Embodiment
For above-mentioned purpose of the present utility model, feature and advantage can be become apparent more, below in conjunction with accompanying drawing, embodiment of the present utility model is described in detail.A lot of details have been set forth in the following description so that fully understand the utility model.But the utility model can be implemented much to be different from alternate manner described here, those skilled in the art can be in the situation that do similar improvement without prejudice to the utility model intension, so the utility model is not subject to the restriction of following public concrete enforcement.
It should be noted that, when element is called as " being fixed in " another element, can directly can there be element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be directly connected to another element or may have centering elements simultaneously.
Unless otherwise defined, all technology that this paper is used are identical with the implication that belongs to the common understanding of those skilled in the art of the present utility model with scientific terminology.The term used in instructions of the present utility model herein, just in order to describe the purpose of specific embodiment, is not intended to be restriction the utility model.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
A kind of polarisation optical filtering module, as shown in Figures 1 to 4, comprise polaroid assembly 100 and optical filter box 200.
Polaroid assembly 100 comprises polaroid 110 and the first transparent conductive layer 120, the first conductive layer 120 is arranged at polaroid 110 1 sides, the first conductive layer 120 comprises a plurality of the first conductive units 122 that arrange along the first direction parallel interval, the first conductive unit 122 is transparent list structure, can reduce task difficulty.The first conductive unit 122 can obtain by etch processes.
Optical filter box 200 comprises transparent substrates 210, and be positioned at filter layer 220 and second conductive layer 230 of transparent substrates 210 the same sides, filter layer 220 comprises light shielding part 222 and filter unit 224, and light shielding part 222 is intersected to form mutually by gridline, and gridline intersects to form a plurality of grid cells 223 mutually; Filter unit 224 comprises a plurality of filter units 225, and each filter unit 225 is contained in a corresponding grid cell 223; The second conductive layer 230 comprises a plurality of the second conductive units 232 that arrange along the second direction parallel interval, and each second conductive unit 232 is intersected to form mutually by conductive thread, and the second conductive unit 232 can be processed and obtain by broken string.
First direction and second direction are not parallel to each other, and the first conductive unit 122 and the second conductive unit 232 form Inductance and Capacitance in the thickness direction insulation.The conductive thread of the second conductive layer 230 falls within on gridline in the projection of filter layer 220, avoids conductive thread to be exposed to filter unit 224 and affects bright dipping and the appearance effect of filter unit 224.
Transparent substrates 210 can be the optically transparent materials such as glass, polymethylmethacrylate (PMMA) or polyethylene terephthalate (PET) and makes.In the present embodiment, transparent substrates 210 is substrate of glass, can reduce production costs.Light shielding part 222 is the photoresist with black dyes, and it can adopt exposure, developing forms specific pattern.Filter unit 224 is the photoresist with coloured dye, can adopt equally exposure, development to form specific pattern.Filter unit 224 comprises red (red, R) filter unit, green (green, G) filter unit and indigo plant (blue, the B) filter unit of some periodic arrangement, for making incident light, is transformed into monochromatic light, realizes filtering functions.
In the present embodiment, the first conductive layer 120 can be the conductive layer of tin indium oxide (ITO) material, also can adopt other conductive materials in other embodiments, as long as meet transparent.The conductive thread of the second conductive layer 230 can be at least one in metal simple-substance line, metal alloy wire, carbon nano tube line, Graphene line, organic conductive macromolecule line or ITO line.In the present embodiment, the conductive thread of the second conductive layer 230 is the metal simple-substance line, and for example silver-colored line, can improve electric conductivity.The interval width of two adjacent the first conductive units 122 can be 0.5 micron to 50 microns, and the interval width of two adjacent the second conductive units 232 also can be 0.5 micron to 50 microns.
Therein in embodiment, the conductive thread of the second conductive layer 230 intersects to form grid node mutually, the conductive thread live width of the second conductive layer 230 is 0.2 micron~5 microns, and adjacent two grid nodes the distance be 50 microns~500 microns, to guarantee the second conductive layer 230 visually-clear., can further avoid conductive thread to be exposed to filter unit 224 and affect bright dipping and the appearance effect of filter unit 224 when the projection of filter layer 220 falls within on gridline when the conductive thread of the second conductive layer 230.
