conductive layer falls within grid in the projection of filter layer
On line, it is to avoid conductive thread be exposed to optical filtering portion and affect optical filtering portion go out light and appearance.In like manner,
The conductive thread of two conductive layers also can not fall within gridline in the projection of filter layer, the conduction of the second conductive layer
Silk thread uses transparent material, or is defined ensureing that the second conductive layer regards to its live width and grid node distance
Feel transparent.
In another embodiment, the conductive thread of the first conductive layer and the second conductive layer is equal in the projection of filter layer
Fall within gridline, it is to avoid conductive thread be exposed to optical filtering portion and affect optical filtering portion go out light and appearance.
It is appreciated that the conductive thread live width at this point for the first conductive layer, and the distance of adjacent two grid nodes
Can be construed as limiting, it is possible to be not construed as limiting.Operate for convenience, the conductive thread live width of the first conductive layer can be limited
Less than the gridline live width of light shielding part, the risk that gridline is lateral can be exposed to by further low conductive thread.
Wherein in an embodiment, the conductive thread of the second conductive layer is wide with the gridline of light shielding part, the
Two conductive layers can use exposure etching to make, and is making conductive thread and the grid of light shielding part of the second conductive layer
During line, the exposure of same mask plate, etching can be used to prepare, it is not necessary to be directed at, reduce task difficulty.
It is appreciated that the conductive thread width of the second conductive layer is also smaller than the gridline width of light shielding part.
First conductive layer includes multiple grid cell, and grid cell can be regular polygon grid, as square,
Rhombus, regular hexagon etc., it is also possible to be random grid, can select according to actual conditions working condition,
Reduce production requirement.The conductive thread of the first conductive layer can be straight line, curve, it is also possible to is broken line,
Can select according to actual conditions working condition, reduce production requirement.It is appreciated that the second conductive layer
The linear of wire silk thread can also be straight line, curve or broken line, the shape of the grid cell constituted can be
Square, rhombus, regular hexagon etc., it is also possible to be random grid.
Second conductive layer also by being coated with or can plate conductive layer, then prepared by the mode exposing etching.Second conductive layer
The light shielding part side away from transparent substrates can be formed at, it is possible to be formed between light shielding part and transparent substrates.
Wherein in an embodiment, the second conductive layer is formed at the light shielding part side away from transparent substrates, step
Rapid S120 can comprise the following steps that
Step 1: in the transparent substrates one whole topcoating of side surface or plating with the photoresist of black dyes, obtain initial
Light shield layer.
Step 2: at the plating of whole of initial light shield layer surface or painting conductive material, obtain initial conductive layer.
Step 3: be coated with the first photoresist layer on initial conductive layer surface, utilizes the gridline pattern with light shielding part
The first corresponding mask plate is exposed development to the first photoresist layer.
Step 4: be etched initial conductive layer, obtains initial second conductive layer.Initial second conductive layer
The pattern of conductive pattern and the first mask plate is consistent, and initial second conductive layer includes some grid cells.
Step 5: initial light shield layer is etched, obtains light shielding part.The gridline pattern of light shielding part and first
The pattern of mask plate is consistent.
Due to the conductive pattern of initial second conductive layer and light shielding part gridline pattern all with the first mask plate
Pattern is consistent, and the conductive thread of each grid cell of the most initial second conductive layer is in the throwing of described filter layer
Shadow correspondence falls within the gridline of grid cell described in
Step 6: be coated with the second photoresist layer at initial second conductive layer surface, utilization is disconnected with the second conductive layer
The second mask plate that line position is corresponding is exposed development to the second photoresist layer.
Step 7: be etched initial second conductive layer, is divided into multiple parallel by initial second conductive layer
Every the second conductive unit arranged, obtain the second conductive layer.
Step 8: plate or be coated with filter unit successively in the grid cell of the gridline composition of light shielding part, form filter
Light portion, obtains filter layer.Transparent substrates, the second conductive layer and filter layer i.e. constitute optical filter box.
The most also transparent substrates one side surface can be carried out plasma treatment, remove the dirty of its surface
Dirt, and make surface ionizing, increase follow-up and other material cohesive force.Initial light shield layer is formed at transparent
Substrate surface after plasma treatment.
In another embodiment, the second conductive layer is formed between light shielding part and transparent substrates, and step S120 can be wrapped
Include following steps:
Step 1: at the plating of whole of transparent substrates one side surface or painting conductive material, obtain initial conductive layer.