The first conductive layer 120 specifically can pass through to be coated with or the plating conductive layer in polaroid 110 1 sides, then prepared by etched mode.
Therein in embodiment, the gridline of the conductive thread of the second conductive layer 230 and light shielding part 222 is wide, as shown in Figure 3 and Figure 4, the second conductive layer 230 can adopt equally and be coated with or the plating conductive layer, again prepared by etched mode, when the gridline of the conductive thread of making the second conductive layer 230 and light shielding part 222, can adopt same mask plate exposure, etching to make, without being aimed at, reduced task difficulty.Be appreciated that the conductive thread width of the second conductive layer 230 also can be less than the gridline width of light shielding part 222.
The second conductive layer 230 can be arranged at the side of light shielding part 222 away from transparent substrates 210, as shown in Fig. 1, Fig. 3 and Fig. 6.The second conductive layer 230 also can be arranged between light shielding part 222 and transparent substrates 210, as shown in Fig. 4, Fig. 5 and Fig. 7.
In embodiment, polarisation optical filtering module also can comprise substratum transparent (not shown in accompanying drawing) therein, and transparent substrates 210 is bonding by substratum transparent and polaroid assembly 100 away from a side of filter layer 220 and the second conductive layer 230.Particularly, transparent substrates 210 can be the side bonds away from the first conductive layer 120 by substratum transparent and polaroid 110, as shown in Figure 1 and Figure 5, can be also that a side bonds of the first conductive layer 120 is set by substratum transparent and polaroid 110, as shown in Figure 6 and Figure 7.Be appreciated that in other embodiments, polarisation optical filtering module also can not comprise substratum transparent, and transparent substrates 210 is connected with polaroid assembly 100 by other means.
Below wherein several embodiment of polarisation optical filtering module making method is elaborated.
The polarisation optical filtering module that there is the touch control operation function as shown in Fig. 1 and Fig. 6, the first conductive layer 120 passes through to be coated with/plating layer of transparent conductive material, then obtains through etching; The second conductive layer 230 is covered in the surface of light shielding part 222 away from transparent substrates 210 1 sides, and light shielding part 222 is while being complete grid, and its manufacturing process is as follows:
(1) at whole of the surface plating layer of transparent conductive material of polaroid 110 or be coated with the layer of transparent conductive ink and solidify that (conductive material or conductive ink can be Graphene, electrically conducting transparent macromolecular material, nano metal line ink or ITO etc., solidify after-vision transparent.The present embodiment plating one deck ITO), form conductive layer.
(2) be coated with the first photoresist layer, utilize first mask plate corresponding with the conductive pattern of the first conductive layer 120 to be exposed, develop again the first photoresist layer, only on conductive layer, cover the photoresist corresponding with the conductive pattern of the first conductive layer 120, other local photoresist is removed.
(3) utilize lithographic technique to carry out etching to conductive layer, obtain the first conductive unit separate, insulation, thereby obtain the polaroid assembly 100 with the first conductive layer 120.
(4) at first carry out the Plasma(plasma process on a surface of transparent substrates 210) process, remove the dirty of transparent substrates 210 surfaces, and make surface ion, increase follow-up and cohesive force other material.
(5) photoresist with black dyes in the painting/plating of whole of the above-mentioned treated surface of transparent substrates 210, obtain initial light shield layer.
(6) (conductive material or conductive ink can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO to plate conductive material or painting one deck conductive ink on whole of initial light shield layer surface.The present embodiment is argent), obtain conductive layer.
(7) be coated with the second photoresist layer, utilize second mask plate corresponding with the gridline pattern of light shielding part 222 to be exposed, develop again the second photoresist layer, only on conductive layer, cover the photoresist consistent with the gridline pattern of light shielding part 222, other local photoresist is removed.
(8) utilize lithographic technique to carry out etching to conductive layer, obtain initial second conductive layer consistent with the gridline pattern of light shielding part 222 (now the conductive thread of initial the second conductive layer is complete, the processing of breaking).