Step 2: in the whole topcoating in initial conductive layer surface or plating with the photoresist of black dyes, initially hidden
Photosphere.
Step 3: utilize the mask plate corresponding with the conductive pattern of the second conductive layer that initial light shield layer is exposed
Development.
Step 4: initial light shield layer is etched, obtains light shielding part.
Step 5: initial conductive layer is etched, conductive layer is divided into that multiple parallel interval is arranged second
Conductive unit, obtains the second conductive layer.The gridline pattern of light shielding part and the conductive pattern one of the second conductive layer
Cause, i.e. light shielding part has been also carried out break line treatment.
Step 6: plate or be coated with filter unit successively in the grid cell of the gridline composition of light shielding part, form filter
Light portion, obtains filter layer.Transparent substrates, the second conductive layer and filter layer i.e. constitute optical filter box.
In like manner, the most also transparent substrates one side surface can be carried out plasma treatment, remove its table
Face dirty, and make surface ionizing, increases follow-up with other material cohesive force.Conductive layer is formed at
Bright substrate surface after plasma treatment.
Step S130: transparent substrates is connected with polarizer component away from the side of filter layer and the second conductive layer,
Obtain polarisation filtration module.
Specifically, can transparent substrates away from filter layer and the second conductive layer side be coated with add binder, pass through
Binder is bonding with polarizer component, and transparent substrates can be to glue away from the side of the first conductive layer with polaroid
Connect, it is also possible to be that one side bonds of the first conductive layer is set with polaroid.It is appreciated that in other embodiments
In, transparent substrates also can be connected with polarizer component by other means.
By above-mentioned polarisation filtration module preparation method prepare polarisation filtration module, can realize simultaneously touch operation,
Polarised light function and filtering functions, as an assembly indispensable in display screen, time in display screen,
Can directly make display screen have touch controllable function, it is not necessary to assemble touch-screen the most on a display screen, not only contribute to fall
The thickness of low electronic product, is the most also greatly saved material and assembly cost.
Below several embodiments of polarisation filtration module preparation method are described in detail.
The polarisation filtration module with touch control operation function as shown in Figure 1 and Figure 7, when the first conductive layer 120
Using impressing mode to prepare, the second conductive layer 230 is covered in light shielding part 222 away from the one of transparent substrates 210
Side, and when light shielding part 222 is complete grid, its manufacturing process is as follows:
(1) at a surface coating impressing glue-line 114 of polaroid body 112, the present embodiment can use
PMMA(polymethylmethacrylate, polymethyl methacrylate) UV solidifies resin, and with
The impression block that the conductive pattern of the first conductive layer 120 is nested carries out imprinting also on impressing glue-line 114 surface
Solidification, obtains the groove for housing the first conductive layer 120.
(2) in groove, fill conductive material and solidify, obtaining separate, the first conductive unit of insulation
(conductive material can be metal simple-substance or alloy, CNT, Graphene, organic conductive macromolecule or ITO.
It is preferably metal, such as nanometer silver paste), obtain the polarizer component 100 with the first conductive layer 120.
(3) Plasma(plasma process is first carried out on a surface of transparent substrates 210) process, remove
Transparent substrates 210 surface dirty, and make surface ionizing, increases follow-up with other material cohesive force.
(4) in the whole topcoating/plating in the above-mentioned treated surface of transparent substrates 210 with the photoetching of black dyes
Glue, obtains initial light shield layer.
(5) at whole of initial light shield layer surface plating conductive material or be coated with one layer of conductive ink (conductive material or lead
Electricity ink can be metal simple-substance, metal alloy, CNT, Graphene, organic conductive macromolecule or ITO.
The present embodiment is argent), obtain conductive layer.
(6) it is coated with the first photoresist layer at conductive layer surface, utilizes the gridline pattern pair with light shielding part 222
First photoresist layer is exposed, develops by the first mask plate answered.Face covers and hides the most on the electrically conductive
The photoresist that the gridline pattern in light portion 222 is consistent, the photoresist in other place removes.
(7) utilize lithographic technique that conductive layer is etched, obtain the gridline pattern one with light shielding part 222
Initial second conductive layer (conductive pattern of the most initial second conductive layer and the pattern one of the first mask plate caused
Causing, the conductive thread of initial second conductive layer is complete, does not carries out break line treatment).
(8) utilize lithographic technique that initial light shield layer is etched, obtain light shielding part 222.Because to conduction
Layer and initial light shield layer are all to utilize the first photoresist layer to do mask layer when etching, so initial second conductive layer
Conductive pattern is consistent with the gridline pattern of light shielding part 222.
(9) again in the initial second conductive layer surface coating second consistent with the gridline pattern of light shielding part 222
Photoresist layer, with second mask plate corresponding with the broken position of the second conductive layer 230 to the second photoresist layer
It is exposed, develops, initial second conductive layer needs the photoresist in broken string region remove.
(10) utilize lithographic technique that the second conductive layer is etched again, it would be desirable to leading at broken string region
Electric material etches away, and forms separate, the second conductive unit of insulation, obtains the second conductive layer 230.
(11) plate/coat R/G/B filter unit more by several times in corresponding region, thus obtain with the second conduction
The optical filter box 200 of layer 230.
(12) by the polarizer component 100 with the first conductive layer 120 with the second conductive layer 230
Optical filter box 200 is bondd by transparent adhesive and solidifies, and obtains having the inclined of touch control operation function
Light filtration module.
With continued reference to Fig. 1 and Fig. 7, there is the polarisation filtration module of touch control operation function, the first conductive layer 120
Using impressing mode to prepare, the second conductive layer 230 is covered in light shielding part 222 away from the one of transparent substrates 210
Side, and the conductive pattern of the gridline pattern of light shielding part 222 and the second conductive layer 230 is consistent, is also carried out breaking
When line processes, its manufacturing process is as follows:
(1) surface coating impressing glue-line 114(the present embodiment at polaroid body 112 uses PMMA
UV solidifies resin), and the impression block being nested with the conductive pattern with the first conductive layer 120 is at impressing glue
Layer 114 surface imprint and solidify, and obtain the groove for housing the first conductive layer 120.
(2) in groove, fill conductive material and solidify, obtaining separate, the first conductive unit of insulation
(conductive material can be metal simple-substance, metal alloy, CNT, Graphene, organic conductive macromolecule
Or ITO.It is preferably metal, such as nanometer silver paste), obtain the polarizer component 100 with the first conductive layer 120.
(3) first carry out Plasma process on a surface of transparent substrates 210, remove transparent substrates 210
Surface dirty, and make surface ionizing, increases follow-up with other material cohesive force.
(4) in the whole topcoating/plating in the above-mentioned treated surface of transparent substrates 210 with the photoetching of black dyes
Glue, obtains initial light shield layer.
(5) whole of initial light shield layer surface plating conductive material plating or be coated with one layer of conductive ink (conductive material or
Conductive ink can be metal simple-substance, metal alloy, CNT, Graphene, organic conductive macromolecule or
ITO.The present embodiment is argent), obtain conductive layer.
(6) at conductive layer surface coating photoresist layer, utilize corresponding with the conductive pattern of the second conductive layer 230
Mask plate photoresist layer is exposed, develops again, the most on the electrically conductive face cover with the second conductive layer 230
The consistent photoresist of conductive pattern shape, the photoresist in other place removes (including region of breaking).
(7) utilize lithographic technique that conductive layer is etched, form the second conduction separate, insulation single
Unit, obtains the second conductive layer 230.
(8) utilize lithographic technique that initial light shield layer is etched, obtain and the conduction of the second conductive layer 230
The light shielding part 222 that pattern is consistent.Because conductive layer and initial light shield layer are utilized same photoetching when being etched
Glue-line does mask layer, and light shielding part 222 has been also carried out break line treatment.
(9) plate/coat R/G/B filter unit by several times in corresponding region again, thus obtain with the second conductive layer
The optical filter box 200 of 230.
(10) by the polarizer component 100 with the first conductive layer 120 with the second conductive layer 230
Optical filter box 200 is bondd by transparent adhesive and solidifies, and obtains having the inclined of touch control operation function
Light filtration module.
The above-mentioned polarisation filtration module with touch control operation function, the first conductive layer uses impressing mode to prepare,
Second conductive layer is covered between light shielding part and transparent substrates, and the gridline pattern of light shielding part and second conducts electricity
The conductive pattern of layer is consistent, and when being also carried out break line treatment, its manufacturing process is as follows:
(1) at surface of polaroid body coating impressing glue-line, (the present embodiment uses PMMA UV solid
Change resin), and the impression block being nested with the conductive pattern with the first conductive layer carries out at impressing film surface
Imprint and solidify, obtaining the groove for housing the first conductive layer.
(2) in groove, fill conductive material and solidify, obtaining separate, the first conductive unit of insulation
(conductive material can be metal simple-substance, metal alloy, CNT, Graphene, organic conductive macromolecule
Or ITO.It is preferably metal, such as nanometer silver paste), just obtain the polarizer component with the first conductive layer.