(9) utilize lithographic technique to carry out etching to initial light shield layer, obtain light shielding part 222.Because be all to utilize the second photoresist layer to do mask layer during to conductive layer and initial light shield layer etching, so the gridline pattern of the conductive pattern of initial the second conductive layer and light shielding part 222 is consistent.
(10) at the gridline pattern with light shielding part 222, consistent initial the second conductive layer surface is coated with the 3rd photoresist layer again, with the 3rd supporting mask plate of the conductive pattern with the second conductive layer 230 broken string position, the 3rd photoresist layer is exposed, developed, initial the second conductive layer regional photoresist that need to break is removed.
(11) utilize lithographic technique again to carry out etching to initial the second conductive layer, the break conductive material of location of needs is etched away, form the second conductive unit separate, insulation, obtain the second conductive layer 230.
(12) plate/coat the R/G/B filter unit in the corresponding region gradation again, thereby obtain the optical filter box 200 with the second conductive layer 230.
(13) will be bondd by transparent adhesive and be solidified with the polaroid assembly 100 of the first conductive layer 120 with the optical filter box 200 of the second conductive layer 230, be obtained having the polarisation optical filtering module of touch control operation function.
Continuation, with reference to Fig. 1 and Fig. 6, has the polarisation optical filtering module of touch control operation function, and the first conductive layer 120 passes through to be coated with/plating layer of transparent conductive material, then obtains through etching; The second conductive layer 230 is covered in the surface of light shielding part 222 away from transparent substrates 210 1 sides, and the gridline pattern of light shielding part 222 is consistent with the conductive pattern of the second conductive layer 230, also breaks while processing, and its manufacturing process is as follows:
(1) at whole of the surface plating layer of transparent conductive material of polaroid 110 or be coated with the layer of transparent conductive ink and solidify that (conductive material or conductive ink can be Graphene, electrically conducting transparent macromolecular material, nano metal line ink or ITO etc., solidify after-vision transparent.The present embodiment plating one deck ITO), form conductive layer.
(2) be coated with the first photoresist layer, utilize first mask plate corresponding with the conductive pattern of the first conductive layer 120 to be exposed, develop again the first photoresist layer, only on conductive layer, cover the photoresist corresponding with the conductive pattern of the first conductive layer 120, other local photoresist is removed.
(3) utilize lithographic technique to carry out etching to conductive layer, obtain the first conductive unit separate, insulation, thereby obtain the polaroid assembly 100 with the first conductive layer 120.
(4) at first carry out the Plasma processing on a surface of transparent substrates 210, remove the dirty of transparent substrates 210 surfaces, and make surface ion, increase follow-up and cohesive force other material.
(5) photoresist with black dyes in the painting/plating of whole of the above-mentioned treated surface of transparent substrates 210, obtain initial light shield layer.
(6) (conductive material or conductive ink can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO to plate conductive material or painting one deck conductive ink on whole of initial light shield layer surface.The present embodiment is argent), obtain conductive layer.
(7) be coated with the second photoresist layer, utilize second mask plate corresponding with the conductive pattern of the second conductive layer 230 to be exposed, develop again the second photoresist layer, only on conductive layer, cover the photoresist consistent with the conductive pattern shape of the second conductive layer 230, other local photoresist is removed (comprising the broken string zone).
(8) utilize lithographic technique to carry out etching to conductive layer, form the second conductive unit separate, insulation, obtain the second conductive layer 230.
(9) utilize lithographic technique to carry out etching to initial light shield layer, obtain the light shielding part consistent with the conductive pattern of the second conductive layer 230 222.Because utilize same photoresist layer to do mask layer when conductive layer is carried out to etching with initial light shield layer, light shielding part 222 also carried out to broken string and processed.
(10) plate/coat the R/G/B filter unit in the corresponding region gradation again, thereby obtain the optical filter box 200 with the second conductive layer 230.
(11) will be bondd by transparent adhesive and be solidified with the polaroid assembly 100 of the first conductive layer 120 with the optical filter box 200 of the second conductive layer 230, be obtained having the polarisation optical filtering module of touch control operation function.