(3) first carry out Plasma process on a surface of transparent substrates, remove the dirty of transparent substrates surface,
And make surface ionizing, increase follow-up and other material cohesive force.
(4) state whole of treated surface plating conductive material on a transparent substrate or be coated with one layer of conductive ink
(conductive material or conductive ink can be metal simple-substance, metal alloy, CNT, Graphene, organic
Conducting polymer or ITO.The present embodiment is argent), obtain conductive layer.
(5) in the whole topcoating/plating of conductive layer surface with the photoresist of black dyes, initial light shield layer is obtained.
(6) utilize the mask plate corresponding with the conductive pattern of the second conductive layer that initial light shield layer is exposed,
Developing, (now light shielding part is carried out to obtain the light shielding part consistent with the conductive pattern shape of the second conductive layer again
Break line treatment, because being to be etched using light shielding part as mask layer when forming the second conductive layer, if light shielding part is not
Carry out break line treatment and can block conductive layer, conductive layer can be made to cannot be carried out break line treatment).
(7) utilize lithographic technique that conductive layer is etched, form the second conduction separate, insulation single
Unit, obtains the second conductive layer.
(8) plate/coat R/G/B filter unit by several times in corresponding region again, thus obtain with the second conductive layer
Optical filter box.
(9) will pass through with the polarizer component of the first conductive layer and the optical filter box with the second conductive layer
Transparent adhesive bonds and solidifies, and obtains the polarisation filtration module with touch control operation function.
Embodiment described above only have expressed the several embodiments of the present invention, and it describes more concrete and detailed,
But therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that, for this area
Those of ordinary skill for, without departing from the inventive concept of the premise, it is also possible to make some deformation and
Improving, these broadly fall into protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be with appended
Claim is as the criterion.
Claims (20)
1. a polarisation filtration module, it is characterised in that including:
Polarizer component, including polaroid, and is arranged at the first conductive layer of described polaroid side, described
First conductive layer includes the most spaced multiple first conductive unit；
Optical filter box, including transparent substrates, and is positioned at the filter layer and second of described transparent substrates the same side
Conductive layer, described filter layer includes light shielding part and optical filtering portion, and described light shielding part is intersected by gridline and formed,
Described gridline intersects and forms multiple grid cells；Described optical filtering portion includes multiple filter unit, each
Described filter unit is contained in grid cell described in corresponding one；Described second conductive layer includes multiple along
The second conductive unit that two direction parallel interval are arranged, each described second conductive unit is mutual by conductive thread
Intersecting to form, described second conductive unit includes some grid cells；
Described first direction is not parallel to each other with second direction, and described first conductive unit and the second conductive unit exist
Thickness direction insulation forms Inductance and Capacitance；The conductive thread of each grid cell of described second conductive layer is in institute
The projection correspondence stating filter layer falls within the gridline of grid cell described in；Described second conductive layer is arranged at
Described light shielding part away from the side of described transparent substrates, or be arranged at described light shielding part and described transparent substrates it
Between；The conductive thread of described second conductive layer is positioned at described light shielding part and the cavity volume of optical filtering portion composition.
Polarisation filtration module the most according to claim 1, it is characterised in that described second conductive layer
Conductive thread is wide with described gridline.
Polarisation filtration module the most according to claim 1, it is characterised in that described first conductive unit
Being intersected by conductive thread and formed, the conductive thread of described first conductive layer is equal in the projection of described filter layer
Fall within described gridline.
Polarisation filtration module the most according to claim 1, it is characterised in that described polaroid includes partially
Mating plate body and be arranged at the impressing glue-line of described polaroid body side, described impressing glue-line away from described partially
The side of mating plate body offers groove, and described first conductive layer is contained in described groove.
Polarisation filtration module the most according to claim 4, it is characterised in that the degree of depth of described groove is little
In the thickness of described impressing glue-line, the conductive thread thickness of described first conductive layer is not more than the deep of described groove
Degree.
Polarisation filtration module the most according to claim 1, it is characterised in that two adjacent described
The interval width of one conductive unit is 0.5 micron～50 microns, between two adjacent described second conductive units
It it is 0.5 micron～50 microns every width.
Polarisation filtration module the most according to claim 1, it is characterised in that also include substratum transparent,
Described transparent substrates away from described filter layer and the second conductive layer side by described substratum transparent with described partially
Light chip module is bonding.
8. a polarisation filtration module, it is characterised in that including:
Polarizer component, including polaroid, and is arranged at the first conductive layer of described polaroid side, described
First conductive layer includes the first conductive unit that multiple parallel interval in the first direction is arranged, each described first
Conductive unit is intersected by conductive thread and is formed, and described conductive thread intersects formation grid node；
Optical filter box, including transparent substrates, and is positioned at the filter layer and second of described transparent substrates the same side
Conductive layer, described filter layer includes light shielding part and optical filtering portion, and described light shielding part is intersected by gridline and formed,
Described gridline intersects and forms multiple grid cells；Described optical filtering portion includes multiple filter unit, each
Described filter unit is contained in grid cell described in corresponding one；Described second conductive layer includes multiple along
The second conductive unit that two direction parallel interval are arranged, each described second conductive unit is mutual by conductive thread
Intersect to form；
Described first direction is not parallel to each other with second direction, and described first conductive unit and the second conductive unit exist
Thickness direction insulation forms Inductance and Capacitance；The conductive thread live width of described first conductive layer is 0.2 micron～5 micro-
Rice, and the distance of adjacent two grid nodes is 50 microns～800 microns；The conductive filament of described second conductive layer
Line falls within described gridline in the projection of described filter layer；Described second conductive layer is arranged at described light shielding part
Away from the side of described transparent substrates, or it is arranged between described light shielding part and described transparent substrates；Described
The conductive thread of two conductive layers is positioned at described light shielding part and the cavity volume of optical filtering portion composition.
Polarisation filtration module the most according to claim 8, it is characterised in that described second conductive layer
Conductive thread is wide with described gridline.
Polarisation filtration module the most according to claim 8, it is characterised in that described polaroid includes
Polaroid body and the impressing glue-line being arranged at described polaroid body side, described impressing glue-line is away from described
The side of polaroid body offers groove, and described first conductive layer is contained in described groove.
11. polarisation filtration module according to claim 10, it is characterised in that the degree of depth of described groove
Less than the thickness of described impressing glue-line, the conductive thread thickness of described first conductive layer is not more than described groove
The degree of depth.
12. polarisation filtration module according to claim 8, it is characterised in that two adjacent described
The interval width of the first conductive unit is 0.5 micron～50 microns, two adjacent described second conductive units
Interval width is 0.5 micron～50 microns.
13. polarisation filtration module according to claim 8, it is characterised in that also include substratum transparent,
Described transparent substrates away from described filter layer and the second conductive layer side by described substratum transparent with described partially
Light chip module is bonding.
14. 1 kinds touch display screen, it is characterised in that include TFT electrode, the Liquid Crystal Module stacked gradually
And the polarisation filtration module as described in any one in claim 1 to 13.
15. 1 kinds of polarisation filtration module preparation methods, it is characterised in that comprise the following steps:
Form the first conductive layer in polaroid side, obtain polarizer component；Described first conductive layer includes many
The first conductive unit that individual parallel interval in the first direction is arranged, each described first conductive unit is by conductive filament
Line intersects formation；
Utilize mask plate to use exposure etching technique, form filter layer and the second conduction in transparent substrates the same side
Layer, obtains optical filter box；Described filter layer includes light shielding part and optical filtering portion, and described light shielding part is by gridline
Intersect formation, and described gridline intersects and forms multiple grid cells；Described optical filtering portion includes multiple
Filter unit, each described filter unit is contained in grid cell described in corresponding one；Described second conduction
Layer includes the second conductive unit that multiple parallel interval in a second direction is arranged, each described second conductive unit
Intersected by conductive thread and formed；Described first direction is not parallel to each other with second direction, described first conduction
Unit and the second conductive unit form Inductance and Capacitance in thickness direction insulation；The conductive filament of described second conductive layer
Line falls within described gridline in the projection of described filter layer；Described second conductive layer is arranged at described light shielding part
Away from the side of described transparent substrates, or it is arranged between described light shielding part and described transparent substrates；Described
The conductive thread of two conductive layers is positioned at described light shielding part and the cavity volume of optical filtering portion composition；
Described transparent substrates is connected with described polarizer component away from the side of described filter layer and the second conductive layer
Connect, obtain polarisation filtration module.
16. polarisation filtration module preparation methods according to claim 15, it is characterised in that described
Polaroid side forms the first conductive layer, and the step obtaining polarizer component comprises the following steps:
At polaroid body side coating impressing glue, obtain imprinting glue-line；Described polaroid body and impressing glue
Layer constitutes described polaroid；
Described impressing glue-line is imprinted away from the side of described polaroid body and solidifies, obtains groove；
In described groove, fill conductive material and solidify, forming described first conductive layer, obtain described polarisation
Chip module.