The polarisation optical filtering module with touch control operation function as shown in Fig. 5 and Fig. 7, the first conductive layer 120 passes through to be coated with/plating layer of transparent conductive material, then obtains through etching; The second conductive layer 230 is covered between light shielding part 222 and transparent substrates 210, and the gridline pattern of light shielding part 222 is consistent with the conductive pattern of the second conductive layer 230, also breaks while processing, and its manufacturing process is as follows:
(1) at whole of the surface plating layer of transparent conductive material of polaroid 110 or be coated with the layer of transparent conductive ink and solidify that (conductive material or conductive ink can be Graphene, electrically conducting transparent macromolecular material, nano metal line ink or ITO etc., solidify after-vision transparent.The present embodiment plating one deck ITO), form conductive layer.
(2) coating photoresist layer, utilize first mask plate corresponding with the conductive pattern of the first conductive layer 120 to be exposed, develop again photoresist layer, only on conductive layer, cover the photoresist corresponding with the conductive pattern of the first conductive layer 120, other local photoresist is removed.
(3) utilize lithographic technique to carry out etching to conductive layer, obtain the first conductive unit separate, insulation, thereby obtain the polaroid assembly 100 with the first conductive layer 120.
(4) at first carry out the Plasma processing on a surface of transparent substrates 210, remove the dirty of transparent substrates 210 surfaces, and make surface ion, increase follow-up and cohesive force other material.
(5) whole the plating conductive material or be coated with one deck conductive ink (conductive material or conductive ink can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO on the above-mentioned treated surface of transparent substrates 210.The present embodiment is argent), obtain conductive layer.
(6) photoresist with black dyes in whole painting/plating of conductive layer surface, obtain initial light shield layer.
(7) utilize second mask plate corresponding with the conductive pattern of the second conductive layer 230 to be exposed, develop initial light shield layer, carry out again etching, (now light shielding part has carried out the broken string processing to obtain the light shielding part consistent with the conductive pattern shape of the second conductive layer 230, because while forming the second conductive layer be, using light shielding part to carry out etching as mask layer, if light shielding part is not broken, processing can not blocked conductive layer, can make the conductive layer processing of can't breaking).
(8) utilize lithographic technique to carry out etching to conductive layer, form the second conductive unit separate, insulation, obtain the second conductive layer 230.
(9) plate/coat the R/G/B filter unit in the corresponding region gradation again, thereby obtain the optical filter box 200 with the second conductive layer 230.
(10) will be bondd by transparent adhesive and be solidified with the polaroid assembly 100 of the first conductive layer 120 with the optical filter box 200 of the second conductive layer 230, be obtained having the polarisation optical filtering module of touch control operation function.
Above-mentioned polarisation optical filtering module, can realize touch operation, polarized light function and filtering functions simultaneously, as an indispensable assembly in display screen, during for display screen, can directly make display screen there is touch controllable function, without assemble again touch-screen on display screen, not only be conducive to reduce the thickness of electronic product, also greatly saved material and assembly cost simultaneously.
The material that the second conductive layer 230 is selected only expands all suitable conductive materials to transparent material by tradition; When conductive material is selected metal material, the energy consumption that can greatly reduce resistance and reduce touch-screen.
The above-mentioned polarisation optical filtering module with touch controllable function is double-deck conductive structure, without the design of putting up a bridge, greatly reduces task difficulty.Adopt above-mentioned polarisation optical filtering module, can reduce the signal interference of liquid crystal display (Liquid Crystal Display, LCD) to the touch-control effect.
In addition, the utility model also provides a kind of touch display screen, can be the LCDs of straight-down negative or side entering type light source.Touch display screen comprises TFT electrode, Liquid Crystal Module and the above-mentioned polarisation optical filtering module stacked gradually.Because polarisation optical filtering module has touch operation, polarized light function and filtering functions simultaneously, make touch display screen there is the touch Presentation Function.Not only be conducive to reduce the thickness of electronic product, also greatly saved material and assembly cost simultaneously.Be appreciated that for to use backlight be polarized light source, as OLED(Organic Light-Emitting Diode, Organic Light Emitting Diode) polarized light source, without lower polaroid, only need the polarisation module in above-mentioned polarisation optical filtering module to get final product.
The above embodiment has only expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.