17. polarisation filtration module preparation methods according to claim 15, it is characterised in that described profit
Use exposure etching technique with mask plate, form filter layer and the second conductive layer in transparent substrates the same side,
Step to optical filter box comprises the following steps:
In the described transparent substrates one whole topcoating of side surface or plating with the photoresist of black dyes, initially hidden
Photosphere；
At the plating of whole of described initial light shield layer surface or painting conductive material, obtain initial conductive layer；
It is coated with the first photoresist layer on described initial conductive layer surface, utilizes the grid line chart with described light shielding part
First mask plate corresponding to case is exposed development to described first photoresist layer；
Described initial conductive layer is etched, obtains initial second conductive layer；Described initial second conductive layer
Conductive pattern consistent with the pattern of described first mask plate；
Described initial light shield layer is etched, obtains light shielding part；The gridline pattern of described light shielding part and institute
The pattern stating the first mask plate is consistent；
It is coated with the second photoresist layer at described initial second conductive layer surface, utilizes and described second conductive layer
Second mask plate corresponding to broken position is exposed development to described second photoresist layer；
Described initial second conductive layer is etched, described initial second conductive layer is divided into multiple parallel
Spaced second conductive unit, obtains described second conductive layer；
In the grid cell that the gridline of described light shielding part is constituted, plate or be coated with filter unit successively, formed and filter
Portion, obtains described filter layer；Described transparent substrates, the second conductive layer and filter layer i.e. constitute described optical filter
Assembly.
18. polarisation filtration module preparation methods according to claim 17, it is characterised in that described
The described transparent substrates one whole topcoating of side surface or plating, with the photoresist of black dyes, obtain initial light shield layer
Before step, comprise the following steps:
Described transparent substrates one side surface is carried out plasma treatment；Described initial light shield layer is formed at described
Bright substrate surface after described plasma treatment.
19. polarisation filtration module preparation methods according to claim 15, it is characterised in that described profit
Use exposure etching technique with mask plate, form filter layer and the second conductive layer in transparent substrates the same side,
Step to optical filter box comprises the following steps:
At the plating of whole of described transparent substrates one side surface or painting conductive material, obtain initial conductive layer；
In the whole topcoating in described initial conductive layer surface or plating with the photoresist of black dyes, obtain initial shading
Layer；
Utilize the mask plate corresponding with the conductive pattern of described second conductive layer that described initial light shield layer is exposed
Photodevelopment；
Described initial light shield layer is etched, obtains described light shielding part；
Described initial conductive layer is etched, described conductive layer is divided into that multiple parallel interval is arranged
Two conductive units, obtain described second conductive layer；The gridline pattern of described light shielding part and described second conduction
The conductive pattern of layer is consistent；
In the grid cell that the gridline of described light shielding part is constituted, plate or be coated with filter unit successively, formed and filter
Portion, obtains described filter layer；Described transparent substrates, the second conductive layer and filter layer i.e. constitute described optical filter
Assembly.
20. polarisation filtration module preparation methods according to claim 19, it is characterised in that described
The plating of whole of transparent substrates one side surface or painting conductive material, before obtaining the step of conductive layer, including following step
Rapid:
Described transparent substrates one side surface is carried out plasma treatment；Described conductive layer is formed at described transparent base
Surface after described plasma treatment, the end.
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| CN103744567A (en) * | 2014-01-10 | 2014-04-23 | 深圳市宇顺电子股份有限公司 | Method for manufacturing capacitive touch screen and touch-control layer, and electronic device |
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| KR100835920B1 (en) * | 2001-12-27 | 2008-06-09 | 엘지디스플레이 주식회사 | Liquid Crystal Display Panel Associated With Touch Panel |
| CN103106953B (en) * | 2013-02-06 | 2014-11-26 | 南昌欧菲光科技有限公司 | Conducting film and preparation method thereof and touch screen comprising the same |
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| EP2527961A1 (en) * | 2010-03-25 | 2012-11-28 | Winsky Technology Limited | Touch Panel |
| CN103135292A (en) * | 2011-11-30 | 2013-06-05 | 乐金显示有限公司 | Liquid crystal display device having touch screen |
| CN202886785U (en) * | 2012-11-06 | 2013-04-17 | 北京京东方光电科技有限公司 | Capacitive touch array substrate and liquid crystal panel |
